CN102693056A - Capacitive touch screen and process for manufacturing same - Google Patents
Capacitive touch screen and process for manufacturing same Download PDFInfo
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- CN102693056A CN102693056A CN2012101651373A CN201210165137A CN102693056A CN 102693056 A CN102693056 A CN 102693056A CN 2012101651373 A CN2012101651373 A CN 2012101651373A CN 201210165137 A CN201210165137 A CN 201210165137A CN 102693056 A CN102693056 A CN 102693056A
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Abstract
The invention discloses a capacitive touch screen which comprises a substrate, an ITO (indium tin oxide) pattern layer, an insulation bridging layer and a jumping conductor pattern layer. The ITO pattern layer is arranged on the substrate, the insulation bridging layer covers the ITO pattern layer, the jumping conductor pattern layer covers the insulation bridging layer, and a black membrane pattern layer covers the jumping conductor pattern layer. A black membrane (BM) of the touch screen is manufactured by the process, after being exposed, the black membrane is only etched and is not peeled off, a low glare effect can be achieved, a peeling-off manufacturing procedure can be omitted, and yield is improved. Besides, the black membrane (BM) is used for shielding high glare generated by the jumping conductor pattern layer, and accordingly the appearance is improved.
Description
Technical field
The present invention relates to capacitive touch screen structure and production technology thereof.
Background technology
The touch screen of producing in the market mainly is a capacitive touch screen; It mainly is divided into two kinds of surface-type and projection-types, and wherein projection-type is claimed the inductance capacitance touch screen again, and capacitive touch screen physical construction is simple; And need not manual synchronizing; Adopt matrix structure, degree of accuracy is very high, is highly suitable on the portable type electronic product and uses.Therefore capacitance touch screen has occupied the main share in market; Its expensive production cost of capacitance touch screen becomes the main cause of competition, in order to reduce production cost, under the constant situation of cost of material; Reduce processing procedure, what provide effective output to become to reduce the cost is maximum crucial.
In the capacitive touch screen processing procedure, mainly be divided into two kinds and process structure:
Two-sided (DITO) constructed products function is better, and structure is more firm.Reliability is outstanding.But shortcoming is being processed the difficulty height.Patent is conflicted easily;
Referring to Fig. 2, single face (SITO) structure is ripe, process simply, but shortcoming is big or small at jumper, and univers parameter is wayward. and outward appearance does not reach customer requirement (outward appearance can exist the dazzle of jump conductor figure layer to produce " pit " phenomenon) in a sense.
Summary of the invention
Technical matters to be solved by this invention is to realize single face (SITO) the capacitive touch screen structure of a kind of nothing " pit " phenomenon, and the production technology of this capacitive touch screen.
To achieve these goals; The technical scheme that the present invention adopts is: a kind of capacitive touch screen; Comprise substrate, the ITO that is arranged on the substrate schemes layer, is covered in the outer insulation bridge formation layer of ITO figure layer; And a jump conductor figure layer that is covered in insulation bridge formation layer top, described jump conductor figure layer top is coated with the black film figure layer that is used to block the dazzle of metal jump conductor figure layer.
Build bridge layer, jump conductor figure layer of described ITO figure layer, insulation is identical and overlapped with the patterning of black film figure layer.
Covering resin protective seam on the described black film figure layer, described substrate back is provided with electrostatic prevention ITO layer and silicon dioxide layer of protection successively.
A kind of touch control part manufacturing process of capacitive touch screen comprises:
A, employing vacuum magnetic-control sputtering method are coated with the ITO film;
B, make ITO figure layer, comprise make public, etching;
C, on the ITO figure, make one deck insulation layer of building bridge;
D, utilize the vacuum magnetic-control sputtering coating machine in the insulation the made outer layer of conductive material of plating of layer of building bridge;
Further, coating one deck black film, the touch control part gold-tinted photoetching technique of employing touch screen then on described layer of conductive material; Be coated with successively; Baking, exposure, development, etch process is made into required figure together with this layer conductive material and black film.
Further, when described conductive material and black film make public, on the employed mask plate dimension scale of design configuration greater than product actual standard value 6-7um, and the exposure machine energy adjustment is to 250-300mj/ cm
2
Further, described conductive material and black film carry out the etching front and back and need carry out roasting firmly operation.
Further, hard roasting temperature 220-240 ℃ of duration 8-10min before the etching; Hard roasting temperature 220-240 ℃ of duration 30-35min after the etching.
The invention has the advantages that and utilize the black film (BM) of doing of this production technology making touch-screen to process not stripping of an exposure back etching, can reach low dazzle, can reduce by one metal lithographic processing procedure again and peel off processing procedure, improve the output yield.This capacitive touch screen structure utilizes black film (BM) to block the high dazzle that jump conductor figure layer produces simultaneously, has improved the outward appearance level.
Description of drawings
Face the content of every width of cloth accompanying drawing expression in the instructions of the present invention and the mark among the figure down and make brief description:
Fig. 1 is a capacitive touch screen cut-open view of the present invention;
Fig. 2 is a traditional handicraft capacitive touch screen cut-open view;
Mark among the above-mentioned figure is: 1, black film figure layer; 2, resin protective layer; 3, jump conductor figure layer; 4, insulation bridge formation layer; 5, ITO figure layer; 6, substrate; 7, electrostatic prevention ITO layer; 8, silicon dioxide layer of protection; 9, metallic circuit.
Embodiment
Can know referring to Fig. 1; Capacitive touch screen is provided with glass substrate 6; Substrate simultaneously is provided with ITO figure layer 5, is with metallic circuit 9 around substrate 6 these faces, is wrapped with the POC insulation layer 4 of building bridge at every circuit of ITO figure layer; The insulation bridge formation layer 4 outer jump conductor figure layer 3 that is coated with; Jump conductor figure layer 3 can adopt ITO or metallic conduction material as coating, outside jump conductor figure layer 3, also is coated with black film (BM) figure layer 1, and this black film figure layer 1 is used for blocking the dazzle that metal (mo/al/mo) jump conductor brings.Above-mentioned I TO schemes the touch control part of the identical and overlapped formation capacitive touch screen of patterning of layer 5, insulation bridge formation layer 4, jump conductor figure layer 3 and black film figure layer 1.And the pattern of jump conductor figure layer 3 and black film figure layer 1 is overlapping fully, and zero offset is favourablely blocked the dazzle that metal (mo/al/mo) jump conductor brings efficiently fully.At touch control part covering resin protective seam 2, substrate 6 back sides are provided with electrostatic prevention ITO layer 7 and silicon dioxide layer of protection 8 successively.
The touch control part manufacturing process of above-mentioned capacitive touch screen is following:
A, employing vacuum magnetic-control sputtering method are coated with the ITO film;
B, make ITO figure layer 5 afterwards, make ITO figure layer 5 here and be conventional means, promptly adopt the touch control part gold-tinted photoetching technique of touch screen, the ITO film is coated with, baking, is developed at exposure, etching, and stripping technology is handled, and is made into ITO figure layer 5;
C, on ITO figure layer 5, make one deck insulation layer 4 of building bridge afterwards, making the edge layer 4 of building bridge here also is conventional means, promptly adopts the touch control part gold-tinted photoetching technique of touch screen; Be coated with baking, exposure, development successively; Hard curing process is handled, and makes insulation bridge formation layer 4;
D, utilize the vacuum magnetic-control sputtering coating machine at the insulation made layer 4 outer layer of metal conductive material or the ITO material of plating of building bridge afterwards; And outside above-mentioned metallic conduction material or ITO material, be coated with one deck black film; Use the mask plate of making jump conductor figure layer 3 in the traditional handicraft then; And utilize the touch control part gold-tinted photoetching technique of touch screen, and this layer conductive material and black film system are made required figure together, promptly process jump conductor figure layer 3 and black film figure layer 1.This gold-tinted photoetching technique comprises coating, baking, exposure, development; Etching; Only remove the stripping technology in jump conductor figure layer 3 traditional manufacturing technique, other gold-tinted photoetching technique processing steps are identical with making jump conductor figure layer 3 traditional manufacturing technique, and original two figure layer production process are united two into one; Thereby practiced thrift making step, also improved product quality.
In the steps d, when carrying out the exposure technology of gold-tinted photoetching technique, traditional exposure machine energy is controlled at 100-150 mj/ cm
2About, can cause short circuit by residual black film between the conductive material after the exposure like this; Black photoresistance and metallic conductor are residual for fear of having between the conductive material graph line; Cause the function poor short circuit; Adopt the mask plate of overexposure, the size of design configuration is proportional greater than product actual standard value 6-7um on the mask plate that promptly uses in the exposure technology, through regulating the exposure function by the extremely present 250-300mj/ cm2 of original 100-150 mj/ cm2; Preferred 300mj/ cm2; It is software defined by DNK exposure machine self to regulate the exposure energy time, and the normal light flux is 35 mj/ cm2, stops automatically after arriving the technique initialization parameter by the board software set always.Through above-mentioned process adjustments, change that design load reaches the actual standard value on the mask plate, it is residual to improve between graph line photoresistance simultaneously.
In the steps d, when carrying out the etch process of gold-tinted photoetching technique, also can have the chemical resistance problem, BM black light resistance receives strong acid and attacks and cause coming off, and the BM photoresistance regional metal that comes off uncovers outside, causes etching to cross etching, produces function NG (short short circuit).Therefore carry out all need carrying out roasting firmly operation before and after the etching at conductive material and black film, to strengthen BM adhesion, hard roasting temperature 220-240 ℃ of duration 8-10min before the etching; Hard roasting temperature 220-240 ℃ of duration 30-35min after the etching strengthens before the etching that black light hinders adhesion after the black light resistance acid resistance and etching.
Gold-tinted photoetching technique described in the instructions, except that the partial parameters technology change of instructions explanation, other are touch-screen photoetching technique conventional in the TP industry.
Combine accompanying drawing that the present invention has been carried out exemplary description above; Obviously the concrete realization of the present invention does not receive the restriction of aforesaid way; As long as adopted the improvement of the various unsubstantialities that method of the present invention design and technical scheme carry out; Or design of the present invention and technical scheme are directly applied to other occasion without improving, all within protection scope of the present invention.
Claims (7)
1. capacitive touch screen; Comprise substrate; The ITO that is arranged on the substrate schemes layer, is covered in ITO figure layer of outer insulation bridge formation layer, and is covered in the jump conductor figure layer above the insulation bridge formation layer; It is characterized in that described jump conductor figure layer top is coated with the black film figure layer that is used to block the dazzle of metal jump conductor figure layer.
2. based on the described capacitive touch screen of claim 1, it is characterized in that: build bridge layer, jump conductor figure layer of described ITO figure layer, insulation is identical and overlapped with the patterning of black film figure layer.
3. capacitive touch screen according to claim 1 and 2 is characterized in that: covering resin protective seam on the described black film figure layer, described substrate back is provided with electrostatic prevention ITO layer and silicon dioxide layer of protection successively.
4. touch control part manufacturing process like the described capacitive touch screen of claim 1-3 comprises:
A, employing vacuum magnetic-control sputtering method are coated with the ITO film;
B, make ITO figure layer, comprise make public, etching;
C, on the ITO figure, make one deck insulation layer of building bridge;
D, utilize the vacuum magnetic-control sputtering coating machine in the insulation the made outer layer of conductive material of plating of layer of building bridge;
It is characterized in that: coating one deck black film on described layer of conductive material; Adopt the touch control part gold-tinted photoetching technique of touch screen then, be coated with successively, baking; Exposure, development, etch process is made into required figure together with this layer conductive material and black film.
5. the touch control part manufacturing process of capacitive touch screen according to claim 4; It is characterized in that: when described conductive material and black film make public; On the employed mask plate dimension scale of design configuration greater than product actual standard value 6-7um, and the exposure machine energy adjustment is to 250-300mj/ cm
2
6. according to the touch control part manufacturing process of claim 4 or 5 described capacitive touch screens, it is characterized in that: described conductive material and black film carry out the etching front and back need carry out roasting firmly operation.
7. the touch control part manufacturing process of capacitive touch screen according to claim 6 is characterized in that: hard roasting temperature 220-240 ℃ of duration 8-10min before the etching; Hard roasting temperature 220-240 ℃ of duration 30-35min after the etching.
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| CN2012101651373A CN102693056A (en) | 2012-05-25 | 2012-05-25 | Capacitive touch screen and process for manufacturing same |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103186309A (en) * | 2013-04-15 | 2013-07-03 | 芜湖长信科技股份有限公司 | Capacitive touch screen and production process thereof |
| WO2014089789A1 (en) * | 2012-12-12 | 2014-06-19 | 富元精密镀膜股份有限公司 | Touch screen and manufacturing method thereof |
| CN104898884A (en) * | 2015-06-16 | 2015-09-09 | 合肥鑫晟光电科技有限公司 | Single glass type touch panel and manufacturing method thereof |
| CN102955612B (en) * | 2012-10-22 | 2016-01-06 | 北京京东方光电科技有限公司 | A kind of touch sensing, its preparation method and display device |
| CN106249950A (en) * | 2016-07-28 | 2016-12-21 | 京东方科技集团股份有限公司 | Touch-control display panel and display device |
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| CN101576790A (en) * | 2008-05-09 | 2009-11-11 | 群康科技(深圳)有限公司 | Manufacturing process for touch-control panel |
| CN101989160A (en) * | 2009-08-07 | 2011-03-23 | 铼宝科技股份有限公司 | Capacitive touch panel |
| CN102385461A (en) * | 2010-08-30 | 2012-03-21 | 华森电子科技股份有限公司 | Projecting capacitor type touch panel and manufacture method thereof |
| CN202615367U (en) * | 2012-05-25 | 2012-12-19 | 芜湖长信科技股份有限公司 | Capacitance touch panel |
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| CN101576790A (en) * | 2008-05-09 | 2009-11-11 | 群康科技(深圳)有限公司 | Manufacturing process for touch-control panel |
| CN101464761A (en) * | 2009-01-05 | 2009-06-24 | 中国南玻集团股份有限公司 | Condenser type touch screen |
| CN101989160A (en) * | 2009-08-07 | 2011-03-23 | 铼宝科技股份有限公司 | Capacitive touch panel |
| CN102385461A (en) * | 2010-08-30 | 2012-03-21 | 华森电子科技股份有限公司 | Projecting capacitor type touch panel and manufacture method thereof |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102955612B (en) * | 2012-10-22 | 2016-01-06 | 北京京东方光电科技有限公司 | A kind of touch sensing, its preparation method and display device |
| WO2014089789A1 (en) * | 2012-12-12 | 2014-06-19 | 富元精密镀膜股份有限公司 | Touch screen and manufacturing method thereof |
| CN103186309A (en) * | 2013-04-15 | 2013-07-03 | 芜湖长信科技股份有限公司 | Capacitive touch screen and production process thereof |
| CN104898884A (en) * | 2015-06-16 | 2015-09-09 | 合肥鑫晟光电科技有限公司 | Single glass type touch panel and manufacturing method thereof |
| US9823799B2 (en) | 2015-06-16 | 2017-11-21 | Boe Technology Group Co., Ltd. | One glass solution touch panel and fabricating method thereof |
| CN104898884B (en) * | 2015-06-16 | 2018-03-13 | 合肥鑫晟光电科技有限公司 | A kind of monolithic glass formula contact panel and preparation method thereof |
| CN106249950A (en) * | 2016-07-28 | 2016-12-21 | 京东方科技集团股份有限公司 | Touch-control display panel and display device |
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Application publication date: 20120926 |