CN201662945U - Marking structure of light-transmission base plate and manufacturing device thereof - Google Patents
Marking structure of light-transmission base plate and manufacturing device thereof Download PDFInfo
- Publication number
- CN201662945U CN201662945U CN2010201177985U CN201020117798U CN201662945U CN 201662945 U CN201662945 U CN 201662945U CN 2010201177985 U CN2010201177985 U CN 2010201177985U CN 201020117798 U CN201020117798 U CN 201020117798U CN 201662945 U CN201662945 U CN 201662945U
- Authority
- CN
- China
- Prior art keywords
- transparent substrates
- photoresist layer
- indicating arrangement
- sensitization photoresist
- sensitization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Laminated Bodies (AREA)
Abstract
The utility model discloses a marking structure of a light-transmission base plate and a manufacturing device thereof. One surface of the light-transmission base plate is provided with a light-sensing photoresist layer which is provided with a patterned color area, accordingly, the patterned color area can be identified so as to achieve marking role, and the marking structure can be further applied to a touch panel or a two-dimensional display and other related products.
Description
Technical field
The utility model relates to the indicating arrangement of transparent substrates, refers to a kind of indicating arrangement that can be applicable in the Related products such as contact panel or flat-panel screens especially.
Background technology
Press, flat-panel screens (FPD) kind comprises Field Emission Display (FED), LCD (TFT-LCD), plasma display panel (PDP), organic light emitting diode display (OLED), projection type liquid crystal display or the like, gently, thin is the common feature of these flat-panel screens, according to the different speciality of this flat-panel screens respectively, some can be applicable to small size panel such as mobile phone; During some then can be applicable to, big molded dimension such as computer screen, TV screen; Or be applied to ultra-large type size such as outdoor digital billboard.Above-mentioned flat-panel monitor is by to processing made by transparent substrates that material constituted such as glass, and carry out the setting that different procedure for processing need this transparent substrates surface is indicated pattern often, for example can conveniently carry out effects such as contraposition, how will be formed with indicating arrangement and not influence this transmittance or successive process again on this transparent substrates, be the problem of the anxious desire solution of manufacturer now.
The utility model content
The technical matters that the utility model solved is to provide a kind of indicating arrangement that can be applicable in the Related products such as contact panel or flat-panel screens.
The technical solution of the utility model is: a kind of indicating arrangement of transparent substrates, this transparent substrates wherein a surface are provided with a sensitization photoresist layer, and this sensitization photoresist layer is formed with the patterning color region.
Wherein, after the exposure of this sensitization photoresist layer through the patterning light shield, and form and the corresponding patterning color region of this light shield.
This sensitization photoresist layer is covered on the surface of transparent substrates.
This transparent substrates is a glass substrate.
The thickness of this sensitization photoresist layer is 1～5 μ m.
Another relative surface is provided with a sensitization photoresist layer, and this sensitization photoresist layer is formed with the patterning color region.
A kind of manufacturing installation that is used for making as claim 1 indicating arrangement, it includes at least: one in order to carry this transparent substrates to carry out the delivery platform of different machining areas, is placed with transparent substrates on this delivery platform; One coating assembly is arranged at transparent substrates wherein on the surface with sensitization photoresist layer coating; One baking assembly in order to transparent substrates is toasted, be arranged at coating assembly after, this sensitization photoresist layer is fixed on this transparent substrates; One the exposure assembly, be arranged at the baking assembly after, this exposure assembly provides a patterning light shield to expose on this transparent substrates, then finishes indicating arrangement.
Wherein, the thickness of this sensitization photoresist layer is 1～5 μ m.
This transparent substrates is a glass substrate.
Contain resin, Photoactive compounds, interfacial agent, solvent and dyestuff in this sensitization photoresist layer.
The beneficial effects of the utility model are: a transparent substrates wherein surface is provided with a sensitization photoresist layer, this sensitization photoresist layer is formed with the patterning color region, recognizable by this patterning color region, can reach marked effect, and can further be applied in the Related products such as contact panel or flat-panel screens, and can not influence the function that its transmittance also can have color-identifying.
