CN103293847A - Mask plate and preparation method of mask plate - Google Patents
Mask plate and preparation method of mask plate Download PDFInfo
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- CN103293847A CN103293847A CN201310207017XA CN201310207017A CN103293847A CN 103293847 A CN103293847 A CN 103293847A CN 201310207017X A CN201310207017X A CN 201310207017XA CN 201310207017 A CN201310207017 A CN 201310207017A CN 103293847 A CN103293847 A CN 103293847A
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- mask plate
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- mask
- lightproof area
- plates
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The invention discloses a mask plate and a preparation method of the mask plate, and relates to the display technical field. Mask diagrams of the mask plate can be regulated through arranging a plurality of sub mask plates and arranging the plurality of sub mask plates in an overlapped mode. The mask plate provided by the embodiment of the invention comprises the plurality of sub mask plates which are arranged in an overlapped mode; each sub mask plate internally comprises a light transmitting region and a light shading region; the light shading regions of the plurality of sub mask plates form the mask diagrams of the mask plate together.
Description
Technical field
The present invention relates to the display technique field, relate in particular to the preparation method of a kind of mask plate and mask plate.
Background technology
Increasingly mature along with the photoelectric display technology, the application of display device more and more widely.Wherein long based on the life-span, light efficiency is high, radiation is low, characteristics such as low in energy consumption, liquid crystal indicator has replaced traditional ray tube display device gradually and has become the research direction of display device product main flow in recent years.
As a kind of conventional process means in the liquid crystal indicator preparation process, photoetching process is used for forming at substrate the figure of liquid crystal indicator array base palte and each structural unit of color membrane substrates.Wherein, be material with the photoresist in the photoetching process, photoresist is coated on the film of preparing etching, utilize mask plate to form the figure of photoresist; the figure of this photoresist can protect following material film not to be etched away in subsequent etching technology, thereby forms the figure of each structural unit.
But the inventor finds that in R﹠D process there is following defective at least in prior art: because the figure of each structural unit has nothing in common with each other in the liquid crystal indicator, and usually need on stream the figure of each structural unit is adjusted.Therefore, for the mask plate of prior art, repeat preparation and not only caused waste, increased the cost expenditure, also can cause the process of developing and making elongated in addition.
Summary of the invention
Embodiments of the invention provide the preparation method of a kind of mask plate and mask plate, and the mask graph of this mask plate is adjustable, so mask plate can reuse, and have saved the preparation cost of mask plate.
For solving the problems of the technologies described above, embodiments of the invention adopt following technical scheme:
A kind of mask plate comprises the sub-mask plate of a plurality of overlapping settings comprising transmission region and lightproof area in each described sub-mask plate, the common mask graph that forms described mask plate of the lightproof area of a plurality of described sub-mask plates.
Further, the described transmission region in each described sub-mask plate and the position between described lightproof area relation is inequality.
Further, the shape of the described lightproof area of described sub-mask plate can be set to rectangle or square or triangle or circle.
Further, the described lightproof area of described sub-mask plate comprises lighttight metal material.
Preferably, described sub-mask plate forms described lightproof area by a composition technology.
Further, also comprise the transparent protective seam that covers described transmission region and described lightproof area in the described sub-mask plate.
Preferably, the thickness of described protective seam is 100 microns.
On the other hand, the embodiment of the invention also provides a kind of preparation method of mask plate, comprising:
Determine required sub-mask plate according to the mask graph of described mask plate, comprise transmission region and lightproof area in the described sub-mask plate;
Overlappingly a plurality of described sub-mask plates are set to form described mask plate.
Further, finish described overlapping arrange a plurality of sub-mask plates with the step that forms mask plate after, also comprise:
Whether the described mask graph of calibrating described mask plate meets the requirements;
If meet, then finish calibration; If do not meet, then repeat describedly overlappingly a plurality of sub-mask plates to be set to form the step of mask plate.
