CN102844878A - 太阳能电池设备 - Google Patents

太阳能电池设备 Download PDF

Info

Publication number
CN102844878A
CN102844878A CN2011800055812A CN201180005581A CN102844878A CN 102844878 A CN102844878 A CN 102844878A CN 2011800055812 A CN2011800055812 A CN 2011800055812A CN 201180005581 A CN201180005581 A CN 201180005581A CN 102844878 A CN102844878 A CN 102844878A
Authority
CN
China
Prior art keywords
solar cell
connecting elements
cell device
light absorbing
absorbing zone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011800055812A
Other languages
English (en)
Inventor
李昇烨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Innotek Co Ltd
Original Assignee
LG Innotek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Innotek Co Ltd filed Critical LG Innotek Co Ltd
Publication of CN102844878A publication Critical patent/CN102844878A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/072Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
    • H01L31/0749Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type including a AIBIIICVI compound, e.g. CdS/CulnSe2 [CIS] heterojunction solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/032Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
    • H01L31/0322Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03923Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIBIIICVI compound materials, e.g. CIS, CIGS
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03926Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate comprising a flexible substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03926Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate comprising a flexible substrate
    • H01L31/03928Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate comprising a flexible substrate including AIBIIICVI compound, e.g. CIS, CIGS deposited on metal or polymer foils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/0445PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/05Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells
    • H01L31/0504Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module
    • H01L31/0512Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module made of a particular material or composition of materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Energy (AREA)
  • Sustainable Development (AREA)
  • Inorganic Chemistry (AREA)
  • Photovoltaic Devices (AREA)

