CN103031532B - Atomic layer deposition equipment with high safety - Google Patents
Atomic layer deposition equipment with high safety Download PDFInfo
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- CN103031532B CN103031532B CN201110300052.7A CN201110300052A CN103031532B CN 103031532 B CN103031532 B CN 103031532B CN 201110300052 A CN201110300052 A CN 201110300052A CN 103031532 B CN103031532 B CN 103031532B
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Abstract
The invention relates to semiconductor process equipment, in particular to atomic layer deposition equipment with high safety. The atomic layer deposition equipment comprises a vacuum component, a heating component, an air passage component, a plasma generating component and a control component, wherein the control component comprises a touch screen, an industrial computer and a data processing module; the touch screen is connected with the industrial computer; the industrial computer is connected with the data processing module; and the data processing module is connected with the vacuum component, the heating component, the air passage component and the plasma generating component respectively. The touch screen, the industrial computer and the data processing module are taken as control devices for replacing a computer, so that the entire equipment is simple and clear in structure and is convenient to assemble, produce and maintain, and damage of sudden accidents to the equipment can be prevented effectively.
Description
Technical field
The present invention relates to a kind of semiconductor manufacturing equipment, especially relate to a kind of atomic layer deposition apparatus high based on the security of industrial computer and touch-screen.
Background technology
Traditional atomic layer deposition apparatus comprises vacuum component, heater block, gas path component, plasma-generating component and function unit, is interconnected, realizes the transmission and reception of data command between function unit and other each parts.But, function unit many employings computer of atomic layer deposition apparatus realizes, and computer needs and all parts is contacted directly, and provides adapter according to the input/output interface of each parts, then the mutual of data command is completed according to certain communication protocol, as shown in Figure 1.
But, the control texture of existing atomic layer deposition apparatus adopts multiple data transmission interface and device, computer needs coordinate and dispatch multiple device, need to adopt special port to connect these devices, and the connectivity port that general computer provides is often inadequate, thus need external circuits for the data exchange between computer and vacuum component, heater block, gas path component, plasma-generating component, this becomes huge with regard to causing the volume of control device, is unfavorable for producing and encapsulation.In addition, staff needs to be operated atomic layer deposition apparatus by computer, and thus computer can not be encapsulated, and must be exposed to the outside of atomic layer deposition apparatus, and is not easy to fix.In atomic layer deposition apparatus operational process, likely due to some improper activities (as collision etc.), cause computer surprisingly to shut down, thus make atomic layer deposition apparatus run unsuccessfully, and can damage equipment.In order to avoid this accidental damage as far as possible, need to redesign control device.
Summary of the invention
The object of the present invention is to provide the atomic layer deposition apparatus that a kind of security is high, described device structure simple and clear, be convenient to assembling, produce and safeguard, can effectively prevent mishap to the damage of equipment.
In order to achieve the above object, the technical solution used in the present invention is:
The atomic layer deposition apparatus that security is high, comprises vacuum component, heater block, gas path component, plasma-generating component and function unit; Described function unit comprises touch-screen, industrial computer and data processing module; Described touch-screen is connected with described industrial computer, and described industrial computer is connected with described data processing module, and described data processing module is connected with described vacuum component, heater block, gas path component, plasma-generating component respectively;
Wherein, described touch-screen, for indicating system operation interface, receives external command, the operating parameter of each parts of display equipment; Described industrial computer, for sending operating instruction and data to data processing module and controlling other parts of equipment, and receives director data from data processing module, analyzes the director data received; Described data processing module, processes for the data sent described vacuum component, heater block, gas path component, plasma-generating component.
In such scheme, the temperature controller in described heater block is connected with described data processing module by RS232 serial ports.
In such scheme, the pressure transmitter in described vacuum component is connected with described data processing module respectively by RS232 with RS485 serial ports with vacuumometer.
