CN103352246A - Polishing device and method for stent - Google Patents
Polishing device and method for stent Download PDFInfo
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- CN103352246A CN103352246A CN2013102726437A CN201310272643A CN103352246A CN 103352246 A CN103352246 A CN 103352246A CN 2013102726437 A CN2013102726437 A CN 2013102726437A CN 201310272643 A CN201310272643 A CN 201310272643A CN 103352246 A CN103352246 A CN 103352246A
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Abstract
The invention provides a polishing device and a polishing method for a stent in electrochemical polishing, which belongs to the field of medical stents. The polishing device comprises a metal electrode and a cathode arranged in an electrolyte and further comprises a connecting part and an extension part, wherein the connecting part is used for connecting a to-be-polished stent to the metal electrode so as to form an anode, and the extension part comprises two metal tubes which are respectively arranged at two ends of the to-be-polished stent to increase the length of the anode in the process of electrochemical polishing. According to embodiments in the invention, the problem of flatness of the end of a stent during polishing of the stent is effectively improved, and integral polishing uniformity of the stent is enhanced. A technical scheme in the invention is applicable to a system using an electrochemical approach for polishing of stents.
Description
Technical field
The present invention relates to the Medical rack field, particularly support burnishing device and the finishing method in a kind of electrochemical etching.
Background technology
Expect the year two thousand twenty, because the cardiovascular disorder death toll will account for 50% of global death toll, reached for 2,500 ten thousand people/years.And in treating cardiovascular disease, intervention support treatment be solve cardiovascular narrow, improve patient's chances of survival, improve the effective ways of quality of life of patients and survival time.But the principal element that affects support and blood compatibility is the surfaceness of support.The roughness of support is larger, and the area that is exposed in the blood is larger, and the possibility of blood coagulation is larger.
The support finishing method can reduce the roughness of support, and what usually adopt at present is electrochemical polishing method.Electrochemical polishing method is in the polishing process of support, and On current is put other metallic substance as the polishing negative electrode as the electrolytic process anode on the support in electrolytic solution, and the polishing negative electrode generally is in the far-end of electrolyzer.In polishing process, utilize electrolytic solution as the polishing ionophore, remove the comparatively coarse metal level of rack surface one deck.With respect to the metal machining method, electrochemical etching is more even, and material surface is also more mellow and fuller.So the electrochemical etching process is to make one of important component part in the support technological process.
Prior art is in the process of using electrochemical polishing method polishing support, and the current distributions in the electrolytic solution as shown in Figure 1.At the middle portion of support, distribution of current is relatively even.In the end of support, electric current shrinks fast owing to will form necessary loop, has formed the situation that most advanced and sophisticated current density sharply raises.And in the electrochemical etching process, the size of the speed that metal ion leaves metallic matrix and polishing electric current, being distributed with important relation: electric current is large, and then the polished speed of material is also large.In support polishing process as shown in Figure 1, although used constant input polishing electric current, but because end current concentration effect is so that the bracket end current density is higher than other position, and then cause that the bracket end polishing speed is faster than the phenomenon of the polishing speed of mid-stent.On the other hand, because bracket end is the position of curvature less, its forming process is just so that there is the shaping stress greater than other position this position.This part stress can discharge under the effect of electric current in advance, and then accelerates the polishing dissolution process of bracket end.Therefore, cause and aggravated the appearance of bracket end " tack " phenomenon.And in case appearance " tack " then can have a strong impact on the safety in utilization of support, so in normal the production, the support of " tack " will appear as waste product.
Summary of the invention
The technical problem to be solved in the present invention provides support burnishing device and the finishing method in a kind of electrochemical etching, can effectively improve the partially flat problem of bracket end that causes in the support polishing process, improves the whole polishing uniformity of support.
For solving the problems of the technologies described above, embodiments of the invention provide technical scheme as follows:
On the one hand, provide the burnishing device of the support in a kind of electrochemical etching, comprise metal electrode and the negative electrode that is arranged in the electrolytic solution, also comprise:
Connection section, be used for polished support be connected metal electrode and connect to form anode;
The extension comprises two metal tubes, is separately positioned on the two ends of described polished support, is used for increasing in the electrochemical etching process length of described anode.
Wherein, described connection section is a mandrel, and described metal tube, polished support and described metal electrode be all take described mandrel as axle, coaxial being installed on the described mandrel.
Wherein, described device also comprises:
One is used for holding the electrolyzer of electrolytic solution.
Wherein, described device also comprises:
Dead ring take described mandrel as axle, is installed between described metal electrode and the described metal tube.
Wherein, described device also comprises:
The polishing sponge contacts with the outside surface of described polished support.
Wherein, described device also comprises:
Cantilever is connected with described connection section, is used for controlling the outside surface of described polished support with respect to the spin friction of described polishing sponge in the electrochemical etching process.
Wherein, the length of described metal tube is 1mm-25mm, and the distance between described metal tube and the described polished support is 0.5mm-10mm.
Wherein, the length of described dead ring is 1mm-50mm.
The embodiment of the invention also provides the finishing method of the support in a kind of electrochemical etching, is applied to the polished support as anode in the electrolytic solution is polished, and described polished support and a metal electrode are connected to form anode, comprising:
Described polished support is carried out electropolishing, wherein, in polishing process, utilize the metal tube that sets in advance at the two ends of described polished support, increase the length of described anode.
Wherein, be separated with a segment distance between described metal tube and the described polished support, and described metal tube is installed on the same mandrel with described polished support is coaxial.
Wherein, describedly described polishing support carried out electropolishing comprise:
To polish sponge and be fixed on and put into electrolytic solution on the substrate, making the angle of described polishing sponge and horizontal direction is 20 °-80 °;
The metal electrode that is fixed on the described mandrel is connected with a cantilever, controls described cantilever and move up and down, make described polished support do the diagonal movement of equal angular along the inclination angle of described polishing sponge, be rotated friction with described polishing sponge.
Wherein, describedly described polishing support carried out electropolishing comprise:
The metal electrode that is fixed on the described mandrel is connected with a cantilever, and fixing described cantilever is immersed in the electrolytic solution described polished support;
To polish sponge and be fixed on and put into electrolytic solution on the substrate, making the angle of described polishing sponge and horizontal direction is 20 °-80 °, and controls described polishing sponge and move reciprocatingly along this angle, is rotated friction with described polishing sponge.
Embodiments of the invention have following beneficial effect:
In the such scheme, metal tube is placed at two ends at polished support, so that in the process that adopts electrochemical method to polish, the physical length of anode has obtained lengthening, the uniform current distributed areas also increase relatively, the uniform zone of electric current can cover whole polished support effectively, reaches thus the purpose that solves bracket end " tack " problem, improves support quality product and yield rate.
Description of drawings
Fig. 1 is distribution of current synoptic diagram in the prior art polishing process;
Fig. 2 is the structural representation of embodiment of the invention support burnishing device;
Fig. 3 is another structural representation of embodiment of the invention support burnishing device;
Fig. 4 is the schematic flow sheet of embodiment of the invention support finishing method;
Fig. 5 is distribution of current synoptic diagram in the embodiment of the invention polishing process;
Fig. 6 is embodiment of the invention Polishing Motion structural scheme of mechanism;
Fig. 7 is branched polishing of the single groove of embodiment of the invention structural representation;
Fig. 8 is branched polishing of embodiment of the invention multiple-grooved structural representation;
Fig. 9 is the effect synoptic diagram that utilizes prior art that support is polished;
Figure 10 is the effect synoptic diagram that the embodiment of the invention is polished support.
Embodiment
For technical problem, technical scheme and advantage that embodiments of the invention will be solved is clearer, be described in detail below in conjunction with the accompanying drawings and the specific embodiments.
The problem of " tack " phenomenon appears in embodiments of the invention for prior art medium-height trestle end, support burnishing device and finishing method in a kind of electrochemical etching are provided, can effectively improve the partially flat problem of bracket end that causes in the support polishing process, improve the whole polishing uniformity of support.
The embodiment of the invention provides the burnishing device of the support in a kind of electrochemical etching, and as shown in Figure 2, present embodiment comprises metal electrode 21 and the negative electrode that is arranged in the electrolytic solution, also comprises:
Connection section 26 connects to form anode for polished support is connected with metal electrode;
Extension 22 comprises two metal tubes, is separately positioned on the two ends of polished support 23, is used for increasing in the electrochemical etching process length of anode, and polished support 23 is under the uniform current distributed areas.
Wherein, connection section 26 is a mandrel, and metal tube 22, polished support 23 and metal electrode 21 be all take mandrel 26 as axle, coaxial being installed on the mandrel 26.
Further, this device also comprises:
One is used for holding the electrolyzer of electrolytic solution.
Further, as shown in Figure 3, present embodiment can also comprise:
Dead ring 24 take mandrel 26 as axle, is installed between metal electrode 21 and the metal tube 22, is used for isolated metal tube 22 and metal electrode 21, avoids metal tube 22 to contact with metal electrode 21 and produces electrical spark.
Further, as shown in Figure 3, present embodiment can also comprise:
Polishing sponge 25 contacts with the outside surface of polished support 23.
Further, present embodiment can also comprise:
Cantilever is connected with connection section 26, is used for controlling the outside surface of polished support 23 with respect to 25 spin frictions of polishing sponge in the electrochemical etching process.
Wherein, the length of metal tube 22 can be 1mm-25mm, and the distance between metal tube 22 and the polished support 23 can be 0.5mm-10mm.
Further, the length of dead ring 24 can be 1mm-50mm.
The support burnishing device of present embodiment, metal tube is placed at two ends at polished support, so that in the process that adopts electrochemical method to polish, the physical length of anode has obtained lengthening, the uniform current distributed areas also increase relatively, the uniform zone of electric current can cover whole polished support effectively, reaches thus the purpose that solves bracket end " tack " problem, improves support quality product and yield rate.And between metal tube and metal electrode, dead ring is set, can effectively avoids contact electricity spark phenomenon and contact friction phenomenon.
The embodiment of the invention also provides the finishing method of the support in a kind of electrochemical etching, is applied to the polished support as anode in the electrolytic solution is polished, and as shown in Figure 4, present embodiment comprises:
Polished support is carried out electropolishing, wherein, in polishing process, utilize the metal tube that sets in advance at the two ends of polished support, increase the length of anode.
The below further introduces the support finishing method of present embodiment, and as shown in Figure 4, present embodiment comprises:
Step 401: metal electrode, metal tube and polished support are fixed on the same mandrel, make metal tube lay respectively at the two ends of polished support;
Successively metal electrode, metal tube, polished support, metal tube, metal electrode are fixed on the same mandrel, be separated with a segment distance between metal electrode and the metal tube, be separated with a segment distance between metal tube and the polished support, dead ring can also be fixed between metal electrode and the metal tube;
Step 402: metal tube and polished support are put into electrolytic solution;
Step 403: the energising metal electrode, make electric current import metal tube and polished support by mandrel, the polishing support is carried out electrochemical etching.
Metal tube and polished support utilize electrolytic solution as the polishing ionophore as the anode in the electrolytic process, remove the comparatively coarse metal level of rack surface one deck.
Present embodiment can be fixed on the polishing sponge and put into electrolytic solution on the substrate, making the angle of polishing sponge and horizontal direction is 20 °-80 °, metal electrode is connected with a cantilever, the control cantilever moves up and down, make polished support do the diagonal movement of equal angular along the inclination angle of polishing sponge, be rotated friction with the polishing sponge, can be rotated polishing to polished support like this, improve the uniformity coefficient of support polishing.
The support finishing method of present embodiment, metal tube is placed at two ends at polished support, so that in the process that adopts electrochemical method to polish, the physical length of anode has obtained lengthening, the uniform current distributed areas also increase relatively, the uniform zone of electric current can cover whole polished support effectively, reaches thus the purpose that solves bracket end " tack " problem, improves support quality product and yield rate.Present embodiment can also arrange dead ring between metal tube and metal electrode, can effectively avoid contact electricity spark phenomenon and contact friction phenomenon.
The below further introduces support burnishing device and the support finishing method of present embodiment.
As shown in Figure 3, present embodiment is placed respectively two metal tubes 22 at the two ends of polished support 23, this metal tube 22 can be identical with polished stent diameter, metal tube 22 can be the cochrome metallic substance identical with support 23 itself, also can be than cochrome reactivity better metal such as magnesium and magnesium alloy materials etc., but to avoid this metallic substance that support 23 is polluted.The length of this metal tube 22 can be 1mm～25mm, produces friction in order to prevent metal tube 22 and support 23 in polishing process, should be at intervals between metal tube 22 and the support 23, and the spacing size can be 0.5mm～10mm.After having placed metal tube 22 at support 23 two ends, the physical length of polishing process Anodic has obtained lengthening, as shown in Figure 5, the uniform current distributed areas also increase relatively, the part of current concentration then appears at the end of metal tube 22, the uniform zone of electric current can cover whole polished support 23 effectively, can solve thus the problem that " tack " appears in support 23 ends.
In the polishing process, electric current imports to metal tube 22 and support 23 by metal electrode 21, if metal tube 22 contacts with metal electrode 21, will produce the contact electricity spark, if metal tube 22 contacts with support 23, friction can bump when producing the contact electricity spark, and then the quality of finish of reduction support 23, therefore, between metal electrode 21 and metal tube 22, place dead ring 24, length is controlled between 1mm～50mm; Simultaneously metal tube 22 is fixed on the end of dead ring 24.Dead ring 24 also is fixed processing with metal electrode 21.Meanwhile, place polishing sponge 25 at the outside surface of support 23, its role is to except the position of fixed support 23, can also in polishing process, provide spin friction for support 23, thereby realize the rotary finishing of support, reach the uniform effect of the whole polishing of support, can said structure be together in series by a mandrel 26, realize coaxial.
In polishing process, also to select different polishing work electric currents according to the length of polished support 23, the size of polishing work electric current is controlled between 50mA～80A, polishing time then according to the controlling factors such as size, stent length of polishing electric current between 5s～1200s.Just can effectively avoid contact electricity spark phenomenon and contact friction phenomenon by aforesaid method, reduce bracket end " tack " phenomenon, improve support quality product and yield rate.
In order further to improve the quality of finish of support, improve the inhomogeneous phenomenon of the whole polishing of support and need to use the rotary finishing mode, as shown in Figure 6, support 23, dead ring 24 and metal tube 22 are fixed on the mandrel 26 simultaneously, mandrel 26 is linked to each other with metal electrode 21, and metal electrode 21 and cantilever 28 coupled together, cantilever 28 can carry out moving up and down of vertical direction, polishing sponge 25 is fixed on the substrate 27, according to the selected different polishing sponge of the length needs of different support and the width of substrate.In the present embodiment, the width of polishing sponge can be 5mm～90mm, and the width of substrate can be 10mm～150mm.With the polishing sponge 25 that fixes and substrate 27 to be placed in the electrolytic solution with the angle of horizontal direction angle as 20 °-80 °, simultaneously this structure is placed on the path that support 23 moves up and down, after support 23 touches polishing sponge 25, can make along the inclination angle of polishing sponge 25 diagonal movement of equal angular.At this moment, support integral body is immersed in the polishing electrolytic solution fully, and the move distance of cantilever 28 is take the upper limbs of support 23 contact polishing sponges 25 as the upper limit, and lower limit can be regulated as required, and the difference of lower limit and the upper limit is controlled between 5mm～400mm.After this, can by the upper and lower to-and-fro movement of cantilever 28, by the slight friction of polishing sponge, realize the selection polishing of support.The cantilever movement rate can be controlled between 2mm/s～300mm/s.In addition, also can cantilever mounted 28 in polishing process, and allow structure that polishing sponge 25 and substrate 27 form along with the horizontal direction angle be that 20 °-80 ° angle moves reciprocatingly, move distance is consistent with the cantilever move distance, can realize equally the rotary finishing of support, improve the uniformity coefficient of support polishing.
In order to improve the adsorptive power of cathode ion in the electrochemical etching process, need to provide a controlled polishing electric current that can be interrupted, periodic according to the variation of the factors such as the size of polishing electric current, stent length, total polishing time.Usually, the variation range of this polishing power frequency is between 0.2s～20s.In addition, in order to guarantee the support polishing effect, improve the steady operation ability of electrolytic solution, can also in electrolytic solution, put constant temperature water-bath water case, this water-bath water tank can be stabilized in the working temperature of electrolytic solution between 35deg～85deg, and the selection of temperature can be regulated according to situations such as real work electric currents.
In order to improve the production efficiency of support polishing, as shown in Figure 7, present embodiment can be put at least 2 pack support burnishing devices simultaneously in polishing electrolyzer 29, namely placed at least 2 polished supports in an electrolyzer.In addition, as shown in Figure 8, present embodiment can also be placed at least 2 electrolyzers 29 in a polishing unit 210.Like this, after fixing support and adjusting polishing unit working parameter, can carry out simultaneously at least polishing of A * B support, wherein A represents the support number of placing in the polishing electrolyzer, B represents a polishing trough number in the polishing unit, thereby improved the production efficiency of polishing support, and the quality of finish with batch polishing support is consistent.
Polishing effect below in conjunction with specific embodiment explanation support burnishing device of the present invention and support finishing method:
Embodiment 1
Selecting support 23 length is 35mm, and metal tube 22 length are 12mm, and the length of dead ring 24 is 10mm, uses polishing electric current 10A, Polishing Motion speed 5mm/s, polishing time 50s, polishing frequency 80Hz, polish temperature 65deg.
Use support polishing structure of the prior art that this support is polished, design sketch is shown in 9, the support burnishing device that uses present embodiment to provide polishes this support, and design sketch can be found out as shown in figure 10, use prior art that support is polished, produce strong " tack " phenomenon, the length of its " tack " section has reached 116um, when " tack " defective occurring, so that the deck-siding of support in this position also attenuates the supporting capacity variation of support.Use support burnishing device of the present invention under the same treatment condition, " tack " phenomenon has been improved effectively, and the homogeneity of end position also is further enhanced.
Embodiment 2
Selecting support 23 length is 15mm, and metal tube 22 length are 20mm, and the length of dead ring 24 is 15mm, uses polishing electric current 12A, Polishing Motion speed 10mm/s, polishing time 30s, polishing frequency 100Hz, polish temperature 70deg.
The support burnishing device that uses respectively support polishing structure of the prior art and present embodiment to provide polishes this support, can find out, uses support burnishing device of the present invention under the same treatment condition, and the whole homogeneity of support is further enhanced.
Described embodiment of the method is corresponding with described device embodiment, the description of relevant portion gets final product among the part comparable device embodiment that does not describe in detail in embodiment of the method, and the description of relevant portion gets final product among the part reference method embodiment that does not describe in detail in device embodiment.
In each embodiment of the method for the present invention; the sequence number of described each step can not be used for limiting the sequencing of each step; for those of ordinary skills, under the prerequisite of not paying creative work, the priority of each step is changed also within protection scope of the present invention.
The above is preferred implementation of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from principle of the present invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (12)
1. the support burnishing device in the electrochemical etching comprises metal electrode and is arranged on negative electrode in the electrolytic solution, it is characterized in that, also comprises:
Connection section, be used for polished support be connected metal electrode and connect to form anode;
The extension comprises two metal tubes, is separately positioned on the two ends of described polished support, is used for increasing in the electrochemical etching process length of described anode.
2. support burnishing device according to claim 1 is characterized in that,
Described connection section is a mandrel, and described metal tube, polished support and described metal electrode be all take described mandrel as axle, coaxial being installed on the described mandrel.
3. support burnishing device according to claim 1 is characterized in that, described device also comprises:
One is used for holding the electrolyzer of electrolytic solution.
4. support burnishing device according to claim 1 is characterized in that, described device also comprises:
Dead ring take described mandrel as axle, is installed between described metal electrode and the described metal tube.
5. support burnishing device according to claim 1 is characterized in that, described device also comprises:
The polishing sponge contacts with the outside surface of described polished support.
6. support burnishing device according to claim 5 is characterized in that, described device also comprises:
Cantilever is connected with described connection section, is used for controlling the outside surface of described polished support with respect to the spin friction of described polishing sponge in the electrochemical etching process.
7. support burnishing device according to claim 1 is characterized in that, the length of described metal tube is 1mm-25mm, and the distance between described metal tube and the described polished support is 0.5mm-10mm.
8. support burnishing device according to claim 4 is characterized in that, the length of described dead ring is 1mm-50mm.
