CN102593110B - Laminated inverted chip packaging structure of ultra-fine spacing welding plates and bottom filling material preparation method - Google Patents

Laminated inverted chip packaging structure of ultra-fine spacing welding plates and bottom filling material preparation method Download PDF

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CN102593110B
CN102593110B CN201210012062.5A CN201210012062A CN102593110B CN 102593110 B CN102593110 B CN 102593110B CN 201210012062 A CN201210012062 A CN 201210012062A CN 102593110 B CN102593110 B CN 102593110B
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chip
conductive
solder
substrate
stacked
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CN102593110A (en
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刘一波
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Samsung Semiconductor China R&D Co Ltd
Samsung Electronics Co Ltd
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Samsung Semiconductor China R&D Co Ltd
Samsung Electronics Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/921Connecting a surface with connectors of different types
    • H01L2224/9212Sequential connecting processes
    • H01L2224/92122Sequential connecting processes the first connecting process involving a bump connector
    • H01L2224/92125Sequential connecting processes the first connecting process involving a bump connector the second connecting process involving a layer connector

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Abstract

The invention discloses a laminated inverted chip packaging structure of ultra-fine spacing welding plates and a preparation method thereof. According to the embodiment of the invention, the laminated inverted chip packaging structure comprises a substrate, a plurality of vertically-stacked chips and a plurality of conducting columns, wherein a plurality of welding plates are arranged on the substrate; one welding plate is arranged on each chip; and the conducting columns are arranged between the chips and the substrate; a part of the conducting columns are vertically stacked together; and the welding plates on the substrate and the welding plates on the chips are electrically connected through the conducting columns. Bottom filling materials are filled in gaps among the chips and gaps between the chips and the substrate and cover solder on each layer and the conducting columns. With the adoption of the laminated inverted chip packaging structure of the ultra-fine spacing welding plates disclosed by the embodiment of the invention, the requirements on the ultra-fine spacing welding plates on the vertically-stacked chips can be satisfied.

Description

超细间距焊盘的叠层倒装芯片封装结构及底填充制造方法Stacked flip-chip packaging structure of ultra-fine pitch pads and underfill manufacturing method

技术领域 technical field

本发明涉及一种叠层倒装芯片封装结构及制造方法,尤其涉及一种超细间距焊盘的叠层倒装芯片小尺寸薄型封装结构及其采用底部填充胶的制造方法。The invention relates to a stacked flip-chip packaging structure and a manufacturing method, in particular to a stacked flip-chip small-sized thin packaging structure with ultra-fine-pitch pads and a manufacturing method using bottom filling glue.

背景技术 Background technique

如图1所示,传统的包含两层倒装芯片的叠层封装结构中,芯片焊盘与基板焊盘之间的互连通常是第二芯片2(位置靠上、距离基板远的芯片)通过较大的球状焊料凸点与基板100焊盘连接,第一芯片1(位置靠下的芯片)通过较小的球状焊料凸点与基板焊盘连接。As shown in Figure 1, in a traditional stacked package structure containing two layers of flip chips, the interconnection between the chip pad and the substrate pad is usually the second chip 2 (the chip that is positioned higher and farther away from the substrate) The larger ball-shaped solder bumps are connected to the pads of the substrate 100 , and the first chip 1 (the lower chip) is connected to the pads of the substrate through smaller ball-shaped solder bumps.

为了克服传统的两层倒装芯片的叠层封装结构中,焊料凸点无法适用于超细间距焊盘的问题,近年来出现了导电柱互连结构,可以在第一芯片1上使用该导电柱互连结构,或者第一芯片1和第二芯片2同时使用导电柱互连结构。In order to overcome the problem that solder bumps cannot be applied to ultra-fine-pitch pads in the traditional two-layer flip-chip stacked packaging structure, a conductive pillar interconnection structure has emerged in recent years, which can be used on the first chip 1. The pillar interconnection structure, or the first chip 1 and the second chip 2 both use the conductive pillar interconnection structure.

如果仅仅将这种新型的导电柱互连使用在第一芯片1上,而第二芯片2仍然使用球状焊料凸点互连时,无法应用于小于150um的超细间距焊盘。If this new type of conductive column interconnection is only used on the first chip 1 and the second chip 2 is still interconnected by ball-shaped solder bumps, it cannot be applied to ultra-fine pitch pads smaller than 150 um.

