CN202615367U - Capacitance touch panel - Google Patents
Capacitance touch panel Download PDFInfo
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- CN202615367U CN202615367U CN 201220238849 CN201220238849U CN202615367U CN 202615367 U CN202615367 U CN 202615367U CN 201220238849 CN201220238849 CN 201220238849 CN 201220238849 U CN201220238849 U CN 201220238849U CN 202615367 U CN202615367 U CN 202615367U
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Abstract
The utility model discloses a capacitance touch panel which comprises a substrate, an ITO (indium tin oxide) layer arranged on the substrate, an insulation bridging layer covered outside the ITO layer, and a leaping guide body layer covered above the insulation bridging layer, wherein a black membrane layer is covered above the leaping guide body layer. The black membrane of the touch panel is manufactured by the production technology and is etched but not stripped after being exposed, so that low glare is achieved, the stripping process is omitted, and the yield of the output is improved. According to the capacitance touch panel, the black membrane is used for covering high glare generated by the leaping guide body layer, so that the appearance level is improved.
Description
Technical field
The utility model relates to the capacitive touch screen structure.
Background technology
The touch screen of producing in the market mainly is a capacitive touch screen; It mainly is divided into two kinds of surface-type and projection-types, and wherein projection-type is claimed the inductance capacitance touch screen again, and capacitive touch screen physical construction is simple; And need not manual synchronizing; Adopt matrix structure, degree of accuracy is very high, is highly suitable on the portable type electronic product and uses.Therefore capacitance touch screen has occupied the main share in market; Its expensive production cost of capacitance touch screen becomes the main cause of competition, in order to reduce production cost, under the constant situation of cost of material; Reduce processing procedure, what provide effective output to become to reduce the cost is maximum crucial.
In the capacitive touch screen processing procedure, mainly be divided into two kinds and process structure:
Two-sided (DITO) constructed products function is better, and structure is more firm.Reliability is outstanding.But shortcoming is being processed the difficulty height.Patent is conflicted easily;
Referring to Fig. 2, single face (SITO) structure is ripe, process simply, but shortcoming is big or small at jumper, and univers parameter is wayward. and outward appearance does not reach customer requirement (outward appearance can exist the dazzle of jump conductor figure layer to produce " pit " phenomenon) in a sense.
The utility model content
The utility model technical matters to be solved is to realize single face (SITO) the capacitive touch screen structure of a kind of nothing " pit " phenomenon, and the production technology of this capacitive touch screen.
To achieve these goals; The technical scheme that the utility model adopts is: a kind of capacitive touch screen; Comprise substrate, the ITO that is arranged on the substrate schemes layer, is covered in the outer insulation bridge formation layer of ITO figure layer; And a jump conductor figure layer that is covered in insulation bridge formation layer top, described jump conductor figure layer top is coated with the black film figure layer that is used to block the dazzle of metal jump conductor figure layer.
Build bridge layer, jump conductor figure layer of described ITO figure layer, insulation is identical and overlapped with the patterning of black film figure layer.
Covering resin protective seam on the described black film figure layer, described substrate back is provided with electrostatic prevention ITO layer and silicon dioxide layer of protection successively.
The advantage of the utility model is to utilize the black film (BM) of doing of this production technology making touch-screen to process not stripping of an exposure back etching, can reach low dazzle, can reduce by one metal lithographic processing procedure again and peel off processing procedure, improves the output yield.This capacitive touch screen structure utilizes black film (BM) to block the high dazzle that jump conductor figure layer produces simultaneously, has improved the outward appearance level.
Description of drawings
Face the content of every width of cloth accompanying drawing expression in the utility model instructions and the mark among the figure down and make brief description:
Fig. 1 is the utility model capacitive touch screen cut-open view;
Fig. 2 is a traditional handicraft capacitive touch screen cut-open view;
Mark among the above-mentioned figure is: 1, black film figure layer; 2, resin protective layer; 3, jump conductor figure layer; 4, insulation bridge formation layer; 5, ITO figure layer; 6, substrate; 7, electrostatic prevention ITO layer; 8, silicon dioxide layer of protection; 9, metallic circuit.
Embodiment
Can know referring to Fig. 1; Capacitive touch screen is provided with glass substrate 6; Substrate simultaneously is provided with ITO figure layer 5, is with metallic circuit 9 around substrate 6 these faces, is wrapped with the POC insulation layer 4 of building bridge at every circuit of ITO figure layer; The insulation bridge formation layer 4 outer jump conductor figure layer 3 that is coated with; Jump conductor figure layer 3 can adopt ITO or metallic conduction material as coating, outside jump conductor figure layer 3, also is coated with black film (BM) figure layer 1, and this black film figure layer 1 is used for blocking the dazzle that metal (mo/al/mo) jump conductor brings.Above-mentioned I TO schemes the touch control part of the identical and overlapped formation capacitive touch screen of patterning of layer 5, insulation bridge formation layer 4, jump conductor figure layer 3 and black film figure layer 1.And the pattern of jump conductor figure layer 3 and black film figure layer 1 is overlapping fully, and zero offset is favourablely blocked the dazzle that metal (mo/al/mo) jump conductor brings efficiently fully.At touch control part covering resin protective seam 2, substrate 6 back sides are provided with electrostatic prevention ITO layer 7 and silicon dioxide layer of protection 8 successively.
The touch control part manufacturing process of above-mentioned capacitive touch screen is following:
A, employing vacuum magnetic-control sputtering method are coated with the ITO film;
B, make ITO figure layer 5 afterwards, make ITO figure layer 5 here and be conventional means, promptly adopt the touch control part gold-tinted photoetching technique of touch screen, the ITO film is coated with, baking, is developed at exposure, etching, and stripping technology is handled, and is made into ITO figure layer 5;
C, on ITO figure layer 5, make one deck insulation layer 4 of building bridge afterwards, making the edge layer 4 of building bridge here also is conventional means, promptly adopts the touch control part gold-tinted photoetching technique of touch screen; Be coated with baking, exposure, development successively; Hard curing process is handled, and makes insulation bridge formation layer 4;
D, utilize the vacuum magnetic-control sputtering coating machine at the insulation made layer 4 outer layer of metal conductive material or the ITO material of plating of building bridge afterwards; And outside above-mentioned metallic conduction material or ITO material, be coated with one deck black film; Use the mask plate of making jump conductor figure layer 3 in the traditional handicraft then; And utilize the touch control part gold-tinted photoetching technique of touch screen, and this layer conductive material and black film system are made required figure together, promptly process jump conductor figure layer 3 and black film figure layer 1.This gold-tinted photoetching technique comprises coating, baking, exposure, development; Etching; Only remove the stripping technology in jump conductor figure layer 3 traditional manufacturing technique, other gold-tinted photoetching technique processing steps are identical with making jump conductor figure layer 3 traditional manufacturing technique, and original two figure layer production process are united two into one; Thereby practiced thrift making step, also improved product quality.
In the steps d, when carrying out the exposure technology of gold-tinted photoetching technique, traditional exposure machine energy is controlled at 100-150 mj/ cm
2About, can cause short circuit by residual black film between the conductive material after the exposure like this; Black photoresistance and metallic conductor are residual for fear of having between the conductive material graph line; Cause the function poor short circuit; Adopt the mask plate of overexposure, the size of design configuration is proportional greater than product actual standard value 6-7um on the mask plate that promptly uses in the exposure technology, through regulating the exposure function by the extremely present 250-300mj/ cm2 of original 100-150 mj/ cm2; Preferred 300mj/ cm2; It is software defined by DNK exposure machine self to regulate the exposure energy time, and the normal light flux is 35 mj/ cm2, stops automatically after arriving the technique initialization parameter by the board software set always.Through above-mentioned process adjustments, change that design load reaches the actual standard value on the mask plate, it is residual to improve between graph line photoresistance simultaneously.
In the steps d, when carrying out the etch process of gold-tinted photoetching technique, also can have the chemical resistance problem, BM black light resistance receives strong acid and attacks and cause coming off, and the BM photoresistance regional metal that comes off uncovers outside, causes etching to cross etching, produces function NG (short short circuit).Therefore carry out all need carrying out roasting firmly operation before and after the etching at conductive material and black film, to strengthen BM adhesion, hard roasting temperature 220-240 ℃ of duration 8-10min before the etching; Hard roasting temperature 220-240 ℃ of duration 30-35min after the etching strengthens before the etching that black light hinders adhesion after the black light resistance acid resistance and etching.
Gold-tinted photoetching technique described in the instructions, except that the partial parameters technology change of instructions explanation, other are touch-screen photoetching technique conventional in the TP industry.
Combine accompanying drawing that the utility model has been carried out exemplary description above; Obviously the concrete realization of the utility model does not receive the restriction of aforesaid way; As long as adopted the method design of the utility model and the improvement of the various unsubstantialities that technical scheme is carried out; Or the design of the utility model and technical scheme are directly applied to other occasion without improving, all within the protection domain of the utility model.
Claims (3)
1. capacitive touch screen; Comprise substrate; The ITO that is arranged on the substrate schemes layer, is covered in ITO figure layer of outer insulation bridge formation layer, and is covered in the jump conductor figure layer above the insulation bridge formation layer; It is characterized in that described jump conductor figure layer top is coated with the black film figure layer that is used to block the dazzle of metal jump conductor figure layer.
2. based on the described capacitive touch screen of claim 1, it is characterized in that: build bridge layer, jump conductor figure layer of described ITO figure layer, insulation is identical and overlapped with the patterning of black film figure layer.
3. capacitive touch screen according to claim 1 and 2 is characterized in that: covering resin protective seam on the described black film figure layer, described substrate back is provided with electrostatic prevention ITO layer and silicon dioxide layer of protection successively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201220238849 CN202615367U (en) | 2012-05-25 | 2012-05-25 | Capacitance touch panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201220238849 CN202615367U (en) | 2012-05-25 | 2012-05-25 | Capacitance touch panel |
Publications (1)
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CN202615367U true CN202615367U (en) | 2012-12-19 |
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CN 201220238849 Expired - Lifetime CN202615367U (en) | 2012-05-25 | 2012-05-25 | Capacitance touch panel |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102693056A (en) * | 2012-05-25 | 2012-09-26 | 芜湖长信科技股份有限公司 | Capacitive touch screen and process for manufacturing same |
CN108595061A (en) * | 2018-04-27 | 2018-09-28 | 深圳秋田微电子股份有限公司 | The production method and capacitance plate functional sheet of capacitance plate functional sheet |
-
2012
- 2012-05-25 CN CN 201220238849 patent/CN202615367U/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102693056A (en) * | 2012-05-25 | 2012-09-26 | 芜湖长信科技股份有限公司 | Capacitive touch screen and process for manufacturing same |
CN108595061A (en) * | 2018-04-27 | 2018-09-28 | 深圳秋田微电子股份有限公司 | The production method and capacitance plate functional sheet of capacitance plate functional sheet |
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Legal Events
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20121219 |