A kind of mask plate that the embodiment of the invention provides and the preparation method of mask plate, the sub-mask plate that comprises a plurality of overlapping settings in this mask plate, comprise transmission region and lightproof area in each sub-mask plate, the lightproof area of a plurality of sub-mask plates forms the mask graph of mask plate jointly, thereby form the mask plate with different mask graphs by the relation of the position between the lightproof area of adjusting a plurality of sub-mask plates, in order to satisfy the needs of different photoetching processes, reduced the cost of development of array base palte and color membrane substrates preparation technology in the liquid crystal indicator, shortened exploitation and made required time.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, to do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below, apparently, accompanying drawing in describing below only is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is one of the structural representation of the sub-mask plate of the embodiment of the invention;
Fig. 2 be the embodiment of the invention sub-mask plate structural representation two;
Fig. 3 be the embodiment of the invention sub-mask plate structural representation three;
Fig. 4 be the embodiment of the invention sub-mask plate structural representation four;
Fig. 5 is one of the structural representation of the mask plate of the embodiment of the invention;
Fig. 6 be the embodiment of the invention mask plate structural representation two;
Fig. 7 be the embodiment of the invention mask plate structural representation three;
Fig. 8 be the embodiment of the invention mask plate structural representation four;
Fig. 9 be the embodiment of the invention mask plate structural representation five;
Figure 10 is the mask plate preparation method's of the embodiment of the invention schematic flow sheet.
Embodiment
Embodiments of the invention provide the preparation method of a kind of mask plate and mask plate, and the mask graph of this mask plate is adjustable, so mask plate can reuse, and have saved the preparation cost of mask plate.
In below describing, in order to illustrate rather than in order limiting, to have proposed the detail such as particular system structure, interface, technology, understand the present invention in order to cut thoroughly.Yet, not it will be clear to one skilled in the art that in having other embodiment of these details and can realize the present invention yet.In other situation, omit the detailed description to well-known device, circuit and method, in order to avoid unnecessary details hinders description of the invention.
Below in conjunction with following accompanying drawing the embodiment of the invention is described in detail.
The embodiment of the invention provides a kind of mask plate, comprises the sub-mask plate of a plurality of overlapping settings, and as shown in Figure 1, Fig. 1 is the structural representation of sub-mask plate, comprises transmission region 1 and lightproof area 2 in each described sub-mask plate.Need to prove that mask plate is used to form the array base palte of display device and the figure of each structural unit of color membrane substrates, so mask plate can extend as required and correspondingly with the position at each pixel place of display device be divided into a plurality of zones.And mask plate comprises the sub-mask plate of a plurality of overlapping settings, and the lightproof area of sub-mask plate is used to form the part of the mask graph of mask plate, therefore, has also carried out similar a plurality of dividing region in the sub-mask plate.In fact, it should be appreciated by those skilled in the art that a plurality of dividing region that mask plate and sub-mask plate are carried out only for display device in each pixel position carry out correspondingly, and be not further restriction to the embodiment of the invention.
Further, the described transmission region in each described sub-mask plate and the position between described lightproof area relation is inequality.
Further, the shape of the described lightproof area of described sub-mask plate can be set to rectangle or square or triangle or circle.
Describe for convenient, the present invention is that example makes an explanation with the sub-mask plate that is divided into triplex row three column regions all.As shown in Figure 1, comprise transmission region 1 and lightproof area 2 in the sub-mask plate.Be example with any one zone, include the rectangular lightproof area 2 that is positioned at middle position and the transmission region 1 that centers on lightproof area 2 in each zoning of sub-mask plate, in fact, sub-mask plate shown in Figure 1 only is a kind of embodiment of the present invention, there is multiple variation in position relation between the transmission region that comprises in the sub-mask plate and the shape of lightproof area and two zones, for instance, the shape of described lightproof area can be set to rectangle, square, triangle, common graphics shape such as circle or be the shape of other irregular figures, as a same reason, the shape of transmission region also has multiple possibility.For example: sub-mask plate as shown in Figure 2, wherein, lightproof area 2 be shaped as square.
In addition, owing to include transmission region 1 and lightproof area 2 in described sub-mask plate, so transmission region concerns with the position of lightproof area in sub-mask plate and can comprise following three kinds:
One, in sub-mask plate, lightproof area can be centered on by transmission region, and for example as Fig. 1 or shown in Figure 2, lightproof area is positioned at the middle position of each zoning of sub-mask plate, and transmission region is around the lightproof area setting.
Its two, as shown in Figure 3, in sub-mask plate, transmission region can be centered on by lightproof area, transmission region is positioned at the middle position of each zoning of sub-mask plate, lightproof area is around the transmission region setting.
Its three, as shown in Figure 4, in sub-mask plate, the transmission region setting that links to each other with lightproof area, for example transmission region is positioned at the left of each zoning of sub-mask plate, lightproof area is positioned at the right-hand of each zoning of sub-mask plate; Certainly, transmission region and lightproof area also can be upper and lower to the adjacent distributions setting.
