CN106371131B - A kind of ion source beam diagnostics emittance instrument and emittance detection method - Google Patents
A kind of ion source beam diagnostics emittance instrument and emittance detection method Download PDFInfo
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- CN106371131B CN106371131B CN201610906978.3A CN201610906978A CN106371131B CN 106371131 B CN106371131 B CN 106371131B CN 201610906978 A CN201610906978 A CN 201610906978A CN 106371131 B CN106371131 B CN 106371131B
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- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
- G01T1/2914—Measurement of spatial distribution of radiation
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Abstract
The invention belongs to Electromagnetic isotope separator technical fields, more particularly to a kind of ion source beam diagnostics emittance instrument and emittance detection method, it is arranged on Electromagnetic isotope separator, Electromagnetic isotope separator includes being arranged in vacuum chamber, ion source equipped with extraction electrode, ion source projects ion beam from the extraction seam of extraction electrode, wherein, ion source beam diagnostics emittance instrument includes the movement support device for being provided with probe, movement support device can make probe do linear reciprocating motion near seam in vacuum indoor draw, probe can measure the current signal of ion beam；Further include the scanning power supply of connection probe；Further include motion control and the data collecting system of the obtained current signal of the dynamic supporting mechanism of control, scanning power supply, processing probe.Emittance instrument and emittance detection method using the present invention can accurately measure the emittance of low energy high current Arc-discharge ion source, measurement beam power reaches 1.5kW, and measurement line subtended angle reaches ± 14.5 °.
Description
Technical field
The invention belongs to Electromagnetic isotope separator technical fields, and in particular to a kind of ion source beam diagnostics emittance
Instrument and emittance detection method.
Background technology
Electromagnetism separation method has indispensable status in isotopic separation field, and electromagnetic separation is to utilize energy phase
The different realization isotopic separations of the ion same, quality is different radius of turn in transverse magnetic field.Electromagnetic isotope separator is just
It is the equipment using the isolated isotope of electromagnetism separation method.Ion beam to be separated is from the ion of Electromagnetic isotope separator
It projects in source, is separated through the magnetic field in Electromagnetic isotope separator, then be received device reception, complete the separation work of isotope
Make.
, it is necessary to measure the line of Electromagnetic isotope separator intermediate ion beam in position and momentum in this separation process
Distribution in phase space.The area of distribution is the emittance of line, to characterize the quality of line.Ion source is isotope electromagnetism
The key equipment (present invention targeted is low energy high current Arc-discharge ion source, referred to as " ion source ") of separator, the hair of line
Degree of penetrating is one of key factor of ion source design, and the influence to ion source image width is very big, it is therefore desirable to carry out the survey of emittance
Amount, in the process of running, is also required to measure emittance in real time sometimes.Therefore, it is necessary to a kind of devices to measure emittance.From
Component and ion beam are also carried out all in vacuum environment for the measurement of the emittance of ion beam in vacuum environment.
Emittance measurement is common to have there are many method：Seam-screen method, hole-fluorescent screen method, seam-silk method, voltage scanning
Method.Seam-Si Fa can be divided into the various forms such as more seam monofilament, single seam multifibres and single seam monofilament again.
Seam-screen method (i.e. " pepper pot " method) is simple in structure, but can not measure the beam current density in beam spot, can not consider
Contribution of the current density contours to emittance, the border of beam spot be not easy to accurately determine, the error for making x ' is larger.It is in addition, each
A screen can only carry out the measurement of limited number of time, and just can determine that emittance value after taking out screen piece, less efficient.
Since low energy ion has stronger splash effect to screen, therefore hole-fluorescent screen method is not suitable for low energy high current ion
Beam.
Seam-silk method can obtain more accurately electric current distribution, and leading screw can also provide accurate position, still
The time measured every time is longer.Silk seam scanning emittance instrument stitches mechanical movement to measure the beam under different (X, θ) phase points by silk
Current density, X depend on the spatial position of probe, and θ depends on position of the silk compared with seam center.
Voltage scanning method obtains the beam current density under different (X, θ) phase points by the variation of deflection voltage, and different is inclined
Turn voltage for different θ.
