CN103397309A - Air-inlet device and reaction chamber - Google Patents
Air-inlet device and reaction chamber Download PDFInfo
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- CN103397309A CN103397309A CN2013103355330A CN201310335533A CN103397309A CN 103397309 A CN103397309 A CN 103397309A CN 2013103355330 A CN2013103355330 A CN 2013103355330A CN 201310335533 A CN201310335533 A CN 201310335533A CN 103397309 A CN103397309 A CN 103397309A
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Abstract
The invention discloses an air-inlet device and a reaction chamber. The air-inlet device comprises a main body and a removable layer which are arranged in a stacked mode, the main body at least includes a first gas chamber, and a second gas chamber is formed by the region between the main body and the removable layer arranged below the main body; the main body and the removable layer are detachably connected via a positioning matching device, the positioning matching device is used to determine the relative position relationship between the removable layer and the main body, and a fixed part of the positioning matching device is locked into the main body; the first gas chamber and the second gas chamber both have one gas passage to provide a reaction region below the removable layer with reaction gases; then after a period of time, the removable layer can be removed for cleaning or replacement by a new removable layer, so that the shedding probability of particles on the surface of the air-inlet device can be effectively reduced, the pollution to products can be reduced, and the film forming quality can be improved.
Description
Technical field
The present invention relates to semi-conductor device technology field, particularly a kind of diffuser and reaction chamber.
Background technology
The chemical vapour deposition for example basic process of growth of Metalorganic chemical vapor deposition (MOCVD) technique is, reactant gases is introduced to reaction chamber from source of the gas by diffuser, utilization is with the substrate initiating chamical reaction of heater heats, thereby generates monocrystalline or polycrystal film on substrate.
the diffuser of prior art please refer to Fig. 1, comprise multi-layer gas chamber 1, for example comprise three, perhaps other quantity, also comprise cooling chamber 2, each gas chamber all is provided with gas passage 3, for reactant gases is transported to the conversion zone (not shown) of below from gas chamber 1, concrete, each gas chamber 1 all is positioned at described cooling chamber 2 tops, and gas passage 3 also runs through described cooling chamber 2, described cooling chamber 2 is for carrying out cooling to whole diffuser and gas chamber 1, make the temperature on the surface (being lower surface) towards pallet and substrate (not shown) side of diffuser maintain lower level, to reduce as much as possible the predecomposition of reactant gases.
yet in carrying out the MOCVD technological process, pallet and substrate temperature are higher, and the temperature of diffuser is lower, this easily causes the skewness of gas field of the conversion zone between pallet and diffuser, and (reactant gases of high temperature spreads to diffuser, the reactant gases of low temperature spreads to pallet), on the diffuser surface, pre-reaction occurs easily, because the surface temperature of diffuser is low, the particle that forms on the diffuser surface is loose, if the particle detachment on diffuser surface, may cause the particle contamination of the epitaxial material layer of substrate surface formation, affect yield.And prior art is because the temperature of diffuser is lower, and its surperficial particle contaminant problem is particularly serious.
Therefore, present diffuser is also unreasonable, need to improve it.
Summary of the invention
The object of the present invention is to provide a kind of diffuser and reaction chamber, the particle that forms with the surface that solves diffuser of the prior art easily comes off and substrate is produced to the problem of polluting.
For solving the problems of the technologies described above, the invention provides a kind of diffuser, for to conversion zone, providing reactant gases, wherein, described diffuser comprises main body and the layer can be removed of stacking setting, described main body comprises the first gas chamber at least, and the zone between the layer can be removed of described main body and this main body below forms the second gas chamber; Between described layer can be removed and described main body, by the location adapting device, removably connect, described location adapting device is used for determining the relative position relation between described layer can be removed and main body, and will locates mounting block and the described body lock of adapting device; Described the first gas chamber and the second gas chamber all have gas passage, with the conversion zone to described layer can be removed below, provide reactant gases.
