CN103064136A - Combined microlens array for integrated imaging three-dimensional (3D) display and manufacturing method thereof - Google Patents
Combined microlens array for integrated imaging three-dimensional (3D) display and manufacturing method thereof Download PDFInfo
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- CN103064136A CN103064136A CN2013100148610A CN201310014861A CN103064136A CN 103064136 A CN103064136 A CN 103064136A CN 2013100148610 A CN2013100148610 A CN 2013100148610A CN 201310014861 A CN201310014861 A CN 201310014861A CN 103064136 A CN103064136 A CN 103064136A
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Abstract
The invention relates to the technical field of integrated imaging three-dimensional (3D) display, in particular to a combined microlens array for the integrated imaging 3D display and a manufacturing method of the combined microlens array. The combined microlens array for the integrated imaging 3D display is characterized by comprising a substrate, a small hole raster and a microlens array, wherein the small hole raster is arranged on one surface of the substrate, the small hole raster is opaque metal or photoresist with a hollow hole array, the microlens array is arranged on one face of the substrate, the microlens array is composed of lens units which correspond to the small hole raster of the small hole array, and the lens units are located in the corresponding small hole array. The manufacturing method of the combined microlens array have the advantages of being simple in method, low in cost, and capable of effectively resolving the problems of serious image crosstalk and reduction of resolution caused by a single microlens array. Meanwhile, the problem of reduction of display brightness caused by the single microlens array is also resolved, and the high-performance integrated imaging 3D display is easy to achieve.
Description
Technical field
The present invention relates to integration imaging 3D display technique field, relate in particular to a kind of combination microlens array that shows for integration imaging 3D and preparation method thereof.
Background technology
Integration imaging (Integral Imaging, II) is a kind of new method of authentic three-dimensional optical imaging as a kind of free 3 D display technology.Integration imaging 3D display technique adopts microlens array or aperture grating to realize objective stereoscopic features information recording/and stereo-picture reconstruct.Compare with other stereo display techniques, this technology has does not need utility appliance and coherent source; The very three-dimensional real-time stereo images of full parallax, continuous viewpoint, full color can be provided; Can effectively overcome the visual fatigue phenomenon that converge like the spokes of a wheel at the hub and focus adjustment range that traditional multi-view auto stereo display occurs causes; Can the advantages such as good compatibility be arranged with existing HDTV Systems, become the important subject in the 3D demonstration field.
Wherein, microlens array or aperture grating are the key components of integration imaging 3D display system, and the research of its Optimal Structure Designing and manufacture craft plays an important role to high-performance integration imaging 3D display technique.The 3D display device that single microlens array is realized, display brightness is high, but the gap between lens and the lens equally can printing opacity in the single microlens array, therefore increases crosstalking between image disruption and the micro unit image, reduces the resolution that shows.And single aperture grating can not cause picture crosstalk, but because aperture must be much smaller than the size of micro unit image, guarantee shows clear picture, certainly will cause like this display brightness to reduce.
For single microlens array and single aperture grating above shortcomings, the present invention proposes combination microlens array of a kind of new integration imaging 3D of being used for demonstration and preparation method thereof in conjunction with the advantage of aperture grating and microlens array.
Summary of the invention
In view of this, the purpose of this invention is to provide a kind of combination microlens array that shows for integration imaging 3D and preparation method thereof.
The invention provides a kind of combination microlens array for integration imaging 3D demonstration, it is characterized in that, comprising:
One substrate;
One aperture grating is arranged at a surface of described substrate, and described aperture grating is opaque metal or a photoresist with the hollow out array of orifices; And
One microlens array is arranged at the one side that described substrate contains described aperture grating, described microlens array by with the array of orifices of described aperture grating one to one lens unit form, and described lens unit is arranged in the array of orifices of described correspondence.
In an embodiment of the present invention, described substrate is clear glass, transparent organic material or transparent polymer material.
