CN102480004A - Metamaterial with spatial clearance and preparation method of metamaterial - Google Patents

Metamaterial with spatial clearance and preparation method of metamaterial Download PDF

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Publication number
CN102480004A
CN102480004A CN2011100771034A CN201110077103A CN102480004A CN 102480004 A CN102480004 A CN 102480004A CN 2011100771034 A CN2011100771034 A CN 2011100771034A CN 201110077103 A CN201110077103 A CN 201110077103A CN 102480004 A CN102480004 A CN 102480004A
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CN
China
Prior art keywords
ultra material
joint clearance
metamaterial
spatial joint
thickness
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Pending
Application number
CN2011100771034A
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Chinese (zh)
Inventor
刘若鹏
赵治亚
王文剑
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Kuang Chi Institute of Advanced Technology
Kuang Chi Innovative Technology Ltd
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Kuang Chi Institute of Advanced Technology
Kuang Chi Innovative Technology Ltd
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Application filed by Kuang Chi Institute of Advanced Technology, Kuang Chi Innovative Technology Ltd filed Critical Kuang Chi Institute of Advanced Technology
Priority to CN2011100771034A priority Critical patent/CN102480004A/en
Priority to PCT/CN2011/084490 priority patent/WO2012129943A1/en
Publication of CN102480004A publication Critical patent/CN102480004A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices

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  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Abstract

The invention provides a metamaterial with a spatial clearance, which is formed by combining a plurality of layers of metamaterial functional plates, wherein each metamaterial functional plate comprises a dielectric substrate and a plurality of artificial micro structures arranged on the dielectric substrate. The metamaterial is characterized in that a spacing element is arranged between every two metamaterial functional plates, and is mutually adhered with the metamaterial functional plate through an adhesive. The invention also provides a preparation method of the metamaterial. By adopting the method of arranging the spacing elements in the metamaterial functional plates for increasing preset spatial clearness, because the thickness of the spacing elements is used for conveniently setting the spatial clearances and further an equivalent dielectric constant and an equivalent magnetic conductivity of the metamaterial are subjected to predetermined change, the functions of the metamaterial are designed more flexibly and variously; and the prepared metamaterial has more electromagnetic characteristics and has wider function application.

Description

A kind of ultra material and preparation method thereof with spatial joint clearance
[technical field]
The present invention relates to ultra field of materials, relate to a kind of ultra material and preparation method thereof particularly with spatial joint clearance.
[background technology]
In recent years, along with the fast development of new and high technologies such as radar detection, satellite communication, Aero-Space, and the rise of research field such as anti-electromagnetic interference, stealth technique, microwave dark room, the research of microwave absorbing material more and more receives people's attention.Ultra material can reveal very marvellous galvanomagnetic effect, can be used for fields such as absorbing material and stealth material, becomes the focus of absorbing material area research.
So-called ultra material is meant artificial composite structure or composite material that some have the not available extraordinary physical property of natural material.Structurally ordered design through on the key physical yardstick of material can break through the restriction of some apparent natural law, thereby obtains to exceed the intrinsic common meta-materials function of nature.As, ultra material has ultra material function plate stack of multilayer or array to form, and ultra material function plate is formed the material behavior that ultra material can provide various common materials to have and do not have by medium substrate and a plurality of metal micro structures that are arranged on the medium substrate.Single metal micro-structural size is generally less than 1/10 wavelength, and it has electroresponse or magnetic response to extra electric field or magnetic field, thereby has the effective dielectric constant of showing or equivalent permeability, perhaps wave impedance.The effective dielectric constant of metal micro structure and equivalent permeability (or wave impedance) can artificially be designed and control by the decision of cell geometry dimensional parameters.And metal micro structure can have the electromagnetic parameter of artificial design, thereby produces the phenomenon of many novelties.
The general array of artificial micro-structural of existing ultra material function plate is in the surface or the inside of medium substrate; The ultra material function plate of each layer combined closely and formed whole ultra material; We can regard the medium substrate and the space around the two at each artificial micro-structural, artificial micro-structural place as a ultra material elementary cell; The effective dielectric constant of its each elementary cell or equivalent permeability are influenced by the medium substrate and the space around the two at artificial micro-structural, artificial micro-structural place jointly; Prior art is only through changing the change that artificial micro-structural realizes the effective dielectric constant or the equivalent permeability of whole ultra material; Its control device is limited, and is strong for the dependence of artificial micro-structural, and the flexibility of design is not enough.
[summary of the invention]
The present invention is the shortcoming that overcomes above-mentioned prior art, provides a kind of function to use the ultra material of horn of plenty on the one hand, provides a kind of design ultra more flexibly material preparation method on the other hand.
The present invention realizes that the technical scheme that goal of the invention adopts is; Combine by the ultra material function plate of multilayer; Said ultra material function plate comprises medium substrate and the array a plurality of artificial micro-structural on medium substrate; Said ultra material function plate is provided with spacer element between any two, and is bonding each other through adhesive between said spacer element and the said ultra material function plate.
As preferred implementation, said spacer element is the shaped as frame dividing plate, and is bonding each other through adhesive between said shaped as frame dividing plate and the said ultra material function plate.
As embodiment, the thickness of each said dividing plate is increasing or decreasing to be changed.
As embodiment, the thickness of each said dividing plate is big or small alternate.
As embodiment, each said adhesive is double faced adhesive tape adhesive or solid state bonds resin, and said solid state bonds resin is phenolic resins, epoxy resin, mylar, polyimide resin or polyflon.
As embodiment, said dividing plate is square frame shape or circle framework dividing plate.
The present invention also provides a kind of ultra preparation methods, may further comprise the steps:
A. a plurality of artificial micro-structurals of array on the medium substrate of ultra material function plate form ultra material function plate;
B. calculate and confirm the thickness of spatial joint clearance between the ultra material function plate according to design demand;
C. confirm the thickness of the spacer element between each ultra material function plate according to the thickness of spatial joint clearance, make spacer thickness equal the thickness of said spatial joint clearance;
D. through adhesive with each ultra material function plate each other and the mutual bonding assembling of spacer element form ultra material.
As embodiment, among the said step a, through chemical etching, plating, brill quarter, photoetching, electronics is carved or ion is carved a plurality of artificial micro-structurals of method array on said medium substrate.
Adopt in the ultra material function plate in the ultra material preparation of the present invention the method that spacer element increases the predetermined space gap is set; Because can be through the thickness setting in gap, implementation space easily of spacer element; And then the change that can be scheduled to the effective dielectric constant and the equivalent permeability of ultra material; Thereby more flexible and various in the design of the function of ultra material, the electromagnetic property of prepared ultra material is horn of plenty more also, has function application widely.
[description of drawings]
Fig. 1, embodiment 1 surpass the section of structure of material.
Fig. 2, the structure chart of embodiment 1 dividing plate.
Fig. 3, embodiment 2 surpass the section of structure of material.
Fig. 4, the structure chart of embodiment 2 dividing plates.
Among the figure, 1 surpass material function plate, 2 medium substrates, 3 artificial micro-structurals, 4 dividing plates, 5 double faced adhesive tape adhesive layers, 6 phenolic resin adhesion layers.
[embodiment]
Below in conjunction with accompanying drawing and embodiment the present invention is elaborated.
Embodiment 1
The section of structure of the ultra material of present embodiment is referring to accompanying drawing 1; Combined by the ultra material function plate 1 of multilayer, ultra material function plate 1 comprises medium substrate 2 and the array a plurality of artificial micro-structural 3 on medium substrate, and ultra material function plate 1 is provided with dividing plate 4 between any two; Dividing plate 4 is a square frame shape dividing plate; The structure chart of dividing plate 4 is referring to accompanying drawing 2, and is bonding each other through double faced adhesive tape tack coat 5 between dividing plate 4 and the ultra material function plate 1, and the thickness of each dividing plate 4 is the rule of successively decreasing successively to be changed.
During practical implementation, ultra preparation methods adopts following steps:
A. a plurality of artificial micro-structurals 3 of array on the medium substrate 2 of ultra material function plate 1; Form ultra material function plate 1; Specifically can be through chemical etching, plating, brill quarter, photoetching, electronics is carved or ion is carved a plurality of artificial micro-structurals 3 of method array on the medium substrate 2 of ultra material function plate; Ultra material function plate 1 to be made up of the medium substrate 2 and the metal micro structure 3 of macromolecular material is an example; Can select the method for chemical etching to prepare; Promptly on the medium substrate that is covered with metallic film 2, develop and etching step through overlay film, exposure, light-sensitive surface, accomplish the manufacturing of metal micro structure 3, this process can adopt the common equipment of pcb board chemical etching to carry out processing and manufacturing;
B. be to realize that the effective dielectric constant of each ultra material function plate 1 integral body in the ultra material is by the variation of successively decreasing successively from big to small; Present embodiment can make the gap between the ultra material function plate 1 be the variation of successively decreasing successively according to this design demand; Because for ultra material function plate 1; We can regard the medium substrate 2 and the space around the two at each artificial micro-structural 3, artificial micro-structural 3 places as a ultra material elementary cell; The effective dielectric constant of its each elementary cell or equivalent permeability are influenced by the medium substrate 2 and the space around the two at artificial micro-structural 3, artificial micro-structural 3 places jointly; When the spatial joint clearance that changes between the whole ultra material function plate 1, correspondingly also changed the size in the space around the artificial micro-structural 3 and medium substrate 2 in each ultra material elementary cell, and the change of this surrounding space size can influence the effective dielectric constant of ultra material elementary cell; And then influence the effective dielectric constant of whole ultra material function plate 1; Because the artificial micro-structural of present embodiment 3 is an air with space around the medium substrate 2, and the dielectric constant of general material is all greater than the dielectric constant of air, so when change surrounding space big or small; Can change the effective dielectric constant of ultra material function plate 1, make the effective dielectric constant of ultra material function plate 1 also demonstrate the variation of once successively decreasing;
C. after the size of confirming spatial joint clearance was the rule of successively decreasing successively, for ease of the size of control spatial joint clearance, we can control the size of spatial joint clearance through the thickness that makes dividing plate 4 thickness equal spatial joint clearance;
D. through double faced adhesive tape each ultra material function plate 1 is formed ultra material with dividing plate 4 mutual bonding assemblings each other,, for the thickness of whole spatial joint clearance, can ignore owing to the very thin thickness of double faced adhesive tape adhesive layer 5.
Ultra material that use provides according to present embodiment and preparation method thereof through increasing spatial joint clearance and controlling the method for its gap thickness, makes ultra material design more flexible and various in the function of dielectric constant and magnetic permeability.
Embodiment 2
The section of structure of the ultra material of present embodiment is referring to accompanying drawing 3; Combined by the ultra material function plate 1 of multilayer, ultra material function plate 1 comprises medium substrate 2 and the array a plurality of artificial micro-structural 3 on medium substrate, and ultra material function plate 1 is provided with dividing plate 4 between any two; Dividing plate 4 is the circle framework dividing plate; The structure chart of dividing plate 4 is referring to accompanying drawing 4, and is bonding each other through phenolic resin bonded layer 6 between dividing plate 4 and the ultra material function plate 1, and the thickness of each dividing plate 4 is the rule variation that thickness replaces.
During practical implementation, ultra preparation methods adopts following steps:
A. a plurality of artificial micro-structurals 3 of array on the medium substrate 2 of ultra material function plate 1; Form ultra material function plate 1; Specifically can be through chemical etching, plating, brill quarter, photoetching, electronics is carved or ion is carved a plurality of artificial micro-structurals 3 of method array on the medium substrate 2 of ultra material function plate 1; Ultra material function plate 1 to be made up of the medium substrate 2 and the metal micro structure 3 of macromolecular material is an example; Can select the method for chemical etching to prepare; Promptly on the medium substrate that is covered with metallic film 2, develop and etching step through overlay film, exposure, light-sensitive surface, accomplish the manufacturing of metal micro structure, this process can adopt the common equipment of pcb board chemical etching to carry out processing and manufacturing;
B. be to realize that the effective dielectric constant of each ultra material function plate 1 integral body in the ultra material is by the variation that replaces from size; Present embodiment can make the gap between the ultra material function plate 1 be the variation that size replaces according to this design demand; Because for ultra material function plate 1; We can regard the medium substrate 2 and the space around the two at each artificial micro-structural 3, artificial micro-structural 3 places as a ultra material elementary cell; The effective dielectric constant of its each elementary cell or equivalent permeability are influenced by the medium substrate 2 and the space around the two at artificial micro-structural 3, artificial micro-structural 3 places jointly; When the spatial joint clearance that changes between the whole ultra material function plate 1, correspondingly also changed the size in the space around the artificial micro-structural 3 and medium substrate 2 in each ultra material elementary cell, and the change of this surrounding space size can influence the effective dielectric constant of ultra material elementary cell; And then influence the effective dielectric constant of whole ultra material function plate 1; Because the artificial micro-structural of present embodiment 3 is an air with space around the medium substrate 2, and the dielectric constant of general material is all greater than the dielectric constant of air, so when change surrounding space big or small; Can change the effective dielectric constant of ultra material function plate 1, thereby realize the effective dielectric constant size alternate of ultra material function plate 1;
C. after the size of confirming spatial joint clearance was the rule that alternately changes, for ease of the size of control spatial joint clearance, we can control the size of spatial joint clearance through the thickness that makes dividing plate 4 thickness equal spatial joint clearance;
D. present embodiment carries out the moulding assembling based on existing semisolid moulding process to ultra material; At first the periphery at ultra material function plate 1 applies phenolic resins; Alternately arrange range upon range of with dividing plate 4 each ultra material function plate 1 then; Ultra material after range upon range of being placed in the semisolid melt temperature scope of phenolic resins, is 3kg/cm at pressure 2Hyperbaric environment in ultra material is carried out pressing, be cooled to room temperature after pressing is accomplished, solidify and also form ultra material.As embodiment, the moulding process in this step includes but not limited to following process: extruding-out process, injection molding technique or calendering formation technology etc.Because the very thin thickness of the phenolic resins after the pressing can be ignored for the thickness of whole spatial joint clearance,,, dividing plate 4 can accurately control through being reserved certain thickness method even thickness has reached a dimensioning.
Ultra material that use provides according to present embodiment and preparation method thereof on the one hand through increasing spatial joint clearance and controlling the method for its gap thickness, makes ultra material design more flexible and various in the function of dielectric constant and magnetic permeability; On the other hand, the ultra material of present embodiment and preparation thereof can be passed through the moulding process mass preparation, and it is simple to have the preparation process, the advantage that efficient is high, cost is low.
In the above-described embodiments, only the present invention has been carried out exemplary description, but those skilled in the art can carry out various modifications to the present invention after reading present patent application under the situation that does not break away from the spirit and scope of the present invention.

Claims (11)

1. ultra material with spatial joint clearance; Combine by the ultra material function plate of multilayer; Said ultra material function plate comprises medium substrate and the array a plurality of artificial micro-structural on medium substrate; It is characterized in that: said ultra material function plate is provided with spacer element between any two, and is bonding each other through adhesive between said spacer element and the said ultra material function plate.
2. a kind of ultra material with spatial joint clearance according to claim 1, it is characterized in that: said spacer element is the shaped as frame dividing plate, and is bonding each other through adhesive between said shaped as frame dividing plate and the said ultra material function plate.
3. a kind of ultra material with spatial joint clearance according to claim 2 is characterized in that: the thickness of each said dividing plate equates.
4. a kind of ultra material with spatial joint clearance according to claim 2 is characterized in that: the thickness of each said dividing plate is increasing or decreasing to be changed.
5. a kind of ultra material with spatial joint clearance according to claim 2, it is characterized in that: the thickness of each said dividing plate is big or small alternate.
6. a kind of ultra material with spatial joint clearance according to claim 2, it is characterized in that: said adhesive is the double faced adhesive tape adhesive.
7. a kind of ultra material according to claim 2 with spatial joint clearance; It is characterized in that: said adhesive is the solid state bonds resin, and said solid state bonds resin is phenolic resins, epoxy resin, mylar, polyimide resin or polyflon.
8. a kind of ultra material with spatial joint clearance according to claim 2 is characterized in that: said dividing plate is a square frame shape dividing plate.
9. a kind of ultra material with spatial joint clearance according to claim 2, it is characterized in that: said dividing plate is the circle framework dividing plate.
10. ultra preparation methods may further comprise the steps:
A. a plurality of artificial micro-structurals of array on the medium substrate of ultra material function plate form ultra material function plate;
B. calculate and confirm the thickness of spatial joint clearance between the ultra material function plate according to design demand;
C. confirm the thickness of the spacer element between each ultra material function plate according to the thickness of spatial joint clearance, make spacer thickness equal the thickness of said spatial joint clearance;
D. through adhesive with each ultra material function plate each other and the mutual bonding assembling of spacer element form ultra material.
11. a kind of ultra preparation methods according to claim 9 is characterized in that: among the said step a, through chemical etching, plating, brill quarter, photoetching, electronics is carved or ion is carved a plurality of artificial micro-structurals of method array on said medium substrate.
CN2011100771034A 2011-03-29 2011-03-29 Metamaterial with spatial clearance and preparation method of metamaterial Pending CN102480004A (en)