Accordingly, the invention provides a kind of reaction chamber, comprise: cavity, for pallet and the diffuser of load substrates, described pallet is arranged at the bottom of described cavity, described diffuser is arranged on the top of described cavity and is oppositely arranged with described pallet, between described pallet and described diffuser, limit gas reaction area, described diffuser is used for to described conversion zone output-response gas, and described diffuser is diffuser as above.
Diffuser provided by the invention and reaction chamber, described diffuser comprises main body and layer can be removed, between described layer can be removed and described main body, by the location adapting device, removably connects.When after after a while, just can dismantle described layer can be removed to clean or replace new layer can be removed so, thereby can effectively reduce the probability of the particle detachment on diffuser surface, reduce the pollution to product, improve quality of forming film.
The accompanying drawing explanation
Fig. 1 is the structural representation of the diffuser of prior art;
Fig. 2 is the structural representation of the diffuser of one embodiment of the invention;
Fig. 3 is the part of the diffuser upward view of one embodiment of the invention.
Embodiment
Below in conjunction with schematic diagram, diffuser of the present invention and reaction chamber are described in more detail, the preferred embodiments of the present invention have wherein been represented, should be appreciated that those skilled in the art can revise the present invention described here, and still realize advantageous effects of the present invention.Therefore, following description is appreciated that extensively knowing for those skilled in the art, and not as limitation of the present invention.
For clear, whole features of practical embodiments are not described.They in the following description, are not described in detail known function and structure, because can make the present invention chaotic due to unnecessary details.Will be understood that in the exploitation of any practical embodiments, must make a large amount of implementation details to realize developer's specific objective, for example, according to the restriction of relevant system or relevant business, by an embodiment, change into another embodiment.In addition, will be understood that this development may be complicated and time-consuming, but be only routine work to those skilled in the art.
In the following passage, with reference to accompanying drawing, with way of example, the present invention is described more specifically.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the purpose of the aid illustration embodiment of the present invention lucidly.
core concept of the present invention is, a kind of diffuser and reaction chamber are provided, consider that diffuser lower surface of the prior art is easy to attaching particles, and may cause detrimentally affect, it is a method that diffuser is cleaned, but present diffuser cleans and is difficult for, so the contriver is designed to comprise main body and layer can be removed by diffuser, between described layer can be removed and described main body, by the location adapting device, removably connect, so when after after a while, just can dismantle described layer can be removed to clean or replace new layer can be removed.
Below in conjunction with the drawings and specific embodiments, diffuser provided by the invention and reaction chamber are described in further detail.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying, only in order to convenient, the purpose of the aid illustration embodiment of the present invention lucidly.
Please refer to Fig. 2, the invention provides a kind of diffuser, for to conversion zone, providing reactant gases, described diffuser comprises main body 1 and the layer can be removed 2 of stacking setting, described main body 1 comprises the first gas chamber 10 at least, zone between the layer can be removed 2 of described main body 1 and described main body 1 below forms the second gas chamber 12, and described the first gas chamber 10 is positioned at described the second gas chamber 12 and deviates from a side of described layer can be removed 2; Between described layer can be removed 2 and described main body 1, by the location adapting device, removably connect, described location adapting device is used for determining the relative position relation between described layer can be removed 2 and main body 1, and will locates mounting block and 1 locking of described main body of adapting device; Described the first gas chamber 10 has first gas passage 101 that is connected with this first gas chamber 10, described the first gas passage 101 is delivered to the conversion zone of layer can be removed 2 belows for the gas by the first gas chamber 10, described the second gas chamber 12 has the second gas passage 121 that is connected with this second gas chamber 12, and described the second gas passage 121 is delivered to the conversion zone of layer can be removed 2 belows for the gas by described the second gas chamber 12.Preferably, described the second gas passage 121 is for running through the through hole of described layer can be removed 2, and described the first gas passage 101 embeds in described the second gas passage 121, and between the two, has gap.
Concrete, as shown in Figure 2, in the present embodiment, described location adapting device is arranged on the edge of described layer can be removed 2.Described location adapting device comprises that positioning element 40, mating parts 41 and mounting block 42(are with reference to figure 3), described positioning element 40 is arranged at described layer can be removed 2 belows, described mating parts 41 is arranged between layer can be removed 2 and positioning element 40, described positioning element 40 and mating parts 41 are for determining the relative position relation between described layer can be removed 2 and main body 1, then by by 1 locking of described mounting block 42 and main body, realize being fixedly connected with between layer can be removed 2 and main body 1.
In the present embodiment, described mounting block 42 is bolt, described mounting block 42 passes positioning element 40, mating parts 41 and layer can be removed 2 and locks together with described main body 1, described layer can be removed 2 is provided with screw hole 22(with reference to figure 3), described mounting block 42 passes described screw hole 22, described screw hole 22 is along the size of described layer can be removed 2 size radially greater than described bolt, thus the required mobile space of volume change that occurs when reserved layer can be removed 2 radially expands with heat and contract with cold.In another preferred embodiment, described mounting block 42 can be also steady brace, and described layer can be removed 2 is provided with through hole, and described through hole is along the size of described layer can be removed size radially greater than described steady brace.Described steady brace be installed as common practise, at this, do not do introduction.
In order to prevent described layer can be removed 2 when the expanded by heating and described main body 1 is pushed, affect the work-ing life of diffuser, junction in described layer can be removed 2 and main body 1 is reserved with gap 21, by the design to screw hole 22 and gap 21, can make diffuser effectively adaptive temperature change the volume change of the layer can be removed 2 bring, thereby improved work-ing life.
in addition, the all parts volume change of considering described diffuser when expanding with heat and contract with cold may be different, even parts are also variant in the variation of different sites, therefore expand with heat and contract with cold and cause possibly described diffuser to produce unpredictable variation, in order effectively to keep the basic structure of diffuser, the contriver circumferentially is provided with a plurality of parts for centering adjustment (not shown) at the edge of described layer can be removed 2, can be for example that described layer can be removed 2 edges circumferentially are provided with a plurality of projections, and be provided with corresponding draw-in groove in main body 1 and described protruding contact position, so that the center of layer can be removed described layer can be removed after expanded by heating is aimed at the center of described main body.
In the present embodiment, the side that described positioning element 40 is relative with described layer can be removed 2 is respectively arranged with groove 401,20, and the two ends of described mating parts 41 lay respectively in the groove 401,20 of described positioning element 40 and layer can be removed 2.It will be appreciated that, " groove type " combination of the present embodiment is not that the fixed relationship between explanation described positioning element 40, mating parts 41 and layer can be removed 2 only limits to this, can also adopt other modes, be for example step-like engaging between described positioning element 40, mating parts 41 and layer can be removed 2.
In order to reach effect preferably, in the present embodiment, described positioning element 40 and mating parts 41 are preferably strip (or ring-type), in one week of edge around layer can be removed 2, make between described layer can be removed 2 and main body 1 and fix preferably.Comparatively simple in when assembling like this, also can effectively reduce the impact that the shape change that produces owing to expanding with heat and contract with cold brings.In another optional embodiment, the shape of described positioning element 40 and mating parts 41 also can be bulk, along one week of edge of layer can be removed 2, evenly arranges.
Being connected and fixed between the layer can be removed 2 in the present embodiment and main body 1 is mainly to design in edge section.Yet being connected and fixed of the two can be various ways, and for example, another preferred embodiment can be to be provided with interconnecting piece at the medial axis place of described layer can be removed 2 and main body 1, adopts the mode of furred ceiling that the two is linked together.Perhaps, can be also that described layer can be removed 2 screws up this structure together with main body 1 by screw thread.
Due to, preferably, in described the first gas chamber 10, pass into the first gas, in described the second gas chamber 12, pass into the second gas, described the first gas is III family gas, described the second gas is V family gas, and described III family's gas and V family gas are different to the demand of temperature, and for example described V family gas need to impose high temperature, to promote its reaction, the residing temperature environment of described III family's gas need to be lower than described V family gas, to avoid premature decomposition.Therefore, make layer can be removed 2 directly accept the thermal radiation from pedestal and substrate, the temperature that makes described the second gas chamber 12 is high temperature (at least greater than 200 degrees centigrade), and between described main body 1 and described layer can be removed 2, be provided with thermal insulation barriers 3, prevent that the temperature between layer can be removed 2 and main body 1 from influencing each other.As shown in Figure 2, in described main body 1, with described layer can be removed 2 contact positions, be provided with thermal insulation barriers 3, concrete, the edge of described main body 1 is provided with groove, described thermal insulation barriers 3 is arranged in the groove at edge of described main body 1, to isolate the thermal conduction between described main body 1 and described layer can be removed 2.It should be noted that, it is to be embedded in main body 1 that the shape of described thermal insulation barriers 3 is not limited to, and this structure in the present embodiment is mainly to consider the saving material, reduces cost of manufacture.Therefore, can be for example that the place of joint between described main body 1 and described layer can be removed 2 all is provided with thermal insulation barriers, so making can be simple, and effect of heat insulation is better.The material of described thermal insulation barriers 3 is the material that thermal conductivity is low, and preferably, the material of described thermal insulation barriers 3 is preferably pottery.
For the temperature that further makes described the first gas chamber 10 and the second gas chamber 12 remains on needed scope separately, between described the first gas chamber 10 and the second gas chamber 12, be provided with cooling chamber 11, can be for example cooling by water chamber or oil cooling cooling chamber, arranging mainly of described cooling chamber 11 is limited by processing condition, specifically the temperature of described the first gas chamber 10 is controlled.
In addition, between described the first gas chamber 10 and the second gas chamber 12, can also be provided with isolated chamber (not shown), described isolated chamber, for separation gas is provided, is isolated described III family's gas and V family gas, prevents that pre-reaction from occurring.Concrete, described isolated chamber can be between described cooling chamber 11 and the second gas chamber 12.And be gas due to what in isolated chamber, pass into, therefore, also can play cooling effect, so the design of isolated chamber and cooling chamber can depend on the circumstances, the two can all exist, or alternative.
For said structure, described the first gas passage 101 runs through the lower surface that described isolated chamber and/or cooling chamber 11 and the second gas chamber 12 arrive described layer can be removed 2.
Between described layer can be removed 2 and main body 1, also be provided with isolated even compression ring 52 and even gas spare 51, concrete, described even compression ring 52 and even gas spare 51 are arranged on outside described the second gas chamber 12 edges and between described layer can be removed 2 and main body 1, and described even gas spare 51 is nested in described even compression ring 52; Described even gas spare 51 is between described the second gas chamber 12 and even compression ring 52, one week of edge along even compression ring 51 is evenly distributed with a plurality of air inlet ports (not shown), along even 51 1 weeks of gas spare, a plurality of gas passages 511 are set evenly, the second gas from gas source cushions by the zone that air inlet port enters between even compression ring 52 and even gas spare 51, by described gas passage 511, enters described the second gas chamber afterwards.
As seen from Figure 2, described main body 1 caves in to the side away from described layer can be removed 2 with described even gas spare 51 and even compression ring 52 touching positions, thereby is conducive to fixing described even gas spare 51 and even compression ring 52.And, can also effectively prevent from permeating the gap of the second gas between even compression ring 52 and main body 1, avoid causing waste.Further, described layer can be removed 2 also can have the depression away from described the second gas chamber 12 with described even gas spare 51 and even compression ring 52 touching positions.
