CN103094151A - Chemical liquid recovery device - Google Patents
Chemical liquid recovery device Download PDFInfo
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- CN103094151A CN103094151A CN2011103325798A CN201110332579A CN103094151A CN 103094151 A CN103094151 A CN 103094151A CN 2011103325798 A CN2011103325798 A CN 2011103325798A CN 201110332579 A CN201110332579 A CN 201110332579A CN 103094151 A CN103094151 A CN 103094151A
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- wafer
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- chemical liquids
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Abstract
The invention belongs to the field of wet processing of chips in the semiconductor industry, and particularly relates to a chemical liquid recovery device with a liftable CUP. The chemical recovery device comprises a supporting stage used for fixing and rotating a chip, a CUP, a liquid connecting groove, a cylinder, a motor and a countertop. The liquid connecting groove is installed on the countertop and the supporting stage which is driven by the dynamo is installed inside the liquid connecting groove. The elevated CUP which is driven by the cylinder is arranged between the liquid connecting groove and the supporting stage. The liquid connecting groove is divided into an outer groove used for recycling the chemical liquid and an inner groove used for recycling the cleaning liquid by the CUP. Each groove is provided with an outlet. The chemical liquid recovery device controls the separation of the chemical liquid and the cleaning liquid by the way of lifting the CUP. The requirement of recycling chemical liquid can be met in the wet processing through different channels to recycle, and the problems of the pollution of the chemical liquid and being diluted are reduced to a great extent.
Description
Technical field
The invention belongs to semicon industry wafer wet treatment field, specifically a kind of chemical liquids retracting device with liftable CUP.
Background technology
At present, often need to use chemical liquids for wafer wet processing process in semicon industry, and how realize that the pollution-free of chemical liquids is exactly an inevitable problem without the dilution recycling.In the prior art, the recovery of chemical liquids is more difficult, and the chemical liquids that reclaims can contaminated and dilution.Therefore, how to avoid the generation of chemical liquids contaminated and dilution phenomenon in removal process, become problem demanding prompt solution.
Summary of the invention
In order to solve chemical liquids because of problem contaminated in removal process and that dilution can't recycle, the object of the present invention is to provide a kind of chemical liquids retracting device with liftable CUP.This retracting device is used for the recycling after the chemical liquids PROCESS FOR TREATMENT, to reach the purpose of saving cost, can realize that by this device the pollution-free of chemical liquids reclaims without dilution.
The objective of the invention is to be achieved through the following technical solutions:
The present invention includes fixing and rotation wafer wafer-supporting platform, CUP, connect liquid bath, cylinder, motor and deck plate, wherein connect liquid bath and be arranged on deck plate, be provided with in connecing liquid bath by motor-driven wafer-supporting platform; The described CUP that is provided with between liquid bath and wafer-supporting platform by the air cylinder driven lifting that connects connects in liquid bath by described CUP and is divided into the water jacket that reclaims chemical liquids and the inside groove of recovery and rinsing liquid, and each groove respectively is provided with an outlet.
Wherein: the upper limit that described CUP moves is positioned at the top of wafer and wafer-supporting platform, and lower limit is positioned at the below of wafer and wafer-supporting platform; Described motor is hollow shaft motor, be arranged on the below of deck plate, the output shaft of motor hollow passes deck plate and is connected with described wafer-supporting platform, output shaft end in motor hollow is provided with the compressed air inlet, and the position that described wafer-supporting platform is enclosed within outside output shaft has the compressed air outlet that is communicated with the output shaft of described hollow; Described CUP is taper type, inner hollow, has the first through hole that passes for described wafer-supporting platform at the upper surface of CUP; Have groove on described CUP, connect and be provided with the second projection in liquid bath, this second projection is contained in described groove; Described cylinder is arranged on the lower surface of deck plate, and piston rod passes deck plate successively, the second projection is connected with CUP; Described the first projection, the second projection that is provided with successively from inside to outside inner hollow in liquid bath that connect, the output shaft of wafer-supporting platform and motor is passed by the first projection; Described the first projection and the second projection will connect the liquid bath interior separation and become water jacket and inside groove, it is inside groove between first and second projection, the second projection is water jacket with connecing between the liquid bath outer wall, and the bottom of inside groove has the leakage fluid dram of recovery and rinsing liquid, and the bottom of water jacket has the acid discharge mouth of recovery chemical liquids; In described inside groove, be provided with baffle plate between the first protruding top and wafer-supporting platform; The described top that connects liquid bath is equipped with protective cover; Described protective cover is taper type, and its upper surface has the second through hole.
Advantage of the present invention and good effect are:
1. the present invention controls separating of chemical liquids and cleaning fluid by the mode of lifting CUP, reclaims by different passages, has realized that chemical liquids reclaims requirement when wet treatment, has reduced to a great extent the pollution of chemical liquids and has been diluted problem.
CUP of the present invention be positioned at when upper limit wafer 1 above, cleaning fluid all is thrown to the CUP inwall, can not be thrown to the CUP outside, pollution that therefore can chemical liquids and being diluted; CUP can be when lower limit, and chemical liquids is left to exocoel along the CUP outer wall, all is recycled, and can not cause waste.
3. the present invention offers respectively compressed air inlet and compressed air outlet on motor and wafer-supporting platform, and add baffled below the first projection and wafer-supporting platform, there is compressed air to blow out below wafer-supporting platform, guaranteed that the acid mist that produces can corrosion electrical motor in process treatment process.
The present invention simple in structure, be swift in response, easy for installation, lower-price characteristic.
5. the present invention has realized the recovery of chemical liquids and the automatic conversion of discharging.
Description of drawings
Fig. 1 is one of internal structure schematic diagram of the present invention (CUP is in mobile lower limit);
Fig. 2 is two (CUP is in mobile upper limit) of internal structure schematic diagram of the present invention;
Wherein 1 is wafer, and 2 is wafer-supporting platform, and 3 is CUP (anti-splash cup), and 4 is piston rod, 5 for connecing liquid bath, and 6 are the acid discharge mouth, and 7 is cylinder, and 8 is motor, 9 is the compressed air inlet, and 10 is leakage fluid dram, and 11 is compressed air outlet, 12 chemical liquids, 13 is cleaning fluid, 14 is deck plate, 15 is protective cover, and 16 is water jacket, and 17 is inside groove, 18 is the first projection, and 19 is the second projection, and 20 is baffle plate.
Embodiment
The invention will be further described below in conjunction with accompanying drawing.
as Fig. 1, shown in Figure 2, the present invention includes wafer 1, wafer-supporting platform 2, CUP3, connect liquid bath 5, cylinder 7, motor 8 and deck plate 14, wherein connect the upper surface that liquid bath 5 is fixed on deck plate 14, the bottom surface that connects liquid bath 5 extends upward vertically, form from inside to outside first projection the 18 and second projection 19 of hollow, the first projection 18 is positioned at the central authorities that connect liquid bath 5, central axis and the central axis conllinear that connects liquid bath 5, the second projection 19 is positioned at the periphery of the first projection 18, with the first concentric setting of projection 18, form inside groove 17 between first projection the 18 and second projection 19, the second projection 19 with connect formation water jacket 16 between the outer wall of liquid bath 5, water jacket 16 is separate with inside groove 17, connect liquid bath 5, first the projection the 18 and second projection 19 all can be circle.Have the leakage fluid dram 10 of recovery and rinsing liquid 13 in the bottom surface that connects liquid bath 5 of inside groove 17 correspondences, this leakage fluid dram 10 is always to downward-extension (being also to have leakage fluid dram 10 on deck plate 14), be connected to the cleaning fluid reclaimer by tube connector; Have the acid discharge mouth 6 that reclaims chemical liquids 12 in the bottom surface that connects liquid bath 5 of water jacket 16 correspondences, this acid discharge mouth 6 is always to downward-extension (being also to have acid discharge mouth 6 on deck plate 14), be connected to the chemical liquids reclaimer by tube connector.
Connect and be provided with the CUP3 that is driven liftings by cylinder 7 in liquid bath 5, this CUP3 is taper type, inner hollow, covers on first projection the 18 and second projection 19, has the first through hole at the upper surface of CUP3.The bottom of CUP3 has the groove corresponding with the second projection 19, and the second projection 19 is contained in described groove, can play guide effect in the process of CUP3 lifting.Cylinder 7 has two at least, is arranged on respectively the lower surface of deck plate 14 as symmetry take the central axis that connects liquid bath 5, and the piston rod 4 of cylinder 7 passes deck plate 14 successively, the second projection 19 is connected with CUP3.Cylinder 7 work drive the CUP3 lifting by piston rod 4.
Centre in connecing liquid bath 5 is provided with wafer-supporting platform 2, and wafer 1 is fixed on wafer-supporting platform 2, rotates with wafer-supporting platform 2.Motor 8 is arranged on the lower surface of deck plate 14, is hollow shaft motor; The first projection 18 that connects liquid bath 5 is hollow structure, have the third through-hole corresponding with the first projection 18 interior hollow cavities on the deck plate 14 below the first projection 18, the third through-hole that the output shaft of motor 8 hollows passes on deck plate 14 is connected with wafer-supporting platform 2, drives wafer-supporting platform 2 rotations.Output shaft lower end in motor 8 hollows is provided with compressed air inlet 9, the bottom of wafer-supporting platform 2 is enclosed within outside output shaft, have the compressed air outlet 11 that is communicated with the output shaft of electronics 8 hollows on wafer-supporting platform 2 in the first protruding 18 hollow cavities, and be provided with baffle plate 20 between the first protruding 18 tops and wafer-supporting platform 2, prevent that the cleaning fluid in inside groove 17 from entering in the first projection 18; Compressed air is blown into by compressed air inlet 9, then has the compressed air outlet 11 of wafer-supporting platform 2 bottoms to blow out, and can guarantee that the acid mist that produces in the course of work can not erode to motor 8.When cylinder 7 drives the CUP3 lifting, the upper limit that CUP3 moves is positioned at the top of wafer 1 and wafer-supporting platform 2, to guarantee that cleaning fluid 13 enters, is ejected on wafer 1 by the first through hole on the CUP3 upper surface, along with the rotation of wafer-supporting platform 2 all is thrown to CUP3 inside, can not be thrown to CUP3 outside and pollute diluted chemical liquid 2; And the lower limit that CUP3 moves is positioned at the below of wafer 1 and wafer-supporting platform 2, be ejected on wafer 1 to guarantee chemical liquids 12, and along with the rotation of wafer-supporting platform 2 all is thrown to the CUP3 outside, and then with chemical liquids 12 recyclings; In lifting process, the first through hole that wafer 1 and plummer 2 are offered by the CUP3 upper surface passes.
In order to prevent spattering outside chemical liquids 12 or cleaning fluid 13, at the top that connects liquid bath 5, protective cover 15 is installed, this protective cover 15 is taper type, its upper surface has the second through hole, sprays into for chemical liquids 12 or cleaning fluid 13.
Operation principle of the present invention is:
As shown in Figure 1, when carrying out PROCESS FOR TREATMENT, chemical liquids 12 is ejected on wafer 1 by the second through hole on protective cover 15, and this moment, CUP3 was positioned at lower limit, and the upper surface of CUP3 is positioned at the below of wafer 1; Wafer 1 rotates under the driving of motor 8 with wafer-supporting platform 2, and in rotary course, chemical liquids 12 is thrown out of on the outer wall that flows to CUP3, and flow in the water jacket 16 that connects liquid bath 5 along the outer wall of CUP3, then is got back in the chemical liquids bucket by 6 outflows of acid discharge mouth and reuse.
When PROCESS FOR TREATMENT finishes, need to wash chemical liquids residual on wafer 1, as shown in Figure 2, CUP3 upwards rises under the promotion of cylinder 7, until upper limit, the upper surface of CUP3 is positioned on wafer 1, and cleaning fluid 13 is ejected on wafer 1 by the first through hole of the second through hole on protective cover 15, CUP3 upper surface successively; In the process of wafer 1 with wafer-supporting platform 2 rotations, cleaning fluid 13 is thrown out of to flow on the CUP3 inwall and along inwall and flow in the inside groove that connects liquid bath 5, then flows out waste discharge by leakage fluid dram 10.So just realized the pollution-free technological requirement without the dilution recovery of chemical liquids.
The present invention all adopts PTFE (polytetrafluoroethylene) material to make, and can use in occasions such as using strong acid and strong base, therefore the scope of application is very extensive.
Claims (9)
1. chemical liquids retracting device, it is characterized in that: comprise fixing and rotation wafer (1) wafer-supporting platform (2), CUP (3), connect liquid bath (5), cylinder (7), motor (8) and deck plate (14), wherein connect liquid bath (5) and be arranged on deck plate (14), be provided with the wafer-supporting platform (2) that is driven by motor (8) in connecing liquid bath (5); Described connecing is provided with the CUP (3) that is driven lifting by cylinder (7) between liquid bath (5) and wafer-supporting platform (2), connect in liquid bath (5) and be divided into the water jacket (16) of recovery chemical liquids (12) and the inside groove (17) of recovery and rinsing liquid (13) by described CUP (3), each groove respectively is provided with an outlet.
2. by chemical liquids retracting device claimed in claim 1, it is characterized in that: the mobile upper limit of described CUP (3) is positioned at the top of wafer (1) and wafer-supporting platform (2), and lower limit is positioned at the below of wafer (1) and wafer-supporting platform (2).
3. by chemical liquids retracting device claimed in claim 1, it is characterized in that: described motor (8) is hollow shaft motor, be arranged on the below of deck plate (14), the output shaft of motor (8) hollow passes deck plate (14) and is connected with described wafer-supporting platform (2), output shaft end in motor (8) hollow is provided with compressed air inlet (9), and the position that described wafer-supporting platform (2) is enclosed within outside output shaft has the compressed air outlet (11) that is communicated with the output shaft of described hollow.
4. by the described chemical liquids retracting device of claim 1 or 2, it is characterized in that: described CUP (3) is taper type, inner hollow, has at the upper surface of CUP (3) the first through hole that passes for described wafer-supporting platform (2).
5. by chemical liquids retracting device claimed in claim 4, it is characterized in that: described CUP has groove on (3), connects and is provided with the second projection (19) in liquid bath (5), and this second projection (19) is contained in described groove; Described cylinder (7) is arranged on the lower surface of deck plate (14), and piston rod (4) passes deck plate (14) successively, the second projection (19) is connected with CUP (3).
6. by chemical liquids retracting device claimed in claim 1, it is characterized in that: described the first projection (18), the second projection (19) that is provided with successively from inside to outside inner hollow in liquid bath (5) that connect, the output shaft of wafer-supporting platform (2) and motor (8) is passed by the first projection (18); Described the first projection (18) and the second projection (19) will connect liquid bath (5) interior separation and become water jacket (16) and inside groove (17), be inside groove (17) between first and second projection (18,19), the second projection (19) and connect between liquid bath (5) outer wall and to be water jacket (16), the bottom of inside groove (17) has the leakage fluid dram (10) of recovery and rinsing liquid (13), and the bottom of water jacket (16) has the acid discharge mouth (6) that reclaims chemical liquids (12).
7. by chemical liquids retracting device claimed in claim 6, it is characterized in that: in described inside groove (17), be provided with baffle plate (20) between the first projection (18) top and wafer-supporting platform (2).
8. by the described chemical liquids retracting device of claim 1 or 6, it is characterized in that: the described top that connects liquid bath (5) is equipped with protective cover (15).
9. by chemical liquids retracting device claimed in claim 8, it is characterized in that: described protective cover (15) is taper type, and its upper surface has the second through hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110332579.8A CN103094151B (en) | 2011-10-27 | 2011-10-27 | Chemical liquid recovery device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110332579.8A CN103094151B (en) | 2011-10-27 | 2011-10-27 | Chemical liquid recovery device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103094151A true CN103094151A (en) | 2013-05-08 |
| CN103094151B CN103094151B (en) | 2015-07-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110332579.8A Active CN103094151B (en) | 2011-10-27 | 2011-10-27 | Chemical liquid recovery device |
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| Country | Link |
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| CN (1) | CN103094151B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107634015A (en) * | 2016-07-19 | 2018-01-26 | 株式会社斯库林集团 | Substrate board treatment and processing cup cleaning method |
| CN109701943A (en) * | 2019-01-22 | 2019-05-03 | 上海提牛机电设备有限公司 | A kind of wafer cleaning basin |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004070807A1 (en) * | 2003-02-03 | 2004-08-19 | Personal Creation Ltd. | Substrate treating device and substrate treating method |
| CN101204708A (en) * | 2006-12-19 | 2008-06-25 | 大日本网目版制造株式会社 | Recovery cup cleaning method and substrate treatment apparatus |
-
2011
- 2011-10-27 CN CN201110332579.8A patent/CN103094151B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004070807A1 (en) * | 2003-02-03 | 2004-08-19 | Personal Creation Ltd. | Substrate treating device and substrate treating method |
| CN101204708A (en) * | 2006-12-19 | 2008-06-25 | 大日本网目版制造株式会社 | Recovery cup cleaning method and substrate treatment apparatus |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107634015A (en) * | 2016-07-19 | 2018-01-26 | 株式会社斯库林集团 | Substrate board treatment and processing cup cleaning method |
| CN107634015B (en) * | 2016-07-19 | 2021-06-11 | 株式会社斯库林集团 | Substrate processing apparatus and processing cup cleaning method |
| CN109701943A (en) * | 2019-01-22 | 2019-05-03 | 上海提牛机电设备有限公司 | A kind of wafer cleaning basin |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103094151B (en) | 2015-07-22 |
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Address after: 110168 No. 16 Feiyun Road, Hunnan District, Shenyang City, Liaoning Province Patentee after: Shenyang Core Source Microelectronic Equipment Co., Ltd. Address before: 110168 No. 16 Feiyun Road, Hunnan New District, Shenyang City, Liaoning Province Patentee before: Shenyang Siayuan Electronic Equipment Co., Ltd. |
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