CN102621577A - Real-time monitoring method of each component beam intensity and injection dosage of mixed ion beam - Google Patents
Real-time monitoring method of each component beam intensity and injection dosage of mixed ion beam Download PDFInfo
- Publication number
- CN102621577A CN102621577A CN2012101081577A CN201210108157A CN102621577A CN 102621577 A CN102621577 A CN 102621577A CN 2012101081577 A CN2012101081577 A CN 2012101081577A CN 201210108157 A CN201210108157 A CN 201210108157A CN 102621577 A CN102621577 A CN 102621577A
- Authority
- CN
- China
- Prior art keywords
- line
- solid thin
- sheet
- ion beam
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Measurement Of Radiation (AREA)
Abstract
The invention provides a real-time monitoring method of each component beam intensity and injection dosage of mixed ion beams. The monitoring method is based on the fact that magnification coefficient is only related with intrinsic property of incidence ions if material quality and thickness of a solid slice remain unchanged when the ions penetrate through the solid slice, and magnification coefficient of the beams changes with change of the material quality or the thickness of the solid slice. Change of strength or integral quantity of the beams around the time when the incident mixed ions penetrate through the solid slice is measured according to the physical law and characteristics, so that beam strength or injection dose of each ion component can be determined when the mixed ion beams irradiate samples. The real-time monitoring method has no special limit on type and number of each component ion of the mixed ion beam to be measured, mutual proportional relation between beam strength and stability. The real-time monitoring method is simple and clear, low in cost and reliable in use.
Description
Technical field
The invention belongs to the ion beam technology application, relate in particular to a kind of method of real-time and method of real-time of implantation dosage of beam intensity of each composition of ion beam mixing.
Background technology
In recent years; Along with developing rapidly and human making unceasing progress of nuclear energy technology to the universe space probation; The anti-radiation performance that is applied to the nuclear material of nuclear power system and is applied to the classes of semiconductors electronics device of universe space probation receives attention more and more widely, especially associated materials and device they are had separately under its residing radiation environment such as physics, chemistry, machinery, electricity, optics etc. changes of properties become that people pay close attention to and the focus of research.Owing to complicacy, the danger of true radiation environment, be difficult for touching property and non-ubiquity; Will carry out Research on Related Problems neither science is also unrealistic on the spot in personly; And accelerator ion beam irradiation technology provides a kind of simulation experiment study means the most simply, the most directly, the most safely and the most reliably for carrying out of these research work, is generally acknowledged and one of generally accepted modeling effort method.
In carry out relevant modeling effort process with accelerator ion beam irradiation technology; The research work that the accurate monitoring of ion beam implantation dosage is carried out all Application of ion bundle irradiation techniques all has very important meaning; This be because: generally speaking; The size of ion beam irradiation implantation dosage can directly have influence on the result of ion beam irradiation effect, so inevitable big or small inseparable with the ion beam irradiation implantation dosage of the acquisition of related conclusions.
When the ion beam with single component carries out irradiation to the sample of being studied; The monitoring of ion irradiation implantation dosage is fairly simple, normally utilizes the line integraph that its line of surveying bundle device (like Faraday cup) output is carried out quantity of electric charge integration with exposure time and can realize.Because irradiate ion is a single component, so in the ion beam irradiation process,, also do not influence the accurate measurement of finally ion irradiation being injected accumulated dose even exist the fluctuations of beam intensity.
But when simultaneously same sample being carried out irradiation with two or more ion beam mixings, situation is then different fully.Owing to there is not inevitable quantitative relationship between each beam component; The charge state of every kind of ion is in most cases also different; And the ion beam of various compositions beam intensity in the Long-Duration Exposure process can not be unalterable; Fluctuation wherein is at random, and there is not necessary relation in fluctuations each other.In this case, the above-mentioned line integraph and that utilizes is surveyed the impossible accurate monitoring that realizes the branch implantation dosage of the total implantation dosage of ion irradiation and each ion beam current composition of simple method for measuring that bundle device links to each other.At present; The two or more ion beam research work of the same sample of irradiation simultaneously is scarcely out of swaddling-clothes; But how to realize dividing the real-time monitoring of implantation dosage to become the critical problem that to face in the polyion combined beam irradiation technique, and go back the effective solution of neither one in the existing ion beam irradiation technology the total implantation dosage of polyion combined beam irradiation and each ion beam composition.
Summary of the invention
To in the prior art when two or more ion beam mixing simultaneously during the same sample of irradiation; Still neither one is effective carries out this problem of monitoring method accurately and reliably to the total implantation dosage of ion beam irradiation and each beam component implantation dosage; The present invention proposes the method for real-time of each composition beam intensity of a kind of ion beam mixing and the method for real-time of implantation dosage; Utilize this method to irradiation line sample analysis; Size in the time of can accurately knowing each beam component irradiation sample, thus realize real-time, online, accurate monitoring to the total implantation dosage of polyion combined beam irradiation and each beam component.
When energetic ion passes solid thin-sheet, its part or all of outer-shell electron will be stripped from.The charge state that the outer-shell electron of the ion of incident is stripped from the ion of the outgoing that has caused passing solid thin-sheet increases; The increase of its charge state will cause the increase of its beam intensity, and the ratio of the incoming beam intensity of flow of the emerging beam intensity of flow that will pass solid thin-sheet here when not passing solid thin-sheet is called the amplification coefficient of line.The unique factor that influences the line amplification coefficient is stripped from for the incident ion outer-shell electron what; What are relevant with following two factors and outer-shell electron is stripped from: the kind and the energy of (1) incident ion; (2) material of solid thin-sheet and thickness; The former is by the character decision of ion beam own, and the latter is an external factor.So under the situation of material and fixed thickness of solid thin-sheet that is external factor, then the amplification coefficient of line just only depends on the character of incident line itself.And under the situation that the character of incident ion own is confirmed, change into the material and the thickness of the solid thin-sheet of external factor, equally also can cause the change of line amplification coefficient.The present invention utilizes these characteristics to realize real-time, online, the accurate monitoring to each composition beam intensity of ion beam mixing and implantation dosage just.
The sampling of adopting in the monitoring method of the present invention is surveyed the bundle Faraday cup and is comprised: receive the metal receiving basin of the ion beam mixing of incident, link to each other with galvanometer or line integraph through the through wires hole output that is arranged on its sidewall, realize the monitoring to line; The metallic shield tube of suit one ground connection outside the metal receiving basin, its function are to mask external stray ion and secondary electron to the accurately interference of monitoring of line; Between the metallic shield tube of metal receiving basin and ground connection a dielectric isolation layer is arranged; Suppress on electrode is fixed on ground connection through the insulation cage ring the port of metallic shield tube, be used to suppress the secondary electron that produces on the metal receiving basin; The insulation cage ring does not directly contact with the metal receiving basin; Between the port of inhibition electrode and metal receiving basin certain clearance is arranged; Dielectric isolation layer does not have directly and contacts with the insulation cage ring, between have certain clearance.
One object of the present invention is to provide a kind of method of real-time of beam intensity of each composition of ion beam mixing.
The method of real-time of the beam intensity of each composition of ion beam mixing of the present invention may further comprise the steps during to the high energy ion beam mixing irradiation sample of N kind composition:
(1) choose sampling and survey the bundle Faraday cup: N of bundle Faraday cup surveyed in the sampling of choosing the structure on all four measurement beam intensity identical with the number N of the composition of ion beam mixing; It is parallel that to be positioned over hybrid ionic to be measured intrafascicular; And be connected with N galvanometer or line integraph respectively, wherein N is >=2 natural number;
(2) choose solid thin-sheet: choose N-1 all different solid thin-sheet of line amplification coefficient for each intrafascicular ion beam of N kind hybrid ionic; Be placed on respectively before N-1 sampling survey the bundle Faraday cup, the selection principle of solid thin-sheet thickness can not pass minimum thickness required when reaching the charge state equilibrium state behind such solid thin-sheet greater than any intrafascicular ion beam of N kind high energy hybrid ionic for its thickness;
(3) confirm the line amplification coefficient: other line from source interception N kind beam component, only let first kind of line incident, write down N sampling survey restraint the same time measurement of Faraday cup to beam intensity be respectively I
11, I
12... .., I
1N, then first kind of incident line passes N-1 the line amplification coefficient behind the solid thin-sheet and is followed successively by: K
12=I
12/ I
11...., K
1N=I
1N/ I
11Similarly can obtain M kind line passes N-1 the line amplification coefficient behind the solid thin-sheet and is followed successively by: K
M2=I
M2/ I
M1...., K
MN=I
MN/ I
M1And the like accomplish and N kind beam component to be passed different solid thin-sheet posterior cords banish confirming of big coefficient, wherein, I
M1Do not survey the beam intensity of the M kind line that the bundle Faraday cup records, I for placing the sampling of any solid thin-sheet
M2... .., I
MNBe followed successively by the sampling of placing different solid thin-sheets and survey the beam intensity of the M kind line that the bundle Faraday cup records, M is natural number and 1≤M≤N;
The beam intensity of each ion component when (4) confirming the ion beam mixing irradiation sample: each sampling beam intensity that Faraday cup records that tests the speed is designated as I respectively during the ion beam mixing irradiation sample
1, I
2..., I
N, the beam intensity of intrafascicular each ion component to be determined of incident hybrid ionic is set at X respectively
1, X
2..., X
NSo, have:
X
1+X
2+......+X
N＝I
1(1)
K
12X
1+K
22X
2+......+K
N2X
N＝I
2(2)
......