In an embodiment of the present invention, the shape of described array of orifices aperture and microlens array lens unit is consistent, equal and opposite in direction, and aligns one by one in the center; Wherein microlens array is used for integration imaging 3D and shows micro unit Image Acquisition and reconstruct, the lightproof part of array of orifices for reducing or eliminate single microlens array because crosstalking of causing between the interference of lenticule unit gap transmitted light and the lenticule unit.
In an embodiment of the present invention, described array of orifices aperture and microlens array lens unit is shaped as circle or regular polygon.
The present invention also provides a kind of method for making of the combination microlens array that shows for integration imaging 3D, the first method for making concrete scheme that adopts is: the method for making that a kind of combination microlens array that shows for integration imaging 3D is provided, it is characterized in that, comprise following steps:
S11 a: substrate is provided and adopts photoetching, etching or serigraphy to make an aperture grating in surface thereof;
S12: the one side that is provided with described aperture grating at described substrate evenly applies the negative photoresist of layer of transparent;
S13: adopt back of the body Exposure mode, the one side that described aperture grating is not set from described substrate is exposed and is developed; The part that described photoresist is stopped by described aperture grating will be developed liquid and remove, and stay the photoresist column pattern array that is not stopped by described aperture grating;
S14: adopt the melting photoresist method to make described photoresist column pattern array fusing distortion, form the photoresist microlens array, thereby obtain described combination microlens array.
In an embodiment of the present invention, described aperture grating is opaque metal or a photoresist with the hollow out array of orifices; Described microlens array by with the array of orifices of described aperture grating one to one lens unit form.
The second method for making concrete scheme that the present invention adopts is: a kind of method for making of the combination microlens array that shows for integration imaging 3D is provided, it is characterized in that, comprise following steps:
S21: two plate bases are provided and adopt photoetching, etching or serigraphy to make an aperture grating in surface thereof respectively;
S22: get a wherein plate base for preparing among the described step S21 and evenly apply layer of transparent in its one side that is provided with described aperture grating and bear photoresist;
S23: adopt back of the body Exposure mode, the one side that the substrate that contains the aperture grating for preparing from described step S22 is not provided with the aperture grating is exposed and is developed, the part that described photoresist is stopped by described aperture grating will be developed liquid and remove, and stay the photoresist column pattern array that is not stopped by described aperture grating;
S24: get the substrate that contains photoresist column pattern array for preparing among the described step S23, adopt the melting photoresist method to make described photoresist column pattern array fusing distortion, form the photoresist microlens array;
S25: get the substrate that contains the photoresist microlens array for preparing among the described step S24, and use silicon rubber to make the silicon rubber negative norm plate of described photoresist microlens array;
S26: utilize described silicon rubber negative norm plate, another sheet that adopts hot padding or ultraviolet stamping to prepare in described step S21 is provided with the substrate of aperture grating and makes a transparent organic material microlens array, thereby obtains described combination microlens array.
In an embodiment of the present invention, described aperture grating is opaque metal or a photoresist with the hollow out array of orifices; Described microlens array by with the array of orifices of described aperture grating one to one lens unit form.
In an embodiment of the present invention, the concrete steps of described step S25 are:
S251: the potpourri for preparing monomer and crosslinking chemical in the required ratio of described silicon rubber;
S252: the described substrate that contains the photoresist microlens array is positioned in the container, pours described potpourri into and leave standstill;
S253: after described potpourri bubbles whole the elimination, this container is put into baking oven, solidify rear taking-up fully until described potpourri;
S254: described potpourri is separated with the described substrate that contains the photoresist microlens array, and cut described potpourri and form described silicon rubber negative norm plate.
In an embodiment of the present invention, the concrete steps of described step S26 are:
S261: described silicon rubber negative norm plate is positioned in the airtight container vacuumizes, make it have negative pressure;
S262: the one side that the substrate that another sheet for preparing in described step S21 is provided with the aperture grating contains described aperture grating evenly applies the layer of transparent organic material;
S263: be positioned over described silicon rubber negative norm plate with negative pressure on the described transparent organic material and alignd one by one with the aperture center of described aperture grating in its center, and described silicon rubber negative norm plate is contacted with described aperture grating;
S264: because described silicon rubber negative norm plate has negative pressure, described transparent organic material will form the transparent organic material microlens array corresponding with described silicon rubber negative norm plate under the acting in conjunction of negative pressure and capillary force;
S265: adopt the mode of cooling curing or ultra-violet curing that described transparent organic material microlens array is solidified;
S266: described silicon rubber negative norm plate is separated with described transparent organic material microlens array.
Remarkable advantage of the present invention is: microlens array and aperture grating are combined, so that microlens array and aperture grating are had complementary advantages, efficiently solve picture crosstalk that single microlens array brings serious and the problem of decrease resolution and the problem that is reduced by the display brightness that single aperture grating brings, be easy to realize high-performance integration imaging 3D demonstration.And combination method for fabricating microlens array provided by the invention is simple, with low cost.
Description of drawings
Fig. 1 is the structural representation of a kind of combination microlens array that shows for integration imaging 3D of the present invention.
Fig. 2 a-2d is for adopting the making flow process diagrammatic cross-section of the first method for making of the present invention.
The silicon rubber negative norm plate diagrammatic cross-section of Fig. 3 for adopting the second method for making of the present invention to make.
Fig. 4 evenly applies layer of transparent organic material 206 diagrammatic cross-sections for the one side that another plate base that adopts the second method for making of the present invention to prepare contains the aperture grating in described step S21.
Fig. 5 is for adopting the second method for making of the present invention to utilize silicon rubber negative norm plate to make transparent organic material microlens array diagrammatic cross-section.
The combination microlens array diagrammatic cross-section that be used for integration imaging 3D demonstration of Fig. 6 for adopting the second method for making of the present invention to make.
Embodiment
For making purpose of the present invention, technical scheme and advantage clearer, below will by specific embodiment and relevant drawings, the present invention be described in further detail.
The invention provides a kind of combination microlens array for integration imaging 3D demonstration, it is characterized in that, comprising:
One substrate;
One aperture grating is arranged at a surface of described substrate, and described aperture grating is opaque metal or a photoresist with the hollow out array of orifices; And
One microlens array is arranged at the one side that described substrate contains described aperture grating, described microlens array by with the array of orifices of described aperture grating one to one lens unit form, and described lens unit is arranged in the array of orifices of described correspondence.
The present invention also provides a kind of method for making of the combination microlens array that shows for integration imaging 3D, the first method for making concrete scheme that adopts is: the method for making that a kind of combination microlens array that shows for integration imaging 3D is provided, it is characterized in that, comprise following steps:
S11 a: substrate is provided and adopts photoetching, etching or serigraphy to make an aperture grating in surface thereof;
S12: the one side that is provided with described aperture grating at described substrate evenly applies the negative photoresist of layer of transparent;
S13: adopt back of the body Exposure mode, the one side that described aperture grating is not set from described substrate is exposed and is developed; The part that described photoresist is stopped by described aperture grating will be developed liquid and remove, and stay the photoresist column pattern array that is not stopped by described aperture grating;
S14: adopt the melting photoresist method to make described photoresist column pattern array fusing distortion, form the photoresist microlens array, thereby obtain described combination microlens array.
Described aperture grating is opaque metal or a photoresist with the hollow out array of orifices; Described microlens array by with the array of orifices of described aperture grating one to one lens unit form.
The second method for making concrete scheme that the present invention adopts is: a kind of method for making of the combination microlens array that shows for integration imaging 3D is provided, it is characterized in that, comprise following steps:
S21: two plate bases are provided and adopt photoetching, etching or serigraphy to make an aperture grating in surface thereof respectively;
S22: get a wherein plate base for preparing among the described step S21 and evenly apply layer of transparent in its one side that is provided with described aperture grating and bear photoresist;
S23: adopt back of the body Exposure mode, the one side that the substrate that contains the aperture grating for preparing from described step S22 is not provided with the aperture grating is exposed and is developed, the part that described photoresist is stopped by described aperture grating will be developed liquid and remove, and stay the photoresist column pattern array that is not stopped by described aperture grating;
S24: get the substrate that contains photoresist column pattern array for preparing among the described step S23, adopt the melting photoresist method to make described photoresist column pattern array fusing distortion, form the photoresist microlens array;
S25: get the substrate that contains the photoresist microlens array for preparing among the described step S24, and use silicon rubber to make the silicon rubber negative norm plate of described photoresist microlens array;
S26: utilize described silicon rubber negative norm plate, another sheet that adopts hot padding or ultraviolet stamping to prepare in described step S21 is provided with the substrate of aperture grating and makes a transparent organic material microlens array, thereby obtains described combination microlens array.
Described aperture grating is opaque metal or a photoresist with the hollow out array of orifices; Described microlens array by with the array of orifices of described aperture grating one to one lens unit form.
The concrete steps of described step S25 are:
S251: the potpourri for preparing monomer and crosslinking chemical in the required ratio of described silicon rubber;
S252: the described substrate that contains the photoresist microlens array is positioned in the container, pours described potpourri into and leave standstill;
S253: after described potpourri bubbles whole the elimination, this container is put into baking oven, solidify rear taking-up fully until described potpourri;
S254: described potpourri is separated with the described substrate that contains the photoresist microlens array, and cut described potpourri and form described silicon rubber negative norm plate.
The concrete steps of described step S26 are:
S261: described silicon rubber negative norm plate is positioned in the airtight container vacuumizes, make it have negative pressure;
S262: the one side that the substrate that another sheet for preparing in described step S21 is provided with the aperture grating contains described aperture grating evenly applies the layer of transparent organic material;
S263: be positioned over described silicon rubber negative norm plate with negative pressure on the described transparent organic material and alignd one by one with the aperture center of described aperture grating in its center, and described silicon rubber negative norm plate is contacted with described aperture grating;
S264: because described silicon rubber negative norm plate has negative pressure, described transparent organic material will form the transparent organic material microlens array corresponding with described silicon rubber negative norm plate under the acting in conjunction of negative pressure and capillary force;
S265: adopt cooling curing or ultra-violet curing that described transparent organic material microlens array is solidified;
S266: described silicon rubber negative norm plate is separated with described transparent organic material microlens array.
As shown in Figure 1, the present invention also provides a kind of combination microlens array for integration imaging 3D demonstration, it is characterized in that, comprising:
One substrate 1;
One aperture grating 2 is arranged at a surface of described substrate 1, and described aperture grating 2 is opaque metal or photoresists with the hollow out array of orifices; And
One microlens array 3 is arranged at the one side that described substrate 1 contains described aperture grating 2, described microlens array 3 by with the array of orifices of described aperture grating 2 one to one lens unit form, and described lens unit is arranged in the array of orifices of described correspondence.
Described substrate is clear glass, transparent organic material or transparent polymer material.Align one by one in the identical and equal and opposite in direction of the shape of the array of orifices of described aperture grating and the lens unit of described microlens array and center; Wherein microlens array is used for integration imaging 3D and shows micro unit Image Acquisition and reconstruct, the lightproof part of array of orifices for reducing or eliminate single microlens array because crosstalking of causing between the interference of lens gap transmitted light and the lens unit.Described array of orifices aperture and microlens array lens unit be shaped as circle or regular polygon, in the present invention not as limit.The thickness of described photoresist microlens array is determined by photoresist kind and coating thickness.
In the drawings, to amplify layer and regional thickness in order representing to know, but should not to be considered to strictly reflect the proportionate relationship of physical dimension as schematic diagram.Reference diagram is the schematic diagram of idealized embodiment of the present invention, and embodiment shown in the present should not be considered to only limit to the given shape in the zone shown in the figure, but comprises resulting shape (deviation that causes such as manufacturing).All represent with rectangle in the present embodiment, the expression among the figure is schematically, but this should not be considered to limit the scope of the invention.
In order to allow those skilled in the art better understand the present invention, preferably, substrate is selected glass substrate in the specific embodiment of the invention, the aperture grating is selected the Cr film, the silastic material that is used for making silicon rubber negative norm plate is selected the ratio column selection 10:1 of dimethyl silicone polymer (PDMS) and monomer whose and crosslinking chemical, be used for making the material selection SU8 3050 of photoresist microlens array, be used for making the material selection NOA81 of transparent organic material microlens array.
Embodiment one
Shown in Fig. 2 a-2d, Fig. 2 a-2d is for adopting the making flow process diagrammatic cross-section of the first method for making of the present invention, and microlens array is transparent photomask glue in the present embodiment, so adopt the first method for making, its concrete scheme may further comprise the steps:
S11:One substrate 101 is provided and adopts photoetching, etching or serigraphy to make an aperture grating 102 in surface thereof:
The glass substrate of choosing a required size carries out scribing and is placed on that (volume ratio is Win-10: DI water=3: 97) in the aqueous solution of glass cleaning solution Win-10, utilize frequency to be the ultrasonic machine cleaning 15min of 32KHz, behind the spray 2min, (volume ratio is Win-41: DI water=5: 95) to place the aqueous solution of glass cleaning solution Win-41 again, utilize frequency to be the ultrasonic machine cleaning 10min of 40KHz, behind circulation tap water spray rinsing 2min, the recycling frequency is that the ultrasonic machine of 28KHz cleans 10min in the DI pure water, through nitrogen gun dry up be placed in 50 ℃ of cleaning ovens for subsequent use more than the insulation 30min.
Take out the glass substrate 101 of above-mentioned preparation, one side utilizes magnetically controlled sputter method to prepare a layer thickness greater than the Cr film of 100nm therein, on the Cr film, evenly apply one deck photoresist RJZ304,110 ℃ of bakings formed the photoresist with aperture grating pattern through overexposure with after developing at the Cr film after 20 minutes; This glass substrate placed contains Ce(NH4) 2(NO3) 6 and the aqueous solution etching liquid of HClO4; metal part (the little bore portion of hollow out with aperture grating pattern photoresist that exposes; the little bore portion of hollow out is for circular in the present embodiment) be etched; the metal of being protected by photoresist stays; photoresist finally forms aperture grating 102 after cleaning.
S12:The one side that is provided with described aperture grating 102 at described substrate 101 evenly applies the negative photoresist 104 of layer of transparent:
Contain at the glass substrate 101 of step S11 preparation on the one side of aperture grating 102 and evenly apply 3050,65 ℃ of bakings of one deck photoresist SU8 2 minutes, 95 ℃ of bakings 5 minutes.
S13:Adopt back of the body Exposure mode, the one side that described aperture grating 102 is not set from described substrate 101 is exposed and is developed; The part that described photoresist is stopped by described aperture grating will be developed liquid and remove, and stay the photoresist column pattern array that is not stopped by described aperture grating:
Adopt back of the body Exposure mode, namely injecting ultraviolet light 105 from the surface that glass substrate 101 does not contain aperture grating 102 exposes, this moment, aperture grating 102 was as the exposure mask version, described photoresist is cleaned in development by SU8 3050 photoresists that aperture grating 102 lightproof parts block, only stay the photoresist column pattern array that is exposed, in the present embodiment, described photoresist column pattern matrix-like shape is cylindric, is the cylindric array 106 of photoresist.
S14:Adopt the melting photoresist method to make described photoresist column pattern array fusing distortion, form photoresist microlens array 103, thereby obtain described combination microlens array:
The cylindric array 106 of photoresist of step S13 preparation is carried out homogeneous heating, and the heating-up temperature scope generally (depends on photoresist and required lenticular radius-of-curvature) between 100 ℃ to 300 ℃.Preferably, the heating-up temperature that the present embodiment adopts is 150 ℃, and the cylindric array 106 melted by heat distortion of photoresist forms photoresist microlens array 103 after the cooling.At this moment, photoresist microlens array 103 and aperture grating 102 are combined on the same transparent glass substrate 101, form a kind of combination microlens array for integration imaging 3D demonstration of the present invention.
Embodiment two
When microlens array is not the photoresist material, can not adopt photolithographicallpatterned to prepare, adopt soft printing process this moment, the present embodiment adopts the second method for making, and its concrete scheme may further comprise the steps:
S21:Two plate bases are provided and adopt photoetching, etching or serigraphy to make an aperture grating in surface thereof respectively:
The glass substrate of choosing two required sizes carries out scribing and is placed on that (volume ratio is Win-10: DI water=3: 97) in the aqueous solution of glass cleaning solution Win-10, utilize frequency to be the ultrasonic machine cleaning 15min of 32KHz, behind the spray 2min, (volume ratio is Win-41: DI water=5: 95) to place the aqueous solution of glass cleaning solution Win-41 again, utilize frequency to be the ultrasonic machine cleaning 10min of 40KHz, behind circulation tap water spray rinsing 2min, the recycling frequency is that the ultrasonic machine of 28KHz cleans 10min in the DI pure water, through nitrogen gun dry up be placed in 50 ℃ of cleaning ovens for subsequent use more than the insulation 30min.
Take out two sheet glass substrates of above-mentioned preparation, utilize magnetically controlled sputter method to prepare a layer thickness greater than the Cr film of 100nm in the wherein one side of these two clean glass substrates respectively, and on the Cr film, evenly apply one deck photoresist RJZ304,110 ℃ of bakings are after 20 minutes, through overexposure be developed on the Cr film photoresist that formation has the aperture grating pattern; This two sheet glass substrate placed contains Ce(NH4) 2(NO3) 6 and the aqueous solution etching liquid of HClO4; metal part (the little bore portion of hollow out with aperture grating pattern photoresist that exposes; the little bore portion of hollow out is for circular in the present embodiment) be etched; the metal of being protected by photoresist stays; photoresist finally forms the aperture grating after cleaning.
S22:Get the wherein plate base for preparing among the described step S21 and evenly apply one deck photoresist in its one side that is provided with described aperture grating:
Get a wherein plate base for preparing among the described step S21 and evenly apply 3050,65 ℃ of the negative photoresist SU8 of layer of transparent in its one side that is provided with described aperture grating and toasted 2 minutes, 95 ℃ were toasted 5 minutes.
S23:Adopt back of the body Exposure mode, the one side that the substrate that contains the aperture grating for preparing from described step S22 is not provided with the aperture grating is exposed and is developed, the part that described photoresist is stopped by described aperture grating will be developed liquid and remove, and stay the photoresist column pattern array that is not stopped by described aperture grating:
Adopt back of the body Exposure mode, the one side that the substrate that contains the aperture grating for preparing from described step S22 does not contain the aperture grating is injected ultraviolet light and is exposed, this moment, the aperture grating was as the exposure mask version, SU8 3050 photoresists that blocked by aperture grating lightproof part are cleaned in development, only stay the photoresist column pattern array that is exposed, in the present embodiment, described photoresist column pattern matrix-like shape is cylindric, is the cylindric array of photoresist.
S24:Get the substrate that contains photoresist column pattern array for preparing among the described step S23, adopt the melting photoresist method to make described photoresist column pattern array fusing distortion, form the photoresist microlens array:
Get the substrate that contains photoresist column pattern array for preparing among the described step S23 and carry out homogeneous heating, the heating-up temperature scope generally (depends on photoresist and required lenticular radius-of-curvature) between 100 ℃ to 300 ℃.Preferably, the heating-up temperature that the present embodiment adopts is 150 ℃, and the cylindric array melted by heat distortion of photoresist forms the photoresist microlens array after the cooling.
S25:Get the substrate that contains the photoresist microlens array for preparing among the described step S24, and use silicon rubber to make the silicon rubber negative norm plate of described photoresist microlens array:
Getting the level and smooth base plate seals that contains the photoresist microlens array for preparing among the described step S24 places in the container that trimethyl chlorosilane molecule (TMCS) is housed, place approximately and take out after 5 minutes, this moment, this photoresist microlens array surface self-organization one deck TMCS was used for antiseized.The potpourri for preparing monomer and crosslinking chemical in the required ratio of described silicon rubber, the ratio row of namely pressing monomer and crosslinking chemical 10:1 configure dimethyl silicone polymer (PDMS) potpourri, are stirred to even mixing.The level and smooth substrate that contains the photoresist microlens array of above-mentioned self assembly one deck TMCS is placed horizontally in the container, pour dimethyl silicone polymer (PDMS) potpourri into, leaving standstill approximately extremely bubbled in 30 minutes all eliminates, this container was put into 80 ℃ of baking ovens more than two hours, solidify rear taking-up fully until PDMS, PDMS is separated with this photoresist microlens array, and cutting PDMS forms the silicon rubber negative norm plate 204 of photoresist microlens array.
S26:Utilize described silicon rubber negative norm plate, another sheet that adopts hot padding or ultraviolet stamping to prepare in described step S21 is provided with the substrate of aperture grating and makes a transparent organic material microlens array, thereby obtains described combination microlens array:
Preferably, the present embodiment selects NOA81 as the material of transparent organic material microlens array, at first, silicon rubber negative norm plate 204 sealings that step S25 is made place in the container that trimethyl chlorosilane molecule (TMCS) is housed, place approximately and take out after 5 minutes, this moment, silicon rubber negative norm plate 204 surface self-organization one deck TMCS were used for antiseized.Then this silicon rubber negative norm plate 204 is positioned in the airtight container and vacuumizes, because silastic material is porosint, the method is so that this silicon rubber negative norm plate 204 has negative pressure.Next the one side that the substrate 201 that another piece of step S21 being made contains the aperture grating contains aperture grating 202 evenly applies layer of transparent organic material 206(NOA81), silicon rubber negative norm plate 204 alignment with negative pressure are positioned on the NOA81, and are alignd one by one with the aperture center of aperture grating 202 in the center of silicon rubber negative norm plate 204; And the outstanding part of described silicon rubber negative norm plate is directly contacted with described aperture grating opaque section, thereby make transparent organic material NOA81 in the array of orifices of the recess of described silicon rubber film coated plate and described aperture grating, form lens unit.Because silicon rubber negative norm plate 204 has negative pressure, flow-like NOA81 will form under the acting in conjunction of negative pressure and capillary force and silicon rubber negative norm plate 204 corresponding transparent organic material microlens arrays 203, after ultraviolet light 205 exposures were greater than 100 seconds, flow-like NOA81 solidified.Silicon rubber negative norm plate 204 is separated with the described substrate 201 that contains the aperture grating, described transparent organic material microlens array 203 and described aperture grating 202 are combined on the same substrate 201, form a kind of combination microlens array for integration imaging 3D demonstration of the present invention.
Above-listed preferred embodiment; the purpose, technical solutions and advantages of the present invention are further described; institute is understood that; the above only is preferred embodiment of the present invention; not in order to limit the present invention; within the spirit and principles in the present invention all, any modification of doing, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. one kind is used for the combination microlens array that integration imaging 3D shows, it is characterized in that, comprising:
One substrate;
One aperture grating is arranged at a surface of described substrate, and described aperture grating is opaque metal or a photoresist with the hollow out array of orifices; And
One microlens array is arranged at the one side that described substrate contains described aperture grating, described microlens array by with the array of orifices of described aperture grating one to one lens unit form, and described lens unit is arranged in the array of orifices of described correspondence.
2. the combination microlens array that shows for integration imaging 3D according to claim 1, it is characterized in that: described substrate is clear glass, transparent organic material or transparent polymer material.
3. the combination microlens array that shows for integration imaging 3D according to claim 1 is characterized in that: the shape of described array of orifices aperture and microlens array lens unit is consistent, equal and opposite in direction, and aligns one by one in the center; Wherein microlens array is used for integration imaging 3D and shows micro unit Image Acquisition and reconstruct, the lightproof part of array of orifices for reducing or eliminate single microlens array because the picture crosstalk that causes between the interference of lenticule unit gap transmitted light and the lenticule unit.
4. the combination microlens array that shows for integration imaging 3D according to claim 1 is characterized in that: described array of orifices aperture and microlens array lens unit be shaped as circle or regular polygon.
5. a method for making that is used for the combination microlens array of integration imaging 3D demonstration is characterized in that, comprises following steps:
S11 a: substrate is provided and adopts photoetching, etching or serigraphy to make an aperture grating in surface thereof;
S12: the one side that is provided with described aperture grating at described substrate evenly applies the negative photoresist of layer of transparent;
S13: adopt back of the body Exposure mode, the one side that described aperture grating is not set from described substrate is exposed and is developed; The part that described photoresist is stopped by described aperture grating will be developed liquid and remove, and stay the photoresist column pattern array that is not stopped by described aperture grating;
S14: adopt the melting photoresist method to make described photoresist column pattern array fusing distortion, form the photoresist microlens array, thereby obtain described combination microlens array.
6. the method for making of the combination microlens array that shows for integration imaging 3D according to claim 5, it is characterized in that: described aperture grating is opaque metal or a photoresist with the hollow out array of orifices; Described microlens array by with the array of orifices of described aperture grating one to one lens unit form.
7. a method for making that is used for the combination microlens array of integration imaging 3D demonstration is characterized in that, comprises following steps:
S21: two plate bases are provided and adopt photoetching, etching or serigraphy to make an aperture grating in surface thereof respectively;
S22: get a wherein plate base for preparing among the described step S21 and evenly apply layer of transparent in its one side that is provided with described aperture grating and bear photoresist;
S23: adopt back of the body Exposure mode, the one side that the substrate that contains the aperture grating for preparing from described step S22 is not provided with the aperture grating is exposed and is developed, the part that described photoresist is stopped by described aperture grating will be developed liquid and remove, and stay the photoresist column pattern array that is not stopped by described aperture grating;
S24: get the substrate that contains photoresist column pattern array for preparing among the described step S23, adopt the melting photoresist method to make described photoresist column pattern array fusing distortion, form the photoresist microlens array;
S25: get the substrate that contains the photoresist microlens array for preparing among the described step S24, and use silicon rubber to make the silicon rubber negative norm plate of described photoresist microlens array;
S26: utilize described silicon rubber negative norm plate, another sheet that adopts hot padding or ultraviolet stamping to prepare in described step S21 is provided with the substrate of aperture grating and makes a transparent organic material microlens array, thereby obtains described combination microlens array.
8. the method for making of the combination microlens array that shows for integration imaging 3D according to claim 7, it is characterized in that: described aperture grating is opaque metal or a photoresist with the hollow out array of orifices; Described microlens array by with the array of orifices of described aperture grating one to one lens unit form.
9. the method for making of the combination microlens array that shows for integration imaging 3D according to claim 7, it is characterized in that: the concrete steps of described step S25 are:
S251: the potpourri for preparing monomer and crosslinking chemical in the required ratio of described silicon rubber;
S252: the described substrate that contains the photoresist microlens array is positioned in the container, pours described potpourri into and leave standstill;
S253: after described potpourri bubbles whole the elimination, this container is put into baking oven, solidify rear taking-up fully until described potpourri;
S254: described potpourri is separated with the described substrate that contains the photoresist microlens array, and cut described potpourri and form described silicon rubber negative norm plate.
10. the method for making of the combination microlens array that shows for integration imaging 3D according to claim 7, it is characterized in that: the concrete steps of described step S26 are:
S261: described silicon rubber negative norm plate is positioned in the airtight container vacuumizes, make it have negative pressure;
S262: the one side that the substrate that another sheet for preparing in described step S21 is provided with the aperture grating contains described aperture grating evenly applies the layer of transparent organic material;
S263: be positioned over described silicon rubber negative norm plate with negative pressure on the described transparent organic material and alignd one by one with the aperture center of described aperture grating in its center, and described silicon rubber negative norm plate is contacted with described aperture grating;
S264: because described silicon rubber negative norm plate has negative pressure, described transparent organic material will form the transparent organic material microlens array corresponding with described silicon rubber negative norm plate under the acting in conjunction of negative pressure and capillary force;
S265: adopt the mode of cooling curing or ultra-violet curing that described transparent organic material microlens array is solidified;
S266: described silicon rubber negative norm plate is separated with described transparent organic material microlens array.
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