CN102751199B - 一种槽型半导体功率器件的制造方法 - Google Patents
一种槽型半导体功率器件的制造方法 Download PDFInfo
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- CN102751199B CN102751199B CN201210226462.6A CN201210226462A CN102751199B CN 102751199 B CN102751199 B CN 102751199B CN 201210226462 A CN201210226462 A CN 201210226462A CN 102751199 B CN102751199 B CN 102751199B
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 234
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 45
- 238000005516 engineering process Methods 0.000 claims abstract description 26
- 238000005530 etching Methods 0.000 claims abstract description 23
- 238000011049 filling Methods 0.000 claims abstract description 15
- 238000002347 injection Methods 0.000 claims abstract description 9
- 239000007924 injection Substances 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 69
- 230000012010 growth Effects 0.000 claims description 39
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 34
- 239000000758 substrate Substances 0.000 claims description 27
- 238000005468 ion implantation Methods 0.000 claims description 17
- 238000007254 oxidation reaction Methods 0.000 claims description 17
- 230000003647 oxidation Effects 0.000 claims description 16
- 239000000377 silicon dioxide Substances 0.000 claims description 16
- 235000012239 silicon dioxide Nutrition 0.000 claims description 16
- 230000015572 biosynthetic process Effects 0.000 claims description 13
- 238000001039 wet etching Methods 0.000 claims description 9
- 238000001312 dry etching Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 229920002120 photoresistant polymer Polymers 0.000 claims description 7
- 230000015556 catabolic process Effects 0.000 claims description 6
- 238000001259 photo etching Methods 0.000 claims description 6
- 230000005684 electric field Effects 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 claims description 2
- 238000002161 passivation Methods 0.000 claims description 2
- 230000007547 defect Effects 0.000 abstract description 4
- 208000012868 Overgrowth Diseases 0.000 abstract description 2
- 210000000746 body region Anatomy 0.000 abstract 4
- 238000000407 epitaxy Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 17
- 238000005520 cutting process Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 239000007943 implant Substances 0.000 description 4
- 238000000137 annealing Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000008094 contradictory effect Effects 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000009790 rate-determining step (RDS) Methods 0.000 description 1
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CN201210226462.6A CN102751199B (zh) | 2012-07-03 | 2012-07-03 | 一种槽型半导体功率器件的制造方法 |
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CN201210226462.6A CN102751199B (zh) | 2012-07-03 | 2012-07-03 | 一种槽型半导体功率器件的制造方法 |
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CN102751199A CN102751199A (zh) | 2012-10-24 |
CN102751199B true CN102751199B (zh) | 2014-12-17 |
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CN106847886A (zh) * | 2017-03-16 | 2017-06-13 | 上海华虹宏力半导体制造有限公司 | 沟槽型超级结的制造方法 |
CN107068735A (zh) * | 2017-03-16 | 2017-08-18 | 上海华虹宏力半导体制造有限公司 | 沟槽型超级结的制造方法 |
Citations (1)
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CN102184939A (zh) * | 2011-03-28 | 2011-09-14 | 电子科技大学 | 一种具有高k介质槽的半导体功率器件 |
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JP2002289683A (ja) * | 2001-03-28 | 2002-10-04 | Nec Corp | トレンチ分離構造の形成方法および半導体装置 |
KR101003496B1 (ko) * | 2008-09-29 | 2010-12-30 | 주식회사 하이닉스반도체 | 소자분리 구조 및 리세스 게이트를 포함하는 반도체 소자 및 제조 방법 |
US20100155801A1 (en) * | 2008-12-22 | 2010-06-24 | Doyle Brian S | Integrated circuit, 1T-1C embedded memory cell containing same, and method of manufacturing 1T-1C memory cell for embedded memory application |
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CN102184939A (zh) * | 2011-03-28 | 2011-09-14 | 电子科技大学 | 一种具有高k介质槽的半导体功率器件 |
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