CN102819033A - Ion beam automatic measuring system and method - Google Patents
Ion beam automatic measuring system and method Download PDFInfo
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- CN102819033A CN102819033A CN2012103133862A CN201210313386A CN102819033A CN 102819033 A CN102819033 A CN 102819033A CN 2012103133862 A CN2012103133862 A CN 2012103133862A CN 201210313386 A CN201210313386 A CN 201210313386A CN 102819033 A CN102819033 A CN 102819033A
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Abstract
The invention discloses an ion beam automatic measuring system and method. Measurement probes for four parameters (beam intensity, emittance, energy divergence and monatomic ion ratio) of an ion beam are organically integrated in a vacuum chamber and are used for measuring beam intensity, emittance, energy divergence and monatomic ion ratio. The measurement probes for the four parameters are movable and are driven by a step motor, the operation of the step motor, and the acquisition and processing of measurement data are controlled by a computer. The invention has the advantages that all parameters of the ion beam can be measured under the state that an ion source stably operates without halting, assembly and disassembly procedures of all parameter measurement devices are reduced, damage to the ion source and the parameter measurement devices is reduced, and the convenience and the rapidness are achieved in a measurement process, and the influence of an environment factor is lowered, and the precision of parameter measurement is improved.
Description
Technical field
The present invention is a kind of ion beam current automatic measurement system and measuring method, relates to fields such as ion gun, beam optics, ion implantation technique, particle accelerator, nuclear energy.
Background technology
For ion beam current, the measurement of its beam intensity, emittance, energy spread and monatomic ion ratio had very significance.In ionogenic research, these parameters of ion beam current have directly reflected the quality of ion gun performance.Ion implantation technique is to use energy to incide in the material as the ion beam of 100keV magnitude to go; A series of physics and interaction chemistry will take place in atom in ion beam and the material or molecule; Incident ion is off-energy gradually, rests in the material at last, and causes that material surface composition, structure and performance change; Thereby optimize the material surface performance; Or obtain some new excellent properties, and mix at semiconductor material, obtained on the surface modification of metal, pottery, high molecular polymer etc. to use very widely.In ion implantation technique, these parameters of ion beam current also directly affect the effect that ion injects.In the particle accelerator field, energy of ions is accelerated to certain magnitude, thereby utilize high energy ion beam to carry out fundamental research or radiation therapy.The ion beam that is accelerated requires that beam intensity is big, emittance is low, energy spread is low, monatomic ion ratio is high.In addition, in the nuclear energy field, the subcritical system (ADS system) that accelerator drives is an importance of advanced nuclear energy research; Wherein, The deuterium ion bundle is produced by ion gun, is accelerated into high energy deuterium ion bundle through accelerator, finally beats on the rotation tritium target; The fusion reaction of deuterium tritium takes place, and produce power is the neutron of 14MeV magnitude.
The measuring method of existing ion beam current for beam intensity, has Faraday cylinder method, secondary electron penalty method, direct current beam transformer (DCCT) etc.Wherein, the DCCT method allows ion beam current not have by passing through, but costs an arm and a leg; The secondary electron penalty method is had relatively high expectations to material preparation; Consider from economic and practical angle, measure the beam intensity of nonelectronic ion beam current at present, generally adopt the Faraday cylinder method; It is simple in structure, cost is low, applied widely, and precision is higher.For the measurement of emittance, the seam method that adopt with seam and the position of silk difference acquiring unit line and the information of emission angle more.It is divided into many seam monofilament methods and single seam monofilament method, wherein many seam monofilament methods, and structure is comparatively simple; Influence each other but have between a plurality of unit line that produces, single seam monofilament method can be avoided influencing each other between adjacent line, and degree of accuracy is higher; But the method should scan polar plate voltage; The pair cross-section position is scanned again, so structure is comparatively complicated, measuring speed is relatively slow.For the measurement of energy spread, electric field retardation method and electric deflection method are arranged, wherein electric deflection method measuring accuracy is higher.Measurement for monatomic ion ratio; Mainly contain electric deflection method and magnetic core logical circuit deflection method; Track according to the particle of different specific charges moves in electric field or magnetic field is different, with particles different in a branch of ion beam current separately, thereby measures the shared ratio of its various ions.
The beam intensity of ion beam current, emittance, energy spread and monatomic ion ratio all have corresponding measuring method.But; In the present technology; The measurement of beam intensity, emittance, energy spread and the monatomic ion ratio of ion beam current is all accomplished by system fully independently, and the system that neither one is integrated is used for measuring beam intensity, emittance, energy spread and the monatomic ion ratio of ion beam current.In some cases, these four parameters of ion beam current all are concerned about very much, need be obtained the information of these four parameters of ion beam current.But, because the integrated system of neither one,, all needs first ion source device to be connected through flange with the measurement mechanism of this parameter so each parameter is measured, also to guarantee line keep certain vacuum tightness through the space.Carry out the measurement of another parameter, the ion gun system that need close down earlier, and, the measurement mechanism of this parameter is installed again with previous measurement mechanism dismounting.This kind measuring method, owing to need the closing and start of installation and removal, ion gun system repeatedly, time-consuming, effort, bigger to the loss of ion gun and parameter measuring apparatus has influenced the stability of ion gun system simultaneously.So a kind of system that can under the non-stop-machine state of ion gun stable operation, accomplish the measurement of all parameters of ion gun ion beam current is necessary.
Summary of the invention
Technology of the present invention is dealt with problems: overcome the deficiency of prior art, a kind of parameter measurement system of ion beam current is provided, that this system has is easy to operate, measuring speed is fast, measuring accuracy is high, be beneficial to the characteristics such as maintenance of equipment.
