CN102645798B - 一种显示装置及其制作方法 - Google Patents

一种显示装置及其制作方法 Download PDF

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CN102645798B
CN102645798B CN201210047059.7A CN201210047059A CN102645798B CN 102645798 B CN102645798 B CN 102645798B CN 201210047059 A CN201210047059 A CN 201210047059A CN 102645798 B CN102645798 B CN 102645798B
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赵伟利
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BOE Technology Group Co Ltd
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Abstract

本发明公开了一种显示装置，其阵列基板上形成有墙形电极，墙形电极将彩膜基板上的一行或一列子像素隔开并将每行或每列子像素分隔为两行或两列亚子像素，两行或两列亚子像素所在区域分别形成光线透射区和反射区，光线透射区和光线反射区内灌注的液晶使得透射区和反射区的光线具有相同的光程差。本发明还公开了一种显示装置制作方法。本发明能够实现显示装置的透射式和反射式显示，不受环境光干扰，可视性强，节能；透射区和反射区盒厚一致，液晶响应时间影响小，工艺简单；采用墙形电极，具有较高的横向电场，驱动电压可以得到显著降低；不用补偿膜或者盒内延迟片，成本降低；透射区和反射区只有液晶不同，制造工艺及电路驱动简单，可行性强。

Description

一种显示装置及其制作方法
技术领域
本发明属于显示技术领域，特别是涉及一种显示装置及其制作方法。
背景技术
透反液晶显示器兼具反射型显示器在户外阳光下优异的阅读性能和全透型显示器在无光、弱光环境下背光照明的出色阅读性能，因而广泛应用于航空器显示器仪表、车载显示器、高端手机、便携电脑等领域。
透反液晶显示器的子像素由透射区和反射区组成，透射区采用背光源发光，光线只穿过液晶层一次，而反射区则依靠反射周围环境光源发光，光线需要两次穿过液晶层，这使得光线穿过反射区的光程差是透射区的两倍，造成透反射区不能同时获得相同的光电特性，即光电特性不匹配。为此，现有技术采用双盒厚结构，即透射区的液晶盒厚为反射区液晶盒厚的两倍，使得光线穿过透射区的光程差和穿过反射区的光程差相等。但是，不同盒厚会导致透射区和反射区液晶响应时间不同，也会增加制造工艺的难度和提高生产成本。现有技术中也有采用单盒厚的半透半反显示装置的结构，其研究多集中于透射区和反射区采用不同的液晶模式，从而使得制造工艺和电路驱动难度加大，生产成本大大提高。
发明内容
(一)要解决的技术问题
本发明要解决的技术问题是如何实现透反液晶显示器中，光线通过透射区和反射区时光程差相同，液晶响应时间相同，且容易实现。
(二)技术方案
为了解决上述技术问题，本发明提供一种显示装置，包括阵列基板、彩膜基板以及阵列基板和彩膜基板对盒形成的液晶盒，所述阵列基板上形成有墙形电极，所述墙形电极将所述彩膜基板上的一行或一列子像素隔开，同时所述墙形电极还将每行或每列子像素分隔为两行或两列亚子像素，所述两行或两列亚子像素所在的区域分别形成光线透射区和光线反射区，所述光线透射区和光线反射区内灌注的液晶使得透射区和反射区的光线具有相同的光程差。
其中，所述透射区和反射区的液晶层厚度相等。
其中，所述液晶盒内透射区和反射区间隔设置。
其中，所述透射区内液晶的折射率差是反射区内液晶折射率差的两倍。
本发明还公开了一种显示装置制作方法，其包括以下步骤：
在阵列基板上形成间隔设置的墙形电极，并将阵列基板与彩膜基板对盒形成液晶盒，所述墙形电极将所述彩膜基板上的一行或一列子像素隔开，同时所述墙形电极还将每行或每列子像素分隔为两行或两列亚子像素，所述两行或两列亚子像素所在的区域分别形成光线透射区和光线反射区；
向所述透射区和反射区内分别灌注液晶，使得透射区和反射区的光线具有相同的光程差；
对所述透射区和反射区封口，并电路组装形成显示装置。
其中，相邻的所述墙形电极与所述阵列基板形成沟槽，所述透射区与反射区所对应的沟槽的长度不相等。
其中，所述透射区液晶和反射区液晶的灌注步骤具体为：
真空环境下，将长度较长的沟槽浸入其要灌注的液晶中，通过毛细作用力将液晶吸入沟槽，然后用封口胶对所述长度较长的沟槽封口，并切割至与长度较短的沟槽长度相等；
再将所述长度较短的沟槽浸入其要灌注的液晶中，通过毛细作用力将液晶吸入沟槽，然后用封口胶对所述长度较短的沟槽封口，并切割掉部分封口胶。
其中，所述透射区和反射区的液晶层厚度相等。
其中，所述液晶盒内透射区和反射区间隔设置。
其中，所述透射区内液晶的折射率差是反射区内液晶的折射率差的两倍。
(三)有益效果
上述技术方案所提供的显示装置及其制作方法，通过在阵列基板上设置墙形电极形成透射区和反射区，并在透射区和反射区灌注液晶，在实现显示装置的透射式和反射式显示的同时，使得透射区和反射区的光线具有相同的光程差，不受环境光干扰，可视性强，节能；透射区和反射区盒厚一致，液晶响应时间影响小，工艺简单；采用墙形电极，具有较高的横向电场，驱动电压可以得到显著降低；不用补偿膜或者盒内延迟片，成本降低；透射区和反射区只有液晶不同，制造工艺及电路驱动简单，可行性强。
附图说明
图1是本发明实施例1中阵列基板上设置墙形电极的液晶盒的结构示意图；
图2是本发明实施例1中真空灌注前的阵列基板与彩膜基板成盒的一种示意图；
图3是本发明实施例1中真空灌注前的阵列基板与彩膜基板成盒的另一种示意图；
图4是本发明实施例1中通过真空毛细作用向液晶盒中灌注不同液晶的示意图。
其中，1：阵列基板；2：墙形电极；A：透射区液晶；C：反射区液晶；T：透射区；F：反射区。
具体实施方式
下面结合附图和实施例，对本发明的具体实施方式作进一步详细描述。以下实施例用于说明本发明，但不用来限制本发明的范围。
实施例1
本实施例所提供的显示装置包括由阵列基板和彩膜基板对盒形成的液晶盒，其中，阵列基板上形成有间隔设置的墙形电极，如图1所示，墙形电极2将彩膜基板上的一行或一列子像素R或G或B隔开，并将每行或每列子像素R或G或B分隔为两行或两列亚子像素，两行或两列亚子像素所在的区域分别形成光线透射区T和光线反射区F，由此在液晶盒内形成多个相邻的与透射区T和反射区F分别对应的沟槽，墙形电极2不仅是透射区T和反射区F的分隔，也可作为信号电极提供很强的横向电场，还能起到支撑液晶盒厚的作用。
本实施例中，透射区T和反射区F所对应的液晶盒厚度相同，所以，透射区T和反射区F所对应的沟槽内分别灌注有参数不同、但满足透射区T和反射区F的光线具有相同的光程差的液晶。优选地，可选择透射区液晶的折射率差是反射区液晶折射率差的两倍，以实现透射区T和反射区F具有相同的光程差，得到良好的光电匹配性，透射区液晶和反射区液晶可以是蓝相模式。
为了满足本实施例显示装置透射式和反射式显示的需要，将液晶盒内的透射区T和反射区F间隔设置，两者面积的比例可以根据实际需要做不同调节。
图2示出了墙形电极行排列，从而将彩膜基板上的子像素分为亚子像素的结构，并进一步示出了阵列基板与彩膜基板成盒的示意图；图3示出了墙形电极列排列，从而将彩膜基板上的子像素分为亚子像素的结构，并进一步示出了阵列基板与彩膜基板成盒的示意图。
实施例2
本实施例提供了一种针对实施例1所述的显示装置的制作方法，其包括以下过程：
首先，在阵列基板上制备墙形电极。
具体为，在阵列基板上涂覆光刻材料，通过掩膜版对其光刻，形成间隔设置的墙形电极，墙形电极将阵列基板上的一行或一列子像素隔开，并将每行或每列子像素分隔为两行或两列亚子像素，两行或两列亚子像素所在的区域分别形成间隔设置的光线透射区和光线反射区。
其次，成盒制屏。
具体为，在彩膜基板上涂覆封框胶，将阵列基板和彩膜基板对盒固化并切割成屏；
最后，灌注液晶，形成显示装置。
具体为，在真空环境下利用毛细作用力向切割后的屏内的透射区和反射区分别灌注透射区液晶和反射区液晶，透射区液晶和反射区液晶的参数不同，满足透射区和反射区的光线具有相同的光程差，优选透射区液晶的折射率差是反射区液晶折射率差的两倍，以实现透射区T和反射区F具有相同的光程差，得到良好的光电匹配性，透射区液晶和反射区液晶可以是蓝相模式；并对透射区和反射区封口，电路组装形成显示装置。
本实施例中，透射区和反射区液晶的灌注技术相当巧妙，首先在墙形电极制作时，实现相邻的墙形电极与阵列基板所形成的沟槽中，透射区与反射区所对应的沟槽的长度不相等，如图4中所示，透射区T所对应的沟槽的长度大于反射区F所对应的沟槽的长度。此时，首先进行透射区T内液晶的灌注，将透射区T所对应的沟槽浸入透射区液晶A中，通过毛细作用力将液晶吸入沟槽，然后用封口胶对透射区T所对应的沟槽封口，并切割至与反射区F所对应的沟槽长度相等；接下来，进行反射区F内液晶的灌注，将反射区F所对应的沟槽浸入反射区液晶C中，通过毛细作用力将液晶吸入沟槽，然后用封口胶对反射区F所对应的沟槽封口，并切割掉部分封口胶，完成透射区T与反射区F内不同液晶的灌注。
显然地，也可以制作成透射区T所对应的沟槽的长度小于反射区F所对应的沟槽的长度，此时按照上述灌注液晶的方式先对反射区F进行液晶灌注，然后对透射区T进行液晶灌注即可。
由以上实施例可以看出，本发明实施例通过在阵列基板上设置墙形电极形成透射区和反射区，并在透射区和反射区灌注参数不同的液晶，以实现显示装置的透射式和反射式显示，不受环境光干扰，可视性强，节能；透射区和反射区盒厚一致，液晶响应时间影响小，工艺简单；采用墙形电极，具有较高的横向电场，驱动电压可以得到显著降低；不用补偿膜或者盒内延迟片，成本降低；透射区和反射区只有液晶不同，制造工艺及电路驱动简单，可行性强。
以上所述仅是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本发明技术原理的前提下，还可以做出若干改进和替换，这些改进和替换也应视为本发明的保护范围。

Claims (8)

1.一种显示装置，包括阵列基板、彩膜基板以及阵列基板和彩膜基板对盒形成的液晶盒，其特征在于，所述阵列基板上形成有墙形电极，所述墙形电极将所述彩膜基板上的一行或一列子像素隔开，同时所述墙形电极还将每行或每列子像素分隔为两行或两列亚子像素，所述两行或两列亚子像素所在的区域分别形成光线透射区和光线反射区，所述光线透射区和光线反射区内灌注的液晶使得透射区和反射区的光线具有相同的光程差；所述透射区内液晶的折射率差是反射区内液晶折射率差的两倍。
2.如权利要求1所述的显示装置，其特征在于，所述透射区和反射区的液晶层厚度相等。
3.如权利要求1所述的显示装置，其特征在于，所述液晶盒内透射区和反射区间隔设置。
4.一种显示装置制作方法，其特征在于，包括以下步骤：
在阵列基板上形成间隔设置的墙形电极，并将阵列基板与彩膜基板对盒形成液晶盒，所述墙形电极将所述彩膜基板上的一行或一列子像素隔开，同时所述墙形电极还将每行或每列子像素分隔为两行或两列亚子像素，所述两行或两列亚子像素所在的区域分别形成光线透射区和光线反射区；
向所述透射区和反射区内分别灌注液晶，使得透射区和反射区的光线具有相同的光程差；
对所述透射区和反射区封口，并电路组装形成显示装置；
其中，所述透射区内液晶的折射率差是反射区内液晶的折射率差的两倍。
5.如权利要求4所述的显示装置制作方法，其特征在于，相邻的所述墙形电极与所述阵列基板形成沟槽，所述透射区与反射区所对应的沟槽的长度不相等。
6.如权利要求5所述的显示装置制作方法，其特征在于，所述透射区液晶和反射区液晶的灌注步骤具体为：
真空环境下，将长度较长的沟槽浸入其要灌注的液晶中，通过毛细作用力将液晶吸入沟槽，然后用封口胶对所述长度较长的沟槽封口，并切割至与长度较短的沟槽长度相等；
再将所述长度较短的沟槽浸入其要灌注的液晶中，通过毛细作用力将液晶吸入沟槽，然后用封口胶对所述长度较短的沟槽封口，并切割掉部分封口胶。
7.如权利要求4所述的显示装置制作方法，其特征在于，所述透射区和反射区的液晶层厚度相等。
8.如权利要求4所述的显示装置制作方法，其特征在于，所述液晶盒内透射区和反射区间隔设置。
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