CN102445279B - Device and method for measuring wave lengths of interferometer - Google Patents
Device and method for measuring wave lengths of interferometer Download PDFInfo
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- CN102445279B CN102445279B CN2010105072205A CN201010507220A CN102445279B CN 102445279 B CN102445279 B CN 102445279B CN 2010105072205 A CN2010105072205 A CN 2010105072205A CN 201010507220 A CN201010507220 A CN 201010507220A CN 102445279 B CN102445279 B CN 102445279B
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Abstract
The invention discloses a device for measuring wave lengths of an interferometer of a workpiece table, comprising a first interferometer and a second interferometer which are respectively arranged at two opposite sides of the workpiece table, first measurement light beams and second measurement light beams emitted from the first interferometer and the second interferometer respectively form a wave length measurement shaft, and a computing module for computing the theory length and practical length of the wave length measurement shaft and computing the practical wave length of the first measurement light beams and the second measurement light beams, so as to perform real-time computation to the wave length of the light beams measured by the interferometer by the first interferometer, the second interferometer and the computing module. The invention also discloses a method for measuring wave lengths of an interferometer of a workpiece table.
Description
Technical field
The technical program relates to interferometer, relates in particular to a kind of device and method of real-time measurement laser interference wavelength.
Background technology
The interferometer of fringe count formula carries out linear measure longimetry take wavelength as benchmark, its measuring principle can be expressed as simply:
In formula, λ is the wavelength of laser in measurement environment, λ
0Be laser wavelength in a vacuum, N is fringe number.Only have and measure in real time air refraction n or the wavelength X of laser in measurement environment, could accurately calculate length to be measured, otherwise interferometer will not known where to begin to the measurement of the Subnano-class precision of space length.
In current application, mainly contain two kinds of methods and determine optical maser wavelength.
The first is to calculate current air refraction by the Elden formula.Optical maser wavelength is affected by the atmospheric pressure of environment and temperature mainly, therefore, by measuring atmospheric pressure and the temperature of environment of living in, can calculate clearancen and refractive index
P wherein
airAnd T
airFor airborne pressure and temperature, a, b, c are constant.
Another kind is the Wavelength Tracker (wavelength tracker) of a kind of special monitoring environment wavelength of providing as Agilent company, as shown in fig. 1.It utilizes the optical cavity of a regular length as benchmark, is measured in real time the length of this cavity by interferometer, thereby learns the variation of current optical maser wavelength by the length variations of interferometer measurement.
Due to the restriction of test philosophy, the position of above two kinds of methods mensuration refractive index or wavelength and the real work position of interferometer be not or not same place, and the wavelength that therefore measures can exist different from the wavelength of interferometer real work position.Because the frequent requirement of the measuring object of interferometer is moved within the specific limits,, as along X, Y-direction translation, around Z axis, rotate, perhaps around Y-axis, tilt.The Wavelength Tracker that Agilent company provides can only be positioned over usually from measuring beam bundle larger distance.And interferometer is a relative position measurement system, at the beginning of this wavelength tracker works, need to carry out one to the preliminary examination value of wavelength and demarcate comparatively accurately, and the design of measuring cavity makes it can not complete comparatively satisfactorily this function.While adopting the Elden formula to calculate air refraction,, owing to being the wavelength of measuring beam indirectly, also easily be subject to the factors such as the measuring error impact of air pressure and temperature.
In addition, Chinese patent CN99814090.2 is disclosed to be improved in the method for measurement of interferometer, and by measuring simultaneously the impact of determining environment along the velocity of sound of measuring route direct of travel, this method has increased equipment cost undoubtedly; In the structure of the dual wavelength heterodyne ineterferometer of the disclosed make-up air disturbance of Chinese patent CN99118742.3, obtain refractive index by the optical path length of measuring two or more wavelength, this method needs two and separates far measurement wavelength (normally multiple relation), and laser instrument has been proposed new requirement.
