CN103227082A - X-ray emitting device and X-ray generating method - Google Patents

X-ray emitting device and X-ray generating method Download PDF

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CN103227082A
CN103227082A CN2012105635399A CN201210563539A CN103227082A CN 103227082 A CN103227082 A CN 103227082A CN 2012105635399 A CN2012105635399 A CN 2012105635399A CN 201210563539 A CN201210563539 A CN 201210563539A CN 103227082 A CN103227082 A CN 103227082A
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ray
photocathode
light source
plate target
ray emitter
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CN103227082B (en
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陈垚
郑海荣
陈婷
桂建保
蒋昌辉
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Shenzhen Institute of Advanced Technology of CAS
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Shenzhen Institute of Advanced Technology of CAS
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Abstract

An X-ray emitting device includes a control circuit and a plurality of independently controlled optical paths, wherein each optical path includes an ordinary light source used for emitting light rays with the specific wavelength coverage, an optical module used for focusing light rays emitted by the ordinary light source, a photocathode used in light excitation electrons, an electron beam focusing structure used for focusing electron beams generated by the photocathode, an anode target bombarded by accelerated electrons and generating X-rays through braking radiation, an X-ray exit window and an ordinary light incidence window both arranged on a vacuum container, and the vacuum container used for encapsulating the photocathode, the electron beam focusing structure and the anode target. The X-ray emitting device can be used for integrating a plurality of X-rays into one X-ray emitting device, and has the advantages of high time resolution, programmable operation, impulse type emission, changeable size and shape of the emitting area, simplicity in switching under a high voltage, low switching difficulty, simplicity in heat dissipation of the anode target and relatively simple structure. The invention further provides an X-ray generating method.

Description

X ray emitter and X ray production method
[technical field]
The present invention relates to a kind of X ray emitter, particularly relate to a kind of X ray emitter and X ray production method that is used for medical/industrial CT system and micro-CT.
[background technology]
The x-ray imaging technology, the character of promptly utilizing X ray can penetrating material and decay according to the size of penetrator quality, realize noninvasive imaging by the attenuation degree of detecting x-ray to internal structure of body, it comprise X ray camera work (Radiography) and X ray computer tomography technology (Computed Tomography, CT).Wherein, the CT technology is to measure the imaging technique that obtains object cross section information by the ray projection that object is carried out different visual angles.The CT system comprises critical pieces such as X ray emitter, X-ray detector, frame, and wherein the X ray emitter is made the generation device of X ray, is one of key core parts of CT system.
The needed X ray energy ranges of imaging system such as medical/industry CT and micro-CT are usually from tens kilo electron volts to the hundreds of kilo electron volt, and the X ray emitter of its equipment adopts high-velocity electron beam bombardment plate target to produce the principle of X ray usually.Promptly in vacuum tank, by the strong electronic beam current of a constant current of electron source emission, and under the effect of high voltage electric field, obtain quickening the bombardment plate target.Plate target is made of the high metal of atomic number usually, slows down behind the electron bombard plate target, produces X ray by the bremstrahlen process.
Constantly the CT system of development has higher requirement to the x-ray source as core component.For example, the novel static scanning CT system that grows up recently requires x-ray source to have the characteristics of space, time emission able to programme.The traditional CT system adopts single x-ray source usually, relies on mechanical rotation, promptly passes through the right rotation of x-ray source/detector or the rotation of scanned object, realizes the X-ray scanning of different angles.And novel static scanning CT system uses and covers X ray emitter certain angular field of view, static, the emission able to programme of the location and time by X ray, the obtaining of X ray transmission image of realizing different visual angles.Static scanning CT system has reduced the cost and the complexity of CT system owing to need not mechanical rotation.Simultaneously, x-ray source can be ignored switching time, thus just equal the time for exposure sweep time, thereby farthest shortened sweep time.This new CT system requirements X ray emitter has the structure of compacting, and promptly requires the X-ray beam of a plurality of independent controls can effectively be integrated in the single X ray emitter.
Simultaneously, the CT system is in particular for the CT system of dynamic imaging (as the cardiopulmonary imaging), produces because scanned object or patient because the pseudo-shadow that motion produces, have very high requirement to the time resolution of x-ray source in order to reduce.The CT system expects also that for the consideration of shortening sweep time and improving the radiation dose utilance x-ray source has higher time resolution.
The design of traditional X ray emitter mainly contains two kinds:
(1) traditional X ray emitter adopts hot cathode as electron emission source, and by the thermionic emission emitting electrons, electronics is subjected to quickening the bombardment plate target and produces X ray.The filament that its negative electrode is normally made by tungsten produces heat when galvanization, electronics is heated and obtains the energy effusion.Electronics is under the acceleration of electric field, and the bombardment plate target produces X ray by the bremstrahlen process.
(2) in recent years a kind of novel field emission X ray emitter of development, adopt cold cathode as electron emission source, be that negative electrode (for example carbon nano-tube film) is under the effect of high voltage electric field, produce electronics by field emission mechanism, electronics is subjected to quickening the bombardment plate target and produces X ray (as patent CN200710025641.2, field-emissive cathode X ray tube).This kind X ray emitter adopts two utmost point formulas and three-pole structure usually.Emissions X-ray tube in two utmost point formula fields adopts negative electrode to add the structure of anode, and negative electrode is emitting electrons under the effect of the high voltage electric field that anode voltage provides, thereby and obtains quickening the bombardment plate target and produce X ray.Three-pole field emission X-ray tube adds independently electrode between negative electrode and anode, be called grid, is used for applied field and launches needed electric field.By opening or closing the grid electric field, but moment activate or interrupt the emission of electron beam, can realize able to programme, the pulsed emission of X ray.Such radiographic source adopts certain focusing electrode to be used to retrain electron beam usually, thereby obtains littler focal spot.Because the existence of grid, often being limited to of this type of X-ray tube adopts anode to connect positive high voltage, and earthed-cathode high pressure inserts design.
For the traditional X-ray ray emission device that adopts the thermionic emission principle,, be difficult to a plurality of negative electrodes are integrated in the single X ray emitter because hot cathode has own characteristics such as working temperature height, power consumption be big.Simultaneously, because hot cathode can't heat up or cool off suddenly, electronic beam current is break-make at any time, thereby temporal resolution is limited, can't carry out X ray emission able to programme, pulsed.Owing to can't carry out the accurate exposure of X ray, also just can't obtain the very utilance of radiation dose.
Field-transmitting cathode in the field emission X ray emitter is because working temperature is low, and power consumption is little, easily a plurality of negative electrodes is integrated in the single X ray emitter.Each negative electrode in the vacuum tank of X ray emitter is furnished with independent control electrode and is used to realize successively, programmable X ray emission.Grid electric field by closing certain negative electrode correspondence or make the unsettled method of certain cathode electrode, the emission of the electron beam of this negative electrode of instantaneous interruption, thereby realize a plurality of negative electrodes independently, successively, able to programme, pulsed X ray emission.Simultaneously, such X ray control mode has limited the high pressure access way of x-ray source greatly, promptly be confined to adopt anode to connect positive high voltage, and earthed-cathode design, it is complicated more to make high pressure insert like this.Simultaneously, because plate target inserts high pressure, increased the difficulty of plate target heat radiation greatly.
In addition, the size and the shape in the cathode emission zone of an emission X ray emitter are changeless, cannot change with requiring, thereby the configuration variation that depends on focusing electrode etc. change the characteristic of focal spot.Simultaneously, this kind X ray emitter often need be controlled the emission of X ray by grid.More than these have all increased a complexity of emission X ray emitter.
[summary of the invention]
In view of above-mentioned condition, the present invention proposes a kind of with the X ray emitter that can launch multiple beam X ray of photocathode as electron emission source.This invention can overcome traditional X-ray ray emission device and be difficult to realize that the multi beam X ray is integrated in single X ray emitter, and temporal resolution is limited, can't carry out shortcomings such as able to programme, pulsed X ray emission; Simultaneously, also overcome an emission x-ray source and need additionally insert control electrode be used for the control emission in vacuum tank, the size in cathode emission zone and shape can't be controlled at any time, and it is big that high pressure inserts difficulty, and plate target is difficult for the shortcoming of heat radiation and structure relative complex.
A kind of X ray emitter comprises control circuit and a plurality of independent light path of controlling, and each light path comprises ordinary light source, optical module, normal optical entrance window, photocathode, electron beam focusing structure, plate target, X ray exit window and vacuum tank;
Described control circuit is used to control the operating state of the ordinary light source of described a plurality of light paths;
Described ordinary light source is used to launch the light of particular range of wavelengths;
Described optical module is used for the light of described ordinary light source emission is focused on;
Described normal optical entrance window is located on the described vacuum tank, and described normal optical entrance window is used for seeing through the light of described particular range of wavelengths;
Described photocathode is used for the optical excitation electronics;
Described electron beam focusing structure is used for the electron beam that described photocathode produces is focused on;
Described plate target is subjected to the bombardment of accelerated electron and produces X ray by bremstrahlen;
Described X ray exit window is located on the described vacuum tank, and described X ray exit window is used for transmitted X-rays; And
Described vacuum tank is used to encapsulate described photocathode, electron beam focusing structure and plate target;
Wherein, the light of described ordinary light source emission after described optical module focusing, shines on the described photocathode through described normal optical entrance window, and described photocathode is subjected to optical excitation and produces electronics; Described electron beam under the constraint of described electron beam focusing structure, and under the acceleration of high voltage electric field the described plate target of bombardment, make described plate target produce X ray.
Compared to traditional X ray emitter, above-mentioned X ray emitter has the following advantages at least:
(1) above-mentioned X ray emitter is compared traditional X-ray ray emission device and is had higher range of application and value.Above-mentioned X ray emitter utilizes photoelectric effect mechanism to produce X ray, a plurality of independent X-ray beams can be integrated in the single x-ray source emitter, and adopt photocathode especially the high current density photocathode as electron emission source, its electronic beam current can instantaneous break-make, make X ray emission have high temporal resolution, can realize independently, successively, able to programme, pulsed emission.Because the accurate control that it can realize the X ray exposure also just can farthest utilize radiation dose.
(2) above-mentioned X ray emitter is compared an emission X ray emitter, has the relative characteristic of simple of project organization, can reduce cost.By changing the outer optical module of vacuum tank, just can change the size and shape of the irradiation area of photocathode, thereby change the size and shape of focal spot on the plate target indirectly.Owing to need not as field emission X ray emitter, to introduce focusing electrode and grid, significantly reduced the complexity and the cost of X ray emitter.Field emission X ray emitter often adopts anode to connect positive high voltage, earthed-cathode design in order to realize the control of X ray emission, and it is complicated more to make high pressure insert like this.Simultaneously, because plate target is in high voltage, the also complicated greatly difficulty of plate target heat radiation.Comparatively speaking, the present invention does not have such structural limitations, thereby makes high pressure access and plate target dispel the heat convenient.
Among embodiment, described ordinary light source is laser generator, laser diode, fiber laser or high brightness LED therein.
Therein among embodiment, the particular value of described ordinary light source wavelength or particular range make the photon of selected certain specific wavelength or particular range of wavelengths can make the photoelectric conversion efficiency of the photocathode material of X-ray tube employing reach maximum or suitable value by the constituent material characteristic decision of described photocathode.
Among embodiment, described photocathode adopts alkali metal, negative electron affinity III-V family's semiconducting compound or metal therein.
Among embodiment, the packing forms of described vacuum tank is glass packaging, cermet encapsulation or adopts the metal vacuum cavity that can keep certain condition of high vacuum degree therein.
Among embodiment, the vacuum ranges of described vacuum tank is smaller or equal to 10 therein -6Millimetres of mercury is more than or equal to 10 -11Millimetres of mercury.
Among embodiment, described normal optical incidence window is made by optical glass therein.
Among embodiment, described optical glass is that quartz glass, K9 glass, molybdenum glass or simple glass are made therein.
Among embodiment, described X ray outgoing window is made of the material of low atomic number therein.
Among embodiment, the material of described low atomic number is a metallic beryllium therein.
Therein among embodiment, the surface of described photocathode and horizontal direction angular range be from more than or equal to 5 degree smaller or equal to 85 degree, the surface of described plate target and horizontal direction angular range be to spend smaller or equal to 15 more than or equal to 5 to spend.
Therein among embodiment, be connected to high voltage between described photocathode and the plate target, described high-tension high pressure connection connects positive high voltage for (1) anode, and negative electrode connects negative high voltage, (2) anode connects positive high voltage, minus earth or (3) plus earth, negative electrode connects negative high voltage.
Among embodiment, described electron beam focusing structure has the formula of crowding around structure therein, and its current potential equates with described photocathode or be close, with the photoelectron of the form focus divergent of electrostatic lens.
Simultaneously, the present invention also provides a kind of X ray production method.
A kind of X ray production method, it adopts above-mentioned X ray emitter, it is characterized in that, and described X ray production method comprises the steps:
Control the open and close of the ordinary light source of described a plurality of light paths by described control circuit, thereby realize the emission of X ray in the zone of plate target correspondence indirectly, so realize the multi beam X ray independently, successively, able to programme, pulsed emission; Or
By changing the outer optical module of described vacuum tank, change the size and shape of the irradiation area of described photocathode, thereby change the size and shape of focal spot on the described plate target; Or
Control the light intensity magnitude of the ordinary light source of described a plurality of light paths by described control circuit, thereby adjust the intensity of X ray.
[description of drawings]
Fig. 1 is the control schematic diagram of the X ray emitter of embodiment of the present invention;
Fig. 2 is certain light channel structure schematic diagram of controlling separately of X ray emitter shown in Figure 1.
[embodiment]
For the ease of understanding the present invention, with reference to relevant drawings the present invention is described more fully below.Provided preferred embodiment of the present invention in the accompanying drawing.But the present invention can realize with many different forms, be not limited to embodiment described herein.On the contrary, provide the purpose of these embodiment be make the understanding of disclosure of the present invention comprehensively thorough more.
Need to prove that when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be to be directly connected to another element or may to have element placed in the middle simultaneously.Term as used herein " vertical ", " level ", " left side ", " right side " and similar statement are just for illustrative purposes.
Unless otherwise defined, the employed all technology of this paper are identical with the implication that belongs to those skilled in the art's common sense of the present invention with scientific terminology.Employed term is not intended to be restriction the present invention just in order to describe the purpose of specific embodiment in specification of the present invention herein.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
See also Fig. 1 and Fig. 2, ordinary light source group, optical module 120, vacuum tank 140, normal optical entrance window 150, photocathode 160, electron beam focusing structure 170, plate target 180 and X ray exit window 190 that the X ray emitter 100 of embodiment of the present invention comprises control circuit 110, is made up of ordinary light source 120, as shown in Figure 1.This X ray emitter 100 logically can be " light path 101 " of a plurality of independent controls of branch, the i.e. ordinary beam of light of sending by ordinary light source 120, irradiates light negative electrode 160 certain zone, produce electron beam, target region on the plate target 180 of bombardment correspondence produces X-ray beam and transmitted X-rays exit window 190.Fig. 2 is the structural representation of certain independent light path 101.
In other words, X ray emitter 100 comprises the light path 101 of control circuit 110 and a plurality of independent controls.Each light path 101 comprises ordinary light source 120, optical module 130, vacuum tank 140, normal optical entrance window 150, photocathode 160, electron beam focusing structure 170, plate target 180 and X ray exit window 190.
Control circuit 110 is used for the operating state of the control ordinary light source 120 of a plurality of light paths 101.Ordinary light source 120 is used to launch the light of particular range of wavelengths.Optical module 13 is used for the light of ordinary light source 120 emissions is focused on.Normal optical entrance window 150 is located on the vacuum tank 140, and normal optical entrance window 150 is used for seeing through the light of particular range of wavelengths.Photocathode 160 is used for the optical excitation electronics.Electron beam focusing structure 170 is used for the electron beam that photocathode 160 produces is focused on.Plate target 180 is subjected to the bombardment of accelerated electron and the bremstrahlen process produces X ray.X ray exit window 190 is located on the vacuum tank 140, and X ray exit window 190 is used for transmitted X-rays.Vacuum tank 140 is used to encapsulate photocathode 160, electron beam focusing structure 170 and plate target 180.Wherein, the light of ordinary light source 120 emissions after optical module 130 focusing, shines on the photocathode 160 through normal optical entrance window 150, and photocathode 160 is subjected to optical excitation and produces electronics; Electron beam under the constraint of electron beam focusing structure 170, and under the acceleration of high voltage electric field bombardment plate target 180, make plate target 180 produce X ray.
Need to prove, vacuum tank 140 in a plurality of light paths 101, normal optical entrance window 150, photocathode 160, electron beam focusing structure 170, plate target 180 and X ray exit window 190 can be distinguished setting separately, also can be shared one, for example, the photocathode 160 of a plurality of light paths 101 is a monoblock photocathode.
The working mechanism of this X ray emitter 100 is as follows, can realize the multi beam X ray independently, successively, the emission of able to programme, pulsed X ray: by control circuit 110 certain light path 101 of control ordinary light source 120 send the light beam of specific wavelength or certain wave-length coverage, this light beam via optical module 130 reflect, after the focusing etc., by the normal optical entrance window 150 on the vacuum tank 140, enter vacuum tank 140 and be radiated on the photocathode 160.Photocathode 160 adopts photocathode 160 materials with high current density characteristic, after photocathode 160 is subjected to this light beam irradiates, launch electronics by photoelectric effect mechanism, electronic beam current is under the constraint of electron beam focusing structure 170, under the effect of the high voltage electric field that plate target 180 produces, obtain quickening and bombardment plate target 180 simultaneously.Slowing down in electron bombard plate target 180 backs, produces X ray by the bremstrahlen process, and last X ray is by outside the X ray exit window 190 output vacuum tanks 140.Ordinary beam of light is controlled by certain knot control circuit 110 according to the control principle of ordinary light source 120.By the effect of control circuit 110, can adjust the light intensity magnitude of ordinary light source 120, thereby adjust the intensity of X ray indirectly.By control to circuit, just can control the instantaneous unlatching of ordinary light source 120 or close, make that photocathode 160 obtains activating or closing, thereby control is by the unlatching of the X ray of the generation of plate target 180 or close indirectly.By control circuit 110 realize independently, the unlatching of ordinary light sources successively, in programmable a plurality of light paths 101 or close, the emission of the X ray of corresponding target region on the realization plate target 180 that just can be indirect, thus finally realize the multi beam X ray independently, successively, able to programme, pulsed X ray emission.
Below specify the structure of each parts of above-mentioned X ray emitter 100:
Ordinary light source 120 can be launched the light of particular range of wavelengths, its can for but be not limited to laser generator, laser diode, fiber laser, high brightness LED etc.The particular value of the wavelength of ordinary light source 120 emissions or particular range are by the constituent material characteristic decision of photocathode 160, and the photon of promptly selected certain specific wavelength or particular range of wavelengths can make the photoelectric conversion efficiency of photocathode 160 materials of X-ray tube employing reach maximum or be suitable for value.Photoelectric conversion efficiency reaches great situation and includes but not limited to following situation: when photocathode 160 adopts alkali metal, can adopt He-Ne laser or Ar ion laser as ordinary light source 120; When photocathode 160 adopted negative electron affinity III-V family semiconducting compound, available frequency multiplication aluminium-yttrium aluminium garnet laser was as ordinary light source 120; When photocathode 160 was metal, available KrF excimer laser or ArF excimer laser were as ordinary light source 120.Situation for the above photocathode of enumerating 160, the laser diode of also available respective wavelength peak value or fiber laser or high brightness LED as common instead of lasers as ordinary light source 120, thereby reach photocathode 160 electron emission densities that need.
Photocathode 160, electron beam focusing structure 170, plate target 180 are encapsulated in the vacuum tank 140 of a high vacuum.Vacuum tank 140 can be taked glass packaging, cermet encapsulation equal vacuum packing forms, also can adopt the metal vacuum cavity that can keep certain condition of high vacuum degree.The vacuum degree of vacuum tank 140 is decided according to the characteristic of photocathode 160, and vacuum ranges can be for smaller or equal to 10 -6Millimetres of mercury is more than or equal to 10 -11Millimetres of mercury.
Normal optical entrance window 150 is installed on the vacuum tank 140, and it is made of the material that can see through the specific wavelength normal optical, can be but is not limited to quartz glass.The X ray exit window is installed on the vacuum tank 140 for 190 mouthfuls, and its material by high X ray penetrance constitutes, and can be but is not limited to metallic beryllium.
Photocathode 160 and plate target 180 equal tiltable settings, for example, photocathode 160 surfaces are to spend smaller or equal to 85 more than or equal to 5 degree with the horizontal direction angular range, plate target 180 surfaces are smaller or equal to 15 degree more than or equal to 5 degree with the horizontal direction angular range.
Photocathode 160 can be made of the photocathode material of big emission density, and selects for use the good material of electrical and thermal conductivity performance as substrate.Photocathode 160 materials can be selected for use but the compound semiconductor materials that is not limited to be made up of alkali metal, if any antimony cesium compound (Cs3-Sb), and two base materials (K2-Cs-Sb) and polybase material (Na-K-Cs-Sb); Negative electron affinity III-V family semiconducting compound, as GaAs (Cs, O2), GaAs (Cs, F); Metal material, as Al, Cu, Zn, Na, Cu-Be, stainless steel 304 etc.
Electron beam focusing structure 170 is made of conductive material, and conductive material includes but not limited to materials such as stainless steel, oxygen-free copper.Electron beam focusing structure 170 has the formula of crowding around structure, and its current potential equates with photocathode or be close, with the photoelectron of the form focus divergent of electrostatic lens, thus the constraint electron beam, on plate target 180, to obtain the focal spot of moderate size.
Plate target 180 is made of the high metal of atomic number, includes but not limited to metals such as tungsten, molybdenum, copper, and closely contacts to improve the rate of heat dissipation of plate target 180 by technologies such as welding, inlay and heat sink material (comprise and be not limited to oxygen-free copper, alloy material).
Be connected to high voltage between photocathode 160 and the plate target 180, voltage range according to the application demand difference from 20 kilo electron volt to 500 kilo electron volts.High voltage can adopt a kind of of following three kinds of high pressure connections: the I. anode connects positive high voltage, and negative electrode connects negative high voltage; II. anode connects positive high voltage, minus earth; III. plus earth, negative electrode connects negative high voltage.
The light that ordinary light source 120 sends, through optical module 130 carry out light beam reflection, process such as converge, on photocathode 160, form a certain size, the hot spot of shape.The photoelectric effect phenomenon under the exciting of normal optical, takes place in photocathode 160 irradiated zones, and promptly photon has certain probability to convert photoelectron to.The photoelectron that the irradiation area of photocathode 160 produces, its current strength scope can be from several micromicroamperes to the hundreds of milliampere.Photoelectron focuses under the effect of electron beam focusing structure 170, and draws acceleration under the effect of electric field that anode electric field produces, and bombardment plate target 180 forms the focal spot of a certain size shape, and logical bremsstrahlung mechanism emission X ray.The X-ray beam that sends from focal spot region penetrates from the X ray exit window 190 of vacuum tank 140.
By adjusting optical module 130 configurations, just can change the size and shape of the irradiation area of photocathode 160 easily, thus the area size and the shape of focal spot on the indirect change plate target 180.So just can under the situation of the configuration in not changing light source and vacuum tank 140, adjust the parameter of the focal spot of X ray emitter 100.
Ordinary light source 120 can relatively easily be controlled by control circuit 110.By the effect of control circuit 110, can adjust the light intensity magnitude of ordinary light source 120, thereby adjust the intensity of X ray.Can easily control the instantaneous unlatching of ordinary light source 120 or close by control circuit 110.The instantaneous irradiation or the disappearance of ordinary beam of light, with the instantaneous electron beam that excites or close photocathode 160, thereby indirectly control is by the unlatching of the X ray of the generation of plate target 180 or close.By control circuit 110 realize independently, successively, in the programmable ordinary light source group ordinary light source 120 unlatching or close, the emission of the X ray in the zone of realization plate target 180 correspondences that just can be indirect, thus finally realize the multi beam X ray independently, successively, the emission of able to programme, pulsed.
Need to prove that in the present embodiment, photocathode 160 can be the reflecting light negative electrode, also can be the transmission-type photocathode.Plate target 180 can be reflective plate target design, also can be substituted with the design of transmission anode target.Plate target 180 can be the fixed anode design, also can substitute with the rotatable anode target.Electron beam focusing structure 170 can be interpolation or replace with electrostatic lens (including but not limited to single or multiple focusing electrodes), also can be to add or replace with magnetic lens (including but not limited to permanent magnet or magnetic solenoid), also can be to add or replace with the electromagnetic lens of being made up of electrostatic lens and magnetic lens.
Compared to traditional X ray emitter, above-mentioned X ray emitter 100 has the following advantages at least:
(1) above-mentioned X ray emitter 100 is compared traditional X-ray ray emission device and is had higher range of application and value.Above-mentioned X ray emitter 100 utilizes photoelectric effect mechanism to produce X ray, a plurality of independent X-ray beams are integrated in the single x-ray source emitter, and adopt photocathode 160 especially high current density photocathode 160 as electron emission source, its electronic beam current can instantaneous break-make, make X ray emission have high temporal resolution, can realize independently, successively, able to programme, pulsed emission.Because the accurate control that it can realize the X ray exposure also just can farthest utilize radiation dose.
(2) above-mentioned X ray emitter 100 is compared an emission X ray emitter, has the relative characteristic of simple of project organization, can reduce cost.Above-mentioned X ray emitter 100 just can change the size and shape of the irradiation area of photocathode 160, thereby change the size and shape of focal spot on the plate target 180 indirectly by changing the optical module 130 outside the vacuum tank 140.Owing to need not as field emission X ray emitter, to introduce focusing electrode and grid, significantly reduced the complexity and the cost of X ray emitter 100.Field emission X ray emitter often adopts anode to connect positive high voltage, earthed-cathode design in order to realize the control of X ray emission, and it is complicated more to make high pressure insert like this.Simultaneously, because plate target 180 is in high voltage, the also complicated greatly difficulty of plate target 180 heat radiations.Comparatively speaking, the present invention does not have such structural limitations, thereby makes high pressure access and plate target 180 dispel the heat convenient.
Simultaneously, the present invention also provides a kind of X ray production method.
A kind of X ray production method, it adopts above-mentioned X ray emitter, and the X ray production method comprises the steps:
The open and close of the ordinary light source 120 by a plurality of light paths 101 of control circuit 110 control, thus realize the emission of X ray in the zone of plate target 180 correspondences indirectly, and then realize the multi beam X ray independently, successively, able to programme, pulsed emission; Or
By changing the optical module 130 outside the vacuum tank 140, change the size and shape of the irradiation area of photocathode 160, thereby change the size and shape of focal spot on the plate target 180; Or
Control the light intensity magnitude of the ordinary light source 120 of a plurality of light paths 101 by control circuit 110, thereby adjust the intensity of X ray.
The above embodiment has only expressed several execution mode of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection range of patent of the present invention should be as the criterion with claims.

Claims (14)

1. X ray emitter, it is characterized in that, comprise the light path of control circuit and a plurality of independent controls, each light path comprises ordinary light source, optical module, normal optical entrance window, photocathode, electron beam focusing structure, plate target, X ray exit window and vacuum tank;
Described control circuit is used to control the operating state of the ordinary light source of described a plurality of light paths;
Described ordinary light source is used to launch the light of particular range of wavelengths;
Described optical module is used for the light of described ordinary light source emission is focused on;
Described normal optical entrance window is located on the described vacuum tank, and described normal optical entrance window is used for seeing through the light of described particular range of wavelengths;
Described photocathode is used for the optical excitation electronics;
Described electron beam focusing structure is used for the electron beam that described photocathode produces is focused on;
Described plate target is subjected to the bombardment of accelerated electron and produces X ray by bremstrahlen;
Described X ray exit window is located on the described vacuum tank, and described X ray exit window is used for transmitted X-rays; And
Described vacuum tank is used to encapsulate described photocathode, electron beam focusing structure and plate target;
Wherein, the light of described ordinary light source emission after described optical module focusing, shines on the described photocathode through described normal optical entrance window, and described photocathode is subjected to optical excitation and produces electronics; Described electron beam under the constraint of described electron beam focusing structure, and under the acceleration of high voltage electric field the described plate target of bombardment, make described plate target produce X ray.
2. X ray emitter as claimed in claim 1 is characterized in that, described ordinary light source is laser generator, laser diode, fiber laser or high brightness LED.
3. X ray emitter as claimed in claim 1, it is characterized in that, the particular value of described ordinary light source wavelength or particular range make the photon of selected certain specific wavelength or particular range of wavelengths can make the photoelectric conversion efficiency of the photocathode material of X-ray tube employing reach maximum or suitable value by the constituent material characteristic decision of described photocathode.
4. X ray emitter as claimed in claim 3 is characterized in that, described photocathode adopts alkali metal, negative electron affinity III-V family's semiconducting compound or metal.
5. X ray emitter as claimed in claim 1 is characterized in that, the packing forms of described vacuum tank is glass packaging, cermet encapsulation or adopts the metal vacuum cavity that can keep certain condition of high vacuum degree.
6. X ray emitter as claimed in claim 1 is characterized in that, the vacuum ranges of described vacuum tank is smaller or equal to 10 -6Millimetres of mercury is more than or equal to 10 -11Millimetres of mercury.
7. X ray emitter as claimed in claim 1 is characterized in that, described normal optical incidence window is made by optical glass.
8. X ray emitter as claimed in claim 7 is characterized in that, described optical glass is quartz glass, K9 glass, molybdenum glass or simple glass.
9. X ray emitter as claimed in claim 1 is characterized in that, described X ray outgoing window is made of the material of low atomic number.
10. X ray emitter as claimed in claim 9 is characterized in that, the material of described low atomic number is a metallic beryllium.
11. X ray emitter as claimed in claim 1, it is characterized in that, the surface of described photocathode and horizontal direction angular range be from more than or equal to 5 degree smaller or equal to 85 degree, the surface of described plate target and horizontal direction angular range be to spend smaller or equal to 15 more than or equal to 5 to spend.
12. X ray emitter as claimed in claim 1, it is characterized in that, be connected to high voltage between described photocathode and the plate target, described high-tension high pressure connection connects positive high voltage for (1) anode, negative electrode connects negative high voltage, (2) anode connects positive high voltage, minus earth or (3) plus earth, negative electrode connects negative high voltage.
13. X ray emitter as claimed in claim 1 is characterized in that, described electron beam focusing structure has the formula of crowding around structure, and its current potential equates with described photocathode or be close, with the photoelectron of the form focus divergent of electrostatic lens.
14. an X ray production method, it adopts as each described X ray emitter of claim 1 ~ 13, it is characterized in that described X ray production method comprises the steps:
Control the open and close of the ordinary light source of described a plurality of light paths by described control circuit, thereby realize the emission of X ray in the zone of plate target correspondence indirectly, so realize the multi beam X ray independently, successively, able to programme, pulsed emission; Or
By changing the outer optical module of described vacuum tank, change the size and shape of the irradiation area of described photocathode, thereby change the size and shape of focal spot on the described plate target; Or
Control the light intensity magnitude of the ordinary light source of described a plurality of light paths by described control circuit, thereby adjust the intensity of X ray.
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