K
1MX
1+K
2MX
2+......+K
NMX
N＝I
M (M)
......
K
1NX
1+K
2NX
2+......+K
NNX
N＝I
N (N)
Separate thus the beam intensity X that system of equations that N equation form can be tried to achieve intrafascicular each ion component of incident hybrid ionic
1, X
2..., X
N
In step (2), N-1 solid thin-sheet material is identical but thickness different, thereby all different for the line amplification coefficient of each intrafascicular ion beam of N kind hybrid ionic; Perhaps N-1 solid thin-sheet thickness is identical but material different, thereby all different for the line amplification coefficient of each intrafascicular ion beam of N kind hybrid ionic.
Another object of the present invention is to provide a kind of method of real-time of implantation dosage of each composition of ion beam mixing.
For confirming of each composition ion implantation dosage of long-time continuous irradiation; Above-mentioned N the sampling Faraday cup that tests the speed is connected with N line integraph respectively; Utilize the integration total value of the interior quantity of electric charge of integrating function measurement certain hour of line integraph; Just the branch quantity of electric charge irradiation dose of each ion component in the time of can confirming ion beam mixing irradiation sample in the certain hour, thus accurately know the irradiate ion implantation dosage of each ion component in this time period.
The method of real-time of the implantation dosage of each composition of ion beam mixing of the present invention may further comprise the steps during to the high energy ion beam mixing irradiation sample of N kind composition:
(1) choose sampling and survey the bundle Faraday cup: N of bundle Faraday cup surveyed in the sampling of choosing the structure on all four measurement beam intensity identical with the number N of the composition of ion beam mixing; It is parallel that to be positioned over hybrid ionic to be measured intrafascicular; And be connected with N line integraph respectively, wherein N is >=2 natural number;
(2) choose solid thin-sheet: choose N-1 all different solid thin-sheet of line amplification coefficient for each intrafascicular ion beam of N kind hybrid ionic; Be placed on respectively before N-1 sampling survey the bundle Faraday cup, the selection principle of solid thin-sheet thickness can not pass minimum thickness required when reaching the charge state equilibrium state behind such solid thin-sheet greater than the intrafascicular arbitrary HIB of N kind high energy hybrid ionic for its thickness;
(3) confirm the line amplification coefficient: other line from source interception N kind beam component, only let first kind of line incident, write down N sampling survey restraint the same time measurement of Faraday cup to beam intensity be respectively I
11, I
12... .., I
1N, then first kind of incident line passes N-1 the line amplification coefficient behind the solid thin-sheet and is followed successively by: K
12=I
12/ I
11...., K
1N=I
1N/ I
11Similarly can obtain M kind line passes N-1 the line amplification coefficient behind the solid thin-sheet and is followed successively by: K
M2=I
M2/ I
M1...., K
MN=I
MN/ I
M1And the like accomplish and N kind beam component to be passed different solid thin-sheet posterior cords banish confirming of big coefficient, wherein, I
M1Do not survey the beam intensity of the M kind line that the bundle Faraday cup records, I for placing the sampling of any solid thin-sheet
M2... .., I
MNBe followed successively by the sampling of placing different solid thin-sheets and survey the beam intensity of the M kind line that the bundle Faraday cup records, M is natural number and 1≤M≤N;
The implantation dosage of each ion component when (4) confirming the ion beam mixing irradiation sample: the test the speed quantity of electric charge of Faraday cup of each sampling is Q when recording the ion beam mixing irradiation sample behind the line integraph elapsed time T
1, Q
2..., Q
N, the quantity of electric charge of intrafascicular each ion component to be determined of incident hybrid ionic is set at X respectively
1, X
2..., X
NSo, have:
X
1+X
2+......+X
N＝Q
1(1)
K
12X
1+K
22X
2+......+K
N2X
N＝Q
2(2)
......
K
1MX
1+K
2MX
2+......+K
NMX
N＝Q
M (M)
......
K
1NX
1+K
2NX
2+......+K
NNX
N＝Q
N (N)
Separate thus the quantity of electric charge that system of equations that N equation form can try to achieve intrafascicular each ion component of incident hybrid ionic and be respectively X
1, X
2..., X
N, then the quantity of electric charge is converted into the ion number that implantation dosage is a unit area, thereby obtains the implantation dosage of intrafascicular each ion component of incident hybrid ionic.
In step (2); N-1 all different solid thin-sheet of line amplification coefficient for each intrafascicular ion beam of N kind hybrid ionic; Can be that material is identical but thickness different, thus all different for the line amplification coefficient of each intrafascicular ion beam of N kind hybrid ionic; Also can be that thickness is identical but material different, thus all different for the line amplification coefficient of each intrafascicular ion beam of N kind hybrid ionic.