Summary of the invention
The present invention is directed to existing above-mentioned shortcoming in the prior art scheme, provide a kind of device and method of measuring workpieces platform interferometer wavelength, in order to the measuring beam wavelength of real-time stellar interferometer.
for realizing above-mentioned and other purpose, the invention provides a kind of device of measuring workpieces platform interferometer wavelength, comprise: the first interferometer and the second interferometer, this is first years old, the second interferometer lays respectively at the relative both sides of this work stage, the second measuring beam that the first measuring beam that this first interferometer sends and this second interferometer send forms a wavelength measurement axle, this is first years old, the second interferometer obtain respectively this first, the first light path of the second measuring beam and the second light path, this is first years old, the second interferometer measurement this first, the light wave of the second measuring beam with respect to one measuring period initial time cycle change number, and computing module, the theoretical length that calculates this wavelength measurement axle in order to the first light path of obtaining according to this first, second interferometer and the second light path, and according to the theoretical length of this wavelength measurement axle, the kinematic parameter of this work stage, calculate the physical length of this wavelength measurement axle, and change number according to the light wave of the physical length of this wavelength measurement axle, this first, second measuring beam with respect to cycle of initial time, and should measuring period the initial wavelength of this first, second measuring beam of initial time calculate the actual wavelength of this first, second measuring beam.
The kinematic parameter of this work stage comprises: the anglec of rotation of this work stage and/or the angle of inclination of this work stage.
This first measuring beam and the second measuring beam are located along the same line.
The present invention also provides a kind of method of measuring workpieces platform interferometer wavelength, comprise the first light path and the second light path that utilize the first interferometer be positioned at these relative both sides of work stage and the second interferometer to obtain respectively first, second measuring beam that this first, second interferometer sends respectively, this first measuring beam and the second measuring beam composition one wavelength measurement axle; The light wave that utilizes this first, second this first, second measuring beam of interferometer measurement with respect to one measuring period initial time cycle change number; Calculate the theoretical length of this wavelength measurement axle according to this first light path and the second light path; Calculate the physical length of this wavelength measurement axle according to the theoretical length of this wavelength measurement axle, the kinematic parameter of this work stage; And change number according to the light wave of the physical length of this wavelength measurement axle, this first, second measuring beam with respect to cycle of initial time, and should measuring period the initial wavelength of this first, second measuring beam of initial time calculate the actual wavelength of this first, second measuring beam.
This first measuring beam and the second measuring beam are located along the same line.
This, initial wavelength of this first, second measuring beam of initial time was to see through following methods to obtain measuring period: utilize a location device to carry out two marks on time, this first, second interferometer measurement is along this wavelength measurement axial mean change cycle (this mean change cycle of PLSCONFM be whose mean change cycle); And according to these two, be marked at standoff distance on this wavelength measurement direction of principal axis and the initial wavelength of this this first, second measuring beam of mean change computation of Period.
This locating device is alignment system or Hall element.
Compared with prior art, the present invention has following advantage:
The device and method of measuring workpieces platform laser interference wavelength disclosed in this invention,, by measuring beam is arranged in interfering meter measuring device, directly and effectively measured wavelength, and it is more accurate to measure; Light path and relevant apparatus that stellar interferometer is measured, need not the extra special measuring equipment that increases, and structure is simpler, and cost is cheaper; By the alignment system of litho machine, this measurement scheme can be passed through regular calibration, thereby eliminates systematic error.The device and method of measuring workpieces platform laser interference wavelength provided by the present invention, both gone for the double frequency interferometer, again applicable to the single-frequency interferometer.
Description of drawings
Can be by following detailed Description Of The Invention and appended graphic being further understood about the advantages and spirit of the present invention.
Fig. 1 is the interferometer application mode of utilizing wavelength tracker monitoring of environmental wavelength in prior art;
Fig. 2 is the structural representation that utilizes interferometer to come the measuring workpieces platform to move in prior art;
Fig. 3 is the structural representation of the device of stellar interferometer wavelength disclosed in this invention;
Fig. 4 is that work stage is in rotation or the structural representation during heeling condition;
Embodiment
Describe specific embodiments of the invention in detail below in conjunction with accompanying drawing.
Shown in Fig. 1 is the structural representation that in prior art, interferometer comes the measuring workpieces platform to move.This figure is used in litho machine the interferometer measurement structure of the typical measuring workpieces platform position of being used as signal.This interferometer is positioned at X and the Y-direction of work stage, and it is respectively arranged with some measuring beams in X-direction and the Y-direction of work stage.Measuring beam is by being installed on the plane Fang Jing reflection of work stage side, thus the length variations of interferometer by measuring beam the change in location of work stage.According to the structure arrangement of interferometer measurement light beam, the six-freedom degree of measuring workpieces platform at most in real time.
