CN102646000A - Manufacturing method of touch panel - Google Patents
Manufacturing method of touch panel Download PDFInfo
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- CN102646000A CN102646000A CN2012100531891A CN201210053189A CN102646000A CN 102646000 A CN102646000 A CN 102646000A CN 2012100531891 A CN2012100531891 A CN 2012100531891A CN 201210053189 A CN201210053189 A CN 201210053189A CN 102646000 A CN102646000 A CN 102646000A
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Abstract
The invention relates to a manufacturing method of a touch panel. A base plate with a sensing area and a surrounding area is provided. A plurality of first sensing serial buses and a plurality of second sensing serial buses are formed in the sensing area, and a plurality of transmission lines are formed in the surrounding area. A method for forming the first sensing serial buses, the second sensing serial buses and the transmission lines comprises a step of performing a patterning process by using a light shield to ensure that a transparent conducting layer and a metal layer are patterned into a patterned transparent conducting layer and a patterned metal layer. The patterned transparent conducting layer comprises a plurality of first transparent bridging lines of the first sensing serial buses and a plurality of transparent transmission lines positioned in the surrounding area. The patterned metal layer comprises a plurality of metal transmission lines positioned in the surrounding area. The transparent transmission lines and the metal transmission lines are overlapped to form the transmission lines.
Description
Technical field
The invention relates to a kind of manufacturing approach of contact panel, and particularly relevant for a kind of manufacturing approach that reduces the contact panel of light shield use number.
Background technology
In recent years, various electronic product all constantly strides forward towards the direction of easy and simple to handle, small size and screen sizes, and particularly portable electronic product is more strict for the requirement of volume and screen size.Therefore, many electronic products are all integrated contact panel and display panel, with omission keyboard or the required space of operational and controlled key button, and then make the configurable enlarged areas of screen.At present, contact panel roughly can be divided into contact panels such as resistance-type, condenser type, infrared-type and ultrasonic formula, is modal product with electric resistance touch-control panel and capacitance type touch-control panel wherein.
With a kind of capacitance type touch-control panel wherein, the sensing area in the contact panel comprises the sensing serial of directions X and Y direction, and sensing serial normally is made up of sensor pad and bridging line.In addition, these sensing serial often are connected with control circuit with the metal transmission line that is arranged at outside the sensing area.Use number in order to save light shield, when making metal transmission line, make bridging line usually simultaneously.Yet, can be in the sensing area because the light that bridging line is a metal material reflects external environment can cause the not good problem of visual grade.
In addition; Because the metallic diaphragm thickness in order to make the metal bridge wiring is thicker; Make bridging line if use metallic diaphragm; Then it causes the phenomenon that produces film forming flatness not good (or climbing broken string) in the manufacturing process of follow-up transparent bridging line (striding across the transparent bridging line on the upper strata of metal bridge wiring) easily, and such phenomenon can increase the probability that contact panel produces static discharge (Electrostatic Discharge).When static discharge occurs in staggered regional of bridging line, can cause the transmission signal of directions X and Y direction that the phenomenon of short circuit is arranged.Therefore,, must increase by one light shield processing procedure and accomplish the making that replaces aforesaid metal bridge wiring with the transparent bridging line, just increase the light shield processing procedure thus one, cause the increase of cost of manufacture in order to reduce the not good and situation of short circuit of visual grade.
Summary of the invention
The present invention provides a kind of manufacturing approach of contact panel, and it uses the electrically conducting transparent material as bridging line, and the sensing serial that therefore helps good visual grade to be provided and to avoid different directions produces situation of short circuit.
The present invention provides a kind of manufacturing approach of contact panel, and it comprises the following steps.At first, a substrate is provided, the surrounding zone that this substrate has a sensing area and is positioned at the sensing area periphery.Then; In sensing area, form many first sensing serial and many second sensing serial and in the surrounding zone, form the plurality of transmission lines that is connected in first sensing serial and second sensing serial; The bearing of trend of the bearing of trend of first sensing serial and second sensing serial is interlaced, and the step that wherein forms first sensing serial, second sensing serial and transmission line comprises: on substrate, form a transparency conducting layer and a metal level in regular turn; Carrying out a patterning process makes transparency conducting layer and metal layer pattern turn to a patterned transparent conductive layer and a patterned metal layer; Patterned transparent conductive layer comprises many first transparent bridging lines of first sensing serial and is positioned at many transparent transmission lines of surrounding zone; And patterned metal layer comprises the many strip metals transmission line that is positioned at the surrounding zone, and wherein transparent transmission line and metal transmission line are repeatedly put to constitute transmission line.Come, form a patterned insulation layer, wherein patterned insulation layer covers the first transparent bridging line.At last, on patterned insulation layer, form many second transparent bridging lines of second sensing serial.
In one embodiment of this invention, the manufacturing approach of above-mentioned contact panel more comprises: form a plurality of first sensor pads, and first sensor pad is to be formed by first transparent bridging line serial connection; Form a plurality of second sensor pads, and second sensor pad is to be formed by second transparent bridging line serial connection.
In one embodiment of this invention, above-mentioned step of carrying out patterning process more comprises and makes patterned transparent conductive layer comprise first sensor pad.
In one embodiment of this invention, above-mentioned step of carrying out patterning process more comprises and makes patterned transparent conductive layer comprise second sensor pad.
In one embodiment of this invention, more form first sensor pad above-mentioned formation second transparent bridging line time.
In one embodiment of this invention, more form second sensor pad above-mentioned formation second transparent bridging line time.
In one embodiment of this invention, the manufacturing approach of above-mentioned contact panel more comprises formation one protective seam, and protective seam covers first sensing serial and second sensing serial.
In one embodiment of this invention, above-mentioned patterning process is to be a light shield processing procedure.
In one embodiment of this invention, the light shield of above-mentioned light shield processing procedure use comprises a shadow tone light shield or a gray tone light shield.
Based on above-mentioned, the manufacturing approach of contact panel of the present invention is made bridging line with transparent conductive material, so contact panel can have preferable visual grade.In addition, according to the manufacturing approach of contact panel of the present invention, use the making that one the light shield processing procedure can be accomplished transparent bridging line partly and be positioned at the transmission line of periphery.Therefore, the manufacturing approach of contact panel of the present invention helps to reduce the number of light shield processing procedure and reduces cost of manufacture.
For letting the above-mentioned feature and advantage of the present invention can be more obviously understandable, hereinafter is special lifts embodiment, and cooperates appended graphic elaborating as follows.
Description of drawings
Fig. 1 illustrates the synoptic diagram of a contact panel of one embodiment of the invention.
Fig. 2 A to Fig. 2 J is the making schematic flow sheet of a contact panel of first embodiment of the invention.
Fig. 3 A to Fig. 3 J is the making schematic flow sheet of a contact panel of second embodiment of the invention.
Fig. 4 A to Fig. 4 J is the making schematic flow sheet of a contact panel of third embodiment of the invention.
[primary clustering symbol description]
TP, TP1, TP2, TP3: contact panel
10: substrate
12: transparency conducting layer
14: metal level
16: the first photoresistances
18a: second photoresistance
18b: the 3rd photoresistance
20: patterned insulation layer
30: protective seam
100: sensing area
110: the first sensing serial
112: the first transparent bridging lines
114: the first sensor pads
120: the second sensing serial
122: the second transparent bridging lines
124: the second sensor pads
200: the surrounding zone
210: transmission line
212: the transparent transmission line
214: metal transmission line
The X:X direction
The Y:Y direction
M: zone.
