CN208336145U - A kind of scan-type x-ray source and its imaging system - Google Patents
A kind of scan-type x-ray source and its imaging system Download PDFInfo
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- CN208336145U CN208336145U CN201821016550.2U CN201821016550U CN208336145U CN 208336145 U CN208336145 U CN 208336145U CN 201821016550 U CN201821016550 U CN 201821016550U CN 208336145 U CN208336145 U CN 208336145U
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Abstract
The utility model discloses a kind of scan-type x-ray source and its imaging systems.The scan-type x-ray source includes vacuum cavity, a cathode and multiple anode target structures are provided in vacuum cavity, position in vacuum cavity close to cathode is provided with grid, position in vacuum cavity close to grid is provided with focusing electrode, and the periphery of vacuum cavity is simultaneously provided with deflection coil close to the position of grid.This scan-type x-ray source generates electron beam by using a cathode, and the on-off of electron beam is controlled by grid, and control of the deflection coil to beam motion direction, corresponding target surface is bombarded one by one according to preset rules to realize, to complete the switching between multifocal, not only increase the efficiency of this scan-type x-ray source, demand of the imaging system to scan-type x-ray source and the image for obtaining multiple projection angles is also met, and solves the problems, such as to generate mechanical movement artifact when realizing x-ray source rotation or translation using movement mechanism.
Description
Technical field
The utility model relates to a kind of scan-type x-ray source, also relate to include the scan-type x-ray source imaging system
System, belongs to radiography field.
Background technique
In conventional radiation imaging field, it usually needs obtain the throwing of multiple angles according to figure, such as TOMO
(Tomothynthesis, X-ray layer radiography) imaging system, reversed geometry imaging system (Inversion Geometry),
CT (Computed Tomography, computed tomography) imaging system etc..
The mode that different imaging systems has its different obtains the image of multiple projection angles to realize.Such as TOMO at
It as system, rotates or translates using by x-ray source, realize and exposed in different angles or displacement to obtain multiple throw according to angle
The image of degree.Reversed geometry imaging system is then using face battle array multiple focal spot x-ray source to obtain the projected image of different angle.It is main
The CT imaging system of stream is then the projected image by x-ray source and detector high speed rotation to obtain multiple angles.And it is of new generation
Static CT imaging system be then the twin nuclei for having used detector rings and radiographic source ring, be uniformly distributed on radiographic source ring more
A x-ray source, each x-ray source have corresponded to the perspective view of an angle.
Therefore, under the application scenarios of multiple projection angle images, in system design still in a manner of mobile x-ray source
It is in the majority.It is not difficult to find that the mode of multiple focal spot x-ray source has more obvious advantage；Also, it is obtained using mobile X-ray source
When the image of multiple projection angles, need to realize x-ray source rotation or translation using movement mechanism, to be easy to produce mechanical fortune
Dynamic artifact, influences the quality of reconstruction image.
Summary of the invention
Primary technical problem to be solved in the utility model is to provide a kind of scan-type x-ray source.
Another technical problem to be solved in the utility model is to provide a kind of including above-mentioned scan-type x-ray source
Imaging system.
To achieve the goals above, the utility model adopts the following technical solutions:
According to the utility model embodiment in a first aspect, providing a kind of scan-type x-ray source, including vacuum cavity, institute
It states and is provided with a cathode and multiple anode target structures in vacuum cavity, the position in the vacuum cavity close to the cathode is set
It is equipped with grid, the position of the close grid is provided with focusing electrode in the vacuum cavity, and the periphery of the vacuum cavity is simultaneously leaned on
The position of the nearly grid is provided with deflection coil；
The electron beam that the cathode generates successively is passed through the focusing of the focusing electrode, the deflection wire by the control grid
After the direction of motion control of circle, the target surface of the corresponding anode target structure is bombarded one by one according to preset rules, and from the target
The bombardment side in face generates X-ray, forms the multiple focuses arranged according to default spread geometry.
Wherein more preferably, when use, at least one described anode target structure generates and is emitted narrow beam X-ray, and the anode
When target structure is shot at the target using Integral back, the upper surface that the Integral back is shot at the target is provided with radiating block, the radiating block it is upper
Surface is provided with steel plate, is placed with multiple collimating apertures according to linear array form on the steel plate, and the collimating aperture corresponds to a beryllium
Window forms the exit portal of multiple X-rays.
Wherein more preferably, when use, at least one described anode target structure generates and is emitted narrow beam X-ray, and the anode
When target structure is arranged in the form of an array, the anode target structure uses independent individual formula reflecting target, the independent individual formula reflection
The upper surface of target is provided with radiating block, and the upper surface of the radiating block is provided with steel plate, corresponds to the independence on the steel plate
Individual formula reflecting target is provided with collimating aperture, and the collimating aperture corresponds to a beryllium window, forms the exit portal of multiple X-rays.
Wherein more preferably, the collimating aperture is embedded in the steel plate, and the beryllium window is embedded in the radiating block and the steel
On plate and run through the corresponding collimating aperture.