Advantage of the present invention:
Real-time, online, the accurate monitoring that the total implantation dosage of irradiation and each beam component divide implantation dosage when (1) having realized multicomponent ion beam mixing irradiation sample;
(2) utilized high energy charged particles to pass the physics law that charge state increases behind the solid thin-sheet dexterously;
(3) respectively become the kind of segregant and number not to limit to ion beam mixing to be measured;
(4) to the not restriction of the mutual proportionate relationship of the interionic beam intensity of each composition of ion beam mixing to be measured;
(5) stability to each composition ion beam current intensity of ion beam mixing to be measured does not limit;
(6) fluctuations of beam intensity in the irradiation process of the intrafascicular arbitrary ion component of hybrid ionic to be measured; Neither can have influence on accurate measurement, also can not become the accurate measurement of the final irradiation implantation dosage of segregant itself to impact this to the final irradiation implantation dosage of other ion component;
(7) the special sampling use of Faraday cup of testing the speed, removed the large tracts of land line get on the target chamber wall and other object on the secondary electron that produces and scattered ion(s) thereof to measuring the influence of accuracy;
(8) method is simple and clear, and cost is low, uses reliable.
Description of drawings
Fig. 1 is the test the speed structural representation of Faraday cup of sampling;
The test the speed synoptic diagram of Faraday cup of the sampling that Fig. 2 places solid thin-sheet for the line porch.
Embodiment
Below in conjunction with accompanying drawing, the present invention is further specified through instance.
As shown in Figure 1, the sampling that the present invention the adopts Faraday cup that tests the speed comprises: metallic shield tube 1; Dielectric isolation layer 2; Metal receiving basin 3; Insulation cage ring 4; Suppress electrode 5; And through wires hole 6.In Fig. 1,7 is line to be measured.
As shown in Figure 2, test the speed between Faraday cup and the line to be measured in sampling and to place solid plectrum 8.
Specify embodiment of the present invention below in conjunction with embodiment.
The proton of the large tracts of land 3MeV of two accelerator generations and the Si of 25MeV
4+Even combined beam, stream separately is adjustable by force.The monitoring method of the implantation dosage of each composition during the combined beam irradiation sample of two kinds of ions:
(1) choose the sampling Faraday cup that tests the speed: choose two identical in structure samplings Faraday cup that tests the speed according to Fig. 1, first sampling Faraday cup and second sampling Faraday cup that tests the speed that tests the speed, the area of its line receiving port is 5mm
2
(2) choose solid thin-sheet: choosing area is 1cm
2, thickness is 5ug/cm
2The carbon solid thin-sheet be placed on second sampling and test the speed before the line receiving port of Faraday cup;
(3) confirm the line amplification coefficient: let the proton of 3MeV and the Si of 25MeV
4+Respectively independent incident, for proton, first and second samplings test the speed beam intensity that Faraday cup records be respectively 4nA and 4nA (proton has not had outer-shell electron, pass the carbon solid thin-sheet after charge state constant, therefore flow also constant by force), the line amplification coefficient is 1, for Si
4+, first and second samplings beam intensity that Faraday cup records that tests the speed is respectively 1.3nA and 2.7nA, and the line amplification coefficient is 2.08;
The implantation dosage of each ion component when (4) confirming the ion beam mixing irradiation sample: place irradiation sample and confirm parallelly with first and second lines sampling Faraday cup that tests the speed, in combined beam irradiation process, the stream of randomly changing proton by force and Si
4+Stream strong, stop ion beam irradiation after 10 minutes, the test the speed quantity of electric charge of line integration of Faraday cup of first and second samplings is respectively 3000nC and 4000nC in this section period, so obtain system of equations:
X
1+X
2＝3000(1)
X
1+2.08X
2＝4000(2)
Wherein, X
1And X
2Represent proton and Si respectively
4+The quantity of electric charge, separate above system of equations and can confirm proton and Si
4+The quantity of electric charge be respectively 2074nC and 926nC, the implantation dosage of each ion component when converting ion irradiation into is respectively 2.6E13P/cm
2And 2.9E12P/cm
2
It should be noted that at last; The purpose of publicizing and implementing mode is to help further to understand the present invention; But it will be appreciated by those skilled in the art that: in the spirit and scope that do not break away from the present invention and appended claim, various replacements and to revise all be possible.Therefore, the present invention should not be limited to the disclosed content of embodiment, and the scope that the present invention requires to protect is as the criterion with the scope that claims define.
Claims (10)
1. the method for real-time of the beam intensity of each composition of ion beam mixing during to the high energy ion beam mixing irradiation sample of N kind composition, is characterized in that, may further comprise the steps:
(1) choose sampling and survey the bundle Faraday cup: N of bundle Faraday cup surveyed in the sampling of choosing the structure on all four measurement beam intensity identical with the number N of the composition of ion beam mixing; It is parallel that to be positioned over hybrid ionic to be measured intrafascicular; And be connected with N galvanometer or line integraph respectively, wherein N is >=2 natural number;
(2) choose solid thin-sheet: choose N-1 all different solid thin-sheet of line amplification coefficient for each intrafascicular ion beam of N kind hybrid ionic, be placed on respectively N-1 sampling survey restraint Faraday cup before;
(3) confirm the line amplification coefficient: other line from source interception N kind beam component, only let first kind of line incident, write down N sampling survey restraint the same time measurement of Faraday cup to beam intensity be respectively I
11, I
12... .., I
1N, then first kind of incident line passes N-1 the line amplification coefficient behind the solid thin-sheet and is followed successively by: K
12=I
12/ I
11...., K
1N=I
1N/ I
11Similarly can obtain M kind line passes N-1 the line amplification coefficient behind the solid thin-sheet and is followed successively by: K
M2=I
M2/ I
M1...., K
MN=I
MN/ I
M1And the like accomplish and N kind beam component to be passed different solid thin-sheet posterior cords banish confirming of big coefficient, wherein, I
M1Do not survey the beam intensity of the M kind line that the bundle Faraday cup records, I for placing the sampling of any solid thin-sheet
M2... .., I
MNBe followed successively by the sampling of placing different solid thin-sheets and survey the beam intensity of the M kind line that the bundle Faraday cup records, M is natural number and 1≤M≤N;
The beam intensity of each ion component when (4) confirming the ion beam mixing irradiation sample: each sampling beam intensity that Faraday cup records that tests the speed is designated as I respectively during the ion beam mixing irradiation sample
1, I
2..., I
N, the beam intensity of intrafascicular each ion component to be determined of incident hybrid ionic is set at X respectively
1, X
2..., X
NSo, have:
X
1+X
2+......+X
N＝I
1(1)
K
12X
1+K
22X
2+......+K
N2X
N＝I
2(2)
......
K
1MX
1+K
2MX
2+......+K
NMX
N＝I
M (M)
......
K
1NX
1+K
2NX
2+......+K
NNX
N＝I
N (N)
Separate thus the beam intensity X that system of equations that N equation form can be tried to achieve intrafascicular each ion component of incident hybrid ionic
1, X
2..., X
N
2. the method for claim 1 is characterized in that, in step (2), said N-1 solid thin-sheet material is identical but thickness different, thereby all different for the line amplification coefficient of each intrafascicular ion beam of N kind hybrid ionic.
3. the method for claim 1 is characterized in that, in step (2), said N-1 solid thin-sheet thickness is identical but material different, thereby all different for the line amplification coefficient of each intrafascicular ion beam of N kind hybrid ionic.The selection principle of solid thin-sheet thickness can not pass minimum thickness required when reaching the charge state equilibrium state behind such solid thin-sheet greater than the intrafascicular arbitrary HIB of N kind high energy hybrid ionic for its thickness.
4. the method for claim 1; It is characterized in that; In step (2), the selection principle of said solid thin-sheet thickness can not pass minimum thickness required when reaching the charge state equilibrium state behind such solid thin-sheet greater than any intrafascicular ion beam of N kind high energy hybrid ionic for its thickness.
5. the method for claim 1; It is characterized in that; Said sampling is surveyed the bundle Faraday cup and is comprised: receive the metal receiving basin (3) of the ion beam mixing of incident, link to each other with galvanometer or line integraph through through wires hole (6) output that is arranged on its sidewall, realize the monitoring to line; The metallic shield tube (1) of suit one ground connection outside metal receiving basin (3), its function are to mask external stray ion and secondary electron to the accurately interference of monitoring of line; Between the metallic shield tube (1) of metal receiving basin (3) and ground connection a dielectric isolation layer (2) is arranged; Suppress on electrode (5) is fixed on ground connection through the cage ring (4) that insulate the port of metallic shield tube, be used to suppress the secondary electron that produces on the metal receiving basin; Insulation cage ring (4) does not directly contact with metal receiving basin (3); Between the port of inhibition electrode (5) and metal receiving basin (3) certain clearance is arranged; Dielectric isolation layer (2) does not have with insulation cage ring (4) and directly contacts, between have certain clearance.
6. the method for real-time of the implantation dosage of each composition of ion beam mixing during to the high energy ion beam mixing irradiation sample of N kind composition, is characterized in that, may further comprise the steps:
(1) choose sampling and survey the bundle Faraday cup: N of bundle Faraday cup surveyed in the sampling of choosing the structure on all four measurement beam intensity identical with the number N of the composition of ion beam mixing; It is parallel that to be positioned over hybrid ionic to be measured intrafascicular; And be connected with N line integraph respectively, wherein N is >=2 natural number;
(2) choose solid thin-sheet: choose N-1 all different solid thin-sheet of line amplification coefficient for each intrafascicular ion beam of N kind hybrid ionic, be placed on respectively N-1 sampling survey restraint Faraday cup before;
(3) confirm the line amplification coefficient: other line from source interception N kind beam component, only let first kind of line incident, write down N sampling survey restraint the same time measurement of Faraday cup to beam intensity be respectively I
11, I
12... .., I
1N, then first kind of incident line passes N-1 the line amplification coefficient behind the solid thin-sheet and is followed successively by: K
12=I
12/ I
11...., K
1N=I
1N/ I
11Similarly can obtain M kind line passes N-1 the line amplification coefficient behind the solid thin-sheet and is followed successively by: K
M2=I
M2/ I
M1...., K
MN=I
MN/ I
M1And the like accomplish and N kind beam component to be passed different solid thin-sheet posterior cords banish confirming of big coefficient, wherein, I
M1Do not survey the beam intensity of the M kind line that the bundle Faraday cup records, I for placing the sampling of any solid thin-sheet
M2... .., I
MNBe followed successively by the sampling of placing different solid thin-sheets and survey the beam intensity of the M kind line that the bundle Faraday cup records, M is natural number and 1≤M≤N;
The implantation dosage of each ion component when (4) confirming the ion beam mixing irradiation sample: the test the speed quantity of electric charge of Faraday cup of each sampling is Q when recording the ion beam mixing irradiation sample behind the line integraph elapsed time T
1, Q
2..., Q
N, the quantity of electric charge of intrafascicular each ion component to be determined of incident hybrid ionic is set at X respectively
1, X
2..., X
NSo, have:
X
1+X
2+......+X
N＝Q
1(1)
K
12X
1+K
22X
2+......+K
N2X
N＝Q
2(2)
......
K
1MX
1+K
2MX
2+......+K
NMX
N＝Q
M (M)
......
K
1NX
1+K
2NX
2+......+K
NNX
N＝Q
N (N)
Separate thus the quantity of electric charge that system of equations that N equation form can try to achieve intrafascicular each ion component of incident hybrid ionic and be respectively X
1, X
2..., X
N, then the quantity of electric charge is converted into implantation dosage, thereby obtains the implantation dosage of intrafascicular each ion component of incident hybrid ionic.
7. method as claimed in claim 6 is characterized in that, in step (2), said N-1 solid thin-sheet material is identical but thickness different, thereby all different for the line amplification coefficient of each intrafascicular ion beam of N kind hybrid ionic.
8. method as claimed in claim 6 is characterized in that, in step (2), said N-1 solid thin-sheet thickness is identical but material different, thereby all different for the line amplification coefficient of each intrafascicular ion beam of N kind hybrid ionic.
9. method as claimed in claim 6; It is characterized in that; In step (2), the selection principle of said solid thin-sheet thickness can not pass minimum thickness required when reaching the charge state equilibrium state behind such solid thin-sheet greater than any intrafascicular ion beam of N kind high energy hybrid ionic for its thickness.
10. method as claimed in claim 6; It is characterized in that; Said sampling is surveyed the bundle Faraday cup and is comprised: receive the metal receiving basin (3) of the ion beam mixing of incident, link to each other with galvanometer or line integraph through through wires hole (6) output that is arranged on its sidewall, realize the monitoring to line; The metallic shield tube (1) of suit one ground connection outside metal receiving basin (3), its function are to mask external stray ion and secondary electron to the accurately interference of monitoring of line; Between the metallic shield tube (1) of metal receiving basin (3) and ground connection a dielectric isolation layer (2) is arranged; Suppress on electrode (5) is fixed on ground connection through the cage ring (4) that insulate the port of metallic shield tube, be used to suppress the secondary electron that produces on the metal receiving basin; Insulation cage ring (4) does not directly contact with metal receiving basin (3); Between the port of inhibition electrode (5) and metal receiving basin (3) certain clearance is arranged; Dielectric isolation layer (2) does not have with insulation cage ring (4) and directly contacts, between have certain clearance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210108157.7A CN102621577B (en) | 2012-04-13 | 2012-04-13 | Real-time monitoring method of each component beam intensity and injection dosage of mixed ion beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210108157.7A CN102621577B (en) | 2012-04-13 | 2012-04-13 | Real-time monitoring method of each component beam intensity and injection dosage of mixed ion beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102621577A true CN102621577A (en) | 2012-08-01 |
| CN102621577B CN102621577B (en) | 2014-03-26 |
Family
ID=46561602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210108157.7A Expired - Fee Related CN102621577B (en) | 2012-04-13 | 2012-04-13 | Real-time monitoring method of each component beam intensity and injection dosage of mixed ion beam |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102621577B (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102819033A (en) * | 2012-08-29 | 2012-12-12 | 中国科学院合肥物质科学研究院 | Ion beam automatic measuring system and method |
| CN103091698A (en) * | 2013-01-23 | 2013-05-08 | 哈尔滨工业大学 | Test method of proton/electronic synthetical irradiation beam fluence |
| CN103176202A (en) * | 2013-04-12 | 2013-06-26 | 中国工程物理研究院核物理与化学研究所 | Device and method for measuring components of deuterium ion beam of deuterium-tritium neutron tube |
| CN103823234A (en) * | 2014-03-12 | 2014-05-28 | 中国工程物理研究院电子工程研究所 | Pulse charged particle beam detector |
| CN103984002A (en) * | 2014-04-28 | 2014-08-13 | 中国工程物理研究院流体物理研究所 | System and method for collecting section signal of H+ ions containing mixed ion currents |
| CN104808236A (en) * | 2015-05-11 | 2015-07-29 | 北京大学 | Real-time monitoring device and method for injection dose of small-area ion beam radiation small sample |
| CN104981271A (en) * | 2012-12-25 | 2015-10-14 | 株式会社日立制作所 | Particle beam treatment device |
| CN110221339A (en) * | 2018-10-26 | 2019-09-10 | 新瑞阳光粒子医疗装备(无锡)有限公司 | A kind of beam intensity detection device and particle accelerator |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002521799A (en) * | 1998-07-28 | 2002-07-16 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | Particle beam current monitoring technology |
| WO2004031687A1 (en) * | 2002-09-17 | 2004-04-15 | Gesellschaft Für Schwerionenforschung Gmbh | Device and method for locally measuring the layer thickness of a sample and/or for locally modifying the thickness thereof with an electron beam |
| CN101414545A (en) * | 2007-10-17 | 2009-04-22 | 北京中科信电子装备有限公司 | Faraday apparatus for angle measurement of parallel beam |
| CN101764029A (en) * | 2008-12-04 | 2010-06-30 | 北京中科信电子装备有限公司 | Method and device for accurately detecting and correcting parallelism of ion beam |
| CN101900826A (en) * | 2010-06-13 | 2010-12-01 | 中国科学院近代物理研究所 | Heavy ion beam current transverse dosage distribution measuring detector and two-dimensional imaging method thereof |
| CN102005362A (en) * | 2009-09-03 | 2011-04-06 | 北京中科信电子装备有限公司 | Calibration system and calibration method for dual-Faraday cup measuring ratios of ion implantation machine |
| CN202066970U (en) * | 2011-03-22 | 2011-12-07 | 北京大学 | Accurate real-time online monitoring device for total dose of large-area uniform beam irradiation |
-
2012
- 2012-04-13 CN CN201210108157.7A patent/CN102621577B/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002521799A (en) * | 1998-07-28 | 2002-07-16 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | Particle beam current monitoring technology |
| WO2004031687A1 (en) * | 2002-09-17 | 2004-04-15 | Gesellschaft Für Schwerionenforschung Gmbh | Device and method for locally measuring the layer thickness of a sample and/or for locally modifying the thickness thereof with an electron beam |
| CN101414545A (en) * | 2007-10-17 | 2009-04-22 | 北京中科信电子装备有限公司 | Faraday apparatus for angle measurement of parallel beam |
| CN101764029A (en) * | 2008-12-04 | 2010-06-30 | 北京中科信电子装备有限公司 | Method and device for accurately detecting and correcting parallelism of ion beam |
| CN102005362A (en) * | 2009-09-03 | 2011-04-06 | 北京中科信电子装备有限公司 | Calibration system and calibration method for dual-Faraday cup measuring ratios of ion implantation machine |
| CN101900826A (en) * | 2010-06-13 | 2010-12-01 | 中国科学院近代物理研究所 | Heavy ion beam current transverse dosage distribution measuring detector and two-dimensional imaging method thereof |
| CN202066970U (en) * | 2011-03-22 | 2011-12-07 | 北京大学 | Accurate real-time online monitoring device for total dose of large-area uniform beam irradiation |
Non-Patent Citations (2)
| Title |
|---|
| N. URUSHIHARA等: "Ion Beam Alignment Procedures using a Faraday Cup or a Silicon Dioxide Film on Silicon Substrate with Auger Electron Microscope", 《JOURNAL OF SURFACE ANALYSIS》 * |
| 张璐: "闪烁体薄膜在线测量质子束流强度", 《核技术》 * |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102819033A (en) * | 2012-08-29 | 2012-12-12 | 中国科学院合肥物质科学研究院 | Ion beam automatic measuring system and method |
| CN102819033B (en) * | 2012-08-29 | 2014-05-07 | 中国科学院合肥物质科学研究院 | Ion beam automatic measuring system and method |
| CN104981271A (en) * | 2012-12-25 | 2015-10-14 | 株式会社日立制作所 | Particle beam treatment device |
| CN104981271B (en) * | 2012-12-25 | 2017-09-15 | 株式会社日立制作所 | Particle beam therapy device |
| CN103091698A (en) * | 2013-01-23 | 2013-05-08 | 哈尔滨工业大学 | Test method of proton/electronic synthetical irradiation beam fluence |
| CN103091698B (en) * | 2013-01-23 | 2015-08-19 | 哈尔滨工业大学 | The detection method of one kind of proton/electronics synthesis irradiation beams streamer amount |
| CN103176202A (en) * | 2013-04-12 | 2013-06-26 | 中国工程物理研究院核物理与化学研究所 | Device and method for measuring components of deuterium ion beam of deuterium-tritium neutron tube |
| CN103176202B (en) * | 2013-04-12 | 2014-12-10 | 中国工程物理研究院核物理与化学研究所 | Device and method for measuring components of deuterium ion beam of deuterium-tritium neutron tube |
| CN103823234A (en) * | 2014-03-12 | 2014-05-28 | 中国工程物理研究院电子工程研究所 | Pulse charged particle beam detector |
| CN103984002A (en) * | 2014-04-28 | 2014-08-13 | 中国工程物理研究院流体物理研究所 | System and method for collecting section signal of H+ ions containing mixed ion currents |
| CN104808236A (en) * | 2015-05-11 | 2015-07-29 | 北京大学 | Real-time monitoring device and method for injection dose of small-area ion beam radiation small sample |
| CN110221339A (en) * | 2018-10-26 | 2019-09-10 | 新瑞阳光粒子医疗装备(无锡)有限公司 | A kind of beam intensity detection device and particle accelerator |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102621577B (en) | 2014-03-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102621577B (en) | Real-time monitoring method of each component beam intensity and injection dosage of mixed ion beam | |
| Cazzaniga et al. | Progress of the scientific commissioning of a fast neutron beamline for chip irradiation | |
| Litvinov et al. | Precision experiments with time-resolved Schottky mass spectrometry | |
| Schuch et al. | Dielectronic resonance method for measuring isotope shifts | |
| Wietfeldt et al. | aCORN: An experiment to measure the electron–antineutrino correlation in neutron decay | |
| Christl et al. | 236U analyses with the ETH Zurich MILEA prototype system | |
| Unverzagt | Light meson physics with Crystal Ball/MAMI and at BES-III | |
| Earnshaw et al. | The height of origin of muons in large air showers | |
| Lane et al. | Polarization and differential cross section for neutron scattering from silicon | |
| Bachiller-Perea et al. | New energy calibration of the CMAM 5MV tandem accelerator | |
| D Javorsek et al. | Experimental limits on the existence of strongly interacting massive particles bound to gold nuclei | |
| Haungs | Ultra-High Energy Cosmic Rays: A Recap of the Discussions at the European Cosmic Ray Symposium 2014 | |
| Halataei et al. | Simulation study on number of secondary particles in extensive air showers using CORSIKA code | |
| Kuramoto et al. | Segmented silicon-based solid-state detector with thin dead layer for superheavy element research | |
| Farahvashi et al. | Scattering model for grazing impact of micro-particles on mirror surfaces | |
| Kochelev et al. | Semi-inclusive Λc+ leptoproductions and polarized gluon distributions | |
| Bhowmik et al. | The mass of the A 0-hyperon | |
| Alsalmi | Measurement of the Nuclear Dependence of F_2 and R= Sigma_L/Sigma_T in The Nucleon Resonance Region | |
| Li et al. | Realisation and measurement of (6–15) keV single‐energy X‐rays | |
| Loparco et al. | Measurements of the cosmic-ray electron and positron spectrum and anisotropies with the Fermi LAT | |
| Xue et al. | Comparison of displacement damage effects on the dark signal in CMOS image sensors induced by CSNS back-n and XAPR neutrons | |
| Devlin et al. | Measurements of the longitudinal energy distribution of low energy electrons | |
| Virk | Modgil-Virk formulation of single activation energy model of radiation damage annealing in SSNTDs: a critical appraisal | |
| Ruffenach et al. | A proton detector for energies from 2 MeV to 20 MeV | |
| Liu et al. | Development of diamond sensors for beam halo and compton spectrum diagnostics after the interaction point of atf2 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140326 Termination date: 20170413 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |