CN103241958A - Etching method of liquid crystal display device glass substrate - Google Patents
Etching method of liquid crystal display device glass substrate Download PDFInfo
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- CN103241958A CN103241958A CN2013102023145A CN201310202314A CN103241958A CN 103241958 A CN103241958 A CN 103241958A CN 2013102023145 A CN2013102023145 A CN 2013102023145A CN 201310202314 A CN201310202314 A CN 201310202314A CN 103241958 A CN103241958 A CN 103241958A
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Abstract
The invention discloses an etching method of a liquid crystal display device glass substrate, which comprises steps of glass substrate clamping, primary ultrasonic cleaning, primary etching, secondary ultrasonic cleaning, secondary etching, tertiary ultrasonic cleaning and drying, wherein the primary ultrasonic cleaning time is 1-1.5 minutes, the primary etching time is 5-8 minutes, the secondary ultrasonic cleaning time is 2-3 minutes, the secondary etching time is 3-5 minutes, and the tertiary ultrasonic cleaning time is 2-3 minutes; the etching agent for primary etching comprises 20-35% of hydrofluoric acid, 10-25% of sulfuric acid and 45-65% of water; and the etching agent for secondary etching comprises 30-40% of hydrofluoric acid, 5-10% of sulfuric acid and 50-65% of water. The etching method can effectively enhance the etching quality of the liquid crystal display device glass substrate, and has the advantage of high etching quality.
Description
Technical field
The present invention relates to the LCD glass substrate processing technique field, relate in particular to a kind of engraving method of LCD glass substrate.
Background technology
Along with people are more and more higher to the degree of concern of the display effect of indicating meter, particularly the requirement of exploration on display resolution ratio constantly promotes; So in the glass substrate course of processing of indicating meter, its line-spacing, that live width needs etching to get is more and more thinner, homogeneity also requires more and more stricter.
In order to satisfy the requirement in market, must provide a kind of engraving method of high request.
Summary of the invention
The object of the present invention is to provide a kind of engraving method of LCD glass substrate, this LCD glass substrate engraving method can improve the etching quality of LCD glass substrate, etching quality better further.
For achieving the above object, the present invention is achieved through the following technical solutions.
A kind of engraving method of LCD glass substrate includes following processing step, is specially:
A, glass substrate is positioned over hand basket;
B, the hand basket that will install glass substrate are positioned in first ultrasonic cleaner, and scavenging period is 1-1.5 minute;
C, will be positioned in first etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the first time, first etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in first etching bath is 5-8 minute, wherein, etching reagent in first etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 20%-35%
Sulfuric acid 10%-25%
Water 45%-65%;
D, will be positioned in second ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the first time, scavenging period is 2-3 minute;
E, will be positioned in second etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the second time, second etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in second etching bath is 3-5 minute, wherein, etching reagent in second etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 30%-40%
Sulfuric acid 5%-10%
Water 50%-65%;
F, will be positioned in the 3rd ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the second time, scavenging period is 2-3 minute;
H, will be positioned in the baker with hand basket through the glass substrate after the ultrasonic cleaning for the third time, till the glass substrate oven dry.
Further, the employed etching reagent of described step c includes the component of following weight part, is specially:
Hydrofluoric acid 25%-30%
Sulfuric acid 15%-20%
Water 50%-60%.
Further, the employed etching reagent of described step c includes the component of following weight part, is specially:
Hydrofluoric acid 28%
Sulfuric acid 18%
Water 54%.
Further, the employed etching reagent of described step e includes the component of following weight part, is specially:
Hydrofluoric acid 35%-40%
Sulfuric acid 5%-8%
Water 50%-60%.
Further, the employed etching reagent of described step e includes the component of following weight part, is specially:
Hydrofluoric acid 40%
Sulfuric acid 5%
Water 55%.
Beneficial effect of the present invention is: the engraving method of a kind of LCD glass substrate of the present invention, and this engraving method includes following processing step, is specially: a, glass substrate is positioned over hand basket; B, the hand basket that will install glass substrate are positioned in first ultrasonic cleaner, and scavenging period is 1-1.5 minute; C, will be positioned in first etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the first time, first etching bath is supplied with etching reagent continuously by the circulation pump housing, and the etching period of glass substrate in first etching bath is 5-8 minute; D, will be positioned in second ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the first time, scavenging period is 2-3 minute; E, will be positioned in second etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the second time, second etching bath is supplied with etching reagent continuously by the circulation pump housing, and the etching period of glass substrate in second etching bath is 3-5 minute; F, will be positioned in the 3rd ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the second time, scavenging period is 2-3 minute; H, will be positioned in the baker with hand basket through the glass substrate after the ultrasonic cleaning for the third time, till the glass substrate oven dry.Wherein, the etching reagent in first etching bath includes the component of following weight part, is specially: hydrofluoric acid 20%-35%, sulfuric acid 10%-25%, water 45%-65%; Etching reagent in second etching bath includes the component of following weight part, is specially: hydrofluoric acid 30%-40%, sulfuric acid 5%-10%, water 50%-65%.By above-mentioned processing step, this engraving method can improve the etching quality of LCD glass substrate, etching quality better effectively.
Embodiment
The present invention will be described below in conjunction with concrete embodiment.
Embodiment one, and a kind of engraving method of LCD glass substrate includes following processing step, is specially:
A, glass substrate is positioned over hand basket;
B, the hand basket that will install glass substrate are positioned in first ultrasonic cleaner, and scavenging period is 1-1.5 minute;
C, will be positioned in first etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the first time, first etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in first etching bath is 5-8 minute, wherein, etching reagent in first etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 28%
Sulfuric acid 18%
Water 54%;
D, will be positioned in second ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the first time, scavenging period is 2-3 minute;
E, will be positioned in second etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the second time, second etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in second etching bath is 3-5 minute, wherein, etching reagent in second etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 40%
Sulfuric acid 5%
Water 55%;
F, will be positioned in the 3rd ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the second time, scavenging period is 2-3 minute;
H, will be positioned in the baker with hand basket through the glass substrate after the ultrasonic cleaning for the third time, till the glass substrate oven dry.
Wherein, the engraving method of present embodiment one is finished glass substrate etching processing by the step of glass substrate clamping, a ultrasonic cleaning, an etching, the cleaning of twice ultrasonic ripple, second etch, three ultrasonic cleaning and oven dry successively, this engraving method can improve the etching quality of LCD glass substrate, etching quality better effectively.
Embodiment two, and a kind of engraving method of LCD glass substrate includes following processing step, is specially:
A, glass substrate is positioned over hand basket;
B, the hand basket that will install glass substrate are positioned in first ultrasonic cleaner, and scavenging period is 1-1.5 minute;
C, will be positioned in first etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the first time, first etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in first etching bath is 5-8 minute, wherein, etching reagent in first etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 25%
Sulfuric acid 20%
Water 55%;
D, will be positioned in second ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the first time, scavenging period is 2-3 minute;
E, will be positioned in second etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the second time, second etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in second etching bath is 3-5 minute, wherein, etching reagent in second etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 35%
Sulfuric acid 8%
Water 57%;
F, will be positioned in the 3rd ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the second time, scavenging period is 2-3 minute;
H, will be positioned in the baker with hand basket through the glass substrate after the ultrasonic cleaning for the third time, till the glass substrate oven dry.
Wherein, the engraving method of present embodiment two is finished glass substrate etching processing by the step of glass substrate clamping, a ultrasonic cleaning, an etching, the cleaning of twice ultrasonic ripple, second etch, three ultrasonic cleaning and oven dry successively, this engraving method can improve the etching quality of LCD glass substrate, etching quality better effectively.
Embodiment three, and a kind of engraving method of LCD glass substrate includes following processing step, is specially:
A, glass substrate is positioned over hand basket;
B, the hand basket that will install glass substrate are positioned in first ultrasonic cleaner, and scavenging period is 1-1.5 minute;
C, will be positioned in first etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the first time, first etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in first etching bath is 5-8 minute, wherein, etching reagent in first etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 30%
Sulfuric acid 20%
Water 50%;
D, will be positioned in second ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the first time, scavenging period is 2-3 minute;
E, will be positioned in second etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the second time, second etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in second etching bath is 3-5 minute, wherein, etching reagent in second etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 40%
Sulfuric acid 8%
Water 52%;
F, will be positioned in the 3rd ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the second time, scavenging period is 2-3 minute;
H, will be positioned in the baker with hand basket through the glass substrate after the ultrasonic cleaning for the third time, till the glass substrate oven dry.
