CN203855644U - Control system for plasma enhanced chemical vapor deposition - Google Patents
Control system for plasma enhanced chemical vapor deposition Download PDFInfo
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- CN203855644U CN203855644U CN201320817918.6U CN201320817918U CN203855644U CN 203855644 U CN203855644 U CN 203855644U CN 201320817918 U CN201320817918 U CN 201320817918U CN 203855644 U CN203855644 U CN 203855644U
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Abstract
The embodiment of the utility model discloses control system of plasma enhanced chemical vapor deposition, include: the system comprises a first monitoring equipment group for remote monitoring and data record inquiry, a second monitoring equipment group for data processing and parameter configuration, an Ethernet switch, a first control equipment group for controlling process operation and a second control equipment group for executing process operation; the first monitoring equipment group and the second monitoring equipment group are respectively connected with the first control equipment group through an Ethernet switch, and the first control equipment group is connected with the second control equipment group; the second set of control devices includes a loading chamber for sample transfer and a reaction chamber for process operations. Adopt the utility model discloses, can satisfy real time monitoring technology operation engineering, carry out big data processing.
Description
Technical field
The utility model relates to industrial computer control techniques field, relates in particular to a kind of Controlling System of plasma enhanced chemical vapor deposition.
Background technology
Plasma enhanced chemical vapor deposition method (Plama Enhanced Chemical Vapor Deposition, PECVD) be one of method the most frequently used in vacuum-treat technology, development along with microelectronic processing technology technology in super large-scale integration and high-quality thin film technology, the processing parameter of PECVD is many and complicated, is badly in need of a kind of Controlling System of equipment and process parameter being carried out to strict control.
In prior art, the master modes that adopt touch-screen and standard programmable logic controller more, realization is to the monitoring of equipment and operation, yet to meeting the requirement to the monitoring in real time of multiple parameter and large data processing, the while also cannot meet the requirement that equipment advanced security is controlled.
Utility model content
The utility model embodiment technical problem to be solved is, a kind of Controlling System of plasma enhanced chemical vapor deposition is provided, and can meet real-time monitoring process process, carries out large data processing, and improves the level of security of device control.
In order to solve the problems of the technologies described above, the utility model embodiment provides a kind of Controlling System of plasma enhanced chemical vapor deposition, comprising:
For the first watch-dog group of remote monitoring and data logging inquiry, the second watch-dog group for data processing and parameter configuration, Ethernet switch, for controlling the first operating device group of technological operation and for carrying out the second operating device group of technological operation;
Described the first watch-dog group and described the second watch-dog group by Ethernet switch, are connected with described the first operating device group respectively, and described the first operating device group is connected with described the second operating device group;
Wherein, described the first operating device group comprises programmable logic controller group, distributed input/output port group and smart machine group; The second operating device group comprises for the load chamber of sample transmission with for the reaction chamber of technological operation.
Wherein, described the first watch-dog group comprises for the first computer of remote monitoring and red tape operation with for the second computer of long range data record queries.
Wherein, described the second watch-dog group comprises the 3rd computer for local data processing, time variable control and parameter configuration, and for the 4th computer of recording process data and historical query.
Wherein, also comprise:
Described the first watch-dog group, by Ethernet or wireless Wifi mode, is connected with described the second watch-dog group.
Wherein, described distributed input/output port group comprises standard input output port and the safe input/output port with safety performance.
Wherein, described programmable logic controller group comprises:
The main website programmable logic controller of controlling for data gathering and the output signal of described smart machine group, described standard input output port and described safe input/output port;
The slave station programmable logic controller that is used for the data acquisition control of standard input output port and described smart machine group;
The safe programmable controller of controlling for signals collecting and the output signal of described safe input/output port.
Wherein, also comprise:
Described standard input output port is connected with described slave station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode;
Described safe input/output port is by safe open field bus Safetybus
pmode is connected with described safe programmable controller;
Described safe programmable controller is connected with described main website programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode.
Wherein, described smart machine comprises temperature controller, technique power supply, the first vacuum pump, the second vacuum pump, the first servo controller, the second servo controller and vacuum gauge.
