CN103234456A - Ultrahigh resolution linear encoder - Google Patents

Ultrahigh resolution linear encoder Download PDF

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CN103234456A
CN103234456A CN2013101229263A CN201310122926A CN103234456A CN 103234456 A CN103234456 A CN 103234456A CN 2013101229263 A CN2013101229263 A CN 2013101229263A CN 201310122926 A CN201310122926 A CN 201310122926A CN 103234456 A CN103234456 A CN 103234456A
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grating
moving
array ccd
ccd sensor
moving grating
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CN103234456B (en
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魏泽鼎
石建玲
张弛
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Tangshan million and Electronic Co., Ltd.
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Hebei University of Science and Technology
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Abstract

An ultrahigh resolution linear encoder comprises a plane light source, a fixed grating, a moving grating and a linear array CCD (charge coupled device) sensor, wherein the fixed grating, the moving grating and the linear array CCD sensor are mutually parallel, sequentially arranged in an irradiation direction of the plane light source and perpendicular to the irradiation direction of the plane light source. The linear array CCD sensor is fixed to the moving grating side by side. Photosensitive units of the linear array CCD sensor are as long as the moving grating. Grids of the N-1 length part of the fixed grating are as exactly N grids of the moving grating, namely grating spacing of the moving grating is equal to the number of ((n-1)/n) multiplied by grating spacing of the fixed grating, wherein the letter n refers to the number of gratings that can be described within the length of the moving grating. Displacement is measured for both the fixed grating and the moving grating according to the measurement principle of vernier caliper, measurement signals are acquired through the linear array CCD sensor, and accordingly resolution of the ultrahigh resolution linear encoder is increased. The ultrahigh resolution linear encoder is especially applicable to places having high requirement on measurement precision.

Description

Ultrahigh resolution grating chi
Technical field
The present invention relates to a kind of grating chi with secondary nanophase resolution, belong to field of measuring technique.
Background technology
Grating chi (being the grating rule displacement sensor) is the measurement feedback assembly that utilizes the optical principle work of grating, and it is big to have sensing range, the accuracy of detection height, and the characteristics that response speed is fast often are applied in the closed loop servo system of numerically-controlled machine.The core component of grating chi is to decide grating and moving grating, and in existing grating chi, the grid of deciding grating and moving grating is equidistant, and a little angle is arranged between them.The resolution of this grating chi can reach several nanometers, but along with manufacturing continuous development, more and more higher to the requirement of measuring accuracy, therefore be necessary the grating chi that design resolution is higher.
Summary of the invention
The objective of the invention is to the drawback at prior art, provide a kind of ultrahigh resolution grating chi, to adapt to manufacturing accuracy requirement.
Problem of the present invention realizes with following technical proposals:
A kind of ultrahigh resolution grating chi, it comprises planar light source and is arranged in order and parallel to each other decides grating, moving grating and line array CCD sensor perpendicular to the direction of illumination of planar light source and along the direction of illumination of planar light source, described line array CCD sensor and moving grating are fixed together side by side, and the length of the photosensitive unit of described line array CCD sensor is corresponding with the length of moving grating; Be that the grid number of the moving grating of length of N-1 is N grid just at the grid number of deciding grating, namely the pitch of moving grating equals to decide the pitch * [(n-1)/n] of grating, and wherein, n is the raster count that can depict in moving grating length.
Above-mentioned ultrahigh resolution grating chi, the photosensitive region length of described line array CCD sensor is more than or equal to the length of moving grating.
Above-mentioned ultrahigh resolution grating chi, the photosensitive unit distance of described line array CCD sensor equals the pitch of moving grating.
Of the present inventionly decide grating and moving grating and utilize the measuring principle of vernier caliper to measure displacement, utilize the line array CCD sensor to gather measuring-signal simultaneously, improved the resolution of grating chi greatly, be specially adapted to the demanding occasion of Measurement Resolution.
Description of drawings
The invention will be further described below in conjunction with accompanying drawing.
Fig. 1 is structural representation of the present invention;
Corresponding each pixel was read current potential when Fig. 2 was grating and decides grating left end first grid and align;
Corresponding each pixel was read current potential when Fig. 3 was that grating moves right 1/4 pitch;
Corresponding each pixel was read current potential when Fig. 4 was that grating moves right 1/2 pitch;
Corresponding each pixel was read current potential when Fig. 5 was that grating moves right 3/4 pitch;
Fig. 6 is structural representation of the present invention;
Fig. 7 is the electrical schematic diagram of control circuit.
Each list of reference numerals is among the figure: 1, decide grating, and 2, moving grating, 3, the line array CCD sensor, 4, planar light source, VR, potentiometer, R1, first resistance, R2, second resistance,
Figure 896050DEST_PATH_IMAGE001
, photoresistance, BJ, comparer.
Embodiment
Referring to Fig. 1, the present invention by light source 4, decide grating 1, moving grating 2 and line array CCD sensor 3 and constitute, it and existing grating chi structural similarity, outward appearance is identical, difference is that there is a line array CCD sensor in the moving grating outside of this grating chi, the length of line array CCD sensor photosensitive unit is identical with the length of the grid of moving grating, and (certainly, the length of line array CCD sensor 3 also can be not equal to the length of moving grating 2; The photosensitive unit distance can equal the pitch of moving grating, also can be not equal to the pitch of moving grating).Moving grating pitch of the present invention is littler than deciding grating pitch Individual pitch is when moving first grid of grating left end with decide first grid of grating left end During alignment, a moving grating left side plays the nIndividual grid
Figure 139447DEST_PATH_IMAGE004
With decide of grating
Figure 629203DEST_PATH_IMAGE005
Individual grid
Figure 579841DEST_PATH_IMAGE006
Just alignment is whenever moving grating moves right During individual pitch, the grid that aligns number also moves right one, when moving grating move right 1 pitch (
Figure 283672DEST_PATH_IMAGE007
) time, the n grid of moving grating and the n grid alignment of deciding grating.Light source is radiated on the line array CCD sensor by moving grating and the grid of decide grating, during the grid alignment illumination the strongest, the electric charge that corresponding photosensitive unit produces is just many, this that a reads out current potential is just low.Corresponding each pixel is read current potential such as Fig. 2~shown in Figure 5 during moving grating diverse location grid alignment, and wherein Fig. 2 is the situation of left justify, each point potential diagram when Fig. 3~Fig. 5 is respectively that grating moves right 1/4,1/2 and 3/4 pitch.Whenever moving grating 1 pitch that moves right, the each point current potential alternately changes one-period from left to right, which aligned in position, the current potential of line array CCD corresponding point is just minimum, the signal of line array CCD output is compared with a set potential, and comparative result is delivered to the input end of single-chip microcomputer, single-chip microcomputer just can be by calculating rising edge and the negative edge of comparative result, obtain the sequence number of the grating that aligns, by recording level period of change number, obtain the raster grid number that moving grating moves right, set out the accurate displacement that grating moves right thereby calculate.
When Fig. 6 is the X grid alignment of the moving grating of hypothesis, read output signal and comparative voltage and comparator output signal waveform.Vs and VREF are compared, comparator circuit as shown in Figure 7, the output meeting of comparer rises to high level at the D point, drops to low level at the E point, can calculate this signal input single-chip microcomputer , round numbers X point is exactly the grid sequence number of moving grating alignment.
For example: level period of change number M, the grating sequence number of current alignment is x, then the distance of current movement is:
Figure 132996DEST_PATH_IMAGE009
Individual pitch.As seen the resolution based on the ultrahigh resolution grating chi of line array CCD is
Figure 22455DEST_PATH_IMAGE010
Pitch.
When pitch equals 2.5 μ m, moving grating grid number is 10000 o'clock, and resolution is μ m, namely
Figure 326583DEST_PATH_IMAGE012
, under the situation of 2.5 μ m pitch, realized the resolution of secondary nanophase.By the improvement algorithm,
Figure 251814DEST_PATH_IMAGE008
In X get 0.5 and can bring up to resolution
Figure 944963DEST_PATH_IMAGE013
The effective length of the effective length of moving grating and line array CCD sensor all should be at 2.5 X10000 μ m=25mm under the above-mentioned situation, and is almost suitable with existing grating chi size.
When line array CCD sensor resolution during less than 2.5 μ m, single-chip microcomputer also can basis
Figure 6460DEST_PATH_IMAGE008
Find the pixel cell of light sensitivity maximum, calculate the corresponding case of deleting and put.Realize
Figure 759653DEST_PATH_IMAGE010
The resolution of pitch.

Claims (3)

1. ultrahigh resolution grating chi, it is characterized in that, it comprises planar light source (4) and is arranged in order and parallel to each other decides grating (1), moving grating (2) and line array CCD sensor (3) perpendicular to the direction of illumination of planar light source (4) and along the direction of illumination of planar light source (4), described line array CCD sensor (3) is fixed together side by side with moving grating (2), and the length of the photosensitive unit of described line array CCD sensor is corresponding with the length of moving grating (2); Be that the grid number of the moving grating of length of N-1 is N grid just at the grid number of deciding grating, namely the pitch of moving grating equals to decide the pitch * [(n-1)/n] of grating, and wherein n is the raster count that can depict in moving grating length.
2. ultrahigh resolution grating chi according to claim 1 is characterized in that, the photosensitive region length of described line array CCD sensor (3) is more than or equal to (2) length of moving grating.
3. ultrahigh resolution grating chi according to claim 1 and 2 is characterized in that, the photosensitive unit distance of described line array CCD sensor (3) equals the pitch of moving grating (2).
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105091747A (en) * 2015-05-29 2015-11-25 中国计量学院 Vernier grating ruler
CN104359409B (en) * 2014-11-27 2017-02-22 上海电力学院 Optics-based high-precision displacement sensor
CN106931893A (en) * 2017-03-10 2017-07-07 黄攸平 The method that grating thin slice pitch is accurately measured based on refraction principle
CN108895970A (en) * 2018-07-13 2018-11-27 重庆理工大学 A kind of straight-line displacement measuring system based on alternation light field
CN112595239A (en) * 2020-12-11 2021-04-02 中车长春轨道客车股份有限公司 Positioning system for automatic coating operation of railway vehicle

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1431458A (en) * 2003-01-20 2003-07-23 重庆工学院 Grid type displacement transducer
JP2004028667A (en) * 2002-06-24 2004-01-29 Mitsutoyo Corp Photoelectric encoder and method of manufacturing scale
EP2189804A1 (en) * 2008-11-21 2010-05-26 Sick Ag Optoelectronic sensor and method for measuring distance according to time-of-flight
CN101872065A (en) * 2010-06-11 2010-10-27 南京中科天文仪器有限公司 Combined raster scanning system of photoelectric shaft angle encoder
CN102095379A (en) * 2010-08-27 2011-06-15 中国科学院长春光学精密机械与物理研究所 Absolute grating scale
CN102359760A (en) * 2011-08-22 2012-02-22 广东万濠精密仪器股份有限公司 Soft-collision grating scale and measuring method thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004028667A (en) * 2002-06-24 2004-01-29 Mitsutoyo Corp Photoelectric encoder and method of manufacturing scale
CN1431458A (en) * 2003-01-20 2003-07-23 重庆工学院 Grid type displacement transducer
EP2189804A1 (en) * 2008-11-21 2010-05-26 Sick Ag Optoelectronic sensor and method for measuring distance according to time-of-flight
CN101872065A (en) * 2010-06-11 2010-10-27 南京中科天文仪器有限公司 Combined raster scanning system of photoelectric shaft angle encoder
CN102095379A (en) * 2010-08-27 2011-06-15 中国科学院长春光学精密机械与物理研究所 Absolute grating scale
CN102359760A (en) * 2011-08-22 2012-02-22 广东万濠精密仪器股份有限公司 Soft-collision grating scale and measuring method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104359409B (en) * 2014-11-27 2017-02-22 上海电力学院 Optics-based high-precision displacement sensor
CN105091747A (en) * 2015-05-29 2015-11-25 中国计量学院 Vernier grating ruler
CN106931893A (en) * 2017-03-10 2017-07-07 黄攸平 The method that grating thin slice pitch is accurately measured based on refraction principle
CN108895970A (en) * 2018-07-13 2018-11-27 重庆理工大学 A kind of straight-line displacement measuring system based on alternation light field
CN108895970B (en) * 2018-07-13 2020-07-24 重庆理工大学 Linear displacement measurement system based on alternating light field
CN112595239A (en) * 2020-12-11 2021-04-02 中车长春轨道客车股份有限公司 Positioning system for automatic coating operation of railway vehicle

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