CN102692826A - Device and method for performing alignment by automatically adopting optimal image - Google Patents
Device and method for performing alignment by automatically adopting optimal image Download PDFInfo
- Publication number
- CN102692826A CN102692826A CN2011100680177A CN201110068017A CN102692826A CN 102692826 A CN102692826 A CN 102692826A CN 2011100680177 A CN2011100680177 A CN 2011100680177A CN 201110068017 A CN201110068017 A CN 201110068017A CN 102692826 A CN102692826 A CN 102692826A
- Authority
- CN
- China
- Prior art keywords
- camera lens
- alignment
- adjusting gear
- aim
- aligning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a device for performing alignment by automatically adopting an optimal image, comprising: a light source used for providing alignment beams; at least one alignment lens used for projecting the alignment beams to a marker; a photographic device used for converting marked light signals into to-be-processed electrical signals; and an image processing unit used for judging marked imaging quality and controlling adjustment movement of the device; the device also comprises a regulating device used for regulating the working distance of the alignment lens. The invention also discloses a method for performing alignment by automatically adopting an optimal image.
Description
Technical field
The present invention relates to a kind of integrated circuit manufacturing equipment field, relate in particular to the employed device and method that is used to aim in a kind of lithographic equipment.
Background technology
Lithographic equipment is a kind of equipment that integrated circuit is made that is applied to, and utilizes this equipment to include but not limited to: integrated circuit is made lithographic equipment, liquid crystal panel lithographic equipment, photomask marking press equipment, MEMS (microelectromechanical systems)/MOMS (low-light machine system) lithographic equipment, advanced encapsulation lithographic equipment, printed circuit board (PCB) lithographic equipment and printed circuit board (PCB) processing unit (plant) etc.
Utilize lithographic equipment to realize in the process of exposure; Mask must be aimed at the position of exposure object (for example silicon chip, printed circuit board (PCB) etc.); Usually the mask top all disposes certain position alignment device with the exposure object top, is used to set up accurate relative position relation between mask and the exposure object.
Along with the raising of the integrated level of chip, also increasingly high to the accuracy requirement of position alignment device.Correspondingly, the resolution of aiming at camera lens is high more, and the NA (Numerical Aperture numerical aperture) that then aims at camera lens is big more, and the depth of field is more little.And the position alignment device that is used for lithographic equipment is at present fixed with respect to the vertical position of mask and exposure object, can not adapt to new for alignment request.
Existing alignment systems can be divided into coaxial alignment system and off-axis alignment system.In the coaxial alignment system, because the distance between mask and the exposure object is bigger, when both distances that caused by temperature variation changed, coaxillay aligned camera lens can't be simultaneously to mask mark and the clear simultaneously imaging of exposure object mark.In off-axis alignment, because existing, silicon chip surface rises and falls, behind silicon chip focusing, the work between mark and the camera lens causes the mark image quality to descend apart from changing.Like disclosed technical scheme among the Chinese patent 200610025447.X, 200610023154.8 etc., the camera lens operating distance is fixed.When external cause caused camera lens work apart from variation, the lens imaging quality reduced, and influences alignment precision.
Summary of the invention
The objective of the invention is to solve existing defective in the above-mentioned prior art; A kind of device and method that utilizes optimized image to aim at automatically is provided; This device and method can change the work distance of camera lens; Make camera lens can access best image, utilize the optimized image that obtains to aim at then.
For reaching the foregoing invention purpose, technical scheme provided by the invention is following:
A kind of device that utilizes optimized image to aim at automatically comprises: alignment light source is used to provide alignment; At least one aims at camera lens, is used for said alignment is projected to mark; Camera, the light signal that is used to receive mark is converted into pending electric signal; Graphics processing unit is in order to the image quality of judge mark and control adjusting gear and move; This device also comprises an adjusting gear, and said adjusting gear is in order to adjust the operating distance of said aligning camera lens.
Further, this adjusting gear through drive said aligning camera lens along Z to moving, to change the operating distance of said aligning camera lens.
Further, this adjusting gear is a straight line motor.
Further, this adjusting gear is through changing the light path of said alignment, to change the operating distance of said aligning camera lens.Further, this adjusting gear comprises two optical wedge element.
Further, this camera head is a ccd video camera.
Further, this aligning camera lens comprises coaxial alignment camera lens and off-axis alignment camera lens.
The present invention also discloses a kind of method of utilizing optimized image to aim at automatically simultaneously, comprising:
Step 2, obtain the second picture quality IQ2 after utilizing an adjustment unit change to aim at the camera lens operating distance;
Step 3, judge the quality of said first, second picture quality, and aim at the camera lens operating distance with identical or opposite direction adjustment according to judged result;
Step 4, repeating step one to three are until obtaining optimum picture quality IQ (n-1);
Further, adjusting gear described in this step 2 through drive said aligning camera lens along Z to moving, to change the operating distance of said aligning camera lens.
Further, adjusting gear described in this step 2 is through changing the light path of said alignment, to change the operating distance of said aligning camera lens.
Further, this optimum picture quality satisfies IQ (n-2)＜IQ (n-1) and IQ (n-1)＞IQn, and wherein n is the natural number more than or equal to 4.
Compared with prior art, alignment device provided by the present invention and alignment methods can effectively change the work distance of aiming at camera lens, make camera lens can access best image, utilize the optimized image that obtains to aim at then.
Description of drawings
Can further be understood through following detailed Description Of The Invention and appended diagram about advantage of the present invention and spirit.
Fig. 1 is the structural representation of the first embodiment of the present invention;
Fig. 2 is the structural representation of the second embodiment of the present invention;
Fig. 3 is the structural representation of the adjusting gear of the second embodiment of the present invention;
Fig. 4 is a silicon chip surface fluctuating synoptic diagram;
Fig. 5 is the process flow diagram of alignment methods involved in the present invention.
[primary clustering symbol description]
1-coaxial alignment camera lens 2-off-axis alignment camera lens 3-camera 4-graphics processing unit
5-adjusting gear 10-mask plate 101,102-mask alignment mark 8-mask plummer
14-projection lens 11-silicon chip 111,112-silicon chip alignment mark 9-silicon wafer bearing table
12-complete machine framework 100-wafer-supporting platform reference mark
Embodiment
Specify specific embodiment of the present invention below in conjunction with accompanying drawing.
Inventive concept of the present invention is to comprise an adjusting gear and graphics processing unit, utilizes this graphics processing unit that the marking image that collects is handled, and whether is in optimum condition with the quality of judge mark image.If the quality of marking image is not in optimum condition (can influence alignment precision this moment), graphics processing unit sends instruction, drives adjusting gear.This adjusting gear can change the work distance of camera lens, makes camera lens can obtain best image, utilizes the optimized image that obtains to aim at then.
The structural representation of first kind of embodiment of the present invention is as shown in Figure 1.This alignment device comprises light source, is used for providing the light beam that illuminates target label (figure does not look out).Aim at camera lens and comprise coaxial alignment camera lens 1 and off-axis alignment camera lens 2.Light beam process coaxial alignment camera lens 1 and 2 exposure label(l)ings of off-axis alignment camera lens that light source provided, and mark is imaged on the target surface of camera 3.Camera 3 is used for being converted into pending electric signal to the light signal of mark, selects for use the CCD camera lens to do with explanation in the present embodiment.Graphics processing unit 4 is used to handle 3 signals converted of camera, with the image quality of judge mark, can also send instruction simultaneously, drives adjusting gear and has an effect.Adjusting gear 5 receives the instruction of graphics processing unit, whole adjustment aim at camera lens Z to the position.In the first embodiment of the present invention, adopted of the explanation of the mode of mechanical motion as the embodiment of adjusting gear 5.
Other module all belongs to the ingredient in the lithographic equipment among Fig. 1.Be used to provide a figure like mask plate 10, this figure is through being projected to the surface of silicon chip 11 behind the projection lens 14.Wherein, comprise mask alignment mark 101,102 on this mask plate 10, and the motion of a plurality of degree of freedom directions is provided by mask plummer 8.Comprise silicon chip alignment mark 111,112 on the surface of silicon chip 11, and the motion of a plurality of degree of freedom directions is provided by silicon wafer bearing table 9.Mask alignment mark 101,102, silicon chip alignment mark 111,112 and wafer-supporting platform reference mark 100 are set up mutual alignment coordinate relation between any two, and finally confirm three's mutual alignment coordinate.Complete machine framework 12 provides whole support and framework for lithographic equipment.Above module and parts have finally constituted complete lithographic equipment with alignment device.
In Fig. 1, aligning camera lens 1,2 and adjusting gear 5 are fixing, and are installed on the complete machine framework 12 through this adjusting gear 5.In Fig. 1, schematically provided the optics element of aiming at camera lens 1,2.This adjusting gear 5 be used to support and change aim at camera lens 1,2 along Z to displacement.Linear electric motors etc. can realize that the device of displacement all can be used as adjusting gear 5.
Mask plate 10 is fixed on the complete machine framework 12 through mask plummer 9, and silicon chip 11 is fixed on the complete machine framework 12 through silicon wafer bearing table 9.Aim at camera lens 1 or 2, mask plate 10, silicon chip 11 threes at Z to certain position relation is arranged.Aim at camera lens 1 or 2 and camera 3 (CCD) is installed at the back, be converted into electric signal to the picture of mark, graphics processing unit is handled the electric signal after transforming, and whether the quality of judge mark image is in optimum condition then.As shown in Figure 4; When plane, alignment mark place overlaps with the best focal plane of aligning camera lens; The quality of marking image is in optimum condition, and when plane, alignment mark place did not overlap with the best focal plane of aligning camera lens, the quality of marking image just can not be in optimum condition.The step whether quality of judge mark image is in optimum condition is following: graphics processing unit is found the solution the quality IQ1 (image quality 1) of marking image; Graphics processing unit sends instruction then, let adjusting gear with the step-length of setting drive camera lens along Z to moving (Z forward or negative sense all can).After accomplishing a step-length, find the solution the quality IQ2 (image quality 2) of marking image once more, compare twice result, if IQ2＞IQ1, equidirectional driving camera motion; If IQ2＜IQ1, then reverse direction drives camera motion, and wherein IQ2＞IQ1 shows that the picture quality of picture quality is superior to the picture quality of picture quality for the second time for the first time; IQ2＜IQ1, then picture quality is superior to picture quality for the first time for the second time.Until IQ (n-2)＜IQ (n-1) and IQ (n-1)＞IQn, promptly obtain optimum picture quality IQ (n-1) after, get into the alignment work flow process.
The present invention provides second kind of embodiment simultaneously, as shown in Figure 2.Same, the alignment device in second kind of embodiment comprises that aiming at camera lens contains coaxial alignment camera lens 1 and off-axis alignment camera lens 2; Camera 3 is used for changing into the signal of being convenient to handle to the picture of mark; Graphics processing unit 4 is used to handle the signal after camera transforms, and with the image quality of judge mark, can also send instruction simultaneously, drives adjusting gear and has an effect and adjusting gear 5.In second embodiment, adjusting gear 5 adopts the purpose of optical element adjustment camera lens operating distance.As showing among Fig. 3, Fig. 3 is the structural representation of the adjusting gear of second embodiment.This adjusting gear 5 is a pair of wedge devices, comprises two optical wedge element 501 and 502.After the instruction that receives graphics processing unit 4, one of them optical wedge element moves, or two optical wedge element move in the opposite direction simultaneously.Through the registration of change optical wedge element, thereby change light path, reach the purpose of adjustment camera lens work distance through the alignment behind the aligning camera lens 1 or 2.
Mask plate 10 is fixed on the complete machine framework 12 through mask plummer 9, and silicon chip 11 is fixed on the complete machine framework 12 through silicon wafer bearing table 9.Aim at camera lens 1 or 2, mask plate 10, silicon chip 11 threes at Z to certain position relation is arranged.Aim at camera lens 1 or 2 and camera 3 (CCD) is installed at the back, be converted into electric signal to the picture of mark, graphics processing unit is handled the electric signal after transforming, and whether the quality of judge mark image is in optimum condition then.As shown in Figure 4; When plane, alignment mark place overlaps with the best focal plane of aligning camera lens; The quality of marking image is in optimum condition, and when plane, alignment mark place did not overlap with the best focal plane of aligning camera lens, the quality of marking image just can not be in optimum condition.The step whether quality of judge mark image is in optimum condition is following: graphics processing unit is found the solution the quality IQ1 (image quality 1) of marking image; Graphics processing unit sends instruction then, let adjusting gear with the step-length of setting drive camera lens along Z to moving (Z forward or negative sense all can).After accomplishing a step-length, find the solution the quality IQ2 (image quality 2) of marking image once more, compare twice result, if IQ2＞IQ1, equidirectional driving camera motion; If IQ2＜IQ1, then reverse direction drives camera motion, and wherein IQ2＞IQ1 shows that the picture quality of picture quality is superior to the picture quality of picture quality for the second time for the first time; IQ2＜IQ1, then picture quality is superior to picture quality for the first time for the second time.Until IQ (n-2)＜IQ (n-1) and IQ (n-1)＞IQn, promptly obtain optimum picture quality IQ (n-1) after, get into the alignment work flow process.
The present invention provides a kind of method of utilizing optimized image to aim at automatically simultaneously.As shown in Figure 5, be that the optimized image of this method is found the solution process flow diagram among Fig. 5.
Step 501-obtains IQ1.CCD gathers the image of alignment mark this moment, and converts this image information into electric signal, obtains IQ1.
Step 502-obtains IQ2.Adjusting gear setting in motion CCD behind the next position continues images acquired and obtains IQ2 then.
Whether step 503-judges IQ1 greater than IQ2, if " being " then gets into step 506, if " denying " then gets into step 504.
Step 504-obtains IQ3.Adjusting gear by the direction opposite action with step 502 after, the CCD images acquired and handle image after obtain IQ3.Obtain to get into step 505 behind the IQ3.
Whether step 505-judges IQ3 greater than IQ1, if " being " then gets into step 506, if " denying " then gets into step 508.
Step 506-obtains IQn.Adjusting gear by the method identical action with step 502 after, the CCD images acquired and handle image after obtain IQn, wherein n is the natural number more than or equal to 4.Obtain to get into step 507 behind the IQn.
Whether step 507-judges IQn greater than IQn-1, if " denying " then gets into step 508.
Step 508-gets into and aims at flow process.
Step 509-judges to aim at whether accomplish, if " being " then gets into step 501 again; If " denying " then returned step 508.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to explain technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within scope of the present invention under this invention's idea through the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (11)
1. device that utilizes optimized image to aim at automatically comprises:
Light source is used to provide alignment;
At least one aims at camera lens, is used for said alignment is projected to mark;
Camera, the light signal that is used to receive mark is converted into pending electric signal;
Graphics processing unit is in order to the image quality of judge mark and control adjusting gear and move;
It is characterized in that said device also comprises an adjusting gear, said adjusting gear is in order to adjust the operating distance of said aligning camera lens.
2. device as claimed in claim 1 is characterized in that, said adjusting gear through drive said aligning camera lens along Z to moving, to change the operating distance of said aligning camera lens.
3. device as claimed in claim 2 is characterized in that, said adjusting gear is a straight line motor.
4. device as claimed in claim 1 is characterized in that, said adjusting gear is through changing the light path of said alignment, to change the operating distance of said aligning camera lens.
5. device as claimed in claim 4 is characterized in that, said adjusting gear comprises two optical wedge element.
6. device as claimed in claim 1 is characterized in that said camera head is a ccd video camera.
7. device as claimed in claim 1 is characterized in that, said aligning camera lens comprises coaxial alignment camera lens and off-axis alignment camera lens.
8. method of utilizing optimized image to aim at automatically comprises:
Step 1, gather marking image and obtain picture quality IQ1 for the first time through a graphics processing unit;
Step 2, obtain the second picture quality IQ2 after utilizing an adjustment unit change to aim at the camera lens operating distance;
Step 3, judge the quality of said first, second picture quality, and aim at the camera lens operating distance with identical or opposite direction adjustment according to judged result;
Step 4, repeating step one to three are until obtaining optimum picture quality IQ (n-1);
Step 5, utilize said optimum picture quality IQ (n-1) to aim at.
9. alignment methods as claimed in claim 8 is characterized in that, adjusting gear described in the said step 2 through drive said aligning camera lens along Z to moving, to change the operating distance of said aligning camera lens.
10. alignment methods as claimed in claim 8 is characterized in that, adjusting gear described in the said step 2 is through changing the light path of said alignment, to change the operating distance of said aligning camera lens.
11. alignment methods as claimed in claim 8 is characterized in that, said optimum picture quality satisfies IQ (n-2)＜IQ (n-1) and IQ (n-1)＞IQn, and wherein n is the natural number more than or equal to 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110068017.7A CN102692826B (en) | 2011-03-21 | 2011-03-21 | A kind of optimized image that automatically utilizes carries out the device and method aimed at |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110068017.7A CN102692826B (en) | 2011-03-21 | 2011-03-21 | A kind of optimized image that automatically utilizes carries out the device and method aimed at |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102692826A true CN102692826A (en) | 2012-09-26 |
| CN102692826B CN102692826B (en) | 2015-08-26 |
Family
ID=46858383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110068017.7A Active CN102692826B (en) | 2011-03-21 | 2011-03-21 | A kind of optimized image that automatically utilizes carries out the device and method aimed at |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102692826B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108573907A (en) * | 2017-03-13 | 2018-09-25 | 台湾积体电路制造股份有限公司 | Workpiece bonding device, workpiece alignment method and Workpiece carrier device |
| CN109425997A (en) * | 2017-09-05 | 2019-03-05 | 奇景光电股份有限公司 | Projection lens assembles equipment |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07219212A (en) * | 1994-02-01 | 1995-08-18 | Orc Mfg Co Ltd | Deflection correcting device for photomask and its method |
| JP2002036373A (en) * | 2000-07-25 | 2002-02-05 | Sanyo Electric Co Ltd | Stereo lithographic apparatus |
| CN2763851Y (en) * | 2004-12-09 | 2006-03-08 | 鸿富锦精密工业（深圳）有限公司 | Focusing mechanism |
| CN101329515A (en) * | 2008-07-29 | 2008-12-24 | 上海微电子装备有限公司 | Device and method for measuring and checking step photoetching machine aligning system |
| CN101726829A (en) * | 2009-12-23 | 2010-06-09 | 重庆大学 | Method for automatically focusing zoom lens |
-
2011
- 2011-03-21 CN CN201110068017.7A patent/CN102692826B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07219212A (en) * | 1994-02-01 | 1995-08-18 | Orc Mfg Co Ltd | Deflection correcting device for photomask and its method |
| JP2002036373A (en) * | 2000-07-25 | 2002-02-05 | Sanyo Electric Co Ltd | Stereo lithographic apparatus |
| CN2763851Y (en) * | 2004-12-09 | 2006-03-08 | 鸿富锦精密工业（深圳）有限公司 | Focusing mechanism |
| CN101329515A (en) * | 2008-07-29 | 2008-12-24 | 上海微电子装备有限公司 | Device and method for measuring and checking step photoetching machine aligning system |
| CN101726829A (en) * | 2009-12-23 | 2010-06-09 | 重庆大学 | Method for automatically focusing zoom lens |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108573907A (en) * | 2017-03-13 | 2018-09-25 | 台湾积体电路制造股份有限公司 | Workpiece bonding device, workpiece alignment method and Workpiece carrier device |
| CN108573907B (en) * | 2017-03-13 | 2021-01-22 | 台湾积体电路制造股份有限公司 | Workpiece joining device, workpiece aligning method, and workpiece carrying device |
| CN109425997A (en) * | 2017-09-05 | 2019-03-05 | 奇景光电股份有限公司 | Projection lens assembles equipment |
| CN109425997B (en) * | 2017-09-05 | 2021-01-26 | 奇景光电股份有限公司 | Projection lens assembling equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102692826B (en) | 2015-08-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10563977B2 (en) | Three-dimensional measuring device | |
| US9964717B2 (en) | Device and method for aligning and bonding lens array and PD array with high precision | |
| US9374936B2 (en) | Workpiece mounting apparatus | |
| CN101807012B (en) | Automatic focus light path structure of direct-write lithography machine | |
| CN113093487B (en) | Mask alignment system, mask alignment method and lithographic apparatus | |
| CN102681359B (en) | Method for measuring time delay by synchronous signal trigger sweep | |
| CN101266409A (en) | Laser machining apparatus | |
| CN105593396A (en) | Alignment method and alignment device | |
| CN103676976A (en) | Correction method for three-dimensional worktable repositioning error | |
| CN102538823A (en) | System for detecting matching error of TDICCD (Time Delay and Integration Charge Coupled Device) focal plane different-speed imaging | |
| CN111735768B (en) | Micro imaging method and device for Micro LED screen | |
| CN113126449B (en) | Laser direct-writing photoetching system and method for green oil photoetching | |
| JP6643328B2 (en) | Optical system for producing lithographic structures | |
| CN102314097A (en) | Method of calibrating spatial position between spatial light modulator center and camera center | |
| KR102043501B1 (en) | Pattern exposure device, exposure head, and pattern exposure method | |
| CN107664833B (en) | Machine vision system for aligning substrate and aligning device | |
| CN102692826A (en) | Device and method for performing alignment by automatically adopting optimal image | |
| CN102445861A (en) | Photoetching machine system with position triggered scanning mode and method thereof | |
| CN114578655B (en) | Edge exposure device, method and photoetching equipment | |
| CN101551597B (en) | Self-imaging double-sided overlay alignment method | |
| CN102566335A (en) | Template image acquisition method | |
| CN103558740A (en) | Double-surface stepping photo-etching method for micro electro mechanical system (MEMS) wafer | |
| CN100578369C (en) | Automatic position aligning device and method for projection exposure device | |
| JP2007225431A (en) | Visual inspection device | |
| CN111669509A (en) | Automatic focusing device and automatic focusing method for changing image space optical path |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
|
| CP01 | Change in the name or title of a patent holder |