CN102540575A - Exposing device and exposing method - Google Patents
Exposing device and exposing method Download PDFInfo
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- CN102540575A CN102540575A CN2011103646835A CN201110364683A CN102540575A CN 102540575 A CN102540575 A CN 102540575A CN 2011103646835 A CN2011103646835 A CN 2011103646835A CN 201110364683 A CN201110364683 A CN 201110364683A CN 102540575 A CN102540575 A CN 102540575A
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- light beam
- exposing
- light
- alignment film
- substrate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
- G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Light deflection components (2b, 2c) or light deflection components (2d, 2e) or light deflection components (2f, 2g, 2h, 2i) or light deflection components (2j, 2k) are arranged at an upper surface or a lower surface of a light cover (2), an exposing light beam obliquely irradiates from the light cover (2) to a substrate (1), the light deflection components (2b, 2c) or the light deflection components (2d, 2e) or the light deflection components (2f, 2g, 2h, 2i) or the light deflection components (2j, 2k) enable the exposing light beam irradiated from an exposing light beam irradiating device (30) to pass through, and enables a heading of the exposing light beam to be oblique. And the light deflection components (2b, 2c) or the light deflection components (2d, 2e) or the light deflection components (2f, 2g, 2h, 2i) or the light deflection components (2j, 2k) enable the heading of the exposing light beam irradiated from the exposing light beam irradiating device (30) to be oblique in different directions.
Description
Technical field
The present invention relates to a kind of exposure device and exposure method of alignment film; In the manufacture process of liquid crystal indicator; With the exposing light beam illuminating of linear polarization to the alignment film that comprises macromolecular compound; Make alignment film produce the orientation characteristic of the orientation of adjustment liquid crystal, The present invention be more particularly directed to the exposure device and the exposure method of following alignment film, use in the alignment film of photomask (photomask) (below be called " light shield ") on a substrate and form a plurality of different orientations zone.
Background technology
Liquid crystal is enclosed to thin film transistor (TFT) (Thin Film Transistor; TFT) between substrate and colored filter (color filter) substrate; Thereby make the liquid crystal indicator of active matrix (active matrix) type of drive; On the surface of TFT substrate and colored filter substrate, be formed with alignment film in order to the orientation of adjustment liquid crystal.In the past, carry out following processing by " friction (rubbing) method ", said " rubbing manipulation " utilizes cloth to come wiping is carried out on the surface of alignment film; Said processing makes alignment film produce the orientation characteristic of the orientation of adjustment liquid crystal; But in recent years, developed " light orientation method ", should " light orientation method " ultraviolet lighting of linear polarization be incident upon the alignment film of the macromolecular compound that comprises polyimide etc.; The macromolecular chain of polarization direction is reacted, thereby produce anisotropy.
Disclose in the patent documentation 1 following technology is arranged; That is,, display quality is improved for the angle of visibility that makes liquid crystal indicator enlarges; And contrast (contrast) is improved; At double team on a pair of substrate of liquid crystal layer, the alignment film on each substrate is divided into pre-tilt (pretilt) direction respectively differs two about 180 ° orientation zones, so that the regional border of the border in the zone of the orientation on substrate and the orientation on another substrate mode of quadrature roughly; Make two baseplate-laminatings, thereby form the zone of four orientation states.
[prior art document]
[patent documentation]
[patent documentation 1] japanese patent laid-open 11-352486 communique
Of patent documentation 1, in order to form a plurality of different orientations zone in the alignment film on a substrate, must expose to each orientation zone obliquely with the ultraviolet light of linear polarization from different directions.In addition, in order to be made public in each orientation zone the light shield that need the zone beyond the orientation zone of exposure be covered.
In the past; In photoetching (photolithography) technology employed near (proximity) exposure device in; Above light shield, be provided with the exposing light beam illuminating device; Vertically exposing light beam is exposed to light shield from the exposing light beam illuminating device, said is between light shield and substrate, to be provided with small gap (near gap (proximity gap)) near exposure device, and the pattern (pattern) of light shield is transferred to substrate.For the exposure device that alignment film is made public; If use with near the identical formation of exposure device; Exposing light beam is exposed to light shield from the exposing light beam illuminating device obliquely, and the zone that then exposing light beam passed through can enlarge significantly, needs large space in the device.
In addition; Can't the direction of illumination of exposing light beam be changed in the past near employed exposing light beam illuminating device in the exposure device; Therefore; In order to form a plurality of different orientations zone in the alignment film on a substrate, must be when being made public in each orientation zone at every turn, with substrate after anchor clamps (chuck) dismounting, make substrate towards rotation.Therefore, have following problem, that is, the working time, (tact time) was elongated, and output (throughput) descends.
Summary of the invention
Problem of the present invention is: exposing light beam is exposed to alignment film and the zone that do not make exposing light beam and passed through enlarges significantly obliquely.In addition, problem of the present invention is: when forming a plurality of different orientations zone in the alignment film on a substrate, shortened the working time, thereby output is improved.
The exposure device of alignment film of the present invention comprises: supporting the anchor clamps of substrate, the light shield fixed mount (mask holder) that is keeping light shield and the exposing light beam illuminating device that irradiates the exposing light beam of linear polarization; Small gap is set between light shield and substrate; The exposing light beam of the linear polarization that will irradiate from said exposing light beam illuminating device exposes to substrate via light shield; Make the alignment film of coating substrate produce the orientation characteristic of the orientation of adjustment liquid crystal; In the exposure device of alignment film, light deflection element is arranged at the upper surface or the lower surface of light shield, exposing light beam is exposed to substrate from light shield obliquely; Said light deflection element sees through the exposing light beam that irradiates from the exposing light beam illuminating device, and the working direction of exposing light beam is tilted.
In addition; The exposure method of alignment film of the present invention is to utilize anchor clamps supporting substrate, utilizes the light shield fixed mount keeping light shield, and small gap is set between light shield and substrate; The exposing light beam of the linear polarization that will irradiate from the exposing light beam illuminating device exposes to substrate via light shield; Make the alignment film of coating substrate produce the orientation characteristic of the orientation of adjustment liquid crystal, light deflection element is arranged at the upper surface or the lower surface of light shield, exposing light beam is exposed to substrate from light shield obliquely; Said light deflection element sees through the exposing light beam that irradiates from the exposing light beam illuminating device, and the working direction of exposing light beam is tilted.
Light deflection element is arranged at the upper surface or the lower surface of light shield; Exposing light beam is exposed to substrate from light shield obliquely, and said light deflection element sees through the exposing light beam that irradiates from the exposing light beam illuminating device, and the working direction of exposing light beam is tilted; Therefore; With directly exposing light beam is compared from the situation that the exposing light beam illuminating device exposes to light shield obliquely, the zone that exposing light beam passed through can not enlarge significantly, exposing light beam shines to alignment film obliquely.
And; The exposure device of alignment film of the present invention is upper surface or the lower surface that the light deflection element of a plurality of kinds is arranged at light shield, and various light deflection elements tilt the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device respectively to different directions.In addition; The exposure method of alignment film of the present invention is upper surface or the lower surface that the light deflection element of a plurality of kinds is arranged at light shield, and the light deflection element of said a plurality of kinds tilts the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device respectively to different directions.The light deflection element of a plurality of kinds is arranged at the upper surface or the lower surface of light shield; The light deflection element of said a plurality of kinds tilts the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device respectively to different directions; Therefore; Exposing light beam exposes to substrate from light shield obliquely simultaneously from different directions.Therefore; When forming a plurality of different orientations zone in the alignment film on a substrate, need not at every turn when made public in each orientation zone, with substrate after anchor clamps are removed, make substrate towards rotation; Can form a plurality of different orientations zone simultaneously; Therefore, the working time shortens, and output improves.
And the exposure device of alignment film of the present invention is the lower surface that two kinds of light deflection elements is arranged at light shield, and various light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 180 degree each other.In addition; The exposure method of alignment film of the present invention is the lower surface that two kinds of light deflection elements is arranged at light shield, and said two kinds of light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 180 degree each other.Two kinds of light deflection elements are arranged at the lower surface of light shield; Said two kinds of light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 180 degree each other; Therefore, exposing light beam from roughly differing the direction of 180 degree, exposes to substrate from light shield respectively obliquely simultaneously; In the alignment film on a substrate, form two kinds of orientation zones that the pre-tilt direction roughly differs 180 degree simultaneously.
Perhaps, the exposure device of alignment film of the present invention is the lower surface that four kinds of light deflection elements is arranged at light shield, and various light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 90 degree each other.In addition; The exposure method of alignment film of the present invention is the lower surface that four kinds of light deflection elements is arranged at light shield, and said four kinds of light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 90 degree each other.Four kinds of light deflection elements are arranged at the lower surface of light shield; Said four kinds of light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 90 degree each other; Therefore, exposing light beam from roughly differing the direction of 90 degree, exposes to substrate from light shield respectively obliquely simultaneously; In the alignment film on a substrate, form four kinds of orientation zones that the pre-tilt direction roughly differs 90 degree simultaneously.
Perhaps, the exposure device of alignment film of the present invention is the lower surface that two kinds of light deflection elements is arranged at light shield, and various light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 90 degree each other.In addition; The exposure method of alignment film of the present invention is the lower surface that two kinds of light deflection elements is arranged at light shield, and said two kinds of light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 90 degree each other.Two kinds of light deflection elements are arranged at the lower surface of light shield; Said two kinds of light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 90 degree each other; Therefore, exposing light beam from roughly differing the direction of 90 degree, exposes to substrate from light shield respectively obliquely simultaneously; In the alignment film on a substrate, form two kinds of orientation zones that the pre-tilt direction roughly differs 90 degree simultaneously.
And in the exposure device of alignment film of the present invention, light deflection element is transmission-type (blazed) diffraction grating that glitters, and the section shape of this transmission-type blazed diffraction grating groove is a zigzag.In addition, to be to use the section shape of groove be that jagged transmission-type blazed diffraction grating is as light deflection element to the exposure method of alignment film of the present invention.Use the transmission-type blazed diffraction grating as light deflection element, whereby, the loss of the exposing light beam when seeing through light deflection element is few.
[effect of invention]
According to the present invention; Light deflection element is arranged at the upper surface or the lower surface of light shield; Exposing light beam is exposed to substrate from light shield obliquely, and said light deflection element sees through the exposing light beam that irradiates from the exposing light beam illuminating device, and the working direction of exposing light beam is tilted; Whereby, can exposing light beam be exposed to alignment film and the zone that exposing light beam is passed through enlarges significantly obliquely.
And; According to the present invention, the light deflection element of a plurality of kinds is arranged at the upper surface or the lower surface of light shield, the light deflection element of said a plurality of kinds tilts the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device respectively to different directions; Whereby; When forming a plurality of different orientations zone in the alignment film on a substrate, the working time is shortened, thereby output is improved.
And; According to the present invention; Two kinds of light deflection elements are arranged at the lower surface of light shield, and said two kinds of light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 180 degree each other, whereby; Can in the alignment film on the substrate, form two kinds of orientation zones that the pre-tilt direction roughly differs 180 degree simultaneously.
Perhaps; According to the present invention; Four kinds of light deflection elements are arranged at the lower surface of light shield, and said four kinds of light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 90 degree each other, whereby; Can in the alignment film on the substrate, form four kinds of orientation zones that the pre-tilt direction roughly differs 90 degree simultaneously.
Perhaps; According to the present invention; Two kinds of light deflection elements are arranged at the lower surface of light shield, and said two kinds of light deflection elements make the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device tilt towards the direction that roughly differs 90 degree each other, whereby; Can in the alignment film on the substrate, form two kinds of orientation zones that the pre-tilt direction roughly differs 90 degree simultaneously.
And, according to the present invention, use the transmission-type blazed diffraction grating as light deflection element, whereby, the loss of the exposing light beam in the time of can making through light deflection element reduces.
Description of drawings
Fig. 1 is the figure that the summary of exposure device of the alignment film of expression an embodiment of the invention constitutes.
Fig. 2 comes from the top figure that observation post sees is carried out in the configuration of first level crossing, concave mirror and second level crossing.
Fig. 3 (a) is the top view of the light shield of an embodiment of the invention.
Fig. 3 (b) is the sectional view of the A-A part of Fig. 3 (a).
Fig. 3 (c) is the sectional view of the B-B part of Fig. 3 (a).
Fig. 4 (a) is the backplan of the light shield of other embodiment of the present invention,
Fig. 4 (b) is the sectional view of the C-C part of Fig. 4 (a).
Fig. 4 (c) is the sectional view of the D-D part of Fig. 4 (a).
Fig. 5 (a) is the backplan of the light shield of another embodiment of the present invention.
Fig. 5 (b) is the sectional view of the E-E part of Fig. 5 (a).
Fig. 5 (c) is the sectional view of the F-F part of Fig. 5 (a).
Fig. 6 (a) is the backplan of the light shield of another embodiment of the present invention.
Fig. 6 (b) is the sectional view of the G-G part of Fig. 6 (a).
Fig. 6 (c) is the sectional view of the H-H part of Fig. 6 (a).
1: substrate 2: light shield
2a: pattern
2b, 2c, 2d, 2e, 2f, 2g, 2h, 2i, 2j, 2k: light deflection element
3: pedestal 4:X guiding piece
5:X platform 6:Y guiding piece
7:Y platform 8: theta stage
9: fixture support platform 10: anchor clamps
20: light shield fixed mount 30: the exposing light beam illuminating device
31: lamp 32: condenser
Level crossing 34 in 33: the first: lens group
35: retaining door 36: polarization element
37: 38: the second level crossings of concave mirror
40: light source control device 41: power supply
60: platform driving circuit 70: main control unit
A-A, B-B, C-C, D-D, E-E, F-F, G-G, H-H: part
X, Y, Z, θ: direction
Embodiment
Fig. 1 is the figure that the summary of exposure device of the alignment film of expression an embodiment of the invention constitutes.Exposure device comprises: pedestal (base) 3, X guiding piece (guide) 4, X platform (stage) 5, Y guiding piece 6, Y platform 7, theta stage 8, fixture support platform 9, anchor clamps 10, light shield fixed mount 20, exposing light beam illuminating device 30, light source control device 40, platform driving circuit 60 and main control unit 70.Exposure device is except comprising said member; Also comprise substrate transferring mechanical arm (robot), temperature control unit (unit) etc.; Said substrate transferring mechanical arm moves into substrate 1 to anchor clamps 10; And substrate 1 is taken out of from anchor clamps 10, and said temperature control unit is managed the temperature in installing.
Moreover, below XY direction in the illustrated embodiment be illustration, also can change directions X and Y direction.
Among Fig. 1, anchor clamps 10 are positioned at the exposure position that the alignment film to substrate 1 makes public.In loading (load)/unloading (unload) position, by not shown substrate transferring mechanical arm substrate 1 is moved into to anchor clamps 10, and substrate 1 is taken out of from anchor clamps 10 away from exposure position.Use is arranged at a plurality of knock pins (pin) of anchor clamps 10, and substrate 1 is loaded into anchor clamps 10 and from anchor clamps 10, unloads carried base board 1.Knock pin is accommodated in the inside of anchor clamps 10; Said knock pin rises from the inside of anchor clamps 10, and when substrate 1 was loaded into anchor clamps 10, said knock pin was accepted substrate 1 from the substrate transferring mechanical arm; When anchor clamps 10 unload carried base board 1, said knock pin is delivered to the substrate transferring mechanical arm with substrate 1.Vacuum suction is carried out at the back side of 10 pairs of substrates 1 of anchor clamps, thereby is supporting the back side of this substrate 1.The surfaces coated of substrate 1 is furnished with the alignment film of the macromolecular compound that comprises polyimide etc.
Anchor clamps 10 are equipped on theta stage 8 via fixture support platform 9, below theta stage 8, are provided with Y platform 7 and X platform 5.X platform 5 is equipped on X guiding piece 4 set on the pedestal 3, and moves to directions X (the accompanying drawing depth direction of Fig. 1) along X guiding piece 4.Y platform 7 is equipped on Y guiding piece 6 set on the X platform 5, and moves to Y direction (the accompanying drawing transverse direction of Fig. 1) along Y guiding piece 6.Theta stage 8 is equipped on Y platform 7, and rotates to the θ direction.Fixture support platform 9 is equipped on theta stage 8, and is supporting anchor clamps 10 at a plurality of positions.Be provided with the not shown driving mechanism of ball screw (ball screw) and motor (motor) or linear motor (linear motor) etc. in X platform 5, Y platform 7 and the theta stage 8, each driving mechanism is to be driven by platform driving circuit 60.
X platform 5 moves and Y platform 7 moves to the Y direction to directions X, and anchor clamps 10 are moved between load/unload position and exposure position.In load/unload position, X platform 5 moves to directions X, and Y platform 7 moves to the Y direction, and theta stage 8 comes the substrate 1 that is equipped on anchor clamps 10 is carried out prealignment (prealignment) to the rotation of θ direction whereby.At exposure position, the light shield fixed mount 20 that utilizes not shown Z-to tilt to state after (tilt) mechanism makes moves and tilts to Z direction (the accompanying drawing above-below direction of Fig. 1), makes the gap alignment of light shield 2 and substrate 1 whereby.Then, X platform 5 moves to directions X, and Y platform 7 moves to the Y direction, and theta stage 8 is to the rotation of θ direction, makes the position alignment of light shield 2 and substrate 1 whereby.70 pairs of platform driving circuits 60 of main control unit are controlled, thereby X platform 5 is moved to directions X, Y platform 7 is moved to the Y direction, and theta stage 8 is rotated to the θ direction.
Moreover; In this embodiment; Make light shield fixed mount 20 move and tilt, make the gap alignment of light shield 2 and substrate 1 whereby, but also can the Z-leaning device be arranged at fixture support platform 9 to the Z direction; Make anchor clamps 10 move and tilt, make the gap alignment of light shield 2 and substrate 1 whereby to the Z direction.
Exposing light beam illuminating device 30 comprises: lamp (lamp) 31, condenser 32, first level crossing 33, lens group 34, retaining door (shutter) 35, polarization element 36, concave mirror 37, second level crossing 38 and power supply 41.Use as the lamp of discharge-type that the inclosure in bulb (bulb) of mercury vapor lamp, Halogen lamp LED (halogen lamp) and xenon lamp (xenon lamp) etc. has gases at high pressure (gas) as lamp 31.Around lamp 31, be provided with condenser 32, the light that this condenser 32 is produced lamp 31 converges.The light that lamp 31 is produced converges because of condenser 32, and to 33 irradiations of first level crossing.
Fig. 2 comes from the top figure that observation post sees is carried out in the configuration of first level crossing, concave mirror and second level crossing.By the light of first level crossing 33 reflection to lens group 34 incidents that comprise fly's-eye lens (fly eye lens) or lens pillar (rod lens) etc., through after the lens group 34, the Illumination Distribution of this light homogeneous that becomes.Retaining door 35 is opened when the alignment film to substrate 1 makes public, and when not making public, closes.When retaining door 35 is opened, become linear polarization through the light transmission polarization element 36 of lens group 34, then become parallel beam after concave mirror 37 reflections.Among Fig. 1, by 38 reflections of second level crossing, then vertically shone to the accompanying drawing below by the light of concave mirror 37 reflections.Light source control device 40 comes the electric power of supplying with to lamp 31 from power supply 41 is controlled by the control of main control unit 70, thereby the illumination of exposing light beam is regulated.
Above exposure position, be provided with the light shield fixed mount 20 that is keeping light shield 2.In light shield fixed mount 20, be provided with the opening that supplies exposing light beam to pass through, around the opening of the lower surface of light shield fixed mount 20, be provided with not shown adsorption tank.Light shield fixed mount 20 comes the periphery of light shield 2 is carried out vacuum suction by not shown adsorption tank, thereby light shield 2 is remained in lower surface.The exposing light beam that irradiates from exposing light beam illuminating device 30 shines through light shield 2 and to substrate 1, comes whereby the alignment film of substrate 1 is made public.
Below, the exposure method of the alignment film of this embodiment is described.Fig. 3 (a) is the top view of the light shield of an embodiment of the invention, and Fig. 3 (b) is the sectional view of the A-A part of Fig. 3 (a), and Fig. 3 (c) is the sectional view of the B-B part of Fig. 3 (a).Shown in Fig. 3 (b), Fig. 3 (c), be formed with pattern 2a at the lower surface of light shield 2.Exposing light beam can see through the part that is not formed with pattern 2a of the lower surface of light shield 2.Shown in Fig. 3 (a), Fig. 3 (b) and Fig. 3 (c), light deflection element 2b, 2c are installed at the upper surface of light shield 2.This light deflection element 2b, 2c see through the exposing light beam that vertically irradiates from exposing light beam illuminating device 30, and the working direction of exposing light beam is tilted towards the direction that roughly differs 180 degree each other, thereby exposing light beam is exposed to substrate 1 from light shield 2 obliquely.In this embodiment, using the section shape of groove is that jagged transmission-type blazed diffraction grating is as light deflection element 2b, 2c.The section shape that uses groove be jagged transmission-type blazed diffraction grating as light deflection element 2b, 2c, whereby, the loss of the exposing light beam when seeing through light deflection element 2b, 2c is few.Among Fig. 3 (a), light deflection element 2b, the last arrow of 2c are represented the direction when light deflection element 2b, 2c tilt exposing light beam.
Shown in Fig. 3 (b), the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2b, and working direction is tiltedly below inclination towards a left side, and exposes to substrate 1 from right oblique upper.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing left side.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing right side.
In addition, shown in Fig. 3 (c), the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2c, and working direction is tiltedly below inclination towards the right side, and exposes to substrate 1 from left oblique upper.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing right side.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing left side.
Fig. 4 (a) is the backplan of the light shield of other embodiment of the present invention, and Fig. 4 (b) is the sectional view of the C-C part of Fig. 4 (a), and Fig. 4 (c) is the sectional view of the D-D part of Fig. 4 (a).Shown in Fig. 4 (a), Fig. 4 (b) and Fig. 4 (c), be formed with pattern 2a at the lower surface of light shield 2.Exposing light beam can see through the part that is not formed with pattern 2a of the lower surface of light shield 2.The part that is not formed with pattern 2a at the lower surface of light shield 2 is formed with light deflection element 2d, 2e.This light deflection element 2d, 2e see through the exposing light beam that vertically irradiates from exposing light beam illuminating device 30, and the working direction of exposing light beam is tilted towards the direction that roughly differs 180 degree each other, thereby exposing light beam is exposed to substrate 1 from light shield 2 obliquely.In this embodiment, using the section shape of groove is that jagged transmission-type blazed diffraction grating is as light deflection element 2d, 2e.The section shape that uses groove be jagged transmission-type blazed diffraction grating as light deflection element 2d, 2e, whereby, the loss of the exposing light beam when seeing through light deflection element 2d, 2e is few.Among Fig. 4 (a), light deflection element 2d, the last arrow of 2e are represented the direction when light deflection element 2d, 2e tilt exposing light beam.
Shown in Fig. 4 (b), the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2d, and working direction is tiltedly below inclination towards a left side, and exposes to substrate 1 from right oblique upper.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing left side.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing right side.
In addition, shown in Fig. 4 (c), the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2e, and working direction is tiltedly below inclination towards the right side, and exposes to substrate 1 from left oblique upper.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing right side.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing left side.
And; With light deflection element 2b, 2c or the light deflection element 2d of a plurality of kinds, upper surface or the lower surface that 2e is arranged at light shield; The light deflection element 2b of said a plurality of kinds, 2c or light deflection element 2d, 2e tilt the working direction of the exposing light beam that irradiates from the exposing light beam illuminating device respectively to different directions; Therefore, exposing light beam exposes to substrate 1 from light shield 2 obliquely simultaneously respectively from different directions.Therefore; When forming a plurality of different orientations zone in the alignment film on a substrate, need not at every turn when made public in each orientation zone, with substrate 1 after anchor clamps 10 are removed, make substrate 1 towards rotation; Can form a plurality of different orientations zone simultaneously; Therefore, the working time shortens, and output improves.
Particularly two kinds of light deflection element 2b, 2c or light deflection element 2d, 2e are arranged at the upper surface or the lower surface of light shield; Said two kinds of light deflection element 2b, 2c or light deflection element 2d, 2e make the working direction of the exposing light beam that irradiates from exposing light beam illuminating device 30 tilt towards the direction that roughly differs 180 degree each other; Therefore; In the alignment film on a substrate, form two kinds of orientation zones that the pre-tilt direction roughly differs 180 degree simultaneously.
Fig. 5 (a) is the backplan of the light shield of another embodiment of the present invention, and Fig. 5 (b) is the sectional view of the E-E part of Fig. 5 (a), and Fig. 5 (c) is the sectional view of the F-F part of Fig. 5 (a).Shown in Fig. 5 (a), Fig. 5 (b) and Fig. 5 (c), be formed with pattern 2a at the lower surface of light shield 2.Exposing light beam can see through the part that is not formed with pattern 2a of the lower surface of light shield 2.The part that is not formed with pattern 2a at the lower surface of light shield 2 is formed with light deflection element 2f, 2g, 2h, 2i.This light deflection element 2f, 2g, 2h, 2i see through the exposing light beam that vertically irradiates from exposing light beam illuminating device 30; And the working direction of exposing light beam is tilted towards the direction that roughly differs 90 degree each other, thereby exposing light beam is exposed to substrate 1 from light shield 2 obliquely.In this embodiment, using the section shape of groove is that jagged transmission-type blazed diffraction grating is as light deflection element 2f, 2g, 2h, 2i.The section shape that uses groove be jagged transmission-type blazed diffraction grating as light deflection element 2f, 2g, 2h, 2i, whereby, the loss of the exposing light beam when seeing through light deflection element 2f, 2g, 2h, 2i is few.Among Fig. 5 (a), light deflection element 2f, 2g, 2h, the last arrow of 2i are represented the direction when light deflection element 2f, 2g, 2h, 2i tilt exposing light beam.
Shown in Fig. 5 (b), the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2f, and working direction is tiltedly below inclination towards a left side, and exposes to substrate 1 from right oblique upper.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing left side.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing right side.
In addition, the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2i, and working direction nearby tilts the oblique below of direction court along accompanying drawing, and exposes to substrate 1 from the oblique upper of accompanying drawing depth direction.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in accompanying drawing side nearby.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in accompanying drawing depth side.
Shown in Fig. 5 (c), the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2g, and working direction tilts towards oblique below along accompanying drawing depth direction, and from accompanying drawing nearby the oblique upper of direction expose to substrate 1.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in accompanying drawing depth side.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in accompanying drawing side nearby.
In addition, the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2h, and working direction is tiltedly below inclination towards the right side, and exposes to substrate 1 from left oblique upper.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing right side.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing left side.
Four kinds of light deflection element 2f, 2g, 2h, 2i are arranged at the lower surface of light shield 2; Said four kinds of light deflection element 2f, 2g, 2h, 2i make the working direction of the exposing light beam that irradiates from exposing light beam illuminating device 30 tilt towards the direction that roughly differs 90 degree each other; Therefore, exposing light beam from roughly differing the direction of 90 degree, exposes to substrate 1 from light shield 2 respectively obliquely simultaneously; In the alignment film on a substrate, form four kinds of orientation zones that the pre-tilt direction roughly differs 90 degree simultaneously.
Fig. 6 (a) is the backplan of the light shield of another embodiment of the present invention, and Fig. 6 (b) is the sectional view of the G-G part of Fig. 6 (a), and Fig. 6 (c) is the sectional view of the H-H part of Fig. 6 (a).Shown in Fig. 6 (a), Fig. 6 (b) and Fig. 6 (c), be formed with pattern 2a at the lower surface of light shield 2.Exposing light beam can see through the part that is not formed with pattern 2a of the lower surface of light shield 2.The part that is not formed with pattern 2a at the lower surface of light shield 2 is formed with light deflection element 2j, 2k.This light deflection element 2j, 2k see through the exposing light beam that vertically irradiates from exposing light beam illuminating device 30, and the working direction of exposing light beam is tilted towards the direction that roughly differs 90 degree each other, thereby exposing light beam is exposed to substrate 1 from light shield 2 obliquely.In this embodiment, using the section shape of groove is that jagged transmission-type blazed diffraction grating is as light deflection element 2j, 2k.The section shape that uses groove be jagged transmission-type blazed diffraction grating as light deflection element 2j, 2k, whereby, the loss of the exposing light beam when seeing through light deflection element 2j, 2k is few.Among Fig. 6 (a), light deflection element 2j, the last arrow of 2k are represented the direction when light deflection element 2j, 2k tilt exposing light beam.
Shown in Fig. 6 (b), the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2j, and working direction is tiltedly below inclination towards a left side, and exposes to substrate 1 from right oblique upper.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing left side.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in the accompanying drawing right side.
In addition, shown in Fig. 6 (c), the exposing light beam that vertically irradiates from exposing light beam illuminating device 30 sees through after the light deflection element 2k, and working direction tilts towards oblique below along accompanying drawing depth direction, and from accompanying drawing nearby the oblique upper of direction expose to substrate 1.Therefore; According to character of alignment film etc.; When pre-tilt direction during along the working direction of exposing light beam, by making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in accompanying drawing depth side.In addition; According to character of alignment film etc.; When pre-tilt direction during along the direction opposite with the working direction of exposing light beam; By making the alignment film of substrate 1 produce following orientation characteristic from light shield 2 to the exposing light beam of substrate 1 irradiation, this orientation characteristic is to instigate the pre-tilt direction to be in accompanying drawing side nearby.
Two kinds of light deflection element 2j, 2k are arranged at the lower surface of light shield 2; Said two kinds of light deflection element 2j, 2k make the working direction of the exposing light beam that irradiates from exposing light beam illuminating device 30 tilt towards the direction that roughly differs 90 degree each other; Therefore, exposing light beam from roughly differing the direction of 90 degree, exposes to substrate 1 from light shield 2 respectively obliquely simultaneously; In the alignment film on a substrate, form two kinds of orientation zones that the pre-tilt direction roughly differs 90 degree simultaneously.
According to embodiment discussed above; Light deflection element 2b, 2c or light deflection element 2d, 2e or light deflection element 2f, 2g, 2h, 2i or light deflection element 2j, 2k are arranged at the upper surface or the lower surface of light shield 2; Exposing light beam is exposed to substrate 1 from light shield 2 obliquely; Said light deflection element 2b, 2c or light deflection element 2d, 2e or light deflection element 2f, 2g, 2h, 2i or light deflection element 2j, 2k see through the exposing light beam that irradiates from exposing light beam illuminating device 30; And the working direction of exposing light beam is tilted, whereby, can exposing light beam be exposed to alignment film and the zone that exposing light beam is passed through enlarges significantly obliquely.
And; With light deflection element 2b, 2c or light deflection element 2d, 2e or light deflection element 2f, 2g, 2h, 2i or the light deflection element 2j of a plurality of kinds, upper surface or the lower surface that 2k is arranged at light shield 2; The light deflection element 2b of said a plurality of kinds, 2c or light deflection element 2d, 2e or light deflection element 2f, 2g, 2h, 2i or light deflection element 2j, 2k tilt the working direction of the exposing light beam that irradiates from exposing light beam illuminating device 30 respectively to different directions; Whereby; When forming a plurality of different orientations zone in the alignment film on a substrate, the working time is shortened, thereby output is improved.
And, use the transmission-type blazed diffraction grating as light deflection element 2b, 2c or light deflection element 2d, 2e or light deflection element 2f, 2g, 2h, 2i or light deflection element 2j, 2k, whereby, the loss of the exposing light beam in the time of can making through light deflection element reduces.
In addition; According to the embodiment shown in Fig. 3 (a)～Fig. 3 (c) and Fig. 4 (a)～Fig. 4 (c); Two kinds of light deflection element 2b, 2c or light deflection element 2d, 2e are arranged at the upper surface or the lower surface of light shield; Said two kinds of light deflection element 2b, 2c or light deflection element 2d, 2e make the working direction of the exposing light beam that irradiates from exposing light beam illuminating device 30 tilt towards the direction that roughly differs 180 degree each other; Whereby, can in the alignment film on the substrate, form two kinds of orientation zones that the pre-tilt direction roughly differs 180 degree simultaneously.
In addition; According to the embodiment shown in Fig. 5 (a)～Fig. 5 (c); Four kinds of light deflection element 2f, 2g, 2h, 2i are arranged at the lower surface of light shield, and said four kinds of light deflection element 2f, 2g, 2h, 2i make the working direction of the exposing light beam that irradiates from exposing light beam illuminating device 30 tilt towards the direction that roughly differs 90 degree each other, whereby; Can in the alignment film on the substrate, form four kinds of orientation zones that the pre-tilt direction roughly differs 90 degree simultaneously.
In addition; According to the embodiment shown in Fig. 6 (a)～Fig. 6 (c); Two kinds of light deflection element 2j, 2k are arranged at the lower surface of light shield, and said two kinds of light deflection element 2j, 2k make the working direction of the exposing light beam that irradiates from exposing light beam illuminating device 30 tilt towards the direction that roughly differs 90 degree each other, whereby; Can in the alignment film on the substrate, form two kinds of orientation zones that the pre-tilt direction roughly differs 90 degree simultaneously.
Claims (12)
1. the exposure device of an alignment film comprises:
Supporting the anchor clamps of substrate, the exposing light beam illuminating device that is keeping the light shield fixed mount of light shield and irradiating the exposing light beam of linear polarization; Between said light shield and said substrate, small gap is set; The said exposing light beam of the linear polarization that will irradiate from said exposing light beam illuminating device exposes to said substrate via said light shield; Make the alignment film of coating said substrate produce the orientation characteristic of the orientation of adjustment liquid crystal, the exposure device of said alignment film is characterised in that:
Light deflection element is arranged at the upper surface or the lower surface of said light shield; Said exposing light beam is exposed to said substrate from said light shield obliquely; Said light deflection element sees through the said exposing light beam that irradiates from said exposing light beam illuminating device, and the working direction of said exposing light beam is tilted.
2. the exposure device of alignment film according to claim 1 is characterized in that
The said light deflection element of a plurality of kinds is arranged at the upper surface or the lower surface of said light shield, and various said light deflection elements tilt the working direction of the said exposing light beam that irradiates from said exposing light beam illuminating device respectively to different directions.
3. the exposure device of alignment film according to claim 2 is characterized in that
Two kinds of light deflection elements are arranged at the lower surface of said light shield, and various said light deflection elements make the working direction of the said exposing light beam that irradiates from said exposing light beam illuminating device tilt towards the direction that differs 180 degree each other.
4. the exposure device of alignment film according to claim 2 is characterized in that
Four kinds of said light deflection elements are arranged at the lower surface of said light shield, and various said light deflection elements make the working direction of the said exposing light beam that irradiates from said exposing light beam illuminating device tilt towards the direction that differs 90 degree each other.
5. the exposure device of alignment film according to claim 2 is characterized in that
Two kinds of said light deflection elements are arranged at the lower surface of said light shield, and various said light deflection elements make the working direction of the said exposing light beam that irradiates from said exposing light beam illuminating device tilt towards the direction that differs 90 degree each other.
6. according to the exposure device of each described alignment film in the claim 1 to 5, wherein
Said light deflection element is the transmission-type blazed diffraction grating, and the section shape of the groove of this transmission-type blazed diffraction grating is a zigzag.
7. the exposure method of an alignment film,
Utilize anchor clamps supporting substrate; Utilize the light shield fixed mount keeping light shield; Between said light shield and said substrate, small gap is set; The exposing light beam of the linear polarization that will irradiate from the exposing light beam illuminating device exposes to said substrate via said light shield, makes the alignment film of coating said substrate produce the orientation characteristic of the orientation of adjustment liquid crystal, and the exposure method of said alignment film is characterised in that:
Light deflection element is arranged at the upper surface or the lower surface of said light shield; Said exposing light beam is exposed to said substrate from said light shield obliquely; Said light deflection element sees through the said exposing light beam that irradiates from said exposing light beam illuminating device, and the working direction of said exposing light beam is tilted.
8. the exposure method of alignment film according to claim 7 is characterized in that
The said light deflection element of a plurality of kinds is arranged at the upper surface or the lower surface of said light shield, and the light deflection element of said a plurality of kinds tilts the working direction of the said exposing light beam that irradiates from said exposing light beam illuminating device respectively to different directions.
9. the exposure method of alignment film according to claim 8 is characterized in that
Two kinds of said light deflection elements are arranged at the lower surface of said light shield, and said two kinds of light deflection elements make the working direction of the said exposing light beam that irradiates from said exposing light beam illuminating device tilt towards the direction that differs 180 degree each other.
10. the exposure method of alignment film according to claim 8 is characterized in that
Four kinds of said light deflection elements are arranged at the lower surface of said light shield, and said four kinds of light deflection elements make the working direction of the said exposing light beam that irradiates from said exposing light beam illuminating device tilt towards the direction that differs 90 degree each other.
11. the exposure method of alignment film according to claim 8 is characterized in that
Two kinds of said light deflection elements are arranged at the lower surface of said light shield, and said two kinds of light deflection elements make the working direction of the said exposing light beam that irradiates from said exposing light beam illuminating device tilt towards the direction that differs 90 degree each other.
12. the exposure method according to each described alignment film in the claim 7 to 11 is characterized in that
Using the section shape of groove is that jagged transmission-type blazed diffraction grating is as said light deflection element.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-274032 | 2010-12-08 | ||
| JP2010274032A JP2012123206A (en) | 2010-12-08 | 2010-12-08 | Exposure apparatus and exposure method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102540575A true CN102540575A (en) | 2012-07-04 |
Family
ID=46347809
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011103646835A Pending CN102540575A (en) | 2010-12-08 | 2011-11-11 | Exposing device and exposing method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2012123206A (en) |
| KR (1) | KR20120064020A (en) |
| CN (1) | CN102540575A (en) |
| TW (1) | TW201235795A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107561871A (en) * | 2016-07-01 | 2018-01-09 | 上海微电子装备（集团）股份有限公司 | Proximity printing and light orientation integrated device, light alignment method and exposure method |
| CN110888267A (en) * | 2019-11-26 | 2020-03-17 | Tcl华星光电技术有限公司 | Liquid crystal alignment device and operation method thereof |
| CN113366380A (en) * | 2019-02-07 | 2021-09-07 | 株式会社V技术 | Exposure apparatus for photo-alignment and exposure method for photo-alignment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000081621A (en) * | 1998-07-07 | 2000-03-21 | Fujitsu Ltd | Manufacture of liquid crystal display device |
| US20020006587A1 (en) * | 1997-09-05 | 2002-01-17 | Lg Electronics Inc. | Method for manufacturing a multidomain liquid crystal display panel |
| CN1450394A (en) * | 2002-03-29 | 2003-10-22 | 捷时雅株式会社 | Optical alignment method and liquid crystal display element |
| JP2009042426A (en) * | 2007-08-08 | 2009-02-26 | Seiko Epson Corp | Apparatus for manufacturing liquid crystal device, method for manufacturing liquid crystal device, and liquid crystal device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP5194925B2 (en) * | 2008-03-25 | 2013-05-08 | オムロン株式会社 | Resist exposure method |
-
2010
- 2010-12-08 JP JP2010274032A patent/JP2012123206A/en active Pending
-
2011
- 2011-10-28 KR KR1020110111674A patent/KR20120064020A/en not_active Application Discontinuation
- 2011-11-11 CN CN2011103646835A patent/CN102540575A/en active Pending
- 2011-11-16 TW TW100141725A patent/TW201235795A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020006587A1 (en) * | 1997-09-05 | 2002-01-17 | Lg Electronics Inc. | Method for manufacturing a multidomain liquid crystal display panel |
| JP2000081621A (en) * | 1998-07-07 | 2000-03-21 | Fujitsu Ltd | Manufacture of liquid crystal display device |
| CN1450394A (en) * | 2002-03-29 | 2003-10-22 | 捷时雅株式会社 | Optical alignment method and liquid crystal display element |
| JP2009042426A (en) * | 2007-08-08 | 2009-02-26 | Seiko Epson Corp | Apparatus for manufacturing liquid crystal device, method for manufacturing liquid crystal device, and liquid crystal device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107561871A (en) * | 2016-07-01 | 2018-01-09 | 上海微电子装备（集团）股份有限公司 | Proximity printing and light orientation integrated device, light alignment method and exposure method |
| CN107561871B (en) * | 2016-07-01 | 2020-04-10 | 上海微电子装备（集团）股份有限公司 | Proximity type exposure and photo-alignment integrated device, photo-alignment method and exposure method |
| CN113366380A (en) * | 2019-02-07 | 2021-09-07 | 株式会社V技术 | Exposure apparatus for photo-alignment and exposure method for photo-alignment |
| CN110888267A (en) * | 2019-11-26 | 2020-03-17 | Tcl华星光电技术有限公司 | Liquid crystal alignment device and operation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201235795A (en) | 2012-09-01 |
| JP2012123206A (en) | 2012-06-28 |
| KR20120064020A (en) | 2012-06-18 |
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Application publication date: 20120704 |