Embodiment
For specifying the manufacturing approach of contact panel of the present invention, the general arrangement of contact panel is described earlier at this.Fig. 1 illustrates the synoptic diagram of a contact panel of one embodiment of the invention.Please refer to Fig. 1, in view of structure, contact panel TP consists essentially of a sensing area 100 and a surrounding zone 200, and wherein surrounding zone 200 is positioned at the periphery of sensing area 100.Have many first sensing serial 110 and many second sensing serial 120 in the sensing area 100.Has plurality of transmission lines 210 in the surrounding zone 200.Each bar first sensing serial 110 all is to be made up of many first bridging lines 112 and 114 of a plurality of first sensor pads, and first bridging line 112 in same first sensing serial 110 is serially connected these first sensor pads 114.Similarly, each bar second sensing serial 120 all is to be made up of many second bridging lines 122 and 124 of a plurality of second sensor pads, and second bridging line 122 in same second sensing serial 120 is serially connected these second sensor pads 124.First bridging line 112 and second bridging line 122 can present configuration interlaced with each other.
In detail, the bearing of trend of the bearing of trend of first sensing serial 110 and second sensing serial 120 is interlaced.In other words, in this embodiment, the bearing of trend of first sensing serial 110 for example is a directions X, and the bearing of trend of second sensing serial 120 for example is the Y direction, and directions X and Y direction are interlaced.Yet, the invention is not restricted to this, in other embodiments, the bearing of trend of first sensing serial 110 can be the Y direction for example, and the bearing of trend of second sensing serial 120 for example is a directions X.
Below will enumerate three embodiment to introduce the manufacturing approach of above-mentioned first sensing serial 110, second sensing serial 120 and transmission line 210 in detail.Earlier explanation is, is the manufacturing approach of concise description contact panel of the present invention, will be with the enlarged diagram of the regional M among Fig. 1 as explanation in following diagram.And, will be only in the following diagram with the formation method of a transmission lines 210, first sensing serial 110 and one second sensing serial 120 as explanation.Yet, in this field, have common knowledge the knowledgeable when the manufacturing approach that can understand contact panel of the present invention according to following explanation.
Fig. 2 A to Fig. 2 J is the making schematic flow sheet of a contact panel of first embodiment of the invention.It is noted that, be that clear expression makes flow process, the following graphic top view that comprises contact panel all simultaneously (on) and the sectional view (descending) of contact panel, and the overall architecture of the Fig. 1 that arranges in pairs or groups simultaneously describes.Please refer to Fig. 2 A, at first, on substrate 10, form a transparency conducting layer 12 and a metal level 14.Then, transparency conducting layer 12 and metal level 14 are carried out a patterning process.
In present embodiment, patterning process can may further comprise the steps, but not as limit.Form a photoresist layer (not illustrating) on the substrate 10 that is formed with transparency conducting layer 12 and metal level 14, then with a light shield processing procedure photoresist layer is carried out patterning, wherein this light shield processing procedure for example is a shadow tone light shield processing procedure or a gray tone light shield processing procedure.So; One first photoresistance 16 and one second photoresistance 18a can be formed on the metal level 14; Wherein the thicknesses of layers of first photoresistance 16 is less than the second photoresistance 18a, shown in Fig. 2 B, and first photoresistance 16 for example be positioned at sensing area 100 and the second photoresistance 18a for example the position in the surrounding zone 200.
Coming, serves as the cover curtain with first photoresistance 16 and the second photoresistance 18a again, removes the part metals layer 14 that is exposed out, shown in Fig. 2 C.Similarly, serve as the cover curtain with first photoresistance 16 and the second photoresistance 18a again, remove the partially transparent conductive layer 12 that is exposed out, shown in Fig. 2 D.The step that removes that Fig. 2 C and Fig. 2 D are painted for example is to see through an etch process to realize.Behind etch process, transparency conducting layer 12 and metal level 14 all are patterned and only remaining part of being covered by first photoresistance 16 and the second photoresistance 18a.
Then, remove first photoresistance 16 and the part second photoresistance 18a to form the 3rd photoresistance 18b and to expose part metals layer 14, shown in Fig. 2 E.The method that removes first photoresistance 16 and the part second photoresistance 18a here, for example is an ashing method.And the 3rd photoresistance 18b for example is by being constituted by the second photoresistance 18a of thinning.That is the 3rd photoresistance 18b has identical profile with the second photoresistance 18a in top view, but in sectional view, has different thickness.
Then, with originally being covered by first photoresistance 16 that the part metals layer 14 that then is exposed out removes so that first bridging line 112 of first sensing serial 110 in partially transparent conductive layer 12 pie graphs 1 that come out, shown in Fig. 2 F.At this moment, the 3rd photoresistance 18b still remaines in the surrounding zone 200 of substrate 10.
Come again, the 3rd photoresistance 18b is removed, promptly accomplish patterned metal layer and patterned transparent conductive layer, shown in Fig. 2 G.Please again with reference to figure 2G and simultaneously with reference to Fig. 1, patterned metal layer comprises many strip metals transmission line 214 (only illustrating 1 at this).Patterned transparent conductive layer comprises many first transparent bridging lines 112 (only illustrating 1 at this) of first sensing serial 110 and the many transparent transmission lines 212 (only illustrating 1 at this) that are positioned at surrounding zone 200.In addition, transparent transmission line 212 is repeatedly put to constitute transmission line 210 with metal transmission line 214.Particularly, the pattern of first photoresistance 16 is the pattern of the first transparent bridging line 112 in the abovementioned steps, and the pattern of the second photoresistance 18a and be the pattern of transmission line 210.And, in the present embodiment, can therefore help to reduce the cost of manufacture of contact panel with the material layer patternization of two kinds of different materials to accomplish the making of the transmission line 210 and the first transparent bridging line 112 with one light shield processing procedure.
Subsequently, please refer to Fig. 2 H, form patterned insulation layer 20 and cover part first a transparent bridging line 112 and a transmission line 210.In detail, patterned insulation layer 20 can have a plurality of openings that expose part first transparent bridging line 112 and part metals transmission line 214 by one light shield processing procedure patterning.
Come again, please refer to Fig. 2 I, on patterned insulation layer 20, form second sensing serial 120 and a plurality of first sensor pad 114.Present embodiment for example is to make the second transparent bridging line 122, first sensor pad 114 and second sensor pad 124 make simultaneously by one light shield processing procedure patterning one transparency conducting layer (not illustrating).The opening and first sensor pad 114 that the first transparent bridging line 112 sees through patterned insulation layer 20 are concatenated into first sensing serial 110, and the second transparent bridging line 122 and second sensor pad 124 directly connect into to constitute second sensing serial 120.In addition; First sensor pad 114 between surrounding zone 200 and sensing area 100 for example more extends in the surrounding zone 200; And the part metals transmission line 214 that is exposed with patterned insulation layer 20 electrically connects, and can the sensing signal be sent on the transmission line 210 by this.
At last, please refer to Fig. 2 J, form a protective seam 30.Protective seam 30 covers first sensing serial 110 and second sensing serial 120.So far, accomplish the making of contact panel TP1.In the present embodiment, the second transparent bridging line 122, first sensor pad 114 and second sensor pad 124 all are to be made up of transparent conductive material.In addition, according to the making flow process of Fig. 2 A to Fig. 2 G, the first transparent bridging line 112 also is to be made up of transparent conductive material.So first sensing serial 110 and second sensing serial, 120 integral body that are positioned at sensing area 100 all are transparent members, this helps to improve the visual taste of contact panel TP1.
Below will enumerate other embodiment with as explanation.In this mandatory declaration is that following embodiment continues to use the assembly label and the partial content of previous embodiment, wherein adopts identical label to represent identical or approximate assembly, and has omitted the explanation of constructed content.Explanation about clipped can be with reference to previous embodiment, and following embodiment no longer is repeated in this description.
Fig. 3 A to Fig. 3 J is the making schematic flow sheet of a contact panel of second embodiment of the invention.It is noted that, be that clear expression makes flow process, the following graphic top view that comprises contact panel all simultaneously (on) and the sectional view (descending) of contact panel, and the overall architecture of the Fig. 1 that arranges in pairs or groups simultaneously describes.In this embodiment, the bearing of trend of first sensing serial 110 for example is the Y direction, and the bearing of trend of second sensing serial 120 for example is a directions X.Please refer to Fig. 3 A, at first, on substrate 10, form a transparency conducting layer 12 and a metal level 14.Then, transparency conducting layer 12 and metal level 14 are carried out a patterning process.
In present embodiment, patterning process can may further comprise the steps, but not as limit.Form a photoresist layer (not illustrating) on the substrate 10 that is formed with transparency conducting layer 12 and metal level 14, then with a light shield processing procedure photoresist layer is carried out patterning, wherein this light shield processing procedure for example is a shadow tone light shield processing procedure or a gray tone light shield processing procedure.So; One first photoresistance 16 and one second photoresistance 18a can be formed on the metal level 14; Wherein the thicknesses of layers of first photoresistance 16 is less than the second photoresistance 18a, shown in Fig. 3 B, and first photoresistance 16 for example be positioned at sensing area 100 and the second photoresistance 18a for example the position in the surrounding zone 200.
Coming, serves as the cover curtain with first photoresistance 16 and the second photoresistance 18a again, removes the part metals layer 14 that is exposed out and exposes transparency conducting layer 12, shown in Fig. 3 C.Similarly, serve as the cover curtain with first photoresistance 16 and the second photoresistance 18a again, remove the partially transparent conductive layer 12 that is exposed out, shown in Fig. 3 D.The step that removes that Fig. 3 C and Fig. 3 D are painted for example is to see through an etch process to realize.Behind etch process, transparency conducting layer 12 and metal level 14 all are patterned and only remaining part of being covered by first photoresistance 16 and the second photoresistance 18a.
Then, remove first photoresistance 16 and the part second photoresistance 18a to form the 3rd photoresistance 18b and to expose the part metals layer 14 that is covered by first photoresistance 16 originally, shown in Fig. 3 E.The method that removes first photoresistance 16 and the part second photoresistance 18a here, for example is an ashing method.And the 3rd photoresistance 18b for example is by being constituted by the second photoresistance 18a of thinning.That is the 3rd photoresistance 18b has identical profile with the second photoresistance 18a in top view, but in sectional view, has different thickness.
Then; With originally being covered by first photoresistance 16 that the part metals layer 14 that then is exposed out removes so that first sensing serial 110 in partially transparent conductive layer 12 pie graphs 1 that come out and second sensor pad 124 of second sensing serial 120, shown in Fig. 3 F.At this moment, the 3rd photoresistance 18b still remaines in the surrounding zone 200 of substrate 10.
Come again, the 3rd photoresistance 18b is removed, promptly accomplish patterned metal layer and patterned transparent conductive layer, shown in Fig. 3 G.Please again with reference to figure 3G and simultaneously with reference to Fig. 1, patterned metal layer comprises many strip metals transmission line 214 (only illustrating 1 at this).Patterned transparent conductive layer comprises first sensing serial 110, second sensor pad 124 of second sensing serial 120 and the transparent transmission line 212 that is positioned at surrounding zone 200.In other words, present embodiment for example is that win transparent bridging line 112, first sensor pad 114 and second sensor pad 124 are made simultaneously, and wherein the first transparent bridging line 112 and first sensor pad 114 directly connect into first sensing serial 110.In addition, transparent transmission line 212 is repeatedly put to constitute transmission line 210 with metal transmission line 214.Particularly, the pattern of first photoresistance 16 is the pattern of first sensing serial 110 and second sensor pad 124 in the abovementioned steps.And, can therefore help to reduce the cost of manufacture of contact panel with the material layer patternization of two kinds of different materials to accomplish the making of transmission line 210, first sensing serial 110 and second sensor pad 124 with one light shield processing procedure in the present embodiment.
Subsequently, please refer to Fig. 3 H, form a patterned insulation layer 20 and cover the first transparent bridging line 112 and transmission line 210.In detail, patterned insulation layer 20 can have a plurality of openings that expose part second sensor pad 124 by one light shield processing procedure patterning.
Come again, please refer to Fig. 3 I, on patterned insulation layer 20, form many second transparent bridging lines 122 of second sensing serial 120.So far, the second transparent bridging line 122 is concatenated into second sensing serial 120 through the opening and second sensor pad 124 of patterned insulation layer 20.In addition, because second sensor pad 124 between surrounding zone 200 and sensing area 100 and the transparent transmission line 212 of surrounding zone 200 are continuous circuit, therefore, the sensing signal of second sensing serial 120 can be sent on the transmission line 210 by this.
At last, please refer to Fig. 3 J, form a protective seam 30.Protective seam 30 covers first sensing serial 110 and second sensing serial 120.So far, accomplish the making of contact panel TP2.With the embodiment of Fig. 2 G similarly, in the present embodiment, first sensing serial 110 and second sensing serial, 120 integral body all are transparent members, this helps to improve the visual taste of contact panel TP2.
Fig. 4 A to Fig. 4 J is the making schematic flow sheet of a contact panel of third embodiment of the invention.It is noted that, be that clear expression makes flow process, the following graphic top view that comprises contact panel all simultaneously (on) and the sectional view (descending) of contact panel, and the overall architecture of the Fig. 1 that arranges in pairs or groups simultaneously describes.In this embodiment, the bearing of trend of first sensing serial 110 for example is a directions X, and the bearing of trend of second sensing serial 120 for example is the Y direction.Please refer to Fig. 4 A, at first, on substrate 10, form a transparency conducting layer 12 and a metal level 14.Then, transparency conducting layer 12 and metal level 14 are carried out a patterning process.
In present embodiment, patterning process can may further comprise the steps, but not as limit.Form a photoresist layer (not illustrating) on the substrate 10 that is formed with transparency conducting layer 12 and metal level 14, then with a light shield processing procedure photoresist layer is carried out patterning, wherein this light shield processing procedure for example is a shadow tone light shield processing procedure or a gray tone light shield processing procedure.So; One first photoresistance 16 and one second photoresistance 18a can be formed on the metal level 14; Wherein the thicknesses of layers of first photoresistance 16 is less than the second photoresistance 18a, shown in Fig. 4 B, and first photoresistance 16 for example be positioned at sensing area 100 and the second photoresistance 18a for example the position in the surrounding zone 200.
Coming, serves as the cover curtain with first photoresistance 16 and the second photoresistance 18a again, removes the part metals layer 14 that is exposed out and exposes transparency conducting layer 12, shown in Fig. 4 C.Similarly, serve as the cover curtain with first photoresistance 16 and the second photoresistance 18a again, remove the partially transparent conductive layer 12 that is exposed out, shown in Fig. 4 D.The step that removes that Fig. 4 C and Fig. 4 D are painted for example is to see through an etch process to realize.Behind etch process, transparency conducting layer 12 and metal level 14 all are patterned and only remaining part of being covered by first photoresistance 16 and the second photoresistance 18a.
Then, remove first photoresistance 16 and the part second photoresistance 18a to form the 3rd photoresistance 18b and to expose part metals layer 14, shown in Fig. 4 E.The method that removes first photoresistance 16 and the part second photoresistance 18a here, for example is an ashing method.And the 3rd photoresistance 18b for example is by being constituted by the second photoresistance 18a of thinning.That is the 3rd photoresistance 18b has identical profile with the second photoresistance 18a in top view, but in sectional view, has different thickness.
Then, remove so that expose partially transparent conductive layer 12 originally being covered the part metals layer 14 that then is exposed out by first photoresistance 16, first sensing serial 110 in its pie graph 1 is shown in Fig. 4 F.At this moment, the 3rd photoresistance 18b still remaines in the surrounding zone 200 of substrate 10.
Come again, the 3rd photoresistance 18b is removed, promptly accomplish patterned metal layer and patterned transparent conductive layer, shown in Fig. 4 G.Please again with reference to figure 4G and simultaneously with reference to Fig. 1, patterned metal layer comprises many strip metals transmission line 214 (only illustrating 1 at this).Patterned transparent conductive layer comprises first sensing serial 110 and is positioned at many transparent transmission lines 212 of surrounding zone 200 (only illustrating 1 at this).In other words, present embodiment for example is that win transparent bridging line 112 and first sensor pad 114 are made simultaneously, and wherein the first transparent bridging line 112 and first sensor pad 114 directly connect into first sensing serial 110.In addition, transparent transmission line 212 is repeatedly put to constitute transmission line 210 with metal transmission line 214.Particularly, the pattern of first photoresistance 16 is the pattern of first sensing serial 110 in the abovementioned steps.And, can therefore help to reduce the cost of manufacture of contact panel with the material layer patternization of two kinds of different materials to accomplish the making of the transmission line 210 and first sensing serial 110 with one light shield processing procedure in the present embodiment.。
Subsequently, please refer to Fig. 4 H, form a patterned insulation layer 20 and cover the first transparent bridging line 112.In detail, patterned insulation layer 20 can only cover the first transparent bridging line 112 by one light shield processing procedure patterning.
Come again, please refer to Fig. 4 I, on patterned insulation layer 20, form many second transparent bridging lines 122 of second sensing serial 120.And, when forming the second transparent bridging line 122, more on substrate 10, form a plurality of second sensor pads 124, wherein the second transparent bridging line 122 and second sensor pad 124 are for make and directly connect into second sensing serial 120 simultaneously.In addition, because first sensor pad 114 between surrounding zone 200 and sensing area 100 and the transparent transmission line 212 of surrounding zone 200 are continuous circuit, therefore, the sensing signal of first sensing serial 110 can be sent on the transmission line 210 by this.
At last, please refer to Fig. 4 J, form a protective seam 30.Protective seam 30 covers first sensing serial 110 and second sensing serial 120.So far, accomplish the making of contact panel TP3.With the embodiment of Fig. 2 G similarly, in the present embodiment, first sensing serial 110 and second sensing serial, 120 integral body all are transparent members, this helps to improve the visual taste of contact panel TP3.
In sum, the manufacturing approach of contact panel of the present invention is made bridging line with transparent conductive material, so contact panel can have preferable visual grade.In addition, according to the manufacturing approach of contact panel of the present invention, the making of can be only promptly accomplishing transparent bridging line partly and being positioned at the transmission line of periphery with one light shield processing procedure, above-mentioned light shield processing procedure for example is shadow tone light shield processing procedure or gray tone light shield processing procedure.Therefore, the manufacturing approach of contact panel of the present invention helps to reduce the number of light shield processing procedure and reduces cost of manufacture.
Though the present invention discloses as above with embodiment; Right its is not in order to limit the present invention; Has common knowledge the knowledgeable in the technical field under any; Do not breaking away from the spirit and scope of the present invention, when doing a little change and retouching, so protection scope of the present invention is as the criterion when looking accompanying the claim person of defining.
Claims (9)
1. the manufacturing approach of a contact panel is characterized in that, comprises the following steps:
One substrate is provided, the surrounding zone that this substrate has a sensing area and is positioned at this sensing area periphery;
In this sensing area, form many first sensing serial and many second sensing serial and in this surrounding zone, form the plurality of transmission lines that is connected in those first sensing serial and those second sensing serial; The bearing of trend of the bearing of trend of those first sensing serial and those second sensing serial is interlaced, and the step that wherein forms those first sensing serial, those second sensing serial and those transmission lines comprises:
On this substrate, form a transparency conducting layer and a metal level in regular turn;
Carrying out a patterning process makes this transparency conducting layer and this metal layer pattern turn to a patterned transparent conductive layer and a patterned metal layer; This patterned transparent conductive layer comprises many first transparent bridging lines of those first sensing serial and is positioned at many transparent transmission lines of this surrounding zone; And this patterned metal layer comprises the many strip metals transmission line that is positioned at this surrounding zone, and wherein those transparent transmission lines and those metal transmission lines are repeatedly put to constitute those transmission lines;
Form a patterned insulation layer, wherein this patterned insulation layer covers those first transparent bridging lines; And
On this patterned insulation layer, form many second transparent bridging lines of those second sensing serial.
2. the manufacturing approach of contact panel according to claim 1 is characterized in that, further comprises:
Form a plurality of first sensor pads, and those first sensor pads are concatenated into those first sensing serial by those first transparent bridging lines; And
Form a plurality of second sensor pads, and those second sensor pads are concatenated into those second sensing serial by those second transparent bridging lines.
3. the manufacturing approach of contact panel according to claim 2, it is characterized in that: the step of wherein carrying out this patterning process more comprises makes this patterned transparent conductive layer comprise those first sensor pads.
4. the manufacturing approach of contact panel according to claim 2, it is characterized in that: the step of wherein carrying out this patterning process more comprises makes this patterned transparent conductive layer comprise those second sensor pads.
5. the manufacturing approach of contact panel according to claim 2 is characterized in that: more form those first sensor pads when wherein forming those second transparent bridging lines.
6. the manufacturing approach of contact panel according to claim 2 is characterized in that: more form those second sensor pads when wherein forming those second transparent bridging lines.
7. the manufacturing approach of contact panel according to claim 1 is characterized in that: further comprise forming a protective seam this protective seam those first sensing serial of covering and those second sensing serial.
8. the manufacturing approach of contact panel according to claim 1, it is characterized in that: wherein this patterning process is to be a light shield processing procedure.
9. the manufacturing approach of contact panel according to claim 8 is characterized in that: wherein the light shield that uses of this light shield processing procedure comprises a shadow tone light shield or a gray tone light shield.
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| CN201210053189.1A CN102646000B (en) | 2012-03-02 | 2012-03-02 | The manufacture method of contact panel |
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| CN201210053189.1A CN102646000B (en) | 2012-03-02 | 2012-03-02 | The manufacture method of contact panel |
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| CN102646000B CN102646000B (en) | 2015-09-09 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103440061A (en) * | 2013-04-25 | 2013-12-11 | 友达光电股份有限公司 | Touch panel and touch display panel using same |
| CN103472944A (en) * | 2013-07-02 | 2013-12-25 | 友达光电股份有限公司 | Touch panel and manufacturing method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070242054A1 (en) * | 2006-04-14 | 2007-10-18 | Ritdisplay Corporation | Light transmission touch panel and manufacturing method thereof |
| CN101685362A (en) * | 2008-09-22 | 2010-03-31 | 铼宝科技股份有限公司 | Light transmission touch panel |
| CN101699378A (en) * | 2009-09-23 | 2010-04-28 | 深超光电（深圳）有限公司 | Touch panel and manufacturing method thereof |
| CN201662945U (en) * | 2010-02-11 | 2010-12-01 | 新应材股份有限公司 | Marking structure of light-transmission base plate and manufacturing device thereof |
| CN202084018U (en) * | 2011-04-22 | 2011-12-21 | 铼洋科技股份有限公司 | Touch panel |
-
2012
- 2012-03-02 CN CN201210053189.1A patent/CN102646000B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070242054A1 (en) * | 2006-04-14 | 2007-10-18 | Ritdisplay Corporation | Light transmission touch panel and manufacturing method thereof |
| CN101685362A (en) * | 2008-09-22 | 2010-03-31 | 铼宝科技股份有限公司 | Light transmission touch panel |
| CN101699378A (en) * | 2009-09-23 | 2010-04-28 | 深超光电（深圳）有限公司 | Touch panel and manufacturing method thereof |
| CN201662945U (en) * | 2010-02-11 | 2010-12-01 | 新应材股份有限公司 | Marking structure of light-transmission base plate and manufacturing device thereof |
| CN202084018U (en) * | 2011-04-22 | 2011-12-21 | 铼洋科技股份有限公司 | Touch panel |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103440061A (en) * | 2013-04-25 | 2013-12-11 | 友达光电股份有限公司 | Touch panel and touch display panel using same |
| CN103472944A (en) * | 2013-07-02 | 2013-12-25 | 友达光电股份有限公司 | Touch panel and manufacturing method thereof |
| CN103472944B (en) * | 2013-07-02 | 2016-05-11 | 友达光电股份有限公司 | Touch panel and manufacturing method thereof |
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