The content of the invention
By comparing, voltage scanning method has the advantages of sweep time is short, sonde configuration is simple and practicable, and it is strong to be more suitable for low energy
Wander about as a refugee beamlet emittance measurement.Therefore the device of the measurement emittance of the present invention is designed according to the mode of voltage scanning, it is real
The measurement of the emittance of existing low energy high current Arc-discharge ion source, using single seam-electrostatic scanning type emittance instrument measurement direct current beam
Emittance.The beam emittance instrument of design can measure the line that beam power reaches 1.5kW (30kV, 50mA).
To achieve the above objectives, the technical solution adopted by the present invention is a kind of ion source beam diagnostics emittance instrument, if
It puts on Electromagnetic isotope separator, the Electromagnetic isotope separator includes being arranged in vacuum chamber, equipped with extraction electrode
Ion source, the ion source project ion beam from the extraction seam of the extraction electrode, wherein, the ion source beam diagnostics is used
Emittance instrument includes the movement support device for being provided with probe, and the movement support device can make the probe in the vacuum
The indoor seam of drawing nearby does linear reciprocating motion, and the probe can measure the current signal of the ion beam；Also wrap
Include the scanning power supply for connecting the probe；The control dynamic supporting mechanism, scanning power supply, the processing probe is further included to be obtained
The current signal motion control and data collecting system.
Further, the movement support device is arranged on the vacuum chamber, the silk including connection stepper motor and nut
Thick stick, further include be connected with the nut, one end penetrates the drive link of the vacuum chamber, the indoor biography that is arranged on the vacuum
The probe bracket of one end of lever, the probe are mounted on the probe bracket, further include and the drive link is arranged on institute
The mounting flange on vacuum chamber is stated, it is reciprocal straight that the drive link can drive the probe to do under the driving of the stepper motor
Line moves, wherein, the drive link using the bellows of sealing realize the movement support device vacuum environment with it is antivacuum
Movement between environment runs through, and the stroke of linear reciprocating motion of the drive link in the vacuum chamber can reach ±
105mm。
Further, part and the probe bracket of the drive link in the vacuum chamber, the tolerance power of probe
Reach 1.5kW, the tolerance power refers to the maximum power for the ion beam being resistant to.
Further, penetrating electrode is further included, described penetrating electrode one end is connected with the indoor probe of the vacuum, separately
One end is arranged in the non-vacuum environment outside the vacuum chamber, and the penetrating electrode is mutually tied using metal electrode with ceramic material
It closes, can realize that the electrical of 5kV high pressures is run through, be used for transmission the electric current letter for the ion beam that the probe measurement arrives
Number, the ceramic material is used for the insulation of the metal electrode.
Further, the probe includes be arranged in parallel up and down, the low potential pole plate for electrostatic deflection, high potential pole
Plate, the high potential pole plate are arranged on above the low potential pole plate；It further includes and is arranged on the low potential pole plate, high potential pole
The preceding sealing and rear sealing at plate both ends, the preceding sealing are stitched close to the extraction of the ion source；It further includes described in being arranged on
Faraday cup on sealing afterwards；The ion beam can from the preceding sealing into the low potential pole plate, high potential pole plate it
Between after electrostatic deflection, sealing enters the Faraday cup after described；
The low potential pole plate, high potential pole plate length are 200mm；
Spacing between the low potential pole plate, high potential pole plate is 30mm；
The preceding sealing, rear seam width are 0.5mm.
Further, the scanning power supply is arranged on outside the vacuum chamber, and the scanning power supply passes through vacuum sealing plug
It is connected with the probe in the vacuum chamber.
Further, the scanning voltage of the scanning power supply is ± 5kV, and the scanning step of the scanning voltage is 20V.
Further, the probe is equipped with the signal link for being used for transmission the current signal, and the penetrating electrode passes through
The signal link is connected with the probe.
Further, the motion control and data collecting system are arranged on outside the vacuum chamber, with described through electricity
Pole connects and obtains the current signal.
To achieve the above objectives, the invention also discloses one kind for ion source beam diagnostics emittance instrument described above
Emittance detection method, include the following steps：
Step (S1),
Close the scanning power supply；
Open the power supply of the stepper motor of the movement support device；
The speed of service for setting the stepper motor is 5mm/s；
The drive link is made to be reset to original state；
The current location of the probe is set as " 0mm "；
The target location of the probe is set as " 200mm "；
Step (S2),
Start the stepper motor, the probe is made from " 0mm " position to " 200mm " position to do linear uniform motion inswept
The ion beam obtains the current density contours image of the ion beam；
The stepper motor is controlled, the probe is made to return to described " 0mm " position；
Wide corresponding two seats of overall height in the current density contours image are obtained according to the current density contours image
X1, X2 are marked, as the initial position X1 of the scanning probe and final position X2；
Step (S3) sets the initial position of the stepper motor for X1 the ion source beam diagnostics to be set to emit
Spend the unit of the spatial resolution of instrument；
Step (S4), starts the stepper motor, and the stepper motor is made to run to X1 positions from " 0mm " position；
Step (S5), opens the scanning power supply, and the probe starts to scan；It is scanned, close the scanning power supply；
Step (S6) controls the stepper motor to take a step forward according to the unit of spatial resolution described in step (S3)；
Step (S7), opens the scanning power supply, and the probe starts to scan；It is scanned, close the scanning power supply；
Step (S8) repeats step (S6), step (S7), until the probe is mobile more than until the X2 positions.
The beneficial effects of the present invention are：
1. it can accurately measure the emittance of low energy high current Arc-discharge ion source.
2. the ion beam that beam power reaches 1.5kW (30kV, 50mA) can be measured.
3. the beam emittance that line subtended angle reaches ± 14.5 ° can be measured.
Description of the drawings
Fig. 1 is the schematic diagram of emittance instrument described in the specific embodiment of the invention；
Fig. 2 is the front view of movement support device described in the specific embodiment of the invention；
Fig. 3 is the top view of movement support device described in the specific embodiment of the invention；
Fig. 4 is the front view of probe and probe bracket described in the specific embodiment of the invention；
Fig. 5 is the top view of probe and probe bracket described in the specific embodiment of the invention；
Fig. 6 is the side view of probe and probe bracket described in the specific embodiment of the invention；
Fig. 7 is the principle schematic popped one's head in described in the specific embodiment of the invention；
Fig. 8 is the first critical size and numerical value schematic diagram popped one's head in described in the specific embodiment of the invention；
Fig. 9 is the second critical size and numerical value schematic diagram popped one's head in described in the specific embodiment of the invention；
Figure 10 is that the scanning voltage output popped one's head in described in the specific embodiment of the invention is defeated with low-potential voltage signal source
The control planning schematic diagram gone out；
Figure 11 is X ' described in the specific embodiment of the invention to replace the emittance measurement schematic diagram data that p is obtained；
In figure：1- stepper motors, 2- nuts, 3- leading screws, 4- drive links, 5- mounting flanges, 6- probes, 7- vacuum-chamber walls,
8- probe brackets, 9- vacuum chambers, 10- ion beams, 11- low potential pole plates, 12- high potential pole plates, sealing plate before 13- are stitched before 14-
Mouthful, sealing after 15-, 16- Faraday cups, 17- inhibition electrodes, 18- water cooling tubes, 19- penetrating electrode.
Specific embodiment
The invention will be further described with reference to the accompanying drawings and examples.
As shown in Figure 1, a kind of ion source beam diagnostics with emittance instrument (referred to as " emittance instrument "), is arranged on isotope electricity
On magnetic separator, Electromagnetic isotope separator includes being arranged in vacuum chamber 9, the ion source equipped with extraction electrode, ion source from
Ion beam is projected in the extraction seam of extraction electrode, wherein, ion source beam diagnostics emittance instrument is mainly made of four major parts,
Including probe 6, movement support device, scanning power supply, motion control and data collecting system.Wherein, movement support device can
Extraction seam of the probe 6 in vacuum chamber 9 is made nearby to do linear reciprocating motion, probe 6 can measure the current signal of ion beam；Even
It connects the scanning power supply of probe 6 and provides scanning voltage for probe 6；Motion control and data collecting system are used to control braking support machine
Structure, scanning power supply, and handle the current signal that probe 6 is obtained.
Principle on emittance instrument
A kind of ion source beam diagnostics provided by the invention is mainly used for measuring Electromagnetic isotope separator with emittance instrument
In distribution of the ion beam line in the phase space of position and momentum (ion beam is from the Calutron of Electromagnetic isotope separator
The extraction seam through extraction electrode projects in ion source), the area of distribution is the emittance of line, to characterize the quality of line.