Abstract

公开了一种太阳能电池设备。所述太阳能电池设备包括:第一太阳能电池;以及与所述第一太阳能电池部分重叠并且与所述第一太阳能电池连接的第二太阳能电池。

Description

太阳能电池设备
技术领域
本发明涉及一种太阳能电池设备。
背景技术
近来,随着能量消耗的增长,已经研发了将太阳能转化为电能的太阳能电池。
具体地,已广泛使用基于CIGS的电池,所述基于CIGS的电池是具有衬底结构的pn异质结设备,包括玻璃衬底、金属后电极层、p型基于CIGS的光吸收层、高电阻缓冲层和n型窗口层。
特别地,太阳能电池包括互相串联和/或并联连接的多个电池,并且太阳能电池设备的特性可以随着电池的特性而变化。
发明内容
技术问题
本发明提供一种太阳能电池设备,所述太阳能电池易于制造、具有提高的效率并且是挠性的。
技术方案
根据本发明,提供一种太阳能电池设备,包括:第一太阳能电池;以及与所述第一太阳能电池部分重叠并且与所述第一太阳能电池连接的第二太阳能电池。
根据本发明,提供一种太阳能电池设备,包括:绝缘衬底;在所述绝缘衬底上的第一太阳能电池;以及第二太阳能电池,所述第二太阳能电池的一部分插置于所述绝缘衬底与所述第一太阳能电池之间同时与所述第一太阳能电池的下表面连接。
根据本发明,提供一种太阳能电池设备,包括:第一太阳能电池;与所述第一太阳能电池连接的第二太阳能电池;以及将所述第一太阳能电池与所述第二太阳能电池连接的连接构件。所述连接构件包括导电聚合物。
有益效果
在根据本发明的太阳能电池设备中,多个太阳能电池互相连接,同时互相重叠。因此,可以无需用于将多个太阳能电池互相区分并且互相连接的图案化过程就能形成根据本发明的太阳能电池设备。
因此,可以容易地制造根据本发明的太阳能电池设备。
另外,在根据本发明的太阳能电池设备中,可以最小化多个太阳能电池之间的重叠区域。此外,所述重叠区域是用于将太阳光转换为电能的有效区域。
因此,根据本发明的太阳能电池设备具有提高的发电效率。
另外,太阳能电池和在太阳能电池下面的包含绝缘体的支撑衬底可以是挠性的。因此,根据本发明的太阳能电池设备是挠性的。
具体地,当所述连接构件包括导电聚合物时,所述连接构件可以有效地将所述多个太阳能电池互相连接。
因此,根据本发明的太阳能电池设备可以具有改进的电特性。
附图说明
图1是示出根据实施例的太阳能电池设备的平面图;
图2是示出太阳能电池的剖视图;
图3是示出作为光吸收层的高度的函数的I族元素的组分的曲线图,其中I族元素的组分作为光吸收层的高度的函数;
图4是沿图1的A-A’线截取的剖视图;
图5至图8是示出太阳能电池的制造方法的剖视图;以及
图9和图10是示出根据另一实施例的形成光吸收层的制造过程的剖视图。
具体实施方式
在实施例的描述中,应该理解,当层(或膜)、区域、图案或结构被表述为在其它衬底、其它层(或膜)、其它区域、其它衬垫、或其它图案“上”或“下”时,它可以“直接地”或“间接地”在所述其它衬底、层(或膜)、区域、衬垫、或图案上,或者也可以存在一个或多个中间层。参照附图描述了所述层的这种位置关系。为了方便或清楚的目的,可以夸大、省略或示意性地描绘附图中各个层的厚度和尺寸。另外,元件的尺寸不完全反映实际尺寸。
图1是示出根据实施例的太阳能电池设备的平面图,图2是示出太阳能电池的剖视图,图3是示出I族元素的组分作为光吸收层的高度的函数的曲线图,图4是沿图1的A-A’线截取的剖视图。
参照图1至图4,根据实施例的太阳能电池设备包括支撑衬底10、多个太阳能电池C1、C2、…CN和多个连接构件21、22、…N。
支撑衬底10具有板形形状或薄片形状。支撑衬底10支撑太阳能电池C1、C2、…CN。支撑衬底10是绝缘体。支撑衬底10可以是挠性的。另外,支撑衬底10可以是刚性的。
例如,支撑衬底10可以包含乙烯-醋酸乙烯共聚物(EVA)。
太阳能电池C1、C2、…CN设置在支撑衬底10上。太阳能电池C1、C2、…CN互相连接。更详细地,太阳能电池C1、C2、…CN可以互相串联连接。太阳能电池C1、C2、…CN可以在一个方向上延伸。换言之,太阳能电池C1、C2、…CN可以布置为条纹状。
太阳能电池C1、C2、…CN中每一个的宽度W1可以在约0.5cm到约2.5cm的范围内。更详细地,太阳能电池C1、C2、…CN中每一个的宽度W1可以在约0.8cm到约1.2cm的范围内。
太阳能电池C1、C2、…CN互相重叠。换言之,太阳能电池C1、C2、…CN通过它们之间的重叠区域互相连接。在此情形中,太阳能电池C1、C2、…CN之间的各个重叠区域的宽度W2可以在约1mm到约5mm的范围内。
连接构件21、22、…N将太阳能电池C1、C2、…CN互相连接。例如,连接构件21、22、…N将互相重叠的太阳能电池C1、C2、…CN互相连接。更详细地,连接构件21、22、…N可以插置于互相重叠的太阳能电池C1、C2、…CN之间。
连接构件21、22、…N的宽度可以等于太阳能电池C1、C2、…CN之间的重叠区域的宽度W2。另外,连接构件21、22、…N可以覆盖太阳能电池C1、C2、…CN的整个下表面。连接构件21、22、…N中每一个的厚度在约20μm到约500μm的范围内。
连接构件21、22、…N可以包含导电聚合物。更详细地,连接构件21、22、…N可以包含蒽导电聚合物、聚苯胺导电聚合物或者基于聚(乙烯二氧噻吩):聚(苯乙烯磺酸盐)(PEDOT:PSS)的导电聚合物。
