CN102866595A - Two-dimensional micro-displacement measuring method for double workpiece tables of photoetching machine and sensing device - Google Patents
Two-dimensional micro-displacement measuring method for double workpiece tables of photoetching machine and sensing device Download PDFInfo
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Abstract
A two-dimensional micro-displacement measuring method for double workpiece tables of a photoetching machine and a sensing device belong to integrated circuit (IC) manufacture and ultra precise measurement and machining devices. The measuring method includes that output Hall voltage signals of a Hall micro-displacement sensor change in linear mode along with relative displacement of a macro workpiece table and a micro workpiece table, the two Hall micro-displacement sensors in 90-degree phase relation are used for measuring two-dimensional micro-displacement, and an external detecting circuit processes and combines the output signals of the two Hall sensors to finish measurement. The sensing device solves the problems of high-speed high-precision relative-position detecting of special positions such as a photoetching micro double-driving mechanism Chuck table and a mask table, has the advantages of being free of contact, good in linearity, high in integration level and strong in transplanting capacity, and can achieve multi-dimensional measurement such as one dimension, two dimensions and three dimensions and meets environment requirements of a photoetching system.
Description
Technical field
The invention belongs to IC manufacturing and ultra precise measurement and process technology, relate generally to a kind of two-dimensional micro-displacement measuring method and sensing device for the litho machine double-workpiece-table.
Background technology
Photoetching is core procedure in the manufacturing of large scale integrated circuit, and grand little dual-stage technology is one of Main Means that improves the litho machine performance.The macro-micro dual-drive technology is as large stroke, high precision, high speed detent mechanism, and research has at home and abroad obtained certain achievement.
Wherein, the photo-electric such as grating scale and laser interferometer method is controlled in the double-workpiece-table by close-loop feedback and uses to some extent: the 4th phase of machine design and manufacture magazine August calendar year 2001 71-72 page or leaf has been delivered the article of a piece " controlling party and research of large stroke and high precision the two poles of the earth positioning table " by name, this worktable utilizes single frequency laser interferometer to realize the closed loop position feedback, can realize the repetitive positioning accuracy of the interior 20nm of impulse stroke of 500mm; 2005, the optical precision engineering reports the 13rd volume the 2nd phase 171-178 page or leaf to deliver the article of a piece " a kind of modeling and control of macro-micro dual-drive ultra-precision positioning mechanism " by name, a kind of macro-micro dual-drive ultra-precision positioning mechanism is proposed, adopt the position signalling of precise grating chi feedback micromotion platform output terminal, realize the closed-loop feedback control of detent mechanism, realize the repetitive positioning accuracy of 10nm in the 100mm impulse stroke.Above-mentioned measurement mechanism has solved some practical problemss in some double-workpiece-table motion controls, but locates apart from feedback mainly for grand little dual-workpiece director, and electro-optical pickoff is expensive, and complex structure is had relatively high expectations to working environment.
And for the short distance detection problem of the specific positions such as grand little double-workpiece-table Chuck platform, mask stage, common are electric capacity, inductance sensor: 1999, instrumental technique and sensor report the 9th phase 4-5 page or leaf to deliver the article of a piece " novel Inductance Micro-Displacement Sensor " by name, this article has been developed a kind of novel high-precision inductance sensor, its resolution is 5nm, and measurement range is 20 μ m, 200 μ m; 1999, the 21st volume fifth phase of National University of Defense technology's journal 91-94 page or leaf has been delivered the article of a piece " Ultraprecision Air Bearing Capacitive Sensor System " by name, this capacitive sensor system is used for ultraprecise contact type measurement system, and its resolution reaches 0.01 μ m, and measurement range only is 50 μ m; 2005, low 24 volumes the 10th phase 13-16 page or leaf of sensor technology newspaper has been delivered the article of a piece " Design of capacitance micro-displacement sensor and applied research thereof " by name, adopt equipotential ring and driven shield cable technology, designed capacitance micro-displacement sensor, resolving power is 0.1 μ m, and range is 20 μ m.This class electric capacity, inductance type transducer resolution 1nm, precision can reach several nanometers, but that limitation is range is all smaller, and be generally tens and do not wait to the hundreds of micron, and its complex structure, the instrument volume is large, is subject to environmental interference.
Summary of the invention
The present invention is directed to the deficiency that above-mentioned prior art exists, a kind of high-speed, high precision two-dimensional micro-displacement measuring method and sensing device for the litho machine double-workpiece-table proposed, to solve the monitoring problem of the specific positions such as the grand little double-workpiece-table Chuck platform of litho machine, mask stage, reach simple in structure, integrated level is high, be easy to install, flexibility ratio is high, the purpose of fast response time.
The object of the present invention is achieved like this:
A kind of two-dimensional micro-displacement measuring method for the litho machine double-workpiece-table, this measuring method step is as follows:
The first step, the grand actuation mechanism of the grand little double-workpiece-table of litho machine and micromotion mechanism produce relative displacement, magnetic-field component perpendicular to the Hall element surface changes with relative displacement is linear, is the first Hall micro-displacement sensor of 90 ° of phase relations and the output Hall voltage signal intensity of the second Hall micro-displacement sensor;
Second step, the output Hall voltage signal of the first Hall micro-displacement sensor and the second Hall micro-displacement sensor amplify with filtering through the signal condition module of outer detecting circuit to be processed; Obtain voltage magnitude and the phase place of the size and Orientation of the representative grand actuation mechanism of grand little double-workpiece-table and grand little double-workpiece-table micromotion mechanism relative shift;
The 3rd step, voltage magnitude and phase place are carried out data acquisition and control through the data acquisition module of outer detecting circuit, send at last host computer and process with comprehensive.
A kind of microdisplacement measurement sensing device for the litho machine double-workpiece-table comprises litho machine double-workpiece-table, the grand actuation mechanism of double-workpiece-table, double-workpiece-table micromotion mechanism, the first Hall link, the first Hall micro-displacement sensor, the second Hall link, the second Hall micro-displacement sensor and outer detecting circuit; Described first and second Hall micro-displacement sensor forms by mover permanent magnet group pedestal, permanent magnet group and stator gallium arsenide Hall element; Wherein mover permanent magnet group pedestal is fixed on the grand actuation mechanism of double-workpiece-table or the double-workpiece-table micromotion mechanism, parallel and the level of permanent magnet group is packed on the mover permanent magnet group pedestal, the stator gallium arsenide Hall element of the first Hall micro-displacement sensor is installed on the side end of the first Hall link, the stator gallium arsenide Hall element of the second Hall micro-displacement sensor is installed on the side end of the second Hall link, and two stator gallium arsenide Hall elements all are parallel to upper surface or the lower surface of permanent magnet group; The output terminal of the stator gallium arsenide Hall element of first and second Hall micro-displacement sensor all links to each other with the input end of outer detecting circuit; Angle between the first Hall link and the second Hall link is 90 °; The end side of the first Hall link is fixed on double-workpiece-table micromotion mechanism or the grand actuation mechanism of double-workpiece-table; The end side of the second Hall link is fixed on double-workpiece-table micromotion mechanism or the grand actuation mechanism of double-workpiece-table.
Outer detecting circuit comprises hall sensing module, signal condition module and data acquisition module; The hall sensing module is comprised of power supply stabilization circuit, current voltage-controlled constant-current circuit and temperature-compensation circuit; The signal condition module is by zero bias circuit, instrument amplifying circuit, offset correction main circuit amplifying circuit and second-order low-pass filter the electric circuit constitute; Data acquisition module is comprised of A/D chip, control chip and host computer; The output terminal of described power supply stabilization circuit is connected with the power input of current voltage-controlled constant-current circuit, the signal output part of current voltage-controlled constant-current circuit and the signal input part of temperature-compensation circuit and the first Hall micro-displacement sensor be connected the power input of Hall micro-displacement sensor and be connected; The first Hall micro-displacement sensor be connected the displacement signal output terminal of Hall micro-displacement sensor and be connected with the signal positive input of instrument with amplifying circuit, the output terminal of zero bias circuit is connected with the signal negative input of instrument with amplifying circuit, the output terminal of offset correction circuit is connected with the reference voltage input of instrument with amplifying circuit, instrument is connected with the signal input part of main amplifying circuit with the signal output part of amplifying circuit, the signal output part of main amplifying circuit is connected with the signal input part of second-order low-pass filter circuit, and the output terminal of second-order low-pass filter circuit is connected with the input end of analog signal of A/D chip; The digital signal output end of A/D chip is connected with the displacement signal input end of control chip, and the displacement measurement signal output part of control chip is connected with the signal input part of host computer; Host computer links to each other with computer display screen.
Compared with prior art, characteristics advantage of the present invention is:
A kind of two-dimensional micro-displacement measuring method and measurement mechanism for the litho machine double-workpiece-table of the present invention, its characteristics and advantages is: it is interval that the permanent magnet group of horizontal positioned produces linear magnetic field, this magnetic field intervals linear degree is good, and the range of linearity is wide, and magnetic field sensitivity is high; This installs electronic sub-permanent magnet group and stator gallium arsenide Hall element, measures relative displacement; Mover is fixed in the grand actuation mechanism stator of grand little double-workpiece-table and is fixed in grand little double-workpiece-table micromotion mechanism, or stator is fixed in the grand actuation mechanism mover of grand little double-workpiece-table and is fixed on grand little double-workpiece-table micromotion mechanism, simple in structure, Abbe error is little, can directly record the position signalling of macro-micro dual-drive platform, the realization double-workpiece-table is accurately located; Integrated level is high, is easy to install, and is mainly used in the monitoring of the specific positions such as Chuck platform, mask stage of grand little double-workpiece-table; Flexibility ratio is high, can carry out one dimension, two dimension, even three-dimensional measurement; Contactless, the life-span is long; Highly sensitive, good resolution, fast response time can be measured ± the little displacement of 1mm, and in range ability, the linearity is better than 0.2%.
Description of drawings
Fig. 1 is the Hall effect basic principle schematic
Fig. 2 is that grand moving platform is a kind of for litho machine double-workpiece-table two-dimension displacement measurement scheme dynamic model structural representation of mover
Fig. 3 is that grand moving platform is a kind of for litho machine double-workpiece-table two-dimension displacement measurement scheme dynamic model structural representation of stator
Fig. 4 is Hall effect microdisplacement measurement scheme synoptic diagram
Fig. 5 is outer detecting circuit design cycle synoptic diagram
Piece number among the figure: 1-litho machine double-workpiece-table; The grand actuation mechanism of 2-double-workpiece-table; 3-double-workpiece-table micromotion mechanism; 4-the first Hall link; 5-the first Hall micro-displacement sensor; 6-the second Hall link; 7-the second Hall micro-displacement sensor; The 8-outer detecting circuit; 8-1-hall sensing module; The 8-1-1-power supply stabilization circuit; The 8-1-2-current voltage-controlled constant-current circuit; The 8-1-3-temperature-compensation circuit; 8-2-signal condition module; 8-2-1-zero bias circuit; 8-2-2-instrument amplifying circuit; 8-2-3-offset correction circuit; The 8-2-4-main amplifying circuit; 8-2-5-second-order low-pass filter circuit; The 8-3-data acquisition module; The 8-3-1-A/D chip; The 8-3-2-control chip; The 8-3-3-host computer; 9-mover permanent magnet group pedestal; 10-permanent magnet group; 11-stator gallium arsenide Hall element;
Embodiment
Below in conjunction with accompanying drawing the specific embodiment of the invention is described in further detail:
See also Fig. 2 and Fig. 3, a kind of two-dimensional micro-displacement for the litho machine double-workpiece-table is measured sensing device, comprises litho machine double-workpiece-table 1, the grand actuation mechanism 2 of double-workpiece-table, double-workpiece-table micromotion mechanism 3, the first Hall link 4, the first Hall micro-displacement sensor 5, the second Hall link 6, the second Hall micro-displacement sensor 7 and outer detecting circuit 8; Described first and second Hall micro-displacement sensor 5,7 forms by mover permanent magnet group pedestal 9, permanent magnet group 10 and stator gallium arsenide Hall element 11; Wherein mover permanent magnet group pedestal 9 is fixed on the grand actuation mechanism 2 of double-workpiece-table or the double-workpiece-table micromotion mechanism 3, parallel and the level of permanent magnet group 10 is packed on the mover permanent magnet group pedestal 9, the stator gallium arsenide Hall element 11 of the first Hall micro-displacement sensor 5 is installed on the side end of the first Hall link 4, the stator gallium arsenide Hall element 11 of the second Hall micro-displacement sensor 7 is installed on the side end of the second Hall link 6, and two stator gallium arsenide Hall elements 11 all are parallel to upper surface or the lower surface of permanent magnet group 10; The output terminal of first and second Hall micro-displacement sensor 5,7 stator gallium arsenide Hall element 11 all links to each other with the input end of outer detecting circuit 8; Angle between the first Hall link 4 and the second Hall link 6 is 90 °; The end side of the first Hall link 4 is fixed on double-workpiece-table micromotion mechanism 3 or the grand actuation mechanism 2 of double-workpiece-table; The end side of the second Hall link 6 is fixed on double-workpiece-table micromotion mechanism 3 or the grand actuation mechanism 2 of double-workpiece-table.
Fig. 5 is outer detecting circuit design cycle synoptic diagram, and outer detecting circuit 8 comprises hall sensing module 8-1, signal condition module 8-2 and data acquisition module 8-3; Hall sensing module 8-1 is comprised of power supply stabilization circuit 8-1-1, current voltage-controlled constant-current circuit 8-1-2 and temperature-compensation circuit 8-1-3; Signal condition module 8-2 is comprised of with amplifying circuit 8-2-2, offset correction circuit 8-2-3, main amplifying circuit 8-2-4 and second-order low-pass filter circuit 8-2-5 zero bias circuit 8-2-1, instrument; Data acquisition module 8-3 is comprised of A/D chip 8-3-1, control chip 8-3-2 and host computer 8-3-3; The output terminal of described power supply stabilization circuit 8-1-1 is connected with the power input of current voltage-controlled constant-current circuit 8-1-2, the signal input part of the signal output part of current voltage-controlled constant-current circuit 8-1-2 and temperature-compensation circuit 8-1-3 and the first Hall micro-displacement sensor 5 be connected the power input of Hall micro-displacement sensor 7 and be connected; The first Hall micro-displacement sensor 5 be connected the displacement signal output terminal of Hall micro-displacement sensor 7 and be connected with the signal positive input of instrument with amplifying circuit 8-2-2, the output terminal of zero bias circuit 8-2-1 is connected with the signal negative input of instrument with amplifying circuit 8-2-2, the output terminal of offset correction circuit 8-2-3 is connected with the reference voltage input of instrument with amplifying circuit 8-2-2, instrument is connected with the signal input part of main amplifying circuit 8-2-4 with the signal output part of amplifying circuit 8-2-2, the signal output part of main amplifying circuit 8-2-4 is connected with the signal input part of second-order low-pass filter circuit 8-2-5, and the output terminal of second-order low-pass filter circuit 8-2-5 is connected with the input end of analog signal of A/D chip 8-3-1; The digital signal output end of A/D chip 8-3-1 is connected with the displacement signal input end of control chip 8-3-2, and the displacement measurement signal output part of control chip 8-3-2 is connected with the signal input part of host computer 8-3-3; Host computer 8-3-3 links to each other with computer display screen.
In conjunction with Fig. 1, Fig. 4 microdisplacement measurement method of the present invention is described.Fig. 1 is the Hall effect basic principle schematic, and the semiconductor alloy sheet is placed perpendicular to its surperficial magnetic field B, when having current i to flow through along the ab direction, will produce hall output voltage U on perpendicular to the direction cd of current i and magnetic field B
H, this physical phenomenon is called Hall effect; Current i is constant, then hall output voltage U
HB is directly proportional with magnetic field intensity; Fig. 4 is Hall effect microdisplacement measurement scheme synoptic diagram, and the permanent magnet group 10 that parallel, horizontal is placed produces along the linear magnetic field interval B perpendicular to magnet upper surface direction
zStator gallium arsenide Hall element 11 is parallel to permanent magnet group 10 upper surfaces, permanent magnet group 10 is fixed on the grand actuation mechanism 2 of double-workpiece-table or the double-workpiece-table micromotion mechanism 3 as mover, chairman's Ding gallium arsenide Hall element 11 is fixed on double-workpiece-table micromotion mechanism 3 or the grand actuation mechanism 2 of double-workpiece-table as stator, when the grand actuation mechanism 2 of litho machine double-workpiece-table produced relative displacement with micromotion mechanism 3, the hall output voltage signal was with this relative displacement linear change; The two-dimensional phase positional change even that two Hall micro-displacement sensors the first Hall micro-displacement sensor 5 by being 90 ° of phase relations and the second Hall micro-displacement sensor 7 can record the grand actuation mechanism 2 of double-workpiece-table and double-workpiece-table micromotion mechanism 3.Its measuring method step is: the first step, the grand actuation mechanism 2 of the grand little double-workpiece-table of litho machine produces relative displacement with micromotion mechanism 3, perpendicular to the magnetic-field component B on gallium arsenide Hall element 11 surfaces
zChange the output Hall voltage signal intensity of the first Hall micro-displacement sensor 5 and the second Hall micro-displacement sensor 7 with relative displacement is linear; Second step, the output Hall voltage signal of the first Hall micro-displacement sensor 5 and the second Hall micro-displacement sensor 7 amplify with filtering through the signal condition module 8-2 of outer detecting circuit 8 to be processed; Obtain voltage magnitude and the phase place of the size and Orientation of the grand actuation mechanism 2 of the grand little double-workpiece-table of representative and grand little double-workpiece-table micromotion mechanism 3 relative shifts; The 3rd step, voltage magnitude and phase place are carried out data acquisition and control through the data acquisition module 8-3 of outer detecting circuit 8, send at last host computer 8-3-3 and process with comprehensive.
Claims (3)
1. two-dimensional micro-displacement measuring method that is used for the litho machine double-workpiece-table is characterized in that this measuring method step is:
The first step, the grand actuation mechanism of the grand little double-workpiece-table of litho machine and micromotion mechanism produce relative displacement, magnetic-field component perpendicular to the Hall element surface changes with relative displacement is linear, is the first Hall micro-displacement sensor of 90 ° of phase relations and the output Hall voltage signal intensity of the second Hall micro-displacement sensor;
Second step, the output Hall voltage signal of the first Hall micro-displacement sensor and the second Hall micro-displacement sensor amplify with filtering through the signal condition module of outer detecting circuit to be processed; Obtain voltage magnitude and the phase place of the size and Orientation of the representative grand actuation mechanism of grand little double-workpiece-table and grand little double-workpiece-table micromotion mechanism relative shift;
The 3rd step, voltage magnitude and phase place are carried out data acquisition and control through the data acquisition module of outer detecting circuit, send at last host computer and process with comprehensive.
2. a two-dimensional micro-displacement that is used for the litho machine double-workpiece-table is measured sensing device, comprise litho machine double-workpiece-table (1), the grand actuation mechanism of double-workpiece-table (2) and double-workpiece-table micromotion mechanism (3), it is characterized in that this device also comprises the first Hall link (4), the first Hall micro-displacement sensor (5), the second Hall link (6), the second Hall micro-displacement sensor (7) and outer detecting circuit (8); Described first and second Hall micro-displacement sensor (5,7) forms by mover permanent magnet group pedestal (9), permanent magnet group (10) and stator gallium arsenide Hall element (11); Wherein mover permanent magnet group pedestal (9) is fixed on the grand actuation mechanism of double-workpiece-table (2) or the double-workpiece-table micromotion mechanism (3), parallel and the level of permanent magnet group (10) is packed on the mover permanent magnet group pedestal (9), the stator gallium arsenide Hall element (11) of the first Hall micro-displacement sensor (5) is installed on the side end of the first Hall link (4), the stator gallium arsenide Hall element (11) of the second Hall micro-displacement sensor (7) is installed on the side end of the second Hall link (6), and two stator gallium arsenide Hall elements (11) all are parallel to upper surface or the lower surface of permanent magnet group (10); The output terminal of the stator gallium arsenide Hall element (11) of first and second Hall micro-displacement sensor (5,7) all links to each other with the input end of outer detecting circuit (8); Angle between the first Hall link (4) and the second Hall link (6) is 90 °; The end side of the first Hall link (4) is fixed on double-workpiece-table micromotion mechanism (3) or the grand actuation mechanism of double-workpiece-table (2); The end side of the second Hall link (6) is fixed on double-workpiece-table micromotion mechanism (3) or the grand actuation mechanism of double-workpiece-table (2).
3. a kind of two-dimensional micro-displacement for the litho machine double-workpiece-table according to claim 2 is measured sensing device, it is characterized in that outer detecting circuit (8) comprises hall sensing module (8-1), signal condition module (8-2) and data acquisition module (8-3); Hall sensing module (8-1) is comprised of power supply stabilization circuit (8-1-1), current voltage-controlled constant-current circuit (8-1-2) and temperature-compensation circuit (8-1-3); Signal condition module (8-2) is comprised of with amplifying circuit (8-2-2), offset correction circuit (8-2-3), main amplifying circuit (8-2-4) and second-order low-pass filter circuit (8-2-5) zero bias circuit (8-2-1), instrument; Data acquisition module (8-3) is comprised of A/D chip (8-3-1), control chip (8-3-2) and host computer (8-3-3); The output terminal of described power supply stabilization circuit (8-1-1) is connected with the power input of current voltage-controlled constant-current circuit (8-1-2), the signal input part of the signal output part of current voltage-controlled constant-current circuit (8-1-2) and temperature-compensation circuit (8-1-3) and the first Hall micro-displacement sensor (5) be connected the power input of Hall micro-displacement sensor (7) and be connected; The first Hall micro-displacement sensor (5) be connected the displacement signal output terminal of Hall micro-displacement sensor (7) and be connected with the signal positive input of instrument with amplifying circuit (8-2-2), the output terminal of zero bias circuit (8-2-1) is connected with the signal negative input of instrument with amplifying circuit (8-2-2), the output terminal of offset correction circuit (8-2-3) is connected with the reference voltage input of instrument with amplifying circuit (8-2-2), instrument is connected with the signal input part of main amplifying circuit (8-2-4) with the signal output part of amplifying circuit (8-2-2), the signal output part of main amplifying circuit (8-2-4) is connected with the signal input part of second-order low-pass filter circuit (8-2-5), and the output terminal of second-order low-pass filter circuit (8-2-5) is connected with the input end of analog signal of A/D chip (8-3-1); The digital signal output end of A/D chip (8-3-1) is connected with the displacement signal input end of control chip (8-3-2), and the displacement measurement signal output part of control chip (8-3-2) is connected with the signal input part of host computer (8-3-3); Host computer (8-3-3) links to each other with computer display screen.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109059744A (en) * | 2017-06-13 | 2018-12-21 | 南京理工大学 | Micro-displacement signal detection system and measurement method based on ADA2200 |
| CN110375975A (en) * | 2019-07-25 | 2019-10-25 | 深圳市阿尔艾富信息技术股份有限公司 | A kind of disconnected spring detection circuit of track damping spring |
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| CN1726630A (en) * | 2002-12-16 | 2006-01-25 | 皇家飞利浦电子股份有限公司 | Apparatus for processing an object with high position accurancy |
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| US5493216A (en) * | 1993-09-08 | 1996-02-20 | Asa Electronic Industry Co., Ltd. | Magnetic position detector |
| US6442858B1 (en) * | 1999-02-03 | 2002-09-03 | Canon Kabushiki Kaisha | Positioning apparatus, exposure apparatus, device manufacturing method, and positioning method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109059744A (en) * | 2017-06-13 | 2018-12-21 | 南京理工大学 | Micro-displacement signal detection system and measurement method based on ADA2200 |
| CN110375975A (en) * | 2019-07-25 | 2019-10-25 | 深圳市阿尔艾富信息技术股份有限公司 | A kind of disconnected spring detection circuit of track damping spring |
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Application publication date: 20130109 |