CN102884222A - Target mounting mechanism - Google Patents
Target mounting mechanism Download PDFInfo
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- CN102884222A CN102884222A CN2011800227147A CN201180022714A CN102884222A CN 102884222 A CN102884222 A CN 102884222A CN 2011800227147 A CN2011800227147 A CN 2011800227147A CN 201180022714 A CN201180022714 A CN 201180022714A CN 102884222 A CN102884222 A CN 102884222A
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- China
- Prior art keywords
- target
- anchor clamps
- engaging protuberance
- engaging
- protuberance
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/342—Hollow targets
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
A target mounting mechanism detachably mounts a cylindrical target, which is used in a spattering device, to connection sections of cathodes. The target is provided with cylindrical base bodies and also with a target member which covers the base bodies, and the target has a center region in which the target member is disposed and which has connection regions from which the base bodies are exposed at the opposite ends of the target which are located outside the center region. The connection sections of the cathodes each comprise a substantially cylindrical clamp in which the connection section and the connection region are present. A first engagement protrusion section formed in each of the connection regions of the target and a second engagement protrusion section formed in the inner peripheral surface of the clamp are engaged with each other when the connection section and the connection region move relative to each other only in the circumferential direction of the target while the connection section and the connection region are present within the clamp.
Description
Technical field
The present invention relates to the target installing mechanism of sputter equipment, at length relate to the target installing mechanism that columnar target can anticathode easily and reliably be installed.
The application quotes its content based on the Patent 2010-146617 number opinion right of priority of on June 28th, 2010 in Japanese publication at this.
Background technology
For example, as building materials glass, Low-E glass (low emissivity glass) is popularized.
This Low-E glass is by forming the metallic film film forming on glass surface.In the past, when forming metallic film on the surface of glass etc., utilize and possess plate shaped target the magnetic control sputtering device of (below, only be called target) to carry out film forming.
But, along with the maximization with glass of in recent years building materials, for plate shaped target, be difficult to metallic membrane with uniform thickness film forming on glass surface all.
As with metallic membrane with the uniform thickness device of film forming on this large-area film forming object with no difference, a kind of sputter equipment (for example, with reference to patent documentation 1) that utilizes the target of drum is proposed.In addition, columnar target has the advantages that service efficiency is higher than plate shaped target.
Utilize in the sputter equipment of target of drum, columnar target is installed on the negative electrode at the two ends along turning axle direction (length direction).In the past, the structure as target being installed to negative electrode discloses a kind of attachment system, and for example spirally to form section on the anchor clamps of negative electrode be semicircular groove being sticked in, and also spirally form semicircular groove in the end of target.And, by the columnar spiral ring of insertion in either party's groove, and spiral ring is engaged in the opposing party's the groove, thereby target is installed in (with reference to patent documentation 2) on the negative electrode.
Patent documentation 1: JP 2010-100930 communique
Patent documentation 2: special table 2006-521515 communique
But, in the connected system of patent documentation 2 as described, when columnar target is installed to negative electrode, owing to engaging target and anchor clamps by spiral ring, so the installation site easily is offset, be difficult to the rotation center of negative electrode accurately be aimed in the axle center of target and installed.Therefore, have the easy eccentric rotary of target, corrosion pattern short problem of life-span unstable, target.
In addition, for example, one side in order to be several meters etc. the large-scale film forming of being undertaken by film forming matter in film forming face, and use in the situation of length for several meters etc. large-scale target, when target is installed to negative electrode, need to use the larger power rolling clamp of special tool, the installation of target needs huge labour.
Summary of the invention
The present invention makes in view of described problem, and its purpose is, provides a kind of and can anticathode easily and in installation site accurately the target installing mechanism of columnar target be installed.In addition, its purpose is, provides a kind of corrosion pattern that can make target evenly and realizes the target installing mechanism of the long lifetime of target.
(1) the target installing mechanism of a mode of the present invention, anticathode linking part can be installed and removed ground the columnar target that uses in the sputter equipment is installed,
Described target possesses columnar matrix and covers the target of this matrix, and has the middle section of being furnished with described target and the connecting area that exposes at the described matrix of the both end sides except this middle section;
Be formed with the anchor clamps of the general cylindrical shape of built-in this linking part and described connecting area at the linking part of described negative electrode; Under described linking part and described connecting area are built in state in the described anchor clamps, the first the second engaging protuberance that engages protuberance and the inner peripheral surface that is formed at described anchor clamps that is formed at the described connecting area of described target only relatively moves along the circumferential direction of described target, thus engaging.
(2) in above-mentioned (1) described mode, the required torque of engaging of preferred described the first engaging protuberance and described the second engaging protuberance is more than the 1kgfcm, below the 20kgfcm.
(3) in above-mentioned (1) described mode, the contact surface of preferred described the first engaging protuberance and described the second engaging protuberance is that the circumferential direction of described target is that the direction of principal axis of minor face, described target is the shape on long limit.
(4) in above-mentioned (1) described mode, preferably possesses the structure of sending the signal of judging that described the first engaging protuberance and the described second snap action that engages protuberance have been finished.
(5) in above-mentioned (1) described mode, preferred described the second engaging protuberance is formed with more than three, be positioned on the same line of inner peripheral surface direction of described anchor clamps, and be positioned at the turning axle of described target is regarded as on the imaginary circle at center, and with respect to the line segment of at least one in the protuberance by described center and described the second engaging, other described the second engaging protuberance rotational symmetry configuration.
(6) in above-mentioned (1) described mode, preferably further possess packing ring, this packing ring be arranged on the described linking part of described negative electrode with respect to the contact part of the vertically extending part in axle center with described matrix.
(7) in above-mentioned (1) described mode, preferably further possess fixed mechanism, this fixed mechanism make on the described linking part of described negative electrode with respect to the vertically extending part in axle center and described matrix tight joint.
(8) in above-mentioned (1) described mode, preferably further possess liner, this liner be configured on the described linking part of described negative electrode with respect to the gap of the vertically extending part in axle center with described anchor clamps.
(9) in above-mentioned (8) described mode, preferably implement surface treatment at described liner.
As described above, according to above-mentioned (1) described mode, when the negative electrode of sputter equipment is installed columnar target, to be formed at anchor clamps on the negative electrode and be inserted into the connecting area of the end of target, anchor clamps are only relatively moved along the circumferential direction of target, just make the first engaging protuberance and the second engaging protuberance engaging, can anticathode be installed by columnar target.
Therefore, by the engaging of the first engaging protuberance and the second engaging protuberance, can be easy to make the axle center of the center of negative electrode and target consistent, target is rotated without acceptance of persons take the axle center as rotation center.Thus, by the distance of film forming matter and target on the whole circumference of target evenly, can be by the epithelium of the even thickness of whole film forming indifference of film forming matter.
In addition, even in the situation that the large-scale and ponderable target of use when target is installed, only relatively moves anchor clamps along the circumferential direction of target, the second engaging protuberance and the first engaging protuberance are engaged, thereby target is installed on the negative electrode.Therefore, do not need picture to use in the past special tool with larger power rolling clamp, do not use special tool and make anchor clamps along the circumferential direction rotation of target with less power, just can easily target be installed on the negative electrode.
Description of drawings
Fig. 1 is the longitudinal section of the sputter equipment that relates to of one embodiment of the present invention.
Fig. 2 is the major portion amplification stereogram in the zone that comprises target in this sputter equipment of expression.
Fig. 3 is the amplification stereogram of the target installing mechanism of this embodiment of expression.
Fig. 4 is the sectional view of the target installing mechanism of this embodiment of expression.
Fig. 5 A is the explanatory view of installation procedure of the target of interim this embodiment of expression.
Fig. 5 B is the explanatory view of installation procedure of the target of interim this embodiment of expression.
Fig. 5 C is the explanatory view of installation procedure of the target of interim this embodiment of expression.
Fig. 5 D is the explanatory view of installation procedure of the target of interim this embodiment of expression.
Fig. 5 E is the explanatory view of installation procedure of the target of interim this embodiment of expression.
Fig. 6 A is the explanatory view that second of this embodiment of expression engages the configuration example of protuberance.
Fig. 6 B is the explanatory view that second of this embodiment of expression engages the configuration example of protuberance.
Fig. 6 C is the explanatory view that second of this embodiment of expression engages the configuration example of protuberance.
Fig. 7 is the amplification stereogram of another embodiment of expression target installing mechanism of the present invention.
Fig. 8 is the sectional view of another embodiment of expression target installing mechanism of the present invention.
Fig. 9 A is the explanatory view of installation procedure of the target of interim another embodiment of expression.
Fig. 9 B is the explanatory view of installation procedure of the target of interim another embodiment of expression.
Fig. 9 C is the explanatory view of installation procedure of the target of interim another embodiment of expression.
