CN103044977B - 可形成亲水自清洁减反射膜涂料的制备方法 - Google Patents
可形成亲水自清洁减反射膜涂料的制备方法 Download PDFInfo
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- CN103044977B CN103044977B CN201210411603.1A CN201210411603A CN103044977B CN 103044977 B CN103044977 B CN 103044977B CN 201210411603 A CN201210411603 A CN 201210411603A CN 103044977 B CN103044977 B CN 103044977B
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- preparation
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- automatically cleaning
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- 238000004140 cleaning Methods 0.000 title claims abstract description 35
- 238000000576 coating method Methods 0.000 title claims abstract description 30
- 239000011248 coating agent Substances 0.000 title claims abstract description 29
- 238000002360 preparation method Methods 0.000 title claims abstract description 22
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 22
- 235000011114 ammonium hydroxide Nutrition 0.000 claims abstract description 21
- 238000000034 method Methods 0.000 claims abstract description 20
- 239000000243 solution Substances 0.000 claims abstract description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 16
- 239000010703 silicon Substances 0.000 claims abstract description 16
- 238000006243 chemical reaction Methods 0.000 claims abstract description 15
- 239000008367 deionised water Substances 0.000 claims abstract description 15
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 15
- 238000010438 heat treatment Methods 0.000 claims abstract description 10
- 239000011259 mixed solution Substances 0.000 claims abstract description 9
- 238000002156 mixing Methods 0.000 claims abstract description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 27
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 18
- 239000006117 anti-reflective coating Substances 0.000 claims description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 9
- 229910021529 ammonia Inorganic materials 0.000 claims description 9
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 6
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical class CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 2
- XXZNHVPIQYYRCG-UHFFFAOYSA-N trihydroxy(propoxy)silane Chemical compound CCCO[Si](O)(O)O XXZNHVPIQYYRCG-UHFFFAOYSA-N 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 abstract description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 2
- 239000002086 nanomaterial Substances 0.000 abstract description 2
- 239000002245 particle Substances 0.000 abstract description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 abstract 1
- 230000035699 permeability Effects 0.000 abstract 1
- 229960000935 dehydrated alcohol Drugs 0.000 description 18
- 239000011521 glass Substances 0.000 description 14
- 239000007788 liquid Substances 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 238000007711 solidification Methods 0.000 description 6
- 230000008023 solidification Effects 0.000 description 6
- 238000009396 hybridization Methods 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 230000032683 aging Effects 0.000 description 4
- 229960004756 ethanol Drugs 0.000 description 4
- 230000002209 hydrophobic effect Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000009718 spray deposition Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- FFMLWBWXEBXCQB-UHFFFAOYSA-N FCCO[Si](OCC)(OCC)CCCCCCCC Chemical class FCCO[Si](OCC)(OCC)CCCCCCCC FFMLWBWXEBXCQB-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- -1 catalyzer Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000005543 nano-size silicon particle Substances 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Surface Treatment Of Glass (AREA)
- Silicon Compounds (AREA)
Abstract
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CN201210411603.1A CN103044977B (zh) | 2012-10-24 | 2012-10-24 | 可形成亲水自清洁减反射膜涂料的制备方法 |
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CN201210411603.1A CN103044977B (zh) | 2012-10-24 | 2012-10-24 | 可形成亲水自清洁减反射膜涂料的制备方法 |
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CN103044977A CN103044977A (zh) | 2013-04-17 |
CN103044977B true CN103044977B (zh) | 2015-04-22 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103756395A (zh) * | 2014-01-22 | 2014-04-30 | 上海赛肯森材料科技有限公司 | 用于减反射涂料组合物的纳米杂化粒子及其制备方法和用途 |
CN104448372A (zh) * | 2014-11-18 | 2015-03-25 | 常熟市天娇塑业有限公司 | 一种纳米二氧化硅聚乙烯薄膜的制备方法 |
CN106497196A (zh) * | 2016-10-07 | 2017-03-15 | 常州创索新材料科技有限公司 | 一种高强度自清洁汽车材料的制备方法 |
CN106634607A (zh) * | 2016-11-08 | 2017-05-10 | 苏州蓝锐纳米科技有限公司 | 一种纳米二氧化硅增透液及其制备方法 |
CN106519971A (zh) * | 2016-11-22 | 2017-03-22 | 徐煜 | 亲水性硅质镀膜液及镀膜方法 |
CN108947265B (zh) * | 2018-06-28 | 2021-06-01 | 广东南亮艺术玻璃科技股份有限公司 | 一种玻璃自洁液和自洁玻璃及其制备方法 |
CN109779107A (zh) * | 2019-03-08 | 2019-05-21 | 广东中煌建筑工程有限公司 | 节能玻璃幕墙 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102199371A (zh) * | 2011-04-06 | 2011-09-28 | 重庆大学 | 一种光致超亲水自清洁涂料的制备方法 |
CN102485807A (zh) * | 2010-12-01 | 2012-06-06 | 常熟卓辉光电科技有限公司 | 一种降低玻璃表面光反射的涂覆材料 |
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- 2012-10-24 CN CN201210411603.1A patent/CN103044977B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102485807A (zh) * | 2010-12-01 | 2012-06-06 | 常熟卓辉光电科技有限公司 | 一种降低玻璃表面光反射的涂覆材料 |
CN102199371A (zh) * | 2011-04-06 | 2011-09-28 | 重庆大学 | 一种光致超亲水自清洁涂料的制备方法 |
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Application publication date: 20130417 Assignee: XI'AN JUNSHENG NEW MATERIAL TECHNOLOGY Co.,Ltd. Assignor: XI'AN INSTITUTE OF OPTICS AND PRECISION MECHANICSOF CAS Contract record no.: 2014610000125 Denomination of invention: Preparation method of coating capable of forming hydrophilic self-cleaning antireflection film License type: Exclusive License Record date: 20140901 |
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