CN103176364B - 正型感光性树脂组合物及其应用 - Google Patents
正型感光性树脂组合物及其应用 Download PDFInfo
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- CN103176364B CN103176364B CN201210528013.7A CN201210528013A CN103176364B CN 103176364 B CN103176364 B CN 103176364B CN 201210528013 A CN201210528013 A CN 201210528013A CN 103176364 B CN103176364 B CN 103176364B
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- 150000002576 ketones Chemical class 0.000 description 1
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- OVWYEQOVUDKZNU-UHFFFAOYSA-N m-tolualdehyde Chemical compound CC1=CC=CC(C=O)=C1 OVWYEQOVUDKZNU-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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- 229910052703 rhodium Inorganic materials 0.000 description 1
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- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- JZWFDVDETGFGFC-UHFFFAOYSA-N salacetamide Chemical group CC(=O)NC(=O)C1=CC=CC=C1O JZWFDVDETGFGFC-UHFFFAOYSA-N 0.000 description 1
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N sec-butylidene Natural products CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- SHBDDIJUSNNBLQ-UHFFFAOYSA-M sodium;3-[[4-[(2-chlorophenyl)-[4-[ethyl-[(3-sulfonatophenyl)methyl]azaniumylidene]cyclohexa-2,5-dien-1-ylidene]methyl]-n-ethylanilino]methyl]benzenesulfonate Chemical compound [Na+].C=1C=C(C(=C2C=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=2C(=CC=CC=2)Cl)C=CC=1N(CC)CC1=CC=CC(S([O-])(=O)=O)=C1 SHBDDIJUSNNBLQ-UHFFFAOYSA-M 0.000 description 1
- RWVGQQGBQSJDQV-UHFFFAOYSA-M sodium;3-[[4-[(e)-[4-(4-ethoxyanilino)phenyl]-[4-[ethyl-[(3-sulfonatophenyl)methyl]azaniumylidene]-2-methylcyclohexa-2,5-dien-1-ylidene]methyl]-n-ethyl-3-methylanilino]methyl]benzenesulfonate Chemical compound [Na+].C1=CC(OCC)=CC=C1NC1=CC=C(C(=C2C(=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C)C=2C(=CC(=CC=2)N(CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C)C=C1 RWVGQQGBQSJDQV-UHFFFAOYSA-M 0.000 description 1
- UWGCNDBLFSEBDW-UHFFFAOYSA-M sodium;4-[[4-(diethylamino)phenyl]-(4-diethylazaniumylidenecyclohexa-2,5-dien-1-ylidene)methyl]naphthalene-2,7-disulfonate Chemical compound [Na+].C1=CC(N(CC)CC)=CC=C1C(C=1C2=CC=C(C=C2C=C(C=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1 UWGCNDBLFSEBDW-UHFFFAOYSA-M 0.000 description 1
- FHIODWDKXMVJGO-UHFFFAOYSA-N sodium;8-anilino-5-[[4-[(5-sulfonaphthalen-1-yl)diazenyl]naphthalen-1-yl]diazenyl]naphthalene-1-sulfonic acid Chemical compound [Na+].C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1N=NC(C1=CC=CC=C11)=CC=C1N=NC(C1=CC=CC(=C11)S(O)(=O)=O)=CC=C1NC1=CC=CC=C1 FHIODWDKXMVJGO-UHFFFAOYSA-N 0.000 description 1
- LJFWQNJLLOFIJK-UHFFFAOYSA-N solvent violet 13 Chemical compound C1=CC(C)=CC=C1NC1=CC=C(O)C2=C1C(=O)C1=CC=CC=C1C2=O LJFWQNJLLOFIJK-UHFFFAOYSA-N 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- OKYDCMQQLGECPI-UHFFFAOYSA-N thiopyrylium Chemical group C1=CC=[S+]C=C1 OKYDCMQQLGECPI-UHFFFAOYSA-N 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- XYRAEZLPSATLHH-UHFFFAOYSA-N trisodium methoxy(trioxido)silane Chemical compound [Na+].[Na+].[Na+].CO[Si]([O-])([O-])[O-] XYRAEZLPSATLHH-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- YXZRCLVVNRLPTP-UHFFFAOYSA-J turquoise blue Chemical compound [Na+].[Na+].[Na+].[Na+].