Fig. 2 is the structural representation that utilizes interferometer to come the measuring workpieces platform to move in prior art.As shown in Figure 2,, along X-direction and the Y-direction of work stage 102, place respectively three interferometers on the infrastructural frame (not shown) of lithographic equipment in Fig. 2, comprise the 101a and the 101c that arrange along X-direction, along the 101b of Y-direction setting.Be not provided with some measuring beams in interferometer 101a and interferometer 101b.This measuring beam is by being installed on the plane side mirror (not shown) reflection of work stage 102 sides, thus the length variations of interferometer by measuring beam the change in location of work stage.Yet, due to interferometer environmental parameter of living in, variation such as environment temperature, pressure etc., the wavelength of the measuring beam that interferometer sends also can be subject to the impact of environmental parameter and change, if the wavelength of Real-time Measuring measurement amount light beam effectively, just can't effectively see through the moving situation of interferometer measurement work stage, and then can't the effective location work stage.
Fig. 3 is the structural representation of the device of measuring workpieces platform interferometer wavelength disclosed in this invention.As shown in Figure 3, increase respectively two in interferometer 101a and interferometer 101c and measure light 1 and measure light 2, and will measure light 1 and be referred to as the wavelength measurement axle with measurement light 2.As shown in FIG., measure light 1 and be located along the same line with measuring light 2, i.e. interferometer 101a, work stage 102 is located along the same line with interferometer 101c three.In the present embodiment, the wavelength measurement axle is comprised of the measuring beam that the interferometer along X-direction sends, but in actual use, can be set to form along the measuring beam that the interferometer of Y direction setting sends by the wavelength measurement axle equally.Wavelength measurement axle (being measuring beam 1 and measuring beam 2) can have one or two measuring beams and other measurement axle to share, that is, the wavelength measurement axle can be also simultaneously that other measures logic axle.
In the present invention, interferometer 101a, 101c measure respectively its measuring beam that sends 1,2 light path (being measuring beam 1,2 length) L1, L2., and the light wave of measuring measuring beam bundle 1,2 with respect to one measuring period initial time cycle change number δ i, calculate accordingly according to the measurement result of interferometer for the present invention's computing module (for diagram).
This computing module is according to measuring beam 1,2 measuring beam journey L1, the theoretical length L0=L1+L2 that L2 calculates this wavelength measurement axle.This computing module calculates the physical length L of this wavelength measurement axle according to the theoretical length of this wavelength measurement axle, the kinematic parameter of this work stage 102 (for example the work stage anglec of rotation, work stage angle of inclination) afterwards, and this computing module according to the physical length of this wavelength measurement axle, measuring beam 1,2 light wave with respect to this measuring period initial time cycle change number, and should measuring period the measuring beam 1, the actual wavelength of 2 initial wavelength computation and measurement light beam 1,2 of initial time:
Wherein,
By two measuring beams 1,2 the light wave number of cycles altogether of process light path, λ
0For the measuring beam 1 of this of initial time, 2 initial wavelength measuring period.
K is the length of work stage along this wavelength measurement direction of principal axis (namely along directions X shown in Figure 3).Initial wavelength X
0Acquisition pattern, hereinafter describe in detail.
What need to specify is, in apparatus of the present invention,, due to the wavelength measurement axle, namely sends measuring beam 1 and all is positioned on the infrastructural frame of lithographic equipment with interferometer 101a and the 101c of measuring beam 2, and interferometer 101a, 101c relative position are fixed.In the process of litho machine work, when work stage 102 can occur along X-direction shown in Figure 3 or Y-direction displacement, not change of size due to work stage 102, therefore measuring beam 1 is a fixed value with the light path sum of 2 processes of measuring beam, the physical length L=L0 of above-mentioned wavelength measurement axle under this kind situation.Have in view of that, if the striped of interferometer 101a and 101c changes sum, exist and change, show that measuring beam 1,2 wavelength change.
, according to the number that striped changes, can measure current measuring beam wavelength:
So, in the practical work process of litho machine, work stage 102, also needs in time rotate and tilt except the needs level to movement.When there is rotation in work stage or tilts, the length that forms the measurement light of wavelength measurement axle will change, and namely measure the physical length L of axle ≠ L0 this moment.As shown in Figure 4, when work stage during with rotation and angle of inclination Rx, Ry, Rz angle, the physical length of wavelength measurement axle
K is that work stage is along the axial length of this wavelength measurement.
