CN103361634A - Gas inlet device - Google Patents
Gas inlet device Download PDFInfo
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- CN103361634A CN103361634A CN2013103306300A CN201310330630A CN103361634A CN 103361634 A CN103361634 A CN 103361634A CN 2013103306300 A CN2013103306300 A CN 2013103306300A CN 201310330630 A CN201310330630 A CN 201310330630A CN 103361634 A CN103361634 A CN 103361634A
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Abstract
The invention discloses a gas inlet device. The gas inlet device comprises a first gas chamber and a second gas chamber. The first gas chamber is located under the second gas chamber. The first gas chamber is communicated with first gas channels. The first gas channels are used to convey reaction gas from the first gas chamber to a reaction zone. The second gas chamber is communicated with second gas channels. The second gas channels are used to convey reaction gas from the second gas chamber to the reaction zone. At least one second gas channel is arranged in each first gas channel and goes through a gas outlet surface. The cross-section, of each first gas channel, parallel to the gas outlet surface is rounded, strip-shaped and fan-shaped. By employing the structures, preparation difficulty can be reduced obviously, and occurrence of situations such as stoppage of particles generated from a pre-reaction and the like can be reduced effectively.
Description
Technical field
The present invention relates to semi-conductor device technology field, particularly a kind of diffuser.
Background technology
The chemical vapour deposition for example basic process of growth of Metalorganic chemical vapor deposition (MOCVD) technique is, reactant gases is introduced reaction chamber from source of the gas by diffuser, utilization is with the substrate initiating chamical reaction of heater heats, thereby generates monocrystalline or polycrystal film at substrate.
At present, a plurality of the first gas passages and the second gas passage are set on the existing diffuser, are used for reactant gases evenly is delivered to the semiconducter substrate of below.Please refer to Fig. 1, the employing of the gas passage of existing diffuser be the structure of " 4 bag 1 ", namely 4 the first gas passages 1 surround second gas passage 2, and 4 the second gas passages 2 surround first gas passage 1.Described the first gas passage 1 is used for flowing through the first reactant gases, and described the second gas passage 2 is used for flowing through the second reactant gases.
In order to guarantee the homogeneity of reactant gases, need up to ten thousand apertures (i.e. the first gas passage and the second gas passage) on the existing diffuser, so the gas passage dense arrangement, this just causes the processing and manufacturing of diffuser very difficult.And, because the first reactant gases and the second reactant gases namely mix leaving diffuser, pre-reaction can occur, the pre-reaction product easily is deposited in the diffuser surface, causes particle contaminant, has also reduced on the other hand the utilization ratio of reactant gases.
Therefore, present diffuser is also unreasonable, need to improve it.
Summary of the invention
The object of the present invention is to provide a kind of diffuser, to solve the problem that the intensive and easy generation of the gas passage on the diffuser is polluted in the prior art.
For solving the problems of the technologies described above, the invention provides a kind of diffuser, be used for MOCVD technique, to provide reactant gases to conversion zone, described diffuser is the face of giving vent to anger towards the one side of conversion zone; Comprise the first gas chamber and the second gas chamber, described the first gas chamber is positioned at the second gas chamber below, described the first gas chamber is connected with the first gas passage, described the first gas passage is used for and will be delivered to conversion zone from the reactant gases of the first gas chamber, described the second gas chamber is connected with the second gas passage, described the second gas passage is used for and will be delivered to conversion zone from the reactant gases of the second gas chamber, at least be provided with described second gas passage in each described first gas passage and run through the described face of giving vent to anger, the cross-sectional shape along the parallel described face of giving vent to anger of described the first gas passage is circle, bar shaped or fan-shaped.
Optionally, for described diffuser, described diffuser comprises base plate, clamping plate and the top board that stacks gradually also interval setting, the one side towards described conversion zone of described base plate is the described face of giving vent to anger, described the second gas chamber is between described top board and clamping plate, described the first gas chamber is between described base plate and clamping plate, and described the first gas passage and the second gas passage pass described base plate.
Optionally, for described diffuser, the production well of described the first gas passage is outwards arranged radially along the center on the surface of orientating reaction zone one side of described base plate, is provided with a plurality of the second gas passages in described the first gas passage.
Optionally, for described diffuser, in each first gas passage, the quantity of described the second gas passage outwards increases along radial direction from the center of the described face of giving vent to anger.
Optionally, for described diffuser, described the second gas passage is fixedly connected with described base plate.
Optionally, for described diffuser, have the shielding gas passage between described the first gas passage and the second gas passage, described shielding gas passage is used for providing shielding gas.
Optionally, for described diffuser, described the second gas passage be shaped as round shape or ellipse tubular.
Optionally, for described diffuser, described the first gas passage passes into different reactant gasess from described the second gas passage, and described the first gas passage is used for passing into V family gas, and described the second gas passage is used for passing into III family gas.
Optionally, for described diffuser, the air outlet of described the second gas passage is lower than the air outlet of described the first gas passage.
Optionally, for described diffuser, the material of described the first gas passage and described the second gas passage is pottery or stainless steel.
Diffuser provided by the invention, described diffuser is arranged on the second gas passage in the first gas passage, so changed the first gas passage and the second gas passage the size and arrange, " 4 bag 1 " structure compared to existing technology, so that manufacture difficulty has had obvious reduction, also can effectively reduce the generation of the situations such as particle plugging that produce owing to pre-reaction.
Further optimize, diffuser of the present invention by to the shape of described the first gas passage, quantity and to the arranging and the control of quantity of the second gas passage, can obtain best airflow field distribution situation, has improved quality of forming film.
Further optimize; diffuser of the present invention; between described the first gas passage and the second gas passage, be provided with the shielding gas passage; be connected with shielding gas in the described shielding gas passage; and the air outlet of described the second gas passage is lower than the air outlet of described the first gas passage, can prevent even avoid the premature reaction of reactant gases, avoided formation and the accumulation of particle; be conducive to improve the utilization ratio of gas, avoid waste.
Description of drawings
Fig. 1 is the structural representation of the diffuser of prior art;
Fig. 2 is the structural representation of the diffuser of one embodiment of the invention;
Fig. 3 is the elevational schematic view of diffuser embodiment illustrated in fig. 2;
Fig. 4 is the schematic diagram after diffuser embodiment illustrated in fig. 2 is optimized;
Fig. 5 is the elevational schematic view of the diffuser of another embodiment of the present invention;
Fig. 6 is the elevational schematic view of the diffuser of further embodiment of this invention.
Embodiment
Below in conjunction with schematic diagram diffuser of the present invention is described in more detail, has wherein represented the preferred embodiments of the present invention, should be appreciated that those skilled in the art can revise the present invention described here, and still realize advantageous effects of the present invention.Therefore, following description is appreciated that extensively knowing for those skilled in the art, and not as limitation of the present invention.
For clear, whole features of practical embodiments are not described.In the following description, be not described in detail known function and structure, the confusion because they can make the present invention owing to unnecessary details.Will be understood that in the exploitation of any practical embodiments, must make a large amount of implementation details to realize developer's specific objective, for example according to relevant system or relevant commercial restriction, change into another embodiment by an embodiment.In addition, will be understood that this development may be complicated and time-consuming, but only be routine work to those skilled in the art.
In the following passage, with way of example the present invention is described more specifically with reference to accompanying drawing.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-accurately ratio, only in order to convenient, the purpose of the aid illustration embodiment of the invention lucidly.
Core concept of the present invention is, the invention provides a kind of diffuser, so that different gas passages combines with mutually nested form, thereby reduce the quantity of a part of gas passage, so that manufacture difficulty has had obvious reduction, also can effectively reduce the generation of the situations such as particle plugging that produce owing to pre-reaction.
Based on this thought, please refer to Fig. 2 and Fig. 3, one embodiment of the invention provides a kind of diffuser, is used for MOCVD technique, and to provide reactant gases to conversion zone, described diffuser is the face of giving vent to anger towards the one side of conversion zone; Described diffuser mainly comprises the first gas chamber 10 and the second gas chamber 11, described the first gas chamber 10 is positioned at the second gas chamber 11 belows, described the first gas chamber 10 is connected with the first gas passage 1, described the first gas passage 1 is used for and will be delivered to conversion zone from the reactant gases of the first gas chamber 10, described the second gas chamber 11 is connected with the second gas passage 2, described the second gas passage 2 is used for and will be delivered to conversion zone from the reactant gases of the second gas chamber 11, is provided with at least described second gas passage 2 in each described first gas passage 1 and runs through the described face of giving vent to anger.
Concrete, described diffuser comprises base plate 20, clamping plate (being the first clamping plate 21 and the second clamping plate 22 in the present embodiment) and the top board 23 that stacks gradually also interval setting, described base plate 20 is the described face of giving vent to anger towards the one side of described conversion zone, described the second gas chamber 11 is between described top board 23 and the second clamping plate 22, described the second gas passage 2 passes described the second clamping plate 22, the first clamping plate 21 and base plate 20, so that the reactant gases in the second gas chamber 11 is sent to conversion zone.Described the first gas chamber 10 is between described base plate 20 and the first clamping plate 21, and described the first gas passage 1 passes described base plate 20, so that the reactant gases in the first gas chamber 10 is sent to conversion zone.Preferably, described the first gas passage 1 is for running through the tracheae of described base plate 20, and perhaps, described the first gas passage 1 can be the through hole in the described base plate 20.In the present embodiment, described the first gas passage 1 is for being formed at the through hole in the described base plate 20.Described the second gas passage 2 is fixedly connected with described base plate 20, preferably, described the second gas passage 2 passes a flat board with vesicular structure, described flat board is fixed in described base plate towards the one side of the first gas chamber 10, thereby so that described the second gas passage 2 keeps fixing, avoid occuring the situations such as swing, cause air-flow unstable.
As seen from Figure 2, also be formed with a cooling chamber 12 between described the first clamping plate 21 and the second clamping plate 22, preferably, described cooling chamber 12 is the cooling by water chamber, thereby so that the maintenance of the temperature of described the first gas chamber 10 and the second gas chamber 11 is different, be in the needed temperature range to ensure the reactant gases in the first gas chamber 10 and the second gas chamber 11.
Preferably, pass into V family gas in described the first gas chamber 10, pass into III family gas in described the second gas chamber 11, thereby described the first gas passage 1 and the second gas passage 2 are introduced V family gas and III family gas respectively the conversion zone of described base plate 20 belows and are reacted.Common described V family gas is preferably ammonia (NH
3), described III family gas is MO gas, such as trimethyl-gallium etc.The consumption of described ammonia is more much bigger than the consumption of MO gas, and therefore, in order to improve the utilization ratio of gas, as shown in Figure 2, the air outlet of described the second gas passage 2 is lower than the air outlet of described the first gas passage 1.
As shown in Figure 3, for the ease of arranging and breathing freely, described the first gas passage 1 and the second gas passage 2 be shaped as round shape or ellipse tubular, described the first gas passage 1 number in the circumferential direction of the circle increases, shown in be provided with 3 described the second gas passages 2 in the first gas passage 1, in each first gas passage 1, the quantity of described the second gas passage 2 outwards increases along radial direction from the center of the described face of giving vent to anger.The quantity of described the first gas passage 1, the second gas passage 2 can have multiple ratio, is not limited to the quantity ratio such as the 1:3 of the present embodiment, for example is provided with 2 described the second gas passages 2 in described the first gas passage 1, or 4,6 etc.In addition, in some feasible embodiment, the quantity of described the second gas passage 2 that arranges in described the first gas passage 1 can be different, for example be provided with 3 described the second gas passages 2 in the first gas passage 1 in spray header is given vent to anger a part of location of face, and be provided with 2 described the second gas passages 2 in the first gas passage 1 in another part zone.The order of magnitude arrangement mode of described the first gas passage 1 and the second gas passage 2 can be according to different process requirements, according to the service condition to the reactant gases consumption, and the distribution situation etc. of air-flow in the real reaction process, obtain best arrangement mode, distribute thereby form best airflow field, improved quality of forming film.
Further; the consideration situation that gas just reacts when also not flowing out described the first gas passage 1 that may respond; thereby the problem such as result in blockage; the contriver has proposed prioritization scheme: have shielding gas passage 3 between described the first gas passage 1 and the second gas passage 2; described shielding gas passage 3 is used for providing shielding gas, to avoid the reactant gases premature reaction.As shown in Figure 4; can be that a described shielding gas passage 3 is nested in first gas passage 1; and surround a plurality of described the second gas passages 2, the shape of described shielding gas passage 3 is so that close being advisable of region area around each described the second gas passage 2.Described shielding gas passage 3 can also be corresponding one by one with described the second gas passage 2; described shielding gas passage 3 surrounds described the second gas passage 2 and does not contact with it; and be embedded in described the first gas passage 1; preferably; the shape of described shielding gas passage 3 also is round shape or ellipse tubular, and coaxial with described the second gas passage 2.
The material of described the first gas passage 1, described the second gas passage 2 and described shielding gas passage 3 is preferably pottery or stainless steel, to reduce as much as possible reactant gases to its erosion.
The below please refer to Fig. 5, and it is the elevational schematic view of the diffuser of another embodiment of the present invention, and the difference part of the present embodiment and a upper embodiment is, the shape difference of described the first gas passage 1.As shown in Figure 5, the cross-sectional shape along the parallel described face of giving vent to anger of described the first gas passage 1 is bar shaped, and this can reduce the quantity of described the first gas passage 1, so that make simply, and be not easy to be prematured by solids.The quantity of described the first gas passage 1 is not limited to such as 3 among Fig. 5, can be more, same, the quantity of described the second gas passage 2 and arrangement mode also can freely be selected, for example can be so that the quantity of described the second gas passage 2 outwards increases along radial direction from the center of the described face of giving vent to anger.
Other structures of diffuser in the present embodiment are identical or similar with a upper embodiment, can make reference, and do not do at this and give unnecessary details.
The below please refer to Fig. 6, and it is the elevational schematic view of the diffuser of further embodiment of this invention, and the difference part of the present embodiment and upper two embodiment is, the shape difference of described the first gas passage 1.As shown in Figure 6, the cross-sectional shape along the parallel described face of giving vent to anger of described the first gas passage 1 is fan-shaped, and the production well of described the first gas passage 1 is outwards arranged radially along the center on the surface of orientating reaction zone one side of described base plate 20.The quantity of described the second gas passage 2 outwards increases along radial direction from the center of the described face of giving vent to anger.Like this can either be so that make simple, and take full advantage of whole base plate 20, the MO gas that fringing effect causes can directly remedy on the structure again owing in the situation of base plate 20 edge's concentration deficiencies, and needn't deliberately calculate the distribution situation of described the second gas passage of arranging.
Same, the quantity of described the first gas passage can be not limited to as shown in Figure 64, can be for a plurality of, for example 3, the greater amts such as perhaps 5,7, and the angle of described sector structure also can be various, the angle of described the first gas passage, the second gas passage and described the first gas passage should according in the actual process process to reactant gases and form the synthetic setting that requires of rete, to obtain best effect.
Other structures of diffuser in the present embodiment are identical or similar with a upper embodiment, can make reference, and do not do at this and give unnecessary details.
In sum, diffuser provided by the invention, described diffuser is arranged on the second gas passage in the first gas passage, so changed the first gas passage and the second gas passage the size and arrange, " 4 bag 1 " structure compared to existing technology, so that manufacture difficulty has had obvious reduction, also can effectively reduce the generation of the situations such as particle plugging that produce owing to pre-reaction.
Further optimize, diffuser of the present invention by to the shape of described the first gas passage, quantity and to the arranging and the control of quantity of the second gas passage, can obtain best airflow field distribution situation, has improved quality of forming film.
Further optimize; diffuser of the present invention; between described the first gas passage and the second gas passage, be provided with the shielding gas passage; be connected with shielding gas in the described shielding gas passage; and the air outlet of described the second gas passage is lower than the air outlet of described the first gas passage, can prevent even avoid the premature reaction of reactant gases, avoided formation and the accumulation of particle; be conducive to improve the utilization ratio of gas, avoid waste.
Obviously, those skilled in the art can carry out various changes and modification to invention and not break away from the spirit and scope of the present invention.Like this, if of the present invention these revise and modification belongs within the scope of claim of the present invention and equivalent technologies thereof, then the present invention also is intended to comprise these change and modification.
Claims (10)
1. a diffuser is used for MOCVD technique, and to provide reactant gases to conversion zone, described diffuser is the face of giving vent to anger towards the one side of conversion zone; It is characterized in that, comprise the first gas chamber and the second gas chamber, described the first gas chamber is positioned at the second gas chamber below, described the first gas chamber is connected with the first gas passage, described the first gas passage is used for and will be delivered to conversion zone from the reactant gases of the first gas chamber, described the second gas chamber is connected with the second gas passage, described the second gas passage is used for and will be delivered to conversion zone from the reactant gases of the second gas chamber, at least be provided with described second gas passage in each described first gas passage and run through the described face of giving vent to anger, the cross-sectional shape along the parallel described face of giving vent to anger of described the first gas passage is circle, bar shaped or fan-shaped.
2. diffuser as claimed in claim 1, it is characterized in that, described diffuser comprises base plate, clamping plate and the top board that stacks gradually also interval setting, the one side towards described conversion zone of described base plate is the described face of giving vent to anger, described the second gas chamber is between described top board and clamping plate, described the first gas chamber is between described base plate and clamping plate, and described the first gas passage and the second gas passage pass described base plate.
3. diffuser as claimed in claim 2, it is characterized in that, the production well of described the first gas passage is outwards arranged radially along the center on the surface of orientating reaction zone one side of described base plate, is provided with a plurality of the second gas passages in described the first gas passage.
4. diffuser as claimed in claim 2 is characterized in that, in each first gas passage, the quantity of described the second gas passage outwards increases along radial direction from the center of the described face of giving vent to anger.
5. diffuser as claimed in claim 2 is characterized in that, described the second gas passage is fixedly connected with described base plate.
6. diffuser as claimed in claim 1 is characterized in that, has the shielding gas passage between described the first gas passage and the second gas passage, and described shielding gas passage is used for providing shielding gas.
7. diffuser as claimed in claim 1 is characterized in that, described the second gas passage be shaped as round shape or ellipse tubular.
8. diffuser as claimed in claim 1 is characterized in that, described the first gas passage is used for passing into V family gas, and described the second gas passage is used for passing into III family gas.
9. diffuser as claimed in claim 8 is characterized in that, the air outlet of described the second gas passage is lower than the air outlet of described the first gas passage.
10. diffuser as claimed in claim 1 is characterized in that, the material of described the first gas passage and described the second gas passage is pottery or stainless steel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013103306300A CN103361634A (en) | 2013-07-31 | 2013-07-31 | Gas inlet device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013103306300A CN103361634A (en) | 2013-07-31 | 2013-07-31 | Gas inlet device |
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| CN103361634A true CN103361634A (en) | 2013-10-23 |
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| CN2013103306300A Pending CN103361634A (en) | 2013-07-31 | 2013-07-31 | Gas inlet device |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102230165A (en) * | 2011-06-16 | 2011-11-02 | 中国科学院苏州纳米技术与纳米仿生研究所 | Spray header structure for chemical vapor deposition epitaxial equipment |
| CN102230166A (en) * | 2011-07-06 | 2011-11-02 | 刘军林 | Double-layer gas inlet shower nozzle device of MOCVD (Metal Organic Chemical Vapor Deposition) equipment |
| CN202090055U (en) * | 2011-04-29 | 2011-12-28 | 中微半导体设备(上海)有限公司 | Gas delivery device and reactor employing same |
| CN102691051A (en) * | 2012-06-18 | 2012-09-26 | 杭州士兰明芯科技有限公司 | Spray head of MOCVD (metal organic chemical vapor deposition) equipment reactor and connection structure thereof |
-
2013
- 2013-07-31 CN CN2013103306300A patent/CN103361634A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202090055U (en) * | 2011-04-29 | 2011-12-28 | 中微半导体设备(上海)有限公司 | Gas delivery device and reactor employing same |
| CN102230165A (en) * | 2011-06-16 | 2011-11-02 | 中国科学院苏州纳米技术与纳米仿生研究所 | Spray header structure for chemical vapor deposition epitaxial equipment |
| CN102230166A (en) * | 2011-07-06 | 2011-11-02 | 刘军林 | Double-layer gas inlet shower nozzle device of MOCVD (Metal Organic Chemical Vapor Deposition) equipment |
| CN102691051A (en) * | 2012-06-18 | 2012-09-26 | 杭州士兰明芯科技有限公司 | Spray head of MOCVD (metal organic chemical vapor deposition) equipment reactor and connection structure thereof |
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Application publication date: 20131023 |