因此,连接构件21、22、…N相对于构成太阳能电池C1、C2、…CN的I族元素和导电氧化物来说可以具有高的粘合特性。另外,即使在低温过程中,构成连接构件21、22、…N的材料也可以容易地将太阳能电池C1、C2、…CN互相连接。
具体地,由于构成连接构件21、22、…N的导电聚合物具有高耐蚀性,因此可以防止太阳能电池C1、C2、…CN互相短路。所述导电聚合物使太阳能电池C1、C2、…CN在低温过程中容易地互相粘合。另外,由于所述导电聚合物具有弹性和较低的热膨胀系数,因此可以防止太阳能电池C1、C2、…CN由于热膨胀而互相短路。所述导电聚合物可以使太阳能电池C1、C2、…CN在互相结合,同时表现出提高的粘合强度。
如图2所示,太阳能电池C1、C2、…CN中的每一个可以包括后电极衬底100、光吸收层200、缓冲层300、高阻缓冲层400和窗口层500。
后电极衬底100具有板形形状,并且支撑光吸收层200、缓冲层300、高阻缓冲层400和窗口层500。
后电极衬底100是导体。换言之,后电极衬底100是导电衬底。后电极衬底100可以是挠性的。
后电极衬底100包含I族元素。换言之,例如,后电极衬底100可以包含诸如铜(Cu)或银(Ag)的I族元素。
更详细地,后电极衬底100可以包含I族元素。详细地,后电极衬底100可以包括Cu或Ag。更详细地,后电极衬底100可以由Cu或Ag制成。
后电极衬底100的厚度可以在约100μm到约15mm的范围内。详细地,后电极衬底100的厚度可以在约300μm到约5mm的范围内。
光吸收层200设置在后电极衬底100上。光吸收层200包含I族元素。详细地,光吸收层200包含I族元素的化合物。更详细地,光吸收层200包含基于I、III、VI族的化合物。更详细地,光吸收层200可以由基于I、III、VI族的化合物制成。
例如,基于I、III、VI族的化合物可以包括:选自由基于Cu、In、Ga、Se的化合物、基于Cu、In、Se的化合物、基于Cu、Ga、Se的化合物、基于Cu、In、Ga、S的化合物、基于Cu、In、S的化合物、基于Cu、Ga、S的化合物和基于Cu、In、Ga、Se、S的化合物组成的组中的基于Cu、III、VI族的化合物,或者包括选自由基于Cu、In、Ga、Se的化合物、基于Cu、In、Se的化合物、基于Cu、Ga、Se的化合物、基于Cu、In、Ga、S的化合物、基于Cu、In、S的化合物、基于Cu、Ga、S的化合物和基于Cu、In、Ga、Se、S的化合物组成的组中的基于Cu、III、VI族的化合物。
构成光吸收层200的I族元素的组分可以根据光吸收层200的位置而改变。更详细地,构成光吸收层200的I族元素的组分可以在朝向后电极衬底100的方向上增大。另外,构成光吸收层200的I族元素的组分可以在远离后电极衬底100的方向上减少。
换言之,随着光吸收层200的高度增大,光吸收层200具有的I族元素的组分更低。另外,随着光吸收层200的高度减小,光吸收层200具有的I族元素的组分更高。
详细地,光吸收层200可以包括与后电极衬底100相邻的第一区域和形成在第一区域上的第二区域。第一区域包括具有高组分的I族元素的基于I、III、VI族的化合物,第二区域包括具有低于第一区域的I族元素的组分的基于I、III、VI族的化合物。
另外,构成光吸收层200最下面表面的基于I、III、VI族的化合物包括组分最高的I族元素。另外,构成光吸收层200最上面表面的基于I、III、VI族的化合物包括组分最低的I族元素。
例如,后电极衬底100包含Cu,光吸收层200可以包含基于Cu、III、VI族的化合物,诸如基于Cu、In、Ga、Se的化合物、基于Cu、In、Se的化合物、基于Cu、Ga、Se的化合物、基于Cu、In、Ga、S的化合物、基于Cu、In、S的化合物、基于Cu、Ga、S的化合物或者基于Cu、In、Ga、Se、S的化合物。更详细地,可以用以下分子式来表示基于Cu、III、VI族的化合物:
分子式1:CuX(In,Ga)YSe2Z
分子式2:CuXInYSe2Z
分子式3:CuXGaYSe2Z
分子式4:CuX(In,Ga)YS2Z
分子式5:CuXInYS2Z
分子式6:CuXGaYS2Z
分子式7:CuX(In,Ga)Y(Se,S)2Z
在上面的分子式中,X、Y和Z大于0并且小于2。
在此情形中,如图3所示,光吸收层200包含在朝向后电极衬底100的方向上具有高X值的基于Cu、III、VI族的化合物。相反,光吸收层200包含在远离后电极衬底100的方向上具有低X值的基于Cu、III、VI族的化合物。
换言之,基于Cu、III、VI族的化合物的X值可以在远离后电极衬底100的方向上逐渐减小。
例如,在后电极衬底100与光吸收层200之间的界面的X的值(A)可以在约0.9到约1.5的范围内。另外,在光吸收层200与缓冲层300之间的界面的X的值(B)可以在约0.5到约0.95的范围内。
因此,光吸收层200的与后电极衬底100交界的界面处可以包含具有最高Ag组分的基于Cu、III、VI族的化合物。另外,光吸收层200的与缓冲层300交界的界面处可以包含具有最低Cu组分的基于Cu、III、VI族的化合物。
缓冲层300设置在光吸收层200上。缓冲层300包含硫化镉,并且缓冲层300的能带隙在约2.2eV到约2,4eV的范围内。
高阻缓冲层400设置在缓冲层300上。缓冲层400包括不掺杂质的氧化锌(i-ZnO)。高阻缓冲层400的能带隙在约3.1eV到约3.3eV的范围内。
窗口层500设置在高阻缓冲层400上。窗口层500是透明的,并且包括导电层。窗口层500可以包括透明导电氧化物。例如,窗口层500的材料可以包括掺杂Al的ZnO(AZO)。
由于后电极衬底100包括诸如Ag或Cu的I族元素,因此后电极衬底100具有低电阻。具体地,与包含Mo的电极相比,后电极衬底100具有低电阻并且表现出提高的电特性。
另外,在光吸收层200中,基于I、III、VI族的化合物中的I族元素的组分可以根据光吸收层200的位置而改变,因此可以表现出最佳的光电转换效率。
另外,光吸收层200可以包含在朝向后电极衬底100的方向上具有高I族元素组分的基于I、III、VI族的化合物。
因此,太阳能电池C1、C2、…CN可以包括朝向后电极衬底100表现出较低能带隙的光吸收层200。因此,光吸收层200可以有效地将阳光转换为电能。
另外,后电极衬底100可以是挠性的,太阳能电池C1、C2、…CN整体上可以是挠性的。
如图4所示,太阳能电池C1、C2、…CN互相重叠。更详细地,相邻的太阳能电池C1、C2、…CN部分地互相重叠。换言之,太阳能电池C1、C2、…CN互相连接,同时互相重叠。
例如,第一太阳能电池C1的一部分与第二太阳能电池C2的上部重叠。换言之,第二太阳能电池C2的上部插置于支撑衬底10与太阳能电池C1之间。换言之,第二太阳能电池C2的上部插入到支撑衬底10与第一太阳能电池C1之间。另外,第二太阳能电池C2的上表面与第一太阳能电池C1的下表面连接。
更详细地,第一太阳能电池C1包括顺序地互相层叠的第一后电极衬底110、第一光吸收层210、第一缓冲层310、第一高阻缓冲层410和第一窗口层510。另外,第二太阳能电池C2包括顺序地互相层叠的第二后电极衬底120、第二光吸收层220、第二缓冲层320、第二高阻缓冲层420和第二窗口层520。
在此情形中,第一后电极衬底110的一部分弯曲,并且设置在第二窗口层520上。第一后电极衬底110的下表面与第二窗口层520的上表面连接。
第一连接构件21插置于第一后电极衬底110的下表面与第二窗口层520的上表面之间。第一后电极衬底110通过第一连接构件21与第二窗口层520连接。换言之,第一连接构件21与第一后电极衬底110的下表面和第二窗口层520的上表面直接接触。
如上所述,第一连接构件21可以包含导电聚合物。另外,第一连接构件21可以包括导体、焊膏或导电胶带。
另外,第一连接构件21可以通过以下过程形成。
为了形成第一连接构件21,在第一后电极衬底110的下表面和/或第二窗口层520上涂布导电聚合物。更详细地,可以对应于第一太阳能电池C1与第二太阳能电池C2之间的重叠区域来涂布导电聚合物。
之后,第一太阳能电池C1和第二太阳能电池C2可以互相部分重叠,并且可以通过热压互相结合。因此,包括导电聚合物的第一连接构件21可以形成在第一太阳能电池C1与第二太阳能电池C2之间。
如上所述,由于第一连接构件21包括导电聚合物,因此,通过诸如涂布法或热压法的简单过程可以容易地形成第一连接构件21。
由于第一连接构件21包括导电聚合物,因此,第一连接构件21可以有效地与第一后电极衬底110和第二窗口层520结合。
因此,第一连接构件21有效地与第一后电极衬底110和第二窗口层520结合,使得第一太阳能电池C1和第二太阳能电池C2有效地互相物理连接和电连接。
另外,第一后电极衬底110的下表面通过与第二窗口层520的上表面直接接触可以连接到第二窗口层520的上表面。
另外,第二太阳能电池C2的一部分与第三太阳能电池C3重叠。换言之,第三太阳能电池C3的一部分插置于支撑衬底10与第二太阳能电池C2之间。换言之,第三太阳能电池C3的一部分插入到支撑衬底10与第二太阳能电池C2之间。另外,第三太阳能电池C3的上表面与第二太阳能电池C2的下表面连接。
详细地,第三太阳能电池C3包括顺序地互相层叠的第三后电极衬底130、第三光吸收层230、第三缓冲层330、第三高阻缓冲层430和第三窗口层530。
在此情形中,第二后电极衬底120的一部分弯曲,并且设置在第三窗口层530上。第二后电极衬底120的下表面与第三窗口层530的上表面连接。
另外,第二连接构件22插置于第二后电极衬底120的下表面与第三窗口层530的上表面之间。第二后电极衬底120通过第二连接构件22与第三窗口层530连接。换言之,第二连接构件22与第二后电极衬底120的下表面和第三窗口层530的上表面直接接触。
第二连接构件22可以包括导体、焊膏或导电胶带。与第一连接构件21相似,第二连接构件22可以包括导电聚合物,并且第二太阳能电池C2和第三太阳能电池C3通过第二连接构件22有效地互相连接。
另外,第二后电极衬底120的下表面通过与第三窗口层530的上表面直接接触可以连接到第三窗口层530的上表面。
如上所述,太阳能电池C1、C2、…CN互相重叠同时互相连接,并且互相串联连接。
因此,可以制造根据实施例的太阳能电池设备,而无需用来区分太阳能电池C1、C2、…CN并将太阳能电池C1、C2、…CN互相连接的图案化过程。
因此,可以容易地制造根据实施例的太阳能电池设备。
另外,在根据实施例的太阳能电池设备中,可以最小化太阳能电池C1、C2、…CN之间的重叠区域。另外,太阳能电池C1、C2、…CN之间的重叠区域可以将太阳光转换为电能。
例如,太阳能电池C1的与第二太阳能电池C2重叠的部分可以将太阳光转换为电能。
因此,根据实施例的太阳能电池设备可以表现出提高的发电效率。
另外,根据实施例的太阳能电池设备还可以包括保护衬底,以覆盖太阳能电池C1、C2、…CN。在此情形中,保护衬底可以是透明的,包括绝缘体,并且是挠性的。例如,保护衬底可以包括乙烯-醋酸乙烯共聚物膜。
另外,太阳能电池C1、C2、…CN和支撑衬底10可以是挠性的。因此,根据实施例的太阳能电池设备整体上可以是挠性的。
图5至图8是示出太阳能电池的制造方法的剖视图。关于太阳能电池设备的以上描述将并入关于根据当前实施例的制造方法的描述中。
参照图5,制备包含I族元素的后电极衬底100。
参照图6,在后电极衬底100上形成初级光吸收层201。
初级光吸收层201可以包含III族元素或VI族元素。更详细地,初级光吸收层201可以仅包含III族元素。更详细地,初级光吸收层201可以包含III族元素和VI族元素。
另外,初级光吸收层201可以包括一层或多层。另外,初级光吸收层201的厚度可以在约100nm至1000nm的范围内。
例如,初级光吸收层201可以包括含有基于III、VI族的化合物的单个层。详细地,初级光吸收层201可以包括基于In、Se的化合物、基于In、Ga、Se的化合物、基于Ga、Se的化合物、基于In、S的化合物、基于In、Ga、S的化合物、基于Ga、S的化合物或者基于In、Ga、Se、S的化合物。
可以通过溅射过程沉积基于III、VI族的化合物。换言之,可以利用包含基于III、VI族化合物的溅射靶通过溅射过程形成初级光吸收层201。
可以通过共蒸发法沉积III族元素和VI族元素并且同时蒸发该III族元素和VI族元素来形成初级光吸收层201。
另外,可以通过在后电极衬底100上印刷含有基于III、VI族的化合物的浆料来形成初级光吸收层201。
可以通过在后电极衬底100上喷射含有基于III、VI族的化合物的溶液来形成初级光吸收层201。
另外,初级光吸收层201可以仅包含III族元素而不包含VI族元素。
参照图7,在形成初级光吸收层201之后,对后电极衬底100和初级光吸收层201进行热处理。
因此,构成后电极衬底100的I族元素扩散到初级光吸收层201中,构成初级光吸收层201的III、VI族元素扩散到后电极衬底100中。
另外,构成后电极衬底100的I族元素与构成初级光吸收层201的基于III、VI族的化合物反应,由此形成基于I、III、VI族的化合物。
因此,包含基于I、III、VI族的化合物的光吸收层200形成在后电极衬底100上。
热处理过程在约300℃到约650℃的温度下进行约5分钟到约60分钟。
参照图8,在光吸收层200上沉积硫化镉以形成缓冲层300。然后,在缓冲层300上沉积氧化锌以形成高阻缓冲层400。
然后,在高阻缓冲层400上沉积掺杂Al的ZnO,以形成窗口层500。
根据本实施例的太阳能电池设备的制造方法,不需要沉积诸如Ag或Cu的I族元素的过程来形成光吸收层200。
因此,光吸收层200可以在低温下形成,并且可以容易地制造太阳能电池C1、C2、…CN。
连接构件21、22…N设置在太阳能电池C1、C2、…CN的上表面的一个外部,并且太阳能电池C1、C2、…CN互相连接从而互相重叠。之后,保护衬底和支撑衬底10分别与太阳能电池C1、C2、...CN的上表面和下表面结合,由此制造根据实施例的太阳能电池设备。
如上所述,可以无需图案化过程而制造根据实施例的太阳能电池设备。
图9和图10是示出根据另一实施例的光吸收层的剖视图。将参照前面实施例的描述来描述本实施例。将额外描述形成初级光吸收层和光吸收层的过程。除了修改部分的描述之外,关于前面实施例的描述将并入本实施例中。
参照图9,初级光吸收层202形成在后电极衬底100上。初级光吸收层202包含III族元素。详细地,初级光吸收层202包含III族元素或III族元素化合物。
在此情形中,初级光吸收层202不包括VI族元素。
例如,初级光吸收层202可以包含In和/或Ga,或者可以包含氧化铟或氧化镓。另外,初级光吸收层202可以氧化铟层或氧化镓层。
参照图10,初级光吸收层202和后电极衬底100在诸如Se的VI族元素气氛下经历热处理,从而在后电极衬底100上形成光吸收层200。构成后电极衬底100的I族元素、构成初级光吸收层201的III族元素和初级光吸收层202周围的VI族元素相互反应,使得I-III-VI族化合物形成,由此形成光吸收层200。
本说明书中任意涉及的“一个实施例”、“实施例”、“示例性实施例”等表示联系该实施例描述的特定特征、结构或特性包括在本发明的至少一个实施例中。在说明书中不同位置出现的这些短语不必要都指同一实施例。此外,当联系任意实施例描述具体特征、结构或特性时,应当认为联系其它实施例实现这些特征、结构或特性在本领域技术人员可以预见的范围内。
尽管已经参照一些示例性实施例描述了本发明,但是应该理解,本领域技术人员可以推导出的许多其它改进和实施例将落在本公开原理的精神和范围内。更具体地,在本公开、附图和所附权利要求的范围内,可以对所讨论的结合布置的组成部件和/或布置方式进行各种变型和改进。除了对组成部件和/或布置方式进行变型和改进之外,替换使用对本领域技术人员来说也是显而易见的。
工业应用性
本发明应用于太阳能发电领域。

Claims (20)

1.一种太阳能电池设备,包括:
第一太阳能电池;以及
与所述第一太阳能电池部分重叠并且与所述第一太阳能电池连接的第二太阳能电池。
2.根据权利要求1所述的太阳能电池设备,其中,所述第一太阳能电池包括:
第一导电衬底;
在所述第一导电衬底上的第一光吸收层;以及
在所述第一光吸收层上的第一窗口层,
其中,所述第二太阳能电池包括:
第二导电衬底;
在所述第二导电衬底上的第二光吸收层;以及
在所述第二光吸收层上的第二窗口层,并且
其中,所述第一导电衬底的下表面与所述第二窗口层的上表面接触。
3.根据权利要求2所述的太阳能电池设备,其中,所述第一导电衬底包含I族元素,所述第一光吸收层包含I族元素、III族元素和VI族元素。
4.根据权利要求3所述的太阳能电池设备,其中,所述光吸收层中的所述I族元素的组分在朝向所述第一导电衬底的方向上逐渐增加。
5.根据权利要求3所述的太阳能电池设备,其中,所述I族元素包括银(Ag)或铜(Cu)。
6.根据权利要求1所述的太阳能电池设备,进一步包括连接构件,该连接构件插置于所述第一太阳能电池与所述第二太阳能电池之间,从而将所述第一太阳能电池与所述第二太阳能电池连接。
7.根据权利要求6所述的太阳能电池设备,其中,所述连接构件包括。
8.根据权利要求6所述的太阳能电池设备,其中,所述第一太阳能电池的宽度在约到约的范围内,所述连接构件的宽度在约到约的范围内。 
9.根据权利要求1所述的太阳能电池设备,进一步包括附接到所述第一太阳能电池和所述第二太阳能电池下部的支撑衬底。
10.根据权利要求9所述的太阳能电池设备,其中,所述支撑衬底是挠性的。
11.一种太阳能电池设备,包括:
绝缘衬底;
在所述绝缘衬底上的第一太阳能电池;以及
第二太阳能电池,所述第二太阳能电池的一部分插置于所述绝缘衬底与所述第一太阳能电池之间同时与所述第一太阳能电池的下表面连接。
12.根据权利要求11所述的太阳能电池设备,进一步包括连接构件,该连接构件插置于所述第一太阳能电池的下表面与所述第二太阳能电池的上表面之间,同时与所述第一太阳能电池的下表面和所述第二太阳能电池的上表面直接接触。
13.根据权利要求11所述的太阳能电池设备,其中,进一步包括覆盖所述第一太阳能电池和所述第二太阳能电池的保护衬底。
14.根据权利要求13所述的太阳能电池设备,其中,所述绝缘衬底、所述第一太阳能电池、所述第二太阳能电池和所述保护衬底是挠性的。
15.一种太阳能电池设备,包括:
第一太阳能电池;
与所述第一太阳能电池连接的第二太阳能电池;以及
将所述第一太阳能电池与所述第二太阳能电池连接的连接构件,
其中,所述连接构件包括导电聚合物。
16.根据权利要求15所述的太阳能电池设备,其中,所述第一太阳能电池包括含有I族元素的导电衬底,所述第二太阳能电池包括含有透明导电氧化物的窗口层,并且所述连接构件与所述导电衬底和所述窗口层直接接触。
17.根据权利要求16所述的太阳能电池设备,其中,所述导电衬底包含铜(Cu)或银(Au),并且所述窗口层包含氧化锌。
18.根据权利要求15所述的太阳能电池设备,其中,所述第一太阳能电池和所述第二太阳能电池互相部分重叠,并且所述连接构件与所述第一太阳能电池的下表面和所述第二太阳能电池的上表面直接接触。 
19.根据权利要求15所述的太阳能电池设备,其中,所述导电聚合物包括蒽导电聚合物、聚苯胺导电聚合物或者基于聚(乙烯二氧噻吩):聚(苯乙烯磺酸盐)(PEDOT:PSS)的导电聚合物。
20.根据权利要求15所述的太阳能电池设备,其中,所述连接构件具有弹性。 
CN2011800055812A 2010-01-06 2011-01-06 太阳能电池设备 Pending CN102844878A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2010-0000995 2010-01-06
KR1020100000995A KR101114169B1 (ko) 2010-01-06 2010-01-06 태양광 발전장치
PCT/KR2011/000092 WO2011083994A2 (ko) 2010-01-06 2011-01-06 태양광 발전장치

