CN103149804B - Device and method for generating extreme ultraviolet source based on radial polarization laser driving - Google Patents
Device and method for generating extreme ultraviolet source based on radial polarization laser driving Download PDFInfo
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- CN103149804B CN103149804B CN201310022423.9A CN201310022423A CN103149804B CN 103149804 B CN103149804 B CN 103149804B CN 201310022423 A CN201310022423 A CN 201310022423A CN 103149804 B CN103149804 B CN 103149804B
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Abstract
The invention discloses a device and a method for generating an extreme ultraviolet source based on radial polarization laser driving. The device comprises a radial polarization pulse laser device, a laser amplifier, a collecting mirror and a drop generator. The radial polarization pulse laser device outputs radial polarization pulse laser, the laser amplifier amplifies the radial polarization pulse laser with low power and high repetition rate and outputs the radial polarization pulse laser with high repetition rate and high power, the radial polarization pulse laser with the high repetition rate and the high power is focused and illuminated on the drop, and generates extreme ultraviolet. According to the device and the method for generating the extreme ultraviolet source based on radial polarization laser driving, the beam is focused by utilizing the radial polarization pulse laser, the focus position has a longitudinal field component, energy carried by the longitudinal field component cannot be propagated, the energy is absorbed by Sn to be stimulated into ions in valence states, and extreme ultraviolet (EUV) of 13.5nm is effectively radiated. Meanwhile, the radial polarization pulse laser can obtain smaller focusing light spots during focusing, the smaller the light spots are, the higher the energy intensity of the laser is, and EUV radiation with stronger energy is generated.
Description
Technical field
The invention belongs to laser application, more specifically, relate to a kind of extreme ultraviolet source generator based on radial polarisation Laser Driven and method.
Background technology
Along with the development of semi-conductor industry, more and more higher to the integration level necessitates of chip.The progress of semiconductor technology is determined by photoetching process, the prevailing technology that extreme UV (Extreme Ultraviolet, EUV) photoetching will be following nanoscale lithography.
Photolithography light source wavelength will reach 18nm in 2015, and photoetching minimum feature size is directly proportional to wavelength funtcional relationship, so it is most important to lithographic dimensioned reduction to reduce photolithography light source wavelength.
The performance index that international litho machine supplier proposes photolithography light source are as shown in table 1, wherein the most important thing is the EUV power at gonglion IF place, and this is the major criterion weighing litho machine.
| Light source technology parameter | Technical requirement |
| Wavelength X | 13.5nm |
| EUV power | 115W |
| Repetition frequency | >7-10KHz |
| System capacity stability | ± 0.3%, 3 σ, 50 pulses |
| The optical system life-span | > 30000 hours |
| Light-source collecting degree | <3.3mm 2sr |
Table 1EUV photolithography light source performance index
The height of EUV output power determines photoetching efficiency, but the EUV that will obtain 115W exports with regard at least needing 15KW laser incident, and this requires too high to laser system, so improve just very necessary to incident laser.
Summary of the invention
For the defect of prior art, the object of the present invention is to provide a kind of extreme ultraviolet source generating method based on radial polarisation Laser Driven, be intended to solve the low problem of generation EUV power.
The invention provides a kind of extreme ultraviolet source generator based on radial polarisation Laser Driven, comprise radial polarisation pulsed laser, laser amplifier, collection mirror and droplet generator; Described radial polarisation pulsed laser exports the radial polarisation pulse laser of low-power high-repetition-rate, and the radial polarisation pulse laser of low-power high-repetition-rate is carried out the radial polarisation pulse laser amplifying rear output high-power high-repetition-rate by laser amplifier; Droplet generator is for generation of drop, and the radial polarisation pulse laser of described high power high-repetition-rate irradiates described drop and produces extreme ultraviolet after focusing on.
Further, described radial polarisation pulsed laser comprises laser tube, W conical mirror, flat output mirror and sparking electrode; High pressure is added in the two ends of laser tube and makes described laser tube Output of laser by described sparking electrode; Described W conical mirror and flat output mirror form resonator cavity, and described W conical mirror is for selecting radial polarized light beam, and flat output mirror is used for outputting radial polarized pulses laser.
Further, described laser tube comprises the discharge tube for storing working gas and the water cold sleeve for cooling work gas.
Further, have longitudinal field component at focus place after the radial polarisation pulse laser line focus lens focus of described high power high-repetition-rate, the energy entrained by this longitudinal field component can not be propagated and is conducive to after drop absorption being energized into high-valence state; Obtain less focal beam spot, the hot spot of focusing is less simultaneously, the energy density of laser higher and produce more high-octane extreme ultraviolet radiation.
Present invention also offers a kind of extreme ultraviolet source generating method based on radial polarisation Laser Driven, comprise the steps:
S1: radial polarisation pulsed laser exports the radial polarisation pulse laser of low-power high-repetition-rate;
S2: the radial polarisation pulse laser of radial polarisation pulse laser output high-power high-repetition-rate after laser amplifier amplifies of low-power high-repetition-rate;
S3: the radial polarisation pulse laser of the described high power high-repetition-rate drop that radiation droplet target produces after focusing on also produces extreme ultraviolet.
Further, also comprise the steps: that collecting mirror collects the extreme ultraviolet of radiation and focus on.
Further, the wavelength of described extreme ultraviolet is 13.5nm.
The present invention uses the advantage of radial polarisation pulse laser driving stage ultraviolet source to be: radial polarisation laser line focus lens focus, in focus, place has longitudinal field component, energy entrained by longitudinal field component can not be propagated, be conducive to the ion being energized into high-valence state after being absorbed by Sn, Net long wave radiation goes out the EUV of 13.5nm.Radial polarisation laser beam can obtain less focal beam spot, much smaller than usual CO when focusing on simultaneously
2spot size is obtained after Laser Focusing.The hot spot focused on is less, and the energy density of laser is higher, is more beneficial to by Sn atomic excitation to high-energy state, produces the EUV radiation of stronger energy.Export because above two advantages make to use radial polarisation pulse laser can produce more high-power EUV.
Accompanying drawing explanation
Fig. 1 is the modular structure schematic diagram of the extreme ultraviolet source generator based on radial polarisation Laser Driven that the embodiment of the present invention provides;
Fig. 2 is the modular structure schematic diagram of radial polarized pulses laser instrument in the extreme ultraviolet source generator based on radial polarisation Laser Driven that provides of the embodiment of the present invention;
Fig. 3 is the polarization schematic diagram of the radial polarisation pulse laser that in the extreme ultraviolet source generator based on radial polarisation Laser Driven that provides of the embodiment of the present invention, radial polarized pulses laser instrument produces;
Fig. 4 is the realization flow figure of the extreme ultraviolet source generating method based on radial polarisation Laser Driven that the embodiment of the present invention provides.
Embodiment
In order to make object of the present invention, technical scheme and advantage clearly understand, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
The extreme ultraviolet source generator based on radial polarisation Laser Driven that the embodiment of the present invention provides can be applied to Sn plasma EUV light source, can obtain higher laser-extreme ultraviolet conversion efficiency, promotes the development of photoetching technique.The present invention is to common CO
2laser transformation produces radial polarisation laser, and Sn target can be made to produce and be excited to high-valence state more, the method can obtain more high-power EUV and export, thus can improve photoetching efficiency.
Fig. 1 shows the modular structure of the extreme ultraviolet source generator based on radial polarisation Laser Driven that the embodiment of the present invention provides, and for convenience of explanation, illustrate only the part relevant to example of the present invention, details are as follows:
Extreme ultraviolet source generator comprises: radial polarisation pulsed laser 1, laser amplifier 2, collection mirror 3 and droplet generator 4; Radial polarisation pulsed laser 1 produces the radial polarisation pulse laser of low-power high-repetition-rate, and the radial polarisation pulse laser of low-power high-repetition-rate is carried out the radial polarisation pulse laser amplifying rear output high-power high-repetition-rate by laser amplifier 2; Droplet generator 4 is for generation of drop, and the radial polarisation pulse laser of high power high-repetition-rate irradiates drop and produces EUV after focusing on.
Have longitudinal field component after the radial polarisation pulse laser focusing that radial polarisation pulsed laser 1 produces, the energy entrained by longitudinal field component can not be propagated, and is conducive to the ion that be energized into high-valence state after being absorbed by Sn, thus gives off more EUV; Radial polarisation pulse laser has less focal beam spot after being focused simultaneously, and the power density of laser is higher, is more beneficial to by Sn atomic excitation to high-valence state, produces more high-power EUV radiation.
Fig. 2 illustrates radial polarisation pulsed laser 1, comprising: laser tube 7, W conical mirror 10, flat output mirror 9 and sparking electrode 8.Laser tube 7 is laser instrument most important components, comprises discharge tube and water cold sleeve, and discharge tube is for storing working gas, and water cold sleeve cooling work gas makes stable output power.High pressure is added in laser tube 7 by electrode 8, realizes producing laser.Resonator cavity is made up of W conical mirror 10 and flat output mirror 9, and W conical mirror is for selecting radial polarized light beam, and flat output mirror is used for outputting radial polarization laser.
In embodiments of the present invention, after radial polarisation pulse laser line focus lens focus, in focus, place has longitudinal field component, and the energy entrained by longitudinal field component can not be propagated, and is conducive to the Sn ion being energized into high-valence state by Sn after being absorbed; Can obtain less focal beam spot, the hot spot of focusing is less, and the energy density of laser is higher, is more beneficial to by Sn atomic excitation to high-energy state, produces more high-octane EUV radiation simultaneously.The polarization signal of the radial polarisation pulse laser that radial polarisation pulsed laser produces as shown in Figure 3.This result just desired by us, obtains high-power EUV and exports, and improving photoetching efficiency, is vital to the improvement of photoetching technique.
In embodiments of the present invention, extreme ultraviolet source generator is by the waveguide CO of radio frequency mechanism
2the resonator cavity tail mirror of laser instrument changes W conical mirror and exportable low-power high-repetition-rate radial polarisation pulse CO into
2laser, changes simply and easily realizes.And by low-power high-repetition-rate radial polarisation pulse CO
2laser input laser amplifier amplifies thus produces high power high-repetition-rate radial polarisation pulse CO
2laser, avoid building complicated master and to shake amplification system, the light path system made becomes simple, and stability is improved.Due to the advantage of radial polarisation pulse laser itself, by the waveguide CO of radio frequency mechanism
2laser instrument and laser amplifier produce stable high power high-repetition-rate radial polarisation pulsed laser action and can produce more high-power EUV in drop Sn target and export.
Fig. 4 shows the realization flow of the extreme ultraviolet source generating method based on radial polarisation Laser Driven that the embodiment of the present invention provides, and comprises the steps:
S1: radial polarisation pulsed laser exports the radial polarisation pulse laser of low-power high-repetition-rate;
S2: the radial polarisation pulse laser of radial polarisation pulse laser output high-power high-repetition-rate after laser amplifier amplifies of low-power high-repetition-rate;
S3: the radial polarisation pulse laser of the described high power high-repetition-rate drop that radiation droplet target produces after focusing on also produces extreme ultraviolet.
In embodiments of the present invention, also comprise the extreme ultraviolet collecting mirror collection radiation after step s 3 and focus on.Wherein, the wavelength of extreme ultraviolet is 13.5nm.
Method provided by the invention is by radial polarisation pulse CO
2laser beam irradiates Sn target through lens focus, produces EUV.With radial polarisation pulse CO
2the advantage of Laser Driven EUV light source is that after radial polarisation laser line focus lens focus, in focus, place has longitudinal field component, and the energy entrained by longitudinal field component can not be propagated, and is conducive to the Sn ion being energized into high-valence state by Sn after being absorbed; Can obtain less focal beam spot, the hot spot of focusing is less, and the power density of laser is higher, and Sn atom is excited to the Sn of high-energy state simultaneously
8+~ Sn
12+possibility is larger, is conducive to the EUV giving off required 13.5nm, obtains higher EUV output power.Simultaneously this device easily obtains radial polarisation pulse laser and exports, and use laser amplifier to avoid to build complicated master to shake amplification system, the light path system made becomes simple, and stability is improved.
In order to make object of the present invention, technical scheme and advantage are clearly understood, are described below in conjunction with drawings and Examples.Embodiment is for explaining the present invention herein, does not limit the present invention.
The preferred embodiment of the present invention shown in Fig. 1, for building the schematic diagram of radial polarisation pulse laser driving stage ultraviolet light source system device.As figure so, the device producing EUV according to the present invention comprises following assembly: 1 for radial polarisation pulsed laser, and 2 be laser amplifier, and 3 for being coated with the EUV collection mirror of Mo/Si multilayer film, and 4 drip generator for Sn, and 6 is Sn drop.
Radial polarisation pulsed laser 1 can by changing common CO
2laser resonant cavity obtains, and embodiment is as follows: be 30ns by pulsewidth, and output wavelength is the waveguide CO of the radio frequency mechanism of 10.6 μm
2the resonator cavity tail mirror of laser instrument changes W conical mirror into, and conical mirror surface is coated with Polarization-Sensitive dielectric reflection film, realizes radial impulse CO
2laser output.The effect of laser amplifier 2 is the low-power high-repetition-rate radial polarisation pulse CO will exported from assembly 1
2laser carries out power amplification, and output high-power high-repetition-rate radial polarisation pulse CO
2laser, the embodiment of assembly 2 can be: the radio frequency CO by continuous power output being 4000W
2laser resonant cavity mirror changes full impregnated mirror into, retains working-laser material and electric discharge device.It is the EUV produced for collecting laser action drop Sn target that EUV collects mirror 3, and the EUV mirror being coated with Mo/Si multilayer film can obtain the EUV reflectivity more than 70%.It is drip for generation of Sn that Sn drips generator 4, owing to comprising vibrating device in generator, the Sn of generation can be made to drip very even.
Provide the workflow of radial drive extreme ultraviolet source apparatus below:
(1) radial polarisation pulsed laser 1 produces low-power high-repetition-rate radial polarisation pulse CO
2laser.
(2) low-power high-repetition-rate radial polarisation pulse CO
2laser produces high power high-repetition-rate radial polarisation pulse CO through amplifier 2
2laser output.
(3) high power high-repetition-rate radial polarisation pulse CO
2the Sn that laser drips generator 4 generation through condenser lens irradiation Sn drips 6, produces plasma and the EUV of effective radiation 13.5nm wave band.
(4) EUV collects the EUV that radiation collected by mirror 3, and focuses on focus point 5.
(5) photoetching is carried out at focus point 5.
The advantage of use radial polarisation pulse laser driving stage ultraviolet source is: radial polarisation laser line focus lens focus, in focus, place has longitudinal field component, energy entrained by longitudinal field component can not be propagated, be conducive to the ion being energized into high-valence state after being absorbed by Sn, Net long wave radiation goes out the EUV of 13.5nm.Radial polarisation laser beam can obtain less focal beam spot, much smaller than usual CO when focusing on simultaneously
2spot size is obtained after Laser Focusing.The hot spot focused on is less, and the power density of laser is higher, is more beneficial to by Sn atomic excitation to high-energy state, produces the EUV radiation of stronger energy.Export because above two advantages make to use radial polarisation pulse laser can produce more high-power EUV.
Those skilled in the art will readily understand; the foregoing is only preferred embodiment of the present invention; not in order to limit the present invention, all any amendments done within the spirit and principles in the present invention, equivalent replacement and improvement etc., all should be included within protection scope of the present invention.
Claims (6)
1. based on an extreme ultraviolet source generator for radial polarisation Laser Driven, it is characterized in that, comprise radial polarisation pulsed laser, laser amplifier, collection mirror and droplet generator; Described radial polarisation pulsed laser exports the radial polarisation pulse laser of low-power high-repetition-rate, and the radial polarisation pulse laser of low-power high-repetition-rate is carried out the radial polarisation pulse laser amplifying rear output high-power high-repetition-rate by laser amplifier; Droplet generator is for generation of drop, and the radial polarisation pulse laser of described high power high-repetition-rate irradiates described drop and produces extreme ultraviolet after focusing on;
Described radial polarisation pulsed laser comprises laser tube, W conical mirror, flat output mirror and sparking electrode;
High pressure is added in the two ends of laser tube and makes described laser tube Output of laser by described sparking electrode; Described W conical mirror and flat output mirror form resonator cavity, and described W conical mirror is for selecting radial polarized light beam, and flat output mirror is used for outputting radial polarized pulses laser.
2. extreme ultraviolet source generator as claimed in claim 1, it is characterized in that, described laser tube comprises the discharge tube for storing working gas and the water cold sleeve for cooling work gas.
3. extreme ultraviolet source generator as claimed in claim 1, it is characterized in that, have longitudinal field component at focus place after the radial polarisation pulse laser line focus lens focus of described high power high-repetition-rate, the energy entrained by this longitudinal field component can not be propagated and is conducive to after drop absorption being energized into high-valence state; Obtain less focal beam spot, the hot spot of focusing is less simultaneously, the energy density of laser higher and produce more high-octane extreme ultraviolet radiation.
4., based on an extreme ultraviolet source generating method for extreme ultraviolet source generator according to claim 1, it is characterized in that, comprise the steps:
S1: radial polarisation pulsed laser exports the radial polarisation pulse laser of low-power high-repetition-rate;
S2: the radial polarisation pulse laser of radial polarisation pulse laser output high-power high-repetition-rate after laser amplifier amplifies of low-power high-repetition-rate;
S3: the radial polarisation pulse laser of the described high power high-repetition-rate drop that radiation droplet target produces after focusing on also produces extreme ultraviolet.
5. extreme ultraviolet source generating method as claimed in claim 4, is characterized in that, also comprises the steps: that collecting mirror collects the extreme ultraviolet of radiation and focus on.
6. extreme ultraviolet source generating method as claimed in claim 4, it is characterized in that, the wavelength of described extreme ultraviolet is 13.5nm.
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| CN103513519A (en) * | 2013-09-13 | 2014-01-15 | 华中科技大学 | Monitoring system for liquid drop target space positions in light sources of extreme ultraviolet photoetching machine |
| CN108521066A (en) * | 2018-06-01 | 2018-09-11 | 费勉仪器科技（上海）有限公司 | A kind of laser amplification device and method |
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| CN102822903A (en) * | 2010-04-09 | 2012-12-12 | 西默股份有限公司 | Systems and method for target material delivery protection in a laser produced plasma EUV light source |
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| CN102822903A (en) * | 2010-04-09 | 2012-12-12 | 西默股份有限公司 | Systems and method for target material delivery protection in a laser produced plasma EUV light source |
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| 径向偏振光束特性理论研究;王慧东;《中国优秀硕士学位论文全文数据库》;20091231;全文 * |
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