[Cu+2].NC1=NC(Cl)=NC(NC=2C=C(NS(=O)(=O)C3=CC=4C(=C5NC=4NC=4[N-]C(=C6C=CC(=CC6=4)S([O-])(=O)=O)NC=4NC(=C6C=C(C=CC6=4)S([O-])(=O)=O)NC=4[N-]C(=C6C=CC(=CC6=4)S([O-])(=O)=O)N5)C=C3)C(=CC=2)S([O-])(=O)=O)=N1 YXZRCLVVNRLPTP-UHFFFAOYSA-J 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- AODQPPLFAXTBJS-UHFFFAOYSA-M victoria blue 4R Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[N+](C)C1=CC=CC=C1 AODQPPLFAXTBJS-UHFFFAOYSA-M 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical compound [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/06—Substrate layer characterised by chemical composition
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
本发明是有关一种正型感光性树脂组合物,其具有经时安定性佳的优点。本发明还提供一种薄膜晶体管阵列基板的制造方法、一种薄膜晶体管阵列基板及一种液晶显示元件。
Description
技术领域
本发明是有关一种正型感光性树脂组合物,具体而言,是有关一种经时安定性(经时稳定性)佳的正型感光性树脂组合物及其应用。
背景技术
近年来由于半导体及液晶显示器产业蓬勃发展,个人电脑及显示器的需求扩大,技术亦突飞猛进,导致高分辨率的要求日益提高。为了达到上述要求,一般是使用高邻位酚醛清漆树脂(high-ortho novolac resin)搭配感光剂做为正型感光性树脂组合物(例如日本公开特许2009-192571)。
而在半导体集成电路元件、薄膜晶体管(TFT)的液晶显示元件或触控面板的制作过程中,为提高良率,上述组合物通常可藉由调整感光剂的用量以得到较高的曝光宽容度(exposure latitude),然而,往往却导致该感光性树脂组合物产生经时安定性劣化的问题。
有鉴于此,亟需提出一种正型感光性树脂组合物,藉以改善传统的正型感光性树脂组合物经时安定性不佳的缺点。
发明内容
本发明提供一种包含优异配方的正型感光性树脂组合物,其具有经时安定性佳的优点。
因此,本发明是有关一种正型感光性树脂组合物,其包含:
酚醛清漆树脂(A);
邻萘醌二叠氮磺酸类的酯化物(B);
染料(C);及
溶剂(D);
其中所述染料(C)包含染料(C-1)及染料(C-2),且所述染料(C-1)是选自由双偶氮系染料、蒽醌系染料及三价铬偶氮系染料所组成的群;及所述染料(C-2)为三芳甲烷系染料。
本发明亦提供一种薄膜晶体管阵列基板的制造方法,其中该薄膜晶体管阵列基板包含基板及图案,该方法包含以前述的正型感光性树脂组合物涂布于所述基板上以形成所述图案。
本发明再提供一种薄膜晶体管阵列基板,其是由前述的方法所制得。
本发明又提供一种液晶显示元件,其包含前述的薄膜晶体管阵列基板。
本发明是有关一种正型感光性树脂组合物,其包含:
酚醛清漆树脂(A);
邻萘醌二叠氮磺酸类的酯化物(B);
染料(C);及
溶剂(D);
其中所述染料(C)包含染料(C-1)及染料(C-2),且所述染料(C-1)是选自由双偶氮系染料、蒽醌系染料及三价铬偶氮系染料所组成的群;及所述染料(C-2)为三芳甲烷系染料。
本发明所述的酚醛清漆树脂(A)是指由芳香族羟基化合物及醛类,在盐酸、硫酸、甲酸、醋酸、草酸、对甲苯磺酸等已知的有机酸及/或无机酸的催化剂存在下,于常压下进行缩合反应,并经脱水及除去未反应的单体类而得。
于本发明的具体例中,所述芳香族羟基化合物为:苯酚(phenol);间-甲酚(m-cresol)、对-甲酚(p-cresol)、邻-甲酚(o-cresol)等甲酚(cresol)类;2,3-二甲苯酚、2,5-二甲苯酚、3,5-二甲苯酚、3,4-二甲苯酚等二甲酚(xylenol)类;间-乙基苯酚、对-乙基苯酚、邻-乙基苯酚、2,3,5-三甲基苯酚、2,3,5-三乙基苯酚、4-叔丁基苯酚、3-叔丁基苯酚、2-叔丁基苯酚、2-叔丁基-4-甲基苯酚、2-叔丁基-5-甲基苯酚、6-叔丁基-3-甲基苯酚等烷基苯酚(alkyl phenol)类;对-甲氧基苯酚、间-甲氧基苯酚、对-乙氧基苯酚、间-乙氧基苯酚、对丙氧基苯酚、间-丙氧基苯酚等烷氧基苯酚(alkoxy phenol)类;邻-异丙烯基苯酚、对-异丙烯基苯酚、2-甲基-4-异丙烯基苯酚、2-乙基-4-异丙烯基苯酚等异丙烯基苯酚(isopropenyl phenol)类;苯基苯酚(phenyl phenol)之芳基苯酚(aryl phenol)类;4,4′-二羟基联苯、双酚A、间-苯二酚(resorcinol)、对-苯二酚(hydroquinone)、1,2,3-苯三酚(pyrogallol)等多羟基苯(polyhydroxyphenol)类等。上述化合物可单独一种使用或混合多种使用。其中,该芳香族羟基化合物较佳为邻-甲酚、间-甲酚、对-甲酚、2,5-二甲苯酚、3,5-二甲苯酚或2,3,5-三甲基苯酚。
于本发明的具体例中,与芳香族羟基化合物缩合的醛类为:甲醛、多聚甲醛(paraformaldehyde)、三聚甲醛(trioxane)、乙醛、丙醛、丁醛、三甲基乙醛、丙烯醛(acrolein)、丁烯醛(crotonaldehyde)、环己醛(cyclo hexanealdehyde)、呋喃甲醛(furfural)、呋喃基丙烯醛(furylacrolein)、苯甲醛、对苯二甲醛(terephthal aldehyde)、苯乙醛、α-苯基丙醛、β-苯基丙醛、邻-羟基苯甲醛、间-羟基苯甲醛、对-羟基苯甲醛、邻-甲基苯甲醛、间-甲基苯甲醛、对-甲基苯甲醛、邻-氯苯甲醛、间-氯苯甲醛、对-氯苯甲醛、肉桂醛等。上述醛类可单独一种使用或混合多种使用。其中,该醛类较佳为甲醛。
于本发明的一较佳具体例中,所述酚醛清漆树脂(A)包含高邻位酚醛清漆树脂(A-1),其它酚醛清漆树脂则以随机方式于邻位-对位、对位-对位或邻位-邻位上键结亚甲基。
根据本发明的高邻位酚醛清漆树脂(A-1)通常含有18%至25%亚甲基键结于邻位-邻位上,较佳为含有19%至25%亚甲基键结于邻位-邻位上,更佳为含有20%至25%亚甲基键结于邻位-邻位上。
该高邻位酚醛清漆树脂(A-1)一般是由前述的芳香族羟基化合物及醛类,在2价金属盐催化剂存在下,于酸性(pH值为1至5)下经减压脱水后缩合而得。另可选择性再添加酸催化剂进行脱水缩合反应,并除去未反应的单体,其中此脱水缩合反应可参阅日本专利文献特开昭55-090523号公报、特开昭59-080418号公报及特开昭62-230815号公报,这些文献以引用方式并入本文。
于本发明的较佳具体例中,所述高邻位酚醛清漆树脂(A-1)于制备时,芳香族羟基化合物及醛类的摩尔数使用比例通常为1∶0.5至0.85;更佳为1∶0.55至0.82;尤佳为1∶0.6至0.8。
于本发明的一较佳具体例中,所述2价金属盐催化剂为醋酸锌、醋酸锰、醋酸钡、硝酸锰、硼酸锌、氯化锌、氧化锌等。上述2价金属盐催化剂可单独一种使用或混合多种使用。基于芳香族羟基化合物为100重量份,该2价金属催化剂的使用量通常为0.01重量份至1.0重量份,较佳为0.03重量份至0.8重量份,更佳为0.05重量份至0.5重量份。
于本发明的一较佳具体例中,所述酸催化剂为硫酸二甲酯、硫酸二乙酯、硫酸二丙酯等。上述酸催化剂可单独一种使用或混合多种使用。基于芳香族羟基化合物为100重量份,该酸催化剂的使用量通常为0.005重量份至1.0重量份,较佳为0.008重量份至0.8重量份,更佳为0.01重量份至0.5重量份。
于本发明的一较佳具体例中,基于酚醛清漆树脂(A)为100重量份,高邻位酚醛清漆树脂(A-1)的使用量通常是30重量份至100重量份,较佳为40重量份至100重量份,更佳为50重量份至100重量份。若使用高邻位酚醛清漆树脂(A-1),则可进一步提升感度经时安定性。
本发明所述的邻萘醌二叠氮磺酸类的酯化物(B)可选用已知经常使用者,并无特别的限制。于本发明的较佳具体例中,该邻萘醌二叠氮磺酸类的酯化物(B)为邻萘醌二叠氮-4-磺酸、邻萘醌二叠氮-5-磺酸、邻萘醌二叠氮-6-磺酸等邻萘醌二叠氮磺酸与羟基化合物的酯化物,更佳为上述邻萘醌二叠氮磺酸与多元羟基化合物的酯化物。上述化合物可完全酯化或部分酯化,前述羟基化合物的种类可例如:(一)羟基二苯甲酮类、(二)式(13)的羟基芳基化合物、(三)式(14)的(羟基苯基)烃类化合物以及(四)其它芳香族羟基化合物,现分述如下:
(一)羟基二苯甲酮类的具体例为2,3,4-三羟基二苯甲酮、2,4,4′-三羟基二苯甲酮、2,4,6-三羟基二苯甲酮、2,3,4,4′-四羟基二苯甲酮、2,2′,4,4′-四羟基二苯甲酮、2,3′,4,4′,6-五羟基二苯甲酮、2,2′,3,4,4′-五羟基二苯甲酮、2,2′,3,4,5′-五羟基二苯甲酮、2,3′,4,5,5′-五羟基二苯甲酮或2,3,3′,4,4′,5′-六羟基二苯甲酮;
(二)羟基芳基化合物的具体例为具有式(13)所示的结构式:
其中:
R31至R33表示氢原子或具1至6个碳数的烷基(alkyl);
R34至R39表示氢原子、卤素原子、具1至6个碳数的烷基、具1至6个碳数的烷氧基(alkoxy)、具1至6个碳数的脂烯基(alkenyl)或环烷基(cycloalkyl);
R40及R41表示氢原子、卤素原子或具1至6个碳数的烷基;
x、y及z表示1至3的整数;及
n表示0或1。
于本发明的较佳具体例中,具有式(13)所示结构式的羟基芳基化合物为三(4-羟基苯基)甲烷、双(4-羟基-3,5-二甲基苯基)-4-羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-3-羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-2-羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-4-羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-3-羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-2-羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-3,4-二羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-3,4-二羟基苯基甲烷、双(4-羟基-3,5-二甲基苯基)-2,4-二羟基苯基甲烷、双(4-羟基-2,5-二甲基苯基)-2,4-二羟基苯基甲烷、双(4-羟基苯基)-3-甲氧基-4-羟基苯基甲烷、双(3-环己基-4-羟基苯基)-3-羟基苯基甲烷、双(3-环己基-4-羟基苯基)-2-羟基苯基甲烷、双(3-环己基-4-羟基苯基)-4-羟基苯基甲烷、双(3-环己基-4-羟基-6-甲基苯基)-2-羟基苯基甲烷、双(3-环己基-4-羟基-6-甲基苯基)-3-羟基苯基甲烷、双(3-环己基-4-羟基-6-甲基苯基)-4-羟基苯基甲烷、双(3-环己基-4-羟基-6-甲基苯基)-3,4-二羟基苯基甲烷、双(3-环己基-6-羟基苯基)-3-羟基苯基甲烷、双(3-环己基-6-羟基苯基)-4-羟基苯基甲烷、双(3-环己基-6-羟基苯基)-2-羟基苯基甲烷、双(3-环己基-6-羟基-4-甲基苯基)-2-羟基苯基甲烷、双(3-环己基-6-羟基-4-甲基苯基)-4-羟基苯基甲烷、双(3-环己基-6-羟基-4-甲基苯基)-3,4-二羟基苯基甲烷、1-[1-(4-羟基苯基)异丙基]-4-[1,1-双(4-羟基苯基)乙基]苯或1-[1-(3-甲基-4-羟基苯基)异丙基]-4-[1,1-双(3-甲基-4-羟基苯基)乙基]苯。
(三)(羟基苯基)烃类化合物的具体例为具有式(14)所示的结构式:
其中:
R42及R43表示氢原子或具1至6个碳数的烷基;及
x′及y′表示1至3的整数。
于本发明的较佳具体例中,具有式(14)所示结构式的(羟基苯基)烃类为2-(2,3,4-三羟基苯基)-2-(2′,3′,4′-三羟基苯基)丙烷、2-(2,4-二羟基苯基)-2-(2′,4′-二羟基苯基)丙烷、2-(4-羟基苯基)-2-(4′-羟基苯基)丙烷、双(2,3,4-三羟基苯基)甲烷或双(2,4-二羟基苯基)甲烷。
(四)其它芳香族羟基化合物的具体例为苯酚、对-甲氧基苯酚、二甲基苯酚、对苯二酚、双酚A、萘酚(naphthol)、邻苯二酚(pyrocatechol)、1,2,3-苯三酚甲醚(pyrogallolmonomethyl ether)、1,2,3-苯三酚-1,3-二甲基醚(pyrogallol-1,3-dimethyl ether)、3,4,5-三羟基苯甲酸(gallic acid)或部分酯化或部分醚化的3,4,5-三羟基苯甲酸。
前述羟基化合物较佳为2,3,4-三羟基二苯甲酮或2,3,4,4′-四羟氧基二苯甲酮。前述羟基化合物可单独一种使用或混合多种使用。
根据本发明的正型感光性树脂组合物中的邻萘醌二叠氮磺酸类的酯化物(B),可使用含有醌二叠氮基的化合物,例如:邻萘醌二叠氮-4(或5)-磺酸卤盐与上述(一)~(四)的羟基化合物经缩合反应,可完全酯化或部分酯化而得的化合物。前述缩合反应通常在二氧杂环己烷(dioxane)、N-吡咯烷酮(N-pyrrolidone)、乙酰胺(acetamide)等有机溶媒中进行,较佳为在三乙醇胺(triethanolamine)、碱金属碳酸盐或碱金属碳酸氢盐等碱性缩合剂存在下进行。
于本发明的较佳具体例中,基于羟基化合物中的羟基总量100摩尔%;更佳为50摩尔%以上;尤佳为60摩尔%以上的羟基与邻萘醌二叠氮-4(或5)磺酸卤盐缩合而成酯化物,亦即酯化度在50%以上;更佳为60%以上。
于本发明的具体例中,基于酚醛清漆树脂(A)的使用量为100重量份,本发明的邻萘醌二叠氮磺酸类的酯化物(B)的使用量通常为1至100重量份;较佳为5至80重量份;更佳为10至60重量份。
本发明所述的染料(C)包含染料(C-1)及染料(C-2),且该染料(C-1)是选自由双偶氮系染料、蒽醌系染料及三价铬偶氮系染料所组成的群;及该染料(C-2)为三芳甲烷系染料,当无同时使用染料(C-1)及染料(C-2)时,则有黏度经时安定性及感度经时安定性不佳的问题。
双偶氮系染料为本发明所属技术领域技术人员可选用的,并有许多商用双偶氮系染料可供选择,例如:C.I.AcidBlack 1、C.I.AcidBlack 24、C.I.Reactive Black 5、C.I.SolventBlack 3(商品名Sudan Black 141;中央合成化学制、商品名Neptun Black X60;BASF制)及根本特殊化学制的商品名Oil Black DA-411等。
根据本发明的蒽醌系染料为本发明所属技术领域技术人员可选用的,并有许多商用蒽醌系染料可供选择,例如:C.I.Solvent Red 52、C.I.Solvent Red 111、C.I.Solvent Red149、C.I.Solvent Red 150、C.I.Solvent Red 151、C.I.Solvent Red 168、C.I.Solvent Red 191、C.I.Solvent Red 207、C.I.Solvent Blue 35、C.I.Solvent Blue 36、C.I.Solvent Blue 63、C.I.Solvent Blue 78、C.I.Solvent Blue 83、C.I.Solvent Blue 87、C.I.Solvent Blue 94、C.I.SolventBlue 97、C.I.Solvent Blue 101、C.I.Solvent Green 3、C.I.Solvent Green 20、C.I.SolventGreen 28、C.I.Solvent Violet 13、C.I.Solvent Violet 14、C.I.Solvent Violet 36、C.I.DisperseRed 22、C.I.Disperse Red 60、C.I.Disperse Violet 31、C.I.Disperse Violet 28、C.I.Vat Black27及日本化药制的商品名Kayaset Black A-N等。
根据本发明的三价铬偶氮系染料为本发明所属技术领域技术人员可选用的,并有许多商用三价铬偶氮系染料可供选择,例如:Solvent Black 27(商品名Neozapon Black X51;BASF制、商品名Van CHAKU Black Z1-1500;玄玄化学制)、Solvent Black 29(商品名VALIFAST BLACK 3808;ORIENT CHEMICALS制)、C.I.Solvent Black 34(商品名VALIFAST BLACK 3804;ORIENT CHEMICALS制)等。
根据本发明的染料(C-1)可单独使用或混合多种使用。
根据本发明的三芳甲烷系染料(C-2)为本发明所属技术领域技术人员可选用的,于本发明较佳的具体例中,该三芳甲烷系染料(C-2)具有下列通式(1)或式(2)所示的结构式或其盐类:
式(1)中:
R1及R2是独立选自由氢原子、卤素原子及具1至5个碳数的烷基所组成的群;
R3、R4、R5及R6是独立选自由氢原子、具1至5个碳数的烷基、苯基及芐基所组成的群;及
R7系选自由通式(3)、通式(4)及通式(5)所组成的群;
其中:
R8至R10是选自由氢原子及-NR25R26所组成的群;
其中:
R25及R26是独立选自由氢原子、具1至5个碳数的烷基、芐基、苯基及p位包含具1至3个碳数的烷基或具1至3个碳数的烷氧基取代的苯基所组成的群;及
R11至R16是独立选自由氢原子、羟基及-SO3-所组成的群。
式(2)中:
R21及R22是独立选自由氢原子、卤素原子及具1至5个碳数的烷基所组成的群;
R23是选自由氢原子、-SO3-、羧基、具1至3个碳数的烷基、具1至3个碳数的烷氧基及-NR25R26所组成的群;及
R24是选自由氢原子及-SO3-所组成的群。
较佳地,根据本发明的R21、R22、R23、R25及R26中具1至3个碳数的烷基为甲基、乙基或丙基;R8及R23中具1至3个碳数的烷氧基为甲氧基、乙氧基或丙氧基;R25及R26中包含具1至3个碳数的烷氧基取代的苯基为p-甲氧苯基、p-乙氧苯基、p-丙氧苯基;
根据本发明的三芳甲烷系染料可为通式(1)或通式(2)所示结构式的盐类,例如钠、钾等碱金属的盐类或如三乙胺、2-乙基己基胺及1-胺基-3-苯基丁烷的胺盐。这些盐类亦可为与-SO3-所形成的盐类。
根据本发明的三芳甲烷系染料(C-2)有许多商用染料可供选择,例如:C.I.Acid Green3、C.I.Acid Green 9、C.I.Acid Green 16、C.I.Acid Green 50、C.I.Acid Blue 7、C.I.AcidBlue 83(商品名Brilliant Blue R;Trust Chem制)、C.I.Acid Blue 90、C.I.Acid Blue 108、C.I.Acid Violet 17(商品名Coomassie Violet R200;Sigma制)、C.I.Acid Violet 49、C.I.Solvent Green 15、C.I.Solvent Violet 8、C.I.Basic Blue 1、C.I.Basic Blue 5、C.I.BasicBlue 7(商品名Basonyl Blau 636;BASF制)、C.I.Basic Blue 8、C.I.Basic Blue 26、C.I.Solvent Blue 5、C.I.Solvent Blue 38、C.I.Basic Green 1、C.I.Basic Red 9、C.I.Basic Violet3、C.I.Basic Violet 12、C.I.Basic Violet 14、Methyl Violet、Crystal Violet、Victoria BlueB、Oil Blue 613(ORIENT CHEMICALS制)、VALIFAST Blue 1621(ORIENTCHEMICALS制)、SBN Blue 701(保土谷化学公司制造)及其衍生物等。
根据本发明的三芳甲烷系染料(C-2)可单独使用或混合多种使用。
较佳地,所述染料(C)进一步包含染料(C-3),其中该染料(C-3)为酞菁系染料。本发明所述的酞菁系染料较佳具有通式(6)所示的结构式:
其中:
R27表示取代基,较佳地,其为下述通式(7)中的Ra1至Ra8与Rb1至Rb8所示的取代基;及
m表示1至8范围的整数;较佳为1至6;更佳为1至4。当m为2以上的整数时,多个存在的R27可以相同或不同。
M是选自由金属、金属氯化物、金属氧化物及金属氢氧化物所组成的群。较佳地所述金属是选自由锌、镁、硅、锡、铑、铂、钯、钼、锰、铅、铜、镍、钴及铁所组成的群;所述金属氯化物是选自由AlCl、InCl、FeCl、TiCl2、SnCl2、SiCl2及GeCl2所组成的群;所述金属氧化物是选自由TiO及VO所组成的群;所述金属氢氧化物为Si(OH)2;更佳地,M是选自由锌、钯、铜、镍、钴及VO所组成的群;尤佳地,M是选自由锌、铜、钴及VO所组成的群;最佳地,M为铜。
于本发明的具体例中,该酞菁系染料较佳是具有为通式(7)所示的结构式:
其中:
Ra1至Ra8与Rb1至Rb8分别独立选自由氢原子、卤素原子、氰基、硝基、醛基(formyl)、羧基、磺基(sulfo)、具1至20个碳数的含取代或无取代的烷基、具6至24个碳数的含取代或无取代的芳基、具1至10个碳数的含取代或无取代的杂环基、具1至20个碳数的含取代或无取代的烷氧基、具6至14个碳数的含取代或无取代的芳氧基、具2至21个碳数的含取代或无取代的酰基、具1至20个碳数的含取代或无取代的烷基磺酰基(alkylsulfonyl)、具6至14个碳数的含取代或无取代的芳基磺酰基、具1至10个碳数的含取代或无取代的杂环系磺酰基(heterysulfonyl)、具1至25个碳数的含取代或无取代的胺基甲酰基(carbamoyl)、具0至32个碳数的含取代或无取代的胺磺酰基(sulfamoyl)、具1至20个碳数的含取代或无取代的烷氧羰基(alkoxycarbonyl)、具7至15个碳数的含取代或无取代的芳氧羰基(aryloxycarbonyl)、具2至21个碳数的含取代或无取代的酰胺基(acylamino)、具1至20个碳数的含取代或无取代的磺酰基胺基(sulfonylamino)及具0至36个碳数的含取代或无取代的胺基所组成的群;其中,胺基中包括苯胺基。另外,为得较佳的溶剂相溶性,Ra1至Ra8与Rb1至Rb8中较佳至少8个为氢原子,Ra1至Ra8不全为氢原子。
Ra1至Ra8与Rb1至Rb8较佳是分别独立选自由氢原子、卤素原子、羧基、磺基、具1至16个碳数的含取代或无取代的烷基(例如:甲基、乙基、正丙基、异丙基)、具6至24个碳数的含取代或无取代的芳基(例如:苯基、p-甲氧基苯基、p-十八烷基苯基)、具1至16个碳数的含取代或无取代的烷氧基(例如:甲氧基、乙氧基、正辛氧基)、具6至10个碳数的含取代或无取代的芳氧基(例如:苯氧基、p-乙氧基苯氧基)、具1至20个碳数的含取代或无取代的烷基磺酰基(例如:甲烷磺酰基、正丙基磺酰基、正辛基磺酰基)、具6至14个碳数的含取代或无取代的芳基磺酰基(例如:甲苯磺酰基、苯磺酰基)、具0至20个碳数的含取代或无取代的胺磺酰基(例如:甲基胺磺酰基、正丁基胺磺酰基)、具1至17个碳数的烷氧羰基(例如:甲氧羰基、正丁氧羰基)、具7至15个碳数的含取代或无取代的芳氧羰基(例如:苯氧羰基)、具2至21个碳数的含取代或无取代的酰胺基(例如:乙酰胺基、三甲基乙酰胺基)及具1至18个碳数的磺酰基胺基(例如:甲烷磺酰基胺基、正丁烷磺酰基胺基)。
更佳地,Ra1至Ra8与Rb1至Rb8为分别独立选自由氢原子、卤素原子、羧基、磺基、具1至16个碳数的含取代或无取代的烷基、具1至16个碳数的含取代或无取代的烷氧基、具1至20个碳数的含取代或无取代的烷基磺酰基、具6至14个碳数的含取代或无取代的芳基磺酰基、具2至20个碳数的含取代或无取代的胺磺酰基、具1至13个碳数的烷氧羰基、具2至21个碳数的含取代或无取代的酰胺基及具1至18个碳数的磺酰基胺基所组成的群。
尤佳地,Ra1至Ra8为分别独立选自由氢原子、卤素原子、磺基、具1至16个碳数的含取代或无取代的烷氧基、具1至20个碳数的含取代或无取代的烷基磺酰基、具6至14个碳数的含取代或无取代的芳基磺酰基、具2至20个碳数的含取代或无取代的胺磺酰基、具2至21个碳数的含取代或无取代的酰胺基及具1至18个碳数的磺酰基胺基所组成的群;Rb1至Rb8为氢原子或卤素原子。
最佳地,Ra1至Ra8为分别独立选自由氢原子、磺基、具1至20个碳数的无取代的烷基磺酰基、具6至14个碳数的无取代的芳基磺酰基及具7至20个碳数的无取代的胺磺酰基所组成的群;Rb1至Rb8为氢原子。
另外,为得较佳的溶剂相溶性,Ra1和Ra2中的任意一方、Ra3和Ra4中的任意一方、Ra5和Ra6中的任意一方以及Ra7和Ra8中的任意一方中,四个不同时为氢原子为较佳。
当Ra1至Ra8和Rb1至Rb8所示各基团具有取代基时,该取代基的具体例如下:
具1至20个碳数的链状或环状含取代或无取代的烷基(例如:甲基、乙基、异丙基、环己基、苄基、苯乙基)、具6至18个碳数的含取代或无取代的芳基(例如:苯基、氯苯基、2,4-二叔丁基苯基、1-萘基)、具2至20个碳数的含取代或无取代的烯基(例如:乙烯基、2-甲基乙烯基)、具2至20个碳数的含取代或无取代的炔基(例如:乙炔基、2-甲基乙炔基、2-苯基乙炔基)、卤素原子(例如:氟、氯、溴、碘)、氰基、羟基、羧基、具2至20个碳数的含取代或无取代的酰基(例如:乙酰基、苯甲酰基、水杨酰基、三甲基乙酰基)、具1至20个碳数的含取代或无取代的烷氧基(例如:甲氧基、丁氧基、环己氧基)、具6至20个碳数的含取代或无取代的芳氧基(例如:苯氧基、1-萘氧基、p-甲氧基苯氧基)、具1至20个碳数的含取代或无取代的烷硫基(例如:甲硫基、丁硫基、苄硫基、3-甲氧基丙基硫基)、具6至20个碳数的含取代或无取代的芳硫基(例如:苯硫基、4-氯苯硫基)、具1至20个碳数的含取代或无取代的烷基磺酰基(例如:甲烷磺酰基、丁烷磺酰基)、具6至20个碳数的含取代或无取代的芳基磺酰基(例如:苯磺酰基、对甲苯磺酰基)、具1至17个碳数的含取代或无取代的胺基甲酰基(例如:无取代的胺基甲酰基、甲基胺基甲酰基、乙基胺基甲酰基、正丁基胺基甲酰基、二甲基胺基甲酰基)、具1至16个碳数的含取代或无取代酰胺基(例如:乙酰胺基、苯甲酰胺基)、具2至20个碳数的含取代或无取代酰氧基(例如:乙酰氧基、苯甲酰氧基)、具2至20个碳数的含取代或无取代的烷氧羰基(例如:甲氧羰基、乙氧羰基)、5或6元的含取代或无取代的杂环基(例如:吡啶基、噻吩基、呋喃基、噻唑基、咪唑基、吡唑基等芳香族杂环基;吡咯烷环、哌啶环、吗啉环、吡喃环、硫代吡喃环、二恶烷环、二硫戊环等非芳香族杂环基)。
Ra1至Ra8与Rb1至Rb8各基团中的取代基较佳选自由具1至16个碳数的链状或环状含取代或无取代的烷基、具6至14个碳数的芳基、具1至16个碳数的烷氧基、具6至14个碳数的芳氧基、卤素原子、具2至17个碳数的烷氧羰基、具1至10个碳数的胺基甲酰基及具1至10个碳数的酰胺基所组成的群;
更佳地;其是选自由具1至10个碳数的链状或环状的烷基、具6至10个碳数的芳基、具1至10个碳数的烷氧基、具6至10个碳数的芳氧基、氯原子、具2至11个碳数的烷氧羰基、具1至7个碳数的胺基甲酰基及具1至8个碳数的酰胺基所组成的群;
尤佳地;其是选自由具1至8个碳数的链状或环状无取代的烷基、具1至8个碳数的无取代的烷氧基、具3至9个碳数的无取代的烷氧羰基、苯基及氯原子所组成的群。最佳地,其为具1至6个碳数的无取代的烷氧基。
根据本发明的通式(6)或(7)所示的化合物可在任意位置结合形成聚合物,此时各单元可相同或不同,亦可与聚苯乙烯、聚甲基丙烯酸酯、聚乙烯醇、纤维素等聚合物链相结合。
根据本发明的通式(6)或(7)所示的化合物可单独使用特定的化合物,也可以将多种结构不同的化合物混合使用。较佳地,其是使用取代基的取代位置不同的异构体的混合物。
于本发明的较佳具体例中,该酞菁系染料(C-3)具有式(8)、式(9)、式(10)、式(11)或式(12)所示的结构式。
根据本发明的酞菁系染料(C-3)有许多商用染料可供选择,例如:C.I.Acid Blue 249、C.I.Solvent Blue 25、C.I.Solvent Blue 55、Solvent Blue 64(商品名Neptun Blue 698)、Solvent Blue 67、C.I.Solvent Blue 70(商品名Neozapon Blue 807;BASF制)、C.I.DirectBlue 199、C.I.Direct Blue 86(商品名Turquoise Blue;Italia Incorporation制)等。
若使用酞菁系染料(C-3)时,则可进一步提升黏度经时安定性。
于本发明的较佳具体例中,该正型感光性树脂组合物可依需要进一步包含紫环酮系(perinone)染料、苝系(perylene)染料、偶氮系(azo)染料、甲川系(methine)染料、喹啉系(quinoline)染料、吖嗪系(azine)染料、蒽醌系(anthraquinone)染料、靛蓝系(indigo)染料、类菁系(oxonol)染料、噻嗪系(thiazine)染料、蒽吡啶酮系(anthrapyridone)染料、二苯骈派喃系(xanthene)染料或苯并吡喃系(benzopyran)染料等染料。
于本发明的较佳实施例中,基于酚醛清漆树脂(A)的使用量为100重量份,该染料(C)的使用量为10至35重量份,较佳为12至30重量份,更佳为15至25重量份。
于本发明的较佳实施例中,基于酚醛清漆树脂(A)的使用量为100重量份,该染料(C-1)的使用量为2至15重量份,较佳为3至12重量份,更佳为5至10重量份;该染料(C-2)的使用量为1至10重量份,较佳为2至9重量份,更佳为3至8重量份;该染料(C-3)的使用量为5至30重量份,较佳为7至28重量份,更佳为10至25重量份。
本发明所述的溶剂(D)是指较易与其它有机成分互相溶解但又不与上述成分相互反应的有机溶剂。
于本发明的具体例中,该溶剂(D)为乙二醇单甲基醚、乙二醇单乙基醚、二乙二醇单乙基醚、二乙二醇单正丙基醚、二乙二醇单正丁基醚、三乙二醇单甲基醚、三乙二醇单乙基醚、丙二醇单甲基醚、丙二醇单乙基醚、二丙二醇单甲基醚、二丙二醇单乙基醚、二丙二醇单正丙基醚、二丙二醇单正丁基醚、三丙二醇单甲基醚、三丙二醇单乙基醚等(聚)亚烷基二醇单烷醚类;乙二醇单甲基醚醋酸酯、乙二醇单乙基醚醋酸酯、丙二醇单甲基醚醋酸酯、丙二醇单乙基醚醋酸酯等(聚)亚烷基二醇单烷醚醋酸酯类;二乙二醇二甲基醚、二乙二醇甲基乙基醚、二乙二醇二乙基醚、四氢呋喃等其它醚类;甲乙酮、环己酮、2-庚酮、3-庚酮等之酮类;2-羟基丙酸甲酯、2-羟基丙酸乙酯(乳酸乙酯)等乳酸烷酯类;2-羟基-2-甲基丙酸甲酯、2-羟基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基醋酸乙酯、羟基醋酸乙酯、2-羟基-3-甲基丁酸甲酯、3-甲基-3-甲氧基丁基醋酸酯、3-甲基-3-甲氧基丁基丙酸酯、醋酸乙酯、醋酸正丙酯、醋酸异丙酯、醋酸正丁酯、醋酸异丁酯、醋酸正戊酯、醋酸异戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸异丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙酰醋酸甲酯、乙酰醋酸乙酯、2-氧基丁酸乙酯等其它酯类;甲苯、二甲苯等芳香族烃类;N-甲基吡咯烷酮、N,N-二甲基甲酰胺、N,N-二甲基乙酰胺等羧酸胺类。上述溶剂(D)可一种单独使用或混合多种使用。较佳地,该溶剂(D)为丙二醇单乙基醚、丙二醇单甲基醚醋酸酯或乳酸乙酯。
于本发明的具体例中,基于酚醛清漆树脂(A)的使用量为100重量份,上述溶剂(D)的使用量通常为500至2,000重量份;较佳为600至1,800重量份;更佳为700至1,500重量份。
根据本发明的正型感光性树脂组合物较佳进一步包含添加剂(E),该添加剂(E)较佳包括但不限于:密着助剂(密着剂)、表面平坦剂、稀释剂以及增感剂等。
所述密着助剂的具体例为三聚氰胺(melamine)化合物及硅烷系(silane)化合物,其作用在于增加正型感光性树脂组合物与附着基板间的密着性,其中三聚氰胺的具体例为市售的Cymel-300、Cymel-303(CYTEC制造)、MW-30MH、MW-30、MS-11、MS-001、MX-750或MX-706(三和化学制)市售品。硅烷(silane)系化合物的具体例为乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三(2-甲氧基乙氧基)硅烷、N-(2-氨基乙基)-3-氨基丙基甲基二甲氧基硅烷、N-(2-氨基乙基)-3-氨基丙基三甲氧基硅烷、3-氨基丙基三乙氧基硅烷、3-环氧丙氧基丙基三甲氧基硅烷、3-环氧丙氧基丙基甲基二甲氧基硅烷、2-(3,4-环氧环己基)乙基三甲氧基硅烷、3-氯丙基甲基二甲氧基硅烷、3-氯丙基三甲氧基硅烷、3-甲基丙烯氧基丙基三甲氧基硅烷、3-硫醇基丙基三甲氧基硅烷或双-1,2-(三甲氧基硅基)乙烷。
于本发明的具体例中,基于酚醛清漆树脂(A)的使用量为100重量份,三聚氰胺化合物密着助剂的使用量一般为0重量份至20重量份;较佳为0.5重量份至18重量份;更佳为1.0重量份至15重量份;硅烷系化合物密着助剂的使用量一般为0重量份至2重量份;较佳为0.001重量份至1重量份;更佳为0.005重量份至0.8重量份。
所述表面平坦剂的具体例为氟系表面活性剂或硅系表面活性剂。所述氟系表面活性剂的具体例为Flourate FC-430、FC-431(3M制)或F top EF122A、122B、122C、126、BL20(Tochem product制)市售品。硅系表面活性剂的具体例为SF8427或SH29PA(TorayDow Corning Silicone制)市售品。
于本发明的具体例中,基于酚醛清漆树脂(A)的使用量为100重量份,上述表面活性剂的使用量一般为0重量份至1.2重量份;较佳为0.025重量份至1.0重量份;更佳为0.050重量份至0.8重量份。
所述稀释剂的具体例如为RE801或RE802(帝国Ink制)等市售品。
所述增感剂的具体例为TPPA-1000P、TPPA-100-2C、TPPA-1100-3C、TPPA-1100-4C、TPPA-1200-24X、TPPA-1200-26X、TPPA-1300-235T、TPPA-1600-3M6C或TPPA-MF市售品(日本本州岛化学工业制),其中较佳为TPPA-600-3M6C或TPPA-MF。上述的增感剂可单独一种使用或者混合多种使用。
于本发明的具体例中,基于酚醛清漆树脂(A)的使用量为100重量份,该增感剂的使用量通常为0~20重量份;较佳为0.5~18重量份;更佳为1.0~15重量份。
此外,本发明亦可依需要再添加其它的添加剂,例如:可塑剂、安定剂等。
根据本发明的正型感光性树脂组合物的制备为本发明所属技术领域技术人员可实施的,具体言之,其是将上述酚醛清漆树脂(A)、邻萘醌二叠氮磺酸类的酯化物(B)、染料(C)以及溶剂(D)于搅拌器中搅拌,使其均匀混合成溶液状态,并可视需要添加密着助剂、表面平坦剂、稀释剂、可塑剂、安定剂、增感剂等添加剂(E)。
本发明亦提供一种薄膜晶体管阵列基板(简称TFT阵列基板)的制造方法,其中该薄膜晶体管阵列基板包含基板及图案,该方法包含以前述的正型感光性树脂组合物涂布于所述基板上以形成所述图案。
于本发明的具体例中,所述正型感光性组合物可经由依序施予预烤(prebake)步骤、曝光步骤、显影步骤及后烤(postbake)处理步骤后,而于基板形成图案。
申言之,本发明使用前述正型感光性树脂组合物形成图案的方法,是藉由旋转涂布、流延涂布或辊式涂布等涂布方法,将前述正型感光性树脂组合物涂布在基板上,并于涂布后,以预烤方式去除溶剂,而形成一预烤涂膜。其中,预烤的条件,依各成分的种类、配合比率而异,通常为温度在70至110℃间,进行1至15分钟。
预烤后,将该涂膜于指定的掩膜下进行曝光,然后于23±2℃的温度下浸渍于显影液中,历时15秒至5分钟,藉此将不要的部分除去而形成特定的图案。曝光所使用的光线,以g线、h线、i线等紫外线为佳,而紫外线照射装置可为(超)高压水银灯及金属卤素灯。
本发明所使用显影液的具体例为氢氧化钠、氢氧化钾、碳酸钠、碳酸氢钠、碳酸钾、碳酸氢钾、硅酸钠、甲基硅酸钠、氨水、乙胺、二乙胺、二甲基乙醇胺、氢氧化四甲胺、氢氧化四乙铵、胆碱、吡咯、哌啶或1,8-二氮杂二环-[5,4,0]-7-十一烯之碱性化合物。
较佳地,显影液的浓度是0.001重量%至10重量%;更佳是0.005重量%至5重量%;尤佳是0.01重量%至1重量%。
使用前述碱性化合物所构成的显影液时,通常于显影后以水洗净,再以压缩空气或压缩氮气风干前述涂膜。接着,使用热板或烘箱等加热装置对前述涂膜进行后烤处理。后烤温度通常为100至250℃,其中,使用热板的加热时间为1至60分钟,使用烘箱的加热时间为5至90分钟。经过以上的处理步骤后,即可于基板形成图案。
本发明再提供一种薄膜晶体管阵列基板,其是由前述的方法所制得。
于本发明的具体例中,其是将本发明的正型感光性树脂组合物以旋转涂布、流延涂布或辊式涂布等涂布方式涂布于含有铝、铬、氮化硅或非结晶硅等的薄膜的玻璃基板或塑料基板上而形成正型光阻剂层,接着经过预烤、曝光、显影及后烤处理形成感光性树脂图案之后,进行蚀刻及光阻剥离;重复上述步骤即可制得含多数薄膜晶体管或电极的薄膜晶体管阵列基板。
请参阅图1,其是绘示根据本发明一实施例的LCD用TFT阵列基板的部分剖面示意图。首先,于玻璃基板101上的铝薄膜等处设置栅极(闸极)102a及储存电容Cs电极102b。其次,于栅极102a上覆盖氧化硅膜(SiOx)103或氮化硅膜(SiNx)104等而形成绝缘膜,并于此绝缘膜上形成作为半导体活性层的非晶硅层(a-Si)105。接着,为了降低接面阻抗,可设置掺杂氮不纯物的非晶硅层106于非晶硅层105上。之后,使用铝等金属,形成漏极(汲极)107a及源极107b,其中漏极107a连接于数据讯号线(图未绘示)上,而源极107b则连接于画素电极(或子画素电极)109上。而后,为保护作为半导体活性层的非晶硅层105、漏极107a或源极107b等,设置氮化硅膜等作为保护膜108。
本发明又提供一种液晶显示元件,其包含前述的薄膜晶体管阵列基板。
根据本发明的液晶显示元件,较佳可依需要包含有其它的部材。
上述液晶显示元件的基本构成形态的具体例为:(1)将TFT等驱动元件与画素电极(导电层)经排列所形成的上述本发明的TFT阵列基板(驱动基板),与由彩色滤光片及对电极(导电层)所构成的彩色滤光片基板间介入间隔体并且对向配置,最后于间隙部分封入液晶材料而构成。或者,(2)将于上述本发明的TFT阵列基板上直接形成彩光滤光片的彩色滤光片一体型TFT阵列基板,与配置了对电极(导电层)的对向基板间介入间隔体并且对向配置,最后于间隙部分封入液晶材料而构成等,其中前述使用的液晶材料可为任何一种液晶化合物或液晶组合物,此处并未特别限定。
上述导电层的具体例为ITO膜;铝、锌、铜、铁、镍、铬、钼等金属膜;或二氧化硅等金属氧化膜。较佳地,其为具透明性的膜层;更佳为ITO膜。
上述本发明的TFT阵列基板、彩色滤光片基板及对向基板等所使用的基材,其具体例为钠钙玻璃、低膨胀玻璃、无碱玻璃或石英玻璃之传统玻璃,另外,也可采用由塑料膜等构成的基板。
附图说明
图1为根据本发明一实施例的LCD用TFT阵列基板的部分剖面示意图。
图中主要元件符号说明:
101 玻璃基板
102a 栅极
102b Cs电极
103 氧化硅(SiOx)膜
104 氮化硅(SiNx)膜
105 非晶硅(a-Si)层
106 掺杂氮不纯物的非结晶硅层
107a 漏极
107b 源极
108 保护膜
109 画素电极
具体实施方式
兹以下列实例予以详细说明本发明,唯并不意味本发明仅局限于这些实例所揭示的内容。
合成例1:高邻位酚醛清漆树脂(A-1-1)的制造方法
在一容积1000毫升的四颈锥瓶上设置氮气入口、搅拌器、加热器、冷凝管及温度计,导入氮气后添加间-甲酚64.89g(0.6摩尔)、对-甲酚43.26g(0.4摩尔)、醋酸锰0.5g(0.0028摩尔)及37重量%的甲醛水溶液48.70g(0.6摩尔),缓慢搅拌并聚合3小时。然后,加入水杨酸1.38g(0.01摩尔)将pH值调至3.5,接着于300mmHg的压力下进行减压干燥30分钟,最后,将反应溶液缓慢升温至150℃,将溶剂脱挥后,可得高邻位酚醛清漆树脂(A-1-1)。
所得的高邻位酚醛清漆树脂(A-1-1)以核磁共振(13C-NMR)测得亚甲基的键结数,并以检测项目所述计算方法,计算亚甲基键结于邻位-邻位上的比例为18%。
合成例2:高邻位酚醛清漆树脂(A-1-2)的制造方法
在一容积1000毫升的四颈锥瓶上设置氮气入口、搅拌器、加热器、冷凝管及温度计,导入氮气后添加间-甲酚64.89g(0.6摩尔)、对-甲酚43.26g(0.4摩尔)、醋酸锰0.5g(0.0028摩尔)及37重量%的甲醛水溶液56.82g(0.7摩尔),缓慢搅拌并聚合3小时。然后,加入苯甲酸0.37g(0.003摩尔)将pH值调至4.8,接着于300mmHg的压力下进行减压干燥30分钟后,加入硫酸二甲酯0.03g(0.0002摩尔),并将反应溶液缓慢升温至150℃,将溶剂脱挥后可得高邻位酚醛清漆树脂(A-1-2)。
所得的高邻位酚醛清漆树脂(A-1-2)以核磁共振(13C-NMR)测得亚甲基的键结数,并以检测项目所述计算方法,计算亚甲基键结于邻位-邻位上的比例为25%。
合成例3:酚醛清漆树脂(A-2-1)的制造方法
在一容积1000毫升的四颈锥瓶上设置氮气入口、搅拌器、加热器、冷凝管及温度计,导入氮气后添加间-甲酚64.89g(0.6摩尔)、对-甲酚43.26g(0.4摩尔)、草酸1.80g(0.02摩尔)及37重量%的甲醛水溶液48.70g(0.6摩尔),缓慢搅拌并聚合3小时。然后,将反应溶液升温至150℃,将溶剂脱挥后可得酚醛清漆树脂(A-2-1)。
所得的酚醛清漆树脂(A-2-1)以核磁共振(13C-NMR)测得亚甲基的键结数,并以检测项目所述计算方法,计算亚甲基键结于邻位-邻位上的比例为16%。
合成例4:酚醛清漆树脂(A-2-2)的制造方法
在一容积1000毫升的四颈锥瓶上设置氮气入口、搅拌器、加热器、冷凝管及温度计,导入氮气后添加间-甲酚64.89g(0.6摩尔)、对-甲酚32.45g(0.3摩尔)、2,5-二甲苯酚12.22g(0.1摩尔)、草酸0.90g(0.01摩尔)及37重量%的甲醛水溶液44.64g(0.55摩尔),缓慢搅拌并聚合3小时。然后,将反应溶液升温至150℃,将溶剂脱挥后可得酚醛清漆树脂(A-2-2)。
上述所得的酚醛清漆树脂(A-2-2)以核磁共振(13C-NMR)测得亚甲基的键结数,并以检测项目所述计算方法,计算亚甲基键结于邻位-邻位上的比例为14%。
合成例5:酚醛清漆树脂(A-2-3)的制造方法
在一容积1000毫升的四颈锥瓶上设置氮气入口、搅拌器、加热器、冷凝管及温度计,导入氮气后添加间-甲酚64.89g(0.6摩尔)、对-甲酚32.45g(0.3摩尔)、2,5-二甲苯酚12.22g(0.1摩尔)、草酸0.72g(0.008摩尔)及37重量%的甲醛水溶液44.64g(0.55摩尔),缓慢搅拌并聚合3小时。然后,将反应溶液升温至150℃,将溶剂脱挥后可得酚醛清漆树脂(A-2-2)。
上述所得的酚醛清漆树脂(A-2-3)以核磁共振(13C-NMR)测得亚甲基的键结数,并以检测项目所述计算方法,计算亚甲基键结于邻位-邻位上的比例为13%。
正型感光性树脂组成物的制造方法
以下是根据表1制备实施例1至9以及比较例1至5的正型感光性树脂组成物。
实施例1
取100重量份的高邻位酚醛清漆树脂(A-2-1)、20重量份的2,3,4-三羟基二苯甲酮与1,2-萘醌二叠氮-5-磺酸的酯化物、5重量份的2,3,4,4′-四羟基二苯甲酮与1,2-萘醌二叠氮-5-磺酸的酯化物、10重量份的C.I.Solvent Black 34(商品名VALIFAST Black 3804;ORIENT CHEMICAL制)、5重量份的C.I.Acid Violet 17(商品名Coomassie Violet R200;Sigma制),加入800重量份的丙二醇单甲基醚醋酸酯(PGMEA;D-1)中,以摇动式搅拌器搅拌均匀后,即可制得实施例1的正型感光性树脂组成物。
实施例2至9
同实施例1的正型感光性树脂组成物的制作方法,不同处在于实施例2至9是改变正型感光性树脂组成物中原料的种类及使用量,其配方及检测结果如表1所示,此处不另赘述。
比较例1至5
同实施例1感光性树脂组成物制作方法,不同处在于比较例1至5是改变正型感光性树脂组成物中原料的种类及使用量,其配方及检测结果亦如表1所示。
表1:
评价方式:
感度经时安定性评价:
将实施例1至9及比较例1至5所制得的各种感光性树脂组合物,以旋转涂布方式涂布于一6时晶圆上,经由加热板于120℃下预烤2分钟后,可制得约1μm的预烤涂膜。将该预烤涂膜介于线与间距(line and space)的掩膜(日本Filcon制,1L/1S),利用不同能量的紫外光(曝光机型号AG500-4N;M&R Nano Technology制)进行照射后,再以2.38%的四甲基氢氧化铵水溶液,于23℃下予以显影1分钟,将基板上曝光部分的涂膜除去,然后以纯水洗净,可求得形成1比1线幅时的曝光时间(最佳曝光时间)Eop1。
接着,将实施例1至9及比较例1至5所制得的各种感光性树脂组合物,于23℃下置放7日,并以前述同样的操作方法求得最佳曝光时间Eop2。最后,经下式计算可得到ΔEop,并依据以下基准评价感度经时安定性。
ΔEop(mJ/cm2)=Eop2-Eop1
◎:ΔEop<30
○:50>ΔEop≥30
×:ΔEop≥50
黏度经时安定性评价:
将实施例1至9以及比较例1至5所制得的各种正型感光性树脂组合物置于45℃的烘箱加热1个月,分别量测加热前的黏度值(μ0)与加热后的黏度值(μ1),并依下列公式计算黏度变化率,评价黏度经时安定性。
粘度变化率=|μ0-μ1|/μ0×100%
μ0:加热前的黏度值
μ1:加热后的黏度值
○:黏度变化率<5%
×:黏度变化率≥5%
评价结果示于上表1。其结果可知,使用酚醛清漆树脂(A-2)及同时搭配染料(C-1)及染料(C-2)时,黏度经时安定性及感度经时安定性皆为良好(○);当使用高邻位酚醛清漆树脂(A-1)同时搭配染料(C-1)及染料(C-2)时,其感度经时安定性更提升为优良(◎);当使用酚醛清漆树脂(A-2)同时搭配染料(C-1)、染料(C-2)及染料(C-3)时,其黏度经时安定性更提升为优良(◎);而当使用高邻位酚醛清漆树脂(A-1)同时搭配染料(C-1)、染料(C-2)及染料(C-3)时,其黏度经时安定性及感度经时安定性更提升为优良(◎)。
而于比较例中,无论无同时使用染料(C-1)及染料(C-2);无使用任何染料(C);仅使用染料(C-1)及染料(C-3);及使用染料(C-2)与高邻位酚醛清漆树脂(A-1)时,其黏度经时安定性及感度经时安定性皆不佳(×)。
酚醛清漆树脂的亚甲基邻位-邻位键结比例:
使用核磁共振(13C-NMR)(型号为AV400;Bruker制)测量前述制得的酚醛清漆树脂(A)的亚甲基键结数,并根据下式计算合成例1至5的酚醛清漆树脂中,亚甲基键结于邻位-邻位上的比例:
其中,邻位-邻位键是指亚甲基键结于邻位-邻位上的数量,邻位-对位键是指亚甲基键结于邻位-对位上的数量,而对位-对位键则指亚甲基键结于对位-对位上的数量。
上述实施例仅为说明本发明的原理及其功效,而非限制本发明。熟悉本领域的技术人员对上述实施例所做的修改及变化仍不违背本发明的精神。
Claims (4)
1.一种正型感光性树脂组合物,其包含:
酚醛清漆树脂(A);
邻萘醌二叠氮磺酸类的酯化物(B);
染料(C);及
溶剂(D);
其中所述酚醛清漆树脂(A)包含高邻位酚醛清漆树脂(A-1),其中该高邻位酚醛清漆树脂(A-1)包含18至25%亚甲基键结于邻位-邻位上;
其中所述染料(C)包含染料(C-1)、染料(C-2)及染料(C-3),且所述染料(C-1)是选自由双偶氮系染料、蒽醌系染料及三价铬偶氮系染料所组成的群;所述染料(C-2)为三芳甲烷系染料;及所述染料(C-3)为酞菁系染料;
其中基于酚醛清漆树脂(A)的使用量为100重量份,所述染料(C)的使用量为12至30重量份;所述染料(C-1)的使用量为3至12重量份;所述染料(C-2)的使用量为2至9重量份;及所述染料(C-3)的使用量为7至28重量份;
其中所述染料(C-2)具有下列通式(1)所示的结构式或其盐类:
式(1)中:
R1及R2是独立选自由氢原子、卤素原子及具1至5个碳数的烷基所组成的群;
R3、R4、R5及R6是独立选自由氢原子、具1至5个碳数的烷基、苯基及芐基所组成的群;及
R7是选自由通式(3)、通式(4)及通式(5)所组成的群;
其中:
R8至R10是选自由氢原子及-NR25R26所组成的群;
其中:
R25及R26是独立选自由氢原子、具1至5个碳数的烷基、芐基、苯基及p位包含具1至3个碳数的烷基或具1至3个碳数的烷氧基取代的苯基所组成的群;及
R11至R16是独立选自由氢原子及羟基所组成的群。
2.一种薄膜晶体管阵列基板的制造方法,其中所述薄膜晶体管阵列基板包含基板及图案,该方法包含以根据权利要求1所述的正型感光性树脂组合物涂布于所述基板上以形成所述图案。
3.一种薄膜晶体管阵列基板,其是由根据权利要求2的方法所制得。
4.一种液晶显示元件,其包含根据权利要求3所述的薄膜晶体管阵列基板。
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TWI453543B (zh) * | 2012-05-16 | 2014-09-21 | Chi Mei Corp | Positive photosensitive resin composition and its application |
TWI467334B (zh) * | 2012-08-29 | 2015-01-01 | Chi Mei Corp | 正型感光性樹脂組成物及其圖案形成方法 |
US10866512B2 (en) | 2015-10-21 | 2020-12-15 | Showa Denko K.K. | Positive photosensitive resin composition |
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CN1644393A (zh) * | 2004-01-23 | 2005-07-27 | 富士胶片株式会社 | 平版印刷版前体和平版印刷方法 |
CN101349865A (zh) * | 2007-07-17 | 2009-01-21 | 富士胶片株式会社 | 感光性组合物、可固化组合物、新化合物、可光聚合组合物、滤色器和平版印刷版原版 |
CN101872122A (zh) * | 2009-04-24 | 2010-10-27 | 凸版印刷株式会社 | 蓝色着色组合物、滤色器、液晶显示装置及有机el显示器 |
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JP2878039B2 (ja) * | 1992-07-29 | 1999-04-05 | 東京応化工業株式会社 | 感光性樹脂組成物 |
JP3369471B2 (ja) * | 1998-05-29 | 2003-01-20 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物およびレジストパターンの形成方法 |
DE602004024846D1 (de) * | 2003-04-07 | 2010-02-11 | Toray Industries | Zusammensetzung von photoempfindlichem Harz des Positivtyps |
JP2005136223A (ja) * | 2003-10-30 | 2005-05-26 | Fuji Photo Film Co Ltd | プリント配線板の製造方法 |
EP1662319A3 (en) * | 2004-11-24 | 2009-05-27 | Toray Industries, Inc. | Photosensitive resin composition |
JP2008058636A (ja) * | 2006-08-31 | 2008-03-13 | Fujifilm Corp | パターン形成材料及びパターン形成方法 |
JP2009192571A (ja) * | 2008-02-12 | 2009-08-27 | Sumitomo Bakelite Co Ltd | フォトレジスト用樹脂組成物 |
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CN1644393A (zh) * | 2004-01-23 | 2005-07-27 | 富士胶片株式会社 | 平版印刷版前体和平版印刷方法 |
CN101349865A (zh) * | 2007-07-17 | 2009-01-21 | 富士胶片株式会社 | 感光性组合物、可固化组合物、新化合物、可光聚合组合物、滤色器和平版印刷版原版 |
CN101872122A (zh) * | 2009-04-24 | 2010-10-27 | 凸版印刷株式会社 | 蓝色着色组合物、滤色器、液晶显示装置及有机el显示器 |
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