Described even compression ring 52 deviates between a side, described main body 1 and the described layer can be removed 2 of described even gas spare 51 and surrounds into sweeping gas chamber 6, the described layer can be removed 2 that surrounds into described sweeping gas chamber 6 is provided with sweeping gas passage 23, described sweeping gas chamber 6 is connected with outside purge gas source (not shown), sweeping gas from purge gas source enters sweeping gas chamber 6, thereby a side that deviates from described even gas spare 51 at described even compression ring 52 forms corresponding air pressure, avoids oozing out of reactant gases; And, can also be effectively between described main body 1 and layer can be removed 2, carrying out the heat isolation.After described sweeping gas enters described sweeping gas chamber 6, via sweeping gas passage 23, flow out downwards.
By above description, the structure and function of diffuser of the present invention is cheer and bright.By diffuser being designed to two portions combination of main body and layer can be removed, can be convenient to layer can be removed is cleaned or directly changes, thereby be conducive to guarantee the tidiness of diffuser, slow down or avoided the impact that reaction process is produced, also reduced production cost.
The location adapting device that arranges between described layer can be removed and main body makes between layer can be removed and main body effectively to be fixed, when can preventing from expanding with heat and contract with cold, the gap between layer can be removed and main body etc. because deformation causes structural variation, further ensured the reliability of diffuser.
In conjunction with above-mentioned diffuser, the invention provides a kind of reaction chamber, comprise: cavity, for pallet and the described diffuser of load substrates, described pallet is arranged at the bottom of described cavity, described diffuser is arranged on the top of described cavity and is oppositely arranged with described pallet, between described pallet and described diffuser, limit gas reaction area, described diffuser is used for to described conversion zone output-response gas.
Described reaction chamber for example can carry out MOCVD technique, by described diffuser, introduces gallium source gas and ammonia, formation of deposits gallium nitride film on substrate.After the reaction through after a while, just can to described diffuser, be dismantled by the technician, mainly that lower surface to layer can be removed cleans, removal is because reaction is attached to the contaminant particles on the layer can be removed lower surface, thereby can effectively reduce the probability of the particle detachment on diffuser surface, the pollution of minimizing to product, improve quality of forming film.And due to removable property, described layer can be removed can be manufactured separately, when its damage or consume the time, carries out independent replacing, and needn't change whole diffuser so, just can save greatly cost.
Obviously, those skilled in the art can carry out various changes and modification and not break away from the spirit and scope of the present invention invention.Like this, if within of the present invention these were revised and modification belongs to the scope of the claims in the present invention and equivalent technologies thereof, the present invention also was intended to comprise these change and modification.
Claims (18)
1. diffuser, for to conversion zone, providing reactant gases, it is characterized in that, described diffuser comprises main body and the layer can be removed of stacking setting, described main body comprises the first gas chamber at least, and the zone between the layer can be removed of described main body and this main body below forms the second gas chamber; Between described layer can be removed and described main body, by the location adapting device, removably connect, described location adapting device is used for determining the relative position relation between described layer can be removed and main body, and will locates mounting block and the described body lock of adapting device; Described the first gas chamber and the second gas chamber all have gas passage, with the conversion zone to described layer can be removed below, provide reactant gases.
2. diffuser as claimed in claim 1, is characterized in that, described location adapting device is arranged on the edge of described layer can be removed.
3. diffuser as claimed in claim 1, it is characterized in that, described location adapting device comprises: positioning element, mating parts and described mounting block, described positioning element is arranged at described layer can be removed below, described mating parts is arranged between layer can be removed and positioning element, described positioning element and mating parts be for determining the relative position relation between described layer can be removed and main body, then by by described mounting block and body lock, realizes being fixedly connected with between layer can be removed and main body.
4. diffuser as claimed in claim 3, is characterized in that, the side that described positioning element is relative with described layer can be removed respectively is provided with groove, and the two ends of described mating parts lay respectively in the groove of described positioning element and layer can be removed.
5. diffuser as claimed in claim 4, is characterized in that, described positioning element and mating parts are strip, around one week of edge of layer can be removed.
6. diffuser as claimed in claim 4, is characterized in that, described positioning element and mating parts are block, along one week of edge of layer can be removed, evenly arrange.
7. diffuser as claimed in claim 3, is characterized in that, described mounting block is bolt, and described layer can be removed is provided with screw hole, and described screw hole is along the size of described layer can be removed size radially greater than described bolt.
8. diffuser as claimed in claim 3, is characterized in that, described mounting block is steady brace, and described layer can be removed is provided with through hole, and described through hole is along the size of described layer can be removed size radially greater than described steady brace.
9. diffuser as claimed in claim 1, is characterized in that, described layer can be removed edge circumferentially is provided with a plurality of parts for centering adjustment, so that the center of layer can be removed described layer can be removed after expanded by heating is aimed at the center of described main body.
10. diffuser as claimed in claim 1, is characterized in that, between described main body and described layer can be removed, is provided with thermal insulation barriers, to isolate the thermal conduction between described main body and described layer can be removed.
11. diffuser as claimed in claim 10, is characterized in that, the material of described thermal insulation barriers is pottery.
12. diffuser as claimed in claim 10, is characterized in that, the edge of described main body is provided with groove, and described thermal insulation barriers is arranged in the groove at edge of described main body.
13. diffuser as claimed in claim 1, is characterized in that, between described second outside, gas chamber edge and described layer can be removed and main body, is provided with even compression ring and even gas spare, described even gas spare is nested in described even compression ring; Described even gas spare is between described the second gas chamber and even compression ring, one week of edge along even compression ring is evenly distributed with a plurality of air inlet ports, along even one week of gas spare, a plurality of gas passages are set evenly, the second gas from gas source cushions by the zone that air inlet port enters between even compression ring and even gas spare, by described gas passage, enters described the second gas chamber afterwards.
14. diffuser as claimed in claim 13, is characterized in that, described the first gas chamber passes into the first gas, and described the second gas chamber passes into the second gas, and described the first gas is III family gas, and described the second gas is V family gas.
15. diffuser as claimed in claim 14, it is characterized in that, described even compression ring deviates between a side of described even gas spare, described main body and described layer can be removed and surrounds into the sweeping gas chamber, the described layer can be removed that surrounds into described sweeping gas chamber is provided with the sweeping gas passage, described sweeping gas chamber is connected with outside purge gas source, from the sweeping gas of purge gas source, through sweeping gas chamber and sweeping gas passage, flows out downwards.
16. diffuser as claimed in claim 1, it is characterized in that, stacked isolated chamber and the cooling chamber of being provided with between described the first gas chamber and the second gas chamber, described isolated chamber is for providing separation gas, described III family's gas and V family gas are isolated, prevent that pre-reaction from occurring; Described cooling chamber is for carrying out the heat isolation by described the first gas chamber and the second gas chamber.
17. diffuser as claimed in claim 16, is characterized in that, the gas passage of described the first gas chamber runs through the lower surface that described isolated chamber and cooling chamber and the second gas chamber arrive described layer can be removed; The gas passage of described the second gas chamber is the through hole that runs through described layer can be removed.
18. reaction chamber, comprise: cavity, for pallet and the diffuser of load substrates, described pallet is arranged at the bottom of described cavity, described diffuser is arranged on the top of described cavity and is oppositely arranged with described pallet, between described pallet and described diffuser, limit gas reaction area, described diffuser is used for to described conversion zone output-response gas; It is characterized in that, described diffuser is diffuser as described as any one in claim 1-17.
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| CN2013103355330A CN103397309A (en) | 2013-08-02 | 2013-08-02 | Air-inlet device and reaction chamber |
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| CN2013103355330A CN103397309A (en) | 2013-08-02 | 2013-08-02 | Air-inlet device and reaction chamber |
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Application publication date: 20131120 |