CN103160908A - Electrodeposition apparatus and processing machine thereof - Google Patents
Electrodeposition apparatus and processing machine thereof Download PDFInfo
- Publication number
- CN103160908A CN103160908A CN2011104221851A CN201110422185A CN103160908A CN 103160908 A CN103160908 A CN 103160908A CN 2011104221851 A CN2011104221851 A CN 2011104221851A CN 201110422185 A CN201110422185 A CN 201110422185A CN 103160908 A CN103160908 A CN 103160908A
- Authority
- CN
- China
- Prior art keywords
- cell
- perforation
- workpiece
- circulatory flow
- flow formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The invention relates to an electrodeposition apparatus and a processing machine thereof. The electrodeposition apparatus comprises a circulating flow channel type electrodeposition tank, an electrode and at least a fluid driving module. The circulating flow channel type electrodeposition tank is provided with an internal circulation flow channel which is filled with an electrodeposition liquid, and the fluid driving module drives the electrodeposition liquid to circulate in the internal circulation flow channel for electrodeposition. The electrodeposition apparatus provided by the invention does not need external piping, thereby reducing volume of the electrodeposition apparatus and application amount of the electrodeposition liquid, and being easy to control quality of the electrodeposition liquid. The processing machine provided by the invention respectively drives the electrodeposition apparatus and a workpiece to move along a single direction, so as to simplify complexity of positioning the electrodeposition apparatus and the workpiece, and furthermore improve positioning accuracy of the electrodeposition apparatus and the workpiece.
Description
Technical field
The present invention relates to a kind of electric deposition device and processing machine, referred to especially a kind of electric deposition device and processing machine with internal recycle runner.
Background technology
Along with the progress of industry, smart micro-machined demand day by day increases, such as: in biological detection chip form fluid channel, the making etc. that forms micropore hole, optical mirror slip or micro-mould in the joints of optical fibre all has smart micro-machined demand.So, the processing mode that general precise and tiny machining is used is mainly with the non-traditional master of being processed as, as, electron beam process, laser processing, ultrasound processing, LIGA processing procedure etc., but the processing units of above-mentioned processing mode and processing charges are quite expensive, and the surface after workpiece processing can't reach high quality and high precision.
Micro discharges processing solves above-mentioned processing mode can't make the surface after workpiece is processed reach high quality and high-precision problem.Micro discharges processing can make the surface after workpiece processing reach high precision, but the processing department of micro discharges processing can be because of the consumption of machined electrode, so that producing, the processing structure that forms on workpiece do not meet the shape of design in advance, and the finished surface of workpiece is because high thermogenesis is condensed again, hallrcuts and state such as discharge hole etc., the size and the form accuracy that cause being formed at the processing structure of workpiece reduce, and the surface quality of the finished surface of workpiece is reduced.Other procedure for processing improve the working accuracy of the processing structure that is formed at workpiece so must arrange in pairs or groups, and improve simultaneously the surface quality of the finished surface of workpiece, for example: attrition process.
Take attrition process as example, for the aperture that needs good accuracy and good hole wall or the cell wall of surfaceness, the tradition attrition process is processed mainly with the mode of boring and grinding, the abrasive material piece is evenly distributed in the excircle of round bar type abrasive material clamping device, be rotated in hole wall and to-and-fro movement by warding off bar, so that hole wall is carried out attrition process.For making the abrasive material piece can on average force in hole wall in boring and grinding, the making course of processing of grinding rod is very important.
Usually accurate grinding rod utilizes the galvanic deposit mode to make usually, and as shown in Figure 1, this electric deposition device 1 ' comprises a cell body 10 ', a dividing plate 11 ', a motor 12 ' and electrode carrier 13 '.Wherein this dividing plate 11 ' with perforation 111 ' in being arranged at cell body 10 ', to separate cell body 10 ' as one first holding part 101 ' and one second holding part 102 ', is arranged at the second holding part 102 ' with electrode carrier 13 ', so that electrode to be set.so, the water outlet 141 ' of motor 12 ' is communicated in the first holding part 101 ' by an exterior line 14 ', the water inlet 143 ' of motor 12 ' is communicated in bottom in the second holding part 102 ' by another exterior line 14 ', use and make electrodeposit liquid pass through exterior line 14 ' to flow to the first holding part 101 ', and perforation 111 ' inflow the second holding part 102 ' through dividing plate 11 ' bottom, and the electrodeposit liquid of part is upwards flowed, the electrodeposit liquid of another part is detached the second holding part 102 ' by motor 12 ' downwards, so make the workpiece that is positioned in the second holding part 102 ' be deposited polishing particles.
Although can produce grinding rod by above-mentioned electric deposition device 1 ', but its cell body 10 ' by exterior line 14 ' around, cause the volume of electric deposition device 1 ' larger, can't integrate with other processing modules, carry out online multiple processing and can't reach in same processing.And existing electric deposition device 1 ' utilizes motor 12 ' to drive electrodeposit liquid, but when driving electrodeposit liquid, must make and be full of electrodeposit liquid in exterior line 14 ' and cell body 10 ' and can utilize motor 12 ' to drive, cause the usage quantity of electrodeposit liquid more, and the usage quantity of the plural abrasive grain in electrodeposit liquid is also increased, cause holistic cost to promote, and easy care electrodeposit liquid not.the electrodeposit liquid of existing electric deposition device 1 ' is delivered to the first holding part 101 ' of cell body 10 ' from exterior line 14 ', and pass the dividing plate 11 ' of cell body 10 ', enter in the second holding part 102 ' from the sidewall of the second holding part 102 ', then electrodeposit liquid is wanted up to flow with workpiece and electrode contact the time, motor 12 ' can down detach the second holding part 102 ' with the part electrodeposit liquid, past current downflow when so causing the part electrodeposit liquid also not contact workpiece and electrode, and only have the part electrodeposit liquid up to flow and contact workpiece and electrode, the electrodeposit liquid that namely contacts workpiece and electrode is difficult for flowing and upgrades, so the flow field in cell body 10 ' arranges and easily makes the plural abrasive grain of electrodeposit liquid be difficult for uniform deposition in workpiece, and the power consumption of increase motor 12 ', and motor 12 ' is easily damaged by electrodeposit liquid.
In order to solve the above problems, the invention provides a kind of electric deposition device and processing machine, in one circulatory flow formula galvanic deposition cell of this electric deposition device, an internal recycle runner is set, there is no exterior line is set, this electrodeposit liquid only need be full of the internal recycle runner, get final product internal recycle at this circulatory flow formula galvanic deposition cell, so can reduce the usage quantity of this electrodeposit liquid, the quality of while electrodeposit liquid easy to control, and can reduce the volume of this electric deposition device, and this electric deposition device can be integrated with the processing module of other types, with in carrying out simultaneously online multiple processing.
Summary of the invention
Purpose of the present invention, be to provide a kind of electric deposition device and processing machine, in a circulatory flow formula galvanic deposition cell in electric deposition device, an internal recycle runner is set, nothing is in outer setting one exterior line of circulation galvanic deposition cell, so can reduce the volume of electric deposition device, and electric deposition device can be integrated with the processing module of other types, with in carrying out simultaneously online multiple processing.
Purpose of the present invention is to provide a kind of electric deposition device, and electric deposition device carries out galvanic deposit and adds man-hour, only fills this electrodeposit liquid in this internal recycle runner, and makes this electrodeposit liquid internal recycle in this internal recycle runner, so reduce the usage quantity of this electrodeposit liquid.
Purpose of the present invention, be to provide a kind of processing machine, processing machine drives electric deposition device and moves horizontally on first direction, another travelling workpiece is done vertical movement on second direction, not only simplify the mode that drives electric deposition device and workpiece, and make electric deposition device and workpiece reach high position precision, workpiece is carried out high-precision galvanic deposit processing.
Technical scheme of the present invention: a kind of electric deposition device is to comprise:
One circulatory flow formula galvanic deposition cell has an internal recycle runner, and this internal recycle runner is filled with an electrodeposit liquid;
One electrode is arranged at this circulatory flow formula galvanic deposition cell, and this electrode is positioned at this internal recycle runner; And at least one fluid driver module, be arranged at this circulatory flow formula galvanic deposition cell;
Wherein, one workpiece is positioned over this circulatory flow formula galvanic deposition cell, and is positioned at this internal recycle runner and with respect to this electrode, this fluid driver module drives this electrodeposit liquid internal recycle in this internal recycle runner, and by between this electrode and this workpiece, to carry out galvanic deposit processing.
In the present invention, wherein this circulatory flow formula galvanic deposition cell is to comprise:
One first assembly has one first perforation, one second perforation and a connection runner, and this first perforation and this second perforation run through this first assembly, and this connection runner is connected with this first perforation and this second perforation; And
One second assembly is arranged under this first assembly, and has a groove shaped flow conduits, and this first perforation and this second perforation are connected with this groove shaped flow conduits, to form this internal recycle runner.
In the present invention, wherein further comprise an insulating part, it is arranged between this circulatory flow formula galvanic deposition cell and this electrode, this electrode and this insulating part have respectively a through hole, this two through hole of this electrode and this insulating part is serially connected with this first perforation, and this workpiece setting is in this first perforation, and this workpiece is with respect to this electrode, this fluid driver module is arranged in this second perforation, and drives this electrodeposit liquid internal recycle in this internal recycle runner.
In the present invention, wherein this first assembly has more one the 3rd perforation, the 3rd perforation runs through this first assembly and is connected with this connection runner, this first perforation is between this second perforation and the 3rd perforation, this electrode and this workpiece setting are in this first perforation, this workpiece is with respect to this electrode, and this second perforation is respectively arranged with this fluid driver module with the 3rd perforation.
In the present invention, this fluid driver module more comprises:
One Motorized drive unit is to produce rotary power;
One fluid agitating unit, it connects this Motorized drive unit, with this electrodeposit liquid internal recycle of driving this internal recycle runner in this internal recycle runner.
In the present invention, wherein this Motorized drive unit is to comprise:
One bearing part is arranged at this circulatory flow formula galvanic deposition cell;
One gear unit is articulated in this bearing part, drives this fluid agitation unit;
One actuator drives this gear unit;
This fluid agitation unit comprises:
A connection piece is connected on this gear unit; And
One screw-blade is connected on this web member.
In the present invention, more comprise:
One module of bleeding, the plurality of through holes that it comprises a body and is arranged at this body, the gas that is produced to detach this circulatory flow formula galvanic deposition cell.
In the present invention, more comprise:
One processing module, comprise the complex processing cell body, those are processed cell bodies and are plural number row and are arranged side by side, and these process that cell bodies have respectively a peristome and place for this workpiece, and the Working position that these peristomes and this workpiece are positioned over this circulatory flow formula galvanic deposition cell all is positioned on a straight line zone.
In the present invention, wherein each processing cell body more comprises a distance piece, to be separated out two adjacent treatment troughs, make these treatment troughs have respectively one wide and a narrow section, and these these openings of processing cell bodies are on these narrow of these treatment troughs, and these peristomes of these treatment troughs are interlaced to be arranged on this linearity region.
In the present invention, wherein this internal recycle runner is a pipeline type runner, and is arranged at this galvanic deposition cell.
In the present invention, wherein this circulatory flow formula galvanic deposition cell has more an extension, and a temperature control modules is adjacent to this extension, to control the temperature of this electrodeposit liquid in this circulatory flow formula galvanic deposition cell.
In the present invention, wherein this temperature control modules more comprises:
One heating unit heats this extension, and this extension conduction heat energy is to this circulatory flow formula galvanic deposition cell, to heat this electrodeposit liquid in this circulatory flow formula galvanic deposition cell; And
One refrigerating module, cooling this extension, cooling this circulatory flow formula galvanic deposition cell of this extension is with this electrodeposit liquid in cooling this circulatory flow formula galvanic deposition cell.
A kind of processing machine is characterized in that, is to comprise:
One board body;
One electric deposition device is arranged at this board body, and has a circulatory flow formula galvanic deposition cell, and this circulatory flow formula galvanic deposition cell has an internal recycle runner, is used for carrying out galvanic deposit processing;
One first running gear is arranged at this board body, and drives the tangential movement that this electric deposition device is made a first direction; And
One second running gear is arranged at this board body, and is positioned at the top of this electric deposition device, and fix a workpiece, and mobile this workpiece is done the vertical movement of a second direction, and enters in this circulatory flow formula galvanic deposition cell of this electric deposition device, to carry out galvanic deposit processing.
In the present invention, wherein this electric deposition device comprises:
one processing module, comprise the complex processing cell body, those processing cell bodies are plural number row and are arranged side by side, and these processing cell bodies have respectively a peristome and place for this workpiece, the Working position that these peristomes and this workpiece are positioned over this circulatory flow formula galvanic deposition cell all is positioned on a straight line zone, each is processed cell body and more comprises a distance piece, to be separated out two adjacent treatment troughs, make these treatment troughs have respectively one wide and a narrow section, and these these peristomes of processing cell bodies are positioned at respectively on these narrow of these treatment troughs, these peristomes of these treatment troughs are interlaced to be arranged on this linearity region.
The beneficial effect that the present invention has: the invention provides a kind of electric deposition device, it is to comprise: a circulatory flow formula galvanic deposition cell, and it has an internal recycle runner, and this internal recycle runner is filled with an electrodeposit liquid; One electrode, it is arranged at this circulatory flow formula galvanic deposition cell, and this electrode is positioned at this internal recycle runner; And a fluid driver module, it is arranged at this circulatory flow formula galvanic deposition cell; Wherein, one workpiece is positioned over this circulatory flow formula galvanic deposition cell, and is positioned at this internal recycle runner and with respect to this electrode, this fluid driver module drives this electrodeposit liquid internal recycle in this internal recycle runner, and by between this electrode and this workpiece, to carry out galvanic deposit processing.
The present invention separately provides a kind of processing machine, and it is to comprise: a board body; One electric deposition device, it is arranged at this board body, and has a circulatory flow formula galvanic deposition cell, and this circulatory flow formula galvanic deposition cell has an internal recycle runner, and is used for carrying out galvanic deposit processing; One first running gear, it is arranged at this board body, and drives the tangential movement that this electric deposition device is made a first direction; And one second running gear, it is arranged at this board body, and is positioned at the top of this electric deposition device, and fix a workpiece, and mobile this workpiece is done the vertical movement of a second direction, and enters in this circulatory flow formula galvanic deposition cell of this electric deposition device, to carry out galvanic deposit processing.
Description of drawings
Fig. 1 is the structural representation of existing electric deposition device;
Fig. 2 is the stereographic map of the first embodiment of the present invention;
Fig. 3 is the sectional view of the first embodiment of the present invention;
Fig. 4 is the volume rendering schematic diagram of the first embodiment of the present invention;
Fig. 5 is the use state graph of the first embodiment of the present invention;
Fig. 6 is the sectional view of the second embodiment of the present invention;
Fig. 7 is the stereographic map of the third embodiment of the present invention;
Fig. 8 is the stereographic map of the fourth embodiment of the present invention;
Fig. 9 is the stereographic map of the fifth embodiment of the present invention; And
Figure 10 is the stereographic map of the sixth embodiment of the present invention.
[figure number is to as directed]
1 ' electric deposition device 10 ' cell body
101 ' first holding part the 102 ' second holding part
11 ' dividing plate 111 ' perforation
12 ' motor 13 ' electrode carrier
14 ' exterior line 141 ' water outlet
143 ' water inlet 1 electric deposition device
10 circulatory flow formula galvanic deposition cell 100 internal recycle runners
101 first assembly 1011 first surfaces
1012 second surface 1,013 first perforation
1,014 second perforation 1015 are communicated with runner
1016 the 3rd perforation 102 second assemblies
1021 first surface 1022 second surfaces
1023 groove shaped flow conduits 103 extensions
12 electrode 121 through holes
13 insulating part 14 fluid driver modules
140 Motorized drive unit 1400 bearing parts
1401 gear unit 1402 actuators
141 fluid agitation unit 1411 web members
1412 screw-blade 16 power supply modules
17 temperature control modules 172 heating units
173 refrigerating module 1731 cooling chip modules
1732 radiator fan 18 processing modules
181 process cell body 1811 electrolysis electrodes
1812 treatment trough 18121 narrow sections
18122 wide 182 load bearing seats
183 distance pieces 19 module of bleeding
191 body 192 perforation
2 workpiece 3 processing machines
31 board body 32 first running gears
33 second running gear 4 electrodeposit liquids
Embodiment
Further understand and understanding for making constitutional features of the present invention and the effect reached are had, coordinate detailed explanation in order to preferred embodiment and accompanying drawing, be described as follows:
Existing electric deposition device is to utilize exterior line to be connected to the motor in the outside of galvanic deposition cell, and sees through exterior line supply electrodeposit liquid to galvanic deposition cell, to carry out galvanic deposit processing.Existing electric deposition device must arrange motor and use motor that the electrodeposit liquid in exterior line is evacuated to galvanic deposition cell, but be full of in exterior line and galvanic deposition cell under the prerequisite of electrodeposit liquid, can make the motor start, so cause the usage quantity of electrodeposit liquid to increase, cause cost to increase.So the electrodeposit liquid in galvanic deposition cell also must be evacuated to electrodeposit liquid in exterior line through motor and recycle, if contain polishing particles in electrodeposit liquid under this flow Field Design, polishing particles can't be uniformly distributed in electrodeposit liquid, and then can't uniform deposition on workpiece, and cause the power consumption of motor to improve.And utilize motor constantly to extract electrodeposit liquid, under long-time the use, electrodeposit liquid easily corrodes motor, so must promote the corrosion of motor, cause cost significantly to promote, and outer loop pipeline and motor certainly will increase the volume of electric deposition device around the arranged outside of galvanic deposition cell.
See also Fig. 2 and Fig. 3, it is stereographic map and the sectional view of the first embodiment of the present invention; As shown in the figure, the present embodiment provides a kind of electric deposition device 1, and electric deposition device 1 is to comprise a circulatory flow formula galvanic deposition cell 10, an electrode 12 and a fluid driver module 14.circulatory flow formula galvanic deposition cell 10 has an internal recycle runner 100, the circulatory flow formula galvanic deposition cell 10 of the present embodiment has one first assembly 101 and one second assembly 102, the first assembly 101 has a first surface 1011 and a second surface 1012, and have vertically run through first surface 1011 and second surface 1012 one first the perforation 1013 and 1 second the perforation 1014, and has a connection runner 1015 that is formed at first surface 1011, being communicated with runner 1015 is to be parallel to each other with first surface 1011, wherein being communicated with runner 1015 is connected with first perforation the 1013 and second perforation 1014, and in an embodiment, be communicated with runner 1015 mutually vertical with first perforation the 1013 and second perforation 1014.
So, the second assembly 102 also has first surface 1021 formation one groove shaped flow conduits 1023 of a first surface 1021 and second surface 1022, the second assemblies 102.the second assembly 102 is arranged at the below of the first assembly 101, namely the first surface 1021 of the second assembly 102 contacts with the second surface 1012 of the first assembly 101, first perforation the 1013 and second perforation 1014 of the first assembly 101 is connected with the groove shaped flow conduits 1023 of the second assembly 102, the first perforation 1013 of the first assembly 101 like this, the groove shaped flow conduits 1023 of the second perforation 1014 and connection runner 1015 and the second assembly 102 forms internal recycle runners 100, and be formed in circulatory flow formula galvanic deposition cell 10, and carry out galvanic deposit adds the man-hour electrodeposit liquid and only is filled in internal recycle runner 100 in the future.As shown in Figure 4, internal recycle runner 100 of the present invention is arranged in circulatory flow formula galvanic deposition cell 10, expose to circulatory flow formula galvanic deposition cell 10, be arranged in circulatory flow formula galvanic deposition cell 10 so internal recycle runner 100 is a pipeline type runner and only there is part to be communicated with runner 1015.
The outside of the galvanic deposition cell of the existing electric deposition device of cause is provided with exterior line, electrodeposit liquid is circulated between galvanic deposition cell and exterior line, cause the volume of existing electric deposition device excessive, and the electrodeposit liquid internal recycle of the present embodiment is in the internal recycle runner 100 of circulatory flow formula galvanic deposition cell 10, need not to arrange exterior line, the volume of electric deposition device 1 is obviously reduced.Because of the small volume of the electric deposition device 1 of the present embodiment, thus can integrate with the processing module of other processing types, and carry out online multiple processing in same processing.
See also Fig. 5, it is the use state graph of the first embodiment of the present invention.As shown in the figure, a workpiece 2 carries out the galvanic deposit first being processed, first fills electrodeposit liquid 4 to internal recycle runner 100, can fill from first perforation the 1013 or second perforation 1014, makes electrodeposit liquid 4 riddle internal recycle runner 100.And fluid driver module 14 is arranged at the second perforation 1014 of circulatory flow formula galvanic deposition cell 10, the fluid driver module 14 of the present embodiment comprises a Motorized drive unit 140 and a fluid agitating unit 141, Motorized drive unit 140 connects fluid agitation unit 141, fluid agitation unit 141 is arranged in the second perforation 1014, and is positioned at internal recycle runner 100.When Motorized drive unit 140 produces rotary powers and during actuating fluid agitating unit 141, Stirring is made and electrodeposit liquid 4 in disturbance internal recycle runner 100 in fluid agitation unit 141, to drive the electrodeposit liquid internal recycle in internal recycle runner 100.
The fluid agitation unit 141 of the present embodiment has a connection piece 1411 and more is provided with a screw-blade 1412, and screw-blade 1412 is arranged at an end of web member 1411, and is positioned at internal recycle runner 100.The other end of web member 1411 connects Motorized drive unit 140.when Motorized drive unit 140 drives web member 1411 do rotation, web member 1411 drives screw-blade 1412 rotations, electrodeposit liquids 4 in screw-blade 1412 Stirring internal recycle runners 100 and disturbance electrodeposit liquid 4, and order about electrodeposit liquid 4 and 1014 flow to groove shaped flow conduits 1023 from the second perforation, flow to again the first perforation 1013 and gush out from the first perforation 1013, then flow back into the second perforation 1014 via being communicated with runner 1015, be that fluid driver module 14 drives electrodeposit liquid 4 internal recycle in internal recycle runner 100, so the continuous internal recycle of electrodeposit liquid 4 is in internal recycle runner 100.
The outside of the galvanic deposition cell of the existing electric deposition device of cause is provided with exterior line, electrodeposit liquid must be full of exterior line and galvanic deposition cell, cause the usage quantity of electrodeposit liquid to increase, and the electrodeposit liquid 4 of the present embodiment only is full of the internal recycle runner 100 in circulatory flow formula galvanic deposition cell 10, effectively reduces the usage quantity of electrodeposit liquid 4.If electrodeposit liquid 4 contains plural polishing particles, because the electric deposition device 1 of the present embodiment can make electrodeposit liquid 4 internal recycle in internal recycle runner 100, so can allow electrodeposit liquid 4 those interior polishing particles be uniformly distributed in electrodeposit liquid 4, add workpiece is carried out galvanic deposit the surface that allows man-hour those polishing particles can be deposited on equably workpiece 2.
Above-mentioned Motorized drive unit 140 can be directly an actuator 1402, and in one embodiment of the invention, actuator 1402 is motor, and actuator 1402 directly connects and actuating fluid agitating unit 141, repeats no more in this.so, for lift actuator 1402 drives the rotation torsion of fluid agitation unit 141 and reduces the velocity of rotation of fluid agitation unit 141, so the Motorized drive unit 140 of the present embodiment connection fluid agitation unit 141 is more to comprise a gear unit 1401, gear unit 1401 is arranged between the web member 1411 and actuator 1402 of fluid agitation unit 141, so gear unit 1401 is driven by actuator 1402, to slow down velocity of rotation and transferring power to the fluid agitation unit 141, make the velocity of rotation of fluid agitation unit 141 low than the velocity of rotation of actuator 1402, to increase the rotation torsion of fluid agitation unit 141.
The Motorized drive unit 140 of the present embodiment more comprises a bearing part 1400, and bearing part 1400 is carrier gear group 1401 and actuator 1402, and gear unit 1401 is articulated in bearing part 1400, and fluid agitation unit 141 is connected with gear unit 1401.So bearing part 1400 is arranged on circulatory flow formula galvanic deposition cell 10, and makes the fluid agitation unit 141 that is connected with gear unit 1401 be arranged at second to bore a hole 1014.
The electric deposition device 1 of the present embodiment does not utilize motor directly to extract electrodeposit liquid 4, and use Motorized drive unit 140 to drive fluid agitation unit 141, fluid agitation unit 141 is with Stirring mode disturbance electrodeposit liquid 4, and then driving electrodeposit liquid 4 internal recycle in internal recycle runner 100, the present embodiment makes electrodeposit liquid 4 internal recycle in internal recycle runner 100 with the simplest transmission rig.So, the actuator 1402 of the present embodiment does not directly contact with electrodeposit liquid 4, corrodes the chance of actuator 1402 significantly to reduce electrodeposit liquid 4, keeps its work-ing life, and corrosion that need not lift actuator 1402 can not make the cost of electric deposition device 1 increase.
Consult again Fig. 5, fill electrodeposit liquid 4 to the internal recycle runner 100, electrode 12 is arranged at the first perforation 1013 of circulatory flow formula galvanic deposition cell 10, make electrode 12 be positioned at internal recycle runner 100, be subjected to the driving of fluid driver module 14 because of the electrodeposit liquid 4 in internal recycle runner 100, and constantly internal recycle is in internal recycle runner 100, and electrodeposit liquid 4 makes electrode 12 continue to contact with electrodeposit liquid 4 constantly by electrode 12.The radius that first perforation 1013 of the present embodiment is positioned at the opening of first surface 1011 is positioned at the radius of the opening of second surface 1012 greater than the first perforation 1013, and in the first perforation 1013 interior formation one end differences.Electrode 12 is inserted from the first perforation 1013, and is positioned on the end difference of the first perforation 1013.The center of the electrode 12 of the present embodiment has a through hole 121, and through hole 121 is connected in series with the first perforation 1013, and namely through hole 121 is connected with internal recycle runner 100, so the electrodeposit liquid 4 of internal recycle runner 100 can pass through electrode 12 by through hole 121.The electrode 12 of the present embodiment is ring-type, and this is one embodiment of the invention, and electrode 12 also can be random geometry, repeats no more in this.So the electrode 12 of the present embodiment also can not have through hole 121, may and be positioned at a side of the first perforation 1013 for a sheet, and electrodeposit liquid 4 is by the first perforation 1013, and side by side, electrodeposit liquid 4 also by electrode 12, repeats no more in this.So between circulatory flow formula galvanic deposition cell 10 (i.e. the sidewall of the first perforation 1013) and electrode 12, an insulating part 13 is set more, insulating part 13 has a through hole 131, the through hole 131 of insulating part 13 is communicated with the through hole 121 of electrode 12, and be connected in series with the first perforation 1013, to be connected with internal recycle runner 100.Insulating part 13 is to make electrode 12 and 10 insulation of circulatory flow formula galvanic deposition cell, prevents electrode 12 and 10 conductings of circulatory flow formula galvanic deposition cell.
After treating that electrode 12 arranges the first perforation 1013, want to carry out galvanic deposit and add man-hour, workpiece 2 is first inserted the first perforation 1013 of circulatory flow formula galvanic deposition cell 10, and relatively is positioned at the electrode 12 of the first perforation 1013.The electric deposition device 1 of the present embodiment more comprises a power supply module 16, and the anodic bonding of power supply module 16 is to electrode 12, and its negative electrode is connected to workpiece 2, and power supply module 16 provides a power supply to electrode 12 and workpiece 2, to carry out galvanic deposit processing.
After completing above-mentioned the setting, fill electrodeposit liquid 4 to internal recycle runner 100, and start power supply module 16 and provide power supply to electrode 12 and workpiece 2, and start fluid driver module 14 and drive electrodeposit liquid 4 internal recycle in internal recycle runner 100.When electrodeposit liquid 4 internal recycle during in internal recycle runner 100, electrodeposit liquid 4 also by between electrode 12 and workpiece 2, makes 2 of electrode 12 and workpiece carry out galvanic deposit and processes.
If electrodeposit liquid 4 contains plural polishing particles, in the galvanic deposit course of processing, when electrodeposit liquid 4 internal recycle during in internal recycle runner 100, electrodeposit liquid 4 down flows to groove shaped flow conduits 1023 from the second perforation 1014, upwards flow from groove shaped flow conduits 1023 again, gush out from the first perforation 1013 at last, electrodeposit liquid 4 coats the workpiece 2 that is arranged at the first perforation 1013, make those polishing particles uniform depositions in electrodeposit liquid 4 on the surface of workpiece 2 and form a grinding layer, and then make workpiece 2 form abrasive tools.And the electric deposition device 1 of the present embodiment can make electrodeposit liquid 4 internal recycle in internal recycle runner 100, therefore can allow electrodeposit liquid 4 those interior polishing particles be uniformly distributed in electrodeposit liquid 4, to increase the deposition uniformity of polishing particles on abrasive tool.
See also Fig. 6, it is the use state graph of the second embodiment of the present invention.As shown in the figure, the internal recycle runner 100 of the circulatory flow formula galvanic deposition cell 10 of the first embodiment is one-way circulation, and the circulatory flow formula galvanic deposition cell 10 of the present embodiment also has internal recycle runner 100, and can carry out bidirectional circulating, to increase homogeneity and the density of those polishing particles in electrodeposit liquid 4.First assembly 101 of the present embodiment more is provided with the side that one the 3rd perforation 1016, the three perforation 1016 are positioned at the first perforation 1013, and corresponding with the second perforation 1014, i.e. the first perforation 1013 is between the second perforation the 1014 and the 3rd perforation 1016.The 3rd perforation 1016 runs through the first assembly 101, and is connected with the groove shaped flow conduits 1023 of the second assembly 102, and is connected with the connection runner 1015 that is positioned at the first assembly 101, to form internal recycle runner 100 in circulatory flow formula galvanic deposition cell 10.
The present embodiment is in the first perforation 1013 interior electrodes 12 that arrange, separately in the second perforation the 1014 and the 3rd perforation 1016, a fluid driver module 14 is set respectively, the fluid driver module 14 that is positioned at the second perforation 1014 drives counterclockwise the flowing of electrodeposit liquid 4 works in internal recycle runner 100 left sides, electrodeposit liquid 4 is gushed out from the first perforation 1013, connection runner 1015 on the left of flowing through again, be back to the second perforation 1014, so electrodeposit liquid 4 is circulated in the internal recycle runner 100 that is positioned at circulatory flow formula galvanic deposition cell 10 left sides.So, the fluid driver module 14 that is positioned at the 3rd perforation 1016 drives clockwise the flowing of electrodeposit liquid 4 works on internal recycle runner 100 right sides, electrodeposit liquid 4 is also gushed out from the first perforation 1013, flow through the again connection runner 1015 on right side, be back to the 3rd perforation 1016, so electrodeposit liquid 4 is circulated in the internal recycle runner 100 that is positioned at circulatory flow formula galvanic deposition cell 10 right sides.from the above, electrodeposit liquid 4 can two-way internal recycle in internal recycle runner 100, and be collected to simultaneously the first perforation 1013 and gush out from the first perforation 1013, so a large amount of electrodeposit liquids 4 can be pooled to the first perforation 1013, and a large amount of electrodeposit liquids 4 can be gushed out from the first perforation 1013, the electrodeposit liquid 4 that so flows through between electrode 12 and workpiece 2 namely can increase, this moment, electrodeposit liquid 4 contained polishing particles, and by between the electrode 12 and workpiece 2 of the first perforation 1013, so the density of those polishing particles by 2 of electrode 12 and workpiece also can significantly increase, and then lifting is deposited on settled density and the homogeneity of those polishing particles of workpiece 2.
See also Fig. 7, it is the stereographic map of the third embodiment of the present invention.As shown in the figure, the electric deposition device 1 of the present embodiment more comprises a temperature control modules 17, in one embodiment of the invention, temperature control modules 17 can be a heating rod, heating rod is embedded in a side of circulatory flow formula galvanic deposition cell 10, the heat energy that heating rod provides conducts to the interior electrodeposit liquid of internal recycle runner 100 from a side of circulatory flow formula galvanic deposition cell 10, with the electrodeposit liquid in the internal recycle runner 100 of heating cycle flow channel type galvanic deposition cell 10.In order to make the electrodeposit liquid thermally equivalent in internal recycle runner 100, the circulatory flow formula galvanic deposition cell 10 of the present embodiment more comprises an extension 103, extension 103 is that the second assembly 102 from circulatory flow formula galvanic deposition cell 10 extends, and the second assembly 102 forms the L fonts with extension 103.Extension 103 covers the sidewall of circulatory flow formula galvanic deposition cells 10, and is parallel to each other with the internal recycle runner 100 of circulatory flow formula galvanic deposition cell 10, and arranges for temperature control modules 17.The temperature control modules 17 of the present embodiment comprises at least one heating unit 172 and a refrigerating module 173.Extension 103 is parallel to each other with the internal recycle runner 100 of circulatory flow formula galvanic deposition cell 10, and so heating unit 172 is embedded at extension 103, with heating extension 103.And refrigerating module 173 is adjacent to the sidewall of extension 103, with cooling extension 103.See through heating unit 172 and refrigerating module 173 and control the temperature of extension 103.Extension 103 of the present invention has more a control chip (not shown), and it is used for the temperature of sensing circulatory flow formula galvanic deposition cell 10 or electrodeposit liquid, to control heating unit 172 and refrigerating module 173.The material of circulatory flow formula galvanic deposition cell 10 of the present invention is thermally conductive material, so extension 103 extends from circulatory flow formula galvanic deposition cell 10, the material of extension 103 is also thermally conductive material.
When heating unit 172 produces a heat energy and is passed to extension 103, be the temperature that can improve extension 103, because the volume of extension 103 is large, the heating surface area of extension 103 is large, and heat energy is uniformly distributed in extension 103.So extension 103 is close to and covers the sidewall of circulatory flow formula galvanic deposition cell 10, and contact area between the two is large, so extension 103 conduction heat energy are to the sidewall of circulatory flow formula galvanic deposition cell 10, heat energy is uniformly distributed in the sidewall of circulatory flow formula galvanic deposition cell 10, is positioned at the electrodeposit liquid of internal recycle runner 100 with homogeneous heating.When the temperature of electrodeposit liquid surpasses default value, refrigerating module 173 provides a cooling source and conducts to extension 103, refrigerating module 173 also has large-area the contact with 103 of extensions, the temperature of extension 103 is evenly reduced, right extension 103 is the temperature of the sidewall of refrigeration cycle runner formula galvanic deposition cell 10 equably, and identical with extension 103, with the electrodeposit liquid of even cooling internal recycle runner 100.So see through heating unit 172 and refrigerating module 173 and control the temperature of extension 103, and then the electrodeposit liquid temperature in control internal recycle runner 100, even the electrodeposit liquid temperature meets default value to reach constant temperature.
The present embodiment refrigerating module 173 is a cooling chip module 1731, and cooling chip module 1731 is adjacent to the sidewall of extension 103.When refrigerating module 173 cooling extension 103, cooling chip module 1731 produces a cooling source and is passed to extension 103, reduces the temperature of extension 103, to reduce the electrodeposit liquid temperature in circulatory flow formula galvanic deposition cell 10.And the heat energy of extension 103 drains into the outside through cooling chip module 1731, reduces the temperature of extension 103 with acceleration, and then accelerates to reduce the temperature of the interior electrodeposit liquid of circulatory flow formula galvanic deposition cell 10.And the refrigerating module 173 of the present embodiment more is provided with a radiator fan 1732, radiator fan 1732 is arranged at cooling chip module 1731, when the heat energy of extension 103 is discharged the outside through cooling chip module 1731, the heat energy major part is first built up in the end of cooling chip module 1731, at this moment, startup radiator fan 1732 also will be built up in the heat energy of cooling chip module 1731 ends and detach, the speed of discharging to accelerate heat energy.
See also Fig. 8, it is the stereographic map of the fourth embodiment of the present invention.As shown in the figure, the opposite side of the circulatory flow formula galvanic deposition cell 10 of the present embodiment is more in abutting connection with a processing module 18, processing module 18 be to workpiece 2 carry out the front of galvanic deposit processing or after process.previous embodiment discloses the small volume of the electric deposition device 1 of the present embodiment, can integrate with the processing module of other processing types, to carry out online multiple processing in same processing, for example: the processing module of integrating with the electric deposition device 1 of the present embodiment is the micro discharges processing module, the electrode that the micro discharges processing module uses is the workpiece 2 of the present embodiment, carry out little electrode (being workpiece 2) of putting after processing and produce consume, must utilize electric deposition device 1 to repair, workpiece 2 carries out the galvanic deposit first being processed, processing module 18 is first with pickling, the modes such as washing or degreasing clean the surface of workpiece 2, after workpiece 2 carries out galvanic deposit processing, be deposited on the settled layer on workpiece 2 surfaces with the electrolysis mode finishing.Above-mentioned is only one embodiment of the invention, and the electric deposition device 1 of expression the present embodiment can be integrated with the processing module of other processing types.
So, the electric deposition device 1 of the present embodiment is that processing module 18 and circulatory flow formula galvanic deposition cell 10 are integrated, make and carry out galvanic deposit first being processed or workpiece afterwards 2 and can move to immediately processing module 18 and process, process and need not move to another board, namely carry out simultaneously online galvanic deposit processing and process in same processing.The processing module 18 of the present embodiment has four and processes cell body 181, those are processed cell body 181 and are arranged side by side into row, near the processing cell body 181 of circulatory flow formula galvanic deposition cell 10 and the adjacent sidewalls of circulatory flow formula galvanic deposition cell 10, those functions of processing cell body 181 can be respectively washing, pickling, degreasing and electrolysis etc., so the condition of surface of the workpiece 2 before or after galvanic deposit is selected suitable processing cell body 181, processes with the workpiece 2 before or after galvanic deposit.Wherein the sidewall in order to the processing cell body 181 of electrolysis more is provided with an electrolysis electrode 1811, and when workpiece 2 was inserted processing cell body 181 in order to electrolysis, the relative electrolysis electrode 1811 of workpiece 2 was to carry out electrochemical machining.And the processing module 18 of the present embodiment more comprises a load bearing seat 182, those are processed cell body 181 and are arranged at load bearing seat 182, circulatory flow formula galvanic deposition cell 10 is arranged at load bearing seat 182, and circulatory flow formula galvanic deposition cell 10 is processed the adjacent of cell bodies 181 with those, so circulatory flow formula galvanic deposition cell 10 can disassemble from load bearing seat 182, so that clean cycle flow channel type galvanic deposition cell 10 is processed cell body 181 with those.
See also Fig. 9, it is the stereographic map of the fifth embodiment of the present invention.as shown in the figure, the processing module 18 of the present embodiment is to have two to process cell body 181, each is processed cell body 181 and comprises two treatment troughs 1812, it mainly arranges a distance piece 183 in processing cell body 181, distance piece 183 will be processed cell body 181 and be partitioned into two treatment troughs 1812, so each processing cell body 181 has two treatment troughs 1812, so process cell body 181 and altogether have four treatment troughs 1812 for two, and those treatment troughs 1812 reach adjacency mutually side by side, make these treatment troughs 1812 be plural number row and be arranged into ordered series of numbers, so can increase treatment trough 1812 quantity, and reduce the volume of processing module 18.
The electric deposition device 1 of the present embodiment more comprises the module 19 of bleeding, the module of bleeding 19 has a body 191, body 191 is arranged at circulatory flow formula galvanic deposition cell 10 and processing module 18, and towards circulatory flow formula galvanic deposition cell 10 and processing module 18, body 191 has plurality of through holes 192, see through those perforation 192 and extract gas that circulatory flow formula galvanic deposition cells 10 carry out producing when galvanic deposit processing or processing module 18 are processed to body 191, and by body 191, gas is drained into the outside of electric deposition device 1.So, the module 19 of bleeding of the present embodiment also can only be arranged at a side of circulatory flow formula galvanic deposition cell 10 or processing module 18, and only extract circulatory flow formula galvanic deposition cell 10 and carry out the gas that the galvanic deposit machining produces, perhaps only extract the gas that produces when processing module 18 is processed to the outside of electric deposition device 1, repeat no more in this.
See also Figure 10, it is the stereographic map of the sixth embodiment of the present invention.As shown in the figure, the present embodiment is to provide a processing machine 3, and the electric deposition device 1 of above-described embodiment can be installed on processing machine 3.Processing machine 3 itself has X, Y, Z shifting axle, this processing machine 3 has a board body 31, and it separately arranges one first running gear 32, the Z axis that makes electric deposition device 1 can move to Z axis position and processing machine 3 can be used as one second running gear 33 of present technique, and this first running gear 32 and this second running gear 33 are arranged on board body 31.The present embodiment be electric deposition device 1 take Fig. 8 as example, electric deposition device 1 is arranged at board body 31, and connects the first running gear 32, workpiece 2 is fixed in the second running gear 33.the first running gear 32 drives electric deposition device 1 and moves horizontally on a horizontal plane, and only upper mobile in first direction (namely along X-axis or Y-axis), right the second running gear 33 travelling workpieces 2 are done vertical movement, namely in upper mobile with the second direction (along Z axis) of first direction quadrature, make the X that this processing machine 3 can utilization itself, Y, the Z shifting axle, allow workpiece 2 as instrument, the work piece (not shown) that is fixed on processing machine 3 be processed as after electrodischarge machining(E.D.M.), and can utilize the first running gear 32 to transfer the level attitude (X of electric deposition device 1 to second running gear 33, the Y-axis position), namely with respect to the position of the work piece of processing machine 3, make the second running gear 33 travelling workpieces 2 and carry out galvanic deposit processing, as deposit abrasive grain in workpiece 2 on it, can utilize afterwards the first running gear 32 to transfer the position that electric deposition device 1 leaves the second running gear 33, so at the X that does not make on processing machine 3, under the moving situation of y-axis shift, reprocess to utilize the work piece on 2 pairs of processing machines 3 of the second running gear 33 travelling workpiece, so can improve 2 pairs of position precision that are positioned at the work piece of processing machine 3 of workpiece, therefore improve the working accuracy of the work piece on processing machine.
the above-mentioned small volume of mentioning the electric deposition device 1 of previous embodiment announcement the present embodiment, can integrate with the processing module of other processing types, to carry out online multiple processing in same processing, and be integrated into example with the electric deposition device 1 of the present embodiment with the micro discharges processing module, above-mentioned in this continuity, the micro discharges processing module is arranged at board body 31, and be positioned at the below of electric deposition device 1, workpiece 2 is except being driven by the second running gear 33, more can be by a horizontal shifting platform (X, the Y shifting axle, figure does not show) drive, the electrode that workpiece 2 is processed for micro discharges before carrying out galvanic deposit processing, add man-hour so carry out micro discharges, must first see through the position of horizontal shifting platform positioning workpieces 2, with corresponding micro discharges processing module, then utilize the second running gear 33 travelling workpieces 2 to enter the micro discharges processing module the work piece (not shown) that is fixed in processing machine 3 is carried out micro discharges processing, after micro discharges machines, the second running gear 33 up travelling workpiece 2 leaves the micro discharges processing module.
Add man-hour when carrying out galvanic deposit, only need to move electric deposition device 1 by the first running gear 32, and make 10 pairs of circulatory flow formula galvanic deposition cells be positioned at workpiece 2, follow the second running gear 33 feeding workpiece 2 downwards and enter and carry out galvanic deposit processing in circulatory flow formula galvanic deposition cell 10.After galvanic deposit machines, the second running gear 33 drives workpiece 2 and leaves vertically upward circulatory flow formula galvanic deposition cell 10, right the first running gear 32 drives electric deposition devices 1 movement of turning right, allow and process 181 pairs of cell bodies and be positioned at workpiece 2, the second running gears 33 feeding workpiece 2 is downwards and enter those and process cell bodies 181 and process again.Processing cell bodies 181 because of those of the circulatory flow formula galvanic deposition cell 10 of electric deposition device 1 and processing module 18 is to be plural number row to be arranged side by side, namely arrange along first direction, so only needing the first running gear 32 to drive electric deposition device 1 moves up in first party, can make the second running gear 33 feeding workpiece 2 process cell body 181 to circulatory flow formula galvanic deposition cell 10 and those, it is a peristome 18133 that workpiece 2 is inserted each processing position of processing cell body 181.the first running gear 32 drives electric deposition device 1 and moves up in first party, so workpiece 2 carries out the Working position of galvanic deposit processing and those those peristomes 1813 of processing cell bodies 181 in circulatory flow formula galvanic deposition cell 10 be to be positioned at a straight line zone, and more may further be and be positioned at the same online altogether of linearity region, to form a processing line, this linearity region is moving area, so the first 32 of running gears need to drive electric deposition device 1 and move along the processing line in linearity region or linearity region, and allow the Working position (being the through hole 121 of the electrode 12 of Fig. 3) of circulatory flow formula galvanic deposition cell 10 or those process those peristome 1813 alignment pieces 2 of cell bodies 181, carry out galvanic deposit processing in circulatory flow formula galvanic deposition cell 10 to allow workpiece 2 enter, perhaps entering those those peristomes 1813 of processing cell body 181 processes.
from the above, workpiece 2 need to utilize horizontal shifting platform to position except carrying out at the beginning micro discharges processing, when carrying out afterwards galvanic deposit processing and processing, only utilize the first running gear 32 and the second running gear 33 to drive respectively electric deposition device 1 and workpiece 2, and electric deposition device 1 and workpiece 2 are only moved respectively on single direction, 2 of workpiece are driven by the second running gear 33, and do not need in X-axis and the X-axis of level to move, can enter circulatory flow formula galvanic deposition cell 10 carries out galvanic deposit processing or those and processes cell bodies 181 and process, so reduce the complexity of location electric deposition device 1 and workpiece 2, to increase the positional accuracy of electric deposition device 1 and workpiece 2.
consult again Fig. 9, in order to reduce the volume of processing module 18, process cell body 181 in each distance piece 183 is set, make each process cell body 181 and be partitioned into two treatment troughs 1812, two treatment troughs 1812 have respectively one narrow 18121 and one wide 18122, has a peristome 1813 of inserting for workpiece 2 for narrow 18121, the interlaced row in one of a side that two treatment troughs 1812 are adjacent lists, two peristomes 1813 that namely are positioned at two narrow 18121 are interlaced, and be positioned at the linearity region with Working position that workpiece 2 is positioned at circulatory flow formula galvanic deposition cell 10 and even be positioned at the same online altogether of linearity region, namely be positioned at processing online.The right accommodating treatment soln of each treatment trough 1812, for example: the treatment soln of making the processing cell body 181 of washing is distilled water; The treatment soln of making the processing cell body 181 of electrolysis is electrolytic solution.Wide 18122 of each treatment trough 1812 has a stirring space, and in stirring space, with the treatment soln of stir process cell body 181, and then disturbance treatment solution is processed workpiece so a whipping appts (figure for not) can be set.
so the electric deposition device 1 of Fig. 9 also can be applicable to the processing machine 3 of Figure 10, move by the first running gear 32 drive electric deposition devices 1 and the processing line in linearity region or linearity region, and the one of making way for those peristomes 1813 of the Working position of circulatory flow formula galvanic deposition cell 10 of the processing line in linearity region or linearity region or those treatment troughs 1812 is aimed at this workpiece 2, to allow the second running gear 33 drive Working position or those peristomes 1813 that workpiece 2 enters the processing line that is positioned at linearity region or linearity region, namely entering circulatory flow formula galvanic deposition cell 10 or those treatment troughs 1812 carries out galvanic deposit processing or processes.
In sum, the invention provides a kind of electric deposition device and processing machine, be provided with the internal recycle runner in electric deposition device, do not need to arrange exterior line, so can reduce the volume of electric deposition device, and can integrate with the processing module of other types, and in carrying out simultaneously online multiple processing.In addition, electrodeposit liquid only is filled in the internal recycle runner, and constantly internal recycle in the internal recycle runner, so reduces the usage quantity of electrodeposit liquid and easily safeguards electrodeposit liquid, and easily controls the quality of electrodeposit liquid.And electrodeposit liquid constantly internal recycle in the internal recycle runner, those polishing particles of electrodeposit liquid are uniformly distributed in electrodeposit liquid, be deposited on the uniformity coefficient of workpiece surface to increase those polishing particles, and increase the deposition of those polishing particles.
Processing machine of the present invention only utilizes the first running gear and the second running gear to drive respectively electric deposition device and workpiece, and electric deposition device and workpiece are only moved respectively on single direction, workpiece can enter circulatory flow formula galvanic deposition cell to carry out galvanic deposit processing or those and processes cell bodies and process or the work piece that is positioned on processing machine is carried out following process, and do not need in X-axis and the X-axis of level to move, so reduce the complexity of location electric deposition device and workpiece, to increase the positional accuracy of electric deposition device and workpiece.
In sum, it is only preferred embodiment of the present invention, be not to limit scope of the invention process, all equalizations of doing according to the described shape of claim scope of the present invention, structure, feature and spirit change and modify, and all should be included in claim scope of the present invention.
Claims (14)
1. an electric deposition device, is characterized in that, is to comprise:
One circulatory flow formula galvanic deposition cell has an internal recycle runner, and this internal recycle runner is filled with an electrodeposit liquid;
One electrode is arranged at this circulatory flow formula galvanic deposition cell, and this electrode is positioned at this internal recycle runner; And
At least one fluid driver module is arranged at this circulatory flow formula galvanic deposition cell;
Wherein, one workpiece is positioned over this circulatory flow formula galvanic deposition cell, and is positioned at this internal recycle runner and with respect to this electrode, this fluid driver module drives this electrodeposit liquid internal recycle in this internal recycle runner, and by between this electrode and this workpiece, to carry out galvanic deposit processing.
2. electric deposition device as claimed in claim 1, is characterized in that, wherein this circulatory flow formula galvanic deposition cell is to comprise:
One first assembly has one first perforation, one second perforation and a connection runner, and this first perforation and this second perforation run through this first assembly, and this connection runner is connected with this first perforation and this second perforation; And
One second assembly is arranged under this first assembly, and has a groove shaped flow conduits, and this first perforation and this second perforation are connected with this groove shaped flow conduits, to form this internal recycle runner.
3. electric deposition device as claimed in claim 2, it is characterized in that, wherein further comprise an insulating part, it is arranged between this circulatory flow formula galvanic deposition cell and this electrode, and this electrode and this insulating part have respectively a through hole, and this two through hole of this electrode and this insulating part is serially connected with this first perforation, this workpiece setting is in this first perforation, this workpiece is with respect to this electrode, and this fluid driver module is arranged in this second perforation, and drives this electrodeposit liquid internal recycle in this internal recycle runner.
4. electric deposition device as claimed in claim 2, it is characterized in that, wherein this first assembly has more one the 3rd perforation, the 3rd perforation runs through this first assembly and is connected with this connection runner, this first perforation is between this second perforation and the 3rd perforation, this electrode and this workpiece setting are in this first perforation, and this workpiece is with respect to this electrode, and this second perforation is respectively arranged with this fluid driver module with the 3rd perforation.
5. electric deposition device as claimed in claim 1, is characterized in that, this fluid driver module more comprises:
One Motorized drive unit is to produce rotary power;
One fluid agitating unit, it connects this Motorized drive unit, with this electrodeposit liquid internal recycle of driving this internal recycle runner in this internal recycle runner.
6. electric deposition device as claimed in claim 5, is characterized in that, wherein this Motorized drive unit is to comprise:
One bearing part is arranged at this circulatory flow formula galvanic deposition cell;
One gear unit is articulated in this bearing part, drives this fluid agitation unit;
One actuator drives this gear unit;
This fluid agitation unit comprises:
A connection piece is connected on this gear unit; And
One screw-blade is connected on this web member.
7. electric deposition device as claimed in claim 1, is characterized in that, more comprises:
One module of bleeding, the plurality of through holes that it comprises a body and is arranged at this body, the gas that is produced to detach this circulatory flow formula galvanic deposition cell.
8. electric deposition device as claimed in claim 1, it is characterized in that, more comprise: a processing module, comprise the complex processing cell body, those processing cell bodies are plural number row and are arranged side by side, and these are processed that cell bodies have respectively a peristome and place for this workpiece, and the Working position that these peristomes and this workpiece are positioned over this circulatory flow formula galvanic deposition cell all is positioned on a straight line zone.
9. electric deposition device as claimed in claim 8, it is characterized in that, wherein each processing cell body more comprises a distance piece, to be separated out two adjacent treatment troughs, make these treatment troughs have respectively one wide and a narrow section, and these these openings of processing cell bodies are on these narrow of these treatment troughs, and these peristomes of these treatment troughs are interlaced to be arranged on this linearity region.
10. electric deposition device as claimed in claim 1, is characterized in that, wherein this internal recycle runner is a pipeline type runner, and be arranged at this galvanic deposition cell.
11. electric deposition device as claimed in claim 1 is characterized in that, wherein this circulatory flow formula galvanic deposition cell has more an extension, and a temperature control modules is adjacent to this extension, to control the temperature of this electrodeposit liquid in this circulatory flow formula galvanic deposition cell.
12. electric deposition device as claimed in claim 11 is characterized in that, wherein this temperature control modules more comprises:
One heating unit heats this extension, and this extension conduction heat energy is to this circulatory flow formula galvanic deposition cell, to heat this electrodeposit liquid in this circulatory flow formula galvanic deposition cell; And
One refrigerating module, cooling this extension, cooling this circulatory flow formula galvanic deposition cell of this extension is with this electrodeposit liquid in cooling this circulatory flow formula galvanic deposition cell.
13. a processing machine is characterized in that, is to comprise:
One board body;
One electric deposition device is arranged at this board body, and has a circulatory flow formula galvanic deposition cell, and this circulatory flow formula galvanic deposition cell has an internal recycle runner, is used for carrying out galvanic deposit processing;
One first running gear is arranged at this board body, and drives the tangential movement that this electric deposition device is made a first direction; And
One second running gear is arranged at this board body, and is positioned at the top of this electric deposition device, and fix a workpiece, and mobile this workpiece is done the vertical movement of a second direction, and enters in this circulatory flow formula galvanic deposition cell of this electric deposition device, to carry out galvanic deposit processing.
14. processing machine as claimed in claim 13 is characterized in that, wherein this electric deposition device comprises:
one processing module, comprise the complex processing cell body, those processing cell bodies are plural number row and are arranged side by side, and these processing cell bodies have respectively a peristome and place for this workpiece, the Working position that these peristomes and this workpiece are positioned over this circulatory flow formula galvanic deposition cell all is positioned on a straight line zone, each is processed cell body and more comprises a distance piece, to be separated out two adjacent treatment troughs, make these treatment troughs have respectively one wide and a narrow section, and these these peristomes of processing cell bodies are positioned at respectively on these narrow of these treatment troughs, these peristomes of these treatment troughs are interlaced to be arranged on this linearity region.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011104221851A CN103160908A (en) | 2011-12-09 | 2011-12-09 | Electrodeposition apparatus and processing machine thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011104221851A CN103160908A (en) | 2011-12-09 | 2011-12-09 | Electrodeposition apparatus and processing machine thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103160908A true CN103160908A (en) | 2013-06-19 |
Family
ID=48584428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011104221851A Pending CN103160908A (en) | 2011-12-09 | 2011-12-09 | Electrodeposition apparatus and processing machine thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103160908A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107620111A (en) * | 2017-10-16 | 2018-01-23 | 佛山海格利德机器人智能设备有限公司 | A kind of fully-automatic intelligent valve surface copper facing equipment |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1793434A (en) * | 2005-12-06 | 2006-06-28 | 钢铁研究总院 | Apparatus for continuous electrodepositing of metallic film and process thereof |
| JP3147228U (en) * | 2008-10-09 | 2008-12-18 | 奇▲こう▼科技股▲ふん▼有限公司 | Structure of cooling fan with oil-impregnated bearing |
| TW201042094A (en) * | 2009-04-14 | 2010-12-01 | Reel Solar Inc | Apparatus and methods for chemical electrodeposition on a substrate for solar cell fabrication |
| CN102021636A (en) * | 2009-09-17 | 2011-04-20 | 肖特太阳能控股公司 | Method and device for galvanising substrates |
-
2011
- 2011-12-09 CN CN2011104221851A patent/CN103160908A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1793434A (en) * | 2005-12-06 | 2006-06-28 | 钢铁研究总院 | Apparatus for continuous electrodepositing of metallic film and process thereof |
| JP3147228U (en) * | 2008-10-09 | 2008-12-18 | 奇▲こう▼科技股▲ふん▼有限公司 | Structure of cooling fan with oil-impregnated bearing |
| TW201042094A (en) * | 2009-04-14 | 2010-12-01 | Reel Solar Inc | Apparatus and methods for chemical electrodeposition on a substrate for solar cell fabrication |
| CN102021636A (en) * | 2009-09-17 | 2011-04-20 | 肖特太阳能控股公司 | Method and device for galvanising substrates |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107620111A (en) * | 2017-10-16 | 2018-01-23 | 佛山海格利德机器人智能设备有限公司 | A kind of fully-automatic intelligent valve surface copper facing equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100510196C (en) | Revolving parts electroforming process and device thereof | |
| EP3225342A1 (en) | Method and apparatus for maching workpiece | |
| CN102649186A (en) | Micro-electrochemical machining method and device assisted by laser irradiation | |
| CN103608490A (en) | Electro chemical deposition and replenishment apparatus | |
| EP1750491B1 (en) | System and method for manufacturing flexible copper clad laminate film | |
| CN109676379B (en) | Preparation device and method for laser etching electrochemical micro additive heat exchange functional surface | |
| CN104289775B (en) | Electrode compound motion is electrolysed cutting method | |
| KR20130100063A (en) | Cylinder plating method and device | |
| CN212597579U (en) | Three-station vacuum ultrasonic full-automatic cleaning machine for hydrocarbon solvent | |
| CN105803493A (en) | Small-amplitude motion hollow-out anode electroforming system and method for manufacturing complex thin wall profile | |
| CN103160908A (en) | Electrodeposition apparatus and processing machine thereof | |
| CN102586813B (en) | Microelectroforming machine tool | |
| CN111151830A (en) | Ultrasonic vibration assisted electrolytic matrix oblique square hole machining system and method | |
| CN108788352B (en) | Wire electrode workpiece different-speed composite motion micro-electrolysis wire cutting machining method | |
| CN201433248Y (en) | Integrated circulatory cleaning electroplating installation | |
| CN202591769U (en) | Laser irradiation-aided electrolytic micromachining device | |
| CN103786005A (en) | Workpiece machining method and electric spark machining device | |
| CN101126167B (en) | Method and device for manufacturing optical cable connector metal lock pin | |
| TW201323666A (en) | Electrodeposition device and its tooling machine | |
| CN112680777A (en) | Blind cavity inner wall polishing device and method | |
| CN110842308A (en) | In-situ liquid-sharing electrochemical composite processing device and method | |
| CN103909311A (en) | Electrochemical composite magnetic grinding device and method adopted by device | |
| CN202199873U (en) | Demountable auxiliary working solution tank and device for die-sinking electric discharge machining | |
| CN210481570U (en) | Deplating equipment for pipes | |
| KR20130114573A (en) | Apparatus for plating cylinder |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130619 |