CN102981297A - Implement method of ON CELL - Google Patents

Implement method of ON CELL Download PDF

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Publication number
CN102981297A
CN102981297A CN201210421219XA CN201210421219A CN102981297A CN 102981297 A CN102981297 A CN 102981297A CN 201210421219X A CN201210421219X A CN 201210421219XA CN 201210421219 A CN201210421219 A CN 201210421219A CN 102981297 A CN102981297 A CN 102981297A
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China
Prior art keywords
thin film
touch function
photoresist
conductive film
fpc
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CN201210421219XA
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Chinese (zh)
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CN102981297B (en
Inventor
周朝平
林钟泉
肖新煌
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BENGBU FINGERPRINT TECHNOLOGY Co.,Ltd.
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SUNOPTIC TECHNOLOGY Co Ltd
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Publication of CN102981297A publication Critical patent/CN102981297A/en
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Abstract

The invention discloses an implement method of ON CELL. The implement method comprises a liquid crystal display, a flexible printed circuit (FPC) and a conductive thin film with a touch function. The manufacture method of the conductive thin film with the touch function includes the following steps: an indium tin diode (ITO) layer is coated on the thin film in a vacuum sputtering mode, coating photoresist, exposing the photoresist, developing and hardening the photoresist, etching the ITO thin film layer, eliminating the photoresist to form an ITO electrode and manufacture the conductive thin film with the touch function; pasting the FPC on the conductive thin film with the touch function through the heat press method, then pasting the pasted conductive thin film with the touch function on the liquid crystal display, and attaching one side face of the FPC to one side face of the liquid crystal display. The conductive thin film with the touch function is adopted on the liquid crystal display, so the integration of the liquid crystal display and touch screen components is realized and the display function can not be affected. Products are enabled to be lighter and thinner, and material cost and manual cost are reduced.

Description

The implementation method of a kind of ON CELL
Technical field
The present invention relates to the electronic devices and components field, particularly the implementation method of a kind of ON CELL.
Background technology
ON CELL refers to touch panel function is embedded into method between colored filter substrate and the Polarizer.Original technology is that liquid crystal display is in the same place with the touch panel component combination; FPC is sticked on the Sensor by the mode of hot pressing, with the optics transparent adhesive tape cover plate and the good Sensor of hot pressing are pasted together again, at last liquid crystal display and the component combination that pastes are in the same place.The shortcoming of this method: product is whole heavier and thick, and touch screen panel plate material and production cost are higher.
Summary of the invention
Purpose of the present invention provides the implementation method of a kind of ON CELL, use the film with touch function to replace traditional external capacitive touch screen on liquid crystal display, thereby so that product is lighter and thinner and can reduce material and cost of labor.
To achieve these goals, the present invention has adopted following technical scheme:
The implementation method of a kind of ON CELL is characterized in that, includes LCDs, FPC, with the conductive film of touch function, and concrete grammar may further comprise the steps:
(1) make conductive film with touch function:
Method for making with the conductive film of touch function may further comprise the steps:
1), on film vacuum sputtering ITO layer, vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of ito thin film layer;
2), the coating photoresist, etched ito thin film layer is covered, the thickness 1600 ~ 2000nm of photoresist, in the homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;
3), photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of ITO electrode pattern is chromium plate, apart from the size 100um of substrate ~ 200um;
4), to photoresist developing and sclerosis, adopt NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;
5), etching ito thin film layer, form ito thin film layer electrode pattern, material: HCL60% ~ 6,5%+,HO2 40% ~ 35% is used in etching, temperature: 40 ~ 45 ℃, the time: 120 ~ 220 seconds;
6), remove photoresist, formation ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, use at last the pure water rinsing;
7) make conductive film with touch function;
(2) mode of FPC by hot pressing sticked on the conductive film with touch function;
The conductive film with touch function that (3) will paste again sticks on the liquid crystal display, and the side of FPC is close on the side of LCDs.
The invention has the advantages that:
The present invention on liquid crystal display use with the conductive film of touch function, so that liquid crystal display and touch-screen parts are realized integrated and do not affected Presentation Function; So that product is lighter and thinner and can reduce material and cost of labor.
Description of drawings
Fig. 1 is the LCDs that pastes, FPC, with the structural representation of the conductive film of touch function.
Embodiment
As shown in Figure 1, the implementation method of a kind of ON CELL includes LCDs 1, FPC 2, with the conductive film 3 of touch function, and concrete grammar may further comprise the steps:
(1) make conductive film 3 with touch function:
Method for making with the conductive film 3 of touch function may further comprise the steps:
1), on film vacuum sputtering ITO layer, vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of ito thin film layer;
2), the coating photoresist, etched ito thin film layer is covered, the thickness 1600 ~ 2000nm of photoresist, in the homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;
3), photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of ITO electrode pattern is chromium plate, apart from the size 100um of substrate ~ 200um;
4), to photoresist developing and sclerosis, adopt NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;
5), etching ito thin film layer, form ito thin film layer electrode pattern, material: HCL60% ~ 6,5%+,HO2 40% ~ 35% is used in etching, temperature: 40 ~ 45 ℃, the time: 120 ~ 220 seconds;
6), remove photoresist, formation ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, use at last the pure water rinsing;
7) make conductive film 3 with touch function;
(2) mode of FPC 2 by hot pressing sticked on the conductive film 3 with touch function;
The conductive film 3 with touch function that will paste again sticks on the liquid crystal display 1, and the side of FPC 2 is close on the side of LCDs 1.

Claims (1)

1. the implementation method of an ON CELL is characterized in that, includes LCDs, FPC, with the conductive film of touch function, and concrete grammar may further comprise the steps:
(1) make conductive film with touch function:
Method for making with the conductive film of touch function may further comprise the steps:
1), on film vacuum sputtering ITO layer, vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of ito thin film layer;
2), the coating photoresist, etched ito thin film layer is covered, the thickness 1600 ~ 2000nm of photoresist, in the homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;
3), photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of ITO electrode pattern is chromium plate, apart from the size 100um of substrate ~ 200um;
4), to photoresist developing and sclerosis, adopt NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;
5), etching ito thin film layer, form ito thin film layer electrode pattern, material: HCL60% ~ 6,5%+,HO2 40% ~ 35% is used in etching, temperature: 40 ~ 45 ℃, the time: 120 ~ 220 seconds;
6), remove photoresist, formation ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, use at last the pure water rinsing;
7) make conductive film with touch function;
(2) mode of FPC by hot pressing sticked on the conductive film with touch function;
The conductive film with touch function that (3) will paste again sticks on the liquid crystal display, and the side of FPC is close on the side of LCDs.
CN201210421219.XA 2012-10-29 2012-10-29 The implementation method of a kind of ON CELL Active CN102981297B (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103294306A (en) * 2013-05-09 2013-09-11 晟光科技股份有限公司 Simplified production method for capacitive touch screen
CN103324371A (en) * 2013-05-20 2013-09-25 晟光科技股份有限公司 Manufacturing method of OGS (one glass solution) capacitive touch screen
WO2016026234A1 (en) * 2014-08-22 2016-02-25 京东方科技集团股份有限公司 Touch panel and manufacturing method thereof and touch display device
CN105843453A (en) * 2016-05-25 2016-08-10 北京京东方显示技术有限公司 Manufacturing method of touch screen, touch screen and display substrate

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1253465A (en) * 1998-11-10 2000-05-17 华通电脑股份有限公司 Built-in fingered flat capacitor and resistor and making method thereof
CN101135797A (en) * 2007-09-30 2008-03-05 京东方科技集团股份有限公司 Optical organic membrane structure of display apparatus and display apparatus
JP2010060725A (en) * 2008-09-02 2010-03-18 Toshiba Mobile Display Co Ltd Liquid crystal display device
CN101817108A (en) * 2010-03-24 2010-09-01 江苏大学 Method and device for realizing photoelectrochemical micro-etch processing of masked electrode
CN102096534A (en) * 2010-12-31 2011-06-15 晟光科技股份有限公司 Production method of electrode of capacitive touch screen

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1253465A (en) * 1998-11-10 2000-05-17 华通电脑股份有限公司 Built-in fingered flat capacitor and resistor and making method thereof
CN101135797A (en) * 2007-09-30 2008-03-05 京东方科技集团股份有限公司 Optical organic membrane structure of display apparatus and display apparatus
JP2010060725A (en) * 2008-09-02 2010-03-18 Toshiba Mobile Display Co Ltd Liquid crystal display device
CN101817108A (en) * 2010-03-24 2010-09-01 江苏大学 Method and device for realizing photoelectrochemical micro-etch processing of masked electrode
CN102096534A (en) * 2010-12-31 2011-06-15 晟光科技股份有限公司 Production method of electrode of capacitive touch screen

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103294306A (en) * 2013-05-09 2013-09-11 晟光科技股份有限公司 Simplified production method for capacitive touch screen
CN103324371A (en) * 2013-05-20 2013-09-25 晟光科技股份有限公司 Manufacturing method of OGS (one glass solution) capacitive touch screen
WO2016026234A1 (en) * 2014-08-22 2016-02-25 京东方科技集团股份有限公司 Touch panel and manufacturing method thereof and touch display device
US9753572B2 (en) 2014-08-22 2017-09-05 Boe Technology Group Co., Ltd. Touch panel, method of fabricating the same and touch display device
CN105843453A (en) * 2016-05-25 2016-08-10 北京京东方显示技术有限公司 Manufacturing method of touch screen, touch screen and display substrate
CN105843453B (en) * 2016-05-25 2021-10-29 北京京东方显示技术有限公司 Touch screen manufacturing method, touch screen and display substrate

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Address after: 233040 No.1 Factory building, 958 Yingbin Avenue, Bengbu City, Anhui Province

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Patentee before: SUNOPTIC TECHNOLOGY Co.,Ltd.

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