Embodiment
Referring to accompanying drawing, an embodiment of the target installing mechanism that the present invention relates to is described.And present embodiment does not have not limit the present invention under the specially appointed prerequisite for the purport of better understanding invention specifies.In addition, the accompanying drawing that uses in the following description in order easily to understand feature of the present invention, will amplify expression as the part of major portion for convenient sometimes, and the dimension scale of each integrant etc. are not necessarily identical with reality.
At first, the magnetic control sputtering device that possesses the target installing mechanism of present embodiment (below, be called sputter equipment) is described.
Fig. 1 is the longitudinal section of the structure of expression sputter equipment.In addition, Fig. 2 is the major portion amplification stereogram that expression comprises the zone of target.
Anode (anode) 12 for example is made of a plurality of plate-shaped electrodes.Anode 12 can be electrically connected with ground wire by cable.On the one side of the anode 12 of this plate-shaped electrode, place by film forming matter, for example sheet glass 19.
Negative electrode (cathode) 13 consists of the terminal that is electrically connected with target 21 described later, by cable with exchange 14 electrical connections of (AC) supply unit.Temperature when in addition, this negative electrode 13 suppresses film forming by the cooling water circulation pipe 16 that is connected with apparatus for supplying cool water 15 rises.
Ar air feed system 18 is connected by the inside of air-supply duct with reaction chamber 11.Thus, when film forming, Ar gas is fed in the reaction chamber 11 as the gas for generation of plasma body.
As shown in Figure 2, target 21 integral body form general cylindrical shape.Target 21 consists of by the matrix (stay pipe) 22 of hollow circle tube with at the target 23 that the middle section S1 along the axis direction R of this base material 22 covers the periphery of matrix 22.And, except the both end sides of this middle section S1 becomes the connecting area S2 that matrix 22 exposes.
Matrix (stay pipe) 22 can be that the stainless steel tube of several millimeter forms by thickness for example.The target 23 that covers the middle section S1 of matrix 22 can be to wish film forming by the material of the film on the film forming matter, the target that forms with the thickness of regulation such as the various metallic substance of W, Ti, Ta, Mo, Al alloy etc., silicon, indium-tin-oxide (hereinafter referred to as ITO) etc.
When this columnar target 21 is arranged at sputter equipment 10, is furnished with magnet 51(with reference to Fig. 1 in the inside of matrix 22).This magnet 51 forms magnetic field around target 23, carry out magnetron sputtering.By by this magnet 51 plasma body being enclosed near the target 21, thereby make the sputtering rate high speed, and prevent near the film of accumulation target target 21.
At the both ends of target 21, namely connecting area S2 is electrically connected and mechanical connection with negative electrode 13.The anchor clamps 41 of the linking part S3 of the connection that this connecting area S2 is connected with negative electrode by being formed on negative electrode carry out.
This target 21 for example can be that two identical targets form side by side.And each target 21 is by not shown motor, and the speed of rotation with regulation in film forming is rotated.
When utilizing the as above sputter equipment 10 of structure, metallic film film forming for example as on by the one side of the glass 19 of film forming matter the time, at first, is entered the Ar conductance in the reaction chamber 11 from Ar air feed system 18, making reaction chamber 11 interior decompressions by vacuum pump 17 simultaneously, is 1.3Pa with pressure setting for example.Then, make and be placed with as by the anode 12 of the glass 19 of film forming matter and two targets 21 that configure side by side, 21 relative.
And, flow through alternating current (AC) by negative electrode 13 to two targets 21,21 from exchanging (AC) supply unit 14.At this moment,, electric current is applied to a side target 21 and the opposing party's target 21 in the mode that negative electrode and anode alternately switch.
If target 21,21 is applied alternating current (AC), then the Ar gas in the reaction chamber 11 becomes glow discharge plasma, produces a lot of Ar
+Ion.And, these a lot of Ar
+The target 23 of the target 21 that bombardment by ions is connected with negative electrode 13.Target 23 is because this Ar
+The impact of ion and by sputter, the particle of the constituent material of target (sputtering particle) is stacked on the glass 19 that is positioned over anode 12.Thus, can form the film that the constituent material by target 23 consists of in the one side of glass 19.
When this sputter, rotate with the speed of stipulating take axis direction R as rotation center by making target 21,21, thereby target 23 reduces with uniform thickness, and can form to the whole one side of large-area glass 19 film of uniform film thickness.
(the first embodiment)
Fig. 3 is the amplification stereogram of expression target installing mechanism of the present invention.In addition, Fig. 4 is the sectional view of expression target installing mechanism of the present invention.
The connecting area S2 that exposes at the both ends of target 21 matrix 22 is formed with the first engaging protuberance 61 along the circumferential direction of matrix 22.The first engaging protuberance 61 is from the outside outstanding projection of the side face 22a of base material 22, along the circumferential direction Q of matrix 22, for example is configured in equably six positions.This first engaging protuberance 61 can be integrally formed with matrix 22.
The first engaging protuberance 61 comprises: from the side face 22a of the base material 22 introduction part 61a outstanding in low position; Circumferential direction Q from this introduction part 61a along matrix 22, towards from side face 22a outwards away from the rake 61b that tilts of direction; 61b links to each other with this rake, and compare with rake 61b with more anxious angle (large angle) from side face 22a outwards away from direction hold up (inclination) fastener 61c(also with reference to the sectional view of Fig. 5 A).In addition, rake 61b is along the shape of the axis direction R width expansion of target 21 towards a side that links to each other with fastener 61c from a side that links to each other with introduction part 61a.
Linking part S3 at an end that consists of negative electrode 13 rotatably is equipped with anchor clamps 71.These anchor clamps 71 form the linking part S3 that is built-in with negative electrode 13 and general cylindrical shape shape connecting area S2, hollow of target 21.That is, it is identical or larger than it with the diameter of the connecting area S2 of the linking part S3 of negative electrode 13 or target 21 that the internal diameter of the hollow of target 21 forms, and when target 21 is installed, presents the shape that covers these linking parts S3 and connecting area S2.
At the inner peripheral surface 71a of anchor clamps 71, along the interior Zhou Fangxiang D formation second engaging protuberance 72 of these anchor clamps 71.The second engaging protuberance 72 is to support the bar-shaped parts of cylinder of (fixing) in the two sides of the groove 71b of the preset width that digs out towards the outside of anchor clamps 71 from inner peripheral surface 71a.Groove 71b for example is configured in six positions equably along the interior Zhou Fangxiang D of anchor clamps 71.On the other hand, the second engaging protuberance 72 forms at three positions equably every one in the groove 71b at these six positions.
Distolateral fixed mechanism 75 that is consisted of by fastening screw 73 and screw hole 74 that is formed with at anchor clamps 71.This fixed mechanism 75 is when making anchor clamps 71 engage with target 21, and fastening screw 73 is fastening towards target 21 along axis direction R, thereby anchor clamps 71 are fixed and can unclamp along interior Zhou Fangxiang D.
Among the gap T that between the internal surface of the linking part S3 of the negative electrode 13 of vertically expanding with respect to axis direction and anchor clamps 71, forms, further be provided with liner 76.This liner 76 is that the center is provided with the disc-shaped part that makes the hole that negative electrode 13 runs through, such as being formed by stainless steel, aluminium etc.Liner 76 prevents that when the fastening screw 73 of fastening formation fixed mechanism 75 its front end directly is connected to the linking part S3 of negative electrode 13 and injury.
In addition, for example, surface at the liner 76 that is formed by iron, stainless steel, copper alloy etc., make the eutectoid in treatment solution without electrolytic nickel and fluoro-resin, in epithelium, comprise equably fluoro-resin about 30% for volumetric ratio, after film forming, heat-treat, form and to make without electrolytic nickel and the fluoro-resin epithelium of tight joint securely.
And, can be on the surface such as the liner 76 that is formed by iron, stainless steel, copper alloy etc., will be without electrolytic nickel as substrate, carry out this separate out with the particle shape without electrolytic nickel in synthetic fluoro-resin surface treatment and form epithelium.
Like this, by carrying out the surface treatment of liner 76, can realize the raising of the wear resistance of liner 76, the raising of sliding, anti-adhesion etc.
End at the linking part S3 of negative electrode 13 is formed with packing ring 77.This packing ring 77 is such as being formed by aluminium or copper alloy etc., the end of the base material 22 by being connected to target 21, the inside that keeps airtightly the hollow of base material 22.
Effect to the target installing mechanism of the present invention of this structure describes.
Utilize the target installing mechanism of present embodiment, when the negative electrode 13 of sputter equipment 10 is installed columnar target 21, shown in Fig. 5 A, the connecting area S2 that the anchor clamps 71 that make the linking part S3 that is formed at negative electrode 13 expose near the base material 22 of target 21.And, at the connecting area S2 of the inside of anchor clamps 71 insertion base material 22.
Inserted the connecting area S2 of base material 22 in the inside of anchor clamps 71 after, then, shown in Fig. 5 B, anchor clamps 71 are only rotated along the circumferential direction Q of target 21 around axis direction R.If make 71 of anchor clamps begin rotation along circumferential direction Q, then being formed at the second engaging protuberance 72 on the groove 71b at three positions, engage the introduction part 61a of protuberance 61 with first upwards overlapping in the footpath of inner peripheral surface 71a.Under this state, because the height apart from side face 22a of introduction part 61a is low, so the second engaging protuberance 72 contacts hardly with the first engaging protuberance 61.
Shown in Fig. 5 C ~ Fig. 5 E, if further make 71 of anchor clamps along the circumferential direction Q rotation of target 21, then the second engaging protuberance 72 with towards the sense of rotation of the anchor clamps 71 rake 61b butt of inclination gradually with uprising.And the second engaging protuberance 72 slides at rake 61b in the mode of climbing up rake 61b from the side the time.
71 circumferential direction Q rotations along target 21 of anchor clamps, when sliding past rake 61b, because rake 61b forms the shape of widening along the axis direction R width of target 21 from a side that links to each other with introduction part 61a towards a side that links to each other with fastener 61c, so the contact area of the second engaging protuberance 72 and the first engaging protuberance 61 increases gradually.And the second engaging protuberance 72 forms cylindric, so anchor clamps 71 rotate swimmingly along the circumferential direction Q of target 21.
If anchor clamps 71 are further rotated, then the second engaging protuberance 72 has been stepped on after the rake 61b, is connected to and compares the fastener 61c that holds up with anxious angle with rake 61b.And, terminate in this along the rotation of circumferential direction Q.Thus, target 21 engages with anchor clamps 71.Under this fastening state, the circumferential direction Q that the contact surface B of the first engaging protuberance 61 and the second engaging protuberance 72 consists of target 21 is that axis direction (direction of principal axis) R of minor face, target 21 is the elongated rectangle on long limit.
Suppress littlely by the contact surface with this first engaging protuberance 61 and the second engaging protuberance 72, from insert the connecting area S2 of target 21 in the inside of anchor clamps 71, make 71 circumferential direction Q rotations along target 21 of anchor clamps, until the required rotating torques of the second engaging protuberance 72 and fastener 61c butt is more than the 1kgfcm, below the 20kgfcm.Thus, such as the operator anchor clamps 71 are not used special tool etc. and only with the light rolling clamp 71 of have gentle hands, target 21 is fastened on the anchor clamps 71.
On the other hand, the second engaging protuberance 72 also can be following structure: when being connected to fastener 61c having stepped on rake 61b, send the signal of having finished of the snap action of judging the first engaging protuberance 61 and the second engaging protuberance 72.For example, sort signal can be sound.In this embodiment, the structure that the contact sound that sends sounds when meeting the fastener 61c of the first engaging protuberance 61 by being made as the second engaging protuberance 72 can be learnt the clamped position that anchor clamps 71 is rotated to regulation.Thus, can prevent from waiting the engaging that causes bad by the rotation of anchor clamps 71 is not enough.
Then, by the fastening screw 73 of fixed mechanism shown in Figure 4 75 is 21 fastening along axis direction R towards target, negative electrode 13 is pressed towards target 21, the first engaging protuberance 61 and groove 71b tight joint, and anchor clamps 71 are not easy rotation with respect to target 21.Therefore, keep engaging (contact) state of the first engaging protuberance 61 and the second engaging protuberance 72.
As mentioned above, target installing mechanism according to present embodiment, when the negative electrode 13 of sputter equipment 10 is installed columnar target 21, the anchor clamps 71 that are formed at negative electrode 13 are inserted into the end connecting area S2 of target 21 and make anchor clamps 71 rotations, only make the first engaging protuberance 61 and 72 engagings of the second engaging protuberance, just columnar target 21 can be installed on the negative electrode 13.
In addition, for example, in the situation of using length for several meters etc. large-scale target, when target 21 is installed, only makes 71 of anchor clamps along the circumferential direction rotation and make the second engaging protuberance 72 and 61 engagings of the first engaging protuberance, just target 21 can be installed on the negative electrode 13.Therefore, do not need as the past, to make its rotation etc. with special tool with larger power, do not use special tool with less power, for example, the rotating torques of anchor clamps 71 is rotation in the scope that 1kgfcm is above, 20kgfcm is following, just target 21 can be easily mounted to negative electrode 13.