Therefore, it is necessary to measure each point (X in phase spacei,pj) on population density (being characterized with beam current density).It is however, dynamic in X-direction
Amount component cannot be measured directly, it is necessary to which be converted into can physical quantity measured directly：
P=mvx=mv0sin θ formula (1)
Wherein, p is the momentum in X-direction, and m is the quality of ion, V0It is line general speed, depending on accelerating potential Va；
1/2mv0 2=eVaFormula (2)
Wherein, e is math constant；
Generally remain unchanged.P can be obtained by measuring sin θ.It is smaller in θ,
(dX is the space differentiation of x-axis direction, and dZ is the space differentiation in z-axis direction)
It at this time can be with X ' come instead of p, the emittance measurement data obtained are similar to shown in Figure 11.
On probe
The principle of emittance is mainly manifested on probe, i.e. the correspondence of scanning voltage value and θ.Probe is by parallel up and down
Low potential pole plate 11 and high potential pole plate 12, preceding sealing 14, rear sealing 15, inhibit electrode 17, the composition such as Faraday cup 16 (see
Fig. 7).As shown in Figure 7,8 under each deflection voltage (i.e. scanning voltage), uniquely corresponding θ, only incident angle are θ
Ion could be received by preceding sealing 14, rear sealing 15 by Faraday cup 16.The reception electric current characterization of Faraday cup 16 is incident
Angle is the amount of ions of θ.Spacing between low potential pole plate 11, high potential pole plate 12 is D, low potential pole plate 11, high potential pole
12 length of plate is L, and the scanning voltage loaded on low potential pole plate 11, high potential pole plate 12 is represented with V.
According to the ion trajectory by preceding sealing 14, rear sealing 15 and formula (2), obtain：
Therefore, according to formula (4), the Density Distribution of ion under all θ can be obtained by scanning voltage, what is obtained sweeps
Retouch result (in Figure 11, Im is probe measurement current signal) as shown in figure 11.
The inhibition electrode 17 (see Fig. 7) being arranged between rear sealing 15, Faraday cup 16 is further included in probe, inhibits electrode
17 loadings inhibit the escape that voltage is used to inhibit secondary electron.Inhibition voltage is 300V.In the presence of a magnetic field, secondary electricity
Son is constrained by the magnetic line of force, it may be unnecessary to inhibit electrode.
Probe in the present invention is set according to the beam parameters of the Calutron ion sources on Electromagnetic isotope separator
Meter.In the embodiment of the present invention, Electromagnetic isotope separator is used to carry out electromagnetism separation to rubidium element (Rb), obtains two kinds of isotopes
(85Rb、87Rb), the beam energy of ion beam is 30keV, and maximum subtended angle reaches ± 14.5 degree, flows strong≤100mA.
As shown in Figure 1, probe 6 is arranged on ion source beam diagnostics emittance instrument, ion source beam diagnostics transmitting
Degree instrument is arranged on Electromagnetic isotope separator.Electromagnetic isotope separator includes being arranged in the vacuum environment of vacuum chamber 9, setting
There is the ion source of extraction electrode, ion source projects ion beam 10 from the extraction seam of extraction electrode.Probe 6 passes through probe bracket 8
On emittance instrument, connection relation is shown in Fig. 4-Fig. 6.
As shown in fig. 7, probe 6 includes be arranged in parallel up and down, the low potential pole plate 11 for electrostatic deflection, high potential pole
Plate 12, high potential pole plate 12 are arranged on 11 top of low potential pole plate；It is arranged on low potential pole plate 11, high potential pole plate 12 both ends
Preceding sealing 14 and rear sealing 15, preceding sealing 14 are stitched close to the extraction of ion source；Further include the faraday being arranged on rear sealing 15
Cylinder 16；Ion beam 10 can enter between low potential pole plate 11, high potential pole plate 12 after electrostatic deflection from preceding sealing 14, from
Sealing 15 enters Faraday cup 16 afterwards.
Probe is that the component of core, its size design are directly related to the measurement essence of emittance instrument the most in emittance instrument
Degree.In the design of probe, crucial size has：
Space D between low potential pole plate 11, high potential pole plate 12；
Low potential pole plate 11,12 length L of high potential pole plate；
The seam width d of preceding sealing 14, rear sealing 15；
The maximum scan voltage Vmax that low potential pole plate 11, high potential pole plate 12 load.
In design, the value of above several parameters is determined according to following condition.
S<D/2 (S is the parabola height of ion beam), i.e., cannot be got to low by the ion of preceding sealing 14, rear sealing 15
In potential plate 11, high potential pole plate 12, as shown in Figure 8.According to ion trajectory, there is following relation：
(E is the electric field strength between low potential pole plate 11, high potential pole plate 12, equal to V/D)
Then have
Formula (5) permanent must be set up.In the present embodiment, the subtended angle of the ion beam of Calutron ion sources is no more than
14.5°.In the separated technique of electromagnetism is carried out to rubidium element (Rb), accelerating potential Va≈30KVolt.With reference to formula (1), can obtain
To the maximum scan value of scanning voltage：
V≥2Va sin2(14.5 °) ≈ 3.76kVolt formula (6)
Take Vmax=4kVolt
(R is deflection radius of the ion beam in electromagnetic separator, and B is magnetic field intensity in electromagnetic separator)
When magnetic field size is 1000G, R=2310mm.It takes
L<231mm formula (7)
α≤0.1 °, α are error caused by seam width d, as shown in Figure 9.
It is understood with reference to formula (7) (8)：
d<0.81mm formula (9)
Consider for Machinability Evaluation, take d=0.5mm, substitute into formula (8) and understand,
L>143mm formula (10)
From formula (4),It permanent must set up,
And V<4kVolt, it is therefore necessary to haveThen,
D >=0.138L formula (11)
According to formula (6)-(11), it may be determined that the physical dimension of probe is：
| Parameter | Unit (mm) | Parameter | Unit (mm) | Parameter | Unit (mm) |
| L | 200 | D | 30 | d | 0.5 |
In probe i.e. provided by the present invention：
Low potential pole plate 11,12 length of high potential pole plate are 200mm；
Spacing between low potential pole plate 11, high potential pole plate 12 is 30mm；
Preceding sealing 14,15 width of rear sealing are 0.5mm.
Probe bracket 8 is made of graphite material, and is cooled down with deionized water, sealing plate before preceding sealing 14 is arranged on
(see Fig. 7,8,9) on 13, preceding sealing plate 13 is made of graphite material.
Probe 6 is equipped with the signal link for being used for transmission current signal, is arranged on Faraday cup 16 and (is not marked in attached drawing
Go out), signal link connection penetrating electrode 19 is surveyed by penetrating electrode 19 to motion control and data collecting system transmission probe 6
The current signal for the ion beam measured；
19 one end of penetrating electrode (being located in vacuum chamber 9) is connected by signal link with the probe 6 in vacuum chamber 9, another
End is arranged in the non-vacuum environment outside vacuum chamber 9, and connects the motion control being arranged on outside probe and data acquisition system
System (motion control and data collecting system are located at outside ion source and vacuum environment residing for ion beam 10).Penetrating electrode 19 is used
In the current signal that the acquisition of Faraday cup 16 on probe 6 is sent to motion control and data collecting system.Penetrating electrode 19 is adopted
It is combined with metal electrode with ceramic material, can realize that the electrical of 5kV high pressures is run through, ceramic material is exhausted for metal electrode
Edge.
The tolerance power of probe 6 reaches 1.5kW (30kV, 50mA), and tolerance power refers to the ion beam being resistant to most
It is high-power.
In addition, further include the shielding case for being arranged on 16 periphery of Faraday cup.
Probe is not when measuring, it is necessary to avoid bombarding and be lost away from ion beam.In the present embodiment, the extraction of ion source
Stitch the flange port 660mm of the mounting flange 5 of range transmission degree instrument.
On scanning power supply
Scanning power supply is arranged on outside vacuum chamber 9.Scanning power supply passes through the probe 6 in vacuum sealing plug and vacuum chamber 9
Connection.The scanning voltage of scanning power supply is ± 5kV, and the scanning step of scanning voltage is 20V.Scanning power supply is arranged on vacuum chamber 9
Outside, ion beam 10 can not be irradiated to, and avoid influence of the ion beam 10 to scanning power supply.
The low potential pole plate 11 of probe 6 loads scanning voltage on high potential pole plate 12, because maximum scan voltage is
4kVolt, since θ is divided into positive and negative, therefore the scanning range of scanning power supply should meet -4kVolt to 4kVolt.To ensure that power supply is long
Time stablizes output, when selecting scanning power supply, maximum output 5kVolt.The scanning voltage of probe 6 i.e. provided by the present invention
For 5kV.
For scanning voltage, scanning step is the crucial parameter of comparison.It was found from formula (4), step-length is smaller, the resolution of θ
Better.However, too small scanning step can improve the technical difficulty of scanning power supply or even be difficult to realize.And scanning step is got over
Small, sweep time is longer.Therefore, it is necessary to select suitable scanning step.
Differential is carried out to formula (4)：
It can be write as：
It takesAccording to formula (12)
The necessary permanent condition set up of formula (12), it is known that
Δ V≤27.5Volt formula (13)
Actual selection scanning step is 20V, that is, the scanning step for the scanning voltage popped one's head in is 20V.
In probe provided by the present invention, low potential pole plate 11, high potential pole plate 12 are equipped with grid bias power supply line (in attached drawing
Do not mark), the connection of grid bias power supply line is arranged on the scanning power supply outside popping one's head in, and (scanning power supply is located at residing for ion source and ion beam
Vacuum environment outside), for scanning power supply to low potential pole plate 11, high potential pole plate 12 load scanning voltage.
The output of scanning power supply is controlled by low-potential voltage signal source (0-10V), and the correspondence controlled closes to be linear
(as shown in Figure 10, output voltage are the scanning voltage exported in figure, and control signal are that low-potential voltage is believed for system
The control voltage in number source).In 0-2.5V, scanning power supply output is zero (i.e. scanning voltage is zero)；Low-potential voltage signal source
Control voltage be more than 2.5V when, scanning power supply output have following relation：
(S is control voltage signal)
Wherein, low-potential voltage signal source output S=2.5+0.015n, n=0,1 ... ... 499.
On movement support device
As shown in Figure 1 to Figure 3, movement support device is arranged on vacuum chamber 9, including connection stepper motor 1 and nut 2
Leading screw 3, further include be connected with nut 2, one end penetrates the drive link 4 of vacuum chamber 9, the one of the drive link 4 being arranged in vacuum chamber 9
The probe bracket 8 at end, probe 6 are mounted on probe bracket 8, further include mounting flange drive link 4 being arranged on vacuum chamber 9
5, drive link 4 can drive probe 6 to do linear reciprocating motion under the driving of stepper motor 1, wherein, drive link 4 is using sealing
Bellows realize that movement of the movement support device between vacuum environment and non-vacuum environment runs through, drive link 4 is in vacuum chamber 9
In the stroke of linear reciprocating motion can reach ± 105mm.
The tolerance power of part and probe bracket 8 of the drive link 4 in vacuum chamber 9 reaches 1.5kW (30kV, 50mA),
Tolerance power refers to the maximum power for the ion beam being resistant to.
Depending on the size of mounting flange 5 is according to the flange port size of existing Electromagnetic isotope separator, the fortune of drive link 4
Dynamic scope is depending on the scope that the distance and needs of ion source and flange port scan.When separator is run, of ion beam
Angle is up to ± 14.5 °, and there is 223mm in the position of probe 6 of the ion source outlet from emittance instrument.So probe 6 needs to scan
Region for ion source extraction stitch 223mm × tan (± 14.5 °) ≈ ± 57.5mm.It follows that the movement model of drive link 4
Enclosing needs to be more than 115mm.
On motion control and data collecting system
Motion control and data collecting system are arranged on outside vacuum chamber 9 that (in the present embodiment, motion control and data are adopted
Collecting system uses PLC module), connection movement support device, scanning power supply and probe 6, wherein, motion control and data acquisition system
System is connected by penetrating electrode 19 with the signal link on probe 6.
Motion control and data collecting system are closed for the movement of controlled motion supporting mechanism, the unlatching of control scanning power supply
It closes the output with scanning voltage and handles the current signals that probe 6 is obtained, record the position signal of movement support device,
Show result of detection.
Detection method on emittance
The present invention also provides a kind of emittance detection method for above-mentioned ion source beam diagnostics emittance instrument, bags
Include following steps：
Step S1,
Close scanning power supply；
The power supply of the stepper motor of opening movement supporting mechanism；
The speed of service for setting stepper motor is 5mm/s；
Drive link is made to be reset to original state；
The current location of probe is set as " 0mm "；
The target location of probe is set as " 200mm "；
Step S2,
Start stepper motor, probe made to do the inswept ion beam of linear uniform motion from " 0mm " position to " 200mm " position,
Obtain the current density contours image of ion beam；
Stepper motor is controlled, probe is made to return to " 0mm " position；
Overall height in current density contours image wide corresponding two coordinates X1, X2 are obtained according to current density contours image,
As the initial position X1 of scanning probe and final position X2；
(purpose of above step is in order to avoid losing time in unnecessary spatial position and valuable isotope money
Source)
Step S3 sets the initial position of stepper motor to set the space of ion source beam diagnostics emittance instrument for X1
The unit (such as 5mm) of resolution ratio；
Step S4 starts stepper motor, stepper motor is made to run to X1 positions from " 0mm " position；
Step S5, opens scanning power supply, and probe starts to scan；It is scanned, close scanning power supply；
Step S6, control stepper motor take a step forward (such as 5mm) according to the unit of spatial resolution in step S3；
Step S7, opens scanning power supply, and probe starts to scan；It is scanned, close scanning power supply；
Step S8 repeats step S6, step S7, until probe is mobile more than X2 positions.
Device of the present invention is not limited to the embodiment described in specific embodiment, those skilled in the art according to
Technical scheme draws other embodiments, also belongs to the technological innovation scope of the present invention.
Claims (10)
1. a kind of ion source beam diagnostics emittance instrument, is arranged on Electromagnetic isotope separator, the isotope electromagnetism point
Include being arranged in vacuum chamber (9) from device, the ion source equipped with extraction electrode, the ion source is from the extraction of the extraction electrode
Ion beam is projected in seam, it is characterized in that：The Electromagnetic isotope separator is used to carry out electromagnetism separation to rubidium element Rb, obtains85Rb、87Two kinds of isotopes of Rb, the beam energy of the ion beam are 30keV, and maximum subtended angle reaches ± 14.5 degree, stream by force≤
100mA；The ion source beam diagnostics emittance instrument includes the movement support device for being provided with probe (6), the movement branch
Support mechanism can make extraction seam of the probe (6) in the vacuum chamber (9) nearby do linear reciprocating motion, the spy
Head (6) can measure the current signal of the ion beam；Further include the scanning power supply for connecting the probe (6)；Further include control
The motion control for the current signal that the movement support device, scanning power supply, the processing probe (6) are obtained and number
According to acquisition system；
The movement support device is arranged on the vacuum chamber (9), the leading screw including connection stepper motor (1) and nut (2)
(3), further include be connected with the nut (2), one end penetrates the drive link (4) of the vacuum chamber (9), is arranged on the vacuum chamber
(9) probe bracket (8) of one end of the drive link (4) in, the probe (6) are mounted on the probe bracket (8), also
Including the mounting flange (5) drive link (4) being arranged on the vacuum chamber (9), the drive link (4) can be described
The probe (6) is driven to do linear reciprocating motion under the driving of stepper motor (1), wherein, the drive link (4) is using sealing
Bellows realizes that movement of the movement support device between vacuum environment and non-vacuum environment runs through.
2. emittance instrument as described in claim 1, it is characterized in that：The drive link (4) is reciprocal in the vacuum chamber (9)
The stroke of linear motion can reach ± 105mm.
3. emittance instrument as claimed in claim 2, it is characterized in that：Part of the drive link (4) in the vacuum chamber (9)
And the probe bracket (8), the tolerance power of probe (6) reach 1.5kW, the tolerance power refers to be resistant to described
The maximum power of ion beam.
4. emittance instrument as claimed in claim 2, it is characterized in that：Further include penetrating electrode (19), the penetrating electrode (19)
One end is connected with the probe (6) in the vacuum chamber (9), and the other end is arranged on antivacuum outside the vacuum chamber (9)
In environment, the penetrating electrode (19) is combined using metal electrode with ceramic material, can realize that the electrical of 5kV high pressures is passed through
It wears, is used for transmission the current signal for the ion beam that the probe (6) measures, the ceramic material is used for the gold
Belong to the insulation of electrode.
5. emittance instrument as described in claim 1, it is characterized in that：It is described probe (6) include be arranged in parallel up and down, for quiet
Low potential pole plate (11), the high potential pole plate (12) of electric deflection, the high potential pole plate (12) are arranged on the low potential pole plate
(11) top；It further includes and is arranged on the low potential pole plate (11), the preceding sealing (14) at high potential pole plate (12) both ends and rear seam
Mouth (15), the preceding sealing (14) are stitched close to the extraction of the ion source；It further includes and sets on sealing (15) in the rear
Faraday cup (16)；The ion beam can enter the low potential pole plate (11), high potential pole from the preceding sealing (14)
Between plate (12) after electrostatic deflection, enter the Faraday cup (16) from the rear sealing (15)；
The low potential pole plate (11), high potential pole plate (12) length are 200mm；
Spacing between the low potential pole plate (11), high potential pole plate (12) is 30mm；
The preceding sealing (14), rear sealing (15) width are 0.5mm.
