CN202865335U - Water-cooling control system for reaction chamber - Google Patents
Water-cooling control system for reaction chamber Download PDFInfo
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- CN202865335U CN202865335U CN201220458063.8U CN201220458063U CN202865335U CN 202865335 U CN202865335 U CN 202865335U CN 201220458063 U CN201220458063 U CN 201220458063U CN 202865335 U CN202865335 U CN 202865335U
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- reaction chamber
- water
- pipeline
- cooling
- control system
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Abstract
The utility model discloses a water-cooling control system for a reaction chamber. The water-cooling control system comprises a cooling water inlet (1) controlled via a switch (2), and a first pipeline and a second pipeline which are connected with each other in parallel, wherein the first pipeline is used for cooling a air-jetting flange chamber of the reaction chamber, the second pipeline is used for cooling the furnace body wall of the reaction chamber, and the outlets of the first and second pipelines are joined to a water outlet (8). The water-cooling control system for the reaction chamber is characterized in that flow meters (3) are arranged at the inlets of the first and second pipelines, and temperature controllers (4) are arranged at the outlets of the first and second pipelines. The water-cooling control system further comprises a PLC (programmable logic controller) (5), wherein the switch (2) for the water inlet is controlled by the PLC, and the flow meters (3) and the temperature controllers (4) are connected with the PLC (5) respectively. The water-cooling control system for the reaction chamber disclosed by the utility model is capable of meeting constantly changing process requirements and high in safety.
Description
Technical field
The utility model relates to field of cooling, relates in particular to a kind of reaction chamber water-cooling control system for MOCVD equipment.
Background technology
Metal organic chemical vapor deposition (Metal Organic Vapor Deposition is called for short MOCVD) equipment is the processing unit that present compound semiconductor materials prepares most critical.Now, some advanced microelectronics, opto-electronic device and microwave, millimetric wave device mostly rely on this tooling to produce advanced thin layer, superthin layer semiconductor material.MOCVD equipment is large-scale, a complicated equipment, and wherein reactor chamber systems is this equipment " heart ".The reaction chamber water-cooling system is a kind of configuration of serving centered by reaction chamber, and it contains reaction chamber chamber body (and related seals position), the jet flange of reactor top, heater electrode, magnetic current sealing and relevant pump.Any one local generation problem all can make reaction chamber work even to meet accident.But the position of emphasis or the cooling of the jet flange of reaction chamber cylindrical shell and reactor top are because these two places all involve two most critical factors of film growth: thermal field and air-flowing environment.Because the semiconductor material of new deposit very thin (thin below 1nm), the variation that thermal field and air-flowing environment are small all may greatly affect heavy film quality.
There is following technical problem in existing reaction chamber water-cooling system:
1. in the technique, the well heater envrionment temperature is not controlled.MOCVD apparatus and process long operational time, temperature are high, no matter existing water-cooling system is the high or furnace temperature of furnace temperature when low, and the cooling water flow of the reaction chamber of flowing through is unchanged, easily causes heat radiation uncontrolled, cause thus the envrionment temperature of reaction chamber internal heater extremely unstable, make depositing technology be difficult to control.
2, temperature, the pressure surge of gas is large in the jet flange.The jet flange of reactor top, for being sprayed onto, the gases such as metal organic source and hydride participate in the special setting of chemical reaction on the substrate, the purpose of cooling has three: 1. guarantee the cooling of sealing member, 2. make source of the gas reduce pre-reaction before arriving substrate, 3. the most important gas in ejection chamber that still makes keeps constant temperature and pressure.Therefore, need to bring up stable air-flowing environment, to guarantee thin layer, superthin layer semiconductor material depositing technics quality and process repeatability.Obviously, not controlled water-cooling can't satisfy this overcritical.
3, security is not high.Existing water-cooling system detects intake pressure, and the warning function when not possessing the flow big ups and downs, thereby there are potential hazard in equipment and personnel.
The utility model content
The purpose of this utility model is the defective that exists for above-mentioned prior art, and a kind of reaction chamber water-cooling control system for MOCVD equipment is provided.