Need to prove that under this distribution mode, concrete which zone is on a left side in transmission region and the lightproof area, which zone is on the right side, and perhaps which zone is last, and which zone is following, and the present invention does not do restriction; And in this manner, above-mentioned two zones are not limited to alignment and arrange, and can stagger each other in two zones, and for example, transmission region is positioned at the lower left corner of screen, and lightproof area is positioned at the upper right corner of screen.What need special supplementary notes a bit is, as a kind of comparatively preferred embodiment, transmission region in each sub-mask plate and the relation of the position between the lightproof area are inequality, and the mask graph shape of the mask plate by sub-mask plate formation is abundanter thus.
Below further the mask plate of the sub-mask plate that comprises a plurality of overlapping settings is described in detail.
As a kind of embodiment of the present invention, as shown in Figure 5, include the sub-mask plate of two overlapping settings in the mask plate, comprise transmission region and lightproof area in each sub-mask plate, the lightproof area of two sub-mask plates forms the mask graph of mask plate jointly.Wherein, sub-mask plate is example with sub-mask plate shown in Figure 1, and wherein this sub-mask plate can be described as the central position that lightproof area is arranged on sub-mask plate, and transmission region 1 arranges around lightproof area 2, and lightproof area 2 is rectangle.The forming process of the mask plate of Fig. 5 can be described as: at first, choose two sub-mask plates shown in Figure 1, and two sub-mask plates are overlapping mutually; Then, make another sub-mask plate of one of them sub-mask plate half-twist (sense of rotation can be clockwise or for counterclockwise) keep difference; Then, make after the staggered displacement of two sub-mask plates and position.The lightproof area figure that for example can utilize the overlapping back of two sub-mask plates of microscopic examination to form, and the mask plate figure that overlapping back is formed and predetermined mask plate figure compare until final affirmation and form required mask plate figure.At this moment, after the lightproof area of two sub-mask plates is superimposed, thus the figure of formation mask plate as shown in Figure 5.Wherein, the mask graph in the mask plate shown in Figure 5 is formed jointly by the mutual overlapping back of the lightproof area of two sub-mask plates, and as shown in Figure 5, the mask graph in the described mask plate is positioned at the central authorities of mask plate zoning, is "T"-shaped.
Need to prove that in order to echo with each pixel position of display device, the corresponding division has a plurality of zones in the mask plate.And in the process of the mask plate that utilizes the sub-mask plate formation embodiment of the invention, sub-mask plate can be moved on the position.Therefore a plurality of zones that mask plate is divided may change with a plurality of zones of antithetical phrase mask plate division and become and no longer overlap, but those skilled in the art are to be understood that, in fact, it is in order to make each the pixel position of lightproof area and display device on mask plate and the sub-mask plate carry out corresponding that a plurality of zones that mask plate and sub-mask plate are carried out are divided, do not constitute the change on limitation of the invention further or the summary of the invention, do not give unnecessary details at this.
With reference to above-described embodiment, the present invention further also can form the mask plate with other embodiment.For instance, utilize two sub-mask plates as shown in Figure 1 can form as shown in Figure 6 the L-shaped mask plate of mask graph, the mask graphs that perhaps utilize three sub-mask plates as shown in Figure 1 to form as shown in Figure 7 are " C " shape mask plate etc.Overlapping setting by a plurality of sub-mask plates, comprise transmission region and lightproof area in each sub-mask plate, make the lightproof area of a plurality of sub-mask plates form the mask graph of mask plate jointly, can generate the mask plate with different mask graphs, thereby satisfy the not needs of isomorphic graphs technology.After mask plate is used to complete, a plurality of sub-mask plates can be split again, and be used for the formation of other mask plate.Therefore, the mask plate preparation cost of the embodiment of the invention has obtained reducing greatly, and the preparation required time has also obtained shortening.Certainly, the mode of utilizing a plurality of sub-mask plates to form mask plate has multiple possibility, and is limited because of length of the present invention, is not further described at this.
In addition, any of supplementary notes only enumerated wherein three kinds of mask plates in the above-described embodiments.In fact, because the needs of composition technology, the shape of the mask graph of mask plate and the details of mask graph may be more complicated.For instance, mask plate as described in Figure 8, its mask graph present two parts zone of separation; Perhaps mask plate as described in Figure 9, its mask graph comprises two parts zone that is mutually certain angle.Those skilled in the art should be clear then, even comprise in the mask plate of other embodiment among the present invention the not mentioned detail that arrives, if but its constituted mode is identical with the present invention or similar, the mask plate of this embodiment still should belong to a part of the present invention so.
A kind of mask plate that the embodiment of the invention provides, the sub-mask plate that comprises a plurality of overlapping settings in this mask plate, comprise transmission region and lightproof area in each sub-mask plate, the lightproof area of a plurality of sub-mask plates forms the mask graph of mask plate jointly, thereby form the mask plate with different mask graphs by the relation of the position between the lightproof area of adjusting a plurality of sub-mask plates, in order to satisfy the needs of different photoetching processes, reduced the array base palte of liquid crystal indicator and color membrane substrates preparation technology's cost of development, shortened exploitation and made required time.
Further, the described lightproof area of described sub-mask plate comprises lighttight metal material.For instance, its preparation method is that composition technology can be described as: at first form the lighttight metal material of one deck at sub-mask plate, on metal material, form one deck negative photoresist then, then negative photoresist is carried out uv-exposure and develop, be exposed the negative photoresist generation photocuring reaction in zone; Re-using developer solution afterwards cleans negative photoresist, the negative photoresist of exposure area is retained and the negative photoresist of unexposed area is cleaned, then metal material is carried out etching and removes negative photoresist, finally form the sub-mask plate that lightproof area comprises light tight metal material.Certainly, those skilled in the art also can pass through the other technologies means, for instance, utilize anodal photoresist to form the sub-mask plate mask that lightproof area comprises lighttight metal material, do not do restriction at this this paper.
Preferably, described sub-mask plate forms described lightproof area by a composition technology.
Further, also comprise the transparent protective seam that covers described transmission region and described lightproof area in the described sub-mask plate.The purposes of protective seam can be protected transmission region and the lightproof area of its covering on the one hand, prevents that sub-mask plate is damaged or scratches in overlapping process; Can to make that sub-mask plate forms unified box thick for protective seam on the other hand, for overlapping formation mask plate facilitates.
Preferably, the thickness of described protective seam is 100 microns.
A kind of mask plate that the embodiment of the invention provides, the sub-mask plate that comprises a plurality of overlapping settings in this mask plate, comprise transmission region and lightproof area in each sub-mask plate, the lightproof area of a plurality of sub-mask plates forms the mask graph of mask plate jointly, thereby form the mask plate with different mask graphs by the relation of the position between the lightproof area of adjusting a plurality of sub-mask plates, in order to satisfy the needs of different photoetching processes, reduced the array base palte of liquid crystal indicator and color membrane substrates preparation technology's cost of development, shortened exploitation and made required time.
On the other hand, the embodiment of the invention also provides a kind of preparation method of mask plate, as shown in figure 10, comprising:
Step S101 determines required sub-mask plate according to the mask graph of mask plate, comprises transmission region and lightproof area in the sub-mask plate.
Concrete, the user at first determines required sub-mask plate according to the mask graph of mask plate.Wherein, the user need determine the quantity of required sub-mask plate on the one hand, and for instance, the mask plate that is " C " shape with the formation mask graph is example, as if the sub-mask plate with the rectangle lightproof area, needs at least three sub-mask plates to form mask plate; On the other hand, because being lightproof area by a plurality of sub-mask plates, the mask graph of mask plate forms jointly, so the user also needs the position of definite required sub-mask plate to concern.
Step S102 overlappingly arranges a plurality of sub-mask plates to form mask plate.
The user carries out overlapping setting so that the lightproof area of a plurality of sub-mask plates forms the mask graph of mask plate jointly with a plurality of sub-mask plates after determining required sub-mask plate.And it will be understood by those skilled in the art that: in embodiments of the present invention, the order of the overlapping setting of sub-mask plate is not changeless.For example: the mask graph of supposing mask plate is that the lightproof area by the lightproof area of sub-mask plate a and sub-mask plate b forms jointly, as for arranging on the sub-mask plate b or sub-mask plate b is overlapping to be arranged on the sub-mask plate a in that mask plate forming process neutron mask plate a is overlapping, finally form not difference of mask graph.Need to prove that in addition a plurality of sub-mask plates can be the sub-mask plate with identical lightproof area, also can be the sub-mask plate with different lightproof areas, do not do restriction at this this paper.
Further, behind step S102, the preparation method of the embodiment of the invention also comprises:
Step S103, whether the mask graph of calibration mask plate meets the requirements;
If meet, then finish calibration; If do not meet, then repeat overlappingly a plurality of sub-mask plates to be set to form the step S102 of mask plate.
Behind step S102, the user calibrates the mask graph of the mask plate of formation, for example: the shape of utilizing microscopic examination mask plate mask graph, and this shape and the predetermined mask graph shape that will form compared, can perform calculations by computing machine during comparison, when the result of calibration is undesirable, then repeat step S102 till calibration meets the requirements.
The preparation method of a kind of mask plate that the embodiment of the invention provides, the sub-mask plate that comprises a plurality of overlapping settings in this mask plate, comprise transmission region and lightproof area in each sub-mask plate, the lightproof area of a plurality of sub-mask plates forms the mask graph of mask plate jointly, thereby form the mask plate with different mask graphs by the relation of the position between the lightproof area of adjusting a plurality of sub-mask plates, in order to satisfy the needs of different photoetching processes, reduced the preparation technology's of the array base palte of liquid crystal indicator and color membrane substrates cost of development, shortened exploitation and made required time.
The above; only be the specific embodiment of the present invention, but protection scope of the present invention is not limited thereto, anyly is familiar with those skilled in the art in the technical scope that the present invention discloses; can expect easily changing or replacing, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.
Claims (9)
1. a mask plate is characterized in that, comprises the sub-mask plate of a plurality of overlapping settings, comprises transmission region and lightproof area in each described sub-mask plate, the common mask graph that forms described mask plate of the lightproof area of a plurality of described sub-mask plates.
2. mask plate according to claim 1 is characterized in that, the described transmission region in each described sub-mask plate and the relation of the position between the described lightproof area are inequality.
3. mask plate according to claim 1 is characterized in that, the shape of the described lightproof area of described sub-mask plate can be set to rectangle or square or triangle or circle.
4. mask plate according to claim 1 is characterized in that, the described lightproof area of described sub-mask plate comprises lighttight metal material.
5. according to the described mask plate of claim 4, it is characterized in that described sub-mask plate forms described lightproof area by a composition technology.
6. mask plate according to claim 1 is characterized in that, also comprises the transparent protective seam that covers described transmission region and described lightproof area in the described sub-mask plate.
7. mask plate according to claim 6 is characterized in that, the thickness of described protective seam is 100 microns.
8. the preparation method of a mask plate is characterized in that, comprising:
Determine required sub-mask plate according to the mask graph of described mask plate, comprise transmission region and lightproof area in the described sub-mask plate;
Overlappingly a plurality of described sub-mask plates are set to form described mask plate.
9. preparation method according to claim 8 is characterized in that, finish described overlapping arrange a plurality of sub-mask plates with the step that forms mask plate after, also comprise:
Whether the described mask graph of calibrating described mask plate meets the requirements;
If meet, then finish calibration; If do not meet, then repeat describedly overlappingly a plurality of sub-mask plates to be set to form the step of mask plate.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310207017XA CN103293847A (en) | 2013-05-29 | 2013-05-29 | Mask plate and preparation method of mask plate |
| PCT/CN2013/088979 WO2014190718A1 (en) | 2013-05-29 | 2013-12-10 | Mask plate and preparation method for mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201310207017XA CN103293847A (en) | 2013-05-29 | 2013-05-29 | Mask plate and preparation method of mask plate |
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| CN103293847A true CN103293847A (en) | 2013-09-11 |
