CN109459992A - A kind of control method and system that process gas is switched fast - Google Patents
A kind of control method and system that process gas is switched fast Download PDFInfo
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- CN109459992A CN109459992A CN201811466086.1A CN201811466086A CN109459992A CN 109459992 A CN109459992 A CN 109459992A CN 201811466086 A CN201811466086 A CN 201811466086A CN 109459992 A CN109459992 A CN 109459992A
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- process gas
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- 238000000034 method Methods 0.000 title claims abstract description 111
- 230000008569 process Effects 0.000 title claims abstract description 78
- 230000003993 interaction Effects 0.000 claims description 3
- 230000004044 response Effects 0.000 abstract description 8
- 238000004891 communication Methods 0.000 abstract description 7
- 239000007789 gas Substances 0.000 description 38
- 238000010586 diagram Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 241000208340 Araliaceae Species 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32252—Scheduling production, machining, job shop
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Flow Control (AREA)
Abstract
The present invention discloses a kind of control method that process gas is switched fast, and display carries out technological parameter setting and status display；Main industrial personal computer receives the order from display and order is issued to master controller；Master controller carries out the logical operation and control of process gas switching, and the output power of radio-frequency power supply and the switch of diaphragm valve are controlled by point output signal；Radio-frequency power supply exports radio-frequency power, by gas ionization at plasma；The on-off of diaphragm valve control gas.Invention additionally discloses a kind of control systems that process gas is switched fast, setting of the present invention for diaphragm valve control and radio-frequency power, it to be realized by DO the and AO point of master controller, rather than it is realized by communication, it eliminates main industrial personal computer and assigns the period of instruction and the time of network communication, the response time can be greatly reduced, improve the accuracy of control when the switching time of process gas being set as 0.2 second, it remains to respond rapidly to, it is no-delay.
Description
Technical field
The invention belongs to semiconductor fabrication techniques field, can be used for semiconductor manufacturing equipment production chips in etching machine and
A kind of coating machine, and in particular to control method and system that process gas is switched fast.
Background technique
The development in high and new technology field is advanced by leaps and bounds at present, and the production level of especially semicon industry increasingly improves, and
Control and application for gas circuit and radio frequency are almost the indispensable important component of each semiconductor processing equipment.Gas circuit
Middle circulation be plated film and etching reaction gas, radio frequency is used to reaction gas being ionized into plasma, passes through plasma
To carry out material the technological operations such as plated film and etching.
Control mode traditional at present is: comprising various control programs and algorithm in main industrial personal computer PC, passing through network protocol
TCP/IP assigns control command to I/O module, and I/O module is the input and output for carrying out point, and inside does not include logic control
Program exports corresponding point according to the instruction of main industrial personal computer PC, controls pneumatic diaphragm valve events, and then control different works
The on and off of skill gas.Control for radio frequency power output is also in this way, main industrial personal computer passes through network protocol and radio-frequency power supply
It interacts, assigns power control instruction to radio-frequency power supply.All control instructions in traditional control method, all by main industrial personal computer
PC is assigned, and when the switch speed of process gas requires height, for switching cycle when within 1S, the response time, (PC assigned the week of instruction
Phase, the time that the time of network communication and I/O module execute) too long problem will highlight, it is unable to satisfy process gas
The requirement of switch speed.
With the continuous development of semiconductor coated film and etching apparatus, the switch speed of process gas is getting faster, therefore is passed
The control mode of system can no longer meet technique requirement, needs a kind of control method that new process gas is switched fast, reduces
Response time improves switching cycle.
Summary of the invention
Goal of the invention: in view of the deficienciess of the prior art, the object of the present invention is to provide a kind of structure is simple, operation side
Just the control method that process gas is switched fast.
Technical solution: in order to achieve the above-mentioned object of the invention, The technical solution adopted by the invention is as follows:
A kind of control method that process gas is switched fast, specifically includes that
1) display carries out technological parameter setting and status display；
2) main industrial personal computer receives the order from display and order is issued to master controller；
3) master controller carries out the logical operation and control of process gas switching, and controls radio frequency by point output signal
The output power of power supply and the switch of diaphragm valve；
4) radio-frequency power supply exports radio-frequency power, by gas ionization at plasma；
5) on-off of diaphragm valve control gas.
Preferably, the technological parameter includes that process flow starts, process flow terminates, process flow switching cycle,
5 parameters of radio frequency power output and cycle-index.
Preferably, technique is required to be compiled into program language, be written in master controller, reserve five interaction parameters, when
After master controller receives five parameters that main industrial personal computer issues, start the control of process flow.
Preferably, master controller exports AO1 by analog output port point, to control the output work of radio-frequency power supply
Rate；Master controller exports DO1-DOn by output switch parameter port point, to control the switch of several diaphragm valves.
Invention additionally discloses a kind of control system that process gas is switched fast, for the aobvious of parameter setting and status display
Show device, for receiving the order from display and the main industrial personal computer of transmitting order to lower levels, for the logical operation of process gas switching
With the master controller of control, for the output of radio-frequency power, by gas ionization at the radio-frequency power supply of plasma and control gas
Several diaphragm valves of on-off, display, main industrial personal computer and master controller are sequentially connected, radio-frequency power supply and diaphragm valve respectively with master control
Device connection processed,
Preferably, it is provided with 5 parameter setting buttons, respectively process flow start button on the display,
Button is arranged in process flow conclusion button, process flow switching cycle, and button and cycle-index setting is arranged in radio frequency power output
Button.
Preferably, the master controller is connect by analog output port with radio-frequency power supply, the master controller is logical
Several output switch parameter ports are crossed to connect with diaphragm valve respectively.
Preferably, the master controller is programmable logic controller (PLC) PLC.
The utility model has the advantages that compared with prior art, the invention has the following advantages that
The control method that process gas of the invention is switched fast wants the setting of diaphragm valve control and radio-frequency power
It is realized by DO the and AO point of master controller, rather than is realized by communication, eliminate the period that main industrial personal computer assigns instruction
With the time of network communication, the response time can be greatly reduced, the accuracy for improving control is set in the switching time of process gas
When being set to 0.2 second, remain to respond rapidly to, it is no-delay.
Detailed description of the invention
Fig. 1 is the control system architecture schematic diagram that process gas is switched fast；
Fig. 2 is that the information between control method display, main industrial personal computer and master controller that process gas is switched fast is handed over
Mutual schematic diagram；
Fig. 3 is the information exchange schematic diagram of control method master controller and diaphragm valve that process gas is switched fast；
Fig. 4 is the information exchange schematic diagram of control method master controller and radio-frequency power supply that process gas is switched fast；
Fig. 5 is the control flow chart for the control method that process gas is switched fast.
Specific embodiment
Combined with specific embodiments below, the present invention is furture elucidated, and embodiment is under the premise of the technical scheme of the present invention
Implemented, it should be understood that these examples are only for illustrating the present invention and are not intended to limit the scope of the present invention.
A kind of control method that process gas is switched fast, specifically includes that
1) display 1 carries out technological parameter setting and status display；
2) main industrial personal computer 1 receives the order from display 1 and order is issued to master controller 3；
3) master controller 3 carries out the logical operation and control of process gas switching, and is penetrated by the control of point output signal
The output power of frequency power 4 and the switch of diaphragm valve 5；
4) radio-frequency power supply 4 exports radio-frequency power, by gas ionization at plasma；
5) diaphragm valve 5 controls the on-off of gas.
Specifically, the technological parameter in control method includes that process flow starts, process flow terminates, process flow switching
Period, 5 parameters of radio frequency power output and cycle-index.Above five parameters are handed down to main industrial personal computer 2, and industrial personal computer 2 receives
After five parameter informations, which is issued to master controller 3.
Display 1 and main industrial personal computer 2 are all intended only as the medium of parameter transmission, without logical operation and control, final mesh
Be that parameter is all issued in master controller 3, technique switching whole flow process, all completed by master controller 3.
Main body of the master controller 3 as entire technique switching control, control diaphragm valve 5 switch and radio-frequency power supply 4 it is defeated
Power out.According to process flow, technique is required to be compiled into program language, is written in master controller 3, reserves five interaction ginsengs
Number, i.e. process flow start 11, and process flow terminates 12, process flow switching cycle 13, radio frequency power output 14, cycle-index
15.After master controller 3 receives five parameters that main industrial personal computer 2 issues, the control of process flow was both started.
Master controller 3 exports DO1-DOn (output switch parameter port) by the point of oneself, to control opening for diaphragm valve 5
It closes, as shown in Figure 3；AO1 (analog output port) is exported by the point of oneself, to control the output power of radio-frequency power supply 4,
As shown in Figure 4.I.e. master controller exports AO1 by analog output port point, to control the output power of radio-frequency power supply；It is main
Controller exports DO1-DOn by output switch parameter port point, to control the switch of several diaphragm valves.Entire technique switching stream
Journey is all completed by master controller 3, by point position control, greatly reduces the response time of switching, is improved technique and is completed feelings
Condition.
Invention additionally discloses a kind of control systems that process gas is switched fast, including are used for parameter setting and status display
Display 1, for receiving the order from display and the main industrial personal computer 2 of transmitting order to lower levels, patrolling for process gas switching
Operation and the master controller 3 of control, the output for radio-frequency power are collected, by gas ionization at 4 He of radio-frequency power supply of plasma
Several diaphragm valves 5 of gas on-off are controlled, display, main industrial personal computer and master controller are sequentially connected, radio-frequency power supply and diaphragm valve
It is connect respectively with master controller, specifically, display 1 is communicatively coupled with main industrial personal computer 2 by the first data line 6；Main work
Control machine 2 is communicatively coupled with master controller 3 by the second data line 7；Master controller 3 and diaphragm valve 5 pass through third data line 8
Carry out information exchange；Master controller 3 and radio-frequency power supply 4 pass through the 4th data line 9 progress information exchange.
5 parameter setting buttons, respectively process flow start button 11, process flow knot are provided on display 1
Button 13 is arranged in beam button 12, process flow switching cycle, and button 14 is arranged in radio frequency power output and button is arranged in cycle-index
15.When pressing process flow start button 11, the process flow of gas switching starts；When pressing process flow conclusion button 12,
The process flow of gas switching terminates；Press the period that the setting process flow of process flow switching cycle switches；It is defeated by radio frequency
Power setting button 14 out is configured the output power of radio-frequency power supply；By cycle-index, button 15, setting circulation are set
Number.
Master controller 3 is connect by analog output port with radio-frequency power supply 4, and master controller 3 is defeated by several switching values
Exit port is connect with diaphragm valve 5 respectively.
Master controller is programmable logic controller (PLC) PLC, and programmable logic controller (PLC) PLC uses times good fortune, Mitsubishi, Siemens
Etc. brands PLC, preferably using good fortune PLC again in the present embodiment.
The specific control flow chart of the present invention, as shown in figure 5, control flow is as follows:
1) process flow start button is pressed, process gas supply chain is started；
2) judge whether process ends process, if terminated, press process flow conclusion button, control flow terminates, such as
Fruit does not terminate, and carries out step 3)；
3) process flow switching cycle and radio frequency power output are set, master controller controls radio frequency by point output signal
The output power of power supply and the switch of diaphragm valve；
4) judge cycle-index, if reaching cycle-index, control flow terminates, if not up to, returning to execution
Step 3.
Main industrial personal computer 2 of the invention be intended only as a parameter transmission medium, not any logic and control function,
All control is completed by master controller 3.Master controller 3 must select the PLC with programing function, cannot select IO mould
Block.The parameter that display 1 and main industrial personal computer 2 are transmitted, only the setting parameter of process flow, does not influence the execution of technique
Journey, therefore the transmission of display 1 and main industrial personal computer 2 for parameter do not influence technique switching and response time.For diaphragm valve control
The setting of system and radio-frequency power, will be realized by DO the and AO point of master controller 3, rather than be realized by communication, so
It can reduce the response time, improve the accuracy of control.
The control method that process gas of the invention is switched fast eliminates period and network that main industrial personal computer assigns instruction
The response time can be greatly reduced in the time of communication, when the switching time of process gas being set as 0.2 second, remain to rapid sound
It answers, it is no-delay.
Claims (8)
1. a kind of control method that process gas is switched fast, characterized by comprising:
1) display carries out technological parameter setting and status display；
2) main industrial personal computer receives the order from display and order is issued to master controller；
3) master controller carries out the logical operation and control of process gas switching, and controls radio-frequency power supply by point output signal
Output power and diaphragm valve switch；
4) radio-frequency power supply exports radio-frequency power, by gas ionization at plasma；
5) on-off of diaphragm valve control gas.
2. the control method that process gas according to claim 1 is switched fast, it is characterised in that: the technological parameter packet
It includes process flow to start, process flow terminates, process flow switching cycle, 5 parameters of radio frequency power output and cycle-index.
3. the control method that process gas according to claim 1 is switched fast, it is characterised in that: require to work out technique
It at program language, is written in master controller, five interaction parameters is reserved, when master controller receives five that main industrial personal computer issues
After parameter, start the control of process flow.
4. the control method that process gas according to claim 1 is switched fast, it is characterised in that: master controller passes through mould
Analog quantity output port point exports AO1, to control the output power of radio-frequency power supply；Master controller passes through output switch parameter port point
Position output DO1-DOn, to control the switch of several diaphragm valves.
5. realize the control system that the process gas of control method described in claim 1-4 any claim is switched fast,
It is characterized by: the display for parameter setting and status display；For receiving order and transmitting order to lower levels from display
Main industrial personal computer；For the logical operation of process gas switching and the master controller of control；For the output of radio-frequency power, by gas
Volume ionization at plasma radio-frequency power supply 4, and control gas on-off several diaphragm valves 5, display, main industrial personal computer and master
Controller is sequentially connected, and radio-frequency power supply and diaphragm valve are connect with master controller respectively.
6. the control system that process gas according to claim 1 is switched fast, it is characterised in that: on the display
It is provided with 5 parameter setting buttons, respectively process flow start button, process flow conclusion button, process flow switching week
Button is arranged in phase, and button is arranged in radio frequency power output and button is arranged in cycle-index.
7. the control system that process gas according to claim 1 is switched fast, it is characterised in that: the master controller is logical
Analog output port is crossed to connect with radio-frequency power supply, the master controller by several output switch parameter ports respectively with diaphragm valve
Connection.
8. the control system that process gas according to claim 1 is switched fast, it is characterised in that: the master controller is
Programmable logic controller (PLC) PLC.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811466086.1A CN109459992A (en) | 2018-12-03 | 2018-12-03 | A kind of control method and system that process gas is switched fast |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201811466086.1A CN109459992A (en) | 2018-12-03 | 2018-12-03 | A kind of control method and system that process gas is switched fast |
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| CN109459992A true CN109459992A (en) | 2019-03-12 |
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| CN201811466086.1A Pending CN109459992A (en) | 2018-12-03 | 2018-12-03 | A kind of control method and system that process gas is switched fast |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203855644U (en) * | 2013-12-11 | 2014-10-01 | 南方科技大学 | Control system for plasma-enhanced chemical vapor deposition |
| CN205850066U (en) * | 2016-07-25 | 2017-01-04 | 公安部天津消防研究所 | A kind of image-type gas extinguishing control system |
| CN107908201A (en) * | 2017-09-25 | 2018-04-13 | 湖南工业大学 | A kind of mixed gas flow intelligence control system and method |
-
2018
- 2018-12-03 CN CN201811466086.1A patent/CN109459992A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203855644U (en) * | 2013-12-11 | 2014-10-01 | 南方科技大学 | Control system for plasma-enhanced chemical vapor deposition |
| CN205850066U (en) * | 2016-07-25 | 2017-01-04 | 公安部天津消防研究所 | A kind of image-type gas extinguishing control system |
| CN107908201A (en) * | 2017-09-25 | 2018-04-13 | 湖南工业大学 | A kind of mixed gas flow intelligence control system and method |
Non-Patent Citations (4)
| Title |
|---|
| 刘卫国;周顺;高爱华;张伟;张雄星;金娜;: "等离子体增强液态源MOCVD系统的研制", 真空科学与技术学报, no. 05, pages 476 - 480 * |
| 杨晓东;柳森娟;刘锋敏;: "基于工控机和PLC的真空磁控溅射镀膜设备控制系统设计", 科技情报开发与经济, no. 31, pages 117 - 120 * |
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Address after: 221300 No.8, Liaohe West Road, Pizhou Economic Development Zone, Xuzhou City, Jiangsu Province Applicant after: Jiangsu Luwen Instrument Co.,Ltd. Address before: 221300 No. 16 Haihe West Road, Pizhou City, Xuzhou City, Jiangsu Province Applicant before: JIANGSU LEUVEN INSTRUMMENTS Co.,Ltd. |
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