6. emittance instrument as claimed in claim 5, it is characterized in that：The scanning power supply by vacuum sealing plug with it is described true
The probe (6) connection in empty room (9).
7. emittance instrument as described in claim 1, it is characterized in that：The scanning power supply is arranged on outside the vacuum chamber (9),
The scanning voltage of the scanning power supply is ± 5kV, and the scanning step of the scanning voltage is 20V.
8. emittance instrument as claimed in claim 4, it is characterized in that：The probe (6), which is equipped with, is used for transmission the electric current letter
Number signal link, the penetrating electrode (19) by the signal link with it is described probe (6) be connected.
9. emittance instrument as claimed in claim 8, it is characterized in that：The motion control and data collecting system are arranged on described
Outside vacuum chamber (9), it is connected with the penetrating electrode (19) and obtains the current signal.
10. a kind of detected using the ion source beam diagnostics as described in any one of claim 1 to 9 emittance of emittance instrument
Method includes the following steps：
Step (S1),
Close the scanning power supply；
Open the power supply of the stepper motor of the movement support device；
The speed of service for setting the stepper motor is 5mm/s；
The drive link is made to be reset to original state；
The current location of the probe is set as " 0mm "；
The target location of the probe is set as " 200mm "；
Step (S2),
Start the stepper motor, the probe is made from " 0mm " position to " 200mm " position to do linear uniform motion inswept described
Ion beam obtains the current density contours image of the ion beam；
The stepper motor is controlled, the probe is made to return to described " 0mm " position；
According to the current density contours image obtain the wide corresponding two coordinate X1 of overall height in the current density contours image,
X2, as the initial position X1 of the scanning probe and final position X2；
Step (S3) sets the initial position of the stepper motor to set the ion source beam diagnostics emittance instrument for X1
Spatial resolution unit；
Step (S4), starts the stepper motor, and the stepper motor is made to run to X1 positions from " 0mm " position；
Step (S5), opens the scanning power supply, and the probe starts to scan；It is scanned, close the scanning power supply；
Step (S6) controls the stepper motor to take a step forward according to the unit of spatial resolution described in step (S3)；
Step (S7), opens the scanning power supply, and the probe starts to scan；It is scanned, close the scanning power supply；
Step (S8) repeats step (S6), step (S7), until the probe is mobile more than until the X2 positions.
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| CN107402402A (en) * | 2017-09-05 | 2017-11-28 | 合肥中科离子医学技术装备有限公司 | A kind of beam diagnostics target head for the main radial probe of cyclotron |
| CN108020859B (en) | 2017-12-29 | 2023-12-29 | 合肥中科离子医学技术装备有限公司 | Adjustable transmission device for measuring transverse parameters of beam |
| CN108415063A (en) * | 2018-05-14 | 2018-08-17 | 中国科学院近代物理研究所 | Charged ion beam current strength measurement system and its measurement method |
| CN112698379A (en) * | 2020-12-16 | 2021-04-23 | 南京大学 | Data processing method and device for emittance measuring instrument of low-energy proton beam |
| CN113031047B (en) * | 2021-03-02 | 2022-11-08 | 中国科学院近代物理研究所 | Bidirectional residual gas ionization profile detector system and detection method thereof |
| CN113589356A (en) * | 2021-08-05 | 2021-11-02 | 兰州科近泰基新技术有限责任公司 | Faraday cylinder for isotope dipolar magnet device |
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| CN206147109U (en) * | 2016-10-18 | 2017-05-03 | 中国原子能科学研究院 | Ion source is emittance appearance for beam diagnostics |
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| JP4179168B2 (en) * | 2004-01-06 | 2008-11-12 | 日新イオン機器株式会社 | Ion beam measurement method and ion implantation apparatus |
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| CN102819033A (en) * | 2012-08-29 | 2012-12-12 | 中国科学院合肥物质科学研究院 | Ion beam automatic measuring system and method |
| CN206147109U (en) * | 2016-10-18 | 2017-05-03 | 中国原子能科学研究院 | Ion source is emittance appearance for beam diagnostics |
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