CN102953033A - Laser evaporation coating device - Google Patents
Laser evaporation coating device Download PDFInfo
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- CN102953033A CN102953033A CN2012104997693A CN201210499769A CN102953033A CN 102953033 A CN102953033 A CN 102953033A CN 2012104997693 A CN2012104997693 A CN 2012104997693A CN 201210499769 A CN201210499769 A CN 201210499769A CN 102953033 A CN102953033 A CN 102953033A
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Abstract
The invention relates to a laser evaporation coating device, which is characterized by comprising a vacuum reaction chamber, a substrate frame, a CO2 laser device, a He-Ne laser device, a beam splitter, a focusing convex lens, a defocusing concave lens, a crucible and a reflecting mirror, wherein the beam splitter is positioned outside the vacuum reaction chamber and is arranged in the intersected position of laser beams sent out by the CO2 laser device and the He-Ne laser device in an angle of 45 degrees; the crucible is used for containing materials to be evaporated; the reflecting mirror is positioned above the crucible and is used for reflecting the laser sent out by the laser device into the crucible after the laser sequentially passes through the beam splitter, the focusing convex lens, the defocusing concave lens and a window from outside to inside, and the materials to be evaporated in the crucible are heated and evaporated by the laser, so that a film layer containing the materials to be evaporated is deposited on the surface of a base material or substrate on the substrate frame through vapor deposition. The laser evaporation coating device disclosed by the invention has a simple structure, and can be used for heating high-melting metal materials in a non-contact mode to evaporate the materials so as to realize laser evaporation coating, and the body of the vacuum reaction chamber can not be polluted.
Description
Technical field:
The present invention relates to a kind of laser evaporation film coating apparatus.
Background technology:
Traditional evaporation coating device adopts contact heating, can pollute vacuum cavity.In addition, it is lower that it adds heat fusion joint, can't heat high melting point metal materials to make its evaporation.So be necessary prior art is made improvements, so that a kind of laser evaporation film coating apparatus to be provided, realize contactless heating, and can not pollute the vacuum reaction cavity.
Summary of the invention:
The object of the present invention is to provide a kind of laser evaporation film coating apparatus, it is simple in structure, can carry out contactless heating to high melting point metal materials and make its evaporation and realize the laser evaporation plated film, and can not pollute the vacuum reaction cavity.
A kind of laser evaporation film coating apparatus is characterized in that: comprise
One vacuum reaction chamber, the sidewall sealing of this vacuum reaction chamber is provided with a window;
One frame substrate is located in the vacuum reaction chamber, in order to place substrate to be coated or substrate;
One CO
2Laser apparatus, it is outer and be horizontally disposed with to be positioned at vacuum reaction chamber, and its laser laterally emission is also relative with described window;
One He-Ne laser apparatus is positioned at the outer and vertical setting of vacuum reaction chamber, and its laser is vertically launched;
One beam splitter is positioned at outside the vacuum reaction chamber and is miter angle and is located at CO
2The intersection location place of the laser beam that laser apparatus and He-Ne laser apparatus send;
One focuses on convex lens, is located on the light path between beam splitter and the window;
One defocuses concavees lens, is located on the light path that focuses between convex lens and the window;
One pincers pot is located in the vacuum reaction chamber and is positioned at the below of frame substrate, in order to hold material to be evaporated; And
One speculum, be located in the vacuum reaction chamber, and be positioned at described laser apparatus, beam splitter, focusing convex lens, defocus concavees lens and window on the common light path that forms, and be positioned at described pincers pot top, in order to laser that described laser apparatus is sent from outside to inside successively through beam splitter, focus on convex lens, defocus concavees lens and window after, reflex in the described pincers pot, material to be evaporated in the pincers pot is carried out the LASER HEATING evaporation, thereby the base material on frame substrate or substrate surface vapour deposition go out to contain the rete of described material to be evaporated.
A kind of laser evaporation film coating apparatus of the present invention, it is simple in structure, adopts CO
2Laser apparatus, cooperate to focus on convex lens, can carry out contactless heating to high melting point metal materials and make the high melting point metal materials rapid evaporation, finally vapour deposition goes out rete on base material or substrate, be suitable for very much the pure film of preparation under the ultrahigh vacuum(HHV), and obtain very high vaporator rate.In addition, because thermal source places outside the vacuum reaction chamber, so can not pollute the vacuum reaction cavity, both reduce pollution, simplified again vacuum chamber.
This can be improved by following scheme:
Also be provided with adjustable baffle plate between pincers pot described above and the frame substrate, in order to regulate the gas-phase deposition coating scope of base material or substrate surface.
Also be provided with a reflector adjusting apparatus on the sidewall of vacuum reaction chamber described above, in order to the relative position that changes described speculum and pincers pot and the scope that changes LASER HEATING.
Also be covered with a detachable backplate on the plane of reflection of speculum described above, stained by steam molecule when LASER HEATING is evaporated in order to prevent speculum.
Backplate described above is thin transparency glass plate.Can protect speculum, affect as small as possible again reflection efficiency.
The window of window described above for being made by Ge or ZnSe material.
Adjusting can be moved along light path in the position of focusing convex lens described above.
Description of drawings:
Fig. 1 is synoptic diagram of the present invention.
Embodiment:
As shown in Figure 1, a kind of laser evaporation film coating apparatus comprises a vacuum reaction chamber 1, a frame substrate 2, an adjustable baffle plate 3, a CO
2Laser apparatus 4, a He-Ne laser apparatus 5, a beam splitter 6, focus on convex lens 7, and defocus concavees lens 8, pincers pot 9, one speculum 10 and a reflector adjusting apparatus 11.
The sidewall sealing of described vacuum reaction chamber 1 is provided with a window 12, the window of this window 12 for being made by Ge or ZnSe material.
Described frame substrate 2 is located in the vacuum reaction chamber 1, in order to place substrate to be coated or substrate.
Described CO
2Laser apparatus 4, it is outer and be horizontally disposed with to be positioned at vacuum reaction chamber 1, and its laser is emission and relative with described window 12 laterally.
Described He-Ne laser apparatus 5 is positioned at vacuum reaction chamber 1 outer and vertical the setting, and its laser is vertically launched.
Described beam splitter 6 is positioned at outside the vacuum reaction chamber 1 and is miter angle and is located at CO
2The intersection location place of the laser beam that laser apparatus 4 and He-Ne laser apparatus 5 send.
Described focusing convex lens 7 are located on the light path between beam splitter 6 and the window 12, and can be moved adjusting along light path.
The described concavees lens 8 that defocus are located on the light path that focuses between convex lens 7 and the window 12.
Described pincers pot 9 is located in the vacuum reaction chamber 1 and is positioned at the below of frame substrate 2, in order to hold material to be evaporated.
Described speculum 10, be located in the vacuum reaction chamber 1, and be positioned at described laser apparatus, beam splitter 6, focus on convex lens 7, defocus on concavees lens 8 and 12 common light paths that form of window, and be positioned at described pincers pot 9 tops, in order to laser that described laser apparatus is sent from outside to inside successively through beam splitter 6, focus on convex lens 7, defocus concavees lens 8 and window 12 after, reflex in the described pincers pot 9, material to be evaporated in the pincers pot 9 is carried out the LASER HEATING evaporation, thereby the base material on frame substrate 2 or substrate surface vapour deposition go out to contain the rete of described material to be evaporated.
Described adjustable baffle plate 3 is located between pincers pot 9 and the frame substrate 2, in order to regulate the gas-phase deposition coating scope of base material or substrate surface.
Described reflector adjusting apparatus 11 is located on the sidewall of vacuum reaction chamber 1, in order to the relative position that changes described speculum 10 and pincers pot 9 and the scope that changes LASER HEATING.
Also be covered with a detachable backplate (not shown) on the plane of reflection of described speculum 10, this backplate is thin transparency glass plate, is stained by steam molecule when LASER HEATING is evaporated in order to prevent speculum.
The above is preferred embodiment of the present invention only, is not to limit scope of the invention process, and all equal variation and modifications of doing according to claim of the present invention all fall into the scope that patent of the present invention contains.
Claims (7)
1. a laser evaporation film coating apparatus is characterized in that: comprise
One vacuum reaction chamber, the sidewall sealing of this vacuum reaction chamber is provided with a window;
One frame substrate is located in the vacuum reaction chamber, in order to place substrate to be coated or substrate;
One CO
2Laser apparatus, it is outer and be horizontally disposed with to be positioned at vacuum reaction chamber, and its laser laterally emission is also relative with described window;
One He-Ne laser apparatus is positioned at the outer and vertical setting of vacuum reaction chamber, and its laser is vertically launched;
One beam splitter is positioned at outside the vacuum reaction chamber and is miter angle and is located at CO
2The intersection location place of the laser beam that laser apparatus and He-Ne laser apparatus send;
One focuses on convex lens, is located on the light path between beam splitter and the window;
One defocuses concavees lens, is located on the light path that focuses between convex lens and the window;
One pincers pot is located in the vacuum reaction chamber and is positioned at the below of frame substrate, in order to hold material to be evaporated; And
One speculum, be located in the vacuum reaction chamber, and be positioned at described laser apparatus, beam splitter, focusing convex lens, defocus concavees lens and window on the common light path that forms, and be positioned at described pincers pot top, in order to laser that described laser apparatus is sent from outside to inside successively through beam splitter, focus on convex lens, defocus concavees lens and window after, reflex in the described pincers pot, material to be evaporated in the pincers pot is carried out the LASER HEATING evaporation, thereby the base material on frame substrate or substrate surface vapour deposition go out to contain the rete of described material to be evaporated.
2. a kind of laser evaporation film coating apparatus according to claim 1 is characterized in that: also be provided with adjustable baffle plate between described pincers pot and the frame substrate, in order to regulate the gas-phase deposition coating scope of base material or substrate surface.
3. a kind of laser evaporation film coating apparatus according to claim 1 and 2 is characterized in that: also be provided with a reflector adjusting apparatus on the sidewall of described vacuum reaction chamber, in order to the relative position that changes described speculum and pincers pot and the scope that changes LASER HEATING.
4. a kind of laser evaporation film coating apparatus according to claim 3 is characterized in that: also be covered with a detachable backplate on the plane of reflection of described speculum, stained by steam molecule when LASER HEATING is evaporated in order to prevent speculum.
5. a kind of laser evaporation film coating apparatus according to claim 4, it is characterized in that: described backplate is thin transparency glass plate.
6. a kind of laser evaporation film coating apparatus according to claim 5 is characterized in that: the window of described window for being made by Ge or ZnSe material.
7. a kind of laser evaporation film coating apparatus according to claim 6, it is characterized in that: adjusting can be moved along light path in the position of described focusing convex lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012104997693A CN102953033A (en) | 2012-11-28 | 2012-11-28 | Laser evaporation coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012104997693A CN102953033A (en) | 2012-11-28 | 2012-11-28 | Laser evaporation coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102953033A true CN102953033A (en) | 2013-03-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012104997693A Pending CN102953033A (en) | 2012-11-28 | 2012-11-28 | Laser evaporation coating device |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103247350A (en) * | 2013-04-28 | 2013-08-14 | 大连民族学院 | Laser heating device used for heating fusion material in plasma irradiation platform |
| CN104392883A (en) * | 2014-10-22 | 2015-03-04 | 常州博锐恒电子科技有限公司 | Solid feeding method of implantation machine |
| CN107867098A (en) * | 2016-09-28 | 2018-04-03 | 奥宝科技股份有限公司 | For printing the method and apparatus of heavy viscous material |
| CN109487219A (en) * | 2018-07-24 | 2019-03-19 | 深圳市矩阵多元科技有限公司 | Impulse laser deposition system and its method for manufacturing thin film |
| CN110446558A (en) * | 2017-03-29 | 2019-11-12 | 住友重机械工业株式会社 | Membrane formation device and film forming method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102021518B (en) * | 2010-10-26 | 2012-05-30 | 中国航天科技集团公司第五研究院第五一○研究所 | Method and device for coating film on surface of inner cavity by using pulse laser process |
| CN202968677U (en) * | 2012-11-28 | 2013-06-05 | 中山市创科科研技术服务有限公司 | Laser evaporating and coating device |
-
2012
- 2012-11-28 CN CN2012104997693A patent/CN102953033A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102021518B (en) * | 2010-10-26 | 2012-05-30 | 中国航天科技集团公司第五研究院第五一○研究所 | Method and device for coating film on surface of inner cavity by using pulse laser process |
| CN202968677U (en) * | 2012-11-28 | 2013-06-05 | 中山市创科科研技术服务有限公司 | Laser evaporating and coating device |
Non-Patent Citations (2)
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| 杨邦朝，王文生编著: "《薄膜物理与技术》", 30 April 1997, 成都市:电子科技大学出版社 * |
| 蔡一鸣 等: "大功率CO2连续激光镀制超导铅膜研究", 《低温物理学报》 * |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103247350A (en) * | 2013-04-28 | 2013-08-14 | 大连民族学院 | Laser heating device used for heating fusion material in plasma irradiation platform |
| CN103247350B (en) * | 2013-04-28 | 2016-03-23 | 大连民族学院 | For heating the laser heating device of fusionable material in plasma irradiation platform |
| CN104392883A (en) * | 2014-10-22 | 2015-03-04 | 常州博锐恒电子科技有限公司 | Solid feeding method of implantation machine |
| CN107867098A (en) * | 2016-09-28 | 2018-04-03 | 奥宝科技股份有限公司 | For printing the method and apparatus of heavy viscous material |
| CN110446558A (en) * | 2017-03-29 | 2019-11-12 | 住友重机械工业株式会社 | Membrane formation device and film forming method |
| CN109487219A (en) * | 2018-07-24 | 2019-03-19 | 深圳市矩阵多元科技有限公司 | Impulse laser deposition system and its method for manufacturing thin film |
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Application publication date: 20130306 |