如果在将导电柱互连同时使用在第一芯片1和第二芯片2上时,存在诸多问题。由于现有技术一般只能做到约70um高度的导电柱,减去芯片表面保护绝缘层以及基板表面绝缘层的厚度之后,芯片与基板之间的间隙d将小于50um(参见图3)。但同时第一芯片1的背面与第二芯片2的表面之间至少需要保留10um的空间(d2)以供连接或者底部填充胶的填充。现有的可以实现量产的芯片减薄技术一般最薄为30um厚度,因此下层芯片1的厚度Tc最少也有30um,导致下层芯片1与基板100之间的间隙d1只剩下不到10um。这种结构目前难以实现。If the conductive pillar interconnection is used on the first chip 1 and the second chip 2 at the same time, there are many problems. Since the existing technology generally can only achieve conductive pillars with a height of about 70um, after subtracting the thickness of the protective insulating layer on the chip surface and the insulating layer on the substrate surface, the gap d between the chip and the substrate will be less than 50um (see Figure 3). But at the same time, at least 10um of space ( d2 ) needs to be reserved between the back surface of the first chip 1 and the surface of the second chip 2 for connection or filling of underfill glue. Existing chip thinning technologies that can be mass-produced generally have a minimum thickness of 30um, so the thickness Tc of the lower chip 1 is at least 30um, resulting in a gap d1 between the lower chip 1 and the substrate 100 that is less than 10um. This structure is currently difficult to implement.

发明内容 Contents of the invention

本发明的目的在于提供一种超细间距焊盘的倒装芯片叠层封装结构,可同时满足上下叠层倒装芯片的超细间距焊盘的要求。The object of the present invention is to provide a flip-chip stacked packaging structure with ultra-fine-pitch pads, which can simultaneously meet the requirements of ultra-fine-pitch pads for upper and lower stacked flip-chips.

为了实现上述目的,根据本发明的实施例,提供了一种叠层倒装芯片封装结构,其中,所述叠层倒装芯片封装结构包括:基板,基板上设置有多个焊盘;上下堆叠的多个芯片,每个芯片上均设置有焊盘;多个导电柱,设置在芯片的焊盘与基板之间,基板焊盘与芯片焊盘之间通过所述多个导电柱进行电连接,所述多个导电柱中的一部分上下堆叠在一起,最上层的芯片通过多层导电柱与基板电连接;底部填充材料,填充在各个芯片之间的间隙中。In order to achieve the above object, according to an embodiment of the present invention, a stacked flip-chip packaging structure is provided, wherein the stacked flip-chip packaging structure includes: a substrate on which a plurality of pads are arranged; stacked up and down A plurality of chips, each chip is provided with a pad; a plurality of conductive columns are arranged between the pads of the chip and the substrate, and the substrate pads and the chip pads are electrically connected through the plurality of conductive columns , some of the plurality of conductive columns are stacked up and down, and the uppermost chip is electrically connected to the substrate through the multi-layer conductive column; the bottom filling material is filled in the gap between the chips.

芯片焊盘上设置的导电柱的层数大于等于位于该芯片下方的芯片焊盘上设置的导电柱的层数。The number of layers of conductive pillars arranged on the chip pad is greater than or equal to the number of layers of conductive pillars arranged on the chip pad below the chip.

最下层的芯片通过一层导电柱与基板电连接。The bottom chip is electrically connected to the substrate through a layer of conductive pillars.

各层芯片均包含有间距小于150um的焊盘。Each layer of chips includes pads with a pitch of less than 150um.

所述多个导电柱包括第一导电柱、第二导电柱和第三导电柱,第二导电柱堆叠在第一导电柱上方,第三导电柱设置在最下层的芯片上。The plurality of conductive columns include a first conductive column, a second conductive column and a third conductive column, the second conductive column is stacked above the first conductive column, and the third conductive column is arranged on the chip at the bottom layer.

第一导电柱和第二导电柱之间、以及第一导电柱和第三导电柱与基板焊盘之间通过焊料连接,焊料包括第一焊料、第二焊料和第三焊料。The connection between the first conductive column and the second conductive column, and between the first conductive column and the third conductive column and the substrate pad is connected by solder, and the solder includes the first solder, the second solder and the third solder.

基板焊盘通过第一焊料与第一导电柱的一端连接,基板焊盘通过第三焊料与第三导电柱一端连接,第一导电柱与第二导电柱之间通过第二焊料连接。The substrate pad is connected to one end of the first conductive column through the first solder, the substrate pad is connected to one end of the third conductive column through the third solder, and the first conductive column is connected to the second conductive column through the second solder.

第一焊料的熔点比第二焊料和第三焊料的熔点高50℃以上。The melting point of the first solder is higher than the melting points of the second solder and the third solder by 50° C. or more.

第一焊料和第二焊料以及第三焊料的材料均为无铅焊料。Materials of the first solder, the second solder and the third solder are lead-free solder.

在该封装结构的用于各层导电柱之间连接以及用于导电柱与基板焊盘连接的所有焊料中,在与各层芯片直接连接的导电柱下端所设的焊料的熔点是最低的。Among all the solders used for the connection between the conductive pillars of each layer and the connection between the conductive pillars and the substrate pads in the package structure, the solder provided at the lower end of the conductive pillars directly connected with the chips of each layer has the lowest melting point.

底部填充材料还填充在芯片与基板之间的间隙中,并包覆了各层焊料和导电柱。The underfill material also fills the gap between the chip and the substrate and coats the various layers of solder and conductive pillars.

第一导电柱和第二导电柱以及第三导电柱的材料都为铜。Materials of the first conductive column, the second conductive column and the third conductive column are all copper.

芯片的焊盘与一部分导电柱之间设有UBM层。A UBM layer is provided between the bonding pad of the chip and a part of the conductive pillars.

根据本发明的另一方面,还提供了一种制造如上所述的叠层倒装芯片封装结构的方法,其中,所述方法包括:将预置有第一导电柱的载体通过回流焊连接到基板上后,分离第一导电柱与载体,使第一导电柱通过第一焊料连接保留在基板焊盘上,将预置有第三导电柱的第一芯片贴装到基板上对应焊盘上,将预置有第二导电柱的第二芯片贴装到基板上对应的第一导电柱上,再次回流焊后使芯片与基板形成互连,然后用底部填充材料填充到芯片与芯片之间的间隙以及芯片与基板之间的间隙中。According to another aspect of the present invention, there is also provided a method for manufacturing the stacked flip-chip package structure as described above, wherein the method includes: connecting the carrier pre-prepared with the first conductive pillar to the After being placed on the substrate, separate the first conductive column from the carrier, make the first conductive column remain on the substrate pad through the first solder connection, and mount the first chip with the third conductive column preset on the corresponding pad on the substrate , attach the second chip with the second conductive column preset on the corresponding first conductive column on the substrate, reflow soldering again to form interconnection between the chip and the substrate, and then fill the gap between the chip and the chip with an underfill material In the gap and the gap between the chip and the substrate.

其中,在载体的表面设置保护层,在分离第一导电柱与载体之前,第一导电柱镀在载体的保护层上。Wherein, a protective layer is provided on the surface of the carrier, and before the first conductive pillar is separated from the carrier, the first conductive pillar is plated on the protective layer of the carrier.

其中,第一导电柱与第一焊料之间的结合力以及第一焊料与基板焊盘之间的结合力大于第一导电柱与载体的保护层之间的结合力。Wherein, the bonding force between the first conductive pillar and the first solder and the bonding force between the first solder and the substrate pad are greater than the bonding force between the first conductive pillar and the protective layer of the carrier.

使用根据本发明的实施例的超细间距焊盘的倒装芯片叠层封装结构,可同时满足上下叠层倒装芯片的超细间距焊盘的要求。The flip-chip stacked packaging structure using the ultra-fine-pitch pads according to the embodiment of the present invention can simultaneously meet the requirements of the ultra-fine-pitch pads of the upper and lower stacked flip-chips.

附图说明 Description of drawings

通过下面结合示例性地示出一例的附图进行的描述,本发明的上述和其他目的和特点将会变得更加清楚,其中:The above and other objects and features of the present invention will become more apparent through the following description in conjunction with the accompanying drawings exemplarily showing an example, wherein:

图1为传统的两层芯片均使用球状焊料凸点的倒装芯片结构示意图;Fig. 1 is a schematic diagram of a flip-chip structure in which a conventional two-layer chip uses spherical solder bumps;

图2为上层的第二芯片使用球状焊料凸点,下层的第一芯片使用导电柱结构示意图;Fig. 2 is a schematic diagram of the structure where the second chip on the upper layer uses ball-shaped solder bumps and the first chip on the lower layer uses conductive pillars;

图3为上下两层芯片均使用单层导电柱的结构示意图;Figure 3 is a structural schematic diagram of a single-layer conductive column used for both the upper and lower layers of chips;

图4为根据本发明的实施例的叠层封装结构的示意图;4 is a schematic diagram of a package-on-package structure according to an embodiment of the present invention;

图5为将预置了第一导电柱的载体贴装到基板上的示意图;Fig. 5 is a schematic diagram of mounting the carrier pre-installed with the first conductive column on the substrate;

图6为预置了第一导电柱的载体与基板在第一次回流后形成连接的示意图;6 is a schematic diagram of the connection between the carrier with the first conductive column and the substrate formed after the first reflow;

图7为将载体与第一导电柱分离的示意图,其中,第一导电柱留在基板焊盘上;7 is a schematic diagram of separating the carrier from the first conductive column, wherein the first conductive column is left on the substrate pad;

图8为将载体与第一导电柱分离后,基板一侧的第一导电柱顶部的示意图;8 is a schematic diagram of the top of the first conductive post on the substrate side after the carrier is separated from the first conductive post;

图9为将载体与第一导电柱分离后,载体一侧的示意图;9 is a schematic diagram of one side of the carrier after the carrier is separated from the first conductive pillar;

图10为将第一芯片贴装到带有第一导电柱的基板上的的对应焊盘位置上的示意图;10 is a schematic diagram of attaching the first chip to the corresponding pad position on the substrate with the first conductive column;

图11为将第二芯片贴装到基板上对应的第一导电柱位置上的示意图;Fig. 11 is a schematic diagram of attaching the second chip to the corresponding position of the first conductive column on the substrate;

图12为第二次回流后形成的第一芯片与基板以及第二芯片与基板的互连示意图;12 is a schematic diagram of the interconnection between the first chip and the substrate and the second chip and the substrate formed after the second reflow;

图13为将底部填充胶填充到第二芯片,第一芯片以及基板之间的间隙的示意图。FIG. 13 is a schematic diagram of filling the gap between the second chip, the first chip and the substrate with the underfill glue.

具体实施方式 Detailed ways

可在本发明中使用诸如“在...下方”、“下层”、“在...上方”、“上层”等空间关系术语来容易地描述图中所示的一个元件或特征与其他元件或特征的关系。应当理解,除了附图中描述的方位以外,空间关系术语还意图包括装置在使用或操作中的不同方位。例如,如果附图中的装置翻转,则被描述为在其他元件或特征“下方”或“之下”的元件的方位随后将被定位在其他元件或特征的“上方”。因此,示例性术语“在...下方”可以包括“在...上方”和“在...下方”两种方位。装置可以位于另外的方位(旋转90度或者在其他方位),进而这里使用的空间关系描述符应该被相应地解释。Spatially relative terms such as "beneath," "lower," "above," "upper," etc. may be used herein to readily describe an element or feature shown in the figures in relation to other elements. or feature relations. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "below" or "beneath" other elements or features would then be oriented "above" the other elements or features. Thus, the exemplary term "below" can encompass both an orientation of "above" and "beneath". The device may be at other orientations (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein should be interpreted accordingly.

以下,参照附图来详细说明本发明的实施例。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

图4为根据本发明的实施例的叠层封装结构示意图。如图4所示,根据本发明的实施例的叠层封装结构包括:基板100,基板100上设置有多个焊盘;上下堆叠的两个芯片1、2(不限于两个,根据本发明的封装结构可以具有上、下堆叠的三个以上的芯片,从下到上可以依次称为第一芯片、第二芯片、第三芯片等),第一芯片1和第二芯片2上均设置有多个焊盘;导电柱,设置在第一芯片1与基板100之间以及第二芯片2与基板100之间,基板焊盘与芯片焊盘之间通过所述导电柱进行电连接。FIG. 4 is a schematic diagram of a package-on-package structure according to an embodiment of the present invention. As shown in FIG. 4 , the package-on-package structure according to the embodiment of the present invention includes: a substrate 100, on which a plurality of pads are arranged; two chips 1, 2 stacked up and down (not limited to two, according to the present invention The packaging structure can have more than three chips stacked up and down, which can be called the first chip, the second chip, the third chip, etc. from bottom to top), and both the first chip 1 and the second chip 2 are set There are a plurality of bonding pads; conductive pillars are arranged between the first chip 1 and the substrate 100 and between the second chip 2 and the substrate 100, and the substrate bonding pads and the chip bonding pads are electrically connected through the conductive pillars.

进一步,根据本发明的一个实施例,第一芯片1比第二芯片2更靠近基板100(也可将第一芯片1描述为在第二芯片2的下方),第一芯片1与基板100之间仅设置有一层第三导电柱5,而第二芯片2的下方可设置有两层导电柱,分别为第一导电柱3和第二导电柱4。Further, according to an embodiment of the present invention, the first chip 1 is closer to the substrate 100 than the second chip 2 (the first chip 1 can also be described as being below the second chip 2), and the distance between the first chip 1 and the substrate 100 is Only one layer of third conductive pillars 5 is arranged between them, while two layers of conductive pillars may be arranged below the second chip 2, which are first conductive pillars 3 and second conductive pillars 4 respectively.

如果该叠层封装结构包括更多的芯片,位置越靠上方的芯片可通过更多层的导电柱与基板连接。根据本发明的实施例,至少最上层的芯片通过多层导电柱与基板电连接。任一层芯片的焊盘上设置的导电柱的层数大于等于位于该层芯片下方的芯片设置的导电柱的层数。If the package-on-package structure includes more chips, the chips located higher above can be connected to the substrate through more layers of conductive pillars. According to an embodiment of the present invention, at least the uppermost chip is electrically connected to the substrate through multi-layer conductive pillars. The number of layers of conductive pillars arranged on the bonding pads of any layer of chips is greater than or equal to the number of layers of conductive pillars arranged on chips below this layer of chips.

导电柱截面形状可以为方形或者圆形,并无特别要求。The cross-sectional shape of the conductive pillar can be square or circular, and there is no special requirement.

第一芯片1与第二芯片2均包含有间距小于150um的超细间距焊盘。基板焊盘通过第一焊料6与第一导电柱3一端连接,第一导电柱3另一端通过第二焊料7与第二导电柱4连接,第二导电柱4另一端与第二芯片2的焊盘连接。Both the first chip 1 and the second chip 2 include ultra-fine-pitch pads with a pitch less than 150um. The substrate pad is connected to one end of the first conductive column 3 through the first solder 6, the other end of the first conductive column 3 is connected to the second conductive column 4 through the second solder 7, and the other end of the second conductive column 4 is connected to the second chip 2. pad connection.

基板焊盘通过第三焊料8与第三导电柱5一端连接,第三导电柱5另一端与第一芯片1的焊盘连接。The substrate pad is connected to one end of the third conductive pillar 5 through the third solder 8 , and the other end of the third conductive pillar 5 is connected to the pad of the first chip 1 .

底部填充材料12填充到了芯片与基板100之间的间隙中,并包覆了第一焊料6,第一导电柱3,第二焊料7,第二导电柱4,第三焊料8,第三导电柱5。The underfill material 12 is filled into the gap between the chip and the substrate 100, and covers the first solder 6, the first conductive pillar 3, the second solder 7, the second conductive pillar 4, the third solder 8, the third conductive Column 5.

另外,在基板的底部表面可以分布有焊球,以与其他元器件电连接。In addition, solder balls may be distributed on the bottom surface of the substrate for electrical connection with other components.

第一导电柱材料3和第二导电柱4以及第三导电柱5的材料都可为Cu。The material of the first conductive pillar material 3 , the second conductive pillar 4 and the third conductive pillar 5 can be Cu.

第一和第二以及第三焊料材料都可为无铅(即,铅含量必须减少到低于1000ppm的水平)。Both the first and second and third solder materials may be lead-free (ie, the lead content must be reduced to levels below 1000 ppm).

第二芯片2和/或第一芯片1的焊盘与部分导电柱之间有UBM层10(凸点底层金属层,under bump metal)。UBM层可以保证凸缘与焊盘的粘贴性并防止金属间的相互扩散。There is a UBM layer 10 (under bump metal) between the pads of the second chip 2 and/or the first chip 1 and some conductive pillars. The UBM layer can ensure the adhesion between the flange and the pad and prevent the interdiffusion between metals.

第一焊料6的熔点可以比第二焊料4和第三焊料8的熔点高50℃或更多。The melting point of the first solder 6 may be 50° C. or more higher than the melting points of the second solder 4 and the third solder 8 .

图5-图13示出了根据本发明的实施例的超细间距焊盘的倒装芯片叠层封装结构的制造方法。5-13 illustrate a method for manufacturing a flip-chip stacked packaging structure with ultra-fine-pitch pads according to an embodiment of the present invention.

图5为将预置了第一导电柱的载体贴装到基板上的示意图;图6为预置了第一导电柱的载体与基板在第一次回流后形成连接的示意图;图7为将载体与第一导电柱分离的示意图,其中,第一导电柱留在基板焊盘上。Fig. 5 is a schematic diagram of attaching the carrier with the first conductive column to the substrate; Fig. 6 is a schematic diagram of the connection between the carrier with the first conductive column and the substrate after the first reflow; Fig. 7 is the A schematic diagram of the separation of the carrier from the first conductive pillar, wherein the first conductive pillar remains on the substrate bonding pad.

如图5所示,将预置有第一导电柱3和第一焊料6的导电柱载体9贴装到基板上。现有成熟的倒装芯片凸点制作工艺可以实现在载体9上逐次镀上导电柱和焊料,具体地说,在载体9的表面预先设置不与金属产生冶金结合的保护层,如涂敷聚酰亚胺等高分子涂层后,再进行倒装芯片凸点制作工艺,可以使第一导电柱3与载体9的保护层之间维持极低结合力。再通过回流焊等工艺形成第一焊料6与第一导电柱3之间的牢固的冶金结合。As shown in FIG. 5 , the conductive column carrier 9 pre-prepared with the first conductive column 3 and the first solder 6 is mounted on the substrate. The existing mature flip-chip bump manufacturing process can realize successive plating of conductive pillars and solder on the carrier 9. Specifically, a protective layer that does not produce metallurgical bonding with the metal is pre-set on the surface of the carrier 9, such as coating poly After polymer coating such as imide, the flip-chip bump manufacturing process can be performed to maintain a very low bonding force between the first conductive pillar 3 and the protective layer of the carrier 9 . A strong metallurgical bond between the first solder 6 and the first conductive pillar 3 is then formed through processes such as reflow soldering.

接着,如图6所示,再次进行回流后,使带有第一导电柱3和第一焊料6的载体9与基板100形成焊料连接。Next, as shown in FIG. 6 , after reflowing again, the carrier 9 with the first conductive pillar 3 and the first solder 6 is connected to the substrate 100 by solder.

如图7所示,分离载体9与第一导电柱3。具体地说,经过回流焊工艺后,第一导电柱3与第一焊料6之间,以及第一焊料6与基板焊盘之间,都形成了牢固的冶金结合,它们之间的结合力远远大于第一导电柱3与载体9的保护层之间的结合力,这样就很容易实现第一导电柱3与载体9之间的分离,使得第一导电柱3保留在基板焊盘上。图8为将载体与第一导电柱3分离后,基板一侧的第一导电柱3顶部的示意图,图9为将载体9与第一导电柱3分离后,载体9一侧的示意图。图8和图9仅是一个示例,第一导电柱3的分布并不限于图8和图9示出的形状。As shown in FIG. 7 , the carrier 9 and the first conductive pillar 3 are separated. Specifically, after the reflow soldering process, a firm metallurgical bond is formed between the first conductive pillar 3 and the first solder 6, and between the first solder 6 and the substrate pad, and the bonding force between them is far Far greater than the bonding force between the first conductive pillar 3 and the protective layer of the carrier 9, it is easy to realize the separation between the first conductive pillar 3 and the carrier 9, so that the first conductive pillar 3 remains on the substrate pad. 8 is a schematic view of the top of the first conductive post 3 on the substrate side after the carrier is separated from the first conductive post 3 , and FIG. 9 is a schematic view of the carrier 9 side after the carrier 9 is separated from the first conductive post 3 . FIG. 8 and FIG. 9 are just an example, and the distribution of the first conductive pillars 3 is not limited to the shapes shown in FIG. 8 and FIG. 9 .

图10为将第一芯片贴装到带有第一导电柱的基板上的的对应焊盘位置上的示意图;图11为将第二芯片贴装到基板上对应的第一导电柱位置上的示意图;图12为第二次回流后形成的第一芯片与基板以及第二芯片与基板的互连示意图;图13为将底部填充胶填充到第二芯片,第一芯片以及基板之间的间隙的示意图。Figure 10 is a schematic diagram of attaching the first chip to the corresponding pad position on the substrate with the first conductive column; Figure 11 is a schematic diagram of attaching the second chip to the corresponding first conductive column position on the substrate Schematic diagram; Figure 12 is a schematic diagram of the interconnection between the first chip and the substrate and the second chip and the substrate formed after the second reflow; Figure 13 is the filling of the underfill into the gap between the second chip, the first chip and the substrate schematic diagram.

如图10-13所示,将预置了第三导电柱5的第一芯片1贴装到带有第一导电柱3的基板上。然后将预置了第二导电柱4的第二芯片2贴装到带有第一导电柱3的基板上,贴装过程应该注意对齐导电柱。经回流焊后,芯片1、芯片2的焊盘与基板的焊盘形成互连。As shown in FIGS. 10-13 , the first chip 1 pre-prepared with the third conductive pillars 5 is mounted on the substrate with the first conductive pillars 3 . Then the second chip 2 with the second conductive pillars 4 pre-installed is mounted on the substrate with the first conductive pillars 3 , and the mounting process should pay attention to the alignment of the conductive pillars. After reflow soldering, the bonding pads of the chips 1 and 2 are interconnected with the bonding pads of the substrate.

为了避免第一焊料6在该回流焊的过程中融化导致第一导电柱3歪斜而不能与第二导电柱4对齐,可能需要使第一焊料6的熔点比第二焊料4和第三焊料8的熔点高50℃或更多。In order to avoid the melting of the first solder 6 during the reflow soldering process and cause the first conductive column 3 to be skewed and unable to be aligned with the second conductive column 4, it may be necessary to make the melting point of the first solder 6 higher than that of the second solder 4 and the third solder 8. The melting point is 50°C or more higher.

最后用底部填充材料填充到了各个芯片之间的间隙中,还填充到了芯片与基板之间的间隙中,并包覆第一焊料6,第一导电柱3,第二焊料7,第二导电柱4,第三焊料8,第三导电柱5,从而最终成型。Finally, the underfill material is used to fill the gap between each chip, and also fill the gap between the chip and the substrate, and cover the first solder 6, the first conductive column 3, the second solder 7, and the second conductive column. 4. The third solder 8, the third conductive pillar 5, so as to be finally formed.

如果需要制作三层或者更多层芯片的叠层封装结构,则在基板上需要叠置多层的导电柱,然后依次放置第一芯片、第二芯片、第三芯片、第四芯片,依此类推,最后填充底部填充料。这其中要经历多道回流工艺,根据前面所述的原因知道,在与各层芯片直接连接的导电柱上所设的焊料的熔点在所有焊料中是最低的,因为它们处于最后的回流工序中。If it is necessary to make a stacked package structure of three or more layers of chips, it is necessary to stack multiple layers of conductive pillars on the substrate, and then place the first chip, the second chip, the third chip, and the fourth chip in sequence, and so on. By analogy, the underfill is filled last. This involves going through multiple reflow processes. According to the reasons mentioned above, the melting point of the solder set on the conductive pillars directly connected to each layer of chips is the lowest among all solders, because they are in the final reflow process. .

另外,在基板的底部表面可以分布有焊球,以与其他元器件电连接。In addition, solder balls may be distributed on the bottom surface of the substrate for electrical connection with other components.

虽然上面已经详细描述了本发明的示例性实施例,但本发明所属技术领域中具有公知常识者在不脱离本实用新型的精神和范围内,可对本发明的实施例做出各种的修改、润饰和变型。但是应当理解,在本领域技术人员看来,这些修改、润饰和变型仍将落入权利要求所限定的本发明的示例性实施例的精神和范围内。Although the exemplary embodiment of the present invention has been described in detail above, those with common knowledge in the technical field of the present invention can make various modifications, Retouch and Transform. However, it should be understood that such modifications, modifications and variations will still fall within the spirit and scope of the exemplary embodiments of the present invention as defined by the appended claims.

最后,除非这里指出或者另外与上下文明显矛盾,否则这里描述的所有方法的步骤可以以任意合适的顺序执行。Finally, the steps of all methods described herein can be performed in any suitable order unless otherwise indicated herein or otherwise clearly contradicted by context.

Claims (14)

1.一种叠层倒装芯片封装结构,其中,所述叠层倒装芯片封装结构包括:1. A stacked flip-chip packaging structure, wherein the stacked flip-chip packaging structure comprises: 基板,基板上设置有多个焊盘;a substrate, a plurality of pads are arranged on the substrate; 上下堆叠的多个芯片,每个芯片上均设置有焊盘,各层芯片均包含有间距小于150um的焊盘;Multiple chips stacked up and down, each chip is provided with pads, and each layer of chips contains pads with a spacing of less than 150um; 多个导电柱,设置在芯片的焊盘与基板之间,基板焊盘与芯片焊盘之间通过所述多个导电柱进行电连接,所述多个导电柱中的一部分上下堆叠在一起,最上层的芯片通过多层导电柱与基板电连接;A plurality of conductive columns are arranged between the pads of the chip and the substrate, the substrate pads and the chip pads are electrically connected through the plurality of conductive columns, some of the plurality of conductive columns are stacked up and down, The uppermost chip is electrically connected to the substrate through multi-layer conductive pillars; 底部填充材料,填充在各个芯片之间的间隙中,Underfill material, which fills the gaps between individual chips, 其中,相互堆叠的导电柱之间通过焊料进行连接,在该封装结构的用于各层导电柱之间连接以及用于导电柱与基板焊盘连接的所有焊料中,在与各层芯片直接连接的导电柱下端所设的焊料的熔点是最低的。Among them, the conductive pillars stacked on each other are connected by solder. Among all the solders used for the connection between the conductive pillars of each layer and for the connection between the conductive pillars and the substrate pads of the package structure, the direct connection with the chips of each layer The melting point of the solder provided at the lower end of the conductive post is the lowest. 2.根据权利要求1所述的叠层倒装芯片封装结构,其中,2. The stacked flip-chip packaging structure according to claim 1, wherein, 芯片焊盘上设置的导电柱的层数大于等于位于该芯片下方的芯片焊盘上设置的导电柱的层数。The number of layers of conductive pillars arranged on the chip pad is greater than or equal to the number of layers of conductive pillars arranged on the chip pad below the chip. 3.根据权利要求1或2所述的叠层倒装芯片封装结构,其中,3. The stacked flip-chip packaging structure according to claim 1 or 2, wherein, 最下层的芯片通过一层导电柱与基板电连接。The bottom chip is electrically connected to the substrate through a layer of conductive pillars. 4.根据权利要求1或2所述的叠层倒装芯片封装结构,所述多个导电柱包括第一导电柱、第二导电柱和第三导电柱,第二导电柱堆叠在第一导电柱上方,第三导电柱设置在最下层的芯片上。4. The stacked flip-chip packaging structure according to claim 1 or 2, the plurality of conductive pillars include a first conductive pillar, a second conductive pillar and a third conductive pillar, and the second conductive pillar is stacked on the first conductive pillar Above the pillars, a third conductive pillar is disposed on the bottommost chip. 5.根据权利要求4所述的叠层倒装芯片封装结构,其中,5. The stacked flip-chip packaging structure according to claim 4, wherein, 第一导电柱和第二导电柱之间、以及第一导电柱和第三导电柱与基板焊盘之间通过焊料连接,焊料包括第一焊料、第二焊料和第三焊料。The connection between the first conductive column and the second conductive column, and between the first conductive column and the third conductive column and the substrate pad is connected by solder, and the solder includes the first solder, the second solder and the third solder. 6.根据权利要求5所述的叠层倒装芯片封装结构,其中,6. The stacked flip-chip packaging structure according to claim 5, wherein, 基板焊盘通过第一焊料与第一导电柱的一端连接,基板焊盘通过第三焊料与第三导电柱一端连接,第一导电柱与第二导电柱之间通过第二焊料连接。The substrate pad is connected to one end of the first conductive column through the first solder, the substrate pad is connected to one end of the third conductive column through the third solder, and the first conductive column is connected to the second conductive column through the second solder. 7.根据权利要求5或6所述的叠层倒装芯片封装结构,其中,7. The stacked flip-chip packaging structure according to claim 5 or 6, wherein, 第一焊料的熔点比第二焊料和第三焊料的熔点高50℃以上。The melting point of the first solder is higher than the melting points of the second solder and the third solder by 50° C. or more. 8.根据权利要求5或6所述的叠层倒装芯片封装结构,其中,8. The stacked flip-chip packaging structure according to claim 5 or 6, wherein, 第一焊料和第二焊料以及第三焊料的材料均为无铅焊料。Materials of the first solder, the second solder and the third solder are lead-free solder. 9.根据权利要求1或2所述的叠层倒装芯片封装结构,其中,9. The stacked flip-chip packaging structure according to claim 1 or 2, wherein, 底部填充材料还填充在芯片与基板之间的间隙中,并包覆了各层焊料和导电柱。The underfill material also fills the gap between the chip and the substrate and coats the various layers of solder and conductive pillars. 10.根据权利要求1或2所述的叠层倒装芯片封装结构,其中,10. The stacked flip-chip package structure according to claim 1 or 2, wherein, 第一导电柱和第二导电柱以及第三导电柱的材料都为铜。Materials of the first conductive column, the second conductive column and the third conductive column are all copper. 11.根据权利要求1或2所述的叠层倒装芯片封装结构,其中,11. The stacked flip-chip package structure according to claim 1 or 2, wherein, 芯片的焊盘与一部分导电柱之间设有UBM层。A UBM layer is provided between the bonding pad of the chip and a part of the conductive pillars. 12.一种制造如权利要求1-11中任一项所述的叠层倒装芯片封装结构的方法,其中,所述方法包括:12. A method of manufacturing the stacked flip-chip package structure according to any one of claims 1-11, wherein the method comprises: 将预置有第一导电柱的载体通过回流焊连接到基板上后,分离第一导电柱与载体,使第一导电柱通过第一焊料连接保留在基板焊盘上,After the carrier pre-installed with the first conductive column is connected to the substrate by reflow soldering, the first conductive column is separated from the carrier, so that the first conductive column remains on the substrate pad through the first solder connection, 将预置有第三导电柱的第一芯片贴装到基板上对应焊盘上,将预置有第二导电柱的第二芯片贴装到基板上对应的第一导电柱上,再次回流焊后使芯片与基板形成互连,Attach the first chip with the third conductive column preset on the corresponding pad on the substrate, attach the second chip with the second conductive column preset on the corresponding first conductive column on the substrate, and reflow soldering again After that, the chip and the substrate are interconnected, 然后用底部填充材料填充到芯片与芯片之间的间隙以及芯片与基板之间的间隙中。The chip-to-chip gap and the chip-to-substrate gap are then filled with an underfill material. 13.根据权利要求12所述的方法,其中,在载体的表面设置保护层,在分离第一导电柱与载体之前,第一导电柱镀在载体的保护层上。13. The method according to claim 12, wherein a protective layer is provided on the surface of the carrier, and before the first conductive pillar is separated from the carrier, the first conductive pillar is plated on the protective layer of the carrier. 14.根据权利要求13所述的方法,其中,第一导电柱与第一焊料之间的结合力以及第一焊料与基板焊盘之间的结合力大于第一导电柱与载体的保护层之间的结合力。14. The method according to claim 13, wherein the bonding force between the first conductive post and the first solder and the bonding force between the first solder and the substrate pad are greater than that between the first conductive post and the protective layer of the carrier. inter-cohesion.
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