Wherein, the engraving method of present embodiment three is finished glass substrate etching processing by the step of glass substrate clamping, a ultrasonic cleaning, an etching, the cleaning of twice ultrasonic ripple, second etch, three ultrasonic cleaning and oven dry successively, this engraving method can improve the etching quality of LCD glass substrate, etching quality better effectively.
Above content is preferred embodiment of the present invention only, and for those of ordinary skill in the art, according to thought of the present invention, the part that all can change in specific embodiments and applications, this description should not be construed as limitation of the present invention.
Claims (5)
1. the engraving method of a LCD glass substrate is characterized in that, includes following processing step, is specially:
A, glass substrate is positioned over hand basket;
B, the hand basket that will install glass substrate are positioned in first ultrasonic cleaner, and scavenging period is 1-1.5 minute;
C, will be positioned in first etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the first time, first etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in first etching bath is 5-8 minute, wherein, etching reagent in first etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 20%-35%
Sulfuric acid 10%-25%
Water 45%-65%;
D, will be positioned in second ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the first time, scavenging period is 2-3 minute;
E, will be positioned in second etching bath with hand basket through the glass substrate after the ultrasonic cleaning for the second time, second etching bath is supplied with etching reagent continuously by the circulation pump housing, the etching period of glass substrate in second etching bath is 3-5 minute, wherein, etching reagent in second etching bath includes the component of following weight part, is specially:
Hydrofluoric acid 30%-40%
Sulfuric acid 5%-10%
Water 50%-65%;
F, will be positioned in the 3rd ultrasonic cleaner with hand basket through the glass substrate after the etch processes for the second time, scavenging period is 2-3 minute;
H, will be positioned in the baker with hand basket through the glass substrate after the ultrasonic cleaning for the third time, till the glass substrate oven dry.
2. the engraving method of a kind of LCD glass substrate according to claim 1, it is characterized in that: the employed etching reagent of described step c includes the component of following weight part, is specially:
Hydrofluoric acid 25%-30%
Sulfuric acid 15%-20%
Water 50%-60%.
3. the engraving method of a kind of LCD glass substrate according to claim 2, it is characterized in that: the employed etching reagent of described step c includes the component of following weight part, is specially:
Hydrofluoric acid 28%
Sulfuric acid 18%
Water 54%.
4. according to the engraving method of any described a kind of LCD glass substrate of claim 1 to 3, it is characterized in that: the employed etching reagent of described step e includes the component of following weight part, is specially:
Hydrofluoric acid 35%-40%
Sulfuric acid 5%-8%
Water 50%-60%.
5. the engraving method of a kind of LCD glass substrate according to claim 4, it is characterized in that: the employed etching reagent of described step e includes the component of following weight part, is specially:
Hydrofluoric acid 40%
Sulfuric acid 5%
Water 55%.
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103553349A (en) * | 2013-10-11 | 2014-02-05 | 苏州安洁科技股份有限公司 | Manufacturing method of glass touchpad with different hand feel |
| CN103708736A (en) * | 2013-12-13 | 2014-04-09 | 汕头市拓捷科技有限公司 | Strength recovery method of one-glass solution (OGS) glass and equipment of using method |
| CN103880295A (en) * | 2014-02-26 | 2014-06-25 | 江西沃格光电股份有限公司 | Glass thinning equipment and glass thinning method |
| CN104238824A (en) * | 2014-09-30 | 2014-12-24 | 江西省平波电子有限公司 | Manufacturing technology for touch screen of improved GFF structure |
| CN104238825A (en) * | 2014-09-30 | 2014-12-24 | 江西省平波电子有限公司 | Manufacturing technology of touch screen of improved PG structure |
| CN104267851A (en) * | 2014-09-30 | 2015-01-07 | 江西省平波电子有限公司 | Manufacturing technology for improved touch module with GF2 double-surface conductive film structure |
| CN104267850A (en) * | 2014-09-30 | 2015-01-07 | 江西省平波电子有限公司 | Production technique of improved touch modules of GF2 two-sided conductive films and elargol wiring |
| CN104298401A (en) * | 2014-09-30 | 2015-01-21 | 江西省平波电子有限公司 | Manufacturing process of improved touch screen of GG structure |
| CN105293934A (en) * | 2014-07-11 | 2016-02-03 | 东京应化工业株式会社 | Glass working method, glass etching liquid and glass substrate |
| CN107755388A (en) * | 2016-08-18 | 2018-03-06 | 宁波创润新材料有限公司 | The cleaning method of optical glass |
| CN108687025A (en) * | 2018-05-16 | 2018-10-23 | 安徽宏实自动化装备有限公司 | A kind of piece leaf formula wafer cleaning machine |
| TWI676606B (en) * | 2014-07-11 | 2019-11-11 | 日商東京應化工業股份有限公司 | Glass processing method, glass etching solution, and glass substrate |
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| CN101062838A (en) * | 2006-04-28 | 2007-10-31 | 夏普株式会社 | Method for manufacturing grinding glass substrate |
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| US20030205558A1 (en) * | 1999-09-27 | 2003-11-06 | Nippon Sheet Glass Co., Ltd. | Method of manufacturing a glass substrate for displays and a glass substrate for displays manufactured by same |
| JP3749909B2 (en) * | 2004-06-03 | 2006-03-01 | 西山ステンレスケミカル株式会社 | Method for polishing glass plate surface, glass substrate for flat panel display, and flat panel display |
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Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103553349A (en) * | 2013-10-11 | 2014-02-05 | 苏州安洁科技股份有限公司 | Manufacturing method of glass touchpad with different hand feel |
| CN103708736A (en) * | 2013-12-13 | 2014-04-09 | 汕头市拓捷科技有限公司 | Strength recovery method of one-glass solution (OGS) glass and equipment of using method |
| CN103880295A (en) * | 2014-02-26 | 2014-06-25 | 江西沃格光电股份有限公司 | Glass thinning equipment and glass thinning method |
| CN103880295B (en) * | 2014-02-26 | 2017-01-11 | 江西沃格光电股份有限公司 | Glass thinning equipment and glass thinning method |
| CN105293934A (en) * | 2014-07-11 | 2016-02-03 | 东京应化工业株式会社 | Glass working method, glass etching liquid and glass substrate |
| CN105293934B (en) * | 2014-07-11 | 2019-11-29 | 东京应化工业株式会社 | Glass processing method, glass etching liquid and glass substrate |
| TWI676606B (en) * | 2014-07-11 | 2019-11-11 | 日商東京應化工業股份有限公司 | Glass processing method, glass etching solution, and glass substrate |
| CN104238824A (en) * | 2014-09-30 | 2014-12-24 | 江西省平波电子有限公司 | Manufacturing technology for touch screen of improved GFF structure |
| CN104298401A (en) * | 2014-09-30 | 2015-01-21 | 江西省平波电子有限公司 | Manufacturing process of improved touch screen of GG structure |
| CN104267850A (en) * | 2014-09-30 | 2015-01-07 | 江西省平波电子有限公司 | Production technique of improved touch modules of GF2 two-sided conductive films and elargol wiring |
| CN104267851A (en) * | 2014-09-30 | 2015-01-07 | 江西省平波电子有限公司 | Manufacturing technology for improved touch module with GF2 double-surface conductive film structure |
| CN104238825A (en) * | 2014-09-30 | 2014-12-24 | 江西省平波电子有限公司 | Manufacturing technology of touch screen of improved PG structure |
| CN107755388A (en) * | 2016-08-18 | 2018-03-06 | 宁波创润新材料有限公司 | The cleaning method of optical glass |
| CN108687025A (en) * | 2018-05-16 | 2018-10-23 | 安徽宏实自动化装备有限公司 | A kind of piece leaf formula wafer cleaning machine |
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Address after: The North Industrial Park of Xiaogan city in 432500 Hubei County of Yunmeng province Hubei optoelectronic technology Limited by Share Ltd Unocal Applicant after: UNITECH OPTRONICS TECHNOLOGY (HUBEI) CO., LTD. Address before: The North Industrial Park of Xiaogan city in 432500 Hubei County of Yunmeng province Hubei youniko Photoelectric Technology Co Ltd Applicant before: Unitech Optronics Technology (Hubei) Co., Ltd. |
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