CN104111590A - Laser direct writing device based on combined vortex double focusing light spot - Google Patents
Laser direct writing device based on combined vortex double focusing light spot Download PDFInfo
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- CN104111590A CN104111590A CN201410317829.4A CN201410317829A CN104111590A CN 104111590 A CN104111590 A CN 104111590A CN 201410317829 A CN201410317829 A CN 201410317829A CN 104111590 A CN104111590 A CN 104111590A
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Abstract
The invention discloses a laser direct writing device based on a combined vortex double focusing light spot. The laser direct writing device mainly comprises a 405 nm blue light etching light path, a 650 nm red light self-focusing servo light path, a control computer and a relevant control feedback system, wherein the 405 nm blue light etching light path mainly comprises a circular polarization lens group, a 1/2 wave plate, an electric control rotating platform, a spatial light modulator, a confocal lens group, a dichroism beam splitter, a focusing objective, a self-focusing servo driver, an electric control two-dimensional movement platform and the like; the 650 nm red light self-focusing servo light path mainly comprises a red light collecting lens, a cylindrical mirror and a four-quadrant detector. The laser direct writing device is characterized in that a combined vortex phase modulation is added in an entrance pupil of a conventional laser direct writing light loath focusing objective, thereby achieving double focusing light spot intensity distribution at an objective focusing rear field. The double focusing light spot is capable of achieving hundred-nanometer-order transverse resolution under the medium-numerical aperture focusing, and has a micrometer-order axial focal depth under the medium-numerical aperture focusing.
Description
Technical field
The present invention relates to laser direct-writing device, particularly a kind of laser direct-writing device based on combined vortex bivalve focal beam spot.
Background technology
The focusing light field three-dimensional spatial distribution of object lens can be described as the core of laser direct-writing technology.We know, for conventional optical system, the numerical aperture NA of its resolution R and depth of focus DOF and system imaging lens is closely related, i.e. R ∝ λ/NA, and the depth of focus DOF ∝ λ/NA of imaging system
2.In the situation that wavelength is certain, on the one hand, improve the resolving power of laser direct-writing, the numerical aperture NA of just necessary raising system.But the raising of numerical aperture, just means sharply the reducing of depth of focus of system.Sharply reducing of depth of focus, has just proposed acid test to auto-focusing servo system.Another approach that improves systemic resolution is to reduce operation wavelength.But reducing of operation wavelength, especially arrives deep ultraviolet wave band, owing to there is no suitable optical material, have to adopt reflecting light line structure.Reflective light path is to very difficulty of the aberration correction of system.Nowadays, in business photoetching technique, wavelength has arrived 193nm, substantially approaches technological limit.So the super resolution technology that some realizations surmount diffraction limit is successively suggested, especially some far field super-resolution technology.Further, realize transverse super-resolution simultaneously, still requiring to ensure larger axial depth of focus.
Summary of the invention
The object of the present invention is to provide a kind of laser direct-writing device based on combined vortex bivalve focal beam spot, this device adds combined vortex phase-modulation by the entrance pupil place of directly writing light path focusing objective len at conventional laser, can produce bivalve focal beam spot at the back court of focusing objective len, this can make laser direct writing system realize hundred nano-scale lateral resolution, have the depth of focus under relatively low numerical aperture focusing, thereby performance boost there is important practical to be worth to laser direct writing system simultaneously.
Technical solution of the present invention is as follows:
Based on a laser direct-writing device for combined vortex bivalve focal beam spot, form and comprise 405 nano blue light semiconductor laser composition light paths, 650 nano red light semiconductor laser composition light paths and control computing machine and relevant control feedback system; In the light path of exporting along 405 described nano blue light semiconductor lasers, be the first collimator and extender lens, circular polarization eyeglass group, 1/2 wave plate, the first beam splitter, spatial light modulator, first lens, catoptron, the second lens, dichroic beamsplitter, the second beam splitter, aperture diaphragm, focusing objective len, auto-focusing servo driver, photoetching sample and automatically controlled two-dimensional movement platform successively; The second collimator and extender lens and the second described beam splitter successively along 650 described nano red light semiconductor laser output light path directions, the reflected light Yan Yuan road of inciding on described photoetching sample is returned, and is ruddiness collecting lens, cylindrical mirror, 4 quadrant detector successively in the transmit red light direction of dichroic beamsplitter; Described circular polarization eyeglass group comprises the polarizer and quarter wave plate; Confocal lens combination comprises first lens and the second lens; Catoptron is in the back focal plane position of front focal plane and second lens of the first lens of confocal lens combination, and described aperture diaphragm is on the front focal plane of the second lens, and the front focal plane of the second lens and the back focal plane of focusing objective len overlap; 1/2 described wave plate is to be fixed on automatically controlled universal stage, be characterized at the reflected light direction of the first described beam splitter photomodulator that has living space, the described spatial light modulator together back focal plane of the first lens of focus lens group overlaps, and control is connected described control computing machine with automatically controlled two-dimensional movement platform with described automatically controlled universal stage, spatial light modulator, 4 quadrant detector, auto-focusing servo driver.
405 described nano blue light semiconductor lasers and 650 nano red light semiconductor lasers are coupling fiber output single-mode laser.
The first described beam splitter and the second beam splitter are all realized 50% reflection, 50% transmission.
Described dichroic beamsplitter is high-level efficiency reflection to 405 nanometer lasers, and 650 nano red lights are to high-level efficiency transmission.
The rotation of described automatically controlled universal stage regulates the primary optical axis direction of 1/2 described wave plate within the scope of 0～2 π.
Described spatial light modulator is pure phase-modulation, and the PHASE DISTRIBUTION that described spatial light modulator loads in incident light is combined vortex PHASE DISTRIBUTION; The transmittance function of described combined vortex PHASE DISTRIBUTION meets relational expression
Wherein,
for normalization polar coordinates;
for adjacent ring district initial delay phase differential; r
nbe the radius in n Ge Huan district, n=1,2 ..., N; The total number in N Wei Huan district; Circ (r) is circular hole function:
Described combined vortex PHASE DISTRIBUTION is many ring plot structures, and Ge Huan district area is equal, Ji Gehuan district radius r
nmeet:
and iso-area circlet district sum N is at least more than or equal to 10.
By regulating described spatial light modulator to change combined vortex adjacent ring district initial phase difference
with regulate automatically controlled universal stage to change the polarization direction of the linearly polarized light passing through, guarantee that the dark line direction of bivalve focal beam spot of described focusing objective len focusing is consistent with the polarization direction of incident ray polarized light.
The linear sweep direction of the described relative focusing objective len of automatically controlled two-dimensional movement platform is consistent with the direction of the dark line of bivalve focal beam spot, and described linear sweep direction is consistent with the polarization direction of incident ray polarized light simultaneously.
Technique effect of the present invention
The present invention goes out by spatial light modulator mode to add combined vortex phase-modulation by the entrance pupil of directly writing light path focusing objective len at conventional laser, thereby realizes bivalve focal beam spot at the back court of focusing objective len.This bivalve focal beam spot can be realized hundred nanometer scale resolution and have micron order depth of focus under medium numerical aperture focuses on.
The present invention adopts lower NA objective to focus on, and can reduce the harsh requirement of focusing system to aberration correction.The laser direct-writing technology of this bivalve focal beam spot that the present invention proposes, its lateral resolution is determined by the dark line between two lobes, and this dark line is to be produced by vortex phase singularity, thereby its lateral resolution is insensitive to aberration.That is to say, aberration can not obtain perfect rectification, the abrupt degradation that still can not bring systemic resolution for various reasons in practice.From another aspect, if adopt high-NA objective, lateral resolution even can reach 100 nanometer levels, and the nanocomposite optical components and parts processing that this is some specific demands provides laser direct-writing technical scheme.This laser direct-writing technology that can realize hundred nanometer scale lateral resolutions, large depth of focus can realize high lateral resolution on the one hand, simultaneously also at a high speed, large-area laser is directly write provides one to realize approach.
Brief description of the drawings
Fig. 1 is that the present invention focuses on combined vortex PHASE DISTRIBUTION schematic diagram in entrance pupil.
Fig. 2 is the laser direct writing system index path that the present invention is based on combined vortex bivalve focal beam spot:
Fig. 3 is the contour distribution plan of bivalve focal beam spot lateral cross section two dimension intensity that combined vortex produces.
Fig. 4 is the contour distribution plan of bivalve focal beam spot axial cross section two dimension intensity that combined vortex produces.
Fig. 5 is that the bivalve focal beam spot that combined vortex produces distributes along the axial distribution of light intensity of y.
Fig. 6 is combined vortex PHASE DISTRIBUTION and the contour distribution plan of corresponding focal beam spot lateral cross section two dimension intensity under different adjacent ring district initial delay phase differential.
Embodiment
Core concept of the present invention is introduced combined vortex PHASE DISTRIBUTION in conventional laser direct-writing device, and described combined vortex phase transmittance function can be expressed as:
Wherein,
R
nmeet,
for adjacent ring district initial delay phase differential, N is the total number in iso-area circlet district.Fig. 1 has provided the exemplary complex vortex PHASE DISTRIBUTION that the present invention proposes, and in figure, ruler units is radian.As can be seen from the figure, all ring belt areas are concentric distribution, and all endless belt areas equate; Often adjacent ring region initial phase phase difference of pi (180 degree) between two, and every adjacent ring region PHASE DISTRIBUTION from inside to outside is between two followed successively by be evenly incremented to 2 π (i.e. 360 degree, approximately 6.28 radians) and to be evenly incremented to 2 π from 0 along azimuth direction counterclockwise from 0 along azimuth direction clockwise and alternately changes.Fig. 2 is the bivalve focal beam spot laser direct-writing canonical system that the present invention is based on this combined vortex phase place.The basic mode laser beam that 405 blue-light semiconductor laser instruments 1 send, after expanding, becomes circularly polarized light through the polarizer 301, quarter wave plate 302 successively by the first collimator and extender lens 2, and this circularly polarized light becomes line polarisation through 1/2 wave plate 4.1/2 described wave plate 4 is fixed on automatically controlled universal stage 5, by regulating the anglec of rotation of automatically controlled turntable 5, can change by the polarization orientation of the linearly polarized light of 1/2 wave plate 4.This linearly polarized light, through the first beam splitter 6, reflexes on the modulation face of spatial light modulator 7, and described spatial light modulator 7 loads combined vortex phase place as shown in Figure 1 in folded light beam.Folded light beam after spatial light modulator 7 modulation, by after the first beam splitter 6, by confocal lens combination 8, is then passed through dichroic beamsplitter 10, the second beam splitter 11, aperture diaphragm 12 successively, projects on the entrance pupil face of focusing objective len 13.Wherein, spatial light modulator 7 is placed on the front focal plane of first lens 801 of confocal lens combination 8, and the front focal plane position of the back focal plane of the first lens 801 of confocal lens combination 8 and the second lens 802 overlaps, and catoptron 9 is placed in this coincidence position.Focusing objective len 13 focuses on realization exposure on the photoetching sample 15 being placed on automatically controlled two-dimensional movement platform 16 by inscribing blue light., then reflex in focusing objective len 13 pupils by the second beam splitter 11 through the second collimator and extender lens 18 from 650 nano red light semiconductor laser 17 emitting lasers.The ruddiness that focuses on photoetching sample 15 surfaces passes through focusing objective len 13, the second spectroscope 11, dichroism spectroscope 10 successively through surface reflection, focus on by cylindrical mirror 20 and be imaged on the test surface of 4 quadrant detector 21 through ruddiness collecting lens 19, the astigmatism of the introducing by cylindrical mirror 20, the four-quadrant difference signal by 4 quadrant detector 21 feeds back to focus servo driver 14 and realizes auto-focusing servo through controlling computing machine 22.
In addition, by regulating adjacent ring district initial phase difference
we can regulate the different orientation radially of bivalve focal beam spot, thereby and ensure that by the corresponding adjusting linearly polarized light of automatically controlled universal stage 5 polarization direction the dark line direction of bivalve focal beam spot is consistent with the polarization direction of linearly polarized light.And, ensure that dark line direction, the polarization direction of linearly polarized light and the linear sweep direction of automatically controlled two-dimensional movement platform 16 of described bivalve focal beam spot is consistent.By the linear sweep of described automatically controlled two-dimensional movement platform 16, can realize the photoetching lines of differentiating along dark line direction hundred nanometer scale of bivalve focal beam spot.
On the other hand, we know that the object lens of high-NA are more much higher than low numerical aperture to system aberration rectification requirement meeting, and this is mainly because high-NA objective is more responsive to the aberration of system.The present invention can substitute by the focusing objective len of medium numerical aperture NA=0.6 the object lens of NA=0.9, thereby avoids the harsh requirement that system aberration is corrected.In addition, because the dark line between the focusing bivalve that this laser direct-writing technology based on combined vortex bivalve focal beam spot that the present invention proposes realizes by the combined vortex phase place of introducing is realized photoetching and is differentiated, because the characteristic of the phase singularity of itself, the resolution that the dark line in the middle of this bivalve focal beam spot is realized is insensitive to the aberration of system.
Embodiment
Below taking the condenser lens of NA=0.6 as example, the specific embodiments of the bivalve focal beam spot laser direct writing system that a kind of combined vortex realizes is proposed.
Here the input aperture that choose NA=0.6 condenser lens is 6mm, and the aperture diaphragm aperture on object lens back focal plane is 6mm.Spatial light modulator is selected Holoeye Pluto VIS (single pixel 8 μ m, total pixel number is 1920 × 1080) spatial light modulator of phase only modulation mode work.Auto-focusing servo driver 14 is chosen as axial piezoelectric ceramics nanometer driver, and the range of linearity is 2 microns, closed loop resolution 0.2 nanometer.Combined vortex phase place homalographic region total number in formula (1) is elected N=10 as.When adjacent ring district initial phase difference is π, now the PHASE DISTRIBUTION in the input aperture of focusing objective len as shown in Figure 1.We are respectively f by selected confocal lens combination 8 first lens (801) and the second lens (802) focal length adopting
1=120mm and f
2=90mm.According to diffraction integral theory, we can calculate the optical field distribution that focuses on back court under linearly polarized light incident.Wherein three-dimensional cartesian coordinate system system selection rule is as follows: true origin is elected the geometrical focus place of focusing objective len as, and z axle is along optical axis direction, and positive dirction is along direction of beam propagation, and x axle and y axle, in how much focal planes, and meet right hand rule with z axle.Fig. 3 and Fig. 4 have provided respectively the bivalve focal beam spot contour distribution plan of horizontal two-dimentional intensity of the combined vortex phase place generation under NA=0.6 focusing and have distributed along the axial one dimension distribution of light intensity of y, wherein incident field is the incident of linear polarization TM mode, and linear polarization is along x direction in figure.In figure, x axle and y axial coordinate unit are micron.From Fig. 3, can clearly be seen that, by our designed combined vortex phase-modulation, can realize the focal beam spot of bivalve, original focal beam spot center can produce the dark line that an intensity is zero.From Fig. 4, can obviously find out, the dark line full width at half maximum between bivalve focal beam spot is 250nm, and the focal beam spot resolution under focusing on conventional NA=0.9 is tight is suitable.Realize the dark line direction of the relative bivalve focal beam spot of sample along the linear sweep of polarization direction by mobile platform, can realize the groove of hundred nanometer scale lithographic line width by this laser direct writing system.Fig. 5 has provided the contour distribution plan of bivalve focal beam spot axial cross section two dimension intensity, and y axle and z axial coordinate unit are micron.Therefrom can find out that depth of focus is about 1.8 microns, be about 3 times of the lower depth of focus of conventional NA=0.9 focusing.By regulating adjacent area initial phase to postpone, and the polarization orientation of corresponding adjusting incident ray polarisation, we can realize the adjustment of direction of scanning.Fig. 6 has provided different initial phase differences
the contour distribution plan of two-dimension light field intensity in corresponding lateral cross section.Therefrom we can clearly be seen that, along with initial phase difference
change, between bivalve focal beam spot, dark line is oriented in change.So, by regulating initial phase difference
with the linear polarization of incident light, can realize any adjusting of photoetching direction of scanning.
In sum, the present invention is based on the laser direct-writing device of combined vortex bivalve focal beam spot, under the condition that can focus at medium NA objective, realize the lateral resolution of high NA focus, and have the long depth of focus that medium numerical aperture focuses on.In addition, substitute high-NA objective by medium NA objective, can greatly reduce the harsh requirement to light path aberration correction.Thereby this laser direct-writing device based on combined vortex bivalve focal beam spot is at high speed, large area, sub-wavelength laser direct-writing, especially large-area sub-wave length grating is directly write important practical value in processing.
The above laser direct-writing device focusing on based on combined vortex bivalve has only been expressed a kind of embodiment of the present invention, can not therefore be interpreted as limiting the scope of the invention.It should be noted that; for the person of ordinary skill of the art; do not departing under the prerequisite of basic thought of the present invention, concrete implementation detail and the representative device that can also propose this patent are made some distortion and improvement, and these all belong to protection scope of the present invention.
Claims (8)
1. the laser direct-writing device based on combined vortex bivalve focal beam spot, forms and comprises 405 nano blue light semiconductor laser (1) composition light paths, 650 nano red light semiconductor laser (17) composition light paths and control computing machine (22) and relevant control feedback system, in the light path of exporting along 405 described nano blue light semiconductor lasers (1), be the first collimator and extender lens (2) successively, circular polarization eyeglass group (3), 1/2 wave plate (4), the first beam splitter (6), spatial light modulator (7), first lens (801), catoptron (9), the second lens (802), dichroic beamsplitter (10), the second beam splitter (11), aperture diaphragm (12), focusing objective len (13), auto-focusing servo driver (14), photoetching sample (15) and automatically controlled two-dimensional movement platform (16), the second collimator and extender lens (18) and described the second beam splitter (11) successively along 650 described nano red light semiconductor laser (17) output light path directions, the reflected light Yan Yuan road of inciding on described photoetching sample (15) is returned, and is ruddiness collecting lens (19), cylindrical mirror (20), 4 quadrant detector (21) successively in the transmit red light direction of dichroic beamsplitter (10), described circular polarization eyeglass group (3) comprises the polarizer (301) and quarter wave plate (302), confocal lens combination (8) comprises first lens (801) and the second lens (802), catoptron (9) is in the back focal plane position of front focal plane and second lens (802) of the first lens (801) of confocal lens combination (8), described aperture diaphragm (12) is on the front focal plane of the second lens (802), and the front focal plane of the second lens (802) overlaps with the back focal plane of focusing objective len (13), described 1/2 wave plate (4) is to be fixed on automatically controlled universal stage (5), it is characterized in that at the reflected light direction of described the first beam splitter (6) photomodulator (7) that has living space, described spatial light modulator (7) the together back focal plane of the first lens (801) of focus lens group (8) overlaps, and described control computing machine (22) is controlled and is connected with described automatically controlled universal stage (5), spatial light modulator (7), 4 quadrant detector (21), auto-focusing servo driver (14) and automatically controlled two-dimensional movement platform (16).
2. the laser direct-writing device based on combined vortex bivalve focal beam spot according to claim 1, is characterized in that 405 described nano blue light semiconductor lasers (1) and 650 nano red light semiconductor lasers (17) are coupling fiber output single-mode laser.
3. the laser direct-writing device based on combined vortex bivalve focal beam spot according to claim 1, the first beam splitter (6) and the second beam splitter (11) described in it is characterized in that are all realized 50% reflection, 50% transmission.
4. the laser direct-writing device based on combined vortex bivalve focal beam spot according to claim 1, is characterized in that described dichroic beamsplitter (10) is high-level efficiency reflection to 405 nanometer lasers, is high-level efficiency transmission to 650 nano red lights.
5. the laser direct-writing device based on combined vortex bivalve focal beam spot according to claim 1, is characterized in that the rotation of described automatically controlled universal stage (5) regulates the primary optical axis direction of described 1/2 wave plate (4) within the scope of 0～2 π.
6. the laser direct-writing device based on combined vortex bivalve focal beam spot according to claim 1, it is characterized in that described spatial light modulator (7) is pure phase-modulation, the PHASE DISTRIBUTION that described spatial light modulator (7) loads in incident light is combined vortex PHASE DISTRIBUTION; The transmittance function of described combined vortex PHASE DISTRIBUTION meets relational expression
Wherein,
for normalization polar coordinates;
for adjacent ring district initial delay phase differential; r
nbe the radius in n Ge Huan district, n=1,2 ..., N; The total number in N Wei Huan district; Circ (r) is circular hole function:
Described combined vortex PHASE DISTRIBUTION is many ring plot structures, and Ge Huan district area is equal, Ji Gehuan district radius r
nmeet:
and iso-area circlet district sum N is at least more than or equal to 10.
7. the laser direct-writing device based on combined vortex bivalve focal beam spot according to claim 1, is characterized in that, by regulating described spatial light modulator (7) to change combined vortex adjacent ring district initial phase difference
with regulate automatically controlled universal stage (5) to change the polarization direction of the linearly polarized light passing through, guarantee that the dark line direction of bivalve focal beam spot of described focusing objective len (13) focusing is consistent with the polarization direction of incident ray polarized light.
8. the laser direct-writing device based on combined vortex bivalve focal beam spot according to claim 1, the linear sweep direction that it is characterized in that the relative focusing objective len (13) of described automatically controlled two-dimensional movement platform (16) is consistent with the direction of the dark line of bivalve focal beam spot, and described linear sweep direction is consistent with the polarization direction of incident ray polarized light simultaneously.
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106707692A (en) * | 2015-07-27 | 2017-05-24 | 中国科学院理化技术研究所 | Maskless lithography system with cooperative work of trans-scale structure |
| CN108332679A (en) * | 2018-01-18 | 2018-07-27 | 中国科学院上海光学精密机械研究所 | A kind of precision position from defocus device and detection method |
| CN108681210A (en) * | 2018-03-30 | 2018-10-19 | 电子科技大学 | A kind of miniature laser direct-write lithography machine |
| CN108957716A (en) * | 2018-05-17 | 2018-12-07 | 哈尔滨工业大学 | Interfere alignment device and method in spatial light modulator center |
| CN109709682A (en) * | 2019-01-25 | 2019-05-03 | 电子科技大学 | A kind of device generating combined vortex light beam |
| CN110286564A (en) * | 2019-06-26 | 2019-09-27 | 东北师范大学 | Femtosecond laser direct write printing device integrated with DMD mask-free photolithography |
| CN110441991A (en) * | 2019-07-04 | 2019-11-12 | 中国科学院上海光学精密机械研究所 | Maskless direct-write photoetching system |
| CN110664369A (en) * | 2019-09-19 | 2020-01-10 | 哈尔滨工业大学 | Self-adaptive confocal line scanning harmonic microscopic imaging method and device |
| WO2024010520A1 (en) * | 2022-07-08 | 2024-01-11 | Agency For Science, Technology And Research | Optical system, method of forming the same, method of direct laser writing |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030210383A1 (en) * | 2002-05-10 | 2003-11-13 | Bjorklund Gary C. | Maskless conformable lithography |
| US20050275814A1 (en) * | 2004-06-10 | 2005-12-15 | Lsi Logic Corporation, A Delaware Corporation | Maskless vortex phase shift optical direct write lithography |
| JP2009086015A (en) * | 2007-09-27 | 2009-04-23 | Hitachi Via Mechanics Ltd | Maskless exposure apparatus |
| CN101846890A (en) * | 2010-05-13 | 2010-09-29 | 苏州苏大维格光电科技股份有限公司 | Parallel photoetching write-through system |
| CN102122118A (en) * | 2011-02-23 | 2011-07-13 | 中国科学院上海光学精密机械研究所 | Laser direct-writing device |
| CN102621823A (en) * | 2012-04-17 | 2012-08-01 | 中国科学院上海光学精密机械研究所 | Multi-beam parallel laser direct writing device and method |
-
2014
- 2014-07-04 CN CN201410317829.4A patent/CN104111590B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030210383A1 (en) * | 2002-05-10 | 2003-11-13 | Bjorklund Gary C. | Maskless conformable lithography |
| US20050275814A1 (en) * | 2004-06-10 | 2005-12-15 | Lsi Logic Corporation, A Delaware Corporation | Maskless vortex phase shift optical direct write lithography |
| JP2009086015A (en) * | 2007-09-27 | 2009-04-23 | Hitachi Via Mechanics Ltd | Maskless exposure apparatus |
| CN101846890A (en) * | 2010-05-13 | 2010-09-29 | 苏州苏大维格光电科技股份有限公司 | Parallel photoetching write-through system |
| CN102122118A (en) * | 2011-02-23 | 2011-07-13 | 中国科学院上海光学精密机械研究所 | Laser direct-writing device |
| CN102621823A (en) * | 2012-04-17 | 2012-08-01 | 中国科学院上海光学精密机械研究所 | Multi-beam parallel laser direct writing device and method |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106707692B (en) * | 2015-07-27 | 2018-03-27 | 中国科学院理化技术研究所 | A kind of maskless lithography system to be cooperated across mesostructure |
| JP2018527610A (en) * | 2015-07-27 | 2018-09-20 | 中国科学院理化技術研究所 | Maskless photolithography system in collaborative work of cross-scale structure |
| CN106707692A (en) * | 2015-07-27 | 2017-05-24 | 中国科学院理化技术研究所 | Maskless lithography system with cooperative work of trans-scale structure |
| CN108332679A (en) * | 2018-01-18 | 2018-07-27 | 中国科学院上海光学精密机械研究所 | A kind of precision position from defocus device and detection method |
| CN108681210A (en) * | 2018-03-30 | 2018-10-19 | 电子科技大学 | A kind of miniature laser direct-write lithography machine |
| CN108957716B (en) * | 2018-05-17 | 2020-11-03 | 哈尔滨工业大学 | Spatial light modulator center position interference alignment device and method |
| CN108957716A (en) * | 2018-05-17 | 2018-12-07 | 哈尔滨工业大学 | Interfere alignment device and method in spatial light modulator center |
| CN109709682A (en) * | 2019-01-25 | 2019-05-03 | 电子科技大学 | A kind of device generating combined vortex light beam |
| CN110286564A (en) * | 2019-06-26 | 2019-09-27 | 东北师范大学 | Femtosecond laser direct write printing device integrated with DMD mask-free photolithography |
| CN110441991A (en) * | 2019-07-04 | 2019-11-12 | 中国科学院上海光学精密机械研究所 | Maskless direct-write photoetching system |
| CN110664369A (en) * | 2019-09-19 | 2020-01-10 | 哈尔滨工业大学 | Self-adaptive confocal line scanning harmonic microscopic imaging method and device |
| CN110664369B (en) * | 2019-09-19 | 2022-05-13 | 哈尔滨工业大学 | Self-adaptive confocal line scanning harmonic microscopic imaging method and device |
| WO2024010520A1 (en) * | 2022-07-08 | 2024-01-11 | Agency For Science, Technology And Research | Optical system, method of forming the same, method of direct laser writing |
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