In such scheme, described data processing module is connected with the electric current and voltage amplification module in described vacuum component, and described electric current and voltage amplification module is connected with rly., and described rly. lower end is pump group power supply.
In such scheme, described data processing module is connected with the radio-frequency power supply in described plasma-generating component.
In such scheme, described data processing module is connected with the mass flow controller in described gas path component and each magnetic valve.
Compared with prior art, the beneficial effect that the technical solution used in the present invention produces is as follows:
The present invention replaces computer as control device by adopting touch-screen, industrial computer and data processing module, and make whole device structure simple and clear, be convenient to assembling, produce and safeguard, security is high, can effectively prevent mishap to the damage of equipment.
Accompanying drawing explanation
Fig. 1 is the functional block diagram of sublayer, prior art Central Plains depositing device;
The functional block diagram of the atomic layer deposition apparatus that Fig. 2 provides for the embodiment of the present invention;
The structure iron of the atomic layer deposition apparatus that Fig. 3 provides for the embodiment of the present invention.
Embodiment
Below in conjunction with drawings and Examples, technical solution of the present invention is described in detail.
As shown in Figure 2, the atomic layer deposition apparatus that the embodiment of the present invention provides a kind of security high, comprises vacuum component, heater block, gas path component, plasma-generating component and function unit; Function unit comprises touch-screen 32, industrial computer 25 and data processing module 26, touch-screen 32 is connected with industrial computer 25, industrial computer 25 is connected with data processing module 26, and data processing module 26 is connected with vacuum component, heater block, gas path component, plasma-generating component respectively.Wherein, touch-screen 32, for indicating system operation interface, receives external command, the operating parameter of each parts of display equipment; Industrial computer 25, for sending operating instruction and data to data processing module and controlling other parts of equipment, and receives director data from data processing module, analyzes the director data received; Data processing module 26, processes for the data sent vacuum component, heater block, gas path component, plasma-generating component;
The present invention adopts touch-screen and industrial computer to replace computer as control device, and adds data processing module for processing data real-time, alleviates the computing pressure of industrial computer, improves equipment travelling speed.
Unique passage that touch-screen contacts as user of service general in atomic layer deposition apparatus and atomic layer deposition apparatus; atomic layer deposition apparatus and the external world are well isolated; the security of equipment self have also been obtained very big protection; and have the important parameter instruction etc. of the prompting of corresponding operation steps, equipment running process display, device element, all make to operate this equipment simply clear.By using the digital keyboard provided, user of service carries out initial setting to the parameter of device element, the interact of realization and this equipment.
Industrial computer is as the control device in atomic layer deposition apparatus, the control axis of whole atomic layer deposition apparatus, red-tape operati is carried out to the vacuum device of atomic layer deposition apparatus, heater element, gas circuit device, plasma generating device, information interchange between operating device all parts and analyzing and processing is carried out to these information, it is the dispatching center of whole equipment, be responsible for the request of instruction analysis and transmission in equipment, reception and other parts of process, realize controlling functions, guarantee equipment well runs.
Data processing module is as the data processing centre (DPC) in atomic layer deposition apparatus, the data that the responsible vacuum component to atomic shell equipment, heater block, gas path component, plasma-generating component send process, concrete data processor is have cured in data processing module, by analyzing the request of all parts, enable corresponding handling procedure, real-time return result.Data processing module is except carrying out data processing, also can be used as the vacuum component of atomic shell equipment, heater block, gas path component, the passage that exchanges between plasma-generating component and computer, data processing module directly can send the request not relating to data processing in these four parts to industrial computer, and response results is sent to other parts by data processing module by industrial computer.Data processing module has shared the computing pressure of industrial computer, allows atomic layer deposition apparatus stablize and works fast, meet the processing speed required by deposition growing of film (or thin layer).
As shown in Figure 3, touch-screen 32 in the present invention is for indicating system operation interface, reception external command, the operating parameter of each parts of display equipment, industrial computer 25 sends operating instruction and data to data processing module 26 and controls other parts of atomic layer deposition apparatus, and receive director data from data processing module 26, the director data received is analyzed, coordinates and control whole atomic layer deposition apparatus and operate in normal operating conditions.Temperature controller 24 in heater block is connected with data processing module 26 by RS232 serial ports, pressure transmitter in vacuum component is connected with data processing module 26 respectively by RS232 with RS485 serial ports with vacuumometer 27, data processing module 26 exchanges treatment channel as radio-frequency power supply 16, mass flow controller 1, mass flow controller 23, electric current and voltage amplification module 29 with the data message of data processing module 26, make whole function unit clear in structure, be convenient to produce and encapsulation.Data processing module 26 is connected with electric current and voltage amplification module 29, and electric current and voltage amplification module 29 is connected with rly. 28, and rly. 28 lower end is pump group power supply 22.Data processing module 26 is connected with magnetic valve 2 to the magnetic valve 9 in gas path component.Industrial computer 25 can be encapsulated in atomic layer deposition apparatus completely, and touch-screen 32 can in embedded equipment, and such equipment just can accomplish complete package, the infringement that the accident that effectively prevents an accident causes equipment.
When using of the present invention, first start industrial computer 25, enter atomic layer deposition apparatus Controlling System interface, this interface comprises atomic layer deposition apparatus operation instruction file, the skeleton construction schematic diagram of system, the operational process of animation display atomic layer deposition apparatus, atomic layer deposition apparatus master routine, carries out setting and display in real time by the controling parameters of touch-screen 32 pairs of equipment.After optimum configurations, operating device is completed following operation by industrial computer 25:
(1) industrial computer 25 sends open command by data processing module 26, supply current amplification module 29 output HIGH voltage, the connection of relay 28, and then opens control pump group power supply 22, starts mechanical pump 21 and molecular pump 20.Data processing module 26 is connected with magnetic valve 2 to the magnetic valve 9 in gas path component, being to regulate gas path on-off to the control of magnetic valve 2 to magnetic valve 5, is the break-make in order to regulate bottle 10 to source, the source bottle 13 in gas path component to the control of magnetic valve 6 to magnetic valve 9 respectively.The instruction of industrial computer 25, data are sent in mass flow controller and magnetic valve by data processing module 26, open manually-operated gate 14 and manually-operated gate 15, bleed to sediment chamber 19 and pipeline, take out base vacuum (about to 5 × 10
-4torr); The temperature information that data processing module 26 pairs of temperature controllers 24, thermopairs provide carries out analyzing and processing, result is returned to industrial computer 25, industrial computer 25 monitors the temperature of heating plate, source bottle, pipeline, chamber wall, determine that each parts to be heated continue heating or stop heating, make them be operated in the state of temperature of setting, complete the control to gas path component, heater block.
(2) under meter size is set by touch-screen 32, industrial computer 25 preserves this value, open mass flow controller 1, mass flow controller 23, magnetic valve 2, magnetic valve 3, gas 30, gas 31 will enter gas circuit, inflate gas path component, industrial computer 25 pairs of system pressures are monitored, in real time when system reaches required operating pressure, close above-mentioned mass flow controller and magnetic valve, stop inflation.
(3) parameter required for deposition work is set, industrial computer 25 is by the order of parameter access control, be sent to data processing module 26, data processing module 26 is as information channel, the instruction of industrial computer 25 is sent in the receiving-member of radio-frequency power supply 16, control the unlatching of radio-frequency power supply 16 and the setting to output rating, meanwhile, radio-frequency power supply matching box 17 ensures that radio-frequency power supply 16 provides stable power for plasma production system 18.The output rating of radio-frequency power supply 16 feeds back to industrial computer 25 as the quantities received of data processing module 26, industrial computer 25 is analyzed this power, to make the plasma production system 18 in plasma-generating component be operated in stable state, thus complete the control of plasma production part and deposit.
