CN108415222A - A kind of photoetching stealth grid Infrared Absorbing Thin Film resin lens and preparation method thereof - Google Patents
A kind of photoetching stealth grid Infrared Absorbing Thin Film resin lens and preparation method thereof Download PDFInfo
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- CN108415222A CN108415222A CN201810105504.8A CN201810105504A CN108415222A CN 108415222 A CN108415222 A CN 108415222A CN 201810105504 A CN201810105504 A CN 201810105504A CN 108415222 A CN108415222 A CN 108415222A
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- resin lens
- eyeglass
- mask plate
- photoetching
- concave surface
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- 239000011347 resin Substances 0.000 title claims abstract description 125
- 229920005989 resin Polymers 0.000 title claims abstract description 125
- 238000002360 preparation method Methods 0.000 title claims abstract description 31
- 238000001259 photo etching Methods 0.000 title claims abstract description 29
- 239000010409 thin film Substances 0.000 title claims abstract description 21
- 239000010408 film Substances 0.000 claims abstract description 63
- 239000010410 layer Substances 0.000 claims abstract description 43
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 38
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 30
- 238000000576 coating method Methods 0.000 claims abstract description 27
- 239000011248 coating agent Substances 0.000 claims abstract description 26
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 16
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 15
- 238000011161 development Methods 0.000 claims abstract description 14
- 239000011241 protective layer Substances 0.000 claims abstract description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 8
- 238000002834 transmittance Methods 0.000 claims abstract description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 14
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 14
- 230000001413 cellular effect Effects 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 claims description 12
- 238000009826 distribution Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 239000004744 fabric Substances 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 7
- 239000012528 membrane Substances 0.000 claims description 5
- 210000001508 eye Anatomy 0.000 abstract description 22
- 230000006378 damage Effects 0.000 abstract description 10
- 230000005855 radiation Effects 0.000 abstract description 8
- 208000027418 Wounds and injury Diseases 0.000 abstract description 5
- 230000004438 eyesight Effects 0.000 abstract description 5
- 208000014674 injury Diseases 0.000 abstract description 5
- 230000000007 visual effect Effects 0.000 abstract description 2
- 238000007740 vapor deposition Methods 0.000 abstract 1
- 230000003667 anti-reflective effect Effects 0.000 description 10
- 239000003292 glue Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000007598 dipping method Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical class C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 3
- 210000005252 bulbus oculi Anatomy 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 208000003464 asthenopia Diseases 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000003902 lesion Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 206010038910 Retinitis Diseases 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 210000003161 choroid Anatomy 0.000 description 1
- 210000004240 ciliary body Anatomy 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000012938 design process Methods 0.000 description 1
- 238000004033 diameter control Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 210000001525 retina Anatomy 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Eyeglasses (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The present invention relates to a kind of preparation methods of photoetching stealth grid Infrared Absorbing Thin Film resin lens, and this approach includes the following steps：Make the mask plate being adapted to eyeglass；Prepare single hardened resin lens；It is coated with positive photoresist in the concave surface of eyeglass；Front baking photoresist；After mask plate center is aligned with center of lens, photolithographic exposure, development are carried out to eyeglass using mask plate；Eyeglass detaches with mask plate and cleans eyeglass；Eyeglass is put into vacuum coating equipment steam coating silicon dioxide protective layer after vapor deposition layers of chrome；Eyeglass is cleaned using positive photoresist stripper, the concave surface of eyeglass is made to form mesh layers of chrome；Eyeglass is put into vacuum coating equipment in its concave surface coating anti reflection film layer.It is an advantage of the invention that lens surface forms Infrared Absorbing Thin Film; while ensureing eyeglass light transmittance, light utilization is improved, the comfortable visual field is provided for human eye; the vision injury that infra-red radiation is brought is reduced, to play the role of protecting eyes from infrared radiation damage.
Description
Technical field
The invention belongs to eyeglass manufacturing technology field, it is related to a kind of forming stealthy grid in lens surface using photoetching technique
The method of Infrared Absorbing Thin Film can prevent eyes lesion, and in particular to a kind of photoetching is hidden by containing that infrared ray enters eyes
The preparation method of shape grid Infrared Absorbing Thin Film resin lens and the resin lens prepared using this method.
Background technology
Generally, the effect of antiultraviolet snip, anti-blue light eyeglass and polarizing function lens protection human eye is generally acknowledged,
Ultraviolet-proof lens by eyeglass add ultraviolet absorber be then to stop injury of the ultraviolet light to human eye, anti-blue light eyeglass
By adding blue-light absorbers in eyeglass or plating injury of the anti-blue light protective layer come shielded segment blue light to human eye, polariscope
Piece then scatters light to avoid the visual fatigue of human eye by inhibition water or other materials.
Infrared ray is longer wavelengths of caloradiance, and penetration power is more stronger than ultraviolet light, and eyes are stimulated excessively by infrared ray,
Retina inside its eyeball will be injured, and then influences eye eyesight.But above-mentioned three kinds of functional lenses can not all stop
Injury of the infrared ray to human eye, wave-length coverage can invade often viewing mobile phone electricity in the so-called near-infrared radiation of 720~1000nm
The eyes of the electronic equipments users such as screen curtain, automation equipment in factory screen, or even as far as eyeground.Human eye is chronically exposed to this
Under kind infra-red radiation, not only by asthenopia, but also can be by iris, ciliary body and the choroid in eyeball middle level and place
In the damage of the inner most retina inflammation of eyeball.This verification degenerates, and may cause serious hindrance to our eyesight.Together
When, this obstacle can also be caused by outdoor sports or outwork, and people should be to protect eyes from the same of ultraviolet injury
Pattern degree solves infrared radiation damage.
Invention content
The technical problem to be solved by the present invention is to according to defect of the existing technology, propose that a kind of photoetching stealth grid is red
The preparation method of outer absorbing membrane resin lens, also discloses the resin lens prepared using this method, which makes work
Skill error is small, efficient, and the eyeglass light transmittance of making is good, can guarantee eyes from infrared radiation damage.
The present invention provides a kind of preparation methods of photoetching stealth grid Infrared Absorbing Thin Film resin lens, including following step
Suddenly：
The mask plate that the first step, making are adapted to eyeglass, the surface of the mask plate have the thin slice of several outwardly convexs, and each
A thin slice is in cellular distribution on mask plate surface；Go to second step；
Second step, preparation meet single hardened resin lens of GB10810 standards；Go to third step；
Third step, resin lens one layer of 1~3 μ m-thick of concave surface even spread positive photoresist, coating temperature 23
±5℃；Go to the 4th step；
4th step, front baking 2~3min of photoresist under the conditions of temperature is 105 ± 10 DEG C, to remove the solvent in photoresist；It goes to
5th step；
5th step, after mask plate center is aligned with resin lens center, control the distance between mask plate and resin lens be 2
~10 μm, resin lens is made to be fixed with mask plate, mask plate is then used to carry out photolithographic exposure, development to resin lens；It goes to
6th step；
6th step detaches resin lens with mask plate, and clean resin eyeglass；Go to the 7th step；
It after 7th step, resin lens keep the temperature 10~15min at a temperature of 75 ± 5 DEG C, is put into vacuum coating equipment and layers of chrome is deposited, plate
Film thickness is 18~30 Ethylmercurichlorendimides, and plated film rate is 0.5 ± 0.2A/S, then steam coating silicon dioxide protective layer, coating film thickness 40
~60 Ethylmercurichlorendimides, plated film rate are 5 ± 2A/S；Go to the 8th step；
8th step cleans resin lens using positive photoresist stripper, so that the concave surface of eyeglass is formed mesh layers of chrome, then uses
Dip the cleaning cloth for glasses wiping eyeglass of ether；Go to the 9th step；
Resin lens are put into the concave surface coating anti reflection film layer in vacuum coating equipment in eyeglass, the antireflection by the 9th step
Film layer includes silica membrane and zirconia film.
Single hardened resin lens surface is uniformly filled positive photoresist by the present invention, then using specify mask plate to its into
Row exposure imaging, and by the lens surface evaporation material chromium after development, later remove lens surface glue, in eyeglass table
Face forms grid, antireflection film layer finally is deposited in lens surface, manufactured lens surface has stealthy mesh chrome layer.This
Sample can prevent lesion by containment enters eyes for the infrared ray of our eyesight danger.Specific mask is designed in the present invention
Version is so that the circular hole meshing rule being presented on Arc lens is consistent.
In above-mentioned technical proposal, the mask plate is arc mask plate or gradual change type tablet mask plate.
The plane mask plate with uniform pattern is often used in conventional lithographic techniques, since lens surface is that arcuate zone is centainly curved
Degree, if carrying out photoetching development, the lens surface under the diffraction of light using traditional plane mask plate with uniform pattern
Figure will appear deformation, and with the increase of distance, diffraction can be more severe, and the deformation of figure also can be increasingly severe,
Some even can become ovalisation, it is therefore desirable to customize a kind of mask plate that suitable eyeglass photoetching uses, the mask plate is according to mirror
Piece camber designs, to ensure that the circular hole formed in lens surface after developing is uniform.
Preferably, the upper surface outwardly convex of the arc mask plate forms outer convex globoidal, the outer convex globoidal and resin
The concave surface of eyeglass matches, and has on the outer convex globoidal and covered with the mesh on eyeglass concave surface matches first
Film version pattern.In above structure, the camber of the outer convex globoidal of mask plate is consistent with lens surface camber, schemes after being developed using mask plate
Shape is accurate, can form uniform circular hole in lens surface.
It is further preferred that first reticle pattern is made of the thin rounded flakes of several outwardly convexs, each circle
Thin slice convex globoidal outside mask plate is in cellular distribution, and thin rounded flakes size is consistent with the circular hole size on eyeglass concave surface.
Preferably, the upper surface of the gradual change type tablet mask plate is plane, and the in-plane has and eyeglass indent
The second reticle pattern that mesh on surface matches.
The mask plate of initial design is but the photoetching development according to the one-to-one making of size on required eyeglass on circular hole
After on to eyeglass, the size of circular hole is changed, and more outward, the diameter change of circular hole is bigger, has exceeded control franchise.Cause
This, collects these data, and according to design data gradual change mask plate, the Circularhole diameter control after its photoetching development is existed
400±40μm.In this way, solving circular hole figure on Arc lens by designing arc mask plate and the parallel mask plate of gradual change and differing
Cause and problem unevenly distributed.
It is further preferred that second reticle pattern is made of the thin rounded flakes of several outwardly convexs, each circle
Thin slice is in cellular distribution in mask plate plane；Second reticle pattern is circle, and second reticle pattern includes
Central area and annular outer region domain, the central area are located at mask plate planar central position, a diameter of second reticle pattern
2/9ths of diameter；A diameter of 0.4~the 0.6mm of thin rounded flakes in central area, the circle being located in the domain of annular outer region
Shape wafer diameters are 0.375~0.575mm.In this way, on gradual change type tablet mask plate, circular hole figure is progressive compensation
, development figure can be made accurate, uniform circular hole is formed on eyeglass arc coin surface.In mask plate design process, circle
Or shape thin slice avoids thin rounded flakes from falling in central area and annular in the central area of mask plate or in annular outer region domain
On the line of demarcation of exterior domain.In addition, circular hole can substantially calculate following formula on the circular hole and eyeglass of gradual change type mask plate：D2=-
2.5R1+425；Wherein R1 indicates mask plate radius maximum distance, is divided by area segments, and D2 is mask plate Circularhole diameter（um）；Example
Such as：Within radius 10mm, D2=- 2.5*10+425=400；Within radius 20mm, D2=- 2.5*20+425=375.
In above-mentioned technical proposal, the tenth step is detected the resin lens of preparation using ultraviolet specrophotometer, obtains
The luminous transmittance of resin lens is 86~90%；The resin lens of preparation are detected using metallographic microscope, obtain resin mirror
The hole core diameter of piece surface circular mesh is 400 ± 40 μm, and the hole heart distance of adjacent circular mesh is 600 ± 30 μm.
Through understanding, prepared in lens surface using photoetching process it is round mesh-structured, can control Circularhole diameter error ±
In 40 μ ms, circular hole is controlled with center of circular hole range error in ± 60 μ ms.The mesh that the present invention passes through designed mask version
Be exactly in order to which the circular hole being finally presented on eyeglass is by being sized and spacing is equally distributed, pitch of holes is 400 ± 40 μ
The hole heart distance of m, adjoining cells are 600 μm ± 30 μm.
The present invention also provides a kind of photoetching stealth grid Infrared Absorbing Thin Film resin lens prepared using the above method.
In above-mentioned technical proposal, the surface of the resin lens has stealthy mesh chrome layer.
In above-mentioned technical proposal, the concave surface of the resin lens has a circular reticulated film, described netted thin
There is the identical round mesh of several sizes, each circle mesh is in honeycomb arrangement, the aperture of single circle mesh in film
For 0.4~0.6mm, the centre distance between adjacent circular holes is 0.6~0.9mm.
In above structure, mesh is designed to that round hole is due to the hole compared to hexagon or other figures, by wearing
The eyeglass with round hole can be obtained by wearing experiment, and wearing is more comfortable, and infrared absorption effect is more preferable.
It is an advantage of the invention that：Using photoetching technique one layer of translucent cellular infrared absorption of class is formed in lens surface
Membrane structure, the Infrared Absorbing Thin Film structure precisely, specification, keep the light through eyeglass soft as tree shade, hot spot is uniform, energy
It is enough while ensureing eyeglass light transmittance, the light that obstructs and block all directions reflective using chromium, lamp shielding angle is carried close to 90 °
High light utilization, provides the comfortable visual field for human eye, reduces the vision that infra-red radiation is brought and injure, to play protect eyes
From the effect of infrared radiation damage.
Description of the drawings
The invention will be further described below in conjunction with the accompanying drawings.
Fig. 1 is the structural schematic diagram of gradual change type tablet mask plate in the embodiment of the present invention one.
Fig. 2 is the partial enlarged view of Fig. 1.
Fig. 3 is the structural schematic diagram of arc mask plate in the embodiment of the present invention two.
Fig. 4 is the structural schematic diagram of arc mask plate in the embodiment of the present invention three.
Fig. 5 is the structural schematic diagram of arc mask plate in the embodiment of the present invention four.
Fig. 6 is the structural schematic diagram of the stealthy latticed Infrared Absorbing Thin Film of lens surface in the present invention.
Specific implementation mode
The preparation method of the photoetching stealth grid Infrared Absorbing Thin Film resin lens of the present invention, includes the following steps：
The mask plate that the first step, making are adapted to eyeglass, mask plate are arc mask plate or gradual change type tablet mask plate.Arc is covered
The upper surface outwardly convex of film version forms outer convex globoidal, and lower surface is plane, the concave surface phase of outer convex globoidal and resin lens
It coincide, there is the first reticle pattern to match with the mesh on eyeglass concave surface, the first reticle pattern on outer convex globoidal
Case is made of the thin rounded flakes of several outwardly convexs, and each thin rounded flakes convex globoidal outside mask plate is in cellular distribution, round
Lamina dimensions are consistent with the circular hole size on eyeglass concave surface；The upper and lower surface of gradual change type tablet mask plate is plane, on
Surface middle part has the second reticle pattern to match with the mesh on eyeglass concave surface, and the second reticle pattern is by several
The thin rounded flakes of outwardly convex form, and each thin rounded flakes are in cellular distribution, the second reticle pattern in mask plate upper surface
For circle, the second reticle pattern includes central area and annular outer region domain, and central area is located at mask plate upper surface centre bit
Set, a diameter of second reticle pattern diameter 2/9ths, the second reticle pattern remove central area except its remaining part
It is divided into annular outer region domain, a diameter of 0.4~0.6mm of thin rounded flakes being located in central area, the circle being located in the domain of annular outer region
Shape wafer diameters are 0.375~0.575mm.
Second step, preparation meet single hardened resin lens of GB10810 standards.Single hardened resin lens are allyl resins
Single stiffened eyeglass, brominated bisphenol-A diacrylate list stiffened eyeglass or thio polyurethane list stiffened eyeglass.
Third step, resin lens one layer of 1~3 μ m-thick of concave surface even spread positive photoresist, using rotation
Coating method, coating temperature are 23 ± 5 DEG C.Positive photoresist is formulated by following mass percent component：6-Dizao-
5,6-Dihydoro-5- oxygen -1-naphthalene sulfonic aicd, and 2,3,4 esters, dihydroxy benaophenonel 6%；Cresol novalac resin 21%；2- first
Base propanol acetate 73%.
4th step, front baking 2~3min of photoresist under the conditions of temperature is 105 ± 10 DEG C, to remove the solvent in photoresist,
Change its adhesiveness, mitigates photoresist internal stress.
5th step, after mask plate center is aligned with resin lens center, control between mask plate and resin lens away from
From being 2~10 μm, resin lens is made to be fixed with mask plate, mask plate is then used to carry out photolithographic exposure, development to resin lens,
Developed by photolithographic exposure and the hole completely the same with above-mentioned chip shape is effectively formed the concave surface in eyeglass, photolithographic exposure
Condition is 40~45mj/cm2；Development conditions are to impregnate resin lens and mask plate 30 using developer solution at 23 ± 5 DEG C of temperature
~60sec.Developer solution is tetramethylammonium hydroxide（ C4H13NO）.
6th step detaches resin lens with mask plate, and clean resin eyeglass, and clean method is to impregnate to float using DI water
After wash clean eyeglass, dry.
After 7th step, resin lens keep the temperature 10~15min at a temperature of 75 ± 5 DEG C in moist closet, it is put into vacuum coating
Layers of chrome is deposited in machine, coating film thickness is 18~30 Ethylmercurichlorendimides, and plated film rate is 0.5 ± 0.2A/S, and then steam coating silicon dioxide is protected
Layer, coating film thickness are 40~60 Ethylmercurichlorendimides, and plated film rate is 5 ± 2A/S.
8th step makes eyeglass using positive photoresist stripper RBL-3368 cleaning resin lens to remove lens surface glue
Concave surface forms mesh layers of chrome, then wipes eyeglass to clean using the cleaning cloth for glasses for dipping ether.
The concave surface that resin lens are put into vacuum coating equipment using vacuum vapour deposition in eyeglass is plated anti-reflective by the 9th step
Film layer is penetrated, the anti-reflective film layer includes silica membrane and zirconia film.
Tenth step is detected the resin lens of preparation using ultraviolet specrophotometer UV-2550, obtains resin lens
Luminous transmittance be 86~90%；The resin lens of preparation are detected using metallographic microscope, obtain resin lens surface circle
The hole core diameter of shape mesh is 400 ± 40 μm, and the hole heart distance of adjacent circular mesh is 600 ± 30 μm.
There is a circular reticulated film using resin lens concave surface prepared by the above method, have in reticulated film
The identical round mesh of many a sizes, each circle mesh is in honeycomb arrangement, and the aperture of single circle mesh is 0.4~
0.6mm, the centre distance between adjacent circular holes are 0.6~0.9mm.
Embodiment one
1）The mask plate being adapted to eyeglass concave surface is made, mask plate is gradual change type tablet mask plate, and mask plate size is 127
×127nm.The upper and lower surface of gradual change type tablet mask plate is plane, thereon centre of surface have on eyeglass concave surface
The second reticle pattern for matching of mesh, the second reticle pattern is circle（Diameter 90mm）, and the second reticle pattern
It is made of the thin rounded flakes of many outwardly convexs, each thin rounded flakes are in cellular distribution in mask plate upper surface, adjacent two circle
Centre distance between shape thin slice is 0.6~0.9mm, and the second reticle pattern includes central area and annular outer region domain, center
Region is located at upper surface center, a diameter of 20mm, and the second reticle pattern removes the rest part except central area（Directly
Within the scope of diameter 20mm to diameter 90mm）For annular outer region domain, it is located at the thin rounded flakes (within the scope of diameter 20mm) in central area
A diameter of 0.4~0.6mm, a diameter of 0.375~0.575mm of thin rounded flakes being located in the domain of annular outer region（See Fig. 1 and Fig. 2）.
Then, prepare the brominated bisphenol-A diacrylate list stiffened eyeglass that refractive index is 1.600 and uv blocking value is 403nm, eyeglass indent
Surface camber is 2.00C, and optical powers are+3.00D.
2）In the concave surface of eyeglass（Surface close to eyes side）The positive photoresist of one layer of 1.0 μ m-thick of spin coating（Type
Number RZJ-304）, coating temperature is 23 DEG C.
3）Front baking photoresist 3min changes its adherency to remove the solvent in photoresist under the conditions of temperature is 105 DEG C
Property, mitigate photoresist internal stress.
4）After mask plate center is aligned with resin lens center, control the distance between mask plate and resin lens are 2 μ
The upper surface of m, the concave surface and mask plate that make resin lens position, and then mask plate are used to carry out photoetching exposure to resin lens
Light, photolithographic exposure condition are 45mj/cm2.
5）At 23 DEG C of temperature, development 30sec is impregnated using model RZX-3038 developer solutions.By photolithographic exposure and show
Shadow will be effectively formed concave surface in eyeglass with reticulated film.
6）Resin lens are detached with mask plate, and rinsed clean eyeglass is impregnated using DI water, to clean eyeglass, then,
Eyeglass is dried.
7）It after resin lens keep the temperature 12min in 75 DEG C of moist closet, is put into vacuum coating equipment and layers of chrome is deposited, plate film thickness
Degree is 28 Ethylmercurichlorendimides, and plated film rate is 0.5A/S；Then steam coating silicon dioxide protective layer, coating film thickness are 60 Ethylmercurichlorendimides, plated film rate
For 5A/S.
8）Make the indent of eyeglass using positive photoresist stripper RBL-3368 cleaning resin lens to remove lens surface glue
Surface forms mesh layers of chrome, then using dipping the cleaning cloth for glasses of ether by eyeglass wiped clean.
9）The concave surface that resin lens are placed again into vacuum coating equipment using vacuum vapour deposition in eyeglass is plated into anti-reflective
Film layer is penetrated, anti-reflective film layer contains silica and zirconia film.
10）The resin lens of preparation are detected using ultraviolet specrophotometer UV-2550 first, it is seen that light light transmission
Than being 90%；Then the resin lens of preparation are detected using metallographic microscope, obtain resin lens surface circular mesh
Hole core diameter is 400 ± 40 μm, and the hole heart distance of adjacent circular mesh is 600 ± 30 μm（See Fig. 6）.
Embodiment two
1）Make the mask plate that is adapted to eyeglass concave surface, mask plate is arc mask plate, the upper table of arc mask plate towards
Outer lug forms outer convex globoidal（Surface camber is 2.00C）, lower surface is plane, the concave surface of outer convex globoidal and resin lens
It matches, there is the first reticle pattern to match with the mesh on eyeglass concave surface, the first mask plate on outer convex globoidal
Pattern is made of the thin rounded flakes of many outwardly convexs, and each thin rounded flakes convex globoidal outside mask plate is in cellular distribution, circle
Shape lamina dimensions are consistent with the circular hole size on eyeglass concave surface（See Fig. 3）.Then, it is 1.600 and uv blocking to prepare refractive index
Value is the thio polyurethane list stiffened eyeglass of 401nm, and eyeglass concave surface camber is 2.00C, and optical powers are+3.00D.
2）In the concave surface of eyeglass（Surface close to eyes side）The positive photoresist of one layer of 1.5 μ m-thick of spin coating（Type
Number RZJ-304）, coating temperature is 28 DEG C.
3）Front baking photoresist 2.5min changes its adherency to remove the solvent in photoresist under the conditions of temperature is 95 DEG C
Property, mitigate photoresist internal stress.
4）After mask plate center is aligned with resin lens center, control the distance between mask plate and resin lens are 4 μ
The upper surface of m, the concave surface and mask plate that make resin lens position, and then mask plate are used to carry out photoetching exposure to resin lens
Light, photolithographic exposure condition are 45mj/cm2.
5）At 28 DEG C of temperature, development 40sec is impregnated using model RZX-3038 developer solutions.By photolithographic exposure and show
Shadow will be effectively formed concave surface in eyeglass with reticulated film.
6）Resin lens are detached with mask plate, and rinsed clean eyeglass is impregnated using DI water, to clean eyeglass, then,
Eyeglass is dried.
7）It after resin lens keep the temperature 15min in 70 DEG C of moist closet, is put into vacuum coating equipment and layers of chrome is deposited, plate film thickness
Degree is 30 Ethylmercurichlorendimides, and plated film rate is 0.3A/S；Then steam coating silicon dioxide protective layer, coating film thickness are 50 Ethylmercurichlorendimides, plated film rate
For 7A/S.
8）Make the indent of eyeglass using positive photoresist stripper RBL-3368 cleaning resin lens to remove lens surface glue
Surface forms mesh layers of chrome, then using dipping the cleaning cloth for glasses of ether by eyeglass wiped clean.
9）The concave surface that resin lens are placed again into vacuum coating equipment using vacuum vapour deposition in eyeglass is plated into anti-reflective
Film layer is penetrated, anti-reflective film layer contains silica and zirconia film.
10）The resin lens of preparation are detected using ultraviolet specrophotometer UV-2550 first, it is seen that light light transmission
Than being 88%；Then the resin lens of preparation are detected using metallographic microscope, obtain resin lens surface circular mesh
Hole core diameter is 400 ± 40 μm, and the hole heart distance of adjacent circular mesh is 600 ± 30 μm（See Fig. 6）.
Embodiment three
1）Make the mask plate that is adapted to eyeglass concave surface, mask plate is arc mask plate, the upper table of arc mask plate towards
Outer lug forms outer convex globoidal（Surface camber is 4.00C）, lower surface is plane, the concave surface of outer convex globoidal and resin lens
It matches, there is the first reticle pattern to match with the mesh on eyeglass concave surface, the first mask plate on outer convex globoidal
Pattern is made of the thin rounded flakes of many outwardly convexs, and each thin rounded flakes convex globoidal outside mask plate is in cellular distribution, circle
Shape lamina dimensions are consistent with the circular hole size on eyeglass concave surface（See Fig. 4）.Then, it is 1.600 and uv blocking to prepare refractive index
Value be 417nm brominated bisphenol-A diacrylate list stiffened eyeglass, eyeglass concave surface camber be 4.00C, optical powers be+
5.00D。
2）In the concave surface of eyeglass（Surface close to eyes side）The positive photoresist of one layer of 2 μ m-thick of spin coating（Model
RZJ-304）, coating temperature is 18 DEG C.
3）Front baking photoresist 2min changes its adherency to remove the solvent in photoresist under the conditions of temperature is 115 DEG C
Property, mitigate photoresist internal stress.
4）After mask plate center is aligned with resin lens center, control the distance between mask plate and resin lens are 6 μ
The upper surface of m, the concave surface and mask plate that make resin lens position, and then mask plate are used to carry out photoetching exposure to resin lens
Light, photolithographic exposure condition are 40mj/cm2.
5）At 18 DEG C of temperature, development 60sec is impregnated using model RZX-3038 developer solutions.By photolithographic exposure and show
Shadow will be effectively formed concave surface in eyeglass with reticulated film.
6）Resin lens are detached with mask plate, and rinsed clean eyeglass is impregnated using DI water, to clean eyeglass, then,
Eyeglass is dried.
7）It after resin lens keep the temperature 10min in 80 DEG C of moist closet, is put into vacuum coating equipment and layers of chrome is deposited, plate film thickness
Degree is 23 Ethylmercurichlorendimides, and plated film rate is 0.7A/S；Then steam coating silicon dioxide protective layer, coating film thickness are 50 Ethylmercurichlorendimides, plated film rate
For 5A/S.
8）Make the indent of eyeglass using positive photoresist stripper RBL-3368 cleaning resin lens to remove lens surface glue
Surface forms mesh layers of chrome, then using dipping the cleaning cloth for glasses of ether by eyeglass wiped clean.
9）The concave surface that resin lens are placed again into vacuum coating equipment using vacuum vapour deposition in eyeglass is plated into anti-reflective
Film layer is penetrated, anti-reflective film layer contains silica and zirconia film.
10）The resin lens of preparation are detected using ultraviolet specrophotometer UV-2550 first, it is seen that light light transmission
Than being 86%；Then the resin lens of preparation are detected using metallographic microscope, obtain resin lens surface circular mesh
Hole core diameter is 400 ± 40 μm, and the hole heart distance of adjacent circular mesh is 600 ± 30 μm（See Fig. 6）.
Example IV
1）Make the mask plate that is adapted to eyeglass concave surface, mask plate is arc mask plate, the upper table of arc mask plate towards
Outer lug forms outer convex globoidal（Surface camber is 6.00C）, lower surface is plane, the concave surface of outer convex globoidal and resin lens
It matches, there is the first reticle pattern to match with the mesh on eyeglass concave surface, the first mask plate on outer convex globoidal
Pattern is made of the thin rounded flakes of many outwardly convexs, and each thin rounded flakes convex globoidal outside mask plate is in cellular distribution, circle
Shape lamina dimensions are consistent with the circular hole size on eyeglass concave surface（See Fig. 5）.Then, it is 1.600 and uv blocking to prepare refractive index
Value is the allyl resin list stiffened eyeglass of 417nm, and eyeglass concave surface camber is 6.00C, and optical powers are+7.00D.
2）In the concave surface of eyeglass（Surface close to eyes side）The positive photoresist of one layer of 3 μ m-thick of spin coating（Model
RZJ-304）, coating temperature is 23 DEG C.
3）Front baking photoresist 3min changes its adherency to remove the solvent in photoresist under the conditions of temperature is 105 DEG C
Property, mitigate photoresist internal stress.
4）After mask plate center is aligned with resin lens center, control the distance between mask plate and resin lens are 10
μm, the upper surface of the concave surface and mask plate that make resin lens positions, and then mask plate is used to carry out photoetching to resin lens
Exposure, photolithographic exposure condition is 42mj/cm2.
5）At 23 DEG C of temperature, development 50sec is impregnated using model RZX-3038 developer solutions.By photolithographic exposure and show
Shadow will be effectively formed concave surface in eyeglass with reticulated film.
6）Resin lens are detached with mask plate, and rinsed clean eyeglass is impregnated using DI water, to clean eyeglass, then,
Eyeglass is dried.
7）It after resin lens keep the temperature 10min in 75 DEG C of moist closet, is put into vacuum coating equipment and layers of chrome is deposited, plate film thickness
Degree is 18 Ethylmercurichlorendimides, and plated film rate is 0.5A/S；Then steam coating silicon dioxide protective layer, coating film thickness are 40 Ethylmercurichlorendimides, plated film rate
For 3A/S.
8）Make the indent of eyeglass using positive photoresist stripper RBL-3368 cleaning resin lens to remove lens surface glue
Surface forms mesh layers of chrome, then using dipping the cleaning cloth for glasses of ether by eyeglass wiped clean.
9）The concave surface that resin lens are placed again into vacuum coating equipment using vacuum vapour deposition in eyeglass is plated into anti-reflective
Film layer is penetrated, anti-reflective film layer contains silica and zirconia film.
10）The resin lens of preparation are detected using ultraviolet specrophotometer UV-2550 first, it is seen that light light transmission
Than being 87%；Then the resin lens of preparation are detected using metallographic microscope, obtain resin lens surface circular mesh
Hole core diameter is 400 ± 40 μm, and the hole heart distance of adjacent circular mesh is 600 ± 30 μm（See Fig. 6）.
In addition to the implementation, the present invention can also have other embodiment.All use equally replaces equivalent transformation to be formed
Technical solution is fallen within the scope of protection required by the present invention.
Claims (10)
1. a kind of preparation method of photoetching stealth grid Infrared Absorbing Thin Film resin lens, which is characterized in that include the following steps：
The mask plate that the first step, making are adapted to eyeglass, the surface of the mask plate have the thin slice of several outwardly convexs, and each
A thin slice is in cellular distribution on mask plate surface；Go to second step；
Second step, preparation meet single hardened resin lens of GB10810 standards；Go to third step；
Third step, resin lens one layer of 1~3 μ m-thick of concave surface even spread positive photoresist, coating temperature 23
±5℃；Go to the 4th step；
4th step, front baking 2~3min of photoresist under the conditions of temperature is 105 ± 10 DEG C, to remove the solvent in photoresist；It goes to
5th step；
5th step, after mask plate center is aligned with resin lens center, control the distance between mask plate and resin lens be 2
~10 μm, resin lens is made to be fixed with mask plate, mask plate is then used to carry out photolithographic exposure, development to resin lens；It goes to
6th step；
6th step detaches resin lens with mask plate, and clean resin eyeglass；Go to the 7th step；
It after 7th step, resin lens keep the temperature 10~15min at a temperature of 75 ± 5 DEG C, is put into vacuum coating equipment and layers of chrome is deposited, plate
Film thickness is 18~30 Ethylmercurichlorendimides, and plated film rate is 0.5 ± 0.2A/S, then steam coating silicon dioxide protective layer, coating film thickness 40
~60 Ethylmercurichlorendimides, plated film rate are 5 ± 2A/S；Go to the 8th step；
8th step cleans resin lens using positive photoresist stripper, so that the concave surface of eyeglass is formed mesh layers of chrome, then uses
Dip the cleaning cloth for glasses wiping eyeglass of ether；Go to the 9th step；
Resin lens are put into the concave surface coating anti reflection film layer in vacuum coating equipment in eyeglass, the antireflection by the 9th step
Film layer includes silica membrane and zirconia film.
2. a kind of preparation method of photoetching stealth grid Infrared Absorbing Thin Film resin lens according to claim 1, feature
It is：The mask plate is arc mask plate or gradual change type tablet mask plate.
3. a kind of preparation method of photoetching stealth grid Infrared Absorbing Thin Film resin lens according to claim 2, feature
It is：The upper surface outwardly convex of the arc mask plate forms outer convex globoidal, the indent of the outer convex globoidal and resin lens
Surface matches, and has the first reticle pattern to match with the mesh on eyeglass concave surface on the outer convex globoidal.
4. a kind of preparation method of photoetching stealth grid Infrared Absorbing Thin Film resin lens according to claim 3, feature
It is：First reticle pattern is made of the thin rounded flakes of several outwardly convexs, and each thin rounded flakes are in mask plate evagination
Cambered surface is in cellular distribution, and thin rounded flakes size is consistent with the circular hole size on eyeglass concave surface.
5. a kind of preparation method of photoetching stealth grid Infrared Absorbing Thin Film resin lens according to claim 2, feature
It is：The upper surface of the gradual change type tablet mask plate is plane, and the in-plane has and the net on eyeglass concave surface
The second reticle pattern that hole matches.
6. a kind of preparation method of photoetching stealth grid Infrared Absorbing Thin Film resin lens according to claim 5, feature
It is：Second reticle pattern is made of the thin rounded flakes of several outwardly convexs, and each thin rounded flakes are in mask plate plane
In cellular distribution；Second reticle pattern is circle, and second reticle pattern includes outside central area and annular
Region, the central area be located at mask plate planar central position, a diameter of second reticle pattern diameter 2/9ths；Position
In a diameter of 0.4~0.6mm of thin rounded flakes in central area, the thin rounded flakes a diameter of 0.375 being located in the domain of annular outer region
~0.575mm.
7. a kind of preparation method of photoetching stealth grid Infrared Absorbing Thin Film resin lens according to claim 1, feature
It is, it is further comprising the steps of：Tenth step is detected the resin lens of preparation using ultraviolet specrophotometer, is set
The luminous transmittance of fat eyeglass is 86~90%；The resin lens of preparation are detected using metallographic microscope, obtain resin lens
The hole core diameter of surface mesh is 400 ± 40 μm, and the hole heart distance of adjoining cells is 600 ± 30 μm.
8. the photoetching stealth grid Infrared Absorbing Thin Film resin lens prepared according to any one of claim 1 to 6 the method.
9. a kind of photoetching stealth grid Infrared Absorbing Thin Film resin lens according to claim 8, it is characterised in that：The tree
The surface of fat eyeglass has stealthy mesh chrome layer.
10. a kind of photoetching stealth grid Infrared Absorbing Thin Film resin lens according to claim 9, it is characterised in that：It is described
The concave surface of resin lens has a circular reticulated film, has the identical circle of several sizes in the reticulated film
Mesh, each circle mesh is in honeycomb arrangement, and the aperture of single circle mesh is 0.4~0.6mm, between adjacent circular holes in
Heart distance is 0.6~0.9mm.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810105504.8A CN108415222B (en) | 2018-02-02 | 2018-02-02 | Photolithographic invisible grid infrared absorption film resin lens and preparation method thereof |
| PCT/CN2018/077813 WO2019148572A1 (en) | 2018-02-02 | 2018-03-02 | Photolithographic invisible grid infrared absorption film resin lens and preparation method therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201810105504.8A CN108415222B (en) | 2018-02-02 | 2018-02-02 | Photolithographic invisible grid infrared absorption film resin lens and preparation method thereof |
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| CN108415222A true CN108415222A (en) | 2018-08-17 |
| CN108415222B CN108415222B (en) | 2021-07-09 |
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| WO (1) | WO2019148572A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113311515A (en) * | 2020-02-25 | 2021-08-27 | 华为技术有限公司 | Camera lens, camera module and electronic equipment |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1266501A (en) * | 1998-07-31 | 2000-09-13 | 青山眼镜株式会社 | Spectacle lens a method of producing the same |
| US8177358B2 (en) * | 2008-10-09 | 2012-05-15 | SOL-Grid, LLC. | Polarized eyewear |
| CN102981369A (en) * | 2012-12-20 | 2013-03-20 | 福建福晶科技股份有限公司 | Optical filming side stopping method |
| CN105204180A (en) * | 2015-09-23 | 2015-12-30 | 江苏视客光学眼镜有限公司 | Manufacturing method and device of compound eye lens |
| JP6165018B2 (en) * | 2013-10-11 | 2017-07-19 | 旭化成株式会社 | Polarizing member, spectacle lens, polarized sunglasses, and combiner |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7771045B2 (en) * | 2008-04-03 | 2010-08-10 | Sol-Grid, Llc | Polarized eyewear |
| CN105296942A (en) * | 2015-12-04 | 2016-02-03 | 北极光电(深圳)有限公司 | Method adopting photoetching mask lifting method for achieving optical coating |
-
2018
- 2018-02-02 CN CN201810105504.8A patent/CN108415222B/en active Active
- 2018-03-02 WO PCT/CN2018/077813 patent/WO2019148572A1/en active Application Filing
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1266501A (en) * | 1998-07-31 | 2000-09-13 | 青山眼镜株式会社 | Spectacle lens a method of producing the same |
| US8177358B2 (en) * | 2008-10-09 | 2012-05-15 | SOL-Grid, LLC. | Polarized eyewear |
| CN102981369A (en) * | 2012-12-20 | 2013-03-20 | 福建福晶科技股份有限公司 | Optical filming side stopping method |
| JP6165018B2 (en) * | 2013-10-11 | 2017-07-19 | 旭化成株式会社 | Polarizing member, spectacle lens, polarized sunglasses, and combiner |
| CN105204180A (en) * | 2015-09-23 | 2015-12-30 | 江苏视客光学眼镜有限公司 | Manufacturing method and device of compound eye lens |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113311515A (en) * | 2020-02-25 | 2021-08-27 | 华为技术有限公司 | Camera lens, camera module and electronic equipment |
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| WO2019148572A1 (en) | 2019-08-08 |
| CN108415222B (en) | 2021-07-09 |
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