Description of drawings
Figure 1A, B are the structural perspective of indicating arrangement in the utility model;
Fig. 2 is the manufacturing installation structural representation of indicating arrangement in the utility model;
Fig. 3 is provided with the structural representation of sensitization photoresist layer for transparent substrates in the utility model;
The structural representation that Fig. 4 exposes for transparent substrates in the utility model.
[figure number explanation]
Patterning color region 21 unexposed areas 22
Baking assembly 33 exposure assemblies 34
Embodiment
The indicating arrangement of the utility model transparent substrates, shown in Figure 1A, this transparent substrates 1 (can be glass substrate) wherein covers on the first surface 11 and is provided with a sensitization photoresist layer 2, contain resin in this sensitization photoresist layer 2 and [can be phenolics (Novolak, novolac resin) or epoxy resin (Epoxy resin)], Photoactive compounds [can be diazonium naphthoquinone sulphonate (Diazonaphthoquinonesulfonate ester Derivatives) derivative compound], interfacial agent, solvent and dyestuff [can be derivative compound (Diarylmethane Derivatives) for diarylmethanes, or triarylmethane is derivative compound (Triarylmethane Derivatives)], and the thickness of this sensitization photoresist layer 2 can be 1～5 μ m, this sensitization photoresist layer 2 is formed with patterning color region 21,22 identifications of other unexposed area of this patterning color region 21 and sensitization photoresist layer 2 with color, the effect that can have sign by this patterning color region 21; Wherein after wherein finish on a surface 11, the step of can turn-over carrying out above repetition again in another second surface 12 relatively, can be provided with a sensitization photoresist layer 2 in second surface 12, shown in Figure 1B, this sensitization photoresist layer 2 is formed with patterning color region 21, can finish two-sided processing procedure indicating arrangement.
As shown in Figure 2, for the utility model is used to make the manufacturing installation of indicating arrangement, it includes at least:
One delivery platform 31 is placed with transparent substrates 1 on this delivery platform 31, carries out different machining areas in order to carry this transparent substrates 1;
One coating assembly 32, this coating assembly 32 can be coated with for rotary coating mode, slit or other coating method, sensitization photoresist layer 2 coating is arranged at transparent substrates wherein on the surface 11, please consults shown in Figure 3ly simultaneously, make this transparent substrates be coated with sensitization photoresist layer 2 on the surface 11;
One baking assembly 33, after being arranged at coating assembly 32,, this sensitization photoresist layer 2 is fixed on this transparent substrates 1 in order to transparent substrates 1 is toasted, wherein this stoving time is 1～5 minute (was good with 2 minutes), and baking temperature is 90～140 ℃ (are good with 110 ℃);
One exposure assembly 34, after being arranged at baking assembly 33, this exposure assembly 34 provides a patterning light shield 35 expose (applicable to the exposure wavelength processing procedure below the 500nm) on this transparent substrates 1, please consult shown in Figure 4 simultaneously, after this sensitization photoresist layer 2 exposure through patterning light shield 35, and form and these light shield 35 corresponding patterning color regions 21, then finish indicating arrangement.
And indicating arrangement of the present utility model is applied in the Related products such as contact panel or flat-panel screens, and can not influence the function that its transmittance also can have color-identifying.
Claims (8)
1. the indicating arrangement of a transparent substrates is characterized in that, this a transparent substrates wherein surface is provided with a sensitization photoresist layer, and this sensitization photoresist layer is formed with the patterning color region.
2. the indicating arrangement of transparent substrates as claimed in claim 1 is characterized in that, this sensitization photoresist layer is covered on the surface of transparent substrates.
3. the indicating arrangement of transparent substrates as claimed in claim 1 or 2 is characterized in that, this transparent substrates is a glass substrate.
4. the indicating arrangement of transparent substrates as claimed in claim 1 or 2 is characterized in that, the thickness of this sensitization photoresist layer is 1～5 μ m.
5. the indicating arrangement of transparent substrates as claimed in claim 1 or 2 is characterized in that, another relative surface is provided with a sensitization photoresist layer, and this sensitization photoresist layer is formed with the patterning color region.
6. manufacturing installation that is used for making as claim 1 indicating arrangement is characterized in that it includes at least:
One in order to carry this transparent substrates to carry out the delivery platform of different machining areas, is placed with transparent substrates on this delivery platform;
One coating assembly is arranged at transparent substrates wherein on the surface with sensitization photoresist layer coating;
One baking assembly in order to transparent substrates is toasted, be arranged at coating assembly after, this sensitization photoresist layer is fixed on this transparent substrates;
One the exposure assembly, be arranged at the baking assembly after, this exposure assembly provides a patterning light shield to expose on this transparent substrates, then finishes indicating arrangement.
7. the manufacturing installation of indicating arrangement as claimed in claim 6 is characterized in that, the thickness of this sensitization photoresist layer is 1～5 μ m.
8. the manufacturing installation of indicating arrangement as claimed in claim 6 is characterized in that, this transparent substrates is a glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201177985U CN201662945U (en) | 2010-02-11 | 2010-02-11 | Marking structure of light-transmission base plate and manufacturing device thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201177985U CN201662945U (en) | 2010-02-11 | 2010-02-11 | Marking structure of light-transmission base plate and manufacturing device thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201662945U true CN201662945U (en) | 2010-12-01 |
Family
ID=43233364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010201177985U Expired - Fee Related CN201662945U (en) | 2010-02-11 | 2010-02-11 | Marking structure of light-transmission base plate and manufacturing device thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201662945U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102646000A (en) * | 2012-03-02 | 2012-08-22 | 华映光电股份有限公司 | Manufacturing method of touch panel |
| CN103019421A (en) * | 2011-09-23 | 2013-04-03 | 胜华科技股份有限公司 | Sign structure of touch panel, touch panel and touch display device |
-
2010
- 2010-02-11 CN CN2010201177985U patent/CN201662945U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103019421A (en) * | 2011-09-23 | 2013-04-03 | 胜华科技股份有限公司 | Sign structure of touch panel, touch panel and touch display device |
| CN102646000A (en) * | 2012-03-02 | 2012-08-22 | 华映光电股份有限公司 | Manufacturing method of touch panel |
| CN102646000B (en) * | 2012-03-02 | 2015-09-09 | 华映光电股份有限公司 | The manufacture method of contact panel |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11171306B2 (en) | Package substrate, manufacturing method thereof, OLED display panel and manufacturing method thereof | |
| US9316870B2 (en) | Liquid crystal display device and a manufacturing method thereof | |
| CN105428355B (en) | Array substrate and preparation method thereof, display device | |
| US9453948B2 (en) | Color filter substrate, manufacturing method thereof and display device | |
| US20180364530A1 (en) | Array substrate, manufacturing method thereof, and display apparatus | |
| US9626017B2 (en) | Touch panel and manufacturing method thereof, display device | |
| CN103176650B (en) | Conducting glass substrate and preparation method thereof | |
| WO2017049878A1 (en) | Photoresist pattern forming method, color filter, and display device | |
| US8749135B2 (en) | Mother substrate structure of light emitting devices, light emitting device and method of fabricating the same | |
| CN105093629B (en) | A kind of display panel and preparation method thereof, display device | |
| US9329445B2 (en) | Mask plate and processes for manufacturing ultraviolet mask plate and array substrate | |
| CN102104050B (en) | Thin film transistor substrate and method for fabricating the same | |
| CN105739166B (en) | Liquid crystal display module and liquid crystal display device | |
| US20210336182A1 (en) | Oled display substrate, manufacturing method thereof and display device | |
| US20190140207A1 (en) | Method for fabricating display panel, display panel and display apparatus | |
| US20160011457A1 (en) | Fabrication method of substrate | |
| JP2017503219A (en) | Display device and manufacturing method thereof | |
| CN103839923A (en) | Alignment mark manufacturing method and substrate | |
| CN201662945U (en) | Marking structure of light-transmission base plate and manufacturing device thereof | |
| US10868090B2 (en) | Display substrate, manufacture method of the same, display panel | |
| CN104810322A (en) | Array substrate and manufacture method thereof, display panel, display device and mask plate | |
| CN106773523B (en) | Mask plate and manufacturing method thereof | |
| CN110164948B (en) | Pixel defining layer, manufacturing method and display panel | |
| CN103400837A (en) | Array substrate as well as preparation method and display device thereof | |
| KR101298464B1 (en) | Resist solution and method of forming pattern using thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101201 Termination date: 20170211 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |