CN103294307B - A kind of OGS touch screen method for making of improvement - Google Patents
A kind of OGS touch screen method for making of improvement Download PDFInfo
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Abstract
The invention discloses a kind of OGS touch screen method for making of improvement, glass cover-plate directly makes transparent electrode layer and graphical, on the pin then flexible circuit board FPC being connected to electrode layer by heat pressing process; Simultaneously, the second polaroid of LCD screen arranges black light shield layer, final formation has liquid crystal display (LCD) screen of multi-point touch function.The technical matters of the ink light shield layer non-refractory that the present invention runs into when can solve current OGS production, enhances product performance and reliability, reduces and produces yield, enhance productivity, and gets through the bottleneck on OGS touch screen production and processing procedure.
Description
Technical field
The present invention relates to touch-screen field, refer more particularly to a kind of OGS touch screen method for making of improvement.
Background technology
Touch-screen is as the intelligentized human-computer interaction interface product of one, a lot of fields in social production and life obtain applies more and more widely, especially with the fastest developing speed in consumer electronics sector (as the field such as smart mobile phone, panel computer).
Capacitive touch screen is touch-screen product of new generation after being relay resistive touch screen, and it has had qualitative leap than the product of previous generation in performance, not only shows and is quick on the draw, and support multi-point touch, and the life-span is long.And the OGS product of a new generation is the new developing direction of capacitive touch screen, from technological layer, OGS technology is simple, light, thin than the G/G touch technology structure of current main flow, light transmission is good; Owing to saving a slice glass baseplate and bonding process, be beneficial to and reduce production cost, raising product yield.
At present, common OGS touch screen module method for making as shown in Figure 1, first on glass cover-plate 11 painting black photosensitive material (BM) 12 as light shield layer, cover organic leveling layer (OC) 16 more in the above afterwards, so that follow-up making ito transparent electrode, then graphical ito transparent electrode layer 13 is made, by flexible circuit board FPC14(with touch-control IC15) form OGS touch screen module 1 on the pin that is connected to ITO pattern electrode layer 13 by hot pressing, finally OGS touch screen module 1 and liquid crystal display 2 are fitted, form the display with multi-point touch function.
The disadvantage of this OGS module method for making is:
(1) due to the self reason of material, BM film thicker (generally thickness is 2 μm) just must can reach the blackness requirement of shading region, and thicker BM film will produce harsh requirement to subsequent technique, increase the difficulty that subsequent technique is implemented;
(2) BM material can not be high temperature resistant, because technological process subsequently needs at its surface coverage OC layer, namely temperature is greater than 250 DEG C can there is carbonization phenomenon, and this causes extreme difficulties by giving follow-up ITO plated film, form free electrode simultaneously, the capacitance signal of normal touch can be disturbed.
Summary of the invention
Object of the present invention is exactly the problem for above-mentioned BM non-refractory, proposes a kind of OGS touch screen method for making of improvement.
The technical solution used in the present invention is:
An OGS touch screen method for making for improvement, is characterized in that, comprise the following steps:
(1) ito transparent electrode layer is made in glass cover plate surfaces
The method of vacuum magnetic-control sputtering is utilized on glass cover-plate, to make ITO nesa coating as sensor electrode layer, concrete technology parameter: plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 DEG C, the thickness 10nm ~ 20nm of ito thin film layer;
(2) graphical treatment is carried out to ito transparent electrode layer
ITO nesa coating is completed the graphical of ito transparent electrode layer, concrete technology and parameter through operations such as cleaning, gluing, exposure, development, post bake, stripings:
Coating photoresist, covers the ito thin film layer of etching, the thickness 1600 ~ 2000nm of photoresist, within homogeneity 5%, and preliminary drying temperature: 80 ~ 90 DEG C;
Expose photoresist, i.e. photoetching electrode pattern on a photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, and the light shield of ITO electrode pattern is chromium plate, the size 100um ~ 200um of distance substrate;
Photoresist developing is hardened, adopts NaOH solution, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 DEG C, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 DEG C, 30 ~ 35 minutes time;
Etching ito thin film layer, form ito thin film layer electrode pattern, etching uses material: HCL60% ~ 65%+HO240% ~ 35%, temperature: 40 ~ 45 DEG C, time: 120 ~ 220 seconds;
Remove photoresist, form ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 DEG C, 100 seconds ~ 120 seconds time, finally uses pure water rinsing;
(3) what flexible circuit board FPC is connected to ito transparent electrode layer walks wire pin
By heat pressing process, first anisotropic conducting film (ACF) is pressed on the pin of ito transparent electrode layer, then the FPC with touch-control IC is pressed on ACF, complete FPC and be connected with the electricity of ito transparent electrode layer pin, concrete technology parameter:
The connection of ACF: hot pressing temperature 90 DEG C, hot pressing time 3s, hot pressing pressure 0.154MPa;
The connection of FPC: hot pressing temperature 290 DEG C, hot pressing time 10s, hot pressing pressure 0.21MPa;
(4) making of black light shield layer
The polaroid with black light shield layer is formed by the method for serigraphy black ink on polaroid surface,
Concrete technology parameter:
The distance of half tone and polaroid: net distance: 3.0-4.0mm, height 20-30mm scraped by glue, and angle scraped by glue: 60-85 degree, and pressure 3.0-4.0Mpa scraped by glue;
Baking sintering: baking box put into by the glass that silk-screen is good; The baking box heating-up time is 15-30min, and constant temperature time is 25-35min, and temperature is 70 ~ 80 DEG C, and the temperature difference is not more than 5 DEG C;
(5) attaching process
The polaroid with black light shield layer made is attached to the upper surface of LCD screen by Optical transparent adhesive, then the cover-plate glass with sensor is attached to the upper surface of LCD screen by optical glue, black light shield layer, just to sensor electrode layer, finally forms the LCD screen with multi-point touch function by above-mentioned laminating.
