CN103382552A - Monitoring method and system for abnormity of plasma chemical vapor deposition machine - Google Patents
Monitoring method and system for abnormity of plasma chemical vapor deposition machine Download PDFInfo
- Publication number
- CN103382552A CN103382552A CN2012101376662A CN201210137666A CN103382552A CN 103382552 A CN103382552 A CN 103382552A CN 2012101376662 A CN2012101376662 A CN 2012101376662A CN 201210137666 A CN201210137666 A CN 201210137666A CN 103382552 A CN103382552 A CN 103382552A
- Authority
- CN
- China
- Prior art keywords
- gate valve
- wafer
- valve port
- pcvd
- dodge gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The invention provides a monitoring method for abnormity of a plasma chemical vapor deposition machine. The method comprises the following steps: monitoring a movable gate valve between cavities; acquiring information about falling of a wafer onto the opening of the movable gate valve; and giving out a control instruction to suspend closing of the movable gate valve. According to the monitoring method for abnormity of the plasma chemical vapor deposition machine, the movable gate valve between the cavities is monitored, and whether the wafer falls onto the opening of the movable gate valve is monitored in real time; once falling of the wafer occurs, a control instruction is given to suspend closing of the movable gate valve, thereby effectively preventing damage of the wafer caused by abnormity of a transfer system between the cavities in the plasma chemical vapor deposition machine. Meanwhile, the invention further provides a monitoring system for abnormity of the plasma chemical vapor deposition machine.
Description
Technical field
The present invention relates to semiconductor technology, particularly relate to a kind of PCVD board abnormality monitoring method and system.
Background technology
PCVD is to make by microwave or radio frequency etc. the ionization of gas that contains the film composed atom, form plasma body in the part, and the plasma chemistry activity is very strong, is easy to react, thereby deposits the technology of desired film on substrate.For chemical reaction can be carried out at lower temperature, utilized the activity of plasma body to promote reaction.
Plasma-activated Chemical Vapor Deposition technique need to be carried out under high vacuum environment, and wafer reacts in airtight cavity.The dependence activity family of power and influence isolates between different cavitys, transmits wafer by mechanical arm.When board occurs extremely to cause wafer to drop at the dodge gate valve port because of transfer systems such as mechanical arm fault or transmission combination misses, wafer is clipped broken by family of power and influence's closed action, cause wafer damaged.
Summary of the invention
Based on this, be necessary to provide a kind of PCVD board abnormality monitoring method that effectively prevents the wafer breakage.
A kind of PCVD board abnormality monitoring method comprises the following steps: the movable family of power and influence between cavity is monitored; Obtain the information that wafer falls to the dodge gate valve port; Send steering order and suspend described movable family of power and influence's closed action.
In embodiment, also comprise step: send steering order and stop the mechanical arm grasping movement therein.
In embodiment, also comprise step: fall to the Information generation abnormity notifying of described dodge gate valve port according to described wafer, and be sent to default object therein.
In embodiment, the described mode that the movable family of power and influence between cavity is monitored is optical monitoring therein.
In embodiment, described optical monitoring is specially therein: the dodge gate valve port is continued the emission infrared signal, and receive; Describedly obtain the step that wafer falls to the information of dodge gate valve port and be specially: obtain the infrared signal interrupting information; Obtain according to the infrared signal interrupting information information that wafer falls to described dodge gate valve port.
In addition, also be necessary to provide a kind of PCVD board abnormality monitoring system.
A kind of PCVD board abnormality monitoring system comprises:
Monitoring device is used for the movable family of power and influence between cavity is monitored, and obtains the information that wafer falls to the dodge gate valve port;
Treater is connected with described monitoring device and the communication of described PCVD board, is used for receiving wafer and falls to the information of dodge gate valve port, and send steering order and suspend described movable family of power and influence's closed action.
In embodiment, described treater also is used for sending steering order and stops the mechanical arm grasping movement therein.
In embodiment, described treater also is used for falling to the Information generation abnormity notifying of described dodge gate valve port according to described wafer, and is sent to default object therein.
In embodiment, the mode that described monitoring device is monitored the movable family of power and influence between cavity is optical monitoring therein.
In embodiment, described monitoring device comprises therein:
Optic probe is used for the dodge gate valve port is continued the emission infrared signal; And
Receptor is used for receiving the infrared signal that optic probe is launched;
Wherein, described treater is connected with described receptor communication; When wafer fell to described dodge gate valve port, wafer blocked infrared signal, and receptor can't receive infrared signal; Treater obtains the infrared signal interrupting information, and obtains according to the infrared signal interrupting information information that wafer falls to described dodge gate valve port.
In above-mentioned PCVD board abnormality monitoring method and system; by the movable family of power and influence between cavity is monitored; whether the Real-Time Monitoring wafer falls to the dodge gate valve port; in case the situation that wafer drops occurs; send the stay off the feet family of power and influence's closed action of steering order, prevent that effectively the wafer that extremely causes because of transfer system between cavity in the PCVD board is damaged.
Description of drawings
Fig. 1 is the schematic diagram of PCVD board;
Fig. 2 is the schema of the PCVD board abnormality monitoring method of the present embodiment;
Fig. 3 is the particular flow sheet of step S120 shown in Figure 2;
Fig. 4 is the schematic diagram of the PCVD board abnormality monitoring system of the present embodiment.
Embodiment
In order to solve when board occurs extremely to cause wafer to drop at the dodge gate valve port because of mechanical arm fault or transmission combination miss etc., wafer is clipped broken by family of power and influence's closed action, the problem that causes the wafer breakage has proposed a kind of PCVD board abnormality monitoring method that effectively prevents the wafer breakage.
Seeing also Fig. 1, comprise load chamber 10 and transmission cavity 20 at the PCVD board, illustrate as an example of load chamber 10 and transmission cavity 20 example, is vacuum state in transmission cavity 20, and load chamber 10 and transmission cavity 20 separate by the movable family of power and influence 30.In daily production, wafer is put into load chamber 10.After putting into, load chamber 10 is evacuated to vacuum, and the movable family of power and influence 30 opens, and the mechanical arm 22 in transmission cavity 20 is put wafer grabbing to transmission cavity 20, then delivers to connected each reaction chamber (not shown) reaction.After reaction finished, mechanical arm 22 crawl wafers were put back to load chamber 10, the closed movable family of power and influence 30, and take out after rising to normal pressure.When the transfer system appearance of PCVD board was abnormal, wafer can drop at the dodge gate valve port, and finally causes damaging.
Based on above-mentioned situation, PCVD board abnormality monitoring method is as shown in Figure 2 proposed, comprise the following steps:
Step S110 monitors the movable family of power and influence between cavity.The movable family of power and influence between each cavity is monitored, and whether the Real-Time Monitoring wafer falls to the dodge gate valve port.Concrete, the mode that the movable family of power and influence between cavity is monitored is optical monitoring.
Step S120 obtains the information that wafer falls to the dodge gate valve port.When mechanical arm fault or transmission combination miss appearred in the PCVD board, wafer fell to the dodge gate valve port.At this moment, the Real-time Obtaining wafer falls to the information of dodge gate valve port.
It is pointed out that in step S110, can adopt infrared rays to carry out optical monitoring to the movable family of power and influence, be specially: the dodge gate valve port is continued the emission infrared signal, and receive.Simultaneously, step S120 is specially:
Step S121 obtains the infrared signal interrupting information.When wafer fell to the dodge gate valve port, wafer blocked infrared signal, caused infrared signal to interrupt, and obtained the infrared signal interrupting information.
Step S122 obtains according to the infrared signal interrupting information information that wafer falls to the dodge gate valve port.Infrared signal interrupts, and has wafer to fall to corresponding dodge gate valve port, further illustrates by the transfer system between two cavitys of this activity family of power and influence isolation to exist extremely.
Step S130 sends the steering order family of power and influence's closed action of staying off the feet.The systems analysis wafer sends steering order after falling to the information of dodge gate valve port, suspends the corresponding movable family of power and influence's closed action, in case clip broken the wafer that falls to the dodge gate valve port when should the activity family of power and influence closed.
If mechanical arm exists abnormal, can cause more wafer to drop, system can send steering order and stopped the mechanical arm grasping movement this moment.Simultaneously, the scheme that also can take the receptor for receiving infrared-ray signal to be connected with the control loop of mechanical arm, in case infrared signal interrupts, mechanical arm stops relevant transmission work immediately.
In above-mentioned PCVD board abnormality monitoring method; by the movable family of power and influence between cavity is monitored; whether the Real-Time Monitoring wafer falls to the dodge gate valve port; in case the situation that wafer drops occurs; send the stay off the feet family of power and influence's closed action of steering order, prevent that effectively the wafer that extremely causes because of transfer system between cavity in the PCVD board is damaged.
Further, above-mentioned PCVD board abnormality monitoring method also can comprise the Information generation abnormity notifying that falls to the dodge gate valve port according to wafer, and is sent to the step of default object.Default object can be the relating operation personnel, and after receiving abnormity notifying, the relating operation personnel can take counter-measure immediately, closes the board line correlation of going forward side by side and processes operation.
