CN103187228A - Correcting method for analyzer magnetic field data - Google Patents
Correcting method for analyzer magnetic field data Download PDFInfo
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- CN103187228A CN103187228A CN201110452396XA CN201110452396A CN103187228A CN 103187228 A CN103187228 A CN 103187228A CN 201110452396X A CN201110452396X A CN 201110452396XA CN 201110452396 A CN201110452396 A CN 201110452396A CN 103187228 A CN103187228 A CN 103187228A
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- China
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- value
- magnetic field
- field data
- analyzer
- analyzer magnetic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30433—System calibration
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Measuring Magnetic Variables (AREA)
Abstract
The invention discloses a correcting method for data processing of an analyzer magnetic field. The correcting method is characterized by improving the data returning precision of magnetic field through correcting of the magnetic filed data of an analyzer. Through conversion of a signal (1) and a signal (2), a true returning displayed value (3) is formed. A user can obtain a stable value when returning is stable because of repeated returning. Through contrast between the stable value and a reference value (5) and an equal relationship between the stable value and the reference value, a correcting value is confirmed.
Description
Technical field
The present invention is a kind of software engineering, relates to the calibration steps of magnetic field data in the ion implantor analyzer.Belong to the software field that semiconductor device is made.
Background technology
The semiconductor integrated circuit manufacturing process has developed into 12 inches wafers, nm technology node period.Along with the wafer size is increasing, the unit component size is more and more littler, and is also just more and more higher to the performance requirement of semiconductor manufacturing equipment.Ion implantor is requisite key equipment in the semiconductor device manufacturing process.In order to improve the performance of ion implantor, make its development of satisfying the requirement of modern big wafer, nano-device production technology and adapting to the semiconductor process techniques in future, must develop full-automatic control system efficiently.
In the ion implantor, there are the many control of using magnetic field data processing, magnetic field size, magnetic field relevant with the close relation of electricity.These controlled quentity controlled variables have directly influenced whole ion implantor injection technology for the accuracy of numerical value.
By the calibration steps to ion implantor analyzer magnetic field data, improved the accuracy of return data, also effectively reduced the inevitable error in the numerical value simultaneously.
Summary of the invention
The present invention mainly is for the analyzer magnetic field data is more accurate, utilizes the calibration steps to analyzer magnetic field.
Concrete steps are as follows:
As shown in Figure 1, digital signal in the ion implantor (1) is by converting analog signal (2) to, in control software, show its intermediate value (3), by repeatedly reading, the value that can show change on the software, and our menu or the manual value (4) of input are reference value, and can show becomes the reference value (5) of returning show value, when the value (3) of change reach stable after, we just think that stationary value is to return the reference value of show value.
As shown in Figure 2, in the data value in analyzer magnetic field, level be fixed value fixed in manual input reference or the menu, y direction return show value, a is after manual input x, and the change by (3) value obtains y after reaching and stablizing, x and y are peer-to-peer, and b and c are other calibration values.
By a, b, c can determine an input reference and return the line of demonstration that the value of surveying when us is more many to analyzer magnetic field calibration, this line will be more accurate, when the too big value of fluctuation, can analyze wherein reason, finds out reason, deals with problems.
The present invention has following remarkable advantage:
1. by the calibration in analyzer magnetic field, can make the raising of numerical value accuracy.
2. by the calibration in analyzer magnetic field, can make numerical precision become controllability.
Embodiment
Below in conjunction with specific embodiment the present invention is described in further detail, but not as the restriction to patent of the present invention.
As shown in Figure 2, we by the digital signal in the ion implantor (1) by converting analog signal (2) to, in control software, show its intermediate value (3), by repeatedly reading, the value that can show change on the software, and our menu or the manual value (4) of input are reference value, and can show becomes the reference value (5) of returning show value, when the value (3) of change reach stable after, we just think that stationary value is to return the reference value of show value.
Then by manual input definite value x, and the change of passing through (3) value reaches stable y, and trunnion axis and the longitudinal axis obtain a, by repeatedly obtaining b, c.By the line of a, b, c, the accuracy of determined value is worth more manyly, and accuracy is more high.
So in the Calibration Method to the analyzer magnetic field data, the numerical value accuracy is improved, reduce error as much as possible.
Description of drawings
Fig. 1 is analyzer magnetic field data calibration flow chart illustration.
Fig. 2 is analyzer magnetic field data calibration key diagram.
The above elaborates content of the present invention.For persons skilled in the art, any apparent change that it is done all constitutes the infringement to patent of the present invention, with corresponding legal responsibilities without departing from the premise in the spirit of the present invention.
Claims (2)
1. the calibration steps of an analyzer magnetic field data is characterized in that: by the calibration to the analyzer magnetic field data, improve the accuracy of drawing return value in the bundle process, more can react control variables really, improve the technology of injecting engineering.
2. the calibration steps of an analyzer magnetic field data is characterized in that: by the calibration to the analyzer magnetic field data, can control and draw data accuracy required in the bundle process, according to actual needs, determine last accuracy.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110452396XA CN103187228A (en) | 2011-12-30 | 2011-12-30 | Correcting method for analyzer magnetic field data |
| PCT/CN2012/081491 WO2013097490A1 (en) | 2011-12-30 | 2012-09-17 | Calibration method for magnetic field data of analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110452396XA CN103187228A (en) | 2011-12-30 | 2011-12-30 | Correcting method for analyzer magnetic field data |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103187228A true CN103187228A (en) | 2013-07-03 |
Family
ID=48678339
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110452396XA Pending CN103187228A (en) | 2011-12-30 | 2011-12-30 | Correcting method for analyzer magnetic field data |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103187228A (en) |
| WO (1) | WO2013097490A1 (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000011943A (en) * | 1998-06-18 | 2000-01-14 | Sumitomo Eaton Noba Kk | Ion implantation apparatus |
| US6965116B1 (en) * | 2004-07-23 | 2005-11-15 | Applied Materials, Inc. | Method of determining dose uniformity of a scanning ion implanter |
| CN200959327Y (en) * | 2006-04-07 | 2007-10-10 | 北京中科信电子装备有限公司 | Magnetic analytic system of ion filler |
| CN101268339A (en) * | 2005-09-21 | 2008-09-17 | 西门子公司 | Method for operating an electromagnetic flowmeter and electromagnetic flowmeter |
| CN101840851A (en) * | 2010-02-05 | 2010-09-22 | 上海凯世通半导体有限公司 | Ion implantation system and method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102194637B (en) * | 2010-03-18 | 2015-03-18 | 上海凯世通半导体有限公司 | Ion implantation system and method |
-
2011
- 2011-12-30 CN CN201110452396XA patent/CN103187228A/en active Pending
-
2012
- 2012-09-17 WO PCT/CN2012/081491 patent/WO2013097490A1/en active Application Filing
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000011943A (en) * | 1998-06-18 | 2000-01-14 | Sumitomo Eaton Noba Kk | Ion implantation apparatus |
| US6965116B1 (en) * | 2004-07-23 | 2005-11-15 | Applied Materials, Inc. | Method of determining dose uniformity of a scanning ion implanter |
| CN101268339A (en) * | 2005-09-21 | 2008-09-17 | 西门子公司 | Method for operating an electromagnetic flowmeter and electromagnetic flowmeter |
| CN200959327Y (en) * | 2006-04-07 | 2007-10-10 | 北京中科信电子装备有限公司 | Magnetic analytic system of ion filler |
| CN101840851A (en) * | 2010-02-05 | 2010-09-22 | 上海凯世通半导体有限公司 | Ion implantation system and method |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2013097490A1 (en) | 2013-07-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| DD01 | Delivery of document by public notice |
Addressee: Zhongkexin Electronic Equipment Co., Ltd., Beijing Document name: the First Notification of an Office Action |
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130703 |
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| WD01 | Invention patent application deemed withdrawn after publication |