(4) after deposition terminates, industrial computer 25 controls n the cycle of whole equipment dry running, carries out purging purification, sends instruction, open magnetic valve 5 to magnetic valve 9, open bottle 10 to source, source bottle 13, purify sediment chamber 19 atomic layer deposition apparatus.
(5), after purging terminates, bolt down procedure, completes whole work of ald.
The present invention replaces computer as control device by adopting touch-screen, industrial computer and data processing module, makes whole device structure simple and clear, is convenient to assembling, produce and safeguard.The present invention, when carrying out ald, can guarantee the operation that atomic layer deposition apparatus is reliable and stable, can effectively prevention apparatus can cause under improper operation performance damage, arithmetic speed also can meet the demand of sedimentation experiment.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for a person skilled in the art, the present invention can have various modifications and variations.Within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (6)
1. the atomic layer deposition apparatus that security is high, comprises vacuum component, heater block, gas path component, plasma-generating component and function unit, it is characterized in that: described function unit comprises touch-screen, industrial computer and data processing module; Described touch-screen is connected with described industrial computer, and described industrial computer is connected with described data processing module, and described data processing module is connected with described vacuum component, heater block, gas path component, plasma-generating component respectively;
Wherein, described touch-screen, for indicating system operation interface, receives external command, the operating parameter of each parts of display equipment;
Described industrial computer, for sending operating instruction and data to data processing module and controlling other parts of equipment, and receives director data from data processing module, analyzes the director data received;
Described data processing module, processes for the data sent described vacuum component, heater block, gas path component, plasma-generating component.
2. the atomic layer deposition apparatus that security as claimed in claim 1 is high, is characterized in that: the temperature controller in described heater block is connected with described data processing module by RS232 serial ports.
3. the atomic layer deposition apparatus that security as claimed in claim 1 is high, is characterized in that: the pressure transmitter in described vacuum component is connected with described data processing module respectively by RS232 with RS485 serial ports with vacuumometer.
4. the atomic layer deposition apparatus that security as claimed in claim 1 is high, it is characterized in that: described data processing module is connected with the electric current and voltage amplification module in described vacuum component, described electric current and voltage amplification module is connected with rly., and described rly. lower end is pump group power supply.
5. the atomic layer deposition apparatus that security as claimed in claim 1 is high, is characterized in that: described data processing module is connected with the radio-frequency power supply in described plasma-generating component.
6. the atomic layer deposition apparatus that security as claimed in claim 1 is high, is characterized in that: described data processing module is connected with the mass flow controller in described gas path component and each magnetic valve.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201110300052.7A CN103031532B (en) | 2011-09-29 | 2011-09-29 | Atomic layer deposition equipment with high safety |
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| CN201110300052.7A CN103031532B (en) | 2011-09-29 | 2011-09-29 | Atomic layer deposition equipment with high safety |
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| CN103031532A CN103031532A (en) | 2013-04-10 |
| CN103031532B true CN103031532B (en) | 2015-02-04 |
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| CN107841730B (en) * | 2017-11-23 | 2019-09-13 | 滁州国凯电子科技有限公司 | A method of extending ALD vacuum meter service life |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102127756A (en) * | 2011-02-21 | 2011-07-20 | 东华大学 | Device and method for enhancing atomic layer deposition by pulse-modulation radio frequency plasma |
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102127756A (en) * | 2011-02-21 | 2011-07-20 | 东华大学 | Device and method for enhancing atomic layer deposition by pulse-modulation radio frequency plasma |
Non-Patent Citations (3)
| Title |
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| "PLC和触摸屏在控制系统中的应用";崔剑平 等;《机械工程与自动化》;20070831(第4期);第160-161页 * |
| "PLC和触摸屏组合控制系统的应用";吕品;《自动化仪表》;20100831;第31卷(第8期);第45-47,51页 * |
| "原子层沉积系统设计的研究";叶位彬 等;《真空科学与技术学报》;20110228;第31卷(第1期);第58页左栏，图1 * |
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