Wherein, also comprise:
The described temperature controller that adds thermal control for described reaction chamber, is connected with described slave station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode;
For controlling the described technique power supply of plasma generation, by Process FieldbusROFIBUS standard P rofibus-DP mode, be connected with described slave station programmable logic controller;
Be used to described the first vacuum pump that described load chamber provides vacuum to be connected with described main website programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode;
Be used to described reaction chamber to provide described second vacuum pump of vacuum to be connected with described slave station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode;
Described the first servo controller is connected with described master-salve station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode with described the second servo controller, wherein, the first servo controller for Quality control transmission is installed on described load chamber, for described second servo controller of Quality control lifting action, is installed on described reaction chamber;
The described vacuum gauge of controlling for described chamber pressure is connected with described slave station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode;
Wherein, described technique power supply is radio-frequency power supply, intermediate frequency power supply or direct supply.
Wherein, described the first vacuum pump and described the second vacuum pump are any or its combination in dry pump, molecular pump and cryopump.
Implement the utility model embodiment, there is following beneficial effect:
The utility model embodiment is the monitoring to described technological operation module by described monitoring module, and described control module is by gathering the state of described technological operation module and sending corresponding technological operation order, can realize intelligent monitoring, control in real time, reliable and stable carries out art breading to sample.
Accompanying drawing explanation
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is only embodiment more of the present utility model, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the Controlling System structure iron of a kind of plasma enhanced chemical vapor deposition of the utility model embodiment;
Fig. 2 is the Controlling System structure iron of the another kind of plasma enhanced chemical vapor deposition of the utility model embodiment;
Fig. 3 is the concrete composition diagram of the first watch-dog group in Fig. 1;
Fig. 4 is the concrete composition diagram of the second watch-dog group in Fig. 1;
Fig. 5 is the concrete composition diagram of distributed input/output port group in Fig. 1;
Fig. 6 is the concrete composition diagram of programmable logic controller group in Fig. 1;
Fig. 7 is the concrete composition diagram of smart machine group in Fig. 1;
Fig. 8 is the concrete structure figure of Controlling System of a kind of plasma enhanced chemical vapor deposition of the utility model embodiment;
Fig. 9 is the control method schema of a kind of plasma enhanced chemical vapor deposition of the utility model embodiment.
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the utility model embodiment is clearly and completely described, obviously, described embodiment is only the utility model part embodiment, rather than whole embodiment.Embodiment based in the utility model, those of ordinary skills are not making the every other embodiment obtaining under creative work prerequisite, all belong to the scope of the utility model protection.
Embodiment mono-:
Referring to Fig. 1, is the Controlling System structure iron of a kind of plasma enhanced chemical vapor deposition of the utility model embodiment, and wherein, described system comprises:
For the first watch-dog group 1 of remote monitoring and data logging inquiry, the second watch-dog group 2 for data processing and parameter configuration, Ethernet switch 3, for controlling the first operating device group 4 of technological operation and for carrying out the second operating device group 5 of technological operation;
Described the first watch-dog group 1 and described the second watch-dog group 2 by Ethernet switch 3, are connected with described the first operating device group 4 respectively, and described the first operating device group 4 is connected with described the second operating device group 5;
Wherein, described the first operating device group 4 comprises programmable logic controller group 41, distributed input/output port group 42 and smart machine group 43; The second operating device group 5 comprises for the load chamber 51 of sample transmission with for the reaction chamber 52 of technological operation.
Described load chamber 51 is at plasma device, pending sample being put into reaction chamber, and described reaction chamber is in plasma device, to treat the chamber that processing sample is carried out the preparation of etching or various deielectric-coating
Described smart machine group 43, for the data collection and control to technological process, specifically comprises temperature controller, technique power supply, the first vacuum pump, the second vacuum pump, the first servo controller, the second servo controller and vacuum gauge.
The utility model embodiment is the monitoring to described technological operation module by described monitoring module, and described control module is by gathering the state of described technological operation module and sending corresponding technological operation order, can realize intelligent monitoring, control in real time, reliable and stable carries out art breading to sample.
Embodiment bis-:
Refer to Fig. 2, Controlling System structure iron for the another kind of plasma enhanced chemical vapor deposition of the utility model embodiment, wherein, described system, except comprising the first watch-dog group 1, the second watch-dog group 2, Ethernet switch 3, the first operating device group 4 and the second operating device group 5, also comprises:
Described the first watch-dog group 1, by Ethernet or wireless Wifi mode, is connected with described the second watch-dog group 2.
Wherein, as shown in Figure 3, described the first watch-dog group 1 comprises for the first computer 11 of remote monitoring and red tape operation with for the second computer 12 of long range data record queries.
Particularly, the first computer 11 and second computer 12 can be referred to as engineer station, by slip-stick artist, by described engineer station, monitor and control technological process.
Wherein, as shown in Figure 4, described the second watch-dog group 2 comprises the 3rd computer 21 for local data processing, time variable control and parameter configuration, and for the 4th computer 22 of recording process data and historical query.
Particularly, described the 3rd computer 21 and described the 4th computer 22 adopt industrial computer, by configuration software coding, control technological process; In described technological operation module, the parameter of each equipment and state show; The setting of processing parameter, modification and preservation; The automatic record of process data, storage, and save as EXCEL document; In technological process, monitor signal is received and processed, and according to the program of setting and parameter, the elements such as programmable logic controller, temperature instrument processed, technique power supply, vacuum pump, servo controller, vacuum gauge are sent to corresponding actions order, control its operation and close.
As shown in Figure 5, described distributed input/output port group 42 comprises standard input output port 421 and the safe input/output port 422 with safety performance.
Wherein, described standard input output port 421 is general port, security is not had to special requirement, and safe input/output port 422 is connected with the input/output port with the equipment of safety requirements.
Particularly, as shown in Figure 6, described programmable logic controller group 41 comprises main website programmable logic controller 411, slave station programmable logic controller 412 and safe programmable controller 413.
The main website programmable logic controller 411 of controlling for data gathering and the output signal of described smart machine group 43, described standard input output port 421 and described safe input/output port 422; The slave station programmable logic controller 412 that is used for the data acquisition control of standard input output port 421 and described smart machine group 43; The safe programmable controller 413 of controlling for signals collecting and the output signal of described safe input/output port 422.
Wherein, programmable logic controller refers to and can change the controller of controlling countermeasure by programming or software arrangements; standard programmable logic controller refers to the Common Controller with general utility functions, and safe programmable controller refers to the programmable logic controller with safety interlock and fault-operation protection functional module.
Particularly, described standard input output port 421 is connected with described slave station programmable logic controller 412 by Profibus-DP mode; Wherein, the DP of described PROFIBUS-DP is Decentralized Periphery, Process FieldbusROFIBUS standard, it has low-cost at a high speed, for communicating by letter of device level Controlling System and distributing I/O, described PROFIBUS-DP agreement has clearly been stipulated how transmission between each station of bus of user data.
Described safe input/output port 422 is by safe open field bus Safetybus
pmode is connected with described safe programmable controller; Wherein, Safetybus
pmode i.e. the open standard for Fieldbus of safety, can directly or by distributing input/output module to sensor and performer, carry out distributed networking safely.
Described safe programmable controller 413 is connected with described main website programmable logic controller 411 by Profibus-DP.
Wherein, as shown in Figure 7, described smart machine group 43 comprises temperature controller 431, technique power supply 432, the first vacuum pump 433, the second vacuum pump 434, the first servo controller 435, the second servo controller 436 and vacuum gauge 437.Wherein, described temperature controller 431 refers to regulation and control integral intelligent temperature control instrument, it has adopted totally digitilized Integrated design, have that temperature curve able to programme or fixed point thermostatic control, multiple PID adjustings, the programming of output rating amplitude limit curve, manual/auto switching, soft start, the output of alarm switch amount, real time data are inquired about, and the function such as computer communication, temperature digital display instrument and ZK thyristor voltage regulator are united two into one, integrate temperature survey, adjusting, drive, instrument is directly exported thyristor triggering signal, can drive all kinds of thyristor loads.Described vacuum pump is that a kind of rotary positive-displacement vacuum pump must have forepump to coordinate can to use and in wider pressure range, has larger pumping speed to contain dust and the insensitive industries such as metallurgy, chemical industry, food, electronics plated film that are widely used in of water vapor in being extracted gas.Described servo controller refers to that servo-driver is called again " servo controller ", " servoamplifier ", for controlling a kind of controller of servomotor, its effect is similar to frequency transformer and acts on common alternating current motor, a part that belongs to servosystem, is mainly used in high-precision station-keeping system.Described vacuum gauge 437 is exactly the sensor of measurement of vacuum, and the signal that vacuum gauge is measured is transferred on vacuumometer just can demonstrate the vacuum tightness of tested vacuum environment through amplifying to process.Described technique power supply 432 is a kind of in radio-frequency power supply, intermediate frequency power supply or direct supply.
Particularly, for described reaction chamber 52, add the described temperature controller of thermal control, by Profibus-DP, be connected with described slave station programmable logic controller; For controlling the described technique power supply of plasma generation, by Profibus-DP, be connected with described slave station programmable logic controller; Be used to described reaction chamber 52 to provide described second vacuum pump of vacuum to be connected with described slave station programmable logic controller by Profibus-DP; Be used to described the first vacuum pump that described load chamber 51 provides vacuum to be connected with described main website programmable logic controller by Profibus-DP; Described the first servo controller is connected with described master-salve station programmable logic controller by Profibus-DP with described the second servo controller, wherein, the first servo controller for Quality control transmission is installed on described load chamber, for described second servo controller of Quality control lifting action, is installed on described reaction chamber; The described vacuum gauge of controlling for described chamber pressure is connected with described slave station programmable logic controller by Profibus-DP; Wherein, described technique power supply is radio-frequency power supply, intermediate frequency power supply or direct supply.Wherein, described the first vacuum pump 433 and described the second vacuum pump 434 are any or its combination in dry pump, molecular pump and cryopump.
The core that the utility model embodiment adopts the industrial computer of perfect performance to control as monitoring, can will after the processing parameter of technological process or the real-time processing of state, feed back to watch-dog group, also corresponding control command is treated to the smart machine group that concrete fill order is issued to described operating device group simultaneously, the data-handling capacity that has effectively improved the Controlling System of plasma enhanced chemical vapor deposition, has improved control accuracy.
Embodiment tri-:
The utility model embodiment is except comprising the hardware configuration of above-described embodiment, and described system also comprises the sub-routine of master routine, safety interlock and fault-operation protection function subprogram, fault safe processing and the warning function of controlling technological process etc.
Wherein, the programme controlled master routine effect of described process operation is the automatic control that realizes technological process, by programmable logic controller PLC, distributed input/output port I/O is completed to the controls such as each vacuum valve, magnetic valve, under meter, pressure warning unit, vent gas treatment, warning light; Transmission and the lifting action of sample are controlled by servo controller; The temperature of reaction chamber is controlled by temperature controller; The pressure of load chamber, reaction chamber is controlled automatically by vacuum pump and vacuum gauge, and technique power supply is controlled the plasma body in reaction chamber automatically.
Safety interlock and fault-operation protection function subprogram, the safety interlock after starting for each peripherals, as the interlocking of water coolant and vacuum pump, technique power supply; The interlocking of servo controller and partial vacuum valve, magnetic valve, when some peripherals, link go wrong, relevant equipment is automatically closed or is stopped starting, and can prevent the generation of personnel, equipment and technology accident, also can avoid disorder and the working order mistake of program.Meanwhile, when the technical papers of input error, this subsystem will be refused to carry out automatically, and technique is protected automatically.
Fault safe is processed and the sub-routine of warning function monitors, processes and report to the police the various faults of technological process, makes any trickle abnormal all in the monitoring of system, to guarantee the normal operation of technological process.When system exception, accurate failure judgement position, and process in time by warning interface prompt operator.Simultaneously; in technological process, once break down, this subsystem can be made safe handling quickly and accurately; send the corresponding command; close relevant device, exit manufacturing process, and when process disruption; relevant operation information, data are stored in time; for analysis and the processing of fault provides foundation, protect thus peripherals safety, avoid equipment and personnel that major accident occurs.
The first computer in described monitoring module and the 3rd computer are also provided with friendly man-machine monitoring interface, have Chinese and English language handoff functionality, make its real-time demonstration that possesses running status, data, man-machine interactive operation.During whole PECVD operation, simple to operate, directly perceived.
Wherein, described man-machine monitoring interface comprises:
The main monitoring interface of monitoring level, red-tape operati, operating parameter demonstration, each parts running status and operation progress for equipment show, sub-interface command button is monitored in its top for each, be used for entering the sub-interface of next stage, middle part is the mimic diagram of each equipment of above-described embodiment, for showing in real time the working order of each equipment, the shortcut key that upper right quarter is device control, right lower quadrant is equipment action command shortcut key, for the technology controlling and process operation of equipment.
Technical recipe interface, for setting and the retouching operation of processing parameter, makes full use of the function of EXCEL, and processing parameter is incorporated in its database, reaches the quick, convenient of parameter modification.
Abnormal alarm interface, for showing All Alerts information, and autostore, can all current or historic recordss of real-time query, by time or classification strainer fast finding fault alarm information.
Apparatus parameter setting interface, for operating parameter and the safety interlock parameter of set device, as the climbing speed of temperature, vacuum valve and magnetic valve action time of lag, fault alarm value etc.
Device report interface, for recording unit operational process, the virtual condition of the arbitrary time point of each parts, and can inquire about the operator who now carries out this status command.
Device service interface, carries out manual operation during for maintenance of the equipment, carry out corresponding each function test after maintenance, as heating test, leak rate test etc.
Subscriber administration interface, for defining user's operating right, comes operating equipment and each parameter of modification equipment according to different authorities.Described authority specifically comprises operation, technique, maintenance, maintenance and five authorities of system, the different open corresponding operation of equipment degree of authority.
The utility model embodiment controls by software program and makes that its level of automation is high, travelling speed is fast, stable, reliable, can remote monitoring/maintenance; Adopt distributed input/output module, solve site control point many, processing requirement is special, controls the problems such as complicated; Monitoring interface is directly perceived, vivid, easy to operate, realizes the accurate control of sample transportation and processing parameter; Storage and the history data inquiry of various data have been realized.
Embodiment tetra-:
Refer to Fig. 8, the concrete structure figure of the Controlling System of a kind of concrete plasma enhanced chemical vapor deposition providing for the utility model embodiment, is specially:
The first computer and the second computer of the first watch-dog group in above-described embodiment adopt respectively the client terminal machine that the world-leading model of Wang Si company is V90L, and difference called after the first engineer station and the second engineer station; It is RS500AT-Q351(ARISTA RS500AT-Q351 that the 3rd computer in described the second watch-dog group and the 4th computer adopt respectively ALLRED Si Ta company model) industrial computer difference called after the first industrial computer and the second industrial computer, wherein, the operating system of described the first industrial computer and the second industrial computer adopts Microsoft's Window XP operating system (Microsoft Windows XP), and developing required configuration software employing Ai Kangnuo company model is GENESIS32 software (ICONICS GENESIS32).
Described Ethernet switch adopts He Si Man, and model is RS40(HIRSCHMANN RS40), described exchange board has 9 ethernet ports, and multiport facilitates the upgrading of follow-up described Controlling System.It is Q25HCPU (MITSUBISHI Q25HCPU) that described main website programmable logic controller and described slave station programmable logic controller adopt Mitsubishi model, and its power module adopts the power supply (MITSUBISHI Q64PN) that Mitsubishi model is Q64PN.Described main website programmable logic controller and described slave station programmable logic controller are undertaken alternately by ethernet communication module, and wherein, described ethernet communication module adopts the module (MITSUBISHI QJ71E71-100) that the model of Mitsubishi is QJ71E71-100.The equipment such as described standard input output port, servo controller, vacuum pump, temperature controller, technique power supply and vacuum gauge are connected with described main website programmable logic controller or described slave station programmable logic controller by Process FieldbusROFIBUS standard (Profibus-DP) mode respectively, and wherein said Profibus-DP communication module adopts the module (MITSUBISHI QJ71PB92D) that Mitsubishi model is QJ71PB92D.Described safe programmable controller adopts Pilz company, and model is the programmable logic controller (PILZ PSS SB3006-3ETH-2DP-S) of PSS SB3006-3ETH-2DP-S.It is PS Su ES series that described standard input output module adopts Pilz company model, as standard digital amount load module PILZ PS Su ES4DI; Safe input/output port be safe input/output module to adopt Pilz company model be PS Su EF series, as relay-type secure digital amount output module PILZ PS Su EF2DOR8.Described temperature controller adopts Continental Europe company, and model is MINI8_16LP (Eurotherm Invensys MINI8_16LP), and it is the controller that 8 road PID calculate.Described servo controller adopts Kollmorgen Corporations, and model is SERVOSTAR-341(KOLLMORGEN SERVOSTAR-341).Described vacuum pump adopts Lai Bao company, and model is DRYVAC5000RS (LEYBOLD DRYVAC5000RS), and it is dry type frequency conversion vacuum pump, the pollution in the external world in the time of can effectively preventing reaction chamber technique.Described vacuum gauge Yong Wan machine instrument company, model is 613B (MKS631B).Described pressure warning unit adopts English good fortune Kanggong department, and model is TPR280 (INFICON TPR280).Described under meter adopts AE PLC, and model is FC-R7710CD (Aera FC-R7710CD).Described vacuum valve adopts Hui Tuo company, and model is 12144 (VAT12144).
Wherein, described the first engineer station, the second engineer station and the first industrial computer, the second industrial computer are respectively by ethernet communication, and main website programmable logic controller and safe programmable controller are by Process FieldbusROFIBUS standard (PROFIBUS-DP) communication; Described standard input output port, described vacuum pump, temperature controller, servo controller, vacuum gauge, technique power supply and master-salve station programmable logic controller are by PROFIBUS-DP communication, for the transmission process of data; Communication module in safe programmable controller and safe input/output port passes through Safetybus
pcommunication, for the transmission process of data.
Controlling System described in employing the utility model embodiment, the parameter of described the first industrial computer and the 3rd industrial computer setting or order can be transferred to the execution units such as described pressure switch, flow valve, vacuum valve, magnetic valve, warning light, hummer, vent gas treatment, pressure warning unit, under meter of described vacuum treatment installation with described standard input output port by master-salve station programmable logic controller, come real-time Quality control in the operation of vacuum treatment installation; Secondly, described execution unit can also be transferred to the state parameter in reaction process the first engineer station and the second engineer station in described the first watch-dog group and the first industrial computer of the second watch-dog group and the second industrial computer in real time.
The utility model embodiment safe programmable controller effectively avoids standard programmable logic controller to occur burning out when bonding when it inputs or outputs contact, produces wrong output signal; By independent safety bus (SafetyBUS p), guarantee when safety problem appears in system, STD bus part still can normally be worked; When software program designs, add due security procedure, make system there is the double shielding on hardware and software.
Embodiment five:
Refer to Fig. 9, the control method schema for a kind of plasma enhanced chemical vapor deposition of the utility model embodiment, comprising:
S101: opening control general supply, and open pneupress system, the cooling water system exhaust treatment system of unifying, and set the corresponding working value of described system;
S102: executive system self-check program;
S103: start the second watch-dog group and described the first operating device group in described Controlling System, set processing parameter and fault alarm parameter, and definite technique numbering, wherein said processing parameter comprises prepares temperature, gas flow, the operation pressure of film, power of technique power supply, process time etc., and described fault alarm parameter comprises vacuum pressure, the temperature rate of rise, valve event time delay interval etc.;
S104: vacuumize and heat up to reach the processing parameter of having set and make described Industrial Computer Control sample put into reaction chamber to carry out corresponding technological operation;
S105: after sample is transmitted, described the second watch-dog group is controlled and passed into process gas, adjusting process pressure and open technique power supply to carry out technological operation;
S106: in operational process of craft, described the second watch-dog group is carried out data gathering and analysis to each equipment of technological operation in real time, if there is extremely, will carry out sound and light alarm and report to the police and process to continue to carry out technological operation;
S107: when the processing parameter having configured described in described sample reaches requires, described the second watch-dog group is controlled and taken out described sample;
S108: will circulate from S103 execution if will continue next technique, otherwise control and close processing unit by Controlling System.
The utility model embodiment adopts the Controlling System described in above-described embodiment, utilizes industrial computer and safe programmable controller PLC, by configuration software, adopts Ethernet, PROFIBUS-DP and Safetybus
pcommunication, and adopt the Monitoring and Controlling technology such as vacuum monitoring, PID heating, technique power supply Auto-matching, plasma spectrometry monitoring, abnormal alarm, remote monitoring, make complicated pecvd process realize automatization control, thereby the operation of whole PECVD system is guaranteed reliably, and the etching of material and the preparation of film are precise and stable.
Above disclosed is only the utility model preferred embodiment, certainly can not limit with this interest field of the utility model, and the equivalent variations of therefore doing according to the utility model claim, still belongs to the scope that the utility model is contained.
Claims (11)
1. the Controlling System of a plasma enhanced chemical vapor deposition, it is characterized in that, comprise for the first watch-dog group of remote monitoring and data logging inquiry, the second watch-dog group for data processing and parameter configuration, Ethernet switch, for controlling the first operating device group of technological operation and for carrying out the second operating device group of technological operation;
Described the first watch-dog group and described the second watch-dog group by Ethernet switch, are connected with described the first operating device group respectively, and described the first operating device group is connected with described the second operating device group;
Wherein, described the first operating device group comprises programmable logic controller group, distributed input/output port group and smart machine group; The second operating device group comprises for the load chamber of sample transmission with for the reaction chamber of technological operation.
2. the system as claimed in claim 1, is characterized in that, described the first watch-dog group comprises for the first computer of remote monitoring and red tape operation with for the second computer of long range data record queries.
3. the system as claimed in claim 1, is characterized in that, described the second watch-dog group comprises the 3rd computer for local data processing, time variable control and parameter configuration, and for the 4th computer of recording process data and historical query.
4. the system as claimed in claim 1, is characterized in that, also comprises:
Described the first watch-dog group, by Ethernet or wireless Wifi mode, is connected with described the second watch-dog group.
5. the system as claimed in claim 1, is characterized in that, described distributed input/output port group comprises standard input output port and has the safe input/output port of safety performance.
6. system as claimed in claim 5, is characterized in that, described programmable logic controller group comprises:
The main website programmable logic controller of controlling for data gathering and the output signal of described smart machine group, described standard input output port and described safe input/output port;
The slave station programmable logic controller that is used for the data acquisition control of standard input output port and described smart machine group;
The safe programmable controller of controlling for signals collecting and the output signal of described safe input/output port.
7. system as claimed in claim 6, is characterized in that, also comprises:
Described standard input output port is connected with described slave station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode;
Described safe input/output port is by safe open field bus Safetybus
pmode is connected with described safe programmable controller;
Described safe programmable controller is connected with described main website programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode.
8. system as claimed in claim 7, is characterized in that, described smart machine comprises temperature controller, technique power supply, the first vacuum pump, the second vacuum pump, the first servo controller, the second servo controller and vacuum gauge.
9. system as claimed in claim 8, is characterized in that, also comprises:
The described temperature controller that adds thermal control for described reaction chamber, is connected with described slave station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode;
For controlling the described technique power supply of plasma generation, by Process FieldbusROFIBUS standard P rofibus-DP mode, be connected with described slave station programmable logic controller;
Be used to described the first vacuum pump that described load chamber provides vacuum to be connected with described main website programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode;
Be used to described reaction chamber to provide described second vacuum pump of vacuum to be connected with described slave station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode;
Described the first servo controller is connected with described master-salve station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode with described the second servo controller, wherein, the first servo controller for Quality control transmission is installed on described load chamber, for described second servo controller of Quality control lifting action, is installed on described reaction chamber;
The described vacuum gauge of controlling for described chamber pressure is connected with described slave station programmable logic controller by Process FieldbusROFIBUS standard P rofibus-DP mode.
10. system as claimed in claim 9, is characterized in that, described technique power supply is radio-frequency power supply, intermediate frequency power supply or direct supply.
11. systems as claimed in claim 9, is characterized in that, described the first vacuum pump and described the second vacuum pump are any or its combination in dry pump, molecular pump and cryopump.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320817918.6U CN203855644U (en) | 2013-12-11 | 2013-12-11 | Control system for plasma enhanced chemical vapor deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320817918.6U CN203855644U (en) | 2013-12-11 | 2013-12-11 | Control system for plasma enhanced chemical vapor deposition |
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| CN203855644U true CN203855644U (en) | 2014-10-01 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103834934A (en) * | 2013-12-11 | 2014-06-04 | 南方科技大学 | Control system for plasma enhanced chemical vapor deposition |
| CN109459992A (en) * | 2018-12-03 | 2019-03-12 | 江苏鲁汶仪器有限公司 | A kind of control method and system that process gas is switched fast |
| CN109778133A (en) * | 2019-02-26 | 2019-05-21 | 佛山市佛欣真空技术有限公司 | Technical arrangement plan method Internet-based in technique for vacuum coating |
-
2013
- 2013-12-11 CN CN201320817918.6U patent/CN203855644U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103834934A (en) * | 2013-12-11 | 2014-06-04 | 南方科技大学 | Control system for plasma enhanced chemical vapor deposition |
| CN103834934B (en) * | 2013-12-11 | 2016-05-11 | 南方科技大学 | Control system for plasma enhanced chemical vapor deposition |
| CN109459992A (en) * | 2018-12-03 | 2019-03-12 | 江苏鲁汶仪器有限公司 | A kind of control method and system that process gas is switched fast |
| CN109778133A (en) * | 2019-02-26 | 2019-05-21 | 佛山市佛欣真空技术有限公司 | Technical arrangement plan method Internet-based in technique for vacuum coating |
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