Below will describe the embodiment of the method for measuring workpieces platform interferometer wavelength disclosed in this invention in detail.
At first in step 1, utilize interferometer 101a and interferometer 101c to obtain respectively measuring beam 1,2 light path L1, L2, and the light wave of measuring measuring beam bundle 1,2 with respect to one measuring period initial time cycle change number δ i.
In step 2, the measuring beam 1 that this computing module obtains according to interferometer 101a, 101c, 2 light path L1, L2 calculate the theoretical length L0=L1+L2 of measuring beam 1, the 2 wavelength measurement axles that form.
In step 3, this computing module calculates (kinematic parameter comprises the work stage anglec of rotation, angle of inclination etc.) physical length of this wavelength measurement axle according to the theoretical length of this wavelength measurement axle, the kinematic parameter of this work stage
In step 4, this computing module changes number δ i according to the physical length L of this wavelength measurement axle, measuring beam 1,2 light wave with respect to the cycle of initial time, and should measuring period the measuring beam 1,2 initial wavelength X of initial time
0Calculate the actual wavelength of this first, second measuring beam
What need to specify is, in the present invention's method,, due to the wavelength measurement axle, namely sends measuring beam 1 and all is positioned on the infrastructural frame of lithographic equipment with interferometer 101a and the 101c of measuring beam 2, and interferometer 101a, 101c relative position are fixed.In the process of litho machine work, when work stage 102 can occur along X-direction shown in Figure 3 or Y-direction displacement, not change of size due to work stage 102, therefore measuring beam 1 is a fixed value with the light path sum of 2 processes of measuring beam, the physical length L=L0 of the wavelength measurement axle that calculates in above-mentioned steps 3 under this kind situation.Have in view of that, if the striped of interferometer 101a and 101c changes sum, exist and change, show that measuring beam 1,2 wavelength change.
, according to the number that striped changes, can measure current measuring beam wavelength:
So, in the practical work process of litho machine, work stage 102, also needs in time rotate and tilt except the needs level to movement.When there is rotation in work stage or tilts, the length that forms the measurement light of wavelength measurement axle will change, the physical length L of the wavelength measurement axle that namely calculates in above-mentioned steps 3 this moment ≠ L0.For example shown in Fig. 4, when work stage during with rotation and angle of inclination Rx, Ry, Rz angle, the physical length of the wavelength measurement axle that above-mentioned steps 3 calculates
K is that work stage is along the axial length of this wavelength measurement.
Below explanation is in the above-mentioned measuring beam 1 of initial time measuring period, 2 initial wavelength X
0Preparation method.
In the technical program, because having adopted in lithographic equipment, this embodiment utilize interferometer to come the measuring workpieces platform to move as setting forth, therefore can realize by the alignment function in the middle of litho machine.Alignment function in litho machine mainly realized by alignment system, and the alignment function in litho machine mainly refers to, by reference mark being set on work stage or alignment mark being set to realize mask-silicon chip coordinate position relation accurately on silicon chip., due to composition how to realize alignment function and alignment system, belonged to the common-sense technology of comparatively knowing in the photoetching machine technique field, and the present invention do not relate to the improvement to alignment function or alignment system, so locate to skip over.
Please refer to Fig. 3, initial wavelength X
0Acquisition by means of reference mark 103 on work stage 102,104 or benchmark silicon chip 106 on alignment mark 105,106 realize.When work stage 102 is moved under the control of interferometer, suppose that two reference marks 103,104 are being Δ x along measuring beam 1,2 wavelength measurement direction of principal axis (the being X-direction shown in Figure 3) standoff distances that form, and the alignment system of litho machine is aimed at these two marks 103,104 successively, be Δ i aiming at interferometer 101a, measured two measuring beams 1, the 2 mean change cycles along wavelength measurement direction of principal axis (being X-direction shown in Figure 3) of 101c constantly, measuring beam 1,2 initial wavelength are
Similarly, when the present invention is applied in litho machine and other lathe or instrument, can adopt other system that possesses positioning function to obtain initial wavelength, such as Hall element is installed in fixed position, be used for the location of work stage or lathe.
When the present embodiment is applied in lithographic equipment, can be by means of the alignment system of litho machine as its locating device, and can carry out accurate correction to the wavelength measurement value termly voluntarily.
See through the present invention, the wavelength of the real-time calculating interferometer measurement light beam in the time of effectively, and then can effectively measure the work stage moving situation through interferometer, realize work stage is accurately located.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (4)
1. the device of a measuring workpieces platform interferometer wavelength comprises:
the first interferometer and the second interferometer, this is first years old, the second interferometer lays respectively at the relative both sides of this work stage, the second measuring beam that the first measuring beam that this first interferometer sends and this second interferometer send forms a wavelength measurement axle, this first measuring beam and the second measuring beam are located along the same line, this is first years old, the second interferometer obtain respectively this first, the first light path of the second measuring beam and the second light path, this is first years old, the second interferometer measurement this first, the light wave of the second measuring beam with respect to one measuring period initial time cycle change number, and
Computing module, the theoretical length L that calculates this wavelength measurement axle in order to the first light path L1 of obtaining according to this first, second interferometer and the second light path L2
0=L1+L2,
And according to the theoretical length L of this wavelength measurement axle
0, this work stage kinematic parameter calculate the physical length of this wavelength measurement axle
Wherein, Ry, Rz are respectively inclination and the anglec of rotation in the kinematic parameter of this work stage, namely are respectively the anglec of rotation with respect to y axle and z axle, and the x direction of principal axis is this wavelength measurement direction of principal axis, k be work stage along the axial length of this wavelength measurement,
And according to the light wave of the physical length L of this wavelength measurement axle, this first, second measuring beam with respect to this measuring period initial time cycle change number δ
i, and should measuring period the initial wavelength X of this first, second measuring beam of initial time
0Calculate the actual wavelength of this first, second measuring beam
2. the method for a measuring workpieces platform interferometer wavelength comprises:
Utilization is positioned at the first interferometer of these relative both sides of work stage and the second interferometer and obtains respectively the first light path and second light path of first, second measuring beam that this first, second interferometer sends respectively, this first measuring beam and the second measuring beam form a wavelength measurement axle, and this first measuring beam and the second measuring beam are located along the same line;
The light wave that utilizes this first, second this first, second measuring beam of interferometer measurement with respect to one measuring period initial time cycle change number;
Calculate the theoretical length L of this wavelength measurement axle according to this first light path L1 and the second light path L2
0=L1+L2;
Theoretical length L according to this wavelength measurement axle
0, this work stage kinematic parameter calculate the physical length of this wavelength measurement axle
Wherein, Ry, Rz are respectively inclination and the anglec of rotation in the kinematic parameter of this work stage, namely are respectively the anglec of rotation with respect to y axle and z axle, and the x direction of principal axis is this wavelength measurement direction of principal axis, and k is that work stage is along the axial length of this wavelength measurement; And
Change number δ according to the light wave of the physical length L of this wavelength measurement axle, this first, second measuring beam with respect to cycle of initial time
i, and should measuring period the initial wavelength X of this first, second measuring beam of initial time
0Calculate the actual wavelength of this first, second measuring beam
3. the method for measuring workpieces platform interferometer wavelength as claimed in claim 2, is characterized in that, this, initial wavelength of this first, second measuring beam of initial time was to see through following methods to obtain measuring period:
Utilize a location device to carry out two marks on time, this first, second measuring beam of this first, second interferometer measurement is along this wavelength measurement axial mean change cycle; And
Calculate the initial wavelength of this first, second measuring beam along this wavelength measurement axial mean change cycle Δ i according to these two standoff distance Δ x and this first, second measuring beams that are marked on this wavelength measurement direction of principal axis
4. the method for measuring workpieces platform interferometer wavelength as claimed in claim 3, is characterized in that, this locating device is Hall element.
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| CN105277118B (en) * | 2015-11-27 | 2018-03-27 | 成都信息工程大学 | A kind of optical maser wavelength modification method using optical maser wavelength amendment type corner reflector laser interferometer |
| CN108088501B (en) * | 2017-12-15 | 2021-01-26 | 中交基础设施养护集团有限公司 | Method for automatically correcting initial wavelength of optical fiber sensor |
| CN108898559B (en) * | 2018-06-20 | 2021-11-19 | 中国科学院光电技术研究所 | Atmospheric dispersion correction method based on image deconvolution |
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