The utility model is by the following technical solutions, design a kind of reaction chamber water-cooling control system for MOCVD equipment, comprise: by the cooling water inlet of on-off control, the first pipeline parallel with one another and the second pipeline, described the first pipeline is used for the cooling of the jet flange chamber of reaction chamber, described the second pipeline is used for the cooling of reaction chamber furnace body wall, the first pipeline and the outlet of the second pipeline converge to water outlet, wherein, described the first and second pipeline entrances are provided with under meter, the outlet of described the first and second pipelines is provided with temperature controller, also comprise a PLC controller, described water inlet switch is by this PLC controller control, described under meter, temperature controller is connected with the PLC controller respectively.
Described PLC controller comprises when switch can't be opened or open when anhydrous, with the control module of well heater upper electrical switch locking; Be in the lower limit of setting when flow system flow or when cutting off the water supply, send the well heater outage, the sound and light alarm module of logical shielding gas.
In one embodiment, described switch adopts the film flow valve.The outlet of described the second pipeline is provided with the proportional integral valve, and this proportional integral valve is communicated with temperature controller.Described the second pipeline adopts the water jacket mode that the reaction chamber furnace body wall is cooled off.
Compared with prior art, the utlity model has following beneficial effect:
1, presses in real time process operation and follow the tracks of adjusting flow of cooling water speed, guaranteed the requirement of conventional heat radiation, especially satisfied the process requirements of continuous variation;
2, safeguard protection warning function easily has warning function when the flow big ups and downs, eliminated the potential hazard that equipment and personnel are existed, and is safe.
Description of drawings
Below in conjunction with drawings and Examples utility model is described in detail, wherein:
Fig. 1 is the schematic diagram of the utility model water-cooling control system.
Embodiment
As shown in Figure 1, the reaction chamber water-cooling control system that the utility model proposes comprises: by the cooling water inlet 1 of switch 2 controls, the first pipeline parallel with one another and the second pipeline, the first pipeline is used for the cooling of reaction chamber chamber 7, the second pipeline is used for the cooling of the furnace body wall of reaction chamber 7, and the first pipeline and the outlet of the second pipeline converge to water outlet 8.The second pipeline adopts the water jacket mode that the reaction chamber furnace body wall is cooled off.The first pipeline entrance is provided with under meter 3, and water outlet is provided with temperature controller 4.The entrance of the second pipeline is provided with under meter 3, and water outlet is provided with temperature controller 4 and proportional integral valve 6, and temperature controller is communicated with the proportional integral valve.Water-cooling control system also comprises a PLC controller 5, and water inlet switch (2) is by the control of PLC controller, and under meter 3, temperature controller 4 are connected with PLC controller 5 respectively.
The utility model is in the situation that guarantee the system cools function, emphasis realizes regulating with detection reaction chamber chambers temp, reaction chamber furnace body wall temperature the flow of water coolant, relatively constant with the temperature that guarantees this two place, can the high repeatedly requirement of batch production thereby satisfy the MOCVD production unit.The utility model is mainly taked following several measures: the precision control of (1) reaction chamber furnace body wall temperature; (2) precision of temperature control in the reaction chamber chamber; Alarm when (3) system's flooding velocity is in the limit and the self-locking of cutting off the water supply.
Flow of cooling water rate-controlling mode is as follows in the utility model:
Cooling for chamber and the furnace body wall of reaction chamber 7 is respectively arranged with independently under meter, temperature controller, temperature sensor and proportional integral valve, automatically controls by the PLC controller.Jet flange is mainly chamber cooling is provided, and therefore, measures the surface temperature of its leaving water temperature(LWT) and furnace body wall with temperature controller.If water temperature is higher or lower than set(ting)value, can both consist of automatic loop by under meter 3, temperature controller 4, proportional integral valve 6, PLC controller 5, follow the tracks of accordingly adjusting.The PLC controller compares the temperature value that temperature controller detects at any time with set(ting)value, and finish precision in inside and calculate, then export a signal to the proportional integral valve 6 on the control outlet conduit, with the under meter 3 on the cooling water inlet pipe road, reach the requirement of control by the aperture of adjust flux meter flow and proportional integral valve.
PLC controller 5 comprises when switch can't be opened or open when anhydrous, with the control module of well heater upper electrical switch locking.Water inlet switch can adopt the film flow valve, and when it can't be opened or open when anhydrous, the PLC controller will with the locking of well heater upper electrical switch, can't be opened.
The PLC controller comprises when flow system flow is in the lower limit of setting or cuts off the water supply, and sends the well heater outage, the sound and light alarm module of logical shielding gas.In process operation, if flow system flow be in setting lower limit or even when cutting off the water supply, the PLC controller then can send the well heater outage, the sound and light alarm signal of logical shielding gas prevents the generation of equipment, fatal accident.
The utility model has following technique effect in using:
(1) do not open or switch when anhydrous the self-locking of equipment well heater upper electrical switch when the diaphragm type flow valve;
(2) in the technique when exterior cooling discharge does not reach the equipment minimum requirements, can provide alarm for the field staff;
(3) heating system steep temperature rise in reaction chamber, when furnace wall or jet flange water outlet temperature rise, the aperture of PLC controller control ratio integral valve and the flow of under meter become greatly thereupon, control very soon drop in temperature to former set(ting)value, and vice versa.
This shows, this cover reaction chamber cooling water control system of the utility model design had both satisfied the general requirement of system, went back the technique core requirement that emphasis has guaranteed MOCVD.
Above-described embodiment only is used for illustrating embodiment of the present utility model.Should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and variation, these distortion and variation all should belong to protection domain of the present utility model.
Claims (6)
1. reaction chamber water-cooling control system, comprise: by the cooling water inlet (1) of switch (2) control, the first pipeline parallel with one another and the second pipeline, described the first pipeline is used for the cooling of the jet flange chamber of reaction chamber, described the second pipeline is used for the cooling of reaction chamber furnace body wall, the first pipeline and the outlet of the second pipeline converge to water outlet (8), it is characterized in that, described the first and second pipeline entrances are provided with under meter (3), the outlet of described the first and second pipelines is provided with temperature controller (4), also comprise a PLC controller (5), described water inlet switch (2) is by this PLC controller control, described under meter (3), temperature controller (4) is connected with PLC controller (5) respectively.
2. reaction chamber water-cooling control system as claimed in claim 1 is characterized in that: described PLC controller comprises when switch (2) can't be opened or open when anhydrous, with the control module of well heater upper electrical switch locking.
3. reaction chamber water-cooling control system as claimed in claim 2 is characterized in that: described switch (2) employing film flow valve.
4. reaction chamber water-cooling control system as claimed in claim 1 is characterized in that: described PLC controller comprises when flow system flow is in the lower limit of setting or cuts off the water supply, and sends the well heater outage, the sound and light alarm module of logical shielding gas.
5. reaction chamber water-cooling control system as claimed in claim 1, it is characterized in that: the outlet of described the second pipeline is provided with proportional integral valve (6), and this proportional integral valve is communicated with temperature controller.
6. reaction chamber water-cooling control system as claimed in claim 1 is characterized in that: described the second pipeline adopts the water jacket mode that the reaction chamber furnace body wall is cooled off.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201220458063.8U CN202865335U (en) | 2012-09-11 | 2012-09-11 | Water-cooling control system for reaction chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201220458063.8U CN202865335U (en) | 2012-09-11 | 2012-09-11 | Water-cooling control system for reaction chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202865335U true CN202865335U (en) | 2013-04-10 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201220458063.8U Expired - Lifetime CN202865335U (en) | 2012-09-11 | 2012-09-11 | Water-cooling control system for reaction chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202865335U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112030146A (en) * | 2020-08-04 | 2020-12-04 | 西安电子科技大学芜湖研究院 | Diamond growth control method and device based on PLC cooling device |
| CN112126910A (en) * | 2020-08-04 | 2020-12-25 | 山西云矽电子科技有限公司 | Control method in diamond growth system based on PLC |
-
2012
- 2012-09-11 CN CN201220458063.8U patent/CN202865335U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112030146A (en) * | 2020-08-04 | 2020-12-04 | 西安电子科技大学芜湖研究院 | Diamond growth control method and device based on PLC cooling device |
| CN112126910A (en) * | 2020-08-04 | 2020-12-25 | 山西云矽电子科技有限公司 | Control method in diamond growth system based on PLC |
| CN112126910B (en) * | 2020-08-04 | 2022-11-18 | 山西云矽电子科技有限公司 | Control method in diamond growth system based on PLC |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130410 |