See also Fig. 4 and Fig. 1, the PCVD board of using above-mentioned PCVD board abnormality monitoring method abnormality monitoring system also is provided, comprise monitoring device 410 and treater (not shown).
Treater is connected with monitoring device 410 and the communication of PCVD board, be used for to receive wafer and falls to the information of dodge gate valve port, and send the steering order family of power and influence's closed action of staying off the feet.When mechanical arm fault or transmission combination miss appearred in the PCVD board, wafer fell to the dodge gate valve port.At this moment, treater Real-time Obtaining wafer falls to the information of dodge gate valve port.
Concrete, when wafer falls to the dodge gate valve port, wafer blocks the infrared signal that optic probe 412 is launched, receptor 414 can't receive infrared signal, treater obtains the infrared signal interrupting information, and obtains according to the infrared signal interrupting information information that wafer falls to the dodge gate valve port.Treater sends steering order by fall to the analysis of the information of dodge gate valve port to analyzing wafer, suspends the corresponding movable family of power and influence's closed action, in case clip broken the wafer that falls to the dodge gate valve port when should the activity family of power and influence closed.
If mechanical arm exists abnormal, can cause more wafer to drop, treater can send steering order and stopped the mechanical arm grasping movement this moment.Simultaneously, the scheme that also can take receptor 414 to be connected with the control loop of mechanical arm, in case infrared signal interrupts, mechanical arm stops relevant transmission work immediately.
In above-mentioned PCVD board abnormality monitoring system; by the movable family of power and influence between cavity is monitored; whether the Real-Time Monitoring wafer falls to the dodge gate valve port; in case the situation that wafer drops occurs; treater sends the stay off the feet family of power and influence's closed action of steering order immediately, prevents that effectively the wafer that extremely causes because of transfer system between cavity in the PCVD board is damaged.
Further, in above-mentioned PCVD board abnormality monitoring system, treater also is used for falling to the Information generation abnormity notifying of dodge gate valve port according to wafer, and is sent to default object.Default object can be the relating operation personnel, and after receiving abnormity notifying, the relating operation personnel can take counter-measure immediately, closes the board line correlation of going forward side by side and processes operation.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the scope of the claims of the present invention.Should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. a PCVD board abnormality monitoring method, is characterized in that, comprises the following steps:
The movable family of power and influence between cavity is monitored;
Obtain the information that wafer falls to the dodge gate valve port;
Send steering order and suspend described movable family of power and influence's closed action.
2. PCVD board abnormality monitoring method according to claim 1, is characterized in that, also comprises step:
Send steering order and stop the mechanical arm grasping movement.
3. PCVD board abnormality monitoring method according to claim 1, is characterized in that, also comprises step:
Fall to the Information generation abnormity notifying of described dodge gate valve port according to described wafer, and be sent to default object.
4. PCVD board abnormality monitoring method according to claim 1, is characterized in that, the described mode that the movable family of power and influence between cavity is monitored is optical monitoring.
5. PCVD board abnormality monitoring method according to claim 4, is characterized in that, described optical monitoring is specially: the dodge gate valve port is continued the emission infrared signal, and receive;
Describedly obtain the step that wafer falls to the information of dodge gate valve port and be specially:
Obtain the infrared signal interrupting information;
Obtain according to the infrared signal interrupting information information that wafer falls to described dodge gate valve port.
6. a PCVD board abnormality monitoring system, is characterized in that, comprising:
Monitoring device is used for the movable family of power and influence between cavity is monitored, and obtains the information that wafer falls to the dodge gate valve port;
Treater is connected with described monitoring device and the communication of described PCVD board, is used for receiving wafer and falls to the information of dodge gate valve port, and send steering order and suspend described movable family of power and influence's closed action.
7. PCVD board abnormality monitoring system according to claim 6, is characterized in that, described treater also is used for sending steering order and stops the mechanical arm grasping movement.
8. PCVD board abnormality monitoring system according to claim 6, is characterized in that, described treater also is used for falling to the Information generation abnormity notifying of described dodge gate valve port according to described wafer, and is sent to default object.
9. PCVD board abnormality monitoring system according to claim 6, is characterized in that, the mode that described monitoring device is monitored the movable family of power and influence between cavity is optical monitoring.