In described embodiment, the second engaging protuberance 72 is formed on three positions every one equably in the groove 71b at six positions.Namely, as shown in Figure 6A, the second engaging protuberance 72 is formed with three, be positioned on the same line P1 of inner peripheral surface 71a direction of anchor clamps 71, the turning axle that also is positioned at target 21 is that axis direction R regards as on the imaginary circle P2 at center, and configures axisymmetrically with respect to the line segment L by this center and the second engaging protuberance 72.
By this structure, in engaging the first engaging protuberance 61 and the second engaging during protuberance 72, can make exactly the axle center on the inner peripheral surface 71a of the turning axle of target 21 and anchor clamps 71 consistent.Therefore, when film forming, target 21 can eccentric rotary, is formed uniformly corrosion pattern, can improve the life-span of target 21.
Shown in Fig. 6 B, the second engaging protuberance can be positioned on the same line P1, and is positioned on the imaginary circle P2, and, be configured in axisymmetrically four positions with respect to the line segment L by this center and the second engaging protuberance 81.In addition, for example shown in Fig. 6 C, can be to be positioned on the same line P1, and be positioned on the imaginary circle P2, and, be configured in axisymmetrically five positions with respect to the line segment L by this center and the second engaging protuberance 82.
Therefore, the engaging by the first engaging protuberance 61 and the second engaging protuberance 72 can be easy to make the center of negative electrode 13 consistent with the axle center of target 21, target 21 can be rotated without acceptance of persons take the axle center as rotation center.Thus, become evenly by the whole circumference of the distance of film forming matter and target 21 at target 21, can be with the epithelium film forming of the even thickness of indifference on whole of film forming matter.
And, in described embodiment, anchor clamps 71 are engaged along circumferential direction Q rotation with respect to 21 of targets, but the first engaging protuberance and the second engaging protuberance only relatively move and engage and get final product along the circumferential direction of target.That is, also can be to make target replace the anchor clamps rotation, perhaps make target and anchor clamps in a circumferential direction towards mutual different direction rotation, so that the structure of the first engaging protuberance and the second engaging protuberance engaging.
(the second embodiment)
Fig. 7 is the amplification stereogram of another embodiment of expression target installing mechanism of the present invention.In addition, Fig. 8 is the sectional view of this target installing mechanism.
In this embodiment, the connecting area S2 that exposes matrix 22 at the both ends of target 21 is formed with the first engaging protuberance 31 along the circumferential direction of matrix 22.The first engaging protuberance 31 is from the outside outstanding projection of the side face 22a of base material 22, for example is configured in equably six positions along the circumferential direction of matrix 22.This first engaging protuberance 31 can be integrally formed with matrix 22.
Shown in Fig. 9 A, the first engaging protuberance 31 for example forms overlooks roughly L font.The first engaging protuberance 31 like this possesses: the first snap fastener E1 that extends along the axis direction R of target 21, the second snap fastener E2 that extends along the circumferential direction Q of target 21 and be configured in the 3rd snap fastener E3 with the direction of the circumferential direction Q approximate vertical of target 21.
Linking part S3 at an end that consists of negative electrode 13 rotatably is equipped with anchor clamps 41.These anchor clamps 41 form the linking part S3 that is built-in with negative electrode 13 and general cylindrical shape shape connecting area S2, hollow of target 21.That is, it is identical or larger than it with the diameter of the connecting area S2 of the linking part S3 of negative electrode 13 or target 21 that the internal diameter of the hollow of target 21 forms, and when target 21 is installed, presents the shape that covers these linking parts S3 and connecting area S2.
At the inner peripheral surface 41a of anchor clamps 41, form the second engaging protuberance 42 along interior Zhou Fangxiang D.The second engaging protuberance 42 is projections outstanding from inner peripheral surface 41a towards center position, along interior Zhou Fangxiang D, for example is configured in equably six positions.This second engaging protuberance 42 can be integrally formed with anchor clamps 41.
Shown in Fig. 9 A, the second engaging protuberance 42 for example forms overlooks essentially rectangular.It is identical with the first engaging protuberance 31 interval each other that adjoins each other that the width W along interior Zhou Fangxiang D of this second engaging protuberance 42 can form, or less than it.
By this structure, the first engaging protuberance 31 and the second engaging protuberance 42 can engage when the installation of target 21.
Distolateral fixed mechanism 45 that is consisted of by fastening screw 43 and screw hole 44 that is formed with at anchor clamps 41.This fixed mechanism 45 is when making anchor clamps 41 engage with target 21, and fastening screw 43 is fastening towards target 21 along axis direction R, thereby makes the first engaging protuberance 31 and the second engaging protuberance 42 tight joint.