The OGS touch screen method for making of described improvement, is characterized in that, described FPC surface coating black protective seam, is consistent with light shield layer color.
The OGS touch screen method for making of described improvement, is characterized in that, described glass cover-plate adopts protection tempered glass.
The OGS touch screen method for making of described improvement, is characterized in that, described Optical transparent adhesive can adopt OCA optical cement.
The OGS touch screen method for making of described improvement, is characterized in that, described optical glue can adopt glue.
Advantage of the present invention is:
Relative to existing technology, OGS touch screen method for making provided by the invention, black light shield layer on cover-plate glass is transferred on the second polaroid of liquid crystal display, on the one hand, black light shield layer is produced on polaroid by the method for ink for screen printing, do not need too high temperature (about tens degree), therefore can not cause high temperature cabonization problem and cause product bad; On the other hand, owing to being directly make ITO pattern electrode layer on glass, the performance of sensor and stability access good guarantee.
Accompanying drawing explanation
Fig. 1 is the structural representation of existing OGS touch screen.
Fig. 2 is the structural representation of LCD screen panel.
Fig. 3 is the structural representation of the OGS touch screen after improving.
Fig. 4 be improve after OGS touch screen and LCD screen fit after structural representation.
Embodiment
The technical matters solved to make the present invention, technical scheme allow those of ordinary skill in the art clearly understand, illustrate below in conjunction with accompanying drawing, are described in further detail the present invention.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
First the panel construction of LCD screen 2 is introduced, as shown in Figure 2, comprise first substrate 21, second substrate 22, liquid crystal layer 23, first polaroid 24 and the second polaroid 25, wherein, liquid crystal layer 23 is formed between first substrate 21 and second substrate 22, first polaroid 24 invests the outside surface of first substrate 21, and the second polaroid 25 invests the outside surface of second substrate 22.
As shown in Figure 3, a kind of OGS touch screen method for making of improvement, concrete grammar step:
1, tempered glass is protected at glass cover-plate 31() surface making ito transparent electrode layer 32
The method of vacuum magnetic-control sputtering is utilized on glass cover-plate 31, to make ITO nesa coating as sensor electrode layer, concrete technology parameter: plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 DEG C, the thickness 10nm ~ 20nm of ito thin film layer;
2, graphical treatment is carried out to ito transparent electrode layer 32
ITO nesa coating is completed the graphical of ito transparent electrode layer, concrete technology parameter through operations such as cleaning, gluing, exposure, development, post bake, stripings:
Coating photoresist, covers the ito thin film layer of etching, the thickness 1600 ~ 2000nm of photoresist, within homogeneity 5%, and preliminary drying temperature: 80 ~ 90 DEG C;
Expose photoresist, i.e. photoetching electrode pattern on a photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, and the light shield of ITO electrode pattern is chromium plate, the size 100um ~ 200um of distance substrate;
Photoresist developing is hardened, adopts NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 DEG C, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 DEG C, 30 ~ 35 minutes time;
Etching ito thin film layer, form ito thin film layer electrode pattern, etching uses material: HCL60% ~ 65%+HO240% ~ 35%, temperature: 40 ~ 45 DEG C, time: 120 ~ 220 seconds;
Remove photoresist, form ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 DEG C, 100 seconds ~ 120 seconds time, finally uses pure water rinsing;
What 3, flexible circuit board FPC33 is connected to ito transparent electrode layer 32 walks wire pin
Pass through heat pressing process, first anisotropic conducting film (ACF) is pressed on the pin of ito transparent electrode layer 32, then the FPC33 with touch-control IC34 is pressed on ACF, completes FPC33 and be connected with the electricity of ito transparent electrode layer 32 pin, concrete technology parameter:
The connection of ACF: hot pressing temperature 90 DEG C, hot pressing time 3s, hot pressing pressure 0.154MPa;
The connection of FPC: hot pressing temperature 290 DEG C, hot pressing time 10s, hot pressing pressure 0.21MPa;
4, the making of black light shield layer
The polaroid 35 with black light shield layer 36 is formed by the method for serigraphy black ink on polaroid 35 surface, concrete technology parameter:
The distance of half tone and polaroid 35: net distance: 3.0-4.0mm, height 20-30mm scraped by glue, and angle scraped by glue: 60-85 degree, and pressure 3.0-4.0Mpa scraped by glue;
Baking sintering: baking box put into by the glass that silk-screen is good; The baking box heating-up time is 15-30min, and constant temperature time is 25-35min, and temperature is 70 ~ 80 DEG C, and the temperature difference is not more than 5 DEG C.
5, attaching process
The polaroid 35 with black light shield layer 36 made is attached to the upper surface of LCD screen by Optical transparent adhesive (as OCA optical cement), then the cover-plate glass 31 with sensor is attached to the upper surface of LCD screen by optical glue (as glue), black light shield layer 36, just to sensor electrode layer, finally forms the LCD screen with multi-point touch function by above-mentioned laminating.
Fig. 4 is the liquid crystal display with touch controllable function after laminating, the above-mentioned polaroid with black light shield layer is fitted to the LCD screen of second substrate upper surface formation with black light shield layer of LCD screen 45, then by the cover-plate glass 41 with sensor by Optical transparent adhesive 47(as glue) fit with LCD screen, the final liquid crystal display 4 formed with touch controllable function.
Claims (5)
1. the OGS touch screen method for making improved, is characterized in that, comprise the following steps:
(1) making ito transparent electrode layer in glass cover plate surfaces utilizes the method for vacuum magnetic-control sputtering on glass cover-plate, to make ITO nesa coating as sensor electrode layer, concrete technology parameter: plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 DEG C, the thickness 10nm ~ 20nm of ito thin film layer;
(2) graphical treatment is carried out to ito transparent electrode layer and ITO nesa coating is completed the graphical of ito transparent electrode layer through cleaning, gluing, exposure, development, post bake, striping operation, concrete technology and parameter: coating photoresist, the ito thin film layer of etching is covered, thickness 1600 ~ the 2000nm of photoresist, within homogeneity 5%, preliminary drying temperature: 80 ~ 90 DEG C; Expose photoresist, i.e. photoetching electrode pattern on a photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, and the light shield of ITO electrode pattern is chromium plate, the size 100um ~ 200um of distance substrate; Photoresist developing is hardened, adopts NaOH solution, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 DEG C, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 DEG C, 30 ~ 35 minutes time; Etching ito thin film layer, form ito thin film layer electrode pattern, etching uses material: HCL60% ~ 65%+HO240% ~ 35%, temperature: 40 ~ 45 DEG C, time: 120 ~ 220 seconds; Remove photoresist, form ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 DEG C, 100 seconds ~ 120 seconds time, finally uses pure water rinsing;
(3) what flexible circuit board FPC is connected to ito transparent electrode layer walks wire pin, pass through heat pressing process, first anisotropic conducting film ACF is pressed on the pin of ito transparent electrode layer, then the FPC with touch-control IC is pressed on anisotropic conducting film ACF, complete FPC to be connected with the electricity of ito transparent electrode layer pin, the connection of concrete technology parameter: ACF: hot pressing temperature 90 DEG C, hot pressing time 3s, hot pressing pressure 0.154MPa; The connection of FPC: hot pressing temperature 290 DEG C, hot pressing time 10s, hot pressing pressure 0.21MPa;
(4) the surperficial method by serigraphy black ink of polaroid that is produced on of black light shield layer forms the polaroid with black light shield layer, concrete technology parameter: the distance of half tone and polaroid: net distance: 3.0-4.0mm, height 20-30mm scraped by glue, angle scraped by glue: 60-85 degree, and pressure 3.0-4.0MPa scraped by glue; Baking sintering: baking box put into by the glass that silk-screen is good; The baking box heating-up time is 15-30min, and constant temperature time is 25-35min, and temperature is 70 ~ 80 DEG C, and the temperature difference is not more than 5 DEG C;
(5) polaroid with black light shield layer made is attached to the upper surface of LCD screen by attaching process by Optical transparent adhesive, then the cover-plate glass with sensor is attached to the upper surface of LCD screen by optical glue, black light shield layer, just to sensor electrode layer, finally forms the LCD screen with multi-point touch function by above-mentioned laminating.
2. the OGS touch screen method for making improved as claimed in claim 1, is characterized in that, described FPC surface coating black protective seam, is consistent with light shield layer color.
3. the OGS touch screen method for making improved as claimed in claim 1, is characterized in that, described glass cover-plate adopts protection tempered glass.
4. the OGS touch screen method for making improved as claimed in claim 1, it is characterized in that, described Optical transparent adhesive can adopt OCA optical cement.
5. the OGS touch screen method for making improved as claimed in claim 1, it is characterized in that, described optical glue can adopt glue.
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