9. the support finishing method in the electrochemical etching is applied to the polished support as anode in the electrolytic solution is polished, and described polished support and a metal electrode are connected to form anode, are characterised in that, comprising:
Described polished support is carried out electropolishing, wherein, in polishing process, utilize the metal tube that sets in advance at the two ends of described polished support, increase the length of described anode.
10. support finishing method according to claim 9 is characterized in that, is separated with a segment distance between described metal tube and the described polished support, and described metal tube is installed on the same mandrel with described polished support is coaxial.
11. according to claim 9 or 10 described support finishing methods, it is characterized in that, describedly described polishing support is carried out electropolishing comprise:
To polish sponge and be fixed on and put into electrolytic solution on the substrate, making the angle of described polishing sponge and horizontal direction is 20 °-80 °;
The metal electrode that is fixed on the described mandrel is connected with a cantilever, controls described cantilever and move up and down, make described polished support do the diagonal movement of equal angular along the inclination angle of described polishing sponge, be rotated friction with described polishing sponge.
12. according to claim 9 or 10 described support finishing methods, it is characterized in that, describedly described polishing support is carried out electropolishing comprise:
The metal electrode that is fixed on the described mandrel is connected with a cantilever, and fixing described cantilever is immersed in the electrolytic solution described polished support;
To polish sponge and be fixed on and put into electrolytic solution on the substrate, making the angle of described polishing sponge and horizontal direction is 20 °-80 °, and controls described polishing sponge and move reciprocatingly along this angle, is rotated friction with described polishing sponge.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310272643.7A CN103352246B (en) | 2010-05-19 | 2010-05-19 | Support burnishing device and method |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310272643.7A CN103352246B (en) | 2010-05-19 | 2010-05-19 | Support burnishing device and method |
| CN 201010182925 CN102251268B (en) | 2010-05-19 | 2010-05-19 | Bracket polishing device and method for electrochemical polish |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 201010182925 Division CN102251268B (en) | 2010-05-19 | 2010-05-19 | Bracket polishing device and method for electrochemical polish |
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| CN103352246A true CN103352246A (en) | 2013-10-16 |
| CN103352246B CN103352246B (en) | 2015-08-19 |
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| CN201310272381.4A Active CN103320846B (en) | 2010-05-19 | 2010-05-19 | Support burnishing device and support finishing method |
| CN201310272643.7A Expired - Fee Related CN103352246B (en) | 2010-05-19 | 2010-05-19 | Support burnishing device and method |
| CN 201010182925 Expired - Fee Related CN102251268B (en) | 2010-05-19 | 2010-05-19 | Bracket polishing device and method for electrochemical polish |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107858746A (en) * | 2017-11-08 | 2018-03-30 | 山东理工大学 | A kind of angiocarpy bracket electrolytic buffing attachment |
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| CN106555221B (en) * | 2015-09-25 | 2023-03-07 | 盛美半导体设备(上海)股份有限公司 | Spray head device |
| CN106609390B (en) * | 2015-10-22 | 2018-11-27 | 易生科技(北京)有限公司 | A kind of electrochemical polish liquid, preparation method and the polishing method of cochrome intravascular stent |
| CN105386117A (en) * | 2015-11-24 | 2016-03-09 | 常州乐奥医疗科技有限公司 | Electrochemical polishing device and method for support |
| US10538856B2 (en) * | 2017-05-02 | 2020-01-21 | General Electric Company | Apparatus and method for electro-polishing complex shapes |
| CN111101190B (en) * | 2020-02-26 | 2022-07-05 | 山东理工大学 | Electro-polishing device for cardiovascular stent |
| CN113481584A (en) * | 2021-07-09 | 2021-10-08 | 上海心玮医疗科技股份有限公司 | Metal support polishing equipment and process |
| CN114990684B (en) * | 2022-06-13 | 2023-09-26 | 深圳市金瑞凯利生物科技有限公司 | Electrochemical polishing device and polishing method for tubular support |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN103320846B (en) | 2015-12-02 |
| CN103320846A (en) | 2013-09-25 |
| CN103352246B (en) | 2015-08-19 |
| CN102251268B (en) | 2013-05-22 |
| CN102251268A (en) | 2011-11-23 |
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