CN102981369A - Optical filming side stopping method - Google Patents

Optical filming side stopping method Download PDF

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Publication number
CN102981369A
CN102981369A CN 201210554567 CN201210554567A CN102981369A CN 102981369 A CN102981369 A CN 102981369A CN 201210554567 CN201210554567 CN 201210554567 CN 201210554567 A CN201210554567 A CN 201210554567A CN 102981369 A CN102981369 A CN 102981369A
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CN
China
Prior art keywords
rib
photoresist
zone
film
mirror slip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 201210554567
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Chinese (zh)
Inventor
朱一村
吴季
郑熠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujian Castech Crystals Inc
Original Assignee
Fujian Castech Crystals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujian Castech Crystals Inc filed Critical Fujian Castech Crystals Inc
Priority to CN 201210554567 priority Critical patent/CN102981369A/en
Publication of CN102981369A publication Critical patent/CN102981369A/en
Pending legal-status Critical Current

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Abstract

The invention discloses an optical filming side stopping method which comprises the following steps of: manufacturing a mask plate, coating a photoresist, pre-baking, exposing, developing, hardening the film, filming, demolding, wiping cleanly and accomplishing the filming. The optical filming side stopping method provided by the invention is easy to precisely control and applicable to production in batch.

Description

A kind of optical coating rib method
Affiliated technical field
The present invention relates to the components and parts film plating process of optical field, especially a kind of optical coating rib method.
Background technology
At present, photoelectron technology has been applied to the every field in the people life, as take a picture, the fields such as light display is shown, infrared night vision, various photoelectric component, space flight, aviation.The demand of optical thin film is embodied on the film of high damage threshold, multiwave optical thin film and these kinds of protective film, is embodied in especially high precision film system, photoelectric function thin films and different plated film rib that optical index is had relatively high expectations and requires.Reflect broadband on the wavelength, from ultraviolet, visible, near infrared to mid infrared region (200nm-12000nm), main Types has antireflective film, high-reflecting film, spectro-film, polarizing coating, various arrowband and cutoff filter etc.For those window and lens etc. that are exposed to the outside, technical requirement is very high, not only requires to have good optical property, and is high such as the transmittance of service band, good uniformity; Also good mechanical property and chemical property to be arranged, such as high rigidity, high friction, heat shock resistance, stable chemical performance etc.
Optical field plated film rib normal operation mechanical clamp or high temperature adhesive plaster block the part that does not need plated film both at home and abroad, the main technical matters that exists is: 1, the mode of high temperature adhesive plaster needs personnel to attach and removes, rib is inhomogeneous, and through behind the high temperature plated film, the glue that has participation is stayed on the optical mirror slip, and firmness and the damage threshold reduction to a certain degree of film system; 2, the mode of mechanical clamp rib, the machining precision of machinery and eyeglass need to cooperate, but require very strict plated film for rib, and very difficult cooperation puts in place; In addition, at mechanical clamp marginal existence shade, the zone of 0.2mm is arranged generally, do not reach so effective clear aperature of demand and other processing request.3, for the rib requirement of more complicated, mechanical system and adhesive plaster are pasted mode and all can't be realized.
Summary of the invention
The object of the present invention is to provide optical coating rib method, easy to operate, can accurately control, be applicable to various plated film ribs, especially complicated optical coating rib.
The technical solution adopted for the present invention to solve the technical problems is: adopt chromium plate or the luxuriant and rich with fragrance version of drenching to make mask, the rib zone of mask can be various very complicated patterns.Acting as of mask: so that parallel ultraviolet is by in effective clear aperature, i.e. non-rib zone; In rib zone, parallel ultraviolet be prevented from by.
Further, at the even coated photoresist of the optical lens surface that needs plated film, and carry out preliminary drying; Then at its surface coverage mask, the elective irradiation of the parallel ultraviolet by some strength, make the photoresist generation chemical reaction that is subjected to illumination position (be the zone outside the optical mirror slip rib, effectively pass through the aperture), changed the solubleness of this part glued membrane in developer solution.
Further, adopt the NaOH solution spraying exposure optical lens surface of low concentration, the zone is fallen by the photoresist of sensitization is dissolved, still do not existed by the photoresist of sensitization (rib zone), pass through again washed with de-ionized water, just form like this pattern identical with mask on optical mirror slip, at this moment, the rib zone is covered by photoresist firmly.
Further, in order to increase being attached on securely on the optical mirror slip of rib zone photoetching agent pattern, the present invention adopts the type of heating post bake, and heating-up temperature is at 40-300 ℃.
Further, with the optical mirror slip of rib position coating photoresist, after the wiped clean, put into coating machine, whole system antireflective film, high-reflecting film, spectro-film, polarizing coating, various arrowband or cutoff filter etc.
Further, after film system has plated, utilizing spray to add hyperacoustic mode washes, photoresist can react with the alkali lye of high concentration, the photoresist that covers on the optical mirror slip is reacted away, manifest the zone of rib, namely the rib place does not have plated film, and remaining zone is for having plated effective clear aperature zone of film.
Specific embodiment
The work flow of a kind of optical coating rib method of the present invention is: make mask, and---resist coating---------developing,------plated film---demoulding---wiped clean, post bake is finished prebake conditions in exposure by plated film.
Light is made mask with chromium plate, makes too equally with the rib zone on the mask, and making and 102 zones of a size can be so that the passing through of parallel ultraviolet.Then, at the uniform resist coating of whole optical mirror slip, with 100 ℃ temperature prebake conditions 2-10 hour; Mask is attached on the optical mirror slip of coated photoresist, adopt parallel ultraviolet irradiation exposure 102 zones, then, utilize NaOH solution spraying exposure optical lens surface, the zone is fallen by the photoresist of sensitization is dissolved, still do not existed by the photoresist of sensitization, pass through again washed with de-ionized water, just form like this pattern identical with mask on optical mirror slip, at this moment, the rib zone is covered by photoresist firmly.
Surface coating at whole optical mirror slip, film system directly contacts very firmly with eyeglass and is attached on the optical mirror slip, but photoresist contacts with optical mirror slip and projection, and employing reacts with the alkali lye of high concentration, the photoresist that covers on the optical mirror slip is reacted away, manifest the zone of rib.

Claims (1)

1. an optical coating rib method is characterized by: comprise following flow process
S1:Adopt chromium plate or the luxuriant and rich with fragrance version of drenching to make mask:, acting as of mask stops ultraviolet light to pass through;
S2At the even coated photoresist of optical lens surface, and carry out preliminary drying; Then at its surface coverage mask, the elective irradiation of the parallel ultraviolet by some strength, make the photoresist generation chemical reaction that is subjected to illumination position (be the zone outside the optical mirror slip rib, effectively pass through the aperture), changed the solubleness of this part glued membrane in developer solution;
S3Adopt the NaOH solution spraying exposure optical lens surface of low concentration, the zone is fallen by the photoresist of sensitization is dissolved, still do not existed by the photoresist of sensitization (rib zone), pass through again washed with de-ionized water, on optical mirror slip, just form like this pattern identical with mask, at this moment, the rib zone is covered by photoresist firmly;
S4Adopt the type of heating post bake, heating-up temperature is at 40-300 ℃, so that being attached on securely on the optical mirror slip of rib zone photoetching agent pattern;
S5With the optical mirror slip of rib position coating photoresist, after the wiped clean, put into coating machine and be coated with antireflective film, high-reflecting film, spectro-film, polarizing coating, various arrowband or cutoff filter;
S6After the film system of optical mirror slip has plated, utilizing spray to add hyperacoustic mode washes, photoresist can react with the alkali lye of high concentration, the photoresist that covers on the optical mirror slip is reacted away, manifest the zone of rib, be that the rib place does not have plated film, remaining zone is for having plated effective clear aperature zone of film.
CN 201210554567 2012-12-20 2012-12-20 Optical filming side stopping method Pending CN102981369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201210554567 CN102981369A (en) 2012-12-20 2012-12-20 Optical filming side stopping method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201210554567 CN102981369A (en) 2012-12-20 2012-12-20 Optical filming side stopping method

Publications (1)

Publication Number Publication Date
CN102981369A true CN102981369A (en) 2013-03-20

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201210554567 Pending CN102981369A (en) 2012-12-20 2012-12-20 Optical filming side stopping method

Country Status (1)

Country Link
CN (1) CN102981369A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104149510A (en) * 2014-08-12 2014-11-19 苏州傲儒塑胶有限公司 Method for coating irregular curved surface complex pattern
CN104149509A (en) * 2014-08-12 2014-11-19 苏州傲儒塑胶有限公司 Coating method taking photographic developable coatings as spraying covering jig
CN105296942A (en) * 2015-12-04 2016-02-03 北极光电(深圳)有限公司 Method adopting photoetching mask lifting method for achieving optical coating
CN108415222A (en) * 2018-02-02 2018-08-17 江苏明月光电科技有限公司 A kind of photoetching stealth grid Infrared Absorbing Thin Film resin lens and preparation method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104149510A (en) * 2014-08-12 2014-11-19 苏州傲儒塑胶有限公司 Method for coating irregular curved surface complex pattern
CN104149509A (en) * 2014-08-12 2014-11-19 苏州傲儒塑胶有限公司 Coating method taking photographic developable coatings as spraying covering jig
CN105296942A (en) * 2015-12-04 2016-02-03 北极光电(深圳)有限公司 Method adopting photoetching mask lifting method for achieving optical coating
CN108415222A (en) * 2018-02-02 2018-08-17 江苏明月光电科技有限公司 A kind of photoetching stealth grid Infrared Absorbing Thin Film resin lens and preparation method thereof
CN108415222B (en) * 2018-02-02 2021-07-09 明月镜片股份有限公司 Photolithographic invisible grid infrared absorption film resin lens and preparation method thereof

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Application publication date: 20130320