CN103317124A - 一种铜铟镓旋转靶材的制备方法 - Google Patents
一种铜铟镓旋转靶材的制备方法 Download PDFInfo
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106319469A (zh) * | 2016-10-28 | 2017-01-11 | 中国科学院宁波材料技术与工程研究所 | 一种铜铟镓合金靶材的制备方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5232740A (en) * | 1989-05-16 | 1993-08-03 | Mannesmannufer Aktiengesellschaft | Method of manufacturing plated hollow blocks |
US20050118339A1 (en) * | 2001-08-13 | 2005-06-02 | Wilmert De Bosscher | Process for the manufacturing of a sputter target |
US20090205955A1 (en) * | 2006-06-26 | 2009-08-20 | Nv Bekaert Sa | Method of manufacturing a rotatable sputter target |
US20100101949A1 (en) * | 2008-10-24 | 2010-04-29 | Applied Materials, Inc. | Rotatable sputter target backing cylinder, rotatable sputter target, method of producing a rotatable sputter target, and coating installation |
CN101705472A (zh) * | 2009-09-18 | 2010-05-12 | 上海高展金属材料有限公司 | 一种旋转靶材的贴合方法 |
CN101709454A (zh) * | 2009-12-03 | 2010-05-19 | 王�琦 | 一种旋转溅射靶及其制作方法 |
CN101921988A (zh) * | 2010-05-05 | 2010-12-22 | 广州市尤特新材料有限公司 | 一种硅基合金旋转靶材及其制备方法 |
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5232740A (en) * | 1989-05-16 | 1993-08-03 | Mannesmannufer Aktiengesellschaft | Method of manufacturing plated hollow blocks |
US20050118339A1 (en) * | 2001-08-13 | 2005-06-02 | Wilmert De Bosscher | Process for the manufacturing of a sputter target |
US20090205955A1 (en) * | 2006-06-26 | 2009-08-20 | Nv Bekaert Sa | Method of manufacturing a rotatable sputter target |
US20100101949A1 (en) * | 2008-10-24 | 2010-04-29 | Applied Materials, Inc. | Rotatable sputter target backing cylinder, rotatable sputter target, method of producing a rotatable sputter target, and coating installation |
CN101705472A (zh) * | 2009-09-18 | 2010-05-12 | 上海高展金属材料有限公司 | 一种旋转靶材的贴合方法 |
CN101709454A (zh) * | 2009-12-03 | 2010-05-19 | 王�琦 | 一种旋转溅射靶及其制作方法 |
CN101921988A (zh) * | 2010-05-05 | 2010-12-22 | 广州市尤特新材料有限公司 | 一种硅基合金旋转靶材及其制备方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106319469A (zh) * | 2016-10-28 | 2017-01-11 | 中国科学院宁波材料技术与工程研究所 | 一种铜铟镓合金靶材的制备方法 |
CN106319469B (zh) * | 2016-10-28 | 2018-08-24 | 中国科学院宁波材料技术与工程研究所 | 一种铜铟镓合金靶材的制备方法 |
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Effective date of registration: 20170727 Address after: 224200, room 609, building 9, Dongcheng Road, Chengdong new district, Jiangsu, Dongtai Patentee after: Dongtai super photoelectric material Co., Ltd. Address before: 214192 Xishan City, Xishan Province Economic and Technological Development Zone, Wuxi Furong Road No. 99, No., No. three Patentee before: Wuxi XuMatic New Energy Technology Inc. |
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Address after: 224200 Chengdong new district, Dongtai City, Jiangsu Province, No. 88 Patentee after: Jiangsu super product Optoelectronic Technology Co., Ltd. Address before: 224200, room 609, building 9, Dongcheng Road, Chengdong new district, Jiangsu, Dongtai Patentee before: Dongtai super photoelectric material Co., Ltd. |
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Effective date of registration: 20210209 Address after: 312030 Building 2, Daxizhuang village, Huashe street, Keqiao District, Shaoxing City, Zhejiang Province Patentee after: Zhejiang Hongkang Semiconductor Technology Co.,Ltd. Address before: No.88, Jingyi Road, Chengdong new district, Dongtai City, Jiangsu Province 224200 Patentee before: Jiangsu super product Optoelectronic Technology Co.,Ltd. |
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