CN102867717B - 防着板支承部件及具有该防着板支承部件的离子源 - Google Patents

防着板支承部件及具有该防着板支承部件的离子源 Download PDF

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Publication number
CN102867717B
CN102867717B CN201210057513.7A CN201210057513A CN102867717B CN 102867717 B CN102867717 B CN 102867717B CN 201210057513 A CN201210057513 A CN 201210057513A CN 102867717 B CN102867717 B CN 102867717B
Authority
CN
China
Prior art keywords
plasma
container
support unit
plate support
prevent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201210057513.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN102867717A (zh
Inventor
井内裕
土肥正二郎
谷井正博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NINSSIN ION EQUIPMENT CO Ltd
Original Assignee
NINSSIN ION EQUIPMENT CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NINSSIN ION EQUIPMENT CO Ltd filed Critical NINSSIN ION EQUIPMENT CO Ltd
Publication of CN102867717A publication Critical patent/CN102867717A/zh
Application granted granted Critical
Publication of CN102867717B publication Critical patent/CN102867717B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
CN201210057513.7A 2011-07-08 2012-03-06 防着板支承部件及具有该防着板支承部件的离子源 Expired - Fee Related CN102867717B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011-151326 2011-07-08
JP2011151326A JP2013020737A (ja) 2011-07-08 2011-07-08 防着板支持部材およびこれを備えたイオン源

Publications (2)

Publication Number Publication Date
CN102867717A CN102867717A (zh) 2013-01-09
CN102867717B true CN102867717B (zh) 2015-04-08

Family

ID=47446508

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201210057513.7A Expired - Fee Related CN102867717B (zh) 2011-07-08 2012-03-06 防着板支承部件及具有该防着板支承部件的离子源

Country Status (4)

Country Link
JP (1) JP2013020737A (ko)
KR (1) KR101384571B1 (ko)
CN (1) CN102867717B (ko)
TW (1) TW201303950A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6307825B2 (ja) * 2013-09-25 2018-04-11 日新イオン機器株式会社 防着板支持部材、プラズマ源およびイオンビーム照射装置
CN206768212U (zh) * 2017-06-08 2017-12-19 合肥鑫晟光电科技有限公司 成膜设备
JP6642612B2 (ja) * 2018-04-12 2020-02-05 日新イオン機器株式会社 イオン源、イオンビーム照射装置及びイオン源の運転方法
KR102458164B1 (ko) * 2020-11-05 2022-10-24 (주)제이피오토메이션 오염방지 방착판을 구비한 진공 증착 장치
CN114850003B (zh) * 2021-02-03 2023-06-27 芝浦机械电子装置株式会社 加热处理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62296332A (ja) * 1986-06-16 1987-12-23 Hitachi Ltd イオン源
US5573596A (en) 1994-01-28 1996-11-12 Applied Materials, Inc. Arc suppression in a plasma processing system
JP4717186B2 (ja) * 2000-07-25 2011-07-06 株式会社アルバック スパッタリング装置
JP4703828B2 (ja) * 2000-09-07 2011-06-15 株式会社アルバック スパッタリング装置及び薄膜製造方法
KR20050009516A (ko) * 2003-07-16 2005-01-25 매그나칩 반도체 유한회사 낮은 결합노이즈의 평판 커패시터 구조를 갖는 디램 셀을제조하는 방법
JP2010153095A (ja) * 2008-12-24 2010-07-08 Showa Shinku:Kk イオンガン
CN101930891B (zh) * 2009-06-25 2012-08-22 北京北方微电子基地设备工艺研究中心有限责任公司 反应腔室和内衬装置

Also Published As

Publication number Publication date
TW201303950A (zh) 2013-01-16
JP2013020737A (ja) 2013-01-31
CN102867717A (zh) 2013-01-09
KR20130006273A (ko) 2013-01-16
KR101384571B1 (ko) 2014-04-11

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20150408

Termination date: 20210306

CF01 Termination of patent right due to non-payment of annual fee