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| CN201310207017XA Pending CN103293847A (en) | 2013-05-29 | 2013-05-29 | Mask plate and preparation method of mask plate |
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| CN (1) | CN103293847A (en) |
| WO (1) | WO2014190718A1 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104166303A (en) * | 2014-08-06 | 2014-11-26 | 京东方科技集团股份有限公司 | Mask plate and exposure method |
| WO2014190718A1 (en) * | 2013-05-29 | 2014-12-04 | 北京京东方光电科技有限公司 | Mask plate and preparation method for mask plate |
| CN105807558A (en) * | 2014-12-30 | 2016-07-27 | 展讯通信（上海）有限公司 | Novel combined mask |
| CN105810564A (en) * | 2014-12-30 | 2016-07-27 | 展讯通信（上海）有限公司 | Combined mask for preparing MOS tube |
| CN108169999A (en) * | 2018-01-02 | 2018-06-15 | 京东方科技集团股份有限公司 | Mask and preparation method thereof, display panel and preparation method thereof |
| CN108598133A (en) * | 2018-05-23 | 2018-09-28 | Oppo广东移动通信有限公司 | Manufacturing method, OLED display screen and the electronic device of OLED display screen |
| CN110750031A (en) * | 2018-07-23 | 2020-02-04 | 上海微电子装备（集团）股份有限公司 | Spliced mask, exposure device and exposure method |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3594168A (en) * | 1967-02-13 | 1971-07-20 | Gen Electric Information Syste | Method for fabricating photographic artwork for printed circuits |
| US5418092A (en) * | 1991-06-10 | 1995-05-23 | Hitachi, Ltd. | Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process |
| KR20030001986A (en) * | 2001-06-28 | 2003-01-08 | 주식회사 하이닉스반도체 | Method for fabricating exposure mask for semiconductor manufacture |
| JP2003124097A (en) * | 2001-10-11 | 2003-04-25 | Sony Corp | Mask and manufacturing method thereof, projection aligner, and manufacturing method of semiconductor device |
| CN1495444A (en) * | 2002-07-18 | 2004-05-12 | ���ǵ�����ʽ���� | Method for designing phase raster graphics and method for making photomask system containing it |
| KR20050060548A (en) * | 2003-12-16 | 2005-06-22 | 엘지.필립스 엘시디 주식회사 | Mask of variable line width and method for forming patterns |
| KR20100098921A (en) * | 2009-03-02 | 2010-09-10 | 주식회사 하이닉스반도체 | Sub expose mask and method for forming semiconductor device using it |
| JP2012022932A (en) * | 2010-07-15 | 2012-02-02 | Hitachi Displays Ltd | Organic electroluminescent panel and manufacturing method thereof |
| CN102608860A (en) * | 2012-03-26 | 2012-07-25 | 深圳市华星光电技术有限公司 | Photoetching method, photomask combination and exposure system |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01237660A (en) * | 1988-03-18 | 1989-09-22 | Fujitsu Ltd | Photomask |
| JP3177404B2 (en) * | 1995-05-31 | 2001-06-18 | シャープ株式会社 | Photomask manufacturing method |
| US6150231A (en) * | 1998-06-15 | 2000-11-21 | Siemens Aktiengesellschaft | Overlay measurement technique using moire patterns |
| KR20060056694A (en) * | 2004-11-22 | 2006-05-25 | 삼성전자주식회사 | Mask and method of array panel using the same |
| JP2006251611A (en) * | 2005-03-14 | 2006-09-21 | Toppan Printing Co Ltd | Self alignment type phase shift mask and a method for manufacturing the same |
| CN101452210B (en) * | 2007-11-28 | 2010-09-08 | 上海华虹Nec电子有限公司 | Photolithography method for forming different pattern density |
| CN103293847A (en) * | 2013-05-29 | 2013-09-11 | 北京京东方光电科技有限公司 | Mask plate and preparation method of mask plate |
-
2013
- 2013-05-29 CN CN201310207017XA patent/CN103293847A/en active Pending
- 2013-12-10 WO PCT/CN2013/088979 patent/WO2014190718A1/en active Application Filing
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3594168A (en) * | 1967-02-13 | 1971-07-20 | Gen Electric Information Syste | Method for fabricating photographic artwork for printed circuits |
| US5418092A (en) * | 1991-06-10 | 1995-05-23 | Hitachi, Ltd. | Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process |
| KR20030001986A (en) * | 2001-06-28 | 2003-01-08 | 주식회사 하이닉스반도체 | Method for fabricating exposure mask for semiconductor manufacture |
| JP2003124097A (en) * | 2001-10-11 | 2003-04-25 | Sony Corp | Mask and manufacturing method thereof, projection aligner, and manufacturing method of semiconductor device |
| CN1495444A (en) * | 2002-07-18 | 2004-05-12 | ���ǵ�����ʽ���� | Method for designing phase raster graphics and method for making photomask system containing it |
| KR20050060548A (en) * | 2003-12-16 | 2005-06-22 | 엘지.필립스 엘시디 주식회사 | Mask of variable line width and method for forming patterns |
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