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CN2011100771034A CN102480004A (en) 2011-03-29 2011-03-29 Metamaterial with spatial clearance and preparation method of metamaterial
PCT/CN2011/084490 WO2012129943A1 (en) 2011-03-29 2011-12-22 Metamaterial having spacing gap and manufacturing method therefor

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CN102802394A (en) * 2012-08-03 2012-11-28 深圳光启创新技术有限公司 Wave-absorbing material
CN102811594A (en) * 2012-07-31 2012-12-05 深圳光启创新技术有限公司 Broadband wave-absorbing metamaterial and wave-absorbing device
CN102811596A (en) * 2012-07-31 2012-12-05 深圳光启创新技术有限公司 Broadband wave-absorbing metamaterial and wave-absorbing device
CN102843899A (en) * 2012-08-03 2012-12-26 深圳光启创新技术有限公司 Wave absorbing metamaterial and device
CN103022623A (en) * 2012-11-20 2013-04-03 深圳光启创新技术有限公司 Harmonic oscillator, method for preparing harmonic oscillator, resonant cavity, filter device and microwave device
CN103296433A (en) * 2012-02-29 2013-09-11 深圳光启创新技术有限公司 Metamaterial
CN104167576A (en) * 2014-08-27 2014-11-26 中国舰船研究设计中心 Large-bandwidth and small-size periodic unit frequency selective surface structure
CN106329150A (en) * 2015-07-10 2017-01-11 深圳光启尖端技术有限责任公司 Microwave absorbing metamaterial

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CN103296433A (en) * 2012-02-29 2013-09-11 深圳光启创新技术有限公司 Metamaterial
CN102811594B (en) * 2012-07-31 2016-06-15 深圳光启创新技术有限公司 A kind of broadband absorbing Meta Materials and suction wave apparatus
CN102811596A (en) * 2012-07-31 2012-12-05 深圳光启创新技术有限公司 Broadband wave-absorbing metamaterial and wave-absorbing device
CN102811594A (en) * 2012-07-31 2012-12-05 深圳光启创新技术有限公司 Broadband wave-absorbing metamaterial and wave-absorbing device
CN102811596B (en) * 2012-07-31 2014-07-09 深圳光启创新技术有限公司 Broadband wave-absorbing metamaterial and wave-absorbing device
CN102843899A (en) * 2012-08-03 2012-12-26 深圳光启创新技术有限公司 Wave absorbing metamaterial and device
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CN102802394A (en) * 2012-08-03 2012-11-28 深圳光启创新技术有限公司 Wave-absorbing material
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CN103022623A (en) * 2012-11-20 2013-04-03 深圳光启创新技术有限公司 Harmonic oscillator, method for preparing harmonic oscillator, resonant cavity, filter device and microwave device
CN104167576A (en) * 2014-08-27 2014-11-26 中国舰船研究设计中心 Large-bandwidth and small-size periodic unit frequency selective surface structure
CN106329150A (en) * 2015-07-10 2017-01-11 深圳光启尖端技术有限责任公司 Microwave absorbing metamaterial
CN106329150B (en) * 2015-07-10 2021-12-07 深圳光启尖端技术有限责任公司 Wave-absorbing metamaterial

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Application publication date: 20120530