10. PCVD board abnormality monitoring system according to claim 9, is characterized in that, described monitoring device comprises:
Optic probe is used for the dodge gate valve port is continued the emission infrared signal; And
Receptor is used for receiving the infrared signal that optic probe is launched;
Wherein, described treater is connected with described receptor communication; When wafer fell to described dodge gate valve port, wafer blocked infrared signal, and receptor can't receive infrared signal; Treater obtains the infrared signal interrupting information, and obtains according to the infrared signal interrupting information information that wafer falls to described dodge gate valve port.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210137666.2A CN103382552B (en) | 2012-05-04 | 2012-05-04 | PCVD board abnormality monitoring method and system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210137666.2A CN103382552B (en) | 2012-05-04 | 2012-05-04 | PCVD board abnormality monitoring method and system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103382552A true CN103382552A (en) | 2013-11-06 |
| CN103382552B CN103382552B (en) | 2015-08-19 |
Family
ID=49490472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210137666.2A Active CN103382552B (en) | 2012-05-04 | 2012-05-04 | PCVD board abnormality monitoring method and system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103382552B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105405800A (en) * | 2014-06-16 | 2016-03-16 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Semiconductor processing equipment |
| CN105441887A (en) * | 2014-06-13 | 2016-03-30 | 北大方正集团有限公司 | Magnetron sputtering device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101469418A (en) * | 2007-12-29 | 2009-07-01 | 沈阳中科博微自动化技术有限公司 | Control method for plasma reinforced chemical meteorology deposition apparatus |
| CN101477961A (en) * | 2008-01-03 | 2009-07-08 | 京元电子股份有限公司 | Wafer raising platform and wafer test machine |
| WO2009099776A1 (en) * | 2008-01-31 | 2009-08-13 | Applied Materials, Inc. | Closed loop mocvd deposition control |
| CN101640166A (en) * | 2008-08-01 | 2010-02-03 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Substrate transmission device and control system and control method thereof |
-
2012
- 2012-05-04 CN CN201210137666.2A patent/CN103382552B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101469418A (en) * | 2007-12-29 | 2009-07-01 | 沈阳中科博微自动化技术有限公司 | Control method for plasma reinforced chemical meteorology deposition apparatus |
| CN101477961A (en) * | 2008-01-03 | 2009-07-08 | 京元电子股份有限公司 | Wafer raising platform and wafer test machine |
| WO2009099776A1 (en) * | 2008-01-31 | 2009-08-13 | Applied Materials, Inc. | Closed loop mocvd deposition control |
| CN101640166A (en) * | 2008-08-01 | 2010-02-03 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Substrate transmission device and control system and control method thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105441887A (en) * | 2014-06-13 | 2016-03-30 | 北大方正集团有限公司 | Magnetron sputtering device |
| CN105405800A (en) * | 2014-06-16 | 2016-03-16 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Semiconductor processing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103382552B (en) | 2015-08-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1900353B (en) | Evacuable magnetron chamber | |
| WO2011084010A3 (en) | Method for performing offline indication of machine type communication device in mobile communication system | |
| CN106531658B (en) | Pressure control method and device | |
| CN103382552A (en) | Monitoring method and system for abnormity of plasma chemical vapor deposition machine | |
| CN103077588A (en) | Gas leakage alarm monitoring device | |
| CN102679495A (en) | Compensation starting method of air conditioner | |
| US20120024394A1 (en) | Method for lowering the pressure in a load lock and associated equipment | |
| CN105304520A (en) | Wafer scheduling method and system | |
| SG178374A1 (en) | Methods and arrangement for detecting a wafer-released event within a plasma processing chamber | |
| KR20100060513A (en) | Equipment for manufacturing display having pressure leak monitoring unit | |
| CN205207878U (en) | Anticollision family of power and influence | |
| CN106036360A (en) | On-line and real-time monitoring electrostatic thawing cabinet | |
| CN106483922A (en) | A kind of vacuum monitoring system for superconducting tokamak device | |
| CN203398091U (en) | Manipulator for taking slices in production of silicon slices | |
| CN102207410A (en) | Temperature and flow monitoring device for condensate water discharged from steam drain valve | |
| CN107591344A (en) | Process chamber atmosphere detection method and wafer fab | |
| CN103426789A (en) | Device capable of detecting leakage state of adaptive pressure controller | |
| CN109946546A (en) | A kind of the degradation system and method for excessive heating protection of photoelectrical coupler | |
| CN102019134A (en) | Tail gas treatment device | |
| CN206313916U (en) | A kind of meeting-place wireless supervisory control system | |
| CN110561429A (en) | manipulator collision protection detection method and system and lower computer | |
| CN209401595U (en) | Semiconductor equipment | |
| CN104948465A (en) | Dry pump sharing treatment method and system | |
| CN204627757U (en) | A kind of double blocking on combustion gas blow line and discharge technology system | |
| CN104213187B (en) | A kind of vacuum detecting protection device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |