CN103149804A - Device and method for generating extreme ultraviolet source based on radial polarization laser driving - Google Patents
Device and method for generating extreme ultraviolet source based on radial polarization laser driving Download PDFInfo
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- CN103149804A CN103149804A CN2013100224239A CN201310022423A CN103149804A CN 103149804 A CN103149804 A CN 103149804A CN 2013100224239 A CN2013100224239 A CN 2013100224239A CN 201310022423 A CN201310022423 A CN 201310022423A CN 103149804 A CN103149804 A CN 103149804A
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Abstract
The invention discloses a device and a method for generating an extreme ultraviolet source based on radial polarization laser driving. The device comprises a radial polarization pulse laser device, a laser amplifier, a collecting mirror and a drop generator. The radial polarization pulse laser device outputs radial polarization pulse laser, the laser amplifier amplifies the radial polarization pulse laser with low power and high repetition rate and outputs the radial polarization pulse laser with high repetition rate and high power, the radial polarization pulse laser with the high repetition rate and the high power is focused and illuminated on the drop, and generates extreme ultraviolet. According to the device and the method for generating the extreme ultraviolet source based on radial polarization laser driving, the beam is focused by utilizing the radial polarization pulse laser, the focus position has a longitudinal field component, energy carried by the longitudinal field component cannot be propagated, the energy is absorbed by Sn to be stimulated into ions in valence states, and extreme ultraviolet (EUV) of 13.5nm is effectively radiated. Meanwhile, the radial polarization pulse laser can obtain smaller focusing light spots during focusing, the smaller the light spots are, the higher the energy intensity of the laser is, and EUV radiation with stronger energy is generated.
Description
Technical field
The invention belongs to the laser application, more specifically, relate to a kind of extreme ultraviolet source generating device and method based on the radial polarisation Laser Driven.
Background technology
Along with the development of semi-conductor industry, more and more higher to the integrated level requirement of chip.The progress of semiconductor technology determines by photoetching process, and extreme extreme ultraviolet (Extreme Ultraviolet, EUV) photoetching will be the main flow technique of following nanoscale photoetching.
The photoetching optical source wavelength will reach in 2015 18nm, the photoetching minimum feature size funtcional relationship that is directly proportional to wavelength, so reduce the photoetching optical source wavelength to lithographic dimensioned reduce most important.
It is as shown in table 1 that international litho machine supplier proposes the performance index of photoetching light source, wherein the most important thing is the EUV power at gonglion IF place, and this is the major criterion of measurement litho machine.
| The light source technology parameter | Technical requirement |
| Wavelength X | 13.5nm |
| EUV power | 115W |
| Repetition frequency | >7-10KHz |
| System capacity stability | ± 0.3%, 3 σ, 50 pulses |
| The optical system life-span | 30000 hours |
| The light-source collecting degree | <3.3mm 2sr |
Table 1EUV photoetching light source performance index
The height of EUV output power determines photoetching efficient, but the EUV output that will obtain 115W just needs the incident of 15KW laser at least, and this requires too high to laser system, so incident laser is improved just very necessary.
Summary of the invention
For the defective of prior art, the object of the present invention is to provide a kind of extreme ultraviolet source generating method based on the radial polarisation Laser Driven, be intended to solve the low problem of EUV power that produces.
The invention provides a kind of extreme ultraviolet source generating device based on the radial polarisation Laser Driven, comprise radial polarisation pulsed laser, laser amplifier, collection mirror and droplet generator; The radial polarisation pulse laser of described radial polarisation pulsed laser output low-power high-repetition-rate, laser amplifier amplifies the radial polarisation pulse laser of low-power high-repetition-rate the radial polarisation pulse laser of rear output high-power high-repetition-rate; The liquid generator is for generation of drop, and the radial polarisation pulse laser of described high power high-repetition-rate is through the described drop of irradiation after focusing on and produce extreme ultraviolet.
Further, described radial polarisation pulsed laser comprises laser tube, W conical mirror, flat output mirror and sparking electrode; Described sparking electrode is added in high pressure the two ends of laser tube and makes described laser tube Output of laser; Described W conical mirror and flat output mirror consist of resonator cavity, and described W conical mirror is used for selecting radial polarized light beam, and flat output mirror is used for outputting radial polarized pulses laser.
Further, described laser tube comprises for the discharge tube that stores working gas and is used for the water cold sleeve of cooling work gas.
Further, have the longitudinal field component at the focus place after the radial polarisation pulse laser line focus lens focus of described high power high-repetition-rate, the entrained energy of this longitudinal field component can not propagate and absorbed by drop after be conducive to be energized into high valence state; Obtain simultaneously less focal beam spot, the hot spot of focusing is less, and the energy density of laser is higher and produce more high-octane extreme ultraviolet radiation.
The present invention also provides a kind of extreme ultraviolet source generating method based on the radial polarisation Laser Driven, comprises the steps:
S1: the radial polarisation pulse laser of radial polarisation pulsed laser output low-power high-repetition-rate;
S2: the radial polarisation pulse laser of the radial polarisation pulse laser of low-power high-repetition-rate output high-power high-repetition-rate after laser amplifier amplifies;
S3: the drop that after the radial polarisation pulse laser process of described high power high-repetition-rate focuses on, radiation drop target produces also produces extreme ultraviolet.
Further, also comprising the steps: to collect mirror collects the extreme ultraviolet of radiation and focuses on.
Further, described extreme ultraviolet light wavelength is 13.5nm.
The present invention uses the advantage of radial polarisation pulse laser driving stage ultraviolet source to be: radial polarisation laser line focus lens focus, the place has the longitudinal field component in focus, the entrained energy of longitudinal field component can not propagated, the ion that is conducive to be energized into high valence state after being absorbed by Sn effectively gives off the EUV of 13.5nm.The radial polarisation laser beam can obtain less focal beam spot when focusing on simultaneously, much smaller than common CO
2Obtain spot size after Laser Focusing.The hot spot that focuses on is less, and the energy density of laser is higher, more is beneficial to high-energy state is arrived in the Sn atomic excitation, produces the EUV radiation of stronger energy.Because making, above two advantages use the radial polarisation pulse laser can produce more high-power EUV output.
Description of drawings
Fig. 1 is the modular structure schematic diagram based on the extreme ultraviolet source generating device of radial polarisation Laser Driven that the embodiment of the present invention provides;
Fig. 2 be the embodiment of the present invention provide based on the extreme ultraviolet source generating device central diameter of the radial polarisation Laser Driven modular structure schematic diagram to the polarized pulses laser instrument;
Fig. 3 is the polarization schematic diagram of the radial polarisation pulse laser that produces to the polarized pulses laser instrument based on the extreme ultraviolet source generating device central diameter of radial polarisation Laser Driven that provides of the embodiment of the present invention;
Fig. 4 is the realization flow figure based on the extreme ultraviolet source generating method of radial polarisation Laser Driven that the embodiment of the present invention provides.
Embodiment
In order to make purpose of the present invention, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the present invention, is not intended to limit the present invention.
The extreme ultraviolet source generating device based on the radial polarisation Laser Driven that the embodiment of the present invention provides can be applied to the Sn plasma EUV light source, can obtain higher laser-extreme ultraviolet conversion efficiency, promotes the development of photoetching technique.The present invention is to common CO
2The laser transformation produces radial polarisation laser, can make the Sn target produce the high valence states that are excited to more, and the method can obtain more high-power EUV output, thereby can improve photoetching efficient.
The modular structure based on the extreme ultraviolet source generating device of radial polarisation Laser Driven that Fig. 1 shows that the embodiment of the present invention provides for convenience of explanation, only shows the part relevant to example of the present invention, and details are as follows:
The extreme ultraviolet source generating device comprises: radial polarisation pulsed laser 1, laser amplifier 2, collection mirror 3 and droplet generator 4; Radial polarisation pulsed laser 1 produces the radial polarisation pulse laser of low-power high-repetition-rate, and laser amplifier 2 amplifies the radial polarisation pulse laser of low-power high-repetition-rate the radial polarisation pulse laser of rear output high-power high-repetition-rate; Liquid generator 4 is for generation of drop, and the radial polarisation pulse laser of high power high-repetition-rate is through irradiation drop after focusing on and produce EUV.
Have the longitudinal field component after the radial polarisation pulse laser focusing that radial polarisation pulsed laser 1 produces, the entrained energy of longitudinal field component can not propagated, and is conducive to be energized into the ion of high valence state after being absorbed by Sn, thereby gives off more EUV; Have less focal beam spot after the radial polarisation pulse laser is focused simultaneously, the power density of laser is higher, more is beneficial to high valence state is arrived in the Sn atomic excitation, produces more high-power EUV radiation.
Fig. 2 illustrates radial polarisation pulsed laser 1, comprising: laser tube 7, W conical mirror 10, flat output mirror 9 and sparking electrode 8.Laser tube 7 is laser instrument most important components, comprises discharge tube and water cold sleeve, and discharge tube is used for storing working gas, and water cold sleeve cooling work gas makes stable output power.Electrode 8 is added in laser tube 7 with high pressure, realizes producing laser.Resonator cavity is comprised of W conical mirror 10 and flat output mirror 9, and the W conical mirror is used for selecting radial polarized light beam, and flat output mirror is used for the outputting radial polarization laser.
In embodiments of the present invention, after radial polarisation pulse laser line focus lens focus, the place has the longitudinal field component in focus, and the entrained energy of longitudinal field component can not propagated, and is conducive to be energized into the Sn ion of high valence state after being absorbed by Sn; Simultaneously can obtain less focal beam spot, the hot spot of focusing is less, and the energy density of laser is higher, more is beneficial to high-energy state is arrived in the Sn atomic excitation, produces more high-octane EUV radiation.The polarization signal of the radial polarisation pulse laser that the radial polarisation pulsed laser produces as shown in Figure 3.This is our desirable result just, obtains high-power EUV output, improves photoetching efficient, is vital to the improvement of photoetching technique.
In embodiments of the present invention, the extreme ultraviolet source generating device is with the waveguide CO of radio frequency mechanism
2It is exportable low-power high-repetition-rate radial polarisation pulse CO that the resonator cavity tail mirror of laser instrument changes the W conical mirror into
2Laser, change is simple and easy to be realized.And with low-power high-repetition-rate radial polarisation pulse CO
2Thereby laser input laser amplifier amplifies generation high power high-repetition-rate radial polarisation pulse CO
2Laser avoids building the complicated master amplification system of shaking, and the light path system that makes becomes simply, and stability is improved.Due to the advantage of radial polarisation pulse laser itself, by the waveguide CO of radio frequency mechanism
2Laser instrument and laser amplifier produce stable high power high-repetition-rate radial polarisation pulsed laser action can produce more high-power EUV output in drop Sn target.
The realization flow based on the extreme ultraviolet source generating method of radial polarisation Laser Driven that Fig. 4 shows that the embodiment of the present invention provides comprises the steps:
S1: the radial polarisation pulse laser of radial polarisation pulsed laser output low-power high-repetition-rate;
S2: the radial polarisation pulse laser of the radial polarisation pulse laser of low-power high-repetition-rate output high-power high-repetition-rate after laser amplifier amplifies;
S3: the drop that after the radial polarisation pulse laser process of described high power high-repetition-rate focuses on, radiation drop target produces also produces extreme ultraviolet.
In embodiments of the present invention, comprise also that after step S3 collecting mirror collects the extreme ultraviolet of radiation and focus on.Wherein, the extreme ultraviolet light wavelength is 13.5nm.
Method provided by the invention is with radial polarisation pulse CO
2Laser beam produces EUV through lens focus irradiation Sn target.With radial polarisation pulse CO
2After the advantage of Laser Driven EUV light source was radial polarisation laser line focus lens focus, the place had the longitudinal field component in focus, and the entrained energy of longitudinal field component can not propagated, and is conducive to be energized into the Sn ion of high valence state after being absorbed by Sn; Simultaneously can obtain less focal beam spot, the hot spot of focusing is less, and the power density of laser is higher, and the Sn atom is excited to the Sn of high-energy state
8+～Sn
12+Possibility is larger, is conducive to give off the EUV of required 13.5nm, obtains higher EUV output power.Simultaneously this device easily obtains the output of radial polarisation pulse laser, the master who uses laser amplifier to avoid the building complexity amplification system of shaking, and the light path system that makes becomes simply, and stability is improved.
In order to make purpose of the present invention, technical scheme and advantage are clearer, describe below in conjunction with drawings and Examples.Embodiment is for explaining the present invention, not limiting the present invention herein.
Shown in Figure 1 is the preferred embodiment of the present invention, is used for building the schematic diagram of radial polarisation pulse laser driving stage ultraviolet light source system device.So as figure, the device that produces EUV according to the present invention comprises following assembly: 1 is the radial polarisation pulsed laser, and 2 is laser amplifier, and 3 for the EUV that is coated with the Mo/Si multilayer film collects mirror, and 4 for Sn drips generator, and 6 is the Sn drop.
Radial polarisation pulsed laser 1 can be by changing common CO
2Laser resonant cavity obtains, and embodiment is as follows: be 30ns with pulsewidth, output wavelength is the waveguide CO of the radio frequency mechanism of 10.6 μ m
2The resonator cavity tail mirror of laser instrument changes the W conical mirror into, and the conical mirror surface is coated with Polarization-Sensitive dielectric reflection film, realizes radial impulse CO
2Laser output.The effect of laser amplifier 2 is with the low-power high-repetition-rate radial polarisation pulse CO from assembly 1 output
2Laser carries out power amplification, and output high-power high-repetition-rate radial polarisation pulse CO
2Laser, the embodiment of assembly 2 can for: be the radio frequency CO of 4000W with continuous power output
2The laser resonant cavity mirror changes the full impregnated mirror into, keeps working-laser material and electric discharge device.It is the EUV that produce for collecting laser action drop Sn target that EUV collects mirror 3, and the EUV catoptron that is coated with the Mo/Si multilayer film can obtain to surpass 70% EUV reflectivity.It is to drip for generation of Sn that Sn drips generator 4, owing to comprising vibrating device in generator, can make the Sn of generation drip very even.
The below provides the workflow of radial drive extreme ultraviolet source apparatus:
(1) radial polarisation pulsed laser 1 produces low-power high-repetition-rate radial polarisation pulse CO
2Laser.
(2) low-power high-repetition-rate radial polarisation pulse CO
2Laser produces high power high-repetition-rate radial polarisation pulse CO through amplifier 2
2Laser output.
(3) high power high-repetition-rate radial polarisation pulse CO
2Laser drips 6 through the Sn that condenser lens irradiation Sn drips generator 4 generations, produces the EUV of plasma and effective radiation 13.5nm wave band.
(4) EUV collects mirror 3 and collects the EUV of radiation, and focuses on focus point 5.
(5) carry out photoetching at focus point 5.
Use the advantage of radial polarisation pulse laser driving stage ultraviolet source to be: radial polarisation laser line focus lens focus, the place has the longitudinal field component in focus, the entrained energy of longitudinal field component can not propagated, the ion that is conducive to be energized into high valence state after being absorbed by Sn effectively gives off the EUV of 13.5nm.The radial polarisation laser beam can obtain less focal beam spot when focusing on simultaneously, much smaller than common CO
2Obtain spot size after Laser Focusing.The hot spot that focuses on is less, and the power density of laser is higher, more is beneficial to high-energy state is arrived in the Sn atomic excitation, produces the EUV radiation of stronger energy.Because making, above two advantages use the radial polarisation pulse laser can produce more high-power EUV output.
Those skilled in the art will readily understand; the above is only preferred embodiment of the present invention; not in order to limiting the present invention, all any modifications of doing within the spirit and principles in the present invention, be equal to and replace and improvement etc., within all should being included in protection scope of the present invention.
Claims (7)
1. the extreme ultraviolet source generating device based on the radial polarisation Laser Driven, is characterized in that, comprises radial polarisation pulsed laser, laser amplifier, collection mirror and droplet generator; The radial polarisation pulse laser of described radial polarisation pulsed laser output low-power high-repetition-rate, laser amplifier amplifies the radial polarisation pulse laser of low-power high-repetition-rate the radial polarisation pulse laser of rear output high-power high-repetition-rate; The liquid generator is for generation of drop, and the radial polarisation pulse laser of described high power high-repetition-rate is through the described drop of irradiation after focusing on and produce extreme ultraviolet.
2. extreme ultraviolet source generating device as claimed in claim 1, is characterized in that, described radial polarisation pulsed laser comprises laser tube, W conical mirror, flat output mirror and sparking electrode;
Described sparking electrode is added in high pressure the two ends of laser tube and makes described laser tube Output of laser; Described W conical mirror and flat output mirror consist of resonator cavity, and described W conical mirror is used for selecting radial polarized light beam, and flat output mirror is used for outputting radial polarized pulses laser.
3. extreme ultraviolet source generating device as claimed in claim 2, is characterized in that, described laser tube comprises for the discharge tube that stores working gas and is used for the water cold sleeve of cooling work gas.
4. extreme ultraviolet source generating device as claimed in claim 1, it is characterized in that, have the longitudinal field component at the focus place after the radial polarisation pulse laser line focus lens focus of described high power high-repetition-rate, the entrained energy of this longitudinal field component can not propagate and absorbed by drop after be conducive to be energized into high valence state; Obtain simultaneously less focal beam spot, the hot spot of focusing is less, and the energy density of laser is higher and produce more high-octane extreme ultraviolet radiation.
5. the extreme ultraviolet source generating method based on the radial polarisation Laser Driven, is characterized in that, comprises the steps:
S1: the radial polarisation pulse laser of radial polarisation pulsed laser output low-power high-repetition-rate;
S2: the radial polarisation pulse laser of the radial polarisation pulse laser of low-power high-repetition-rate output high-power high-repetition-rate after laser amplifier amplifies;
S3: the drop that after the radial polarisation pulse laser process of described high power high-repetition-rate focuses on, radiation drop target produces also produces extreme ultraviolet.
6. extreme ultraviolet source generating method as claimed in claim 5, is characterized in that, also comprises the steps: to collect mirror and collect the extreme ultraviolet of radiation and focus on.
7. extreme ultraviolet source generating method as claimed in claim 5, is characterized in that, described extreme ultraviolet light wavelength is 13.5nm.
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| CN201310022423.9A CN103149804B (en) | 2013-01-22 | 2013-01-22 | Device and method for generating extreme ultraviolet source based on radial polarization laser driving |
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| CN201310022423.9A CN103149804B (en) | 2013-01-22 | 2013-01-22 | Device and method for generating extreme ultraviolet source based on radial polarization laser driving |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103513519A (en) * | 2013-09-13 | 2014-01-15 | 华中科技大学 | Monitoring system for liquid drop target space positions in light sources of extreme ultraviolet photoetching machine |
| CN108521066A (en) * | 2018-06-01 | 2018-09-11 | 费勉仪器科技（上海）有限公司 | A kind of laser amplification device and method |
Citations (2)
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|---|---|---|---|---|
| US20120146507A1 (en) * | 2010-03-29 | 2012-06-14 | Tatsuya Yanagida | System and method for generating extreme ultraviolet light, and laser apparatus |
| CN102822903A (en) * | 2010-04-09 | 2012-12-12 | 西默股份有限公司 | Systems and method for target material delivery protection in a laser produced plasma EUV light source |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120146507A1 (en) * | 2010-03-29 | 2012-06-14 | Tatsuya Yanagida | System and method for generating extreme ultraviolet light, and laser apparatus |
| CN102822903A (en) * | 2010-04-09 | 2012-12-12 | 西默股份有限公司 | Systems and method for target material delivery protection in a laser produced plasma EUV light source |
Non-Patent Citations (1)
| Title |
|---|
| 王慧东: "径向偏振光束特性理论研究", 《中国优秀硕士学位论文全文数据库》, 31 December 2009 (2009-12-31) * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103513519A (en) * | 2013-09-13 | 2014-01-15 | 华中科技大学 | Monitoring system for liquid drop target space positions in light sources of extreme ultraviolet photoetching machine |
| CN108521066A (en) * | 2018-06-01 | 2018-09-11 | 费勉仪器科技（上海）有限公司 | A kind of laser amplification device and method |
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