Publications (1)

Publication Number Publication Date
CN102844878A true CN102844878A (zh) 2012-12-26

Family

ID=44305957

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011800055812A Pending CN102844878A (zh) 2010-01-06 2011-01-06 太阳能电池设备

Country Status (6)

Country Link
US (1) US20120260966A1 (zh)
EP (1) EP2437310A4 (zh)
JP (1) JP2013516783A (zh)
KR (1) KR101114169B1 (zh)
CN (1) CN102844878A (zh)
WO (1) WO2011083994A2 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI488318B (zh) * 2011-07-29 2015-06-11 Thin film solar cell module
KR101405639B1 (ko) * 2012-07-27 2014-06-11 엘지이노텍 주식회사 태양전지 및 이의 제조 방법
DE102012024754A1 (de) * 2012-12-18 2014-06-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Dünnschichtsolarzellenanordnung sowie Verfahren zu deren Herstellung
KR102470791B1 (ko) * 2017-12-07 2022-11-28 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 태양 전지 패널
CN108470783B (zh) * 2018-03-28 2020-12-01 京东方科技集团股份有限公司 感光元件及其制造方法、显示面板及其制造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050263180A1 (en) * 2004-06-01 2005-12-01 Alan Montello Photovoltaic module architecture
CN1918711A (zh) * 2003-12-25 2007-02-21 昭和壳牌石油株式会社 集成薄膜太阳能电池及其制造方法
EP2058870A2 (de) * 2007-11-07 2009-05-13 SolarionAG Photovoltaik Kontaktierung und Modulverschaltung von Dünnschichtsolarzellen auf polymeren Trägern
JP2009130193A (ja) * 2007-11-26 2009-06-11 Toyota Motor Corp 太陽電池モジュール

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5997770A (en) * 1998-03-05 1999-12-07 Conpoly Technology Co., Ltd. Process for doping polyaniline powder
US6239352B1 (en) * 1999-03-30 2001-05-29 Daniel Luch Substrate and collector grid structures for electrically interconnecting photovoltaic arrays and process of manufacture of such arrays
JP2002064062A (ja) * 2000-08-17 2002-02-28 Honda Motor Co Ltd 化合物半導体の成膜方法
JP4288641B2 (ja) * 2000-08-17 2009-07-01 本田技研工業株式会社 化合物半導体成膜装置
WO2007002683A2 (en) * 2005-06-27 2007-01-04 E. I. Du Pont De Nemours And Company Electrically conductive polymer compositions
KR100785730B1 (ko) * 2006-06-22 2007-12-18 이병수 금속 접합을 갖는 태양전지 모듈
US8222511B2 (en) * 2006-08-03 2012-07-17 Gentherm Thermoelectric device
AU2008240423A1 (en) * 2007-04-18 2008-10-30 Nanoco Technologies Limited Fabrication of electrically active films based on multiple layers

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1918711A (zh) * 2003-12-25 2007-02-21 昭和壳牌石油株式会社 集成薄膜太阳能电池及其制造方法
US20050263180A1 (en) * 2004-06-01 2005-12-01 Alan Montello Photovoltaic module architecture
EP2058870A2 (de) * 2007-11-07 2009-05-13 SolarionAG Photovoltaik Kontaktierung und Modulverschaltung von Dünnschichtsolarzellen auf polymeren Trägern
JP2009130193A (ja) * 2007-11-26 2009-06-11 Toyota Motor Corp 太陽電池モジュール

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MIGUEL A.CONTRERAS ETAL: "High efficiency Cu(In,Ga)Se2-based solar cells: processing of novel absorber structures", 《FIRST WCPEC》 *

Also Published As

Publication number Publication date
WO2011083994A3 (ko) 2011-11-10
KR101114169B1 (ko) 2012-02-22
JP2013516783A (ja) 2013-05-13
EP2437310A1 (en) 2012-04-04
US20120260966A1 (en) 2012-10-18
KR20110080663A (ko) 2011-07-13
WO2011083994A2 (ko) 2011-07-14
EP2437310A4 (en) 2014-04-02

Similar Documents

Publication Publication Date Title
KR101125322B1 (ko) 태양전지 및 이의 제조방법
CN102576764A (zh) 太阳能电池设备及其制造方法
CN102576762A (zh) 光伏系统及其制造方法
CN102576758A (zh) 太阳能电池设备及其制造方法
US20130244373A1 (en) Solar cell apparatus and method of fabricating the same
CN102576757A (zh) 太阳能电池设备及其制造方法
CN102844878A (zh) 太阳能电池设备
US10672919B2 (en) Moisture-resistant solar cells for solar roof tiles
US9379266B2 (en) Solar cell module and method of fabricating the same
WO2013058459A1 (en) Solar cell module and preparing method of the same
KR101081143B1 (ko) 태양전지 및 이의 제조방법
CN104272470A (zh) 太阳能电池及其制造方法
CN103201854A (zh) 太阳能电池设备及其制造方法
US9640685B2 (en) Solar cell and method of fabricating the same
CN103988317A (zh) 太阳能电池及太阳能电池模块
CN103069578A (zh) 光伏器件及其制造方法
CN102598303B (zh) 太阳能电池及其制造方法
US9748424B2 (en) Solar cell and preparing method of the same
KR20110001793A (ko) 태양전지 및 이의 제조방법
KR101154571B1 (ko) 태양전지 모듈 및 이의 제조방법
KR101081122B1 (ko) 태양전지 및 이의 제조방법
US9373729B2 (en) Solar cell and method of manufacturing the same
WO2013081346A1 (en) Solar cell module and method of fabricating the same
WO2013094940A1 (en) Solar cell module and method of fabricating the same
KR101020941B1 (ko) 태양전지 및 이의 제조방법

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C05 Deemed withdrawal (patent law before 1993)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20121226