CN102439488B - 改进的倾斜入射角沉积装置、使用它制造非反射性光学薄膜的方法以及非反射性光学薄膜 - Google Patents

改进的倾斜入射角沉积装置、使用它制造非反射性光学薄膜的方法以及非反射性光学薄膜 Download PDF

Info

Publication number
CN102439488B
CN102439488B CN200980159449.XA CN200980159449A CN102439488B CN 102439488 B CN102439488 B CN 102439488B CN 200980159449 A CN200980159449 A CN 200980159449A CN 102439488 B CN102439488 B CN 102439488B
Authority
CN
China
Prior art keywords
substrate
refractor
deposition
deposition materials
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200980159449.XA
Other languages
English (en)
Chinese (zh)
Other versions
CN102439488A (zh
Inventor
皇甫昌权
朴龙俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inha Industry Partnership Institute
Original Assignee
Inha Industry Partnership Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inha Industry Partnership Institute filed Critical Inha Industry Partnership Institute
Publication of CN102439488A publication Critical patent/CN102439488A/zh
Application granted granted Critical
Publication of CN102439488B publication Critical patent/CN102439488B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
CN200980159449.XA 2009-05-22 2009-12-07 改进的倾斜入射角沉积装置、使用它制造非反射性光学薄膜的方法以及非反射性光学薄膜 Expired - Fee Related CN102439488B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020090044859A KR101088403B1 (ko) 2009-05-22 2009-05-22 변형 경사 입사각 증착 장치 및 이를 이용한 무반사 광학 박막의 제조 방법, 그리고 무반사 광학 박막
KR10-2009-0044859 2009-05-22
PCT/KR2009/007276 WO2010134677A1 (ko) 2009-05-22 2009-12-07 변형 경사 입사각 증착 장치 및 이를 이용한 무반사 광학 박막의 제조 방법, 그리고 무반사 광학 박막

Publications (2)

Publication Number Publication Date
CN102439488A CN102439488A (zh) 2012-05-02
CN102439488B true CN102439488B (zh) 2014-01-29

Family

ID=43126333

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980159449.XA Expired - Fee Related CN102439488B (zh) 2009-05-22 2009-12-07 改进的倾斜入射角沉积装置、使用它制造非反射性光学薄膜的方法以及非反射性光学薄膜

Country Status (3)

Country Link
KR (1) KR101088403B1 (ko)
CN (1) CN102439488B (ko)
WO (1) WO2010134677A1 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101353453B1 (ko) * 2011-12-28 2014-01-21 재단법인 포항산업과학연구원 경질 코팅층과 그 형성방법
CN104633972A (zh) * 2013-12-09 2015-05-20 康雪慧 一种采用渐变减反射层的选择性涂层及其制备方法
CN103789743B (zh) * 2014-01-14 2015-09-16 南京工业大学 一种斜角入射微纳米薄膜沉积系统
CN106435508A (zh) * 2016-08-30 2017-02-22 厦门乾照光电股份有限公司 一种折射率连续渐变的光学薄膜制备方法
CN106772710B (zh) * 2016-12-16 2019-09-27 中国科学院长春光学精密机械与物理研究所 一种减反射膜的制备方法及大角度入射减反射膜
CN106733548A (zh) * 2017-01-09 2017-05-31 清华大学 一种表面改性的同质双层氧化硅自清洁减反膜的制备方法
KR101961688B1 (ko) * 2017-03-03 2019-03-25 광주과학기술원 발색 구조체 및 발색 구조체의 제조 방법
CN108878674A (zh) * 2017-05-11 2018-11-23 京东方科技集团股份有限公司 显示基板及其制作方法、显示装置
CN110218980B (zh) * 2019-06-27 2021-01-26 艾普偏光科技(厦门)有限公司 负折射率防晕眩太阳镜片及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002062403A (ja) * 2000-08-17 2002-02-28 Sony Corp 光吸収性反射防止体
CN1532563A (zh) * 2002-09-09 2004-09-29 ͬ�Ϳ�ҵ��ʽ���� 光学增透膜及其镀膜方法
CN101276005A (zh) * 2007-03-29 2008-10-01 郭爱军 新型抗反射导电膜

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100784338B1 (ko) * 2005-08-04 2007-12-13 인하대학교 산학협력단 저굴절률 박막 제조방법 및 이를 이용한 무반사 코팅 방법
JP5060091B2 (ja) 2006-09-21 2012-10-31 三菱電線工業株式会社 多孔性薄膜の製造方法、及び多孔性薄膜を備えた光学部材の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002062403A (ja) * 2000-08-17 2002-02-28 Sony Corp 光吸収性反射防止体
CN1532563A (zh) * 2002-09-09 2004-09-29 ͬ�Ϳ�ҵ��ʽ���� 光学增透膜及其镀膜方法
CN101276005A (zh) * 2007-03-29 2008-10-01 郭爱军 新型抗反射导电膜

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Broadband omnidirectional antireflection coatings optimized by genetic algorithm;DAVID J.POXSON,et al.;《Optical Letters》;20090315;第34卷(第6期);第729页第2栏第2段至第3段，附图3 *
DAVID J.POXSON,et al..Broadband omnidirectional antireflection coatings optimized by genetic algorithm.《Optical Letters》.2009,第34卷(第6期),第729页第2栏第2段至第3段，附图3.

Also Published As

Publication number Publication date
CN102439488A (zh) 2012-05-02
WO2010134677A1 (ko) 2010-11-25
KR101088403B1 (ko) 2011-12-01
KR20100125904A (ko) 2010-12-01

Similar Documents

Publication Publication Date Title
CN102439488B (zh) 改进的倾斜入射角沉积装置、使用它制造非反射性光学薄膜的方法以及非反射性光学薄膜
CN101995588B (zh) 光学物品制造方法
JP6172889B2 (ja) 光学用部材の製造方法
CN106772746B (zh) 红外截止滤光片及其制备方法
JP5840448B2 (ja) 反射防止膜及び反射防止膜の製造方法
JP3159780B2 (ja) 反射防止塗装層
JP3416024B2 (ja) 薄膜太陽電池における微粒子塗布膜
CN105022106B (zh) 一种可见‑近红外波段的超宽带吸收器及制备方法
JP2012189846A (ja) 反射防止光学素子及び反射防止光学素子の製造方法
JP2011013654A (ja) 多層反射防止層およびその製造方法、プラスチックレンズ
JP2005055899A (ja) 反射防止特性を有する光学層システム
CN103443662A (zh) 光学部件及其制造方法
CA2383439A1 (en) Composition and method for a coating providing anti-reflective and anti-static properties
JP6209190B2 (ja) 無反射ナノコーティング構造及びその製造方法
KR20120012555A (ko) 점진적으로 굴절률이 변하는 실리콘 다층 무반사막 및 그 제조방법 및 이를 구비하는 태양전지 및 그 제조방법
EP2696221A1 (en) Optical member and method for manufacturing optical member
JP2013242541A (ja) 反射低減干渉層システムを作製する方法及び反射低減干渉層システム
Kyung et al. Control of structure and film thickness using spray layer-by-layer method: Application to double-layer anti-reflection film
CN105161141B (zh) 可见‑近红外波段的超宽带吸收器及制备方法
JP2010072636A (ja) 光学物品およびその製造方法
CN115903114A (zh) 一种基于光子晶体膜层结构的偏振不敏感角度滤波器及其制备方法
KR20150007392A (ko) 박막의 제조 방법
Nishide et al. Control of refractive index of sol-gel tungsten oxide films
JP6989289B2 (ja) 親水性反射防止膜付きレンズ及びその製造方法
JP2010072635A (ja) 光学物品およびその製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20140129

Termination date: 20191207

CF01 Termination of patent right due to non-payment of annual fee