Among the gap T that forms between the vertically extending part with respect to axis direction on the linking part S3 of negative electrode 13 and the internal surface of anchor clamps 41, also be provided with liner 46.This liner 46 is the discoidal parts that are provided with the hole of running through negative electrode 13 at the center, for example can be formed by stainless steel.This liner 46 prevents that its front end directly is connected to the linking part S3 of negative electrode 13 and injury when the fastening screw 43 of fastening formation fixed mechanism 45.
End at the linking part S3 of negative electrode 13 is formed with packing ring 47.This packing ring 47 is such as being formed by aluminium etc., the end of the base material 22 by being connected to target 21 and the inside that keeps airtightly the hollow of base material 22.
Effect to the target installing mechanism of present embodiment with this structure describes.
Utilize the target installing mechanism of present embodiment, when the negative electrode 13 of sputter equipment 10 is installed columnar target 21, shown in Fig. 9 A, the connecting area S2 that the anchor clamps 41 that make the linking part S3 that is formed at negative electrode 13 expose near the substrate 22 of target 21.And, make each second engaging protuberance 42 position alignment that is formed at anchor clamps 41, so as the first engaging protuberance 31 by being formed at substrate 22 each other after, the connecting area S2 of base material 22 is inserted into anchor clamps 41 the insides.
When this inserted, when the first snap fastener E1 of formation the first engaging protuberance 31 and the one side L1 of the second engaging protuberance 42 slided along axis direction R, the connecting area S2 of base material 22 was inserted into the inside of anchor clamps 41.
Shown in Fig. 9 B, make 41 of anchor clamps along the circumferential direction Q rotation of target 21, be inserted into the one side L1 of the second engaging protuberance 42 and the first snap fastener E1 after the nonoverlapping position of circumferential direction Q, then, shown in Fig. 9 C, make anchor clamps 41 along the circumferential direction Q rotation of target 21.When this rotates, when the second snap fastener E2 of formation the first engaging protuberance 31 and the another side L2 of the second engaging protuberance 42 slide along circumferential direction Q, anchor clamps 41 rotations.
If anchor clamps 41 rotary compasses are quantitative, then the one side L1 of the second engaging protuberance 42 abuts to the 3rd snap fastener E3 that consists of the first engaging protuberance 31.Engage the butt of protuberance 42 with second by the 3rd snap fastener E3, the rotation along circumferential direction of anchor clamps 41 is suppressed.
Then, the fastening screw 43 of fixed mechanism shown in Figure 8 45 is fastening towards target 21 along axis direction R, thus the first engaging protuberance 31 and the second engaging protuberance 42 tight joint, anchor clamps 41 are not easy rotation with respect to target 21.
Nomenclature
10: sputter equipment
12: anode
13: negative electrode
21: target
22: matrix
23: target
61: the first engaging protuberances
71: anchor clamps
72: the second engaging protuberances
Claims (9)
1. target installing mechanism, anticathode linking part can be installed and removed ground the columnar target that uses in the sputter equipment is installed, it is characterized in that,
Described target possesses columnar matrix and covers the target of this matrix, and has the middle section of being furnished with described target and the connecting area that exposes at the described matrix of the both end sides except this middle section;
Be formed with the anchor clamps of the general cylindrical shape of built-in this linking part and described connecting area at the linking part of described negative electrode;
Under described linking part and described connecting area are built in state in the described anchor clamps, the first the second engaging protuberance that engages protuberance and the inner peripheral surface that is formed at described anchor clamps that is formed at the described connecting area of described target only relatively moves along the circumferential direction of described target, thus engaging.
2. target installing mechanism according to claim 1 is characterized in that,
The required torque of engaging of described the first engaging protuberance and described the second engaging protuberance is more than the 1kgfcm, below the 20kgfcm.
3. target installing mechanism according to claim 1 is characterized in that,
The contact surface of described the first engaging protuberance and described the second engaging protuberance is that the circumferential direction of described target is that the direction of principal axis of minor face, described target is the shape on long limit.
4. target installing mechanism according to claim 1 is characterized in that, possesses the structure of sending the signal of judging that described the first engaging protuberance and the described second snap action that engages protuberance have been finished.
5. target installing mechanism according to claim 1 is characterized in that,
Described the second engaging protuberance is formed with more than three, be positioned on the same line of inner peripheral surface direction of described anchor clamps, and be positioned at the turning axle of described target is regarded as on the imaginary circle at center, and with respect to the line segment of at least one in the protuberance by described center and described the second engaging, other described the second engaging protuberance rotational symmetry configuration.
6. target installing mechanism according to claim 1 is characterized in that, further possesses packing ring, this packing ring be arranged on the described linking part of described negative electrode with respect to the contact part of the vertically extending part in axle center with described matrix.
7. target installing mechanism according to claim 1 is characterized in that, further possesses fixed mechanism, this fixed mechanism make on the described linking part of described negative electrode with respect to the vertically extending part in axle center and described matrix tight joint.
8. target installing mechanism according to claim 1 is characterized in that, further possesses liner, this liner be configured on the described linking part of described negative electrode with respect to the gap of the vertically extending part in axle center with described anchor clamps.
9. target installing mechanism according to claim 8 is characterized in that, implements surface treatment at described liner.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010146617 | 2010-06-28 | ||
| JP2010-146617 | 2010-06-28 | ||
| PCT/JP2011/064801 WO2012002383A1 (en) | 2010-06-28 | 2011-06-28 | Target mounting mechanism |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102884222A true CN102884222A (en) | 2013-01-16 |
| CN102884222B CN102884222B (en) | 2014-09-10 |
Family
ID=45402090
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180022714.7A Expired - Fee Related CN102884222B (en) | 2010-06-28 | 2011-06-28 | Target mounting mechanism |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5572710B2 (en) |
| CN (1) | CN102884222B (en) |
| TW (1) | TWI498437B (en) |
| WO (1) | WO2012002383A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108486535A (en) * | 2018-05-17 | 2018-09-04 | 宁波江丰电子材料股份有限公司 | Target material assembly |
| CN111719124A (en) * | 2019-03-21 | 2020-09-29 | 广东太微加速器有限公司 | Combined target |
| CN114517287A (en) * | 2022-02-24 | 2022-05-20 | 武汉普迪真空科技有限公司 | High-power pulse magnetron sputtering device |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013181221A (en) * | 2012-03-02 | 2013-09-12 | Ulvac Japan Ltd | Target assembly and target unit |
| AT13609U1 (en) * | 2012-09-17 | 2014-04-15 | Plansee Se | Tubular target |
| JP7434041B2 (en) * | 2020-04-13 | 2024-02-20 | 浜松ホトニクス株式会社 | Energy ray irradiation device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0698908A2 (en) * | 1994-08-25 | 1996-02-28 | The Boc Group, Inc. | Magnetron apparatus |
| WO2002070777A1 (en) * | 2001-02-17 | 2002-09-12 | David Mark Lynn | Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5591314A (en) * | 1995-10-27 | 1997-01-07 | Morgan; Steven V. | Apparatus for affixing a rotating cylindrical magnetron target to a spindle |
| US20060278519A1 (en) * | 2005-06-10 | 2006-12-14 | Leszek Malaszewski | Adaptable fixation for cylindrical magnetrons |
| ES2375235T3 (en) * | 2008-02-15 | 2012-02-28 | Bekaert Advanced Coatings Nv. | VACUUM COUPLING WITH MULTIPLE SCREENS. |
| KR101560384B1 (en) * | 2008-06-26 | 2015-10-14 | 가부시키가이샤 알박 | Cathode unit and spattering device having same |
-
2011
- 2011-06-28 WO PCT/JP2011/064801 patent/WO2012002383A1/en active Application Filing
- 2011-06-28 JP JP2012522641A patent/JP5572710B2/en not_active Expired - Fee Related
- 2011-06-28 CN CN201180022714.7A patent/CN102884222B/en not_active Expired - Fee Related
- 2011-06-28 TW TW100122711A patent/TWI498437B/en not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0698908A2 (en) * | 1994-08-25 | 1996-02-28 | The Boc Group, Inc. | Magnetron apparatus |
| WO2002070777A1 (en) * | 2001-02-17 | 2002-09-12 | David Mark Lynn | Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108486535A (en) * | 2018-05-17 | 2018-09-04 | 宁波江丰电子材料股份有限公司 | Target material assembly |
| CN111719124A (en) * | 2019-03-21 | 2020-09-29 | 广东太微加速器有限公司 | Combined target |
| CN114517287A (en) * | 2022-02-24 | 2022-05-20 | 武汉普迪真空科技有限公司 | High-power pulse magnetron sputtering device |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI498437B (en) | 2015-09-01 |
| CN102884222B (en) | 2014-09-10 |
| JPWO2012002383A1 (en) | 2013-08-29 |
| TW201211293A (en) | 2012-03-16 |
| JP5572710B2 (en) | 2014-08-13 |
| WO2012002383A1 (en) | 2012-01-05 |
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