Technical solution of the present invention: a kind of ion beam current automatic measurement system comprises: ion gun system 1, flange 2, vacuum chamber 3, beam intensity measuring sonde 4, emittance measurement probe 5, energy spread measuring sonde 6, monatomic ion ratio measuring sonde 7, line stopper 8, first driving device for step-by-step 9, second driving device for step-by-step 16, first stepper motor 10, second stepper motor 12, the 3rd stepper motor 17, the 4th stepper motor 21, the first scanning electric field power supply 14, the second scanning electric field power supply 19, scanning magnetic field power supply 23, an A/D card 11, the 2nd A/D card 15, the 3rd A/D card 20, the 4th A/D card 24, the 5th A/D card 25, a D/A card 13, the 2nd D/A card 18, the 3rd D/A card 22 and computing machine 26; After ion beam current is drawn from ion gun system 1; Get into vacuum chamber 3 by the flange that connects vacuum chamber 32; Beam intensity measuring sonde 4, emittance measurement probe 5, energy spread measuring sonde 6 and monatomic ion ratio measuring sonde 7 have been installed in the both sides of beam line in the vacuum chamber 3, in vacuum chamber 3, have been accomplished the automatic measurement of beam intensity to ion beam current, emittance, energy spread, monatomic ion ratio respectively separately; Computing machine 26 gets into and withdraws beam line through first driving device for step-by-step 9 and first stepper motor, 10 control beam intensity measuring sondes 4; The current signal that beam intensity measuring sonde 4 obtains converts digital data transmission in computing machine 26 through an A/D card 11, and computing machine 26 carries out filtering and shaping processing to this signal and shows; Computing machine 26 gets into and withdraws beam line through first driving device for step-by-step 9 and second stepper motor, 12 control emittance measurement probes 5; After the digital command that computing machine 26 sends converts simulating signal to by a D/A card 13; The voltage of scanning electric field scans in 14 pairs of emittance measurement probes 5 of the control first scanning electric field power supply; The voltage signal that the current signal that emittance measurement probe 5 obtains, beam position signal and the first scanning electric field power supply 14 obtain converts digital signal to through the 2nd A/D card 15 and is input to computing machine 26; Computing machine 26 carries out emittance and calculates, and result of calculation is shown; Calculating 26 gets into and withdraws beam line through second driving device for step-by-step 16 and the 3rd stepper motor 17 control energy spread measuring sondes 6; After the digital command that computing machine 26 sends converts simulating signal to by the 2nd D/A card 18; The voltage of scanning electric field scans in 19 pairs of energy spread measuring sondes 6 of the control second scanning electric field power supply; After converting digital signal to through the 3rd A/D card 20, the voltage signal of the current signal of energy spread measuring sonde 6 and 19 outputs of the second scanning electric field power supply is transferred to computing machine 26; Computing machine 26 carries out energy spread and calculates, and result of calculation is shown; Computing machine 26 gets into and withdraws beam line through second driving device for step-by-step 16 and the monatomic ion ratio measuring sonde 7 of the 4th stepper motor 21 controls; After the digital command that computing machine 26 sends converts simulating signal to by the 3rd D/A card 22; The field intensity in magnetic field scans in 23 pairs of monatomic ion ratio measuring sondes 7 of gated sweep magnetic field power supply; The voltage signal of current signal that monatomic ion ratio measuring sonde 7 obtains and 23 outputs of scanning magnetic field power supply converts digital data transmission to computing machine 26 through the 4th A/D card 24; Computing machine 26 calculates monatomic ion ratio, and result of calculation is shown; Current signal in the line stopper 8 converts digital data transmission in computing machine 26 through the 5th A/D card 25; Computing machine 26 carries out filtering and be shaped to handle and shows this signal, whether reaches steady state (SS) by the judgement of stability line of the waveform of demonstration.
A kind of ion beam current automatic measurement system among the present invention; Because the restriction of beam intensity measuring sonde 4, emittance measurement probe 5, energy spread measuring sonde 6, monatomic ion ratio measuring sonde 7 heat-sinking capabilities; The energy of said ion beam current should be lower than 200keV, and ion beam current intensity is lower than 180mA.
A kind of workflow measuring method of ion beam current automatic measurement system is following among the present invention:
The first step is connected through joint flange 2 ion gun system 1 with vacuum chamber 3;
Second step; Measure the beam intensity of ion beam current: send instruction to first driving device for step-by-step 9 through computing machine 26; Control first stepper motor 10; Beam intensity measuring sonde 4 is moved on the beam line, and the current signal that beam intensity measuring sonde 4 obtains converts digital data transmission in computing machine 26 through an A/D card 11, and computing machine 26 carries out filtering and shaping processing to this signal and shows; After measurement finished, the first control step motor 10 reverted to beam intensity measuring sonde 4 initial position of beam intensity measuring sonde 4;
The 3rd step, the emittance of measurement ion beam current: send instruction through computing machine 26 to first driving device for step-by-step 9, control second stepper motor 12; Emittance measurement probe 5 is moved on the beam line; Computing machine 26 is according to the emittance measurement program of having write, through a D/A card 13 controls first scanning electric field power supply 14, with control to the pop one's head in scanning of 5 polar plate voltages of emittance measurement; In addition; Computing machine 26 sends instruction to first driving device for step-by-step 9, controls second stepper motor 12, with the fine motion of control emittance measurement probe 5; The scanning of 5 positions thereby the completion emittance measurement is popped one's head in; The voltage signal that the current signal that emittance measurement probe 5 obtains, beam position signal and the first scanning electric field power supply 14 obtain converts digital signal to through the 2nd A/D card 15 and is input to computing machine 26, and computing machine 26 carries out emittance and calculates, and result of calculation is shown; After measurement finished, second stepper motor 12 reverted to emittance measurement probe 5 initial position of emittance measurement probe 5;
The 4th step; Measure the energy spread of ion beam current: send instruction to second driving device for step-by-step 16 through computing machine 26; Control the 3rd stepper motor 17, energy spread measuring sonde 6 is moved on the beam line, through the 2nd D/A card 18 controls second scanning electric field power supply 19; With the scanning of control to energy spread measuring sonde 6 polar plate voltages; Be transferred to computing machine 26 after the voltage signal of the current signal of energy spread measuring sonde 6 and 19 outputs of the second scanning electric field power supply converts digital signal to through the 3rd A/D card 20, computing machine 26 carries out energy spread and calculates, and result of calculation is shown.After measurement finished, the 3rd stepper motor 17 reverted to energy spread measuring sonde 6 initial position of energy spread measuring sonde 6;
The 5th step; Measure the monatomic ion ratio of ion beam current: send instruction to second driving device for step-by-step 16 through computing machine 26; Control the 4th stepper motor 21, monatomic ion ratio measuring sonde 7 is moved on the beam line, through the 3rd D/A card 22 gated sweep magnetic field power supplies 23; So that monatomic ion ratio measuring sonde 7 magnetic field intensitys are scanned; The voltage signal of current signal that monatomic ion ratio measuring sonde 7 obtains and 23 outputs of scanning magnetic field power supply converts digital data transmission to computing machine 26 through the 4th A/D card 24, and computing machine 26 calculates monatomic ion ratio, and result of calculation is shown; After measurement finished, the 4th stepper motor 21 reverted to monatomic ion ratio measuring sonde 7 initial position of monatomic ion ratio measuring sonde 7;
The 6th step; Ion beam current is stable, measurement parameter is changed or when ion beam current not being measured; Ion beam current is directly beaten on line stopper 8; Current signal converts digital data transmission in computing machine 26 through the 5th A/D card 25, and computing machine 26 carries out filtering to this signal to be handled and shows with being shaped, and whether reaches steady state (SS) by the judgement of stability line of the waveform of demonstration;
In the 7th step, all parameter measurements finish, and close the operation of ion gun system 1 earlier, break off line stopper 8 power supplys again, close vacuum system 3 power supplys at last.
Second went on foot for the 5th step and does not have the branch of sequencing in the above-mentioned steps.
Described beam intensity measuring sonde 4 is a Faraday cylinder, and its structure comprises first pole plate 29, second pole plate 30, circular hole 28, cylindrical shell 31, water inlet 32, flow of cooling water groove 33, water delivering orifice 34; Circular hole 28 is opened on first pole plate 29 and second pole plate 30; Before first pole plate 29 was positioned at second pole plate 30, after cylindrical shell 31 was positioned at second pole plate 30, flow of cooling water groove 33 twined and is distributed in cylindrical shell 31 outsides; Water inlet 32 is positioned at cylindrical shell 31 front ends, and water delivering orifice 34 is positioned at cylindrical shell 31 rear ends.Said emittance measurement probe 5 comprises: first incident seam, 37, first outgoing seam, 40, first top crown 38, first bottom crown 39, second Faraday cylinder 41; First top crown 38 and the 39 parallel placements of first bottom crown; Between first incident seam, 37 and first outgoing seam 40; The opening direction of first incident seam, 37 and first outgoing seam 40 is parallel to first top crown 38 and first bottom crown, 39, the second Faraday cylinders 41 are positioned at after first outgoing seam 40.Said energy spread measuring sonde 6 comprises second incident seam, 43, second outgoing seam, 49, second top crown 45, second bottom crown 46, the 3rd Faraday cylinder 50; Second top crown 45 and the 46 parallel placements of second bottom crown; Second top crown, 45 ground connection have 48, the three incidents of the 3rd incident seam the 47 and the 3rd outgoing seam and stitch 47 and stitch 48 parallel with the 3rd outgoing on second top crown 45; And with second incident seam 43 and second outgoing stitch 49 parallel, after the 3rd Faraday cylinder 50 is positioned at second outgoing and stitches 49.Said monatomic ion ratio measuring sonde 7 is made up of the 4th incident seam the 52, the 4th outgoing seam 55, deflection magnet 54 and the 4th Faraday cylinder 56; Deflection magnet 54 is 90 ° annular for central angle; The 4th incident seam 52 is parallel to deflection magnet 54 cross sections and places in deflection magnet 54 the place aheads, and the 4th outgoing seam 55 is at deflection magnet 54 rears; Be parallel to deflection magnet 54 and place, the 4th Faraday cylinder 56 is after the 4th outgoing seam 55.Described vacuum chamber 3, its pressure should maintain and be lower than 5 * 10
-3Pa.
Beneficial effect of the present invention is:
(1) in the structure of the present invention; Be not to be connected with ion gun system 1 for beam intensity measuring sonde 4, emittance measurement probe 5, energy spread measuring sonde 6, monatomic ion ratio measuring sonde 7 pass through flange separately; The frequent dismounting that to a plurality of parameter measurement of ion beam current the time, run into and the problem of installation parameter measurement mechanism have been solved like this; Alleviated because measuring process has been simplified in often installation and removal and to the damage of ion gun and parameter measuring apparatus, help the maintenance to equipment; Saved Measuring Time, made easy, quick, the easy row of measuring process.
(2) structure of the present invention can be accomplished the measurement to all parameters of ion beam current under the non-stop-machine state of ion gun stable operation; And the measurement of the beam intensity of ion beam current, emittance, energy spread, monatomic ion ratio all in same physical environment, has been improved the confidence level of measurement result.In addition, because four measuring is popped one's head in when changing, need not stop ionogenic operation, feasible measurement to each parameter is on same beam ion line, to carry out, and has reduced the influence of beaminstability to measurement result, improves the accuracy of measurement result.
Description of drawings
Fig. 1 is the construction module figure of a kind of ion beam current automatic measurement system among the present invention;
Fig. 2 is beam intensity measuring sonde (Faraday cylinder) synoptic diagram of a kind of ion beam current automatic measurement system among the present invention;
Fig. 3 is the emittance measurement probe synoptic diagram of a kind of ion beam current automatic measurement system among the present invention;
Fig. 4 is the energy spread measuring sonde synoptic diagram of a kind of ion beam current automatic measurement system among the present invention;
Fig. 5 is the monatomic ion ratio measuring sonde synoptic diagram of a kind of ion beam current automatic measurement system among the present invention;
Fig. 6 is the line stopper synoptic diagram of a kind of ion beam current automatic measurement system among the present invention.
Embodiment
As shown in Figure 1, a kind of ion beam current automatic measurement system of the embodiment of the invention comprises: ion gun system 1, flange 2, vacuum chamber 3, beam intensity measuring sonde 4, emittance measurement probe 5, energy spread measuring sonde 6, monatomic ion ratio measuring sonde 7, line stopper 8, first driving device for step-by-step 9, second driving device for step-by-step 16, first stepper motor 10, second stepper motor 12, the 3rd stepper motor 17, the 4th stepper motor 21, the first scanning electric field power supply 14, the second scanning electric field power supply 19, scanning magnetic field power supply 23, an A/D card 11, the 2nd A/D card 15, the 3rd A/D card 20, the 4th A/D card 24, the 5th A/D card 25, a D/A card 13, the 2nd D/A card 18, the 3rd D/A card 22 and computing machine 26; After ion beam current is drawn from ion gun system 1; Get into vacuum chamber 3 by the flange that connects vacuum chamber 32; Beam intensity measuring sonde 4, emittance measurement probe 5, energy spread measuring sonde 6 and monatomic ion ratio measuring sonde 7 have been installed in the both sides of beam line in the vacuum chamber 3, in vacuum chamber 3, have been accomplished the automatic measurement of beam intensity to ion beam current, emittance, energy spread, monatomic ion ratio respectively separately; Computing machine 26 gets into and withdraws beam line through first driving device for step-by-step 9 and first stepper motor, 10 control beam intensity measuring sondes 4; The current signal that beam intensity measuring sonde 4 obtains converts digital data transmission in computing machine 26 through an A/D card 11, and computing machine 26 carries out filtering and shaping processing to this signal and shows; Computing machine 26 gets into and withdraws beam line through first driving device for step-by-step 9 and second stepper motor, 12 control emittance measurement probes 5; After the digital command that computing machine 26 sends converts simulating signal to by a D/A card 13; The voltage of scanning electric field scans in 14 pairs of emittance measurement probes 5 of the control first scanning electric field power supply; The voltage signal that the current signal that emittance measurement probe 5 obtains, beam position signal and the first scanning electric field power supply 14 obtain converts digital signal to through the 2nd A/D card 15 and is input to computing machine 26; Computing machine 26 carries out emittance and calculates, and result of calculation is shown; Computing machine 26 gets into and withdraws beam line through second driving device for step-by-step 16 and the 3rd stepper motor 17 control energy spread measuring sondes 6; After the digital command that computing machine 26 sends converts simulating signal to by the 2nd D/A card 18; The voltage of scanning electric field scans in 19 pairs of energy spread measuring sondes 6 of the control second scanning electric field power supply; After converting digital signal to through the 3rd A/D card 20, the voltage signal of the current signal of energy spread measuring sonde 6 and 19 outputs of the second scanning electric field power supply is transferred to computing machine 26; Computing machine 26 carries out energy spread and calculates, and result of calculation is shown; Computing machine 26 gets into and withdraws beam line through second driving device for step-by-step 16 and the monatomic ion ratio measuring sonde 7 of the 4th stepper motor 21 controls; After the digital command that computing machine 26 sends converts simulating signal to by the 3rd D/A card 22; The field intensity in magnetic field scans in 23 pairs of monatomic ion ratio measuring sondes 7 of gated sweep magnetic field power supply; The voltage signal of current signal that monatomic ion ratio measuring sonde 7 obtains and 23 outputs of scanning magnetic field power supply converts digital data transmission to computing machine 26 through the 4th A/D card 24; Computing machine 26 calculates monatomic ion ratio, and result of calculation is shown; Current signal in the line stopper 8 converts digital data transmission in computing machine 26 through the 5th A/D card 25; Computing machine 26 carries out filtering and be shaped to handle and shows this signal, whether reaches steady state (SS) by the judgement of stability line of the waveform of demonstration.
A kind of ion beam current automatic measurement system among the present invention; Because the restriction of beam intensity measuring sonde 4, emittance measurement probe 5, energy spread measuring sonde 6, monatomic ion ratio measuring sonde 7 heat-sinking capabilities; The energy of said ion beam current should be lower than 200keV, and ion beam current intensity should be lower than 180mA.
As shown in Figure 2, the beam intensity measuring sonde 4 among the present invention is a Faraday cylinder, comprises first pole plate 29, second pole plate 30, circular hole 28, cylindrical shell 31, water inlet 32, flow of cooling water groove 33, water delivering orifice 34.The basic structure of Faraday cylinder is cylinder-like structure, is used for collecting line and beating the secondary electron that sputters out at barrel, and avoids other electronics to enter into surge drum.The circular hole 28 of line 27 from first pole plate 29 and second pole plate 30 gets into, and pole plate 29 ground connection keep earth potential; Pole plate 30 connects negative high voltage; Thereby the formation electric field shielding can't get into Faraday cylinder with the assurance external electrical, and the secondary electron of inner sputter can not be escaped away.Cylindrical shell 31 adopts streamlined pyramidal structure, helps increasing the receiving area of line, thereby avoids line in the zonule, to pile up, and improves radiating efficiency.In addition, in order to accelerate heat radiation, cylindrical shell 31 is taked the water-cooled measure.Chilled water is got into by water inlet 32, through flow of cooling water groove 33, flows out from water delivering orifice 34, to take away the heat on faraday's barrel very soon.The flow velocity of chilled water is fast more, and the groove area coverage is big more, just can take away the heat of cylindrical shell more soon, and is just good more to the cooling effect of cylindrical shell.Measuring process to the beam intensity of ion beam current is that after line was stable, computing machine 26 sent instruction to first driving device for step-by-step 9; Controlling first stepper motor, 10 promotion beam intensity measuring sondes 4 enters on the beam line; Ion beam current 27 gets into cylindrical shell 31 by circular hole 28, is received by barrel, makes cylindrical shell electrically charged; Electric charge is drawn the formation current signal; This current signal promptly is a beam intensity, is that digital signal transfers arrives computing machine 26 through A/D card 11 with analog-signal transitions, is carried out filtering and be shaped to be handled and show by computing machine 26.
As shown in Figure 3, emittance measurement of the present invention 5 structures of popping one's head in comprise: the external support of first incident seam, 37, first outgoing seam 40, emittance measurement probe 36, first top crown 38, first bottom crown 39, second Faraday cylinder 41; First top crown 38 and the 39 parallel placements of first bottom crown; Between first incident seam, 37 and first outgoing seam 40; First incident seam 37 is parallel with first bottom crown 39 with first top crown 38 with first outgoing seam 40, and second Faraday cylinder 41 is positioned at after first outgoing seam 40.Its measuring principle is the single seam monofilament method in the seam silk method.Ion beam current 35 is inner by the first inlet seam, 37 accesss to plant of measurement mechanism, deflects in the deflecting electric field of ion beam current between first top crown 38 and first bottom crown 39, gets into second Faraday cylinder 41 through the first outlet seam 40.First top crown 38 and first bottom crown, 39 length are L, the distance be D, between add scanning voltage V.The first inlet seam 37 is very narrow, and width is about 20um, can only be on beam cross section intercepting one tuftlet line.The energy of supposing ion beam is E, has only ion motion direction and beam center axis angle θ (ion drift angle) and scanning voltage V to satisfy relational expression:
tanθ＝VL/4ED (1)
In time, just can be received by second Faraday cylinder 41 through the first outlet seam 41, and by the electronic system projected current signal of second Faraday cylinder, 41 rear ends.Diverse location x place at beam cross section; Scan 39 added deflection voltage V of first top crown 38 and first bottom crown; The ion that bias angle theta and scan deflection voltage V satisfy relational expression (1) in the cluster line of position x place's intercepting can get into second Faraday cylinder 41 through the first outlet seam 40; Like this behind deflection voltage V scanning one-period; The ion of each drift angle will get into what of this drift angle ion of size reflection of second Faraday cylinder, 41, the second Faraday cylinders, 41 projected currents in this bunch line under the deflection voltage of correspondence, and then obtain the distribution of beam cross section x place bias angle theta.The pop one's head in step-length of 5 fine motions of emittance measurement is d; Accomplish the scanning of deflection voltage at beam cross section x place after, emittance measurement probe 5 steps to x+d place, next position, intercepting beam cross section x+d place line; Scan deflection voltage obtains the distribution of beam cross section x+d place bias angle theta.After the scanning of completion to beam cross section position x, can obtain the distribution of each x place ion bias angle theta on the beam cross section.
