CN102498226A - 富硅的合金 - Google Patents

富硅的合金 Download PDF

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Publication number
CN102498226A
CN102498226A CN2010800419636A CN201080041963A CN102498226A CN 102498226 A CN102498226 A CN 102498226A CN 2010800419636 A CN2010800419636 A CN 2010800419636A CN 201080041963 A CN201080041963 A CN 201080041963A CN 102498226 A CN102498226 A CN 102498226A
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CN
China
Prior art keywords
composition
matter
silicon
eutectic
phase
Prior art date
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Pending
Application number
CN2010800419636A
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English (en)
Chinese (zh)
Inventor
C·A·舒
D·A·费希尔
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Massachusetts Institute of Technology
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Massachusetts Institute of Technology
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Publication date
Application filed by Massachusetts Institute of Technology filed Critical Massachusetts Institute of Technology
Publication of CN102498226A publication Critical patent/CN102498226A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Ceramic Products (AREA)
CN2010800419636A 2009-08-21 2010-08-19 富硅的合金 Pending CN102498226A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US23575709P 2009-08-21 2009-08-21
US61/235,757 2009-08-21
PCT/US2010/002271 WO2011022058A1 (en) 2009-08-21 2010-08-19 Silicon-rich alloys

Publications (1)

Publication Number Publication Date
CN102498226A true CN102498226A (zh) 2012-06-13

Family

ID=42941885

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010800419636A Pending CN102498226A (zh) 2009-08-21 2010-08-19 富硅的合金

Country Status (10)

Country Link
US (1) US20120238439A1 (enExample)
EP (2) EP2878693A1 (enExample)
JP (2) JP5809140B2 (enExample)
KR (1) KR20120063485A (enExample)
CN (1) CN102498226A (enExample)
BR (1) BR112012003224A2 (enExample)
CA (1) CA2771342A1 (enExample)
MX (1) MX2012002155A (enExample)
RU (1) RU2012103921A (enExample)
WO (1) WO2011022058A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9061947B1 (en) * 2009-11-02 2015-06-23 Lockheed Martin Corporation Multiphase eutectic ceramic coatings
JP2015517057A (ja) 2011-12-23 2015-06-18 ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ シリコン共晶合金を含む工業コンポーネント及びそのコンポーネントを作製する方法
IN2014DN05709A (enExample) 2011-12-23 2015-04-10 Dow Corning
CA2872500A1 (en) * 2012-05-21 2013-11-28 Dow Corning Corporation Silicothermic reduction of metal oxides to form eutectic composites
CN104321277A (zh) * 2012-05-21 2015-01-28 道康宁公司 具有硅的熔融材料的容纳
WO2015038421A1 (en) 2013-09-10 2015-03-19 Dow Corning Corporation Wear-resistant silicon eutectic alloy components and methods of making the same
WO2015168500A1 (en) 2014-05-02 2015-11-05 Dow Corning Corporation Ternary silicon-chromium eutectic alloys having molybdenum, copper or silver
WO2015183634A1 (en) 2014-05-27 2015-12-03 Dow Corning Corporation Methods of removing silicon from silicon-eutectic alloy compositions, and products made by such methods
WO2015195538A1 (en) 2014-06-17 2015-12-23 Dow Corning Corporation Decorative shape-cast articles made from silicon eutectic alloys, and methods for producing the same
CN105891243B (zh) * 2016-03-30 2018-10-23 上海大学 二维连续成分样品、其制备方法及其在相图高通量快速测定中的应用
JP7676729B2 (ja) 2018-11-22 2025-05-15 東ソー株式会社 Ｃｒ－Ｓｉ系焼結体
EP4129954A4 (en) 2020-03-26 2024-05-01 Tosoh Corporation CR-SI SINTERED BODY, SPUTTERING TARGET AND METHOD FOR PRODUCING A THIN FILM
CN115666820A (zh) 2020-05-26 2023-01-31 东曹株式会社 金属-Si系粉末、其制造方法、以及金属-Si系烧结体、溅射靶和金属-Si系薄膜的制造方法
WO2022025033A1 (ja) 2020-07-31 2022-02-03 東ソー株式会社 Ｃｒ－Ｓｉ－Ｃ系焼結体
US20230407460A1 (en) * 2020-11-06 2023-12-21 The Regents Of The University Of California Single phase high entropy intermetallics and method for manufacturing

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1609060A (zh) * 2003-05-22 2005-04-27 联合工艺公司 硅基基材的粘结涂层

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1043197A (en) * 1962-06-01 1966-09-21 Imp Metal Ind Kynoch Ltd Niobium alloys
JP3567678B2 (ja) * 1996-05-05 2004-09-22 征一郎 宮田 通電発熱体
JP2010010009A (ja) * 2008-06-30 2010-01-14 Kurosaki Harima Corp 溶造Ｓｉ電熱合金の抵抗温度曲線を平坦化する方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1609060A (zh) * 2003-05-22 2005-04-27 联合工艺公司 硅基基材的粘结涂层

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
V.M. CHAD ET AL.: "Microstructural characterization of as-cast Cr–Si alloys", 《MATERIALS CHARACTERIZATION》 *
张世贤等: "热等静压 Cr-Si 靶材的特性及微结构研究", 《粉末冶金材料科学与工程》 *
谭中雄等: "Cr-Si 粉末冶金工艺及其物理-力学性能", 《粉末冶金材料科学与工程》 *

Also Published As

Publication number Publication date
RU2012103921A (ru) 2013-09-27
JP2015166309A (ja) 2015-09-24
MX2012002155A (es) 2012-04-02
US20120238439A1 (en) 2012-09-20
JP5809140B2 (ja) 2015-11-10
EP2878693A1 (en) 2015-06-03
EP2467506B1 (en) 2014-12-31
BR112012003224A2 (pt) 2016-03-01
KR20120063485A (ko) 2012-06-15
JP2013502368A (ja) 2013-01-24
EP2467506A1 (en) 2012-06-27
CA2771342A1 (en) 2011-02-24
WO2011022058A1 (en) 2011-02-24

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C53 Correction of patent of invention or patent application
CB03 Change of inventor or designer information

Inventor after: Schuh Christopher A.

Inventor after: D S Fisher

Inventor before: Schuh Christopher A.

Inventor before: Fischer Donald A

COR Change of bibliographic data

Free format text: CORRECT: INVENTOR; FROM: CHRISTOPHER A. SCHUH DAVID A. FISCHER TO: CHRISTOPHER A. SCHUH D. S. FISCHER

RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20120613