Wherein more preferably, when use, at least one described anode target structure generates and is emitted wide beam X-ray, and the anode
When target structure is shot at the target using Integral back, the lower surface that the Integral back is shot at the target is provided with radiating block, the monoblock type reflection
The upper surface of target is provided with steel plate, is placed with multiple collimating apertures according to linear array form on the steel plate, the collimating aperture corresponds to
One beryllium window, forms the exit portal of multiple X-rays.
Wherein more preferably, when use, at least one described anode target structure generates and is emitted wide beam X-ray, and the anode
When target structure is arranged in the form of an array, the anode target structure uses independent individual formula reflecting target, the independent individual formula reflection
The upper surface of target is provided with steel plate, and the lower surface of the independent individual formula reflecting target is provided with steel plate, corresponds on the steel plate
The independent individual formula reflecting target is provided with collimating aperture, and the collimating aperture corresponds to beryllium window, forms the exit portal of multiple X-rays.
Wherein more preferably, the collimating aperture is embedded in the steel plate, the beryllium window be embedded on the steel plate and through pair
The collimating aperture answered.
Wherein more preferably, the scan-type x-ray source is equipped with grid-control switch, grid-control switch by bracket with it is described
Vacuum cavity is fixed, and the output end of the grid-control switch is connected to the grid, the grid-control switch and grid-control electricity by conducting wire
Source connection, the grid-control power supply are connect with external high pressure power supply.
Wherein more preferably, the deflection coil includes X-direction deflection coil and Y-direction deflection coil, the X-direction deflection
Coil and the Y-direction deflection coil are respectively arranged with control interface, and the control interface is connect with governor circuit respectively, described
Governor circuit applies preset electricity to the control interface of the X-direction deflection coil and the Y-direction deflection coil respectively
Corrugating realizes the direction of motion for controlling the electron beam that the cathode generates.
Wherein more preferably, when the use one anode target structure generation and exit Xray, and the anode target structure is adopted
When being shot at the target with Integral back, the target surface shot at the target of Integral back described in the electron beam face that the emission of cathode goes out；
Wherein more preferably, when the anode target structures generation and exit Xray for using multiple arrangements in the form of linear array, and
When the anode target structure uses independent individual formula reflecting target, independent individual formula described in the electron beam face that the emission of cathode goes out
The target surface of reflecting target.
According to the second aspect of the utility model embodiment, a kind of imaging system is provided, imaging system includes above-mentioned
Scan-type x-ray source.
Scan-type x-ray source provided by the utility model generates electron beam by cathode, and controls electronics by grid
Corresponding target is bombarded in control of the on-off and deflection coil of beam to beam motion direction, realization according to preset rules one by one
Face, to complete the switching between multifocal.This mode not only increases the efficiency of this scan-type x-ray source, also meets into
Demand as system to scan-type x-ray source and the image for obtaining multiple projection angles, and solve and X is realized using movement mechanism
Mechanical movement artifact is led to the problem of when radiographic source rotation or translation.In addition, this scan-type x-ray source also has bigger power
And thermal capacity, and have the characteristics that small in size, focus density is high.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of scan-type x-ray source provided by the utility model；
Fig. 2 is a kind of structural schematic diagram of anode target structure in scan-type x-ray source provided by the utility model；
Fig. 3 is another structural schematic diagram of anode target structure in scan-type x-ray source provided by the utility model；
Fig. 4 is in scan-type x-ray source provided by the utility model, and the amplification of another structure of anode target structure is shown
It is intended to；
Fig. 5 is the top view of anode target structure in scan-type x-ray source provided by the utility model；
Fig. 6 is provided by the utility model embodiment in scan-type x-ray source, with sweeping for 10x10 array arrangement
Retouch the structural schematic diagram of Formula X radiographic source；
Fig. 7 is in scan-type x-ray source provided by the utility model embodiment, with the scan-type X-ray of linear array arrangement
A kind of structural schematic diagram in source；
Fig. 8 is in scan-type x-ray source provided by the utility model embodiment, and adjustment is applied to the voltage of deflection coil
Waveform is to control the schematic diagram in beam motion direction；
Fig. 9 is in imaging system provided by the utility model, and imaging system uses one kind of reversed geometry imaging system
Layout structure schematic diagram；
Figure 10 and Figure 11 is in imaging system provided by the utility model, and imaging system is using the one of number TOMO system
Kind layout structure schematic diagram；
Figure 12 and Figure 13 is in imaging system provided by the utility model, and imaging system uses one kind of static CT system
Layout structure schematic diagram.
Specific embodiment
The technology contents of the utility model are described in further detail in the following with reference to the drawings and specific embodiments.
As shown in Figure 1, scan-type x-ray source provided by the utility model includes vacuum cavity 1, in vacuum cavity 1
It is provided with 1 cathode 2 and multiple anode target structures 3, the position in vacuum cavity 1 close to cathode 2 is provided with grid 4, true
Position in cavity body 1 close to grid 4 is provided with focusing electrode 5, is arranged in the periphery of vacuum cavity 1 and close to the position of grid 4
There is deflection coil 6.By controlling grid 4, so that the electron beam that cathode generates successively passes through the focusing of focusing electrode 5, deflection coil 6
Direction of motion control, to scan the target surface for bombarding corresponding anode target structure 3 one by one according to preset rules, and from target surface
It bombards side and generates X-ray, form the multiple focuses arranged according to default spread geometry.Wherein, the default arrangement shape of focus arrangement
Shape can be depending on imaging system demand.
Specifically, on the one hand vacuum cavity 1 makes for being in cathode 2 and multiple anode target structures 3 under high vacuum environment
Corresponding anode target structure 3 can smoothly be reached by obtaining the electron beam that cathode 2 generates, without damaging because of colliding with air molecule
It loses；The insulation characterisitic of another aspect vacuum makes anode target structure 3 may be at the high-voltage state of opposing cathode 2, without
Breakdown sparking can be generated easily.
Cathode 2 can use cathode filament, and cathode filament is connect with filament supply, and filament supply and external high pressure electricity
Source connection, the size of current of filament supply is controlled by external high pressure power supply, under the action of filament supply, by cathode filament plus
Heat arrives preset temperature (such as 2000 DEG C~3000 DEG C), so that the electronics that the generation of cathode filament surface meets preset quantity is (enough
Active electronics), form electron beam (size of electron beam is related with the electronic beam current size for needing cathode filament to emit).Its
In, cathode filament can be made of dystectic tungsten wire.
As shown in Figures 2 and 3, each anode target structure 3 includes reflecting target 301, radiating block 302, steel plate 303, beryllium window 304
And collimating aperture 305；Anode target structure 3 can produce and be emitted narrow beam X-ray or wide beam X-ray.As shown in Fig. 2, when using extremely
A few anode target structure 3 is generated and is emitted narrow beam X-ray (angle of emergence of X-ray is smaller), and each anode target structure 3 uses
Integral back shoot at the target 301 when, shoot at the target 301 upper surface of the Integral back is provided with radiating block 302, and realization shoots at the target to Integral back
301 heat dissipation.The upper surface of radiating block 302 is provided with steel plate 303, which both can be used as beryllium window 304 and collimating aperture
305 carrier, and can be used to shield unwanted scattered rays, while also functioning to certain heat spreading function.According to what is used
The X-ray Exit positions of imaging system demand, can be on steel plate 303 according to the linear array form (line number (side Y of collimating aperture 305
To) it is multiple collimating apertures 305 of 1) arranging, each collimating aperture 305 is embedded on steel plate 303；Each collimating aperture 305 corresponds to a beryllium
Window 304, each beryllium window 304 is embedded on radiating block 302 and steel plate 303 and through corresponding collimating aperture 305, to realize alignment
The sealing of straight hole 305, and form the exit portal of multiple X-rays.
It is emphasized that when using it is multiple by Integral back shoot at the target 301 form anode target structure when, two neighboring anode
The multiple collimating apertures 305 arranged on target structure can correspond；Or the multiple standards arranged on two neighboring anode target structure
Straight hole 305 can not also correspond, i.e., all collimating apertures 305 can form the shaped faces such as disc, rectangular surfaces after arranging；Each
Collimating aperture 305 corresponds to a beryllium window 304, and each beryllium window 304 is embedded on radiating block 302 and steel plate 303 and through corresponding
Collimating aperture 305 to realize the sealing of alignment straight hole 305, and forms the exit portal of multiple X-rays；Multiple exit portal alignments are whole
The target surface of 301 electron bombardment of body formula reflecting target, 301 target so that a large amount of electron bombardment Integral backs that cathode filament generates are shot at the target
Behind face, which directly generates X-ray, and from exit portal exit Xray corresponding with the target surface.
When the generation of at least one anode target structure 3 of use and it is emitted narrow beam X-ray, and anode target structure 3 is in the form of an array
When (including face formation formula and linear array form) arranges, each anode target structure 3 can use independent individual formula reflecting target 301, should
The upper surface of independent individual formula reflecting target 301 is provided with radiating block 302, and the upper surface of radiating block 302 is provided with steel plate 303,
Correspond to independent individual formula reflecting target 301 on steel plate 303 and be provided with 1 collimating aperture 305, collimating aperture 305 is embedded in steel plate 303
On；Each collimating aperture 305 corresponds to a beryllium window 304, and each beryllium window 304 is embedded on radiating block 302 and steel plate 303 and runs through
Corresponding collimating aperture 305 to realize the sealing of alignment straight hole 305, and forms the exit portal of multiple X-rays.Equally, it is multiple go out
Loophole is directed at the bombardment target surface of independent individual formula electronics, so that a large amount of electron bombardment independent individual formulas reflection that cathode filament generates
After the target surface of target 301, which directly generates X-ray, and from exit portal exit Xray corresponding with the target surface.
As shown in Figure 3 and Figure 4, when using at least one anode target structure 3 generate and be emitted wide beam X-ray (X-ray go out
Firing angle is larger), and each anode target structure 3 using Integral back shoot at the target 301 when, shoot at the target 301 lower surface of the Integral back is set
It is equipped with radiating block 302, the heat dissipation to reflecting target 301 not only may be implemented, can also be reserved more to the design of collimating aperture 305
Space.Shoot at the target 301 upper surface of each Integral back is provided with steel plate 303, which both can be used as 304 He of beryllium window
The carrier of collimating aperture 305, and can be used to shield unwanted scattered rays, while also functioning to certain heat spreading function.According to institute
The X-ray Exit positions of the imaging system demand of utilization, can on each steel plate 303 according to linear array form (collimating aperture 305
Line number (Y-direction) is 1) the multiple collimating apertures 305 of arrangement, each collimating aperture 305 is embedded on steel plate 303；Each collimating aperture 305 is corresponding
In a beryllium window 304, each beryllium window 304 is embedded on steel plate 303 and through corresponding collimating aperture 305, to realize collimation
The sealing in hole 305, and form the exit portal of multiple X-rays.
It is emphasized that when using it is multiple by Integral back shoot at the target 301 form anode target structure 3 when, it is two neighboring
The multiple collimating apertures 305 arranged on anode target structure 3 can correspond；Or arrange on two neighboring anode target structure 3
Multiple collimating apertures 305 can not also correspond, and all collimating apertures 305 can form the shaped faces such as disc, rectangular surfaces after arranging；
Each collimating aperture 305 corresponds to a beryllium window 304, and each beryllium window 304 is embedded on steel plate 303 and through corresponding collimating aperture
305, to realize the sealing of alignment straight hole 305, and form the exit portal of multiple X-rays；Multiple exit portals are directed at Integral back
Shoot at the target the target surfaces of 301 electron bombardments so that a large amount of electron bombardment Integral backs that cathode filament generates shoot at the target 301 target surface after,
The target surface directly generates X-ray, and from exit portal exit Xray corresponding with the target surface.
When the generation of at least one anode target structure 3 of use and it is emitted wide beam X-ray, and anode target structure 3 is in the form of an array
When (including face formation formula and linear array form) arranges, each anode target structure 3 can use independent individual formula reflecting target 301, often
The upper surface of a independent individual formula reflecting target 301 is provided with steel plate 303, in the following table of each independent individual formula reflecting target 301
Face is provided with radiating block 302, corresponds to independent individual formula reflecting target 301 on each steel plate 303 and is provided with 1 collimating aperture 305, quasi-
Straight hole 305 is embedded on steel plate 303；Each collimating aperture 305 corresponds to a beryllium window 304, and each beryllium window 304 is embedded in steel plate
On 303 and run through corresponding collimating aperture 305, to realize the sealing of alignment straight hole 305, and forms the exit portal of multiple X-rays.
Equally, the bombardment target surface of multiple exit portal alignment independent individual formula electronics, so that a large amount of electron bombardments that cathode filament generates are only
After the target surface of vertical individual formula reflecting target 301, which directly generates X-ray, and penetrates from exit portal corresponding with target surface outgoing X
Line.
Wherein, in above-mentioned several anode target structures 3, the position of each collimating aperture 305 and corresponding beryllium window 304 according to
Depending on the X-ray Exit positions for the imaging system demand used.In order to guarantee energy between anode target structure 3 and vacuum cavity 1
Enough preferably engagements, and guarantee the sealing effect of vacuum cavity 1, multiple anode target structures 3 can share same monoblock type
Steel plate 303, i.e. all collimating apertures 305 of this scan-type x-ray source and corresponding beryllium window 304 are embedded in same monoblock type
On steel plate 303.For example, as shown in fig. 6, being embedded on steel plate 303 by taking the scan-type x-ray source of 10 array of 10x as an example
Have with multiple collimating apertures 305 of 10 array arrangement of 10x and corresponding beryllium window 304, to form the outgoing of multiple X-rays
Mouth 306.
The hot channel 3020 of preset quantity is evenly distributed on the radiating block 302 of above-mentioned several anode target structures 3, this is dissipated
It is perfused with coolant in heat pipeline 3020, to realize the heat dissipation to reflecting target 301.It is exhausted that coolant can be flowable high pressure
Edge material, such as transformer oil (high voltage insulating oil)；Radiating block 302 can be using the coefficients of heat conduction high metals or metal such as copper
Alloy material is made, and the shape and size of radiating block 302 can according to the shape of reflecting target 301, X-ray Exit positions and
Depending on heat dissipation effect.According to the actual demand for the imaging system used (such as x-ray focus shape and size, imaging system institute
The outlet angle needed), adjust exit facet shape, size (such as cone, multi-panel of above-mentioned several 3 collimating apertures 305 of anode target structure
Bullet) and shooting angle.For example, needing to be emitted this scan-type x-ray source as shown in figure 5, working as used imaging system
When rectangular shaped X-ray focus, the exit facet shape of collimating aperture 305 can be rectangle, and 305 three-dimensional performance of collimating aperture is four sides taper
Body.
The lightweight beryllium material that the beryllium window 304 of above-mentioned several anode target structures 3 can use atomic number small, to X-ray
Basically no attenuation.Equally, according to the actual demand for the imaging system used (such as x-ray focus shape and size), beryllium is adjusted
The shape and size of window 304.For example, needing to be emitted this scan-type x-ray source as shown in figure 5, working as used imaging system
When rectangular shaped X-ray focus, the exit facet shape of beryllium window 304 can be rectangle.Also, reflecting target 301 can using tungsten,
The metal material or metal alloy compositions that the atomic numbers such as molybdenum, tungsten-rhenium alloy are high, fusing point is high are made.