A kind of common definition of emittance be the phase area of line divided by π, obtain by following formula:
ε(mm·mrad)＝(1/π)∫∫
Ωdxdx′ （2）
Ion momentum p is p at the component of x direction
x, be p at the component of line direction of motion z direction
z, x ' is p in the following formula
xWith p
zThe ratio, that is:
Because the ion bias angle theta is very little, so approximation relation is arranged:
Convolution (1) can get,
x′＝VL/4ED （5）
The distribution of each x place ion bias angle theta on the beam cross section that obtains after the scanning of completion to beam cross section position x, the distribution of each x ' of x place on the beam cross section just.Obtain the emittance of ion beam current by formula (2).
Measuring process to the emittance of ion beam current does; Computing machine 26 sends instruction to first driving device for step-by-step 9; Controlling second stepper motor 12 promotes on the emittance measurement probe 5 entering beam line; When the first inlet seam 37 is about to reach the edge of beam line 35; The motion state of emittance measurement probe 5 is changed to minute movement, makes the first inlet seam, 37 ends from line 35 cross sections slowly step to the other end according to certain step-length d, realizes the scanning to the diverse location x of line cross-sectional direction.The step-length precision of second stepper motor, 12 steppings is in the um magnitude.Set the operational factor of second stepper motor 12 during measurement through the process of measurement of having write in the computing machine 26.When second stepper motor 12 is parked in a measuring position; When the first inlet seam 37 is in the x place, cross section of line 35; Intercepting one tuftlet line; Grid bias power supply 14 provides opposite polarity stepped appearance voltage to first top crown 38 and first bottom crown 39, makes a tuftlet line medium velocity direction of intercepting have the ion of different angles to get into second Faraday cylinder 41 through the first outlet seam 40 successively with the bundle center line, thereby realizes the scanning at the wandering angle of halved tie.The variation of first scanning power supply, 14 output voltages is by a D/A card 13 controls, and the stepped change amount of scanning voltage can be adjusted as required.Line current signal through second Faraday cylinder 41 measures is imported A/D card 15 through amplifying the back, and the corresponding bottom crown deflection voltage of going up of current signal is also imported the 2nd A/D card 15 simultaneously therewith.The motor of beam current signal, first top crown 38 and 39 added deflection voltage V of first bottom crown, this measuring position is walked the step number three and is gathered by computing machine 26 simultaneously.After accomplishing the scanning of voltage, write process of measurement in the computing machine 26 and set the second control step motor 12 and run to x+d place, next measuring position, repeated above step.After whole measuring process is accomplished, can continue to measure through the procedure Selection reset motor or along opposite direction.Beam current signal, first top crown 38 and first bottom crown 39 added deflection voltage V, motors are walked the step number three simultaneously by after computing machine 26 collections; Beam cross section position x walks step number by motor and provides; At x place, beam cross section position, when the value I of beam current signal greater than preset threshold I
0(I
0The current value that brings for background and noise) time; Expression has ion to pass through the first outlet seam, 40 entering, second Faraday cylinder 41 this moment, and the corresponding V value of the value I of beam current signal has relational expression (5) with x ' therewith; Thereby can set up the distribution of the x ' of x place, beam cross section position; Computing machine 26 is drawn this distribution plan, promptly launch phasor, and through type (2) obtains the value of beam emittance.
As shown in Figure 4; Energy spread measuring sonde 6 of the present invention; Structure comprises second incident seam, 43, second outgoing seam, 49, second top crown 45, second bottom crown 46, the 3rd Faraday cylinder 50, energy spread measuring sonde external support structure 44; Second top crown 45 and the 46 parallel placements of second bottom crown, second top crown, 45 ground connection have the 3rd incident seam the 47 and the 3rd outgoing seam 48 on second top crown 45; It is 48 parallel that the 3rd incident seam 47 and the 3rd outgoing are stitched, after the 3rd Faraday cylinder 50 is positioned at second outgoing and stitches 49.Its measuring principle is based on the deflection of charged ion line in electric field.It is inner that ion beam current 42 gets into measurement mechanism by second incident seam 43; The 3rd incident seam 47 by second top crown 45 gets into deflecting electric field; Between second top crown 45 and second bottom crown 46, be added with scanning voltage V; Ion beam current deflects; The ion of different-energy deflects in deflecting electric field in the ion beam current degree is different, has only when energy of ions and deflection voltage satisfy certain condition, and the 3rd outgoing that ion could pass through second top crown 45 is stitched 48 and second outgoing and stitched 49 entering the 3rd Faraday cylinder 50.Measuring process to the energy spread of ion beam current does; Computing machine 26 sends instruction to second driving device for step-by-step 16; Controlling the 3rd stepper motor 17 promotes on the energy spread measuring sonde 6 entering beam line; Ion beam current gets into deflecting electric field by second incident seam the 43 and the 3rd incident seam 47; 19 pairs second top crowns 45 of second scanning power supply and second bottom crown 46 provide opposite polarity stepped appearance voltage, make the ion of different-energy under different deflection voltages, get into the 3rd Faraday cylinder 50 through the 3rd outgoing seam 48 and second outgoing seam 49.The variation of second scanning power supply, 19 output voltages is controlled through the 2nd D/A card 18 by computing machine 26; The current signal of drawing by the 3rd Faraday cylinder 50; With the corresponding polar plate voltage signal of beam current signal herewith, be transferred in the computing machine 26 through the 3rd A/D card 20, carry out the processing of data by computing machine 26; The beam intensity that obtains the different-energy ion distributes, and promptly power spectrum distributes.This distribution is approximately Gaussian distribution, and beam intensity is that the energy width (halfwidth) at peaked half place is △ ε in the cloth curve of keeping the score
1/2, beam intensity maximal value place corresponding energy is ε
0, then obtain the energy spread value δ of ion beam current
εFor:
As shown in Figure 5; Monatomic ion ratio measuring sonde 7 structures comprise the external support 53 of the 4th incident seam the 52, the 4th outgoing seam 55, deflection magnet 54, the 4th Faraday cylinder 56 and monatomic ion ratio measuring sonde 7 among the present invention; Deflection magnet 54 is 90 ° annular for central angle; The 4th incident seam 52 is parallel to deflection magnet 54 cross sections and places in deflection magnet 54 the place aheads, and the 4th outgoing seam 55 is at deflection magnet 54 rears; Be parallel to deflection magnet 54 and place, the 4th Faraday cylinder 56 is after the 4th outgoing seam 55.Its measuring principle is based on the deflection of charged ion line in magnetic field.Ion beam current 51 gets into measurement mechanism inside by the 4th incident seam 52 of monatomic ion ratio measuring sonde 7, and the magnetic field intensity that analysis magnet 54 produces is adjustable, and the specific charge of the different ions in the ion beam current is different, thereby the movement locus in magnetic field is different.Measuring process to the monatomic ion ratio of ion beam current does, computing machine 26 sends instruction to second driving device for step-by-step 16, controls the 4th stepper motor 21 and promotes monatomic ion ratio measuring sonde 7 and get on the beam line; Behind the ion beam current 51 entering magnetic fields; In magnetic field, deflect, computing machine 26 scans through 22 pairs of magnetic field intensitys of the 3rd D/A card, and the ion of different specific charges is drawn from the 4th outlet seam 55 under different magnetic field intensitys; Get into the 4th Faraday cylinder 56 by its collection; The current signal of being drawn by the 4th Faraday cylinder 56 with the corresponding magnetic field intensity of beam current signal herewith, is transferred in the computing machine 26 by the 4th A/D card 24; Carry out the processing of data by computing machine 26; Obtain the beam intensity of different ions, and then the beam intensity that obtains various ions accounts for the ratio of the beam intensity of whole line, thereby draw the value of the monatomic ion ratio of ion beam current.The beam intensity of monatomic ion is I in the note line
1, the overall beam intensity of line is I
Total, then the monatomic ion ratio K in this line is:
As shown in Figure 6; Line stopper 8 is made up of pole plate 57, pole plate 58, line receiving target 59, target cooling device 60 among the present invention, pole plate 57 and pole plate 58 is arranged, pole plate 57 and pole plate 58 parallel placements in line receiving target 59 fronts; Pole plate 57 connects low-voltage; Pole plate 58 connects high voltage, and its effect is to reduce the speed of ion beam current to target, suppresses simultaneously owing to ion is beaten on the beam line in the secondary electron entering vacuum chamber 3 that the sputter on target causes.Target cooling device 60 is arranged behind line receiving target 59, and its inside is the groove of flow of cooling water.A kind of line stopper 8 of ion beam current automatic measurement system among the present invention, its effect detect line in addition and whether reach stable effect to measure except by line.The current signal that line receiving target 59 is drawn is transferred to computing machine 26 through the 5th A/D card 25, and computing machine (26) carries out filtering and be shaped to handle and shows it, whether reaches steady state (SS) by the judgement of stability line of the waveform of demonstration.
The cylindrical shell of above-mentioned first Faraday cylinder 4, second Faraday cylinder 41, the 3rd Faraday cylinder 50, the 4th Faraday cylinder 56 adopts streamlined pyramidal structure, to increase the receiving area of line, accelerates the heat radiation of cylindrical shell; Cylinder body outer wall is carved with the flow of cooling water groove, with the cooling cylindrical shell.
Above-mentioned vacuum chamber 3 is cylindrical, and its pressure should be lower than 5 * 10
-3Pa.
A kind of workflow measuring method of ion beam current automatic measurement system is following among the present invention:
The first step is connected through joint flange 2 ion gun system 1 with vacuum chamber 3;
Second step; Measure the beam intensity of ion beam current: send instruction to first driving device for step-by-step 9 through computing machine 26; Control first stepper motor 10; Beam intensity measuring sonde 4 is moved on the beam line, and the current signal that beam intensity measuring sonde 4 obtains converts digital data transmission in computing machine 26 through an A/D card 11, and computing machine 26 carries out filtering and shaping processing to this signal and shows; After measurement finished, the first control step motor 10 reverted to beam intensity measuring sonde 4 initial position of beam intensity measuring sonde 4;
The 3rd step, the emittance of measurement ion beam current: send instruction through computing machine 26 to first driving device for step-by-step 9, control second stepper motor 12; Emittance measurement probe 5 is moved on the beam line; Computing machine 26 is according to the emittance measurement program of having write, through a D/A card 13 controls first scanning electric field power supply 14, with control to the pop one's head in scanning of 5 polar plate voltages of emittance measurement; In addition; Computing machine 26 sends instruction to first driving device for step-by-step 9, controls second stepper motor 12, with the fine motion of control emittance measurement probe 5; The scanning of 5 positions thereby the completion emittance measurement is popped one's head in; The voltage signal that the current signal that emittance measurement probe 5 obtains, beam position signal and the first scanning electric field power supply 14 obtain converts digital signal to through the 2nd A/D card 15 and is input to computing machine 26, and computing machine 26 carries out emittance and calculates, and result of calculation is shown; After measurement finished, second stepper motor 12 reverted to emittance measurement probe 5 initial position of emittance measurement probe 5;
The 4th step; Measure the energy spread of ion beam current: send instruction to second driving device for step-by-step 16 through computing machine 26; Control the 3rd stepper motor 17, energy spread measuring sonde 6 is moved on the beam line, through the 2nd D/A card 18 controls second scanning electric field power supply 19; With the scanning of control to energy spread measuring sonde 6 polar plate voltages; Be transferred to computing machine 26 after the voltage signal of the current signal of energy spread measuring sonde 6 and 19 outputs of the second scanning electric field power supply converts digital signal to through the 3rd A/D card 20, computing machine 26 carries out energy spread and calculates, and result of calculation is shown.After measurement finished, the 3rd stepper motor 17 reverted to energy spread measuring sonde 6 initial position of energy spread measuring sonde 6;
The 5th step; Measure the monatomic ion ratio of ion beam current: send instruction to second driving device for step-by-step 16 through computing machine 26; Control the 4th stepper motor 21, monatomic ion ratio measuring sonde 7 is moved on the beam line, through the 3rd D/A card 22 gated sweep magnetic field power supplies 23; So that monatomic ion ratio measuring sonde 7 magnetic field intensitys are scanned; The voltage signal of current signal that monatomic ion ratio measuring sonde 7 obtains and 23 outputs of scanning magnetic field power supply converts digital data transmission to computing machine 26 through the 4th A/D card 24, and computing machine 26 calculates monatomic ion ratio, and result of calculation is shown; After measurement finished, the 4th stepper motor 21 reverted to monatomic ion ratio measuring sonde 7 initial position of monatomic ion ratio measuring sonde 7;
The 6th step; Ion beam current is stable, measurement parameter is changed or when ion beam current not being measured; Ion beam current is directly beaten on line stopper 8; Current signal converts digital data transmission in computing machine 26 through the 5th A/D card 25, and computing machine 26 carries out filtering to this signal to be handled and shows with being shaped, and whether reaches steady state (SS) by the judgement of stability line of the waveform of demonstration;
In the 7th step, all parameter measurements finish, and close the operation of ion gun system 1 earlier, break off line stopper 8 power supplys again, close vacuum system 3 power supplys at last.
Claims (9)
1. an ion beam current automatic measurement system is characterized in that comprising: ion gun system (1), flange (2), vacuum chamber (3), beam intensity measuring sonde (4), emittance measurement probe (5), energy spread measuring sonde (6), monatomic ion ratio measuring sonde (7), line stopper (8), first driving device for step-by-step (9), second driving device for step-by-step (16), first stepper motor (10), second stepper motor (12), the 3rd stepper motor (17), the 4th stepper motor (21), the first scanning electric field power supply (14), the second scanning electric field power supply (19), scanning magnetic field power supply (23), an A/D card (11), the 2nd A/D card (15), the 3rd A/D card (20), the 4th A/D card (24), the 5th A/D card (25), a D/A card (13), the 2nd D/A card (18), the 3rd D/A card (22) and computing machine (26); After ion beam current is drawn from ion gun system (1); Get into vacuum chamber (3) by the flange (2) that connects vacuum chamber (3); Beam intensity measuring sonde (4), emittance measurement probe (5), energy spread measuring sonde (6) and monatomic ion ratio measuring sonde (7) have been installed in the both sides of beam line in the vacuum chamber (3), and independent respectively completion is to the automatic measurement of the beam intensity of ion beam current, emittance, energy spread, monatomic ion ratio in vacuum chamber (3); Computing machine (26) gets into and withdraws beam line through first driving device for step-by-step (9) and first stepper motor (10) control beam intensity measuring sonde (4); The current signal that beam intensity measuring sonde (4) obtains converts digital data transmission in computing machine (26) through an A/D card (11), and computing machine (26) carries out filtering and shaping processing to this signal and shows; Computing machine (26) gets into and withdraws beam line through first driving device for step-by-step (9) and second stepper motor (12) control emittance measurement probe (5); After the digital command that computing machine (26) sends converts simulating signal to by a D/A card (13); The control first scanning electric field power supply (14) scans the voltage of scanning electric field in the emittance measurement probe (5); The voltage signal that the current signal that emittance measurement probe (5) obtains, beam position signal and the first scanning electric field power supply (14) obtain converts digital signal to through the 2nd A/D card (15) and is input to computing machine (26); Computing machine (26) carries out emittance and calculates, and result of calculation is shown; Computing machine (26) gets into and withdraws beam line through second driving device for step-by-step (16) and the 3rd stepper motor (17) control energy spread measuring sonde (6); After the digital command that computing machine (26) sends converts simulating signal to by the 2nd D/A card (18); The control second scanning electric field power supply (19) scans the voltage of scanning electric field in the energy spread measuring sonde (6); After converting digital signal to through the 3rd A/D card (20), the voltage signal of the current signal of energy spread measuring sonde (6) and second scanning electric field power supply (19) output is transferred to computing machine (26); Computing machine (26) carries out energy spread and calculates, and result of calculation is shown; Computing machine (26) gets into and withdraws beam line through second driving device for step-by-step (16) and the 4th stepper motor (21) the monatomic ion ratio measuring sonde of control (7); After the digital command that computing machine (26) sends converts simulating signal to by the 3rd D/A card (22); Gated sweep magnetic field power supply (23) scans the field intensity in magnetic field in the monatomic ion ratio measuring sonde (7); The voltage signal of current signal that monatomic ion ratio measuring sonde (7) obtains and scanning magnetic field power supply (23) output converts digital data transmission to computing machine (26) through the 4th A/D card (24); Computing machine (26) calculates monatomic ion ratio, and result of calculation is shown; Current signal in the line stopper (8) converts digital data transmission in computing machine (26) through A/D card (25); Computing machine (26) carries out filtering and be shaped to handle and shows this signal, whether reaches steady state (SS) by the judgement of stability line of the waveform of demonstration.
2. a kind of ion beam current automatic measurement system according to claim 1, it is characterized in that: the energy of said ion beam current should be lower than 200keV, and ion beam current intensity is lower than 180mA.
3. a kind of ion beam current automatic measurement system according to claim 1; It is characterized in that: described beam intensity measuring sonde (4) is a Faraday cylinder, and its structure comprises first pole plate (29), second pole plate (30), circular hole (28), cylindrical shell (31), water inlet (32), flow of cooling water groove (33), water delivering orifice (34); Circular hole (28) is opened on first pole plate (29) and second pole plate (30); It is preceding that first pole plate (29) is positioned at second pole plate (30); After cylindrical shell (31) is positioned at second pole plate (30); Flow of cooling water groove (33) twines and is distributed in cylindrical shell (31) outside, and water inlet (32) is positioned at cylindrical shell (31) front end, and water delivering orifice (34) is positioned at cylindrical shell (31) rear end.
4. a kind of ion beam current automatic measurement system according to claim 1 is characterized in that: said emittance measurement probe (5) comprising: first incident seam (37), first outgoing seam (40), first top crown (38), first bottom crown (39), second Faraday cylinder (41); First top crown (38) and the parallel placement of first bottom crown (39); Be positioned between first incident seam (37) and first outgoing seam (40); The opening direction of first incident seam (37) and first outgoing seam (40) is parallel to first top crown (38) and first bottom crown (39), and second Faraday cylinder (41) is positioned at first outgoing seam (40) afterwards.
5. a kind of ion beam current automatic measurement system according to claim 1; It is characterized in that: said energy spread measuring sonde (6) comprises second incident seam (43), second outgoing seam (49), second top crown (45), second bottom crown (46), the 3rd Faraday cylinder (50); Second top crown (45) and the parallel placement of second bottom crown (46); Second top crown (45) ground connection; Have the 3rd incident seam (47) and the 3rd outgoing seam (48) on second top crown (45); The 3rd incident seam (47) is parallel with the 3rd outgoing seam (48), and parallel with second outgoing seam (49) with second incident seam (43), after the 3rd Faraday cylinder (50) is positioned at second outgoing seam (49).
6. a kind of ion beam current automatic measurement system according to claim 1; It is characterized in that: said monatomic ion ratio measuring sonde (7) is made up of the 4th incident seam (52), the 4th outgoing seam (55), deflection magnet (54) and the 4th Faraday cylinder (56); Deflection magnet (54) is 90 ° annular for central angle; The 4th incident seam (52) is parallel to deflection magnet (54) cross section and places in deflection magnet (54) the place ahead, and the 4th outgoing seam (55) is at deflection magnet (54) rear; Be parallel to deflection magnet (54) and place, the 4th Faraday cylinder (56) at the 4th outgoing seam (55) afterwards.
7. a kind of ion beam current automatic measurement system according to claim 1 is characterized in that: said vacuum chamber (3) is for cylindrical, and its pressure should be lower than 5 * 10
-3Pa.
8. according to one of any described a kind of ion beam current automatic measurement system of claim 3-6; It is characterized in that: the cylindrical shell of said first Faraday cylinder (4), second Faraday cylinder (41), the 3rd Faraday cylinder (50), the 4th Faraday cylinder (56) adopts streamlined pyramidal structure; To increase the receiving area of line, accelerate the heat radiation of cylindrical shell; Cylinder body outer wall is carved with the flow of cooling water groove, with the cooling cylindrical shell.
9. ion beam current method for automatic measurement is characterized in that performing step is following:
The first step is connected through joint flange (2) ion gun system (1) with vacuum chamber (3);
Second step; Measure the beam intensity of ion beam current: send instruction to first driving device for step-by-step (9) through computing machine (26); Control first stepper motor (10); Beam intensity measuring sonde (4) is moved on the beam line, and the current signal that beam intensity measuring sonde (4) obtains converts digital data transmission in computing machine (26) through an A/D card (11), and computing machine (26) carries out filtering and shaping processing to this signal and shows; After measurement finished, the first control step motor (10) reverted to beam intensity measuring sonde (4) initial position of beam intensity measuring sonde (4);
The 3rd step, the emittance of measurement ion beam current: send instruction through computing machine (26) to first driving device for step-by-step (9), control second stepper motor (12); Emittance measurement probe (5) is moved on the beam line; Computing machine (26) is according to the emittance measurement program of having write, through a D/A card (13) the control first scanning electric field power supply (14), with the scanning of control to emittance measurement probe (5) polar plate voltage; In addition; Computing machine (26) sends instruction to first driving device for step-by-step (9), controls second stepper motor (12), with the fine motion of control emittance measurement probe (5); Thereby accomplish the scanning of emittance measurement probe (5) position; The voltage signal that the current signal that emittance measurement probe (5) obtains, beam position signal and the first scanning electric field power supply (14) obtain converts digital signal to through the 2nd A/D card (15) and is input to computing machine (26), and computing machine (26) carries out emittance and calculates, and result of calculation is shown; After measurement finished, second stepper motor (12) reverted to emittance measurement probe (5) initial position of emittance measurement probe (5);
The 4th step; Measure the energy spread of ion beam current: send instruction to second driving device for step-by-step (16) through computing machine (26); Control the 3rd stepper motor (17); Energy spread measuring sonde (6) is moved on the beam line; Through the 2nd D/A card (18) the control second scanning electric field power supply (19),, after converting digital signal to through the 3rd A/D card (20), the voltage signal of the current signal of energy spread measuring sonde (6) and second scanning electric field power supply (19) output is transferred to computing machine (26) with the scanning of control to energy spread measuring sonde (6) polar plate voltage; Computing machine (26) carries out energy spread and calculates, and result of calculation is shown.After measurement finished, the 3rd stepper motor (17) reverted to energy spread measuring sonde (6) initial position of energy spread measuring sonde (6);
The 5th step; Measure the monatomic ion ratio of ion beam current: send instruction to second driving device for step-by-step (16) through computing machine (26); Control the 4th stepper motor (21); Monatomic ion ratio measuring sonde (7) is moved on the beam line; Through the 3rd D/A card (22) gated sweep magnetic field power supply (23), so that monatomic ion ratio measuring sonde (7) magnetic field intensity is scanned, the voltage signal of current signal that monatomic ion ratio measuring sonde (7) obtains and scanning magnetic field power supply (23) output converts digital data transmission to computing machine (26) through the 4th A/D card (24); Computing machine (26) calculates monatomic ion ratio, and result of calculation is shown; After measurement finished, the 4th stepper motor (21) reverted to monatomic ion ratio measuring sonde (7) initial position of monatomic ion ratio measuring sonde (7);
The 6th step; Ion beam current is stable, measurement parameter is changed or when ion beam current not being measured; Ion beam current is directly beaten on line stopper (8); Current signal converts digital data transmission in the computing machine (26) through A/D card (25), and computing machine (26) carries out filtering to this signal to be handled and shows with being shaped, and whether reaches steady state (SS) by the judgement of stability line of the waveform of demonstration;
In the 7th step, all parameter measurements finish, and close the operation of ion gun system (1) earlier, break off line stopper (8) power supply again, close vacuum system (3) power supply at last.
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