CN102662539A - Manufacturing method of projection-type capacitive touch-screen sensor, touch-screen sensor and touch screen - Google Patents
Manufacturing method of projection-type capacitive touch-screen sensor, touch-screen sensor and touch screen Download PDFInfo
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- CN102662539A CN102662539A CN2012100782546A CN201210078254A CN102662539A CN 102662539 A CN102662539 A CN 102662539A CN 2012100782546 A CN2012100782546 A CN 2012100782546A CN 201210078254 A CN201210078254 A CN 201210078254A CN 102662539 A CN102662539 A CN 102662539A
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- 239000010410 layer Substances 0.000 description 42
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Abstract
The invention relates to a manufacturing method of a touch-screen sensor. The touch-screen sensor comprises a conducting film and conducting glass. The manufacturing method of the touch-screen sensor comprises the steps of hardening one side of the ITO (indium tin oxide) and protecting the other side of the ITO by pasting films before etching. The production process of the touch-screen sensor is simplified, and the resolution and the accuracy of box sleeving are improved, thereby achieving the purposes of reducing cost and improving quality.
Description
Technical field
The present invention relates to manufacturing approach and the thus obtained projection-type capacitive touch screen sensor of projection-type capacitive touch screen sensor and the touch-screen that uses this projection-type capacitive touch screen sensor.
Background technology
Projection-type capacitive touch screen mainly relies on two-layer ITO film (driving ITO layer, induction ITO layer) to realize function, drives the ITO layer and can plate the two sides that is engraved in same block of glass with induction ITO layer, also can plate respectively be engraved in two on glass.See from textural; Drive the ITO layer and be arranged in the X-Y coordinates matrix with the complementation of induction ITO layer; Control IC is driving on the ITO layer release pulses signal line by line; Confirm position of touch by the capacitance variations of row monitorings induction ITO layer simultaneously, four electrodes are arranged, stable electric field of the common formation of conductive layer of they and screen surface four jiaos of projection-type capacitive touch screens.When the user touched capacitance plate with hand, because people's bulk electric field, it was just pointed and workplace forms a coupling capacitance; Because be connected to high-frequency signal on the workplace; One little electric current is released through the finger contact, and this electric current flows out the electrode from four angles of screen respectively, and proportional to four jiaos distance through the electric current and the finger of four electrodes; Controller calculates through the precision to four current ratios, draws the position.Can reach 99% degree of accuracy, possess response speed less than 3ms.This pattern arrangement mode of projected capacitive screen and rank scanning mechanism are fundamentally supported the realization of multi-point touch just.
Projection-type capacitive touch screen CTP (Capacity Touch Panel) utilizes the induction by current of human body to carry out work.Projection-type capacitive touch screen is a two-layer compound glass screen; The inside surface of glass screen and interlayer respectively are coated with one deck ITO (nano indium tin metal oxide); Outermost layer is the silicon soil glassivation that has only 0.0015mm thick; Interlayer ITO coating is made workplace, and four electrodes are drawn at four angles, and internal layer ITO is for shielding layer to guarantee working environment.
Projection-type capacitive touch screen mainly contains self-capacitance screen and two kinds of mutual capacitance screens, is example with now more common mutual capacitance screen, innerly is made up of drive electrode and receiving electrode, and drive electrode sends the low-voltage high-frequency signal and projects receiving electrode and form stable electric current.
Projection-type capacitive touch screen will be realized multi-point touch; What lean on is exactly the electrode that increases mutual capacitance, briefly, is exactly with screen block; One group of mutual capacitance module is set in each zone all to work alone; So projection-type capacitive touch screen just can independent detection arrive each regional touch-control situation, after handling, realizes multi-point touch simply.
Traditional projection-type capacitive touch screen; Its core component sensor mainly is to accomplish the making of two-sided ito glass figure and the protection of reverse side ITO layer through the mode of silk-screen; Use this kind production method cause sensor make in technological process complicated, efficient is low, cost is too high, the graphic making resolution is big.
Fig. 1 shows the technological process of traditional film coated type capacitance touch screen.
Fig. 2 shows the capacitance touch screen technological process of adopting ink silk screen printing.
(title: a kind of electric capacity touch screen double-face electrode method for making) disclose a kind of electric capacity touch screen double-face electrode method for making, comprising the following step: 1, positive ITO layer is coated photoresist, exposure, development and curing to Chinese patent CN201110331335.8; 2, reverse side ITO layer silk-screen peelable glue, baking and curing protection reverse side ITO; 3, the positive ITO of etching, stripping photoresist and peelable glue; 4, reverse side ITO layer is coated photoresist, exposure, development and curing; 5, positive ITO layer silk-screen peelable glue, baking and curing are protected positive ITO; 6, etching reverse side ITO forms ITO pattern or circuit, stripping photoresist and peelable glue, plates MOALMO by plated film line reverse side; 7 reverse side MOALMO layers are coated photoresist, exposure, development formation pattern; 8 etching reverse side MOALMO form MOALMO pattern or circuit, peel off the reverse side photoresist.This beneficial effect of the invention is: replace photoresist with peelable glue in step (2), (3); Just can be available expensive gold-tinted line and produce other operations or product with screen printer silk-screen peelable glue; Reasonably utilize equipment, improved production capacity, reduced cost.
(people such as Wen Wei, 2008,30 (6) have introduced the wet etching method of the basic indium tin oxide of a kind of lead lanthanum zirconate titanate (PLZT) (ITO) film to document " research of ITO/PLZT film wet etching ".ITO is carried out the etching test of different temperatures with V (HCI): V (HNO3): V (H2O)=mixed solution of 50: 3: 50.Show through scanning electron microscope (SEM) and X-gamma ray spectrometer (EDS) analysis.At 35 ℃ of ITO figures that obtain the good and surperficial noresidue of pattern edge quality through the 30nm/min etching energy; The PLZT film of etching under equal conditions, etch rate shows that not as good as 2% of ITO this lithographic method has good selectivity.
Chinese patent CN200610061913.X (a kind of formation method of ITO pattern) provides a kind of formation method of ITO pattern, and may further comprise the steps: A1. is coated with the photonasty photoresist on substrate; B1. through exposure, development the photonasty photoresist on the part of desire formation ITO pattern on the substrate is removed; C1. on this substrate, plate the ITO film; D1. this substrate is carried out demoulding and handle, remaining photonasty photoresist and the ITO rete that adheres to are above that removed, obtain the substrate of required ITO pattern.The present invention does not need the etch step of ITO rete, thereby has significantly reduced production cost, and the phenomenon of having avoided figure short circuit to occur, open circuit has improved the quality of product, has avoided harsh liquid to corrosion on Equipment and its danger that causes.
Summary of the invention
An object of the present invention is to provide the manufacturing approach of projection-type capacitive touch screen sensor, this method comprises:
(A) prepare the step of two-sided ITO (tin indium oxide) glass;
(B) A face cleaning step: two-sided ito glass from the cleaning machine input, is used after ultrasonic tank is carried out sonicated with environment-friendly cleaning agent to its surface that hairbrush is scrubbed its surface, rinses out the back with the pure water clean-out system that glass surface is residual after the degreasing and use air knife that the water of glass surface is dried up;
(C) A face design producing step comprises: gluing: after the A face cleans and accomplishes, and PR glue on its surfaces coated (photoresists are for example gone up the AZ-210 that Hai'an intelligence company produces); Preliminary drying: the glass that will be coated with PR glue is dried, and makes glue face and the adhesion of A face (temperature: for example 80-140 ℃, time: 40-250 second); Exposure: be coated with the patterned illumination of grinding tool through ultraviolet light on the A face of PR glue (ultraviolet range 365nm, time shutter scope 3-10 second); Develop: prepare a certain proportion of alkali lye (NaOH, 0.1-0.14mol/L) pattern displaying is come out on the A face after will making public; Post bake: use hot setting (120～180 ℃, time range: 40-200 second) to make PR glue and the adhesion of A face more firm; B face protection: use polymeric membrane (PET (polyethylene terephthalate) for example, thickness 0.1-0.5mm) is protected the another side of ITO (being the B face); Etching: utilize the alkaline-resisting acid nonfast principle of ito glass; The acid solution of using preparation is according to certain ratio (nitric acid for example: hydrochloric acid: water=1: 10～15: 7～13; Preferred about 1: 13: 10); Select the regular hour (40～300 second) according to the thickness of ITO, the A face is not had the ITO of photoresists protection is partially-etched to be fallen, thereby obtain required ITO figure at the A face; Striping: the diaphragm of B face is got rid of, and after soaking with highly basic through ultrasonic tank, used hairbrush to scrub, will remain in alkali lye on glass with pure water again and rinse out, thereby obtain needed ITO electrode pattern at the A face after air knife dries up glass;
(D) B face cleaning step;
(E) B face design producing step: the correlative of method for making and use thereof and equipment are identical with A face design producing.Its step comprises: gluing: after the B face cleans and accomplishes, and PR glue on its surfaces coated (photoresists, supplier: the AZ-210 that An Zhi company produces); Preliminary drying: the glass that will be coated with PR glue is dried, and makes glue face and the adhesion of B face (temperature: 80-140 ℃, the time: 40-250 second); Exposure: be coated with the patterned illumination of grinding tool through ultraviolet light on the B face of PR glue (for example ultraviolet range 365nm, time shutter scope 3-10 second); Develop: prepare on the B face after a certain proportion of alkali lye (for example NaOH, 0.1-0.14mol/L)) will make public pattern displaying and come out; Post bake: use hot setting (120～180 ℃) to make PR glue and the adhesion of B face more firm; A face protection: use polymeric membrane (PET (polyethylene terephthalate), thickness 0.1-0.5mm) to protect the another side of ITO (being the A face); Etching: utilize the alkaline-resisting acid nonfast principle of ito glass; The acid solution of using preparation is according to certain ratio (nitric acid for example: hydrochloric acid: water=1: 10～15: 7～13; Preferred about 1: 13: 10) select the regular hour (40～300 second) the B face not to be had the ITO of photoresists protection is partially-etched to be fallen according to the thickness of ITO, thus obtain required ITO figure at the B face; Striping: after the diaphragm of A face got rid of, and soak the back through ultrasonic tank with highly basic and use hairbrush to scrub, will remain in alkali lye on glass with pure water again and rinse out, thereby obtain needed ITO electrode pattern at the B face after air knife dries up glass;
(F) the pattern detection step of choosing wantonly: for example CCD, short circuit tester etc. carry out the associated electrical property testing to pattern to use checkout equipment;
(G) electrode making step: use serigraphy or laser to accomplish the making of electrode all around, silk-screen is made the cover box and resolution is had relatively high expectations;
(H) cutting step: the big sheet glass that will complete cuts into granule;
(I) disconnected grain step: the big sheet glass of well cutting fragments into granule glass through the external force effect;
(J) step of membrane sticking: the glass to fragmenting into granule sticks diaphragm on its two sides, obtains sensor.
The present invention also provides the touch panel sensor that is obtained by above-mentioned manufacturing approach.
Second aspect of the present invention provides a kind of manufacturing approach of touch-screen, comprising:
(K) FPC (FPC) is fitted: flexible printed circuit board is carried out hot pressing with the above-mentioned sensor that completes be connected;
(L) cover plate (Cover Lens) applying step: sensor and cover plate are fitted;
(M) module assembling: projection-type capacitive touch screen that will complete and FPC (FPC) assemble and accomplish to drive and test.
The present invention further provides the touch-screen by the manufacturing approach acquisition of above-mentioned touch-screen.
The invention effect
1. the design producing precision is high: use the normal precision of printing ink to manufacture projecting type capacitor formula touch panel sensor part figure (receiving the restriction of silk screen printing process and ink product) more than 30 microns; Thereby complex procedures causes production capacity low; Yield control difficulty is bigger; Yield about 70%, causes benefit low basically.It is complicated to use plated film to make his technological process of projecting type capacitor formula touch panel sensor part figure, and nearly more than 40 operation could be accomplished, and the production capacity benefit is lower, and investment of production equipment is huge at present about about 5,000 ten thousand.Employing the present invention technology; Photoresists can reach 10 microns because of resolution, thus can be with the precision improvement to 10 of product micron, and the high yield of the simple efficient of flow process also can be effectively controlled; Thereby can promote the precision and the resolution of product, can promote very big innovative space for the industry.
2. flow process is oversimplified: use imaging process of the present invention to adopt the mode processing procedure of gluing; Can reduce tradition adopts ink for screen printing making sensor pattern 5 procedures, tradition to adopt plated film to make sensor pattern 12 procedures; The average daily production capacity of the present invention's technology is 6000 slices/day, and product can in time satisfy the demand in market.
3. production cost reduces: use printing ink to manufacture projecting type capacitor screen sensor pattern part, be subject to material cost about: about the 120RMB/ sheet.Plated film make its integrated cost about: about the 180RMB/ sheet.And use fabrication techniques projecting type capacitor screen sensor pattern part of the present invention because of reducing flow process, personnel, its integrated cost of equipment event significantly about the 90RMB/ sheet; Be about 75% of traditional printing ink to manufacture; 50% of plated film making; And human cost all can reduce by 50%, on market, has very big competitive power.
4. cost of investment is low: traditional printing ink to manufacture key equipment investment is about 2,300 ten thousand, and the investment of plated film key equipment is about 6,000 ten thousand, and technological process entire equipment of the present invention investment all is lower than the equipment investment of traditional fabrication about 2,000 ten thousand.
Description of drawings
Shown in Figure 1 is traditional film coated type capacitance touch screen process chart.
Shown in Figure 2 for adopting the capacitance touch screen process chart of ink silk screen printing.
Two-sided ito glass (two-sided ito glass substrate preparation process) for cleaning up shown in Figure 3, wherein 1 is glass substrate, and 2 is ITO layer A face, and 3 is ITO layer B face.
Shown in Figure 4 is two-sided ito glass substrate (gluing step) behind the gluing, and wherein 1 is glass substrate, and 2 is ITO layer A face, and 3 is ITO layer B face, and 4 is photoresists.
Shown in Figure 5 is step of exposure, and wherein 1 is glass substrate, and 2 is ITO layer A face, and 3 is ITO layer B face, and 4 is photoresists.
Shown in Figure 6 is development step, and wherein 1 is glass substrate, and 2 is ITO layer A face, and 3 is ITO layer B face, and 4 ' is the graphical photoresists after developing.
Shown in Figure 7 is the post bake step, and wherein 1 is glass substrate, and 2 is ITO layer A face, and 3 is ITO layer B face, and 4 ' is the graphical photoresists after developing.
Shown in Figure 8 wherein 1 is glass substrate for diaphragm attaches step, and 2 is ITO layer A face, and 3 is ITO layer B face, and 4 ' is the graphical photoresists after developing.
Shown in Figure 9 is etching step, and wherein 1 is glass substrate, and 2 ' is ITO layer A face after the etching, and 3 is ITO layer B face, and 4 ' is the graphical photoresists after developing.
Shown in Figure 10 is the demoulding step, and wherein 1 is glass substrate, and 2 ' is ITO layer A face after the etching, and 3 is ITO layer B face.
Shown in Figure 11 is B face development step, and wherein 1 is glass substrate, and 2 ' is ITO layer A face after the etching, and 3 is ITO layer B face, and 7 ' is the graphical photoresists after developing.
The two-sided ito substrate that is behind the protection of A mask, the B facet etch shown in Figure 12, wherein 1 be glass substrate, and 2 ' is ITO layer A face after the etching, and 3 ' is ITO layer B face after the etching, and 6 is diaphragm.
Shown in Figure 13ly be the two-sided ito substrate of double-side pattern after completing, wherein 1 is glass substrate, and 2 ' is ITO layer A face after the etching, and 3 ' is ITO layer B face after the etching.
Embodiment
The present invention provides a kind of sensor production method of touch-screen.The concrete operations flow process is earlier A face (one side that makes progress) to be carried out etching, pattern-making: prepare two-sided ito glass plate (as shown in Figure 3); Then to ito glass A face scrub, degreasing; With pure water the two-sided residual clean-out system of ito glass is rinsed out again, and dry up with the water of air knife with glass surface.After clean accomplishing, coat PR glue (photoresists, the AZ-210 that last Hai'an intelligence company produces) at the A face, and dry (110 ℃, 60 seconds), make glue face and A face adhesion (as shown in Figure 4).After A face exposure (ultraviolet exposure that adopts the 365NM wavelength is 2.4-4S how long), be coated with the patterned illumination of touching tool on the A face of PR glue (as shown in Figure 5).(NaOH, the A face that 0.1-0.14mol/L) will make public demonstrates pattern (as shown in Figure 6) with alkali lye.Use high temperature (about 140 ℃ of temperature) to solidify and make PR glue and the adhesion of A face more firmly (as shown in Figure 7).Then B face (downward one side) is protected: (PET, thickness 0.2mm) protects (as shown in Figure 8) to the B face of not accomplishing etched pattern with polymeric membrane.Acid solution (nitric acid: hydrochloric acid: ratio water=1: 13: 10) with preparation; Select certain hour (40～300 seconds (as: 100 Europe glass according to the thickness of ITO; Etching period 45-55 second); The ITO that the A face is not had PR glue (photoresists) protection etches away, thereby has just obtained needed ITO electrode pattern (as shown in Figure 9) at A face (one side that makes progress).After the diaphragm of B face got rid of, and soak with highly basic through ultrasonic tank, use hairbrush to scrub, the alkali lye that will remain on the ito glass with pure water again rinses out, and glass is dried up (shown in figure 10) through air knife.