Also, when anode target structure 3 is using independent individual formula reflecting target 301, the electron beam that cathode filament generates is line by line
(X-direction) one by one during the target surface of scanning bombardment independent individual formula reflecting target 301, only electron beam reaches independent individual formula
When the position of 301 target surface of reflecting target, X-ray can be just generated, and be formed by exit portal by beryllium window 304 and collimating aperture 305 and penetrate
Out.When anode target structure 3 using Integral back shoot at the target 301 when, cathode filament generate electron beam scan one by one line by line (X-direction)
Bombardment Integral back shoot at the target 301 target surface during, Integral back 301 target surfaces of shooting at the target can generate X-ray always, but only
Beryllium window 304 and collimating aperture 305, which are formed by outgoing eloquence, can project X-ray.As a kind of selection, can control using grid 4
The characteristic of electron beam emission state (on-off) can sweep the state of a control that grid-control switchs with electron beam one by one line by line (X-direction)
Retouch synchronization, it may be assumed that when electron beam reaches target surface corresponding with X-ray exit portal position, by grid-control switch closing, electron beam can be with
Normal transmission simultaneously bombards target surface, so that X-ray is projected from exit portal；When electron beam leaves and X-ray exit portal position pair
When the target surface answered, grid-control being switched and is opened, electron beam is controlled by gate switch to be unable to normal transmission and can not bombard target surface, thus
X-ray stops transmitting.
This scan-type x-ray source is equipped with grid-control switch (not shown), and grid-control switch passes through bracket and vacuum cavity 1
It is fixed, also, the output end of grid-control switch is connected to the grid 4 of this scan-type x-ray source by conducting wire, thus to this scan-type
The cathode filament launching electronics beam of x-ray source on-off (by or lock it is disconnected) controlled, this scan-type x-ray source is put in realization
The control of line.Specifically, grid-control switch is connect with grid-control power supply, and grid-control power supply is connect with external high pressure power supply, passes through grid
The control control grid-control switch of power supply 3 is on or off-state, so that the on-off of this scan-type x-ray source is controlled, it is real
Now to the control of unwrapping wire.
By taking multiple anode target structures 3 of this scan-type x-ray source ground connection as an example, when grid-control power supply control grid-control switch is in
When on state, and a negative high voltage (such as negative high voltage is -130KV), grid 4 can be applied to grid 4 by grid-control power supply
The absolute value for the negative high voltage being applied be greater than this scan-type x-ray source cathode 2 negative high voltage (negative high voltage of such as cathode be-
Absolute value 120KV), so that negative electric field is formed between grid 4 and cathode 2, thus the satisfaction for inhibiting cathode filament surface to generate
The electronics of preset quantity flies to the target surface of anode target structure 3, realizes disconnected to the lock of cathode filament launching electronics.When grid-control switchs quilt
When the negative high voltage of application is sufficiently large, the electrons that cathode filament surface generates all are suppressed in cathode filament surface and cannot fly
To the target surface of anode target structure 3.When grid-control power supply control grid-control switch is in an off state, grid-control switchs the negative height being applied
Pressure disappears, so that forming pressure difference between anode target structure 3 and cathode 2, a large amount of electrons that cathode filament surface generates at this time exist
The target surface that electron beam flies to anode target structure 3 is formed under the effect of biggish energy of position, generates X-ray, and from corresponding exit portal
Exit Xray, to form a focus.
In this scan-type X-ray, focusing electrode 5 is used for the electron beam that beam forming cathode filament generates, and limits the diverging of electron beam,
To constrain electron beam, to obtain the focal spot of moderate size on anode target structure 3.Specifically, by focusing electrode 5 and external piloting control
Circuit connection, the electron beam issued from cathode filament control focusing electrode 5 by governor circuit and are focused to electron beam.It focuses
Effect will affect beam bombardment anode target structure 3 target surface spot face size.The focusing of focusing electrode 5 is divided into static focusing
It is focused with magnetic field, is electronics conventional means, is not illustrating herein.
Deflection coil 6 includes X-direction deflection coil and Y-direction deflection coil, the electronics generated for realizing cathode filament
Beam moves on the face X, Y.It may be implemented further to focus the electron beam that cathode filament generates by deflection coil 6, and control
The direction of motion of electron beam.X-direction deflection coil and Y-direction deflection coil are provided with control interface, control interface difference
It is connect with governor circuit, according to preset rules, corresponds to X-direction deflection coil in governor circuit and Y-direction deflection coil is preparatory
It is provided with multiple voltage waveform, it can be to the control interface of X-direction deflection coil and Y-direction deflection coil point by governor circuit
Do not apply preset voltage waveform, i.e., the direction of motion of controllable electron beam.Wherein, preset rules refer to the scanning of electron beam
Control mode can be and scan one by one line by line, that is, pass through control grid-control switch and X-direction deflection coil and Y-direction deflection coil
On the voltage waveform that is applied so that the target surface of electron beam (X-direction) scanning bombardment anode target structure 3 one by one line by line, generates X and penetrates
Line；It can also be that (Y-direction) scans one by one by column, that is, pass through control grid-control switch and X-direction deflection coil and Y-direction deflection wire
The voltage waveform being applied on circle generates X so that electron beam scans the target surface for bombarding anode target structure 3 by column (Y-direction) one by one
Ray；The position for the multiple focuses that can also be arranged according to default spread geometry is scanned one by one, that is, passes through control grid-control switch and X
The voltage waveform being applied on direction deflection coil and Y-direction deflection coil, so that electron beam is arranged according to default spread geometry
The positions of multiple focuses scan the target surface for bombarding corresponding anode target structure 3 one by one, generate X-ray；The scanning control of electron beam
Mode processed can do different control mode designs according to practical application mode.Therefore, control electricity may be implemented by deflection coil 6
Beamlet completes the scanning of the arbitrary switch between more target surfaces, to complete the switching between multifocal (x-ray focus), improves this
The efficiency of scan-type x-ray source.
In one embodiment of the utility model, when using a generation of anode target structure 3 and exit Xray (wide beam
Or narrow beam X-ray), and anode target structure 3 shoots at the target 301 using Integral back, Integral back shoot at the target 301 steel plate 303 on by
When according to linear array form (line number (Y-direction) of collimating aperture 305 is 1) multiple collimating apertures 305 of arrangement, or it is multiple with linear array when using
The anode target structure 3 of form arrangement generates and exit Xray (wide beam or narrow beam X-ray), and anode target structure 3 is using independent
When body formula reflecting target 301, due to only scanning the target surface of bombardment a line anode target structure 3 in the Y direction in electron beam, to Y
Direction deflection coil provides a fixed incoming level, which can guarantee the high-velocity electron beam that cathode filament is launched
Target surface position can be bombarded in the Y direction.A kind of more simplified design is considered, as shown in fig. 7, can be by this scan-type X
The electron beam and target surface position face that the cathode filament of radiographic source is launched, so as to not need Y-direction deflection coil,
So that this scan-type X-ray volume source is more small and exquisite.
Below with reference to Fig. 8, and in the scan control mode of following several electron beams as an example, it is described in detail inclined to X-direction
Switch coil and Y-direction deflection coil apply voltage waveform, how to control the direction of motion of electron beam.
As shown in figure 8, the box on exit facet represents the exit portal 306 of ray, arrow indicates that electronics beam scanning bombards target
The direction of motion in face, the curve above exit facet represent the voltage waveform applied on X-direction deflection coil, exit facet left
Curve represents the voltage waveform applied on deflection coil in the Y direction, what X-direction deflection coil and Y-direction deflection coil were applied
Voltage waveform cooperation is so that electron beam scans bombardment anode target structure 3 according to sequence from left to right, from top to bottom one by one
Target surface generates X-ray.
Specifically, electron beam is with X-direction deflection wire after can applying triangular-waveform voltage on X-direction deflection coil
The increase of the triangular-waveform voltage applied on circle from left to right scans the target surface of bombardment anode target structure 3 one by one in the X direction,
Generate X-ray；When the triangular-waveform voltage applied on X-direction deflection coil becomes minimum from maximum, electron beam returns again
Start the target surface process of the scanning bombardment anode target structure 3 of a new wheel from left to right to leftmost starting point.
It is also possible to which electron beam is with Y-direction deflection coil after applying triangular-waveform voltage on deflection coil in the Y direction
The increase of the triangular-waveform voltage of upper application scans the target surface of bombardment anode target structure 3 one by one from top to bottom in the Y direction, produces
Raw X-ray；When the triangular-waveform voltage applied on Y-direction deflection coil becomes minimum from maximum, electron beam returns to again
The starting point of the top starts the target surface process of the scanning bombardment anode target structure 3 of a new wheel from top to bottom.
It, can be in the Y direction when needing to make electron beam (X-direction) target surface of scanning bombardment anode target structure 3 one by one line by line
Apply step wave voltage on deflection coil, applies triangular-waveform voltage on X-direction deflection coil；I.e. on Y-direction deflection coil
The step wave voltage of application, which remains unchanged, guarantees that electron beam does not change position in the Y direction, and electron beam in the X direction can be from
The target surface of the left-to-right bombardment anode target structure 3 of scanning one by one, generates X-ray；When the step wave electricity applied on Y-direction deflection coil
When pressure is increased to voltage corresponding with next line electron beam scan position and keeps, electron beam starts a new wheel in the X direction
The from left to right target surface process of scanning bombardment anode target structure 3.And so on, the step wave electricity applied on Y-direction deflection coil
As soon as pressing every raising step, electron beam moves down a line, to realize sweeping one by one line by line for electron beam entire surface
Retouch the target surface of bombardment anode target structure 3.
It, can be in X-direction when needing to make electron beam (X-direction) target surface of scanning bombardment anode target structure 3 one by one by column
Apply step wave voltage on deflection coil, applies triangular-waveform voltage on deflection coil in the Y direction；I.e. on X-direction deflection coil
The step wave voltage of application, which remains unchanged, guarantees that electron beam does not change position in the X direction, and electron beam in the Y direction can be from
Top to bottm scans the target surface of bombardment anode target structure 3 one by one, generates X-ray；When the step wave electricity applied on X-direction deflection coil
When pressure is increased to voltage corresponding with next column electron beam scan position and keeps, electron beam starts a new wheel in the Y direction
The target surface process of scanning bombardment anode target structure 3 from top to bottom.And so on, the step wave electricity applied on X-direction deflection coil
As soon as pressing every raising step, the column that move right of electron beam, to realize sweeping one by one line by line by column for electron beam entire surface
Retouch the target surface of bombardment anode target structure 3.
This scan-type x-ray source not only can be adapted for the x-ray source of plus earth type, can be applicable to minus earth
The x-ray source of type or the x-ray source of neutral ground type.In the case where the x-ray source of minus earth type, cathode is connect
Ground, and positive high voltage is applied to each anode target structure 3 using external high pressure power supply.In the x-ray source of neutral ground type
In the case of, apply negative high-voltage to cathode, applies positive high voltage to each anode target structure 3.
Scan-type x-ray source provided by the utility model generates electron beam by using a cathode, and passes through grid
The control of the on-off and deflection coil of electron beam to beam motion direction is controlled, to realize according to preset rules one by one
Corresponding target surface is bombarded, to complete the switching between multifocal, the efficiency of this scan-type x-ray source is not only increased, also meets
Demand of the imaging system to scan-type x-ray source and the image for obtaining multiple projection angles, and solve using movement mechanism
Mechanical movement artifact is led to the problem of when realizing x-ray source rotation or translation.In addition, this scan-type x-ray source also has more greatly
Power and thermal capacity, and have the characteristics that small in size, focus density is high.
The utility model additionally provides a kind of imaging system, which includes above-mentioned scan-type x-ray source, no
It only can satisfy demand of the imaging system to scan-type x-ray source and the image for obtaining multiple projection angles, it is thus also avoided that use
Movement mechanism realizes the generation that mechanical movement artifact phenomenon is easy to produce when x-ray source rotation or translation, improves imaging system
Image quality.The other structures (structure other than this scan-type x-ray source) and working principle of imaging system are existing
Technology, details are not described herein.
This imaging system and this scanning are briefly described below with reference to Fig. 9~13 for the ease of the understanding to this imaging system
The combined several layout structures of Formula X radiographic source.
As shown in figure 9, needing in reversed geometry imaging system using the anode target knot using this scan-type x-ray source
Structure 3 generates and is emitted narrow beam X-ray, and this scan-type x-ray source is distributed in and meets the reversed geometry imaging system gantry
In plane.
As shown in FIG. 10 and 11, it in digital TOMO system (e.g., mammary gland TOMO function), needs using using this scan-type
The anode target structure 3 of x-ray source generates and is emitted wide beam X-ray, and this scan-type x-ray source is distributed in and meets the number
In the cambered surface or planarea of TOMO system chassis.
As shown in Figure 12 and Figure 13, it needs to produce using the anode target structure 3 of this scan-type x-ray source in static CT system
Wide beam X-ray is given birth to and is emitted, and this scan-type x-ray source is distributed on the ray annulus for meeting the static state CT system rack.
For example, multiple scan-type x-ray sources can be distributed on ray annulus according to the design requirement of the static state CT system, each
Scan-type x-ray source independent control；Wherein, the anode target structure 3 of each scan-type x-ray source is using a monoblock type reflection
Target, according to linear array form (line number (Y-direction) of collimating aperture is 1) the multiple collimating apertures of arrangement on the steel plate that Integral back is shot at the target；
Also, the electron beam that the cathode filament of each scan-type x-ray source is launched and target surface position face.
Scan-type x-ray source provided by the utility model and its imaging system are described in detail above.It is right
For those of ordinary skill in the art, under the premise of without departing substantially from the utility model in essence spirit to its done any aobvious and
The change being clear to will all belong to the protection scope of the utility model patent power.
Claims (12)
1. a kind of scan-type x-ray source, it is characterised in that including vacuum cavity, be provided in the vacuum cavity cathode with it is multiple
Anode target structure, the position in the vacuum cavity close to the cathode are provided with grid, close to described in the vacuum cavity
The position of grid is provided with focusing electrode, and the periphery of the vacuum cavity is simultaneously provided with deflection coil close to the position of the grid；
It controls the grid and the electron beam that the cathode generates successively is passed through into the focusing of the focusing electrode, the deflection coil
After direction of motion control, the target surface of the corresponding anode target structure is bombarded one by one according to preset rules, and from the target surface
It bombards side and generates X-ray, form the multiple focuses arranged according to default spread geometry.
2. scan-type x-ray source as described in claim 1, it is characterised in that:
When use, at least one described anode target structure generates and is emitted narrow beam X-ray, and the anode target structure is using whole
When formula reflecting target, the upper surface that the Integral back is shot at the target is provided with radiating block, and the upper surface of the radiating block is provided with steel plate,
Multiple collimating apertures are placed with according to linear array form on the steel plate, the collimating aperture corresponds to a beryllium window, forms multiple X-rays
Exit portal.
3. scan-type x-ray source as described in claim 1, it is characterised in that:
When use, at least one described anode target structure generates and is emitted narrow beam X-ray, and the anode target structure is with array shape
When formula is arranged, the anode target structure uses independent individual formula reflecting target, and the upper surface of the independent individual formula reflecting target is arranged
There is radiating block, the upper surface of the radiating block is provided with steel plate, corresponds to the independent individual formula reflecting target on the steel plate and set
It is equipped with collimating aperture, the collimating aperture corresponds to a beryllium window, forms the exit portal of multiple X-rays.
4. scan-type x-ray source as claimed in claim 2 or claim 3, it is characterised in that:
The collimating aperture is embedded in the steel plate, and the beryllium window is embedded on the radiating block and the steel plate and through corresponding
The collimating aperture.
5. scan-type x-ray source as described in claim 1, it is characterised in that:
When use, at least one described anode target structure generates and is emitted wide beam X-ray, and the anode target structure is using whole
When formula reflecting target, the lower surface that the Integral back is shot at the target is provided with radiating block, the upper surface setting that the Integral back is shot at the target
There is a steel plate, be placed with multiple collimating apertures according to linear array form on the steel plate, the collimating aperture corresponds to beryllium window, forms multiple X
The exit portal of ray.
6. scan-type x-ray source as described in claim 1, it is characterised in that:
When use, at least one described anode target structure generates and is emitted wide beam X-ray, and the anode target structure is with array shape
When formula is arranged, the anode target structure uses independent individual formula reflecting target, and the upper surface of the independent individual formula reflecting target is arranged
There is steel plate, the lower surface of the independent individual formula reflecting target is provided with steel plate, corresponds to the independent individual formula on the steel plate
Reflecting target is provided with collimating aperture；The collimating aperture corresponds to beryllium window, forms the exit portal of multiple X-rays.
7. such as scan-type x-ray source described in claim 5 or 6, it is characterised in that:
The collimating aperture is embedded in the steel plate, and the beryllium window is embedded on the steel plate and through the corresponding collimating aperture.
8. scan-type x-ray source as described in claim 1, it is characterised in that:
The scan-type x-ray source is equipped with grid-control switch, and the grid-control switch is fixed by bracket and the vacuum cavity, institute
The output end for stating grid-control switch is connected to the grid by conducting wire, and the grid-control switch is connect with grid-control power supply, the grid-control
Power supply is connect with external high pressure power supply.
9. scan-type x-ray source as described in claim 1, it is characterised in that:
The deflection coil includes X-direction deflection coil and Y-direction deflection coil, the X-direction deflection coil and the Y-direction
Deflection coil is respectively arranged with control interface, and the control interface is connect with governor circuit respectively, and the governor circuit is to the X
The control interface of direction deflection coil and the Y-direction deflection coil applies preset voltage waveform respectively, realizes control
The direction of motion for the electron beam that the cathode generates.
10. scan-type x-ray source as described in claim 1, it is characterised in that:
When the use one anode target structure generation and exit Xray, and the anode target structure is shot at the target using Integral back
When, the target surface shot at the target of Integral back described in the electron beam face that the emission of cathode goes out.
11. scan-type x-ray source as described in claim 1, it is characterised in that:
When the anode target structures generation simultaneously exit Xrays, and the anode target structure for using multiple arrangements in the form of linear array
When using independent individual formula reflecting target, the target surface of independent individual formula reflecting target described in the electron beam face that the emission of cathode goes out.
12. a kind of imaging system, it is characterised in that including scan-type x-ray source described in any one of claim 1~11.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821016550.2U CN208336145U (en) | 2018-06-29 | 2018-06-29 | A kind of scan-type x-ray source and its imaging system |
| JP2020573347A JP7300745B2 (en) | 2018-06-29 | 2019-06-12 | Scanning X-ray source and its imaging system |
| EP19825295.9A EP3817027A4 (en) | 2018-06-29 | 2019-06-12 | Scanning-type x-ray source and imaging system therefor |
| PCT/CN2019/090988 WO2020001276A1 (en) | 2018-06-29 | 2019-06-12 | Scanning-type x-ray source and imaging system therefor |
| US17/137,064 US11569055B2 (en) | 2018-06-29 | 2020-12-29 | Scanning-type x-ray source and imaging system therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821016550.2U CN208336145U (en) | 2018-06-29 | 2018-06-29 | A kind of scan-type x-ray source and its imaging system |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108777248A (en) * | 2018-06-29 | 2018-11-09 | 北京纳米维景科技有限公司 | A kind of scan-type x-ray source and its imaging system |
| CN112512196A (en) * | 2019-09-16 | 2021-03-16 | 清华大学 | Array type X-ray source and X-ray imaging equipment |
| CN113345782A (en) * | 2021-05-28 | 2021-09-03 | 武汉联影医疗科技有限公司 | Cathode emission device for an X-ray tube, high-voltage cable and method |
-
2018
- 2018-06-29 CN CN201821016550.2U patent/CN208336145U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108777248A (en) * | 2018-06-29 | 2018-11-09 | 北京纳米维景科技有限公司 | A kind of scan-type x-ray source and its imaging system |
| CN112512196A (en) * | 2019-09-16 | 2021-03-16 | 清华大学 | Array type X-ray source and X-ray imaging equipment |
| CN113345782A (en) * | 2021-05-28 | 2021-09-03 | 武汉联影医疗科技有限公司 | Cathode emission device for an X-ray tube, high-voltage cable and method |
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