CN106033289A - Black-white lattice touch liquid crystal screen and manufacturing method thereof - Google Patents
Black-white lattice touch liquid crystal screen and manufacturing method thereof Download PDFInfo
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- CN106033289A CN106033289A CN201510120858.6A CN201510120858A CN106033289A CN 106033289 A CN106033289 A CN 106033289A CN 201510120858 A CN201510120858 A CN 201510120858A CN 106033289 A CN106033289 A CN 106033289A
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- glass substrate
- liquid crystal
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- control electrode
- ito film
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- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000011521 glass Substances 0.000 claims abstract description 128
- 239000000758 substrate Substances 0.000 claims abstract description 92
- 238000005530 etching Methods 0.000 claims abstract description 30
- 210000002858 crystal cell Anatomy 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 11
- 229920002120 photoresistant polymer Polymers 0.000 claims description 30
- 239000011248 coating agent Substances 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 9
- 238000001259 photo etching Methods 0.000 claims description 9
- 238000010030 laminating Methods 0.000 claims description 8
- 238000004026 adhesive bonding Methods 0.000 claims description 6
- 238000007711 solidification Methods 0.000 claims 2
- 230000008023 solidification Effects 0.000 claims 2
- 238000005516 engineering process Methods 0.000 abstract description 3
- 230000001681 protective effect Effects 0.000 abstract 2
- 239000010408 film Substances 0.000 description 37
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 244000144987 brood Species 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000036039 immunity Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
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Abstract
Provided is a black-white lattice touch liquid crystal screen and a manufacturing method thereof. The touch liquid crystal screen includes a liquid crystal cell, a liquid crystal layer in the liquid crystal cell, and a touch control electrode, the liquid crystal cell includes an upper glass substrate, a lower glass substrate, and display electrodes, the upper and lower surfaces of the upper glass substrate are respectively plated with ITO films, the sheet-like touch control electrode is etched on the ITO film of the upper surface, a polaroid is applied to the upper part of the touch control electrode, and the display electrodes are etched on the lower surface of the upper glass substrate and the upper surface of the lower glass substrate. The sheet-like touch control electrode is simple in structure and is resistant to interference between buttons. By pasting protective glass, the ITO conductive layers on the back sides of the glass substrates are subjected to etching protection, and the protective glass can be removed after the pattern on one side is etched. The method is simple in technology, thereby effectively protecting the back electrodes of the glass substrates and improving the lithographic quality of the glass substrates.
Description
Technical field
The present invention relates to technical field of liquid crystal display, particularly a kind of touch LCD screen and preparation method thereof.
Background technology
Universal along with liquid crystal mobile phone and TV, the advantages such as LCDs (LCD) is increasingly becoming the most widely used display device, and LCD is little with its volume, low in energy consumption, radiationless occupy the leading position in plane display field.Wherein, touch LCD screen is to carry out integrated by input with outlet terminal, can complete to control operation in display screen surface.Touch LCDs can be divided into capacitance plate and touch screens, wherein, capacitance plate is the ITO(indium tin oxide pasting layer of transparent on a liquid crystal display) thin film, ito thin film is exposed, develops, etches, the operation such as remove photoresist, complete the making of capacitance plate.
During making capacitance touch display screen; need to etch electrode pattern respectively in the ito film (i.e. ITO conductive layer) on the most lower two surfaces; therefore the one side at glass substrate needs when performing etching operation to protect the ITO conductive layer of another side, prevents the ito film at the etching liquid corrosion back side.Existing etching resist technology is coating acid-proof ink in the ito film at the glass substrate back side; but it is easily generated bubble during coating acid-proof ink; so; it is in the ito film of the bubble position corrosion that is then etched and produces tiny empty pin hole; make the conductive area in ito film reduce and the phenomenon of rupture of electrode in ito film even occurs, so that affecting the quality of display screen.
Summary of the invention
The technical problem to be solved is the defect overcoming prior art, a kind of black and white lattice touch LCD screen and preparation method thereof is provided, it is to etch touch control electrode and show electrode respectively in the ito film on upper and lower two surfaces of top glass substrate, and its touch electrode structure is simple, strong interference immunity between button.
In addition, the present invention also provides the manufacture method of this liquid crystal display screen, when etching the ito film of top glass substrate respectively, can protect the ito film of non-etched surface, have the advantages that technique is simple, photoetching quality is good.
Of the present invention technical problem is that with following technical proposals realize:
A kind of black and white lattice touch LCD screen, it includes that the liquid crystal layer within liquid crystal cell, liquid crystal cell and touch control electrode, described liquid crystal cell include top glass substrate, lower glass substrate and show electrode；The upper and lower surface of top glass substrate is coated with ito film respectively, and the ito film of upper surface is etched with the touch control electrode of lamellar, and touch control electrode top laminating polaroid, the lower surface of top glass substrate and the upper surface of lower glass substrate etch show electrode respectively.
Above-mentioned black and white lattice touch LCD screen, the surface resistance of described ito film be 10 Ω-20 Ω/
。
Above-mentioned black and white lattice touch LCD screen, the thickness of described upper and lower glass substrate is 0.4-1.1 millimeter, and the flatness of upper and lower glass substrate is ＜ 500/20mm.
The manufacture method of a kind of above-mentioned black and white lattice touch LCD screen, is carried out as follows:
Step one, the photoetching in touch control electrode face: a, glass substrate with two-sided ito film is loaded in framework, clean the touch control electrode face of glass substrate, resist coating, b, it is irradiated on photoresist be exposed by electrode pattern with ultraviolet, the photoresist removing exposed portion with developer solution develops, and heating cure, c, fetch protection glass gluing to the glass substrate back side needing etching, photoresist is coated around protection glass, with the gap between closed glass substrate and protection glass, secondary heating solidifies, d, in ito film, touch control electrode is etched with etching liquid, e, remove protection glass, stripping photoresist；
Step 2, photoetching to show electrode face: a, clean the show electrode face of glass substrate; resist coating; b, expose, develop; heating cure, c, fetches protection the glass gluing touch control electrode face to glass substrate, coats photoresist around protection glass; secondary heating solidifies; d, in ito film, etch show electrode, e, remove protection glass, stripping photoresist；Thus complete the two-sided etching of top glass substrate；
Step 3, the top glass substrate etched and the lower glass substrate being etched with show electrode are combined into liquid crystal cell, make capacitance touch screen.
Its manufacture method of above-mentioned black and white lattice touch LCD screen, the thickness of described protection glass is 0.8-1.1mm.
The present invention be LCD be the dot matrix type touching display screen of multipoint mode, the ito film on upper and lower two surfaces of top glass substrate etches touch control electrode and show electrode according to design circuit respectively, and in lower glass substrate upper surface ito film, etch show electrode, upper and lower glass substrate and middle liquid crystal layer composition liquid crystal cell.Wherein touch control electrode is the touch block that several are independent, each touch block can sense the signal touching and producing a capacitance variations, it is delivered in single-chip microcomputer by connecting the contact conductor touching block, single-chip microcomputer makes corresponding reaction according to touch location, and shown on liquid crystal display screen by show electrode, thus avoid the touch control electrode row touch control electrode of existing TFT-LCD and the intersection point of row touch control electrode to represent the mode of the position of touch.The touch control part separation structure formed by independent touch block is simple, decreases interelectrode wiring problem, and each button is not likely to produce interference from each other, reduces the occurrence probability of maloperation.
To needing the top glass substrate of two-sided etching when a photoetching ITO conductive layer therein; after completing exposure, development step; on the ITO conductive layer at the glass substrate back side, laminating is protected glass and makes to close with photoresist, after completing etching, removes protection glass.The etching operation of top glass substrate another side is carried out with same etching guard method.Owing to protection glass covers on top glass substrate surface and around being coated in photoresist, make the ito film in top glass substrate effectively protect in the space of closing, do not corroded by etching liquid.Avoid the pin-hole phenomena produced when coating acid-proof ink performs etching protection, make to damage quarter the incidence rate of electrode 5%-10% when prior art coating acid-proof ink in ito film and be down to 0%, enhance the lithographic results of top glass substrate, improve the quality of LCDs.The adhesive glue of protection glass selects viscosity to be the photoresist of 39cp; this brood lac adhesion strength is possible not only to make protection glassy bond to glass substrate; play the protection ito film effect that prevents etching liquid from corroding, and after etching, protection glass only needs free-hand just can remove easily, simple to operation.
Black and white LCD production line is that the etching for one side ito film glass substrate is designed at present, uses said method directly can realize the etching technics of double-sided belt ito film on existing black and white LCD production line, and technique is simple, save production cost.
Accompanying drawing explanation
Fig. 1 is the structural representation of the present invention.
In figure, each list of reference numerals is: 1, upper polaroid, 2, touch control electrode, 3, top glass substrate, 4, show electrode, 5, liquid crystal layer, 6, lower glass substrate, 7, lower polaroid, 8, glue frame.
Detailed description of the invention
Below in conjunction with the accompanying drawings the present invention is described in further detail.
As shown in Figure 1, the LCDs of the present invention is the LCD of integrated touch function in black and white IN-CELL LCD(box) structure, it includes the liquid crystal cell being made up of top glass substrate 3, lower glass substrate 6 and glue frame 8, the upper and lower surface of described top glass substrate 3 is coated with ito film respectively, in the ito film of top glass substrate 3 lower surface and the ito film of lower glass substrate 6 upper surface, light is carved with show electrode 4 respectively, and liquid crystal cell is internal is liquid crystal layer 5.The ito film glazing of top glass substrate 3 upper surface is carved with the touch control electrode 2 of some lamellars, the upper polaroid 1 of touch control electrode 2 top laminating, the lower polaroid 7 of lower glass substrate 6 lower surface laminating.The most upper and lower glass substrate, upper and lower polaroid and liquid crystal layer 5 are for realizing the display function of LCD.The thickness of upper and lower glass substrate is 0.4-1.1 millimeter.
The two-sided ITO photolithography process of multipoint mode dot matrix touch LCD screen is:
The preparation of step one glass substrate: first glass substrate is polished, the flatness ＜ 500/20mm after polishing, can avoid the uneven color phenomenon occurring rib-like during display after being polished.Upper and lower surface at glass substrate can be coated with ito film respectively as required after polishing, form the glass substrate with two-sided ito film, it is possible to only plate ito film at one side.The surface resistance of ITO conductive layer be two-sided 10 Ω-20 Ω/
。
The step 2 photoetching to touch control electrode face: a, dress hurdle, cleaning: the glass substrate with two-sided ito film is loaded in framework, touch control electrode face is cleaned with deionized water, remove surface contaminant and bake and bank up with earth 1-2 minute, b, resist coating: uniformly coat photoresist in the touch control electrode face of glass substrate, photoresist be mainly composed of concentration 70%～85%(g/ml) the mixed phenol resin of propylene glycol monomethyl ether acetate, 12%～25% and the diazo compound derivative of 2%～6%.C, front baking: temperature is 85 DEG C of-120 DEG C of heating in vacuum, remove solvent, d, exposes, develops: exposure is to be irradiated by ultraviolet light, is irradiated on photoresist by the pattern on film plate, and its composition of photoresist being irradiated to ultraviolet light changes.Development is to soak glass substrate with developer solution, removes the photoresist of exposed portion, does not has irradiated part will not to remove and retained by developed liquid.Developer solution is concentration 0.4%-0.6%(m/v) sodium hydroxide solution.E, for the first time heating cure (post bake): temperature 110 DEG C-130 DEG C heats 8-10 minute, makes photoresist solidify, is closely adhered to ito film surface.F, the back side laminating protection glass of glass substrate: select the protection glass of 0.8-1.1mm thickness; by protection glass gluing to the glass substrate back side needing etching; coating photoresist around protection glass, in order to the gap between closed glass substrate and protection glass.Carrying out second time heating cure, temperature is 110 DEG C-130 DEG C and heats 8-10 minute, g, etching: utilizes etching liquid to perform etching the glass substrate after development, removes the part ito film not having photoresist to protect.The ito film part having photoresist to protect will not be etched thus remain, and is formed and touch block in ito film.Etching liquid is the mixed aqueous solution of hydrochloric acid and nitric acid, and the volume ratio of three is water: hydrochloric acid: nitric acid=50:50:1.H, remove protection glass, stripping photoresist: free-hand separated with glass substrate by protection glass, remove the photoresist remained on glass substrate after separation with stripper, obtain the glass substrate with one side ITO image.Stripper is the sodium hydroxide solution of concentration 5%.
nullThe step 3 photoetching to show electrode face: a、Clean show electrode face，The show electrode face of glass substrate is cleaned with deionized water，And bake and bank up with earth 1-2 minute，b、Resist coating，Photoresist is uniformly coated in show electrode face，c、Front baking，d、Exposure、Development，e、Post bake，f、At the touch control electrode face of glass substrate laminating protection glass，Select the protection glass of 0.8-1.1mm thickness，By protection glass gluing to the glass baseplate surface being etched with touch control electrode，Coating photoresist around protection glass，Carry out second time heating cure，g、Etching: utilize etching liquid to etch show electrode in ito film，h、Remove protection glass，Stripping photoresist (wherein front baking、Exposure、Development、Post bake、The steps such as etching are with the corresponding contents of step 2)，Thus complete the two-sided etching of top glass substrate 3.
The photoetching of step 4 lower glass substrate: etch show electrode on the glass substrate with one side ito film, completes the etching of lower glass substrate 6.
Step 5 combination of liquid crystals box, making touch screen: with lower glass substrate 6 and glue frame 8, the top glass substrate 3 etched is combined into liquid crystal cell, wherein the show electrode of top glass substrate 3 and lower glass substrate 6 is respectively in liquid crystal cell, and liquid crystal cell is internal is liquid crystal layer 5.Polaroid 1 on touch control electrode 2 upper surface of top glass substrate 3 is fitted, the lower polaroid 7 of lower glass substrate 6 lower surface laminating, make capacitance touch screen.
Claims (5)
1. a black and white lattice touch LCD screen, it is characterised in that it includes the liquid crystal layer (5) within liquid crystal cell, liquid crystal cell and touch control electrode (2), described liquid crystal cell includes top glass substrate (3), lower glass substrate (6) and show electrode (4)；The upper and lower surface of top glass substrate (3) is coated with ito film respectively, the touch control electrode (2) of lamellar it is etched with in the ito film of upper surface, touch control electrode (2) top laminating polaroid, the lower surface of top glass substrate (3) and the upper surface of lower glass substrate (6) etch show electrode (4) respectively.
Black and white lattice touch LCD screen the most according to claim 1, it is characterised in that the surface resistance of described ito film be 10 Ω-20 Ω/
。
Black and white lattice touch LCD screen the most according to claim 2, it is characterised in that the thickness of described upper and lower glass substrate is 0.4-1.1 millimeter, the flatness of upper and lower glass substrate is ＜ 500/20mm.
4. prepare the method for black and white lattice touch LCD screen as described in any one of claim 1-3 for one kind, it is characterised in that comprise the steps:
Step one, the photoetching in touch control electrode face: a, the glass substrate with two-sided ito film is loaded in framework, clean the touch control electrode face of glass substrate, resist coating；B, be irradiated on photoresist be exposed by electrode pattern with ultraviolet, with developer solution remove the photoresist of exposed portion carry out developing, heating cure；C, the glass substrate back side etched to needs by protection glass gluing, coat photoresist around protection glass, with the gap between closed glass substrate and protection glass, secondary heating solidification；D, in ito film, etch touch control electrode with etching liquid；E, removal protection glass, stripping photoresist；
Step 2, the photoetching in show electrode face: a, clean the show electrode face of glass substrate, resist coating, b, expose, develop, heating cure；C, will protection glass gluing to the touch control electrode face of glass substrate, coat photoresist, secondary heating solidification around protection glass；D, in ito film, etch show electrode；E, removal protection glass, stripping photoresist, complete the two-sided etching of top glass substrate；
Step 3, the top glass substrate etched and the lower glass substrate being etched with show electrode are combined into liquid crystal cell, make capacitance touch screen.
The manufacture method of black and white lattice touch LCD screen the most according to claim 4, it is characterised in that the thickness of described protection glass is 0.8-1.1mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510120858.6A CN106033289B (en) | 2015-03-19 | 2015-03-19 | A method of preparing black and white lattice touch LCD screen |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510120858.6A CN106033289B (en) | 2015-03-19 | 2015-03-19 | A method of preparing black and white lattice touch LCD screen |
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| Publication Number | Publication Date |
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| CN106033289A true CN106033289A (en) | 2016-10-19 |
| CN106033289B CN106033289B (en) | 2019-08-02 |
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| CN201510120858.6A Expired - Fee Related CN106033289B (en) | 2015-03-19 | 2015-03-19 | A method of preparing black and white lattice touch LCD screen |
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Cited By (3)
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| CN107564855A (en) * | 2017-08-24 | 2018-01-09 | 京东方科技集团股份有限公司 | Array base palte and preparation method thereof, display device |
| CN108539049A (en) * | 2018-02-28 | 2018-09-14 | 信利半导体有限公司 | A kind of production method and OLED products of OLED products |
| CN117250783A (en) * | 2023-10-26 | 2023-12-19 | 湖北欧雷登显示科技有限公司 | Integrated forming production process and application of liquid crystal display module |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN106033289B (en) | 2019-08-02 |
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