Then B face (downward one side) is carried out etching: after A face (one side that makes progress) has been accomplished etching, on production line, ito glass is turned over a face.To the B face scrub, degreasing, with pure water the two-sided residual clean-out system of ito glass is rinsed out again, and dries up with the water of air knife with glass surface.Coat PR glue (photoresists, the AZ-210 that last Hai'an intelligence company produces) at the B face, and oven dry (110 ℃, 60 seconds), make glue face and the adhesion of B face.。After the exposure of B face, be coated with the patterned illumination of touching tool on the B face of PR glue.(NaOH, the face B that 0.1-0.14mol/L) will make public demonstrates pattern (shown in Figure 11) with alkali lye.Use high temperature (for example about 130 ℃) to solidify to make PR glue and the adhesion of B face more firm.Then the A face is protected: (PET, thickness 0.2mm) protects the A face of accomplishing etched pattern with polymeric membrane.Acid solution (nitric acid: hydrochloric acid: ratio water=1: 13: 10) with preparation; Thickness according to ITO is selected regular hour (as: 100 Europe glass; Etching period 45-55 second) ITO with no PR glue (photoresists) protection on the B face etches away, thereby obtains required ITO electrode pattern (shown in figure 12) at the B face.After the diaphragm of A face got rid of, and soak with highly basic through ultrasonic tank, use hairbrush to scrub, the alkali lye that will remain on the ito glass with pure water again rinses out, and glass is dried up (shown in figure 13) through air knife.For example CCD, short circuit tester etc. carry out the associated electrical property testing to pattern to use checkout equipment.Use serigraphy or laser to accomplish the making of electrode all around, silk-screen is made the cover box and resolution is had relatively high expectations.The big sheet glass that has completed is cut into granule.The big sheet glass of well cutting is fragmented into granule glass through the external force effect.Glass to fragmenting into granule sticks diaphragm on its two sides, obtains sensor.Flexible printed circuit board is carried out hot pressing with the above-mentioned sensor that completes be connected, touch panel sensor is made and is finished.Sensor and cover plate are fitted.The driving test is assembled and accomplished to projection-type capacitive touch screen that has completed and FPC (FPC), obtain touch-screen.
Use the present invention is technological, ink for screen printing is technological and coating technique makes an experiment, and the result contrasts as follows:
Claims (4)
1. the manufacturing approach of a projection-type capacitive touch screen sensor, this method comprises:
(A) step of the two-sided ito glass of preparation;
(B) A face cleaning step;
(C) A face design producing step comprises: gluing: after the A face cleans and accomplishes, and photoresists on its surfaces coated; Preliminary drying: the glass that will be coated with photoresists is dried, and makes glue face and the adhesion of A face; Exposure: be coated with the on glass of photoresists to patterned illumination through ultraviolet light; Develop: pattern displaying is come out on the A face after the preparation depletion will make public; Post bake: use hot setting to make photoresists and the adhesion of A face more firm; The protection of B face: use polymeric membrane the another side of ITO, promptly the B face is protected; Etching: the acid solution of using preparation does not have the A face that the ITO of photoresists protection is partially-etched to be fallen, thereby obtains required ITO figure at the A face; Striping: the diaphragm of B face is removed;
(D) B face cleaning step;
(E) B face design producing step comprises: gluing: after the B face cleans and accomplishes, coat photoresists at its face of table; Preliminary drying: the glass that will be coated with photoresists is dried, and makes glue face and the adhesion of B face; Exposure: be coated with the on glass of photoresists to patterned illumination through ultraviolet light; Develop: pattern displaying is come out on the B face after the preparation depletion will make public; Post bake: use hot setting to make photoresists and the adhesion of B face more firm; The protection of A face: use polymeric membrane the another side of ITO, promptly the A face is protected; Etching: the acid solution of using preparation does not have the B face that the ITO of photoresists protection is partially-etched to be fallen, thereby obtains required ITO figure at the B face; Striping: the diaphragm of A face is removed;
(F) the pattern detection step of choosing wantonly: use checkout equipment that pattern is carried out the associated electrical property testing;
(G) electrode making step: use serigraphy or laser to accomplish the making of electrode all around;
(H) cutting step: the big sheet glass that will complete cuts into granule;
(I) disconnected grain step: the big sheet glass of well cutting fragments into granule glass through the external force effect;
(J) step of membrane sticking: the glass to fragmenting into granule sticks diaphragm on its two sides, obtains sensor;
(K) FPC applying step: flexible printed circuit board is carried out hot pressing with the above-mentioned sensor that completes be connected.
2. the manufacturing approach of a touch-screen comprises step:
(L) cover plate applying step: sensor and cover plate that claim 1 obtains are fitted;
(M) module number of assembling steps: the projection-type capacitive touch screen and the FPC that will complete are assembled.
3. the touch panel sensor that manufacturing approach according to claim 1 obtains.
4. the touch-screen that manufacturing approach according to claim 2 obtains.
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| CN201210078254.6A CN102662539B (en) | 2012-03-22 | 2012-03-22 | The manufacture method of projection-type capacitive touch screen sensor and touch panel sensor and touch-screen |
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| CN201210078254.6A CN102662539B (en) | 2012-03-22 | 2012-03-22 | The manufacture method of projection-type capacitive touch screen sensor and touch panel sensor and touch-screen |
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| CN102662539B CN102662539B (en) | 2015-08-19 |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102915165A (en) * | 2012-09-26 | 2013-02-06 | 深圳市雅视科技有限公司 | Double-side ITO (indium tin oxides) etching method of touch screen |
| CN102968239A (en) * | 2012-12-17 | 2013-03-13 | 苏州合美硕触控技术有限公司 | Capacitive bending type touch screen and manufacturing method thereof |
| CN103274609A (en) * | 2013-05-07 | 2013-09-04 | 苏州威仕科贸有限公司 | Production method of filmed glass |
| CN103425371A (en) * | 2013-07-25 | 2013-12-04 | 浙江金指科技有限公司 | Double-mask-type production process of capacitive touch screens |
| CN103474343A (en) * | 2013-09-12 | 2013-12-25 | 昆山奥德鲁自动化技术有限公司 | ITO surface micro-nano structure processing method |
| CN104007885A (en) * | 2014-05-29 | 2014-08-27 | 向火平 | Projection-type capacitive touch white board manufacturing method and projection-type capacitive touch white board |
| CN108491103A (en) * | 2018-02-28 | 2018-09-04 | 信利半导体有限公司 | A kind of production method of two-sided ITO products and two-sided ITO products |
| CN108845728A (en) * | 2018-09-10 | 2018-11-20 | 广东巨光电科技有限公司 | A kind of manufacturing process of G+G capacitance touch screen |
| CN112702848A (en) * | 2021-03-24 | 2021-04-23 | 成都市克莱微波科技有限公司 | Method for cleaning high-frequency flexible microwave printed circuit board |
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| CN102323869A (en) * | 2011-10-27 | 2012-01-18 | 东莞市润华光电有限公司 | Method for manufacturing electrodes on two surfaces of capacitance touch screen |
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| CN102323869A (en) * | 2011-10-27 | 2012-01-18 | 东莞市润华光电有限公司 | Method for manufacturing electrodes on two surfaces of capacitance touch screen |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102915165A (en) * | 2012-09-26 | 2013-02-06 | 深圳市雅视科技有限公司 | Double-side ITO (indium tin oxides) etching method of touch screen |
| CN102968239A (en) * | 2012-12-17 | 2013-03-13 | 苏州合美硕触控技术有限公司 | Capacitive bending type touch screen and manufacturing method thereof |
| CN103274609A (en) * | 2013-05-07 | 2013-09-04 | 苏州威仕科贸有限公司 | Production method of filmed glass |
| CN103425371A (en) * | 2013-07-25 | 2013-12-04 | 浙江金指科技有限公司 | Double-mask-type production process of capacitive touch screens |
| CN103425371B (en) * | 2013-07-25 | 2017-06-06 | 深圳华视光电有限公司 | A kind of double mask mode production technologies of capacitive touch screen |
| CN103474343A (en) * | 2013-09-12 | 2013-12-25 | 昆山奥德鲁自动化技术有限公司 | ITO surface micro-nano structure processing method |
| CN104007885A (en) * | 2014-05-29 | 2014-08-27 | 向火平 | Projection-type capacitive touch white board manufacturing method and projection-type capacitive touch white board |
| CN108491103A (en) * | 2018-02-28 | 2018-09-04 | 信利半导体有限公司 | A kind of production method of two-sided ITO products and two-sided ITO products |
| CN108845728A (en) * | 2018-09-10 | 2018-11-20 | 广东巨光电科技有限公司 | A kind of manufacturing process of G+G capacitance touch screen |
| CN112702848A (en) * | 2021-03-24 | 2021-04-23 | 成都市克莱微波科技有限公司 